JPH02207501A - Method of forming electrode film in electronic parts - Google Patents

Method of forming electrode film in electronic parts

Info

Publication number
JPH02207501A
JPH02207501A JP1027928A JP2792889A JPH02207501A JP H02207501 A JPH02207501 A JP H02207501A JP 1027928 A JP1027928 A JP 1027928A JP 2792889 A JP2792889 A JP 2792889A JP H02207501 A JPH02207501 A JP H02207501A
Authority
JP
Japan
Prior art keywords
electrode film
insulating material
conductive paste
material plate
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1027928A
Other languages
Japanese (ja)
Other versions
JPH0748410B2 (en
Inventor
Katsunori Watanabe
渡辺 克典
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP1027928A priority Critical patent/JPH0748410B2/en
Publication of JPH02207501A publication Critical patent/JPH02207501A/en
Publication of JPH0748410B2 publication Critical patent/JPH0748410B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Landscapes

  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Abstract

PURPOSE:To reduce generation of chips in an insulating substrate so as to improve the yield rate of a product by applying conductive paste at least in one hand between conductive pastes for electrode films apart at a plate of the groove of two insulating substrates which adjoin each other. CONSTITUTION:When applying, by screen printing, conductive paste for a top electrode film 5a on the place of a projection 4 for electrode in each insulating substrate 1 with the top side of the insulating material plate A up, this conductive paste for top electrode film 5a is applied separately on each projection 4 for electrode so that it may be divided by lateral groove A7, without being applied so that it may continue astride the projections for electrodes in both of the two insulating substrates 1 which adjoin each other with the lateral groove A7 between, so as to form top electrode films 5a. After these are finished, a resistance film 3a is formed at a place of each insulating substrate 1 with the paste for resistance film 3 by screen printing. Thereafter, the insulating material plate A is broken along the lateral groove A7 into each bar-shaped insulating material plate A1 by adding external force in the direction shown by arrows B and B so as to bend it.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えば、チップ抵抗器やチップコンデンサ等
のように、接続用の電極を、絶縁基板に対して膜状に塗
着したものに構成した電子部品において、前記膜状の電
極、つまり電極膜を、前記絶縁基板に対して塗着形成す
るための方法に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention is applicable to devices such as chip resistors and chip capacitors in which connection electrodes are coated in a film form on an insulating substrate. The present invention relates to a method for coating and forming the film-like electrode, that is, the electrode film, on the insulating substrate in the configured electronic component.

〔従来の技術〕[Conventional technology]

一般に、このように絶縁基板に設ける電極を膜状にする
場合、この膜状の電極、つまり、電極膜は、前記絶縁基
板の上面に、当該上面における抵抗膜等に導通するよう
に塗着形成した上面電極膜と、前記絶縁基板の下面に塗
着形成した下面電極膜と、前記絶縁基板の側面に、前記
上面電極膜と下面電極膜とを互いに導通するように塗着
形成した側面電極膜とによって構成している。
Generally, when an electrode provided on an insulating substrate is formed into a film, the film-like electrode, that is, the electrode film is formed by coating on the upper surface of the insulating substrate so as to be electrically conductive to a resistive film, etc. on the upper surface. a top electrode film coated on the bottom surface of the insulating substrate, a bottom electrode film coated and formed on the bottom surface of the insulating substrate, and a side electrode film coated and formed on the side surface of the insulating substrate so that the top electrode film and the bottom electrode film are electrically connected to each other. It is composed of

しかし、これらの上面電極膜、下面電極膜及び側面電極
膜を、絶縁基板の各々について別々に塗着形成したので
は、生産性が著しく低くて、製造コストが大幅に増大す
ることになるから、従来は、以下に述べるような方法で
塗着形成している。
However, if these top electrode films, bottom electrode films, and side electrode films were formed by coating separately on each insulating substrate, productivity would be extremely low and manufacturing costs would increase significantly. Conventionally, the coating is formed by the method described below.

すわなち、例えば、チップ抵抗器の場合には、先づ、第
14図及び第15図に示すように、多数個の絶縁基板1
1を縦方向及び横方向に複数個並べた伏態のセラミック
製の絶縁素材板aを、当該絶縁素材板aの上面及び下面
に前記各絶縁基板11ごとにブレイクするための断面V
型の縦筋目溝a1及び横筋目溝a2を設けて形成し、こ
の絶縁素材板aの下面における横筋目溝a2の箇所に、
第16図及び第17図に示すように、下面電極膜用の導
電性ペーストをスクリーン印刷によって前記横筋目溝a
2を挟んで隣接する二つの絶縁基板11の両方に跨って
連続するように塗着して乾燥することにより、下面電極
膜12bを形成する一方、前記絶縁素材板aの上面にお
ける横筋目溝a2の箇所に、第18図及び第19図に示
すように、前記と同様に、上面電極膜用の導電性ペース
トをスクリーン印刷によって前記横筋目溝a2を挟んで
隣接する二つの絶縁基板11の両方に跨って連続するよ
うに塗着して乾燥することにより、上面電極膜2aを形
成したのち、前記絶縁素材板aの上面における各絶縁基
板11の箇所に、第20図及び第21図に示すように、
抵抗膜13を塗着形成し、次いで、前記絶縁素材板aを
、第22図及び第23図に示すように、横筋目溝a2に
沿って棒状の絶縁素材板a3にブレイクし、この棒状絶
縁素材板a3における各絶縁基板11の左右両側面11
aに、第25図に示すように、側面電極膜用の導電性ペ
ーストを塗着したのち乾燥して、側面電極膜12Cを形
成することにより、各絶縁基板11の各々に電極膜12
を設け、その後において、この棒状絶縁素材板a3を、
縦筋目溝a1に沿って各絶縁基板11ごとにブレイクす
ることによって、チップ抵抗器を製造するようにしてい
る。
For example, in the case of a chip resistor, first, as shown in FIGS. 14 and 15, a large number of insulating substrates 1 are
A cross section V for breaking a lying ceramic insulating material plate a in which a plurality of insulating substrates 1 are arranged in the vertical and horizontal directions on the upper and lower surfaces of the insulating material plate a for each insulating substrate 11.
A vertical groove a1 and a horizontal groove a2 are formed in the mold, and the horizontal groove a2 is formed on the lower surface of the insulating material plate a.
As shown in FIGS. 16 and 17, a conductive paste for the lower electrode film is applied to the horizontal grooves a by screen printing.
The lower surface electrode film 12b is formed by applying the coating continuously across both of the two adjacent insulating substrates 11 with the insulating substrates 11 in between and drying. As shown in FIGS. 18 and 19, in the same manner as described above, a conductive paste for the upper surface electrode film is applied by screen printing to both of the two adjacent insulating substrates 11 with the horizontal groove a2 in between. After forming the upper surface electrode film 2a by applying the film continuously across the insulating material plate a and drying it, it is applied to each insulating substrate 11 on the upper surface of the insulating material plate a as shown in FIGS. 20 and 21. like,
The resistive film 13 is applied and formed, and then, as shown in FIGS. 22 and 23, the insulating material plate a is broken into rod-shaped insulating material plates a3 along the horizontal grooves a2. Both left and right side surfaces 11 of each insulating substrate 11 on the material board a3
As shown in FIG.
After that, this rod-shaped insulating material plate a3 is
A chip resistor is manufactured by breaking each insulating substrate 11 along the vertical grooves a1.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

ところが、この従来における電極膜12の塗着形成する
方法では、上面電極膜12a及び下面電極膜12bの両
方を、絶縁素材板aにおける横筋目aa2の箇所に、導
電性ペーストを当該横筋凹溝a2を挟んで隣接する両絶
縁基板11の両方に跨って連続するようにして塗着する
ことによって形成するもので、このように、両絶縁基板
11の両方に跨って連続するように塗着した導電性ペー
ストは、縦筋目溝alにおける溝面a2′にも塗着され
ると共に、当該導電性ペーストが乾燥するまでの間にお
いて横筋目高a2内に流れ込むことになるから、前記上
面電極膜12a及び下面電極膜12bのうち前記横筋目
高a2内の部分における膜厚さは、第19図に示すよう
に、絶縁基板11の上面及び下面の部分における膜厚さ
よりも可成り厚くなるのである。
However, in this conventional method of coating and forming the electrode film 12, both the upper electrode film 12a and the lower electrode film 12b are coated with a conductive paste at the horizontal grooves aa2 of the insulating material plate a. It is formed by applying the conductive material continuously across both insulating substrates 11 which are adjacent to each other with the conductive substrates 11 in between. The conductive paste is also applied to the groove surface a2' in the vertical groove al, and flows into the horizontal groove height a2 until the conductive paste dries. The thickness of the bottom electrode film 12b at the portion within the horizontal line height a2 is considerably thicker than the thickness at the top and bottom portions of the insulating substrate 11, as shown in FIG.

すなわち、縦筋目溝a1を挟んで隣接する二つの絶縁基
板11は、膜厚さが横筋目高a2内の部分において厚く
なる上面電極膜12a及び下面電極膜12°bによって
互いに連結された状態になり、上面電極膜12a及び下
面電極膜12bにおける膜厚さが、横筋目高a2内にお
いて厚くなることは、この絶縁素材板aを、第21図に
矢印す、  bで示す方向に外力を加えて折り曲げるこ
とにより、横筋目溝a2に沿ってブレイクすることを著
しく阻害するから、ブレイクの作業性が低いのであり、
しかも、ブレイクに際して、絶縁素材板aが、前記横筋
目溝a2の中心(最も深い部分)より外れた箇所におい
てブレイクされ、各絶縁基板11に欠けが発生すること
になるから、製品の歩留り率が低いのである。
That is, the two insulating substrates 11 adjacent to each other with the vertical groove a1 in between are connected to each other by the upper surface electrode film 12a and the lower surface electrode film 12°b whose film thickness is thicker at the portion within the horizontal streak height a2. Therefore, the film thickness of the upper surface electrode film 12a and the lower surface electrode film 12b becomes thicker within the horizontal line height a2 when an external force is applied to the insulating material plate a in the direction shown by arrows b in FIG. By bending it, breaking along the horizontal groove a2 is significantly inhibited, and the workability of breaking is low.
Moreover, when breaking, the insulating material plate a is broken at a location away from the center (deepest part) of the horizontal groove a2, and each insulating substrate 11 is chipped, which reduces the yield rate of the product. It is low.

その上、絶縁素材板aに対して前記のように矢印す、b
の方向に外力を加えることによってブレイクするに際し
て、前記上面電極膜12a及び下面電極膜12bのうち
矢印す、bで示す折り曲げ方向に対して内側に位置する
下面電極膜2bは、圧縮力によってブレイクされるので
、横筋目溝a2の中心の箇所においてブレイクされるこ
とになるが、前記上面電極膜12a及び下面電極膜12
bのうち矢印す、bで示す折り曲げ方向に対して外側に
位置する上面電極膜2aは、引張力によってブレイクさ
れるものであるから、この引張力によってブレイクされ
る上面電極膜12aにおける膜厚さが、前記横筋日清a
2内において厚いことは、当該上面電極膜12aは、第
23図に示すように、前記横筋目溝a2の中心より外れ
た部位においてブレイクされ、両絶縁基板11のうち一
方の絶縁基板11における上面電極膜12aは、当該上
面電極膜12aのうち前記横筋目溝a2における溝面a
2′の部分が禿げ落ちた形態になる一方、両絶縁基板1
1のうち他方の絶縁基板11における上面電極膜12a
は、当該他方の絶縁基板11における側面11aより突
出した形態になり、更に、この他方の絶縁基板11にお
ける上面電極膜12aのうち側面11aより突出した部
分は、絶縁素材板の移送等の取扱中において、第24図
に示すように、絶縁基板11より欠は落ちることになる
から、この他方の絶縁基板11における上面電極膜12
aも、横筋目溝a2における溝面a2′から禿げ落ちた
形態になるのである。
In addition, arrows 1 and 2 are attached to the insulating material plate a as described above.
When the upper electrode film 12a and the lower electrode film 12b are broken by applying an external force in the direction shown in FIG. Therefore, the break occurs at the center of the horizontal groove a2, but the upper surface electrode film 12a and the lower surface electrode film 12
Since the upper surface electrode film 2a located outside of the bending direction indicated by arrows b in b is broken by tensile force, the film thickness of the upper surface electrode film 12a that is broken by this tensile force is However, the Yokosuji Nissin a
As shown in FIG. The electrode film 12a has a groove surface a in the horizontal groove a2 of the upper electrode film 12a.
While the 2' part becomes bald, both insulating substrates 1
1, the upper surface electrode film 12a on the other insulating substrate 11
is in a form that protrudes from the side surface 11a of the other insulating substrate 11, and furthermore, the portion of the upper electrode film 12a of this other insulating substrate 11 that protrudes from the side surface 11a is removed during handling, such as transferring the insulating material board. In this case, as shown in FIG.
A also falls off from the groove surface a2' in the horizontal groove a2.

従って、絶縁基板11における側面11aに対して、導
電性ペーストを塗着することによって側面電極膜12c
を形成した場合、この側面電極膜12cのうち前記上面
電極膜12aが禿げ落ちた溝面a1′の部分における膜
厚さは、第25図に示すように、極めて薄くなるから、
チップ抵抗器をプリント基板等に対して実装するに際し
て、前記電極膜12をプリント基板に対して半田付けす
る場合において、前記電極膜12における側面電極膜1
2cのうち膜厚さが薄い部分に、いわゆる、半田くわれ
(側面電極膜12Cが溶融半田によって持ち去られるこ
と)が発生するのであり、特に、この半田くわれは、上
面電極膜12aにおける幅寸法を、図示のように、絶縁
基板11における幅寸法より狭くした場合において、顕
著に発生するのである。
Therefore, by applying a conductive paste to the side surface 11a of the insulating substrate 11, the side electrode film 12c is
In this case, the thickness of the side electrode film 12c at the groove surface a1' where the upper electrode film 12a falls off becomes extremely thin, as shown in FIG.
When mounting the chip resistor on a printed circuit board or the like, when soldering the electrode film 12 to the printed circuit board, the side electrode film 1 of the electrode film 12
So-called solder cracks (where the side electrode film 12C is removed by the molten solder) occur in the thinner part of the film 2c, and in particular, the solder cracks are caused by the width dimension of the top electrode film 12a. As shown in the figure, this phenomenon occurs significantly when the width of the insulating substrate 11 is made narrower than the width of the insulating substrate 11.

また、前記の不具合は、前記絶縁素材板aを、前記矢印
す、  bとは反対の方向に外力を加えてブイレフする
場合にも発生するのであった。
Further, the above-mentioned problem also occurs when the insulating material plate a is subjected to an external force in the direction opposite to the arrows S and B.

本発明は、前記した従来における電極膜の形成方法が有
する不具合を解消した電極膜の形成方法を提供すること
を目的とするものである。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for forming an electrode film that eliminates the disadvantages of the conventional electrode film forming methods described above.

〔課題を解決するための手段〕[Means to solve the problem]

この目的を達成するため本発明は、多数個の絶縁基板を
縦方向及び横方向に複数個並べた状態の絶縁素材板を、
当該絶縁素材板の上面及び下面に各絶縁基板ごとにブレ
イクするための断面v型の筋目溝を設けて形成し、該絶
縁素材板における各絶縁基板の上面及び下面に、上面電
極膜用の導電性ペースト及び下面電極膜用の導電性ペー
ストを各々塗着し、次いで、前記絶縁素材板を、筋目溝
に沿って棒状の絶縁素材仮にブレイクしたのち、この棒
状絶縁素材における各絶縁基板の側面に、前記上面電極
膜と下面電極膜とを繋ぐ側面電極膜用の導電性ペースト
を塗着するようにした電極膜の形成方法において、前記
上面電極膜用の導電性ペースト及び下面電極膜用の導電
性ペーストのうち、少なくとも一方におけるの導電性ペ
ーストを、前記筋目溝を挟んで隣接する二つの絶縁基板
の両方に跨って連続するように塗着することなく、前記
筋目溝の箇所において分断するようにして塗着する構成
にした。
In order to achieve this object, the present invention provides an insulating material plate in which a plurality of insulating substrates are arranged in the vertical and horizontal directions.
A groove with a V-shaped cross section for breaking each insulating substrate is provided on the upper and lower surfaces of the insulating material plate, and conductive grooves for the upper electrode film are formed on the upper and lower surfaces of each insulating substrate in the insulating material plate. A conductive paste and a conductive paste for the bottom electrode film are respectively applied, and then the insulating material plate is temporarily broken into a bar-shaped insulating material along the grooves, and then a bar-shaped insulating material is applied to the side surface of each insulating substrate in this bar-shaped insulating material. , a method for forming an electrode film comprising applying a conductive paste for a side electrode film connecting the top electrode film and the bottom electrode film, the conductive paste for the top electrode film and the conductive paste for the bottom electrode film; The conductive paste on at least one of the conductive pastes is not applied continuously across both of the two adjacent insulating substrates with the groove in between, but is separated at the location of the groove. The structure was designed so that it can be applied after washing.

〔作  用〕[For production]

絶縁素材仮の上面に上面電極膜用の導電性ペーストを、
絶縁素材板の下面に下面電極膜用の導電性ペーストを各
々塗着するに際して、この上面電極膜用の導電性ペース
ト及び下面電極膜用の導電性ペーストのうち、少なくと
も一方の導電性ペーストを、筋目溝を挟んで隣接する二
つの絶縁基板の両方に跨って連続するように塗着するこ
となく、前記筋目溝の箇所において分断するようにして
塗着する°ように構成すると、この一方の導電性ペース
トは、筋目溝における溝面に塗着されることなく、当該
一方の導電性ペーストが乾燥するまでの間において、筋
目溝内に向って垂れ込むことになるから、前記筋目溝に
おける溝面に、前記一方の導電性ペーストによって膜を
形成することができると共に、前記筋目溝内の最深部に
おける部分における膜の厚さを、極めて薄くすることが
できるか、或いは、前記筋目溝内の最深部に、電極膜が
形成されることを皆無にすることができるのである。
Conductive paste for the top electrode film is applied to the temporary top surface of the insulating material.
When applying the conductive paste for the lower electrode film to the lower surface of the insulating material plate, at least one of the conductive paste for the upper electrode film and the conductive paste for the lower electrode film is applied. If the structure is such that the coating is not applied continuously across two adjacent insulating substrates with the grooves in between, but is applied in a manner that separates the substrates at the grooves, the conductivity of one of the substrates can be increased. The conductive paste is not applied to the groove surface of the groove, but drips into the groove until the one conductive paste dries. In addition, it is possible to form a film using the one conductive paste, and the thickness of the film at the deepest part of the groove can be made extremely thin, or the thickness of the film at the deepest part of the groove can be made extremely thin. This makes it possible to completely eliminate the formation of an electrode film on the area.

〔発明の効果〕〔Effect of the invention〕

従って本発明によると、′絶縁素材板を、筋目溝に沿っ
て棒状の絶縁素材板にブレイクするに際して、その上面
に塗着形成した上面電極膜及び下面に塗着成形した下面
電極膜のうちいずれか一方が、前記筋目溝に沿ってのブ
レイクを阻害することを小さくできるから、絶縁素材板
を、前記筋目溝に沿ってブレイクすることの作業性を大
幅に向上できると共に、前記絶縁素材板が、前記筋目溝
の中心よりはずれた箇所においてブレイクすること、つ
まり、絶縁基板に欠けが発生することを低減できるから
、製品の歩留り率を大幅に向上にできるのである。
Therefore, according to the present invention, when an insulating material plate is broken into rod-shaped insulating material plates along the grooves, either of the upper surface electrode film coated and formed on the upper surface and the lower surface electrode film coated and formed on the lower surface. On the other hand, it is possible to reduce the inhibition of breaking along the grooves, so that the workability of breaking the insulating material plate along the grooves can be greatly improved, and the insulating material plate can be Since it is possible to reduce the occurrence of breaks at locations away from the center of the grooves, that is, the occurrence of chips in the insulating substrate, the yield rate of products can be significantly improved.

しかも、筋目溝における満面に膜を形成した状態の”C
Lで、前記筋目溝内の最深部における部分における膜厚
さを、極めて薄く、或いは、零にすることができるから
、上面電極膜又は下面電極膜のうち筋目溝における溝面
の箇所における部分が、前記のブレイクに際して、溝面
から禿げ落ちることを防止でき、従って、この満面の部
分における膜を、上面電極膜用の導電性ペースト又は下
面電極膜用の導電性ペーストと、側面に塗着した側面電
極膜用の導電性ペースト・との二段重ねの膜にすること
ができ、換言すると、絶縁素材板を折り曲げてのブレイ
クに際して、折り曲げの外側に位置する筋目溝の溝面に
対する電極膜が薄くなることを防止できるから、半田付
けに際して、半田くわれが発生することを確実に低減で
きるのである。
Moreover, "C" in a state where a film is completely formed in the grooves.
In L, the film thickness at the deepest part in the groove can be made extremely thin or zero, so that the portion of the upper electrode film or the lower electrode film at the groove surface in the groove can be made extremely thin or even zero. , it is possible to prevent baldness from falling off the groove surface when the break occurs, and therefore, the film on this full surface area is coated on the side surface with a conductive paste for the top electrode film or a conductive paste for the bottom electrode film. It can be made into a two-layered film with conductive paste for the side electrode film.In other words, when the insulating material plate is bent and broken, the electrode film on the groove surface of the groove located on the outside of the bending is Since thinning can be prevented, it is possible to reliably reduce the occurrence of solder cracks during soldering.

〔実施例〕〔Example〕

以下、本発明の実施例を、チップ型抵抗器のうち、第1
図及び第2図に示すように、絶縁基板1の上面に中心孔
2と同芯円状tこ抵抗膜3を形成する一方、前記絶縁基
板1の側面に突出するように造形した一対の電極用突起
4に、前記抵抗膜3の両端の各々に対する電極膜5を各
々形成し、前記抵抗膜3に摺接するロータ部材6を、前
記中心孔2を挿通した軸7に回転可能に取付けて成るチ
ップ型の可変抵抗器に対して適用した場合について説明
する。この場合において、前記電極膜5は、絶縁基板l
の上面における上面電極膜5aと、絶縁基板lの下面に
おける下面電極膜5bと、絶縁基板1の側面における側
面電極膜5cとによって構成されている。
Hereinafter, the embodiments of the present invention will be explained as follows.
As shown in the figure and FIG. 2, a center hole 2 and a concentric circular resistance film 3 are formed on the upper surface of the insulating substrate 1, while a pair of electrodes are formed to protrude from the side surface of the insulating substrate 1. Electrode films 5 are formed on each of the resistive film 3 at both ends of the resistive film 3, and a rotor member 6 that comes into sliding contact with the resistive film 3 is rotatably attached to a shaft 7 inserted through the center hole 2. A case where the present invention is applied to a chip type variable resistor will be explained. In this case, the electrode film 5 is formed on an insulating substrate l.
It is composed of a top electrode film 5a on the top surface, a bottom electrode film 5b on the bottom surface of the insulating substrate 1, and a side electrode film 5c on the side surface of the insulating substrate 1.

第3図において、符号Aは、セラミック製の絶縁素材板
を示し、該絶縁素材板Aは、前記絶縁基板1の多数個を
当該絶縁基板1における電極用突起4が外向きとなるよ
うに二側に並べて成る棒状絶縁素材板Alの三枚を、こ
れら三枚の棒状絶縁素材板A1の各絶縁基板1における
電極用突起4の箇所において一体的に連接するようにし
て構成され、その両端部には、位置決め用のノツチA4
゜A5を備えた耳片A2.A3が一体的に連接され、且
つ、前記各絶縁基板1の相互間、及び各絶縁基板1と両
耳片A2.A3との間には、第4図に示すように、断面
をV型にした縦筋目溝A6.A7が、絶縁素材板Aにお
ける上面及び下面の両方について設けられている。
In FIG. 3, reference numeral A indicates an insulating material plate made of ceramic, and the insulating material board A holds a large number of the insulating substrates 1 in such a way that the electrode protrusions 4 of the insulating substrate 1 face outward. Three rod-shaped insulating material plates Al arranged side by side are integrally connected at the location of the electrode protrusion 4 on each insulating substrate 1 of these three rod-shaped insulating material plates A1, and both ends thereof has an A4 notch for positioning.
゜Ear piece A2 with A5. A3 are integrally connected, and between the respective insulating substrates 1, and between each insulating substrate 1 and both ear pieces A2. As shown in FIG. 4, there is a vertical groove with a V-shaped cross section between A3 and A6. A7 is provided on both the upper and lower surfaces of the insulating material plate A.

前記絶縁素材板Aを、その下面を上向きになるように裏
返した状態で、当該絶縁素材板Aの下面のうち、各絶縁
基板1における電極用突起4の箇所に、第5図及び第6
図に示すように、下面電極膜5b用の導電性ペーストを
スクリーン印刷により、横筋目溝A7を挟んで隣接する
二つの絶縁基板1の両方における電極用突起4に跨って
連続するようにして塗着したのち乾燥することにより、
下面電極膜5bを形成する。
With the insulating material plate A turned over so that the lower surface thereof faces upward, on the lower surface of the insulating material plate A, place the electrode protrusions 4 on each insulating substrate 1 as shown in FIGS. 5 and 6.
As shown in the figure, the conductive paste for the lower electrode film 5b is applied by screen printing so as to extend continuously over the electrode protrusions 4 on both of the two adjacent insulating substrates 1 with the horizontal groove A7 in between. By drying it after wearing it,
A lower surface electrode film 5b is formed.

次いで、前記絶縁素材板Aを、その上面を上向きにした
状態で、当該絶縁素材板Aの上面のうち、各絶縁基板工
における電極用突起4の箇所に、上面電極膜5a用の導
電性ペーストを、スクリーン印刷によって塗着するに際
して、この上面電極膜5a用の導電性ペーストを、前記
横筋目溝A7を挟んで隣接する二つの絶縁基板10両方
における電極用突起4に跨って連続するように塗着する
ことなく、第7図及び第8図に示すように、前記横筋目
溝A7の箇所において分断するように、換言すれば、各
電極用突起4に各々別に塗着して、乾燥することにより
、上面電極膜5aを形成する。
Next, with the upper surface of the insulating material plate A facing upward, a conductive paste for the upper electrode film 5a is applied to the upper surface of the insulating material plate A at the location of the electrode protrusion 4 in each insulating substrate work. When applying this by screen printing, apply the conductive paste for the upper electrode film 5a so that it continues across the electrode protrusions 4 on both of the two adjacent insulating substrates 10 across the horizontal groove A7. In other words, it is applied to each electrode protrusion 4 separately so as to be divided at the horizontal groove A7 as shown in FIGS. 7 and 8 without being applied, and then dried. By this, the upper surface electrode film 5a is formed.

この場合において、上面電極膜5aは、各絶縁基板lに
おける電極用突起4の幅一杯に形成する。
In this case, the upper surface electrode film 5a is formed to cover the entire width of the electrode protrusion 4 on each insulating substrate l.

これらが終わると、前記絶縁素材板Aの上面のうち、各
絶縁基板1の箇所に、第9図及び第10図に示すように
、抵抗膜3用のペーストを、スクリーン印刷にて塗着し
たのち乾燥することによって、抵抗膜3を形成する。
After completing these steps, paste for the resistive film 3 was applied to the upper surface of the insulating material plate A at the location of each insulating substrate 1 by screen printing, as shown in FIGS. 9 and 10. The resistive film 3 is then formed by drying.

その後において前記絶縁素材板Aを、第10図に矢印B
、Bで示す方向に外力を加えて折り曲げることによって
、第11図及び第12図に示すように、横筋目溝A7に
沿って各棒状絶縁素材板A1ごとにブレイクし、次いで
、この棒状絶縁素材板A1の各絶縁基板1における電極
用突起4の先端部側面4aに、第13図に示すように、
側面電極膜15C用の導電性ペーストをスクリーン印刷
等にて、当該電極用突起4の幅一杯にわたって塗着して
、乾燥することにより、側面電極膜5Cを形成する。
After that, the insulating material plate A is moved to the arrow B in FIG.
, by applying an external force in the direction shown by B and bending, each rod-shaped insulating material plate A1 breaks along the horizontal groove A7, as shown in FIGS. 11 and 12, and then this rod-shaped insulating material As shown in FIG. 13, on the side surface 4a of the tip end of the electrode protrusion 4 on each insulating substrate 1 of the plate A1,
A conductive paste for the side electrode film 15C is applied over the entire width of the electrode protrusion 4 by screen printing or the like, and dried to form the side electrode film 5C.

なお、前記各棒状絶縁素材板A1は、前記側面電極膜5
Cの形成後において、縦筋目溝A6及び横筋目溝A7に
沿って、各絶縁基板1ごとにブレイクされる。
In addition, each rod-shaped insulating material plate A1 is connected to the side electrode film 5.
After forming the grooves C, each insulating substrate 1 is broken along the vertical grooves A6 and the horizontal grooves A7.

そして、前記のように、絶縁素材板Aの上面のうち、各
絶縁基板1における電極用突起4の箇所に、上面電極膜
5a用の導電性ペーストをスクリーン印刷によって塗着
するに際して、本発明は、この上面電極膜5a用の導電
性ペーストを、前記横筋目溝A7を挟んで隣接する二つ
の絶縁基板1の両方における電極用突起4に跨って連続
するように塗着することなく、前記横筋目溝A7の箇所
において分断するようにして塗着するもので、横筋凹溝
A7内には、各絶縁基板1における電極用突起本の上面
に塗着した導電性ペーストが垂れ込むことになるから、
前記横筋目溝A7における満面A7’に塗着形成される
上面電極膜5aは、第8図に示すように、その膜厚さが
横筋目溝A7における最も深い部分に向って次第に薄く
なる形態になる。
As described above, when applying the conductive paste for the upper surface electrode film 5a to the location of the electrode protrusion 4 on each insulating substrate 1 on the upper surface of the insulating material plate A by screen printing, the present invention , without applying the conductive paste for the upper surface electrode film 5a continuously across the electrode protrusions 4 on both of the two adjacent insulating substrates 1 with the horizontal groove A7 in between. This is because the conductive paste applied to the upper surface of the electrode protrusion on each insulating substrate 1 will drip into the transversely grooved groove A7 because it is applied so as to be divided at the groove A7. ,
As shown in FIG. 8, the upper surface electrode film 5a coated and formed on the entire surface A7' of the horizontal groove A7 has a film thickness that gradually becomes thinner toward the deepest part of the horizontal groove A7. Become.

すなわち、本発明によると、横筋目溝A7における満面
A?’に上面電極膜5aを形成することができるもので
ありながら、当該満面A?’における膜厚さを、横筋目
溝A7における最も深い部分に向って次第に薄くなる形
態にすることができ、換言すると、横筋目溝A7におけ
る満面A7’に膜を成形した状態のもとで、前記横筋凹
溝A7内の最深部における部分における膜の厚さを、極
めて薄くすることができるか、或いは、前記横筋凹溝A
7内の最深部に、膜が形成されることを皆無にすること
ができる。
That is, according to the present invention, the full surface A? in the transverse groove A7? Although the upper surface electrode film 5a can be formed on the full surface A? The film thickness at ' can be made to gradually become thinner toward the deepest part in the horizontal groove A7, in other words, under the state where the film is formed on the full surface A7' in the horizontal groove A7, The thickness of the membrane at the deepest part in the transverse groove A7 can be made extremely thin, or
It is possible to completely eliminate the formation of a film in the deepest part of the inside of the 7.

従って、前記横筋目溝A7に沿ってのブレイクに際して
、上面電極膜5aが、前記横筋目溝A7に沿ってのブレ
イクを阻害することを小さくできるから、絶縁素材板へ
を、前記横筋目溝A7に沿ってブレイクすることの作業
性を大幅に向上できると共に、前記絶縁素材板Aが、前
記横筋目溝A7の中心からはずれた箇所においてブレイ
クすることを防止できるのである。
Therefore, when breaking along the horizontal groove A7, the upper surface electrode film 5a can reduce the inhibition of the break along the horizontal groove A7, so that the insulating material plate can be exposed to the horizontal groove A7. The workability of breaking along the groove A7 can be greatly improved, and the insulating material plate A can be prevented from breaking at a location away from the center of the horizontal groove A7.

また、前記のように横筋凹溝A7内の最深部における部
分における膜厚さを、極めて薄く、或いは、零にするこ
とができるから、前記のブレイクに際して、上面電極膜
5aのうち横筋目溝A7における溝面A7’の箇所にお
ける部分が、溝面A7′から禿げ落ちることを防止でき
る。
In addition, since the film thickness at the deepest part of the horizontal groove A7 can be made extremely thin or zero as described above, when the upper electrode film 5a is broken, the horizontal groove A7 of the upper surface electrode film 5a It is possible to prevent a portion of the groove surface A7' from falling off from the groove surface A7'.

その結果、各絶縁基板1における電極用突起4の先端部
側面4aに、側面電極膜5C用の導電性ペーストを塗着
した場合に、横筋目溝A7における満面A?’には、第
13図に示すように、上面に塗着した上面電極膜5a用
の導電性ペーストと、側面に塗着した側面電極膜5C用
の導電性ペーストとの二段重ねの膜を形成することがで
きるから、側面電極膜5Cが、溝面A?’の箇所におい
て部分的に薄くなることを防止できるのである。
As a result, when the conductive paste for the side electrode film 5C is applied to the side surface 4a of the tip end of the electrode protrusion 4 on each insulating substrate 1, the full surface A? ', as shown in FIG. Since the side electrode film 5C can be formed on the groove surface A? It is possible to prevent partial thinning at the point '.

なお、前記実施例は、上面電極膜5a用の導電性ペース
ト及び下面電極膜5b用の導電性ペーストのうち、上面
電極膜5a用の導電性ペーストのみを、横筋目mA1の
箇所で分断するようにして塗着する場合を示したが、本
発明には、これに限らず、絶縁素材板Aを、前記矢印8
.B、の方向とは逆の方向に外力を加えてブレイクする
場合には、下面電極膜5b用の導電性ペーストのみを、
横筋目溝A7の箇所で分断するようにして塗着すれば良
いのであり、勿論、上面電極膜5a用の導電性ペースト
及び下面電極膜5b用の導電性ペーストの両方を、横筋
目溝A7の箇所で分断するようにして塗着しても良いの
である。
In addition, in the above embodiment, of the conductive paste for the upper electrode film 5a and the conductive paste for the lower electrode film 5b, only the conductive paste for the upper electrode film 5a is separated at the horizontal line mA1. However, the present invention is not limited to this, and the insulating material plate A is applied in the direction indicated by the arrow 8.
.. When breaking by applying an external force in the direction opposite to the direction of B, only the conductive paste for the bottom electrode film 5b is applied.
It is sufficient to apply the paste so as to separate it at the horizontal groove A7, and of course, both the conductive paste for the upper electrode film 5a and the conductive paste for the lower electrode film 5b are applied at the horizontal groove A7. It is also possible to apply it by dividing it into parts.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はチップ型可変抵抗器の平面図、第2図は第1図
のn−n視断面図、第3図〜第13図は本発明の実施例
を示す図であり、第3図は絶縁素材板の平面図、第4図
は第3図のIV−IV視広拡大断面図第5図は下面電極
膜用導電性ペーストを塗着したときの平面図、第6図は
第5図のVl−Vl視拡大断面図、第7図は上面電極膜
用導電性ペーストを塗着したときの平面図、第8図は第
7図の■■視拡大断面図、第9図は抵抗膜を塗着したと
きの平面図、第10図は第9図のX−X視拡大断面図、
第11図は棒状絶縁素材板ごとにブレイクしたときの平
面図、第12は第11図のxn−x■視拡大断面図、第
13図は側面電極膜用導電ペースを塗着したときの拡大
断面図、第14図〜第25図は従来の方法を示す図であ
り、第14図は絶縁素材板の平面図、第15図は第14
図のXV−XV視広拡大断面図第16図は下面電極膜を
塗着したときの平面図、第17図は第16図のX■−X
■視広拡大断面図第18図は上面電極膜を塗着したとき
の平面図、第19図は第18図のX■−XIX視拡大断
面図、第20図は抵抗膜を塗着したときの平面図、第2
1図は第20図のXXIXXI視拡大断面図、第22図
は棒状絶縁素材板ごとにブレイクしたときの平面図、第
23図は第22図のxxm−xxm視拡大断面図、第2
4図は第23図の別の断面図、第25図は第22図のx
xv−xxv視拡大断面図である。 1・・・・絶縁基板、3・・・・抵抗膜、4・・・・電
極用突起、5・・・・電極膜、5a・・・・上面電極膜
、5b・・・・下面電極膜、5C・・・・側面電極膜、
6・・・・ロータ部材、A・・・・絶縁素材板、A1・
・・・棒状絶縁素材板、A6.A7・・・・筋目溝。
FIG. 1 is a plan view of a chip type variable resistor, FIG. 2 is a sectional view taken along the line nn in FIG. 1, and FIGS. 3 to 13 are views showing embodiments of the present invention. 4 is a plan view of the insulating material plate, FIG. 4 is a wide enlarged cross-sectional view taken along the line IV-IV in FIG. 3, and FIG. Fig. 7 is a plan view when the conductive paste for the top electrode film is applied, Fig. 8 is an enlarged sectional view of Fig. 7, and Fig. 9 is an enlarged sectional view of the resistor. A plan view when the film is applied, FIG. 10 is an enlarged sectional view taken along line XX in FIG. 9,
Fig. 11 is a plan view when each rod-shaped insulating material plate is broken, Fig. 12 is an enlarged cross-sectional view of xn-x in Fig. 11, and Fig. 13 is an enlarged view when the conductive paste for the side electrode film is applied. 14 to 25 are cross-sectional views showing the conventional method, FIG. 14 is a plan view of the insulating material plate, and FIG.
XV-XV enlarged cross-sectional view in the figure. Figure 16 is a plan view when the bottom electrode film is applied. Figure 17 is X--X in Figure 16.
■ Widely enlarged cross-sectional view Figure 18 is a plan view when the top electrode film is applied, Figure 19 is an enlarged cross-sectional view from X-XIX in Figure 18, and Figure 20 is when the resistive film is applied. Plan view, 2nd
Fig. 1 is an enlarged sectional view of XXIXXI in Fig. 20, Fig. 22 is a plan view when each rod-shaped insulating material plate is broken, Fig. 23 is an enlarged sectional view of xxm-xxm in Fig. 22, and Fig. 2
Figure 4 is another cross-sectional view of Figure 23, and Figure 25 is a cross-sectional view of Figure 22.
It is an enlarged sectional view taken along xv-xxv. DESCRIPTION OF SYMBOLS 1... Insulating substrate, 3... Resistance film, 4... Electrode protrusion, 5... Electrode film, 5a... Top electrode film, 5b... Bottom electrode film. , 5C...side electrode film,
6...Rotor member, A...Insulating material plate, A1...
...rod-shaped insulating material plate, A6. A7...Shime groove.

Claims (1)

【特許請求の範囲】[Claims] (1).多数個の絶縁基板を縦方向及び横方向に複数個
並べた状態の絶縁素材板を、当該絶縁素材板の上面及び
下面に各絶縁基板ごとにブレイクするための断面V型の
筋目溝を設けて形成し、該絶縁素材板における各絶縁基
板の上面及び下面に、上面電極膜用の導電性ペースト及
び下面電極膜用の導電性ペーストを各々塗着し、次いで
、前記絶縁素材板を、筋目溝に沿って棒状の絶縁素材板
にブレイクしたのち、この棒状絶縁素材における各絶縁
基板の側面に、前記上面電極膜と下面電極膜とを繋ぐ側
面電極膜用の導電性ペーストを塗着するようにした電極
膜の形成方法において、前記上面電極膜用の導電性ペー
スト及び下面電極膜用の導電性ペーストのうち、少なく
とも一方における導電性ペーストを、前記筋目溝を挟ん
で隣接する二つの絶縁基板の両方に跨って連続するよう
に塗着することなく、前記筋目溝の箇所において分断す
るようにして塗着することを特徴とする電子部品におけ
る電極膜の形成方法。
(1). An insulating material plate in which a large number of insulating substrates are arranged vertically and horizontally is provided with grooves having a V-shaped cross section for breaking each insulating substrate on the upper and lower surfaces of the insulating material plate. A conductive paste for the upper electrode film and a conductive paste for the lower electrode film are respectively applied to the upper and lower surfaces of each insulating substrate in the insulating material plate, and then the insulating material plate is After breaking into rod-shaped insulating material plates along the rod-shaped insulating material, a conductive paste for the side electrode film connecting the upper electrode film and the lower electrode film is applied to the side surfaces of each insulating substrate in this rod-shaped insulating material. In the method for forming an electrode film, at least one of the conductive paste for the upper electrode film and the conductive paste for the lower electrode film is applied to two adjacent insulating substrates with the groove in between. A method for forming an electrode film in an electronic component, characterized in that the electrode film is applied in a divided manner at the grooves, without being applied continuously over both sides.
JP1027928A 1989-02-07 1989-02-07 Method for forming electrode film in electronic component Expired - Fee Related JPH0748410B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1027928A JPH0748410B2 (en) 1989-02-07 1989-02-07 Method for forming electrode film in electronic component

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1027928A JPH0748410B2 (en) 1989-02-07 1989-02-07 Method for forming electrode film in electronic component

Publications (2)

Publication Number Publication Date
JPH02207501A true JPH02207501A (en) 1990-08-17
JPH0748410B2 JPH0748410B2 (en) 1995-05-24

Family

ID=12234550

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1027928A Expired - Fee Related JPH0748410B2 (en) 1989-02-07 1989-02-07 Method for forming electrode film in electronic component

Country Status (1)

Country Link
JP (1) JPH0748410B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017204500A (en) * 2016-05-09 2017-11-16 Koa株式会社 Chip component and manufacturing method of chip component

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52140857A (en) * 1976-05-19 1977-11-24 Matsushita Electric Industrial Co Ltd Chip resistor element and method of making same
JPS5814505A (en) * 1981-07-17 1983-01-27 松下電器産業株式会社 Method of producing chip resistor
JPS6252917A (en) * 1985-08-30 1987-03-07 株式会社村田製作所 Manufacture of single-plate capacitor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52140857A (en) * 1976-05-19 1977-11-24 Matsushita Electric Industrial Co Ltd Chip resistor element and method of making same
JPS5814505A (en) * 1981-07-17 1983-01-27 松下電器産業株式会社 Method of producing chip resistor
JPS6252917A (en) * 1985-08-30 1987-03-07 株式会社村田製作所 Manufacture of single-plate capacitor

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017204500A (en) * 2016-05-09 2017-11-16 Koa株式会社 Chip component and manufacturing method of chip component

Also Published As

Publication number Publication date
JPH0748410B2 (en) 1995-05-24

Similar Documents

Publication Publication Date Title
JP3945961B2 (en) Circuit board
JP2535441B2 (en) Manufacturing method of chip resistor
JPH0537271A (en) Electrode forming method for chip parts
JPH0653004A (en) Rectangular chip resistor and its manufacture
JP3121325B2 (en) Structure of chip type resistor
JPH08236302A (en) Structure of chip type resistor
JPH09306710A (en) Chip network electronic component
US5691690A (en) Chip type jumper
JPH02264405A (en) Manufacture of multiple chip resistor
JPS6027101A (en) Multistage chip resistor
JPH0748410B2 (en) Method for forming electrode film in electronic component
JPH0547446Y2 (en)
JPH0513201A (en) Square chip resistor
JP3659432B2 (en) Manufacturing method of electronic parts
JP3216373B2 (en) Chip type capacitor network components
JPH04132183A (en) Single in-line type hybrid integrated circuit device and method of fitting terminal lead to prism member thereof
JPH01179389A (en) Manufacture of circuit wiring board
JPH04213801A (en) Module resistor and manufacture thereof
JPH02301725A (en) Soldered terminal
JP2739123B2 (en) Manufacturing method of electronic component mounting board
KR19980054232U (en) Chip Resistor
JPS6235209Y2 (en)
JPH0273608A (en) Manufacture of chip resistor
JPH04199801A (en) Manufacture of positive-characteristic thermistor element
JPH0864472A (en) Manufacture of chip type thick capacitor

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees