JPH0221155B2 - - Google Patents

Info

Publication number
JPH0221155B2
JPH0221155B2 JP18107481A JP18107481A JPH0221155B2 JP H0221155 B2 JPH0221155 B2 JP H0221155B2 JP 18107481 A JP18107481 A JP 18107481A JP 18107481 A JP18107481 A JP 18107481A JP H0221155 B2 JPH0221155 B2 JP H0221155B2
Authority
JP
Japan
Prior art keywords
copper
copper foil
base material
hydrochloric acid
epoxy resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP18107481A
Other languages
Japanese (ja)
Other versions
JPS5884490A (en
Inventor
Takeshi Yamagishi
Kazuyoshi Aso
Takanori Kanamaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Denkai Co Ltd
Original Assignee
Nippon Denkai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Denkai Co Ltd filed Critical Nippon Denkai Co Ltd
Priority to JP18107481A priority Critical patent/JPS5884490A/en
Publication of JPS5884490A publication Critical patent/JPS5884490A/en
Publication of JPH0221155B2 publication Critical patent/JPH0221155B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Laminated Bodies (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

この発明は、芳香族アミン類を硬化剤として用
いる耐熱性エポキシ樹脂基材と、銅箔とを積層し
た耐塩酸性銅張積層板に関するものである。 さて、ガラス・エポキシ樹脂基材と銅箔とから
の銅張積層板の特性は、該基材と使用する硬化剤
との組合わせにより各種特性の積層板が得られる
ことは周知である。そして耐熱性が要求されない
汎用材料を作る場合には、硬化剤としてジ・シア
ンジアミド(DICY)、硬化促進剤にはベンジ
ル・ジメチルアミン(BDMA)、溶剤としてメチ
ルオキシドール、メチルセロソルブなどを配合し
たものが使われ、一方、耐熱性銅張積層板を得る
目的には、ハロゲン化ビスフエノール系基材など
が使われ、硬化剤としては、メタフエニレンジア
ミン(MPD)、ジアミノ・ジフエニルメタン
(DDM)、ジアミノ・ジフエニル・スルホ
(DDS)、3,3′−ジクロル・ジアミノジフエニル
メタンのような一連の芳香族のアミン類が使われ
ている。 さて、エポキシ樹脂基材に銅箔を接着させてな
る積層板を印刷回路に使用する場合は、基材に対
する銅箔の密着性、半田耐熱性、耐シアン性、耐
塩酸性などの諸特性が要求される。ところでエポ
キシ樹脂基材を用い、耐熱性銅張積層板を得るた
めには基材の硬化剤として芳香族系のアミン類が
しばしば使われるが、このような硬化剤を用いる
と、耐塩酸性の劣る銅張積層板を与えるという大
きな欠点があつた。1例を示すと、ジシアン・ジ
アミドを硬化剤とし、ベンジル・ジメチルアミン
を促進剤に、メチルセロソルブを溶剤に用いた通
常のエポキシ樹脂基材に、銅箔粗面を積層して得
た汎用銅張積層板の耐塩酸性(回路巾0.8mmの銅
張積層板試片を試薬塩酸:水=1:1の中に常温
で1時間浸漬後の剥離強度を求めて、これを劣化
率で表わしたものである。)は3〜5%と比較的
劣化が小さいが、耐熱性の臭素化エポキシ樹脂基
材に対し、ジアミノジフエニルスルホン(芳香族
系アミン)を硬化剤とし、三フツ化ホウ素モノエ
チルアミノを促進剤とし、メチルエチルケトンを
溶剤として銅張積層板を作り、上記と同様劣化率
を求めると、その数値は30%またはそれ以上を示
し、回路を緻密として小型となす場合、耐熱性エ
ポキシ樹脂基材の適用が著しく制約されることに
なる。この発明は、芳香族系アミン類を硬化剤と
する耐熱性エポキシ樹脂基材と銅箔粗面または該
面に公知のクロメート処理した銅箔とから耐塩酸
性の良好な銅張積層板を提供できるようなしたも
のである。 本発明者等は、すでに銅箔粗面または該面に公
知のクロメート処理した銅箔面にCu、Fe、Co、
Mn、Crなどの重金属イオンと作用し不活性な金
属錯化合物を形成する公知の重金属不活性化剤の
薄膜を形成させた後、これをエポキシ樹脂基材と
接着して得た銅張積層板が、その耐熱性が良いこ
とを発明し、特願昭56−55595号(特開昭57−
170593号)として出願しているが、このような重
金属不活性化剤の薄膜を、その粗面または該粗面
に形成させた銅箔を、芳香族アミン類を硬化剤と
する耐熱性エポキシ樹脂基材と接着すれば、銅箔
面において熱的または化学的に安定な金属錯化合
物が形成され、経日変化による酸化を防止し、こ
れにより、銅張積層板としての耐塩酸性も改善で
きるのではないかと考え、銅箔粗面または該面に
公知のクロメート処理したものに上記重金属不活
性化剤の薄膜を形成後、芳香族アミン類を硬化剤
とする耐熱性エポキシ樹脂基材と接着させて銅張
積層板を作り、これについて前記したと同様の方
法で、その耐塩酸性を測定してみた、その結果、
3−(N−サリチロイル)アミン−1,2,4−
トリアゾール、N,N′ビス−2−ナフトイルヒ
ドラジン、ビス−3−メトキシ誘導体などの重金
属不活性化剤薄膜の形成が極めて効果のあること
を確認できた。本発明は上記実験結果に基いて、
ここに完成をみたものである。 さらに本発明の説明を続けると、本発明におい
て、銅箔の粗面または該粗面に公知のクロメート
処理したものの面に、本発明の重金属不活性化剤
の薄膜を形成するには、該薬品液に前記銅箔を浸
漬するか、または該薬液でスプレー処理するか、
或いはローラーコーテイングすれば良いが、最も
簡単なのは浸漬法である。また使用する重金属不
活性化剤の濃度は、特に限定の必要はないが、
0.01〜1.0%の範囲のものを用い室温で短時間処
理後、銅箔を乾燥させるだけで良い、また耐熱エ
ポキシ樹脂の硬化剤としては、メタフエニレンジ
アミン、ジアミノ・ジフエニルメタン、ジアミノ
ジフエニルスルホン、3,3′−ジクロルジアミ
ノ・ジフエニルメタンなどいずれかの公知の芳香
族アミンを用いる場合に適用できる。以下、本発
明を実施例により、さらに具体的に説明する。 実施例 銅箔試料として (A) 製箔ロールから剥離した銅箔の粗面を、公知
の硫酸銅浴で電解粗化した32μ厚みの銅箔。 (B) 製箔ロールから剥離した銅箔の粗面に公知の
方法でクロメート処理した32μ厚みの銅箔。 の2種類を用い、試料(A)については3−(N
−サリチロイル)アミノ−1,2,4−トリアゾ
ールの0.1%と0.5%の溶液を、試料(B)につい
ては、N,N′ビス−2−ナフトイルヒドラジン
の0.1%と0.5%の溶液を用い、いずれの場合も、
銅箔をその溶液中に室温で1分間浸漬し、引上げ
て一旦室温で乾燥し、さらに110〜120℃に保持し
た乾燥機を用い、3分間乾燥を行つた。つぎに、
このように処理した銅箔の粗面側を硬化剤として
3,3′−ジクロルジアミノ・ジフエニルメタンを
使用するガラス・臭素化エポキシ樹脂基材と重ね
155℃、圧力100Kg/cm2、30分間の成形条件を採用
して250mm×250mm×2mmの銅張積層板を試作し
た。ついで該積層板の剥離強度、耐塩酸性(回路
巾0.8mmの銅張積層板試片を、試薬塩酸:水=
1:1の中に常温で1時間浸漬後の剥離強度を求
め、これを劣化率で示したもの)および耐シアン
劣化率(回路巾3.2mmの銅張積層板試片を10%の
KCN水溶液中に70℃で30分間浸漬したものの剥
離強度の劣化率で示したものである)を求め、別
にブランク箔からの試作銅張積層板についても上
記と同様の試験を行つてみた。結果は下表に示す
通りである。
The present invention relates to a hydrochloric acid-resistant copper-clad laminate in which a heat-resistant epoxy resin base material using aromatic amines as a curing agent and copper foil are laminated. Now, it is well known that the characteristics of a copper-clad laminate made of a glass epoxy resin base material and copper foil can be obtained by combining the base material and the curing agent used. When making general-purpose materials that do not require heat resistance, use a mixture of dicyandiamide (DICY) as a curing agent, benzyl dimethylamine (BDMA) as a curing accelerator, and methyl oxide, methyl cellosolve, etc. as a solvent. On the other hand, for the purpose of obtaining heat-resistant copper-clad laminates, halogenated bisphenol base materials are used, and as curing agents, metaphenylenediamine (MPD), diamino diphenylmethane (DDM), A series of aromatic amines have been used, such as diamino diphenyl sulfo (DDS) and 3,3'-dichlorodiaminodiphenylmethane. When using a laminate made by adhering copper foil to an epoxy resin base material for printed circuits, various properties are required such as adhesion of the copper foil to the base material, soldering heat resistance, cyanide resistance, and hydrochloric acid resistance. be done. By the way, in order to obtain heat-resistant copper-clad laminates using epoxy resin base materials, aromatic amines are often used as hardeners for the base material, but when such hardeners are used, they have poor hydrochloric acid resistance. A major drawback was that it required copper-clad laminates. One example is general-purpose copper obtained by laminating a rough surface of copper foil on a normal epoxy resin base material using dicyan diamide as a hardening agent, benzyl dimethylamine as an accelerator, and methyl cellosolve as a solvent. Resistance to hydrochloric acid of clad laminates (The peel strength of a copper clad laminate specimen with a circuit width of 0.8 mm was immersed in a reagent of hydrochloric acid:water = 1:1 for 1 hour at room temperature was determined, and this was expressed as a deterioration rate. ) has a relatively small deterioration of 3 to 5%, but when diamino diphenyl sulfone (aromatic amine) is used as a curing agent and boron trifluoride monomer is used as a heat-resistant brominated epoxy resin base material. When a copper-clad laminate is made using ethylamino as an accelerator and methyl ethyl ketone as a solvent, and the deterioration rate is determined in the same manner as above, the value is 30% or more. Application of the resin base material is severely restricted. The present invention can provide a copper-clad laminate with good hydrochloric acid resistance from a heat-resistant epoxy resin base material using an aromatic amine as a curing agent and a copper foil roughened surface or a copper foil subjected to a known chromate treatment on the surface. This is what I did. The present inventors have already discovered that Cu, Fe, Co,
A copper-clad laminate obtained by forming a thin film of a known heavy metal deactivator that acts with heavy metal ions such as Mn and Cr to form an inactive metal complex compound, and then bonding this to an epoxy resin base material. However, he discovered that it has good heat resistance, and published Japanese Patent Application No. 55595 (1983).
No. 170593), a heat-resistant epoxy resin using aromatic amines as a curing agent can be used to coat a thin film of such a heavy metal deactivator on its rough surface or on a copper foil formed on the rough surface. When bonded to the base material, a thermally or chemically stable metal complex is formed on the surface of the copper foil, preventing oxidation due to aging and improving the hydrochloric acid resistance of copper-clad laminates. Thinking that this might be the case, we formed a thin film of the above heavy metal deactivator on the rough surface of copper foil or one that had been subjected to known chromate treatment, and then bonded it to a heat-resistant epoxy resin base material using aromatic amines as a hardening agent. I made a copper-clad laminate using the same methods as described above, and measured its hydrochloric acid resistance.The results were as follows.
3-(N-salicyloyl)amine-1,2,4-
It was confirmed that the formation of a thin film of heavy metal deactivators such as triazole, N,N'bis-2-naphthoylhydrazine, and bis-3-methoxy derivatives was extremely effective. The present invention is based on the above experimental results,
Here you can see it completed. To further explain the present invention, in the present invention, in order to form a thin film of the heavy metal deactivator of the present invention on the rough surface of copper foil or on the surface of the rough surface treated with known chromate, the chemical immersing the copper foil in a liquid or spraying it with the chemical;
Alternatively, roller coating may be used, but the easiest method is dipping. The concentration of the heavy metal deactivator used does not need to be particularly limited, but
It is sufficient to simply dry the copper foil after a short treatment at room temperature using a compound in the range of 0.01 to 1.0%.Also, as a curing agent for heat-resistant epoxy resin, metaphenylenediamine, diamino diphenylmethane, diaminodiphenylsulfone, It can be applied when any known aromatic amine such as 3,3'-dichlorodiamino diphenylmethane is used. EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples. Examples As a copper foil sample (A) A 32μ thick copper foil whose rough surface was electrolytically roughened in a known copper sulfate bath after being peeled off from a foil roll. (B) Copper foil with a thickness of 32 μm that has been subjected to chromate treatment on the rough surface of the copper foil peeled off from the foil roll using a known method. For sample (A), 3-(N
-salicyloyl)amino-1,2,4-triazole with 0.1% and 0.5% solutions and for sample (B) with 0.1% and 0.5% solutions of N,N'bis-2-naphthoylhydrazine. , in any case,
The copper foil was immersed in the solution for 1 minute at room temperature, pulled out and once dried at room temperature, and further dried for 3 minutes using a dryer maintained at 110 to 120°C. next,
The rough side of the copper foil treated in this way is layered with a glass/brominated epoxy resin base material using 3,3'-dichlorodiamino diphenylmethane as a hardening agent.
A 250 mm x 250 mm x 2 mm copper-clad laminate was prototyped using molding conditions of 155°C, pressure of 100 Kg/cm 2 , and 30 minutes. Next, the peel strength and hydrochloric acid resistance of the laminate (a copper-clad laminate sample with a circuit width of 0.8 mm was tested with the reagent hydrochloric acid: water =
The peel strength after immersion in 1:1 solution for 1 hour at room temperature was determined and this was expressed as the deterioration rate) and the cyanogen deterioration resistance (a copper-clad laminate sample with a circuit width of 3.2 mm was immersed in a 10%
The deterioration rate of peel strength after being immersed in a KCN aqueous solution at 70°C for 30 minutes was determined, and a test similar to the above was also conducted on a prototype copper-clad laminate made from blank foil. The results are shown in the table below.

【表】【table】

【表】 表から銅箔の粗面またはクロメート処理した該
銅箔粗面を、本発明の重金属不活性化剤溶液で処
理後、芳香族アミンを硬化剤に用いる耐熱性ガラ
スエポキシ樹脂基材と接合した銅張積層板は、そ
の耐塩酸性について優れた効果を示し、従来のこ
の種耐熱性エポキシ樹脂基材の適用範囲を著しく
拡げ得ることは明白である。また表記しなかつた
が、通常のガラス・エポキシ樹脂基材にジアミノ
ジフエニルスルホンを硬化剤として銅箔粗面と接
合して得た銅張積層板も上記と略々同等の耐塩酸
性能であつた。
[Table] From the table, the rough surface of copper foil or the rough surface of copper foil treated with chromate is treated with the heavy metal deactivator solution of the present invention, and then the heat-resistant glass epoxy resin base material using aromatic amine as a hardening agent is used. It is clear that the bonded copper-clad laminate exhibits excellent hydrochloric acid resistance and can significantly expand the range of application of conventional heat-resistant epoxy resin substrates of this type. Also, although not stated, a copper-clad laminate obtained by bonding a rough surface of copper foil to a normal glass/epoxy resin base material using diaminodiphenylsulfone as a hardening agent also has hydrochloric acid resistance that is almost equivalent to the above. Ta.

Claims (1)

【特許請求の範囲】[Claims] 1 芳香族アミン類を硬化剤として用いる耐熱性
エポキシ樹脂基材面に、予めその粗面またはクロ
メート処理した該粗面に、重金属イオンと作用し
不活性な金属錯化合物を形成する重金属不活性化
剤の薄膜を形成させた銅箔層を設けたことを特徴
とする耐塩酸性銅張積層板。
1. Heavy metal inactivation in which the heat-resistant epoxy resin base material surface using aromatic amines as a curing agent is treated with heavy metal ions to form an inactive metal complex compound on the roughened surface or the roughened surface that has been previously treated with chromate. A hydrochloric acid-resistant copper-clad laminate characterized by having a copper foil layer formed with a thin film of a hydrochloric acid.
JP18107481A 1981-11-13 1981-11-13 Copper-coated laminated board for printed circuit Granted JPS5884490A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18107481A JPS5884490A (en) 1981-11-13 1981-11-13 Copper-coated laminated board for printed circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18107481A JPS5884490A (en) 1981-11-13 1981-11-13 Copper-coated laminated board for printed circuit

Publications (2)

Publication Number Publication Date
JPS5884490A JPS5884490A (en) 1983-05-20
JPH0221155B2 true JPH0221155B2 (en) 1990-05-11

Family

ID=16094344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18107481A Granted JPS5884490A (en) 1981-11-13 1981-11-13 Copper-coated laminated board for printed circuit

Country Status (1)

Country Link
JP (1) JPS5884490A (en)

Also Published As

Publication number Publication date
JPS5884490A (en) 1983-05-20

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