JPH02212364A - Production of ceramic body of aluminum nitride - Google Patents
Production of ceramic body of aluminum nitrideInfo
- Publication number
- JPH02212364A JPH02212364A JP1034646A JP3464689A JPH02212364A JP H02212364 A JPH02212364 A JP H02212364A JP 1034646 A JP1034646 A JP 1034646A JP 3464689 A JP3464689 A JP 3464689A JP H02212364 A JPH02212364 A JP H02212364A
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- powder
- aluminum nitride
- thermal conductivity
- grain size
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Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、銅、銀、銀−パラジウム系、金等と同時焼成
可能で、しかも熱伝導率が高い窒化アルミニウムを主体
とした焼成体の製造方法に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention provides a fired body mainly made of aluminum nitride, which can be fired simultaneously with copper, silver, silver-palladium, gold, etc. and has high thermal conductivity. This relates to a manufacturing method.
エレクトロニクス素子の高集積化がますます進展するに
従って、素子が発生する単位面積あたりの熱量が増大し
ているが、基板の熱伝導率が低いために素子の発生する
熱で素・子の温度が上昇し、素子の機能に障害が生じる
ことが問題になってきており、さらなる高集積化を妨げ
ている。As electronic devices become more and more highly integrated, the amount of heat generated per unit area by the device is increasing, but because the thermal conductivity of the substrate is low, the heat generated by the device causes the temperature of the device to rise. It has become a problem that the increase in the number of semiconductor devices increases and impairs the functionality of devices, which is hindering further integration.
そこで、素子の発生する熱の放散を効率的に行なえる熱
伝導率の高い基板材料が求められており、現在窒化アル
ミニウムが高熱伝導性物質として注目されているが、そ
の焼成には焼結助剤を使用しても1600〜2000℃
の高い温度が必要である。Therefore, there is a need for a substrate material with high thermal conductivity that can efficiently dissipate the heat generated by the device.Currently, aluminum nitride is attracting attention as a highly thermally conductive material, but its firing requires sintering aid. 1600-2000℃ even if using agent
high temperatures are required.
一般に、電子回路は高温で焼結して得られた窒化アルミ
ニウム基板上に、銅、銀、銀−パラジウム系、金等の粉
末のペーストを印刷して配線を形成し、その後配線材料
の融点以下で焼成して配線を焼付け、さらに素子を取り
付けることによって作製される。Generally, electronic circuits are made by printing a powder paste of copper, silver, silver-palladium, gold, etc. on an aluminum nitride substrate obtained by sintering at high temperatures to form wiring, and then below the melting point of the wiring material. It is manufactured by baking the wires, and then attaching the elements.
また、より実装密度の高い多層基板を用いたハイブリッ
ドICを、より効率的に安価に製造するために、低温で
焼成可能なアルミナ−ガラス基板が製造されている。Furthermore, in order to more efficiently and inexpensively manufacture hybrid ICs using multilayer substrates with higher packaging density, alumina-glass substrates that can be fired at low temperatures are being manufactured.
たとえば、アルミナとガラスの粉末を適当なバインダー
等に加えて混合し、ドクターブレード法でグリーンシー
トを作製し、その上に銅、銀、銀−パラジウム系、金等
の粉末のペーストを印刷して配線を形成し、それらの配
線材料が溶融しない温度で焼成し、グリーンシートの焼
成と配線の焼付けとを同時に行なう方法が採用されてい
る。For example, alumina and glass powders are mixed with a suitable binder, etc., a green sheet is made using the doctor blade method, and a powder paste of copper, silver, silver-palladium, gold, etc. is printed on it. A method has been adopted in which wiring is formed and fired at a temperature that does not melt the wiring material, and firing of the green sheet and baking of the wiring are performed simultaneously.
これらの配線材料の中では、融点は銅が最も高< 10
84℃であるから、少なくとも1050℃以下で焼成し
なければならない。Among these wiring materials, copper has the highest melting point < 10
Since the temperature is 84°C, the firing must be at least 1050°C or lower.
ガラスを使用せず、酸化イツトリウムや酸化カルシウム
等の焼結助剤を数%混合して成型した窒化アルミニウム
成形体の上に、金属粉末ペーストで配線を描き、焼成し
て窒化アルミニウムの焼結と配線の焼付けとを同時に行
なうことも可能であるが、焼結温度が1600〜200
0℃の範囲で焼付は可能な金属は、電気抵抗が比較的高
いタングステンかモリブデンに限られる。Wiring is drawn with metal powder paste on the aluminum nitride molded body, which is molded without using glass by mixing a few percent of sintering aids such as yttrium oxide or calcium oxide, and is fired to sinter the aluminum nitride. It is possible to bake the wiring at the same time, but the sintering temperature is 1600-2000℃.
The metals that can be baked in the 0°C range are limited to tungsten and molybdenum, which have relatively high electrical resistance.
〔発明が解決しようとする課題〕
アルミナの焼結体の基板は10〜20W/mに程度の熱
伝導率であるが、低温焼成が可能な同時焼成用のアルミ
ナ−ガラス複合焼成体の熱伝導率はせいぜい311/m
K程度であり、素子からの放熱の問題に充分対応できる
ような熱伝導性を有しているとは言えない。[Problem to be solved by the invention] The thermal conductivity of the alumina sintered body substrate is about 10 to 20 W/m, but the thermal conductivity of the alumina-glass composite fired body for simultaneous firing that can be fired at low temperature is difficult. The rate is at most 311/m
K, and cannot be said to have thermal conductivity sufficient to deal with the problem of heat radiation from the element.
一方、窒化アルミニウムの成形体で同時焼成を行なう場
合は、窒化アルミニウムの熱伝導率が100 W/mに
以上のものが容易に得られるが、その焼成には1600
〜2000℃の高温が必要なため、高温焼成用の高価な
炉と多くのエネルギーとを必要とするだけでなく、配線
材料としてはタングステンまたはモリブデンしか使用で
きず、さらに配線材料の電気抵抗が高いことが問題であ
る。On the other hand, when co-firing aluminum nitride compacts, it is easy to obtain aluminum nitride with a thermal conductivity of 100 W/m or more;
Because it requires a high temperature of ~2000°C, it not only requires an expensive furnace for high-temperature firing and a lot of energy, but also only tungsten or molybdenum can be used as the wiring material, and the electrical resistance of the wiring material is high. That is the problem.
そこで、配線材料として電気抵抗が小さい銅、銀、銀−
パラジウム系、金等を使用するには、その融点以下で焼
成する必要があり、低温でも焼成可能でしかも高い熱伝
導率が得られるものとして、窒化アルミニウム−ガラス
複合体について検討した。Therefore, copper, silver, and silver, which have low electrical resistance, are used as wiring materials.
In order to use palladium-based materials, gold, etc., it is necessary to sinter the material below its melting point, and we investigated an aluminum nitride-glass composite as a material that can be sintered even at low temperatures and has high thermal conductivity.
アルミナより高い熱伝導率を有する窒化アルミニウム粉
末に、1050℃以下で液相を生成するガラス粉末を添
加することにより、低温で焼成可能な窒化アルミニウム
組成物を得ることができるという考えは、すでに特開昭
63−210043号公報に開示されているが、緻密で
しかも高い熱伝導率が安定して得られるものではなかっ
た。The idea that an aluminum nitride composition that can be fired at low temperatures can be obtained by adding glass powder that forms a liquid phase below 1050°C to aluminum nitride powder, which has a higher thermal conductivity than alumina, has already been proposed. Although disclosed in JP-A No. 63-210043, it was not possible to stably obtain dense and high thermal conductivity.
この問題点を解決するために、窒化アルミニウム粉末に
他の熱伝導率の高いセラミック粉末を混合し、それらの
粉末の粒径と焼成体の熱伝導率との関係について研究検
討を重ねた結果、窒化アルミニウム粉末に対して、窒化
ケイ素、炭化ケイ素、窒化ホウ素、アルミナから選ばれ
た少なくとも1種以上で、中心粒径が窒化アルミニウム
粉末の172以下である粉末を混合し、1050℃以下
で液相を生成する低融点物質を焼結助剤として用いて焼
成すると、焼成体の緻密化および熱伝導率の向上に効果
があることを見出した。In order to solve this problem, we mixed aluminum nitride powder with other ceramic powders with high thermal conductivity, and as a result of repeated research and examination on the relationship between the particle size of these powders and the thermal conductivity of the fired body, we found that Aluminum nitride powder is mixed with powder of at least one selected from silicon nitride, silicon carbide, boron nitride, and alumina, whose center particle size is 172 or less than that of the aluminum nitride powder, and the mixture is heated to a liquid phase at 1050°C or less. It has been found that firing using a low melting point substance that produces as a sintering aid is effective in making the fired body denser and improving its thermal conductivity.
一般に、窒化アルミニウムより窒化ケイ素、炭化ケイ素
、窒化ホウ素等の方が細かい粉末が得られやすく、窒化
アルミニウムに対して中心粒径の異なるこれらセラミッ
ク粉末を混合することにより、焼成前の成形体の嵩密度
を高めることができ、それによって緻密でしかも熱伝導
率の高い焼成体を安定して得ることができる。In general, it is easier to obtain fine powders from silicon nitride, silicon carbide, boron nitride, etc. than from aluminum nitride, and by mixing these ceramic powders with different center particle sizes with aluminum nitride, the bulk of the compact before firing can be increased. The density can be increased, and thereby a dense fired body with high thermal conductivity can be stably obtained.
すなわち、本発明は中心粒径が2〜50μmの窒化アル
ミニウム粉末に、中心粒径が該窒化アルミニウム粉末の
中心粒径の172以下の窒化ケイ素、炭化ケイ素、窒化
ホウ素、アルミナから選ばれた少なくとも1種以上の粉
末とガラス粉末とを加え、成形後、焼成することを特徴
とする窒化アルミニウム質セラミック体の製造方法に関
するものである。That is, the present invention provides an aluminum nitride powder having a center particle size of 2 to 50 μm, and at least one selected from silicon nitride, silicon carbide, boron nitride, and alumina, and having a center particle size of 172 or less of the center particle size of the aluminum nitride powder. The present invention relates to a method for manufacturing an aluminum nitride ceramic body, which comprises adding powders of at least one type and a glass powder, molding, and then firing.
本発明によれば、緻密で熱伝導率の高い焼成体を安定し
て得ることができる。According to the present invention, a dense fired body with high thermal conductivity can be stably obtained.
以下、本発明について詳述する。The present invention will be explained in detail below.
高い嵩密度を得るためには、窒化アルミニウム粉末の中
心粒径より小さな中心粒径を持つセラミック粉末を1種
以上部合して用いることが有効である。In order to obtain a high bulk density, it is effective to use a combination of one or more types of ceramic powder having a center particle size smaller than that of the aluminum nitride powder.
ただし、混合するセラミック粉末のうちの最大の中心粒
径が窒化アルミニウム粉末の中心粒径の172より大き
いと緻密化の効果がないので、中心粒径比は172以下
、好ましくは173以下、さらに好ましくは1/4以下
である。However, if the largest center particle size of the ceramic powder to be mixed is larger than the center particle size of the aluminum nitride powder, which is 172, there will be no densification effect, so the center particle size ratio should be 172 or less, preferably 173 or less, and more preferably is less than 1/4.
また、中心粒径の比が172以下であっても、窒化アル
ミニウム粉末の中心粒径が小さすぎると均一な混合が困
難となり、2種以上の異なる中心粒径の粉末を混合した
ことによる成形体嵩密度の向上の効果が得られないこと
がある。In addition, even if the ratio of the center particle sizes is 172 or less, if the center particle size of the aluminum nitride powder is too small, it will be difficult to mix uniformly. The effect of improving bulk density may not be obtained.
また、使用する窒化アルミニウムの粒子が大き過ぎると
、特に数百μmの薄いシート状に成形しようとする場合
、成形が困難になる。Furthermore, if the aluminum nitride particles used are too large, molding becomes difficult, especially when trying to mold the aluminum nitride into a thin sheet of several hundred micrometers.
したがって、使用できる窒化アルミニウム粉末の中心粒
径の範囲は2〜50μm1好ましくは3〜30μm1さ
らに好ましくは5〜20μmである。Therefore, the range of the median particle size of the aluminum nitride powder that can be used is 2 to 50 μm, preferably 3 to 30 μm, and more preferably 5 to 20 μm.
混合するセラミック粉末の窒化アルミニウム粉末に対す
る割合は10〜50重量%、好ましくは20〜40重量
%の範囲である。The proportion of the ceramic powder to be mixed with respect to the aluminum nitride powder is in the range of 10 to 50% by weight, preferably 20 to 40% by weight.
ガラスについては、ホウケイ酸ガラスが用いられるが、
ホウケイ酸鉛ガラスやリン酸系ガラスも用いることがで
きる。As for glass, borosilicate glass is used,
Lead borosilicate glass and phosphate glass can also be used.
例えば、S10.が40〜70重量%、B、0.が5〜
20重量%、^120.が5〜15重量%、MgOが1
〜10重量%、Na、0が1〜5重量%から成る組成の
ものを用いることができる。For example, S10. is 40 to 70% by weight, B, 0. is 5~
20% by weight, ^120. is 5 to 15% by weight, MgO is 1
-10% by weight, and 1 to 5% by weight of Na and 0 can be used.
ガラス粉末の添加量が少なすぎると、焼成時に生成する
液相の量も少ないので緻密化せず、多すぎても熱伝導率
の向上を阻害するので、ガラス粉末の添加量は粉末全体
に対してlO〜70体積%である。If the amount of glass powder added is too small, the amount of liquid phase generated during firing will not be densified, and if it is too large, the improvement of thermal conductivity will be inhibited, so the amount of glass powder added is determined based on the total powder. It is 10 to 70% by volume.
成形体を作製するには、混合粉末に適当なバインダーを
加え、ボールミル等で混合し、スラリーのままドクター
ブレード法でシート状に成形する方法が適用できる。In order to produce a molded body, a method can be applied in which a suitable binder is added to the mixed powder, mixed in a ball mill or the like, and the slurry is molded into a sheet shape using a doctor blade method.
バインダーとしてはポリビニルブチラールやポリメチル
メタクリレート等を用いることができる。As the binder, polyvinyl butyral, polymethyl methacrylate, etc. can be used.
また、湿式ボールミルで生成したスラリーを乾燥させた
り、乾式で混合するなどして得た混合粉末をプレス成形
により成形することもできる。Alternatively, a mixed powder obtained by drying a slurry produced in a wet ball mill or by dry mixing may be molded by press molding.
なお、本発明は成形方法について特に限定するものでは
ない。Note that the present invention does not particularly limit the molding method.
得られた成形体に銅、銀、銀−パラジウム系、金等のペ
ーストで印刷する。The obtained molded body is printed with a paste of copper, silver, silver-palladium, gold, or the like.
印刷方法についても特に限定するものではない。There are no particular limitations on the printing method either.
得られた成形体は、大気中または非酸化性雰囲気中で配
線に用いた材料の融点以下の温度で焼成して窒化アルミ
ニラ・ム焼成体を得る。The obtained compact is fired in air or in a non-oxidizing atmosphere at a temperature below the melting point of the material used for the wiring to obtain an aluminum nitride aluminum fired product.
以下、本発明を実施例により説明するが、本発明はこれ
等に限定されるものではない。EXAMPLES The present invention will be explained below with reference to examples, but the present invention is not limited to these examples.
なお、諸物性の測定は次の装置および方法で行った。The various physical properties were measured using the following equipment and method.
(酸素含有量)
インパルス加熱−赤外線吸収法
装置:堀場製作所 EMGA−2800(粒径分布)
X線透過式沈降法
装置: Micromeritics社 Sedigr
aph 5000BT(熱伝導率)
レーザーフラッシュ法
装置:真空理工 TC−7000型
実施例 1
中心粒径3.1μm1酸素量0.8重量%の窒化アルミ
ニウム粉末に、中心粒径が1.2μmの窒化ケイ素粉末
を、窒化アルミニウム粉末に対して重量比で172の割
合で加え、乾式ボールミルで混合して混合粉末を得た。(Oxygen content) Impulse heating-infrared absorption method device: Horiba, Ltd. EMGA-2800 (particle size distribution) X-ray transmission sedimentation method device: Micromeritics Sedigr
aph 5000BT (thermal conductivity) Laser flash method device: Shinku Riko TC-7000 model Example 1 Silicon nitride with a center particle size of 1.2 μm in aluminum nitride powder with a center particle size of 3.1 μm and an oxygen content of 0.8% by weight The powder was added to the aluminum nitride powder at a weight ratio of 172, and mixed in a dry ball mill to obtain a mixed powder.
該混合粉末に対し、5102−820s 系ガラス粉末
を全体の40体積%になるように混合し、金型で300
にg/cm″の圧力で成形し、さらに1500にg/c
m’のラバープレスを行なった後、950 ℃で30分
焼成して焼成体を得た。To the mixed powder, 5102-820s glass powder was mixed to make up 40% by volume of the total, and the mixture was heated to 300% by volume in a mold.
molded at a pressure of 1,500 g/cm'', and then 1500 g/cm
After performing rubber pressing of m', it was fired at 950°C for 30 minutes to obtain a fired body.
熱伝導率はIOW/mにであった。The thermal conductivity was IOW/m.
実施例 2
中心粒径3;1μm1酸素量0.8重量%の窒化アルミ
ニウム粉末に、中心粒径が0.7μmの窒化ケイ素粉末
を、窒化アルミニウム粉末に対して重量比で172の割
合で加え、乾式ボールミルで混合して混合粉末を得た。Example 2 Center particle size 3: 1 μm Silicon nitride powder with a center particle size of 0.7 μm was added to aluminum nitride powder with an oxygen content of 0.8% by weight at a weight ratio of 172 to the aluminum nitride powder, A mixed powder was obtained by mixing in a dry ball mill.
該混合粉末に対し、Sin、−B、Os系ガラス粉末を
全体の40体積%になるように混合し、実施例1と同様
にして焼成体を得た。A sintered body was obtained in the same manner as in Example 1 by mixing Sin, -B, and Os-based glass powders to the mixed powder in an amount of 40% by volume of the total.
熱伝導率は14W/mKであった。Thermal conductivity was 14 W/mK.
実施例 3
中心粒径5.0μm1酸素量0.7重量%の窒化アルミ
ニウム粉末60重量部に、中心粒径0.3μmの炭化ケ
イ素粉末を40重量部の割合で加え、湿式ボールミルで
混合した。Example 3 40 parts by weight of silicon carbide powder having a center particle size of 0.3 μm was added to 60 parts by weight of aluminum nitride powder having a center particle size of 5.0 μm and an oxygen content of 0.7% by weight, and mixed in a wet ball mill.
該混合粉末に対し、Sl[12−Bz[13系ガラス粉
末を全体の50体積%になるように混合し、実施例1と
同様にして焼成体を得た。To the mixed powder, Sl[12-Bz[13-based glass powder was mixed in an amount of 50% by volume of the total powder, and a fired body was obtained in the same manner as in Example 1.
熱伝導率は21W/mにであった。The thermal conductivity was 21 W/m.
実施例 4
中心粒径5.0μm1酸素量0.7重量%の窒化アルミ
ニウム粉末に、中心粒径1.8μmのアルミナ粉末を2
:1の重量比で加えて混合粉末を得た。Example 4 Two alumina powders with a center particle size of 1.8 μm were added to aluminum nitride powder with a center particle size of 5.0 μm and an oxygen content of 0.7% by weight.
:1 weight ratio was added to obtain a mixed powder.
該混合粉末に対し、5i02−820.系ガラス粉末を
全体の50体積%になるように混合し、バインダとして
はポリビニルブチラールを用い、トリクレン−エタノー
ル混合溶媒系で湿式ボールミルにより混合した。5i02-820. Glass powders were mixed in an amount of 50% by volume of the total, polyvinyl butyral was used as a binder, and mixed in a wet ball mill in a trichlene-ethanol mixed solvent system.
得られたスラリーをドクターブレード法によりシートに
成形し、−辺2インチの正方形に金型で打抜いた後、9
50 ℃で30分焼成した。The obtained slurry was formed into a sheet by the doctor blade method, and after punching it into a square with a side of 2 inches using a die,
It was baked at 50°C for 30 minutes.
熱伝導率は911/mKであった。The thermal conductivity was 911/mK.
比較例 1
中心粒径3.1μm1酸素量0.8重量%の窒化アルミ
ニウム粉末60重量部に、中心粒径2.2μmの窒化ケ
イ素粉末を40重量部の割合で加え、湿式ボールミルで
混合した。Comparative Example 1 40 parts by weight of silicon nitride powder having a center particle size of 2.2 μm was added to 60 parts by weight of aluminum nitride powder having a center particle size of 3.1 μm and an oxygen content of 0.8% by weight, and mixed in a wet ball mill.
該混合粉末に対し、SiO□−B203 系ガラス粉末
を全体の50体積%になるように混合し、実施例1と同
様にして焼成体を得た。A sintered body was obtained in the same manner as in Example 1 by adding SiO□-B203 glass powder to the mixed powder in an amount of 50% by volume.
熱伝導率は5W/mKであった。Thermal conductivity was 5 W/mK.
比較例 2
中心粒径1.5μm1酸素量0゜9重量%の窒化アルミ
ニウム粉末に、中心粒径1.5μmの窒化ケイ素を1:
1の重量比で加え、乾式ボールミルで混合した。Comparative Example 2 One part of silicon nitride with a center particle size of 1.5 μm was added to aluminum nitride powder with a center particle size of 1.5 μm and an oxygen content of 0°9% by weight.
They were added at a weight ratio of 1:1 and mixed using a dry ball mill.
該混合粉末に対し、5i02−820.系ガラス粉末を
全体の50体積%になるように混合し、実施例1と同様
にして焼成体を得た。5i02-820. A sintered body was obtained in the same manner as in Example 1 by mixing the glass powders in an amount of 50% by volume of the total.
熱伝導率は2W/mにであった。The thermal conductivity was 2 W/m.
比較例 3
中心粒径1.5μm1酸素量0.7重量%の窒化アルミ
ニウム粉末に、中心粒径1.5μmの窒化ケイ素を1:
1の重量比で加え、乾式ボールミルで混合した。Comparative Example 3 One part of silicon nitride with a center particle size of 1.5 μm was added to aluminum nitride powder with a center particle size of 1.5 μm and an oxygen content of 0.7% by weight.
They were added at a weight ratio of 1:1 and mixed using a dry ball mill.
該混合粉末に対し、5i02−820+ 系ガラス粉末
を全体の50体積%になるように混合し、実施例1と同
様にして焼成体を得た。A 5i02-820+ type glass powder was mixed with the mixed powder so as to account for 50% by volume of the total powder, and a fired body was obtained in the same manner as in Example 1.
熱伝導率は4W/mKであった。The thermal conductivity was 4 W/mK.
比較例 4
中心粒径1.5μm1酸素量0.9重量%の窒化アルミ
ニウム粉末に、5102−820s系ガラス粉末を全体
の50体積%になるように混合し、実施例1と同様にし
て焼成体を得た。Comparative Example 4 5102-820S glass powder was mixed with aluminum nitride powder having a center particle diameter of 1.5 μm and an oxygen content of 0.9% by weight to make it 50% by volume of the whole, and a fired body was prepared in the same manner as in Example 1. I got it.
熱伝導率は2W/mKであった。Thermal conductivity was 2W/mK.
本発明によれば、銅、銀、銀−パラジウム系、金等と同
時焼成可能で、1050℃以下の低温で焼成することが
でき、しかも従来のアルミナ−ガラス基板の熱伝導率3
W/mKよりかなり高い熱伝導率を持った、窒化アルミ
ニウムを主体としたセラミック焼成体を得ることができ
る。According to the present invention, it is possible to co-fire with copper, silver, silver-palladium, gold, etc., and it can be fired at a low temperature of 1050°C or less, and the thermal conductivity of the conventional alumina-glass substrate is 3
It is possible to obtain a fired ceramic body mainly composed of aluminum nitride, which has a thermal conductivity considerably higher than W/mK.
Claims (1)
中心粒径が該窒化アルミニウム粉末の中心粒径の1/2
以下の窒化ケイ素、炭化ケイ素、窒化ホウ素、アルミナ
から選ばれた少なくとも1種以上の粉末とガラス粉末と
を加え、成形後、焼成することを特徴とする窒化アルミ
ニウム質セラミック体の製造方法。Aluminum nitride powder with a center particle size of 2 to 50 μm,
The center particle size is 1/2 of the center particle size of the aluminum nitride powder.
A method for producing an aluminum nitride ceramic body, which comprises adding glass powder and at least one powder selected from the following silicon nitride, silicon carbide, boron nitride, and alumina, molding, and then firing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1034646A JPH02212364A (en) | 1989-02-13 | 1989-02-13 | Production of ceramic body of aluminum nitride |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1034646A JPH02212364A (en) | 1989-02-13 | 1989-02-13 | Production of ceramic body of aluminum nitride |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02212364A true JPH02212364A (en) | 1990-08-23 |
Family
ID=12420204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1034646A Pending JPH02212364A (en) | 1989-02-13 | 1989-02-13 | Production of ceramic body of aluminum nitride |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02212364A (en) |
-
1989
- 1989-02-13 JP JP1034646A patent/JPH02212364A/en active Pending
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