JPH02214536A - Liquid raw material vaporization device - Google Patents
Liquid raw material vaporization deviceInfo
- Publication number
- JPH02214536A JPH02214536A JP3459489A JP3459489A JPH02214536A JP H02214536 A JPH02214536 A JP H02214536A JP 3459489 A JP3459489 A JP 3459489A JP 3459489 A JP3459489 A JP 3459489A JP H02214536 A JPH02214536 A JP H02214536A
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- liquid raw
- flow rate
- vaporization tank
- control valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000008016 vaporization Effects 0.000 title claims abstract description 36
- 239000007788 liquid Substances 0.000 title claims abstract description 34
- 238000009834 vaporization Methods 0.000 title claims abstract description 33
- 239000002994 raw material Substances 0.000 title claims abstract description 30
- 238000000034 method Methods 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract 3
- 238000001947 vapour-phase growth Methods 0.000 abstract 3
- 239000007789 gas Substances 0.000 description 10
- 239000012159 carrier gas Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 239000000428 dust Substances 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、化学的気相成長法（以下、ＣＶＤ法という）
において用いられる液体原料を気化する装置に関する。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to a chemical vapor deposition method (hereinafter referred to as CVD method)
The present invention relates to an apparatus for vaporizing liquid raw materials used in
（従来の技術）
ＣＶＤ法において用いられる液体原料を気化する一般的
な方法としてバブラー法があるが、最近は特に気化装置
を用いる気運にあり様々な気化装置が世に出されるよう
になった。(Prior Art) The bubbler method is a common method for vaporizing liquid raw materials used in the CVD method, but recently there has been a trend to use vaporizers, and various vaporizers have come on the market.
しかし、これらの装置は液体原料を気化槽まで輸送する
方法として、配管の途中に゛流面制御弁を設け、流量制
御された液体が配管によって気化槽まで輸送されている
のが瑛状である。However, in order to transport the liquid raw material to the vaporization tank, these devices are equipped with a flow control valve in the middle of the piping, and the flow rate of the liquid is controlled and transported to the vaporization tank through the piping. .
制御弁と気化槽とは配管でつながれ、その継ぎ目は溶接
や継手が使用される。The control valve and vaporization tank are connected by piping, and welding or joints are used for the joints.
この場合、制御弁の弁から気化槽の内壁面までの内容積
（以下、内容積という）は以外と大きいものである。こ
のため特に液体原料の流量が微小な場合、液体原料がこ
の内容積を通過する時間は無視できない程長い時間とな
る。In this case, the internal volume from the control valve to the inner wall surface of the vaporization tank (hereinafter referred to as internal volume) is much larger. Therefore, especially when the flow rate of the liquid raw material is minute, the time it takes for the liquid raw material to pass through this internal volume is so long that it cannot be ignored.
また、液体原料が制御弁で減圧されると、液体原料は下
流に向って発泡し易くなり、液体は泡を含むようになる
。この現象によって制御弁から気化槽までの配管中の液
体の流れは脈動し、気化槽には液体と気体が交互に供給
されることになり、一定流量の液体原料を気化槽に供給
できない欠点がある。Further, when the pressure of the liquid raw material is reduced by the control valve, the liquid raw material tends to foam toward the downstream, and the liquid comes to contain bubbles. This phenomenon causes the flow of liquid in the piping from the control valve to the vaporization tank to pulsate, causing liquid and gas to be alternately supplied to the vaporization tank, which has the disadvantage that a constant flow rate of liquid raw material cannot be supplied to the vaporization tank. be.
この現象は内容積が大きい程著しくなる。This phenomenon becomes more pronounced as the internal volume increases.
（解決しようとする問題点）
本発明は、上記の欠点を除去し、たとえ微小流量でも気
化槽に一定流間の液体原料を供給できる液体原料気化装
置を提供しようとするものである。(Problems to be Solved) The present invention aims to eliminate the above-mentioned drawbacks and provide a liquid raw material vaporizing device that can supply a constant flow of liquid raw material to a vaporization tank even at a minute flow rate.
（問題を解決するための手段）
本発明は、制御弁と気化槽までの間に配管、継手等を使
用せずに、気化槽本体に制御弁を造り込んで一体化した
ものである。(Means for Solving the Problem) The present invention integrates the control valve into the vaporization tank main body without using any pipes, joints, etc. between the control valve and the vaporization tank.
このため内容積が極めて小さく、たとえ微小な流量であ
っても、液体原料が内容積を通過する時間を無視できる
ため、一定流量の液体原料を気化槽に供給することがで
きる。Therefore, the internal volume is extremely small, and even if the flow rate is minute, the time it takes for the liquid raw material to pass through the internal volume can be ignored, so a constant flow rate of the liquid raw material can be supplied to the vaporization tank.
第１図は本発明の一実施例の断面図である。FIG. 1 is a sectional view of an embodiment of the present invention.
本発明を第１図にしたがって詳細に説明する。The present invention will be explained in detail with reference to FIG.
制御弁３は気化槽１に造り込んで一体化しである。した
がって、配管の必要はない。The control valve 3 is integrated into the vaporization tank 1. Therefore, there is no need for piping.
液体原料はこの制御弁３で流量制御されて直ちに気化槽
に入り、発熱体２で加熱された気化槽内で気化される。The liquid raw material is flow-controlled by the control valve 3 and immediately enters the vaporization tank, where it is vaporized in the vaporization tank heated by the heating element 2.
気化槽と発熱体部は二重管になっている。The vaporization tank and heating element are double piped.
一方、キャリアガスは予備加熱されたのち、キャリアガ
ス導入口Ａから気化槽１に入り、原料気体を供なって混
合ガス導出口Ｂから導出され、ＣＶＤ反応室に入る。On the other hand, after being preheated, the carrier gas enters the vaporization tank 1 through the carrier gas inlet A, is led out through the mixed gas outlet B together with the raw material gas, and enters the CVD reaction chamber.
本発明は第２図に示すような構造の気化装置にしてもよ
い。The present invention may be applied to a vaporizer having a structure as shown in FIG.
制御弁８は気化槽６の底部に造り込んで一体化しである
。The control valve 8 is integrated into the bottom of the vaporization tank 6.
液体原料はこの制御弁８で流量制御されて直ちに気化槽
に入り、発熱体７で加熱された気化槽内で気化される。The liquid raw material is flow-controlled by the control valve 8 and immediately enters the vaporization tank, where it is vaporized in the vaporization tank heated by the heating element 7.
一方、キレリアガスはキャリアガス導入口Ｃから入り発
熱体で予備加熱されたのち気化槽に入り原料気体を供な
って混合ガス導出口りから導出され、ＣＶＤ反応室に入
る。On the other hand, the Kyrelia gas enters from the carrier gas inlet C, is preheated by a heating element, enters the vaporization tank, is supplied with raw material gas, is led out from the mixed gas outlet, and enters the CVD reaction chamber.
複数の液体原料を気化槽に供給する場合は、制御弁を複
数個設ければよい。When a plurality of liquid raw materials are supplied to the vaporization tank, a plurality of control valves may be provided.
以上のような液体原料気化装置を用いることによって微
少流量の液体原料を一定流量で気化槽に供給することが
できる。By using the liquid raw material vaporization device as described above, a minute flow rate of the liquid raw material can be supplied to the vaporization tank at a constant flow rate.
（発明の効果）
本発明によれば、ＣＶＤ法において用いられる液体原料
を、殊に微小流量の液体原料を一定流量で気化槽に供給
できる特徴がある。(Effects of the Invention) According to the present invention, the liquid raw material used in the CVD method, especially the liquid raw material at a minute flow rate, can be supplied to the vaporization tank at a constant flow rate.
また、配管、継手等がないため、液体原料が汚染された
り、原料成分の酸化物のようなダストが発生しにくい特
徴がある。In addition, since there are no piping, joints, etc., the liquid raw material is less likely to be contaminated and dust such as oxides of raw material components is less likely to be generated.
第１図は本発明の一実施例の断面図である。
図において、１は気化槽、２は発熱体、３は制御弁、４
はキャリアガス導入管、５は混合ガス導出管である。
また、Ａはキャリアガス導入口、Ｂは混合ガス導出口で
ある。
第２図は本発明の他の一実施例の断面図である。
図において、６は気化槽、７は発熱体、８は制御弁、９
はキャリアガス導入管、１０は混合ガス導出管である。
また、Ｃはキャリアガス導入口、Ｄは混合ガス導出口で
ある。
％１ 国FIG. 1 is a sectional view of an embodiment of the present invention. In the figure, 1 is a vaporization tank, 2 is a heating element, 3 is a control valve, and 4
5 is a carrier gas inlet pipe, and 5 is a mixed gas outlet pipe. Further, A is a carrier gas inlet, and B is a mixed gas outlet. FIG. 2 is a sectional view of another embodiment of the present invention. In the figure, 6 is a vaporization tank, 7 is a heating element, 8 is a control valve, 9
1 is a carrier gas inlet pipe, and 10 is a mixed gas outlet pipe. Further, C is a carrier gas inlet, and D is a mixed gas outlet. %1 country
Claims (1)
ＣＶＤ用液体原料気化装置。A liquid raw material vaporization device for CVD, characterized in that a liquid flow rate control valve is integrated into a vaporization tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3459489A JPH02214536A (en) | 1989-02-14 | 1989-02-14 | Liquid raw material vaporization device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3459489A JPH02214536A (en) | 1989-02-14 | 1989-02-14 | Liquid raw material vaporization device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02214536A true JPH02214536A (en) | 1990-08-27 |
Family
ID=12418657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3459489A Pending JPH02214536A (en) | 1989-02-14 | 1989-02-14 | Liquid raw material vaporization device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02214536A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001247969A (en) * | 1999-11-08 | 2001-09-14 | Joint Industrial Processors For Electronics | Apparatus of feeding liquid to cvd chamber |
| JP2002173777A (en) * | 2000-12-01 | 2002-06-21 | C Bui Res:Kk | Metal liquid vaporization unit and vaporization method for CVD apparatus |
| JP2011072894A (en) * | 2009-09-30 | 2011-04-14 | Chino Corp | Evaporator |
| JP2011124457A (en) * | 2009-12-14 | 2011-06-23 | Mitsubishi Electric Corp | Solder bonding device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6010674U (en) * | 1983-06-30 | 1985-01-24 | 菱本 信夫 | golf club grip |
-
1989
- 1989-02-14 JP JP3459489A patent/JPH02214536A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6010674U (en) * | 1983-06-30 | 1985-01-24 | 菱本 信夫 | golf club grip |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001247969A (en) * | 1999-11-08 | 2001-09-14 | Joint Industrial Processors For Electronics | Apparatus of feeding liquid to cvd chamber |
| JP2002173777A (en) * | 2000-12-01 | 2002-06-21 | C Bui Res:Kk | Metal liquid vaporization unit and vaporization method for CVD apparatus |
| JP2011072894A (en) * | 2009-09-30 | 2011-04-14 | Chino Corp | Evaporator |
| JP2011124457A (en) * | 2009-12-14 | 2011-06-23 | Mitsubishi Electric Corp | Solder bonding device |
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