JPH02215599A - Substrate for lithographic printing plate - Google Patents

Substrate for lithographic printing plate

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Publication number
JPH02215599A
JPH02215599A JP3607989A JP3607989A JPH02215599A JP H02215599 A JPH02215599 A JP H02215599A JP 3607989 A JP3607989 A JP 3607989A JP 3607989 A JP3607989 A JP 3607989A JP H02215599 A JPH02215599 A JP H02215599A
Authority
JP
Japan
Prior art keywords
approximately
lithographic printing
printing plate
oxide film
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3607989A
Other languages
Japanese (ja)
Inventor
Tsuyoshi Katsumata
堅 勝又
Shinichi Iizuka
伸一 飯塚
Takehiko Watanabe
剛彦 渡辺
Tetsuji Iwama
岩間 哲治
Hisaki Osada
長田 悠樹
Koji Kondo
近藤 耕二
Shinichi Tanaka
慎一 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
MA Aluminum Corp
Original Assignee
Mitsubishi Aluminum Co Ltd
Mitsubishi Kasei Corp
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Aluminum Co Ltd, Mitsubishi Kasei Corp, Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Aluminum Co Ltd
Priority to JP3607989A priority Critical patent/JPH02215599A/en
Publication of JPH02215599A publication Critical patent/JPH02215599A/en
Pending legal-status Critical Current

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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】[Detailed description of the invention] 【産業上の利用分野】[Industrial application field]

本発明は、平版印刷版用支持体に関するものである。 CM明め背景】 平版印刷版にはアルミニウム又はアルミニウム合金(以
下、アルミニウム合金)板上に感光性組成物を塗布した
所謂28版があるが、アルミニウム合金を印刷用に供す
る場合、保水性及び感光剤との密着性を向上させる為に
、特開昭48−45303号公報、特開昭57−203
593号公報、特開昭58−55572号公報、特開昭
61−51896号公報、特開昭61−233590号
公報、特開昭62−27191号公報に記載されている
ように、先ずアルミニウム合金表面を機械的方法、化学
的方法、電気化学的方法のいずれか一つ又は二つ以上組
合わせた工程により粗面化した後、通常所定の後処理(
陽極酸化処理等)を施して、印刷特性を更に向上させて
いる。 尚、このPS版は、通常、露光、現像、修正、ガム引き
工程を施して平版印刷版とされ、これを印刷機に取り付
けて印刷されている。 そして、アルミニウム合金としては、例えばJIS^1
050、^1100、^3003に相当するものが用い
られている。 特に、電気化学的な方法、すなわち交流電解エツチング
処理によってアルミニウム合金表面を粗面化する場合、
Fe、 Si%Zn、 Cu、 Mg、 Mnといった
不純物元素の少ない^1050相当材は、印刷版におい
て重要な条件である表面処理性が良好であり、かつ粗面
化後の凹凸(電解エツチングビットパターン)の均一性
があることから望ましいと言われてきた。 しかしながら、近年、28版製造コスト低減の為に種々
のアルミニウム合企材、製造方法が提案されているが、
必ずしも印刷汚れ及び耐刷力という点からは満足できる
ものではない。 そこで、薄肉強靭化によるアルミニウム合金の耐力の向
上を目的として種々のAl−Hg系、^i’−Mg−S
i系、へf−Hn系等のアルミニウムが、特開昭58−
42745号公報、特開昭58−1048号公報、特開
昭59−133355号公報、特開昭59−22039
5号公報、特開昭60−63346号公報、特開昭61
−26746号公報、特開昭63−30294号公報等
示す如く提案されている。 しかるに、これらの提案になるアルミニウム合金は、従
来の^1050材と比較してアルミニウム合金の耐力及
び耐疲労強度を大[11に向上させ、取扱い時の耐折れ
性、印刷時の版の耐伸び性、及び薄肉化の向上が得られ
るものの、電解エツチングビットパターンが不均一とな
り易く、印刷汚れといった印刷特性を低下させる問題点
がある。 又、特公昭61−60798号公報等で提案されている
ように、約20〜80μ簡のアルミニウムシートと紙と
熱可塑性樹脂とを積層一体止した複合材の外面側に所定
の後処理を施こしている例もある。 この場合も、■粗面の均一性、及び通常の湿式の表面処
理では複合材の接着界面に悪影響を及ぼす為、特殊な装
置で陽極酸化する等の工夫が必要であり、又、■1万枚
前後以上の耐刷性を必要とする印刷分野での耐刷性に欠
ける、■アルミニウムの省資源を目的とした割には紙若
しくは有機樹脂費、接着刑責及び複合化工程に要する費
用が大きく、コストメリットが少ない、さらには■複合
材の接着面がはがれやすいといった欠点がある。 又、従来の後処理方法である陽極酸化処理では、両面印
刷が可能な平版印刷版用材の製造にあたって、■設備の
改造若しくは新設等による製造原価のアップ、■処理時
のアルミニウム合金材の板幅、電流分布等によって、両
面に均一な陽極酸化皮膜を生成することがむずかしい、
■アルミニウム合金材の裏面にプロセスロール等に付着
している異物による擦り傷等の表面欠陥が発生し易い、
■アルミニウム合金材の裏面に陽極酸化時の溶解反応ガ
ス(112ガス等)の泡だまりができて、処理面が不均
一になる、0表面処理後加熱すると皮膜にひび割れが発
生し、印刷汚れ等の原因となるといった欠点がある。 加えて、特開昭62−196190号公報に明示されて
いる如く、従来の粗面化法であるポールグレイン、ワイ
ヤーグレイン、ブラシダレイン、液体ホーニング等の機
械的粗面化、電気化学的粗面化、化学的粗面化及び上記
の複合粗面化等では、品質安定性(印刷汚れ、耐刷力)
、生産性、製造コスト面のいずれかが必しも満足されて
いない。
The present invention relates to a support for a lithographic printing plate. CM Lighting Background] There is a so-called 28 lithographic printing plate in which a photosensitive composition is coated on an aluminum or aluminum alloy (hereinafter referred to as aluminum alloy) plate, but when using aluminum alloy for printing, water retention and photosensitive In order to improve the adhesion with the agent, JP-A-48-45303 and JP-A-57-203 are used.
As described in JP-A-593, JP-A-58-55572, JP-A-61-51896, JP-A-61-233590, and JP-A-62-27191, aluminum alloy After the surface is roughened by one or a combination of mechanical, chemical, and electrochemical methods, a predetermined post-treatment (
Anodizing treatment, etc.) is applied to further improve printing characteristics. Note that this PS plate is usually subjected to exposure, development, correction, and gumming steps to form a lithographic printing plate, which is attached to a printing machine and printed. As an aluminum alloy, for example, JIS^1
Those corresponding to 050, ^1100, and ^3003 are used. In particular, when roughening the aluminum alloy surface by an electrochemical method, that is, AC electrolytic etching treatment,
^1050 equivalent materials with low impurity elements such as Fe, Si%Zn, Cu, Mg, and Mn have good surface treatability, which is an important condition for printing plates, and have good surface roughness after roughening (electrolytic etching bit pattern). ) has been said to be desirable because of its uniformity. However, in recent years, various aluminum composite materials and manufacturing methods have been proposed to reduce the manufacturing cost of 28th edition.
This is not necessarily satisfactory in terms of printing stains and printing durability. Therefore, with the aim of improving the yield strength of aluminum alloys by making them thinner and tougher, various Al-Hg series, ^i'-Mg-S
I-series, f-Hn-series, etc. aluminum has been
42745, JP 58-1048, JP 59-133355, JP 59-22039
5, JP-A-60-63346, JP-A-61
This method has been proposed as shown in Japanese Patent Application Laid-open No. 26746, Japanese Patent Application Laid-Open No. 63-30294, etc. However, compared to the conventional ^1050 material, these proposed aluminum alloys have greatly improved the yield strength and fatigue strength of the aluminum alloy to [11], and have improved bending resistance during handling and plate elongation resistance during printing. Although improvements in properties and thinning can be obtained, the electrolytically etched bit pattern tends to be non-uniform, and there are problems such as printing stains, which deteriorate printing properties. Furthermore, as proposed in Japanese Patent Publication No. 61-60798, etc., a predetermined post-treatment is applied to the outer surface of a composite material made by laminating and bonding an aluminum sheet of about 20 to 80 μm, paper, and thermoplastic resin together. There are also cases where it is being strained. In this case as well, ■ The uniformity of the rough surface and the adhesive interface of the composite material are adversely affected by normal wet surface treatment, so it is necessary to take measures such as anodizing with special equipment, and ■ Lack of printing durability in the printing field, which requires printing durability of around 100 sheets or more; ■Despite the purpose of saving aluminum resources, the cost of paper or organic resin, adhesive bonding, and compounding process is high. It is large, has little cost advantage, and also has the disadvantages of 1. The adhesive surface of the composite material peels off easily. In addition, with anodizing treatment, which is a conventional post-processing method, when manufacturing lithographic printing plate materials that can be printed on both sides, there are two issues: (1) increased manufacturing costs due to equipment modification or new installation, and (2) increased plate width of aluminum alloy materials during processing. , it is difficult to produce a uniform anodic oxide film on both sides due to current distribution, etc.
■Surface defects such as scratches are likely to occur on the back side of aluminum alloy materials due to foreign objects attached to process rolls, etc.
■Bubble pools of dissolved reaction gas (112 gas, etc.) during anodization are formed on the back side of aluminum alloy materials, making the treated surface uneven. If heated after surface treatment, cracks will occur in the film, causing printing stains, etc. It has the disadvantage that it can cause In addition, as clearly disclosed in JP-A No. 62-196190, conventional surface roughening methods such as pole grain, wire grain, brush dale, liquid honing, etc., and electrochemical roughening are available. Surface roughening, chemical roughening, and the above-mentioned composite roughening, etc., have a negative impact on quality stability (printing stains, printing durability).
, productivity, and manufacturing cost are not always satisfied.

【発明の開示】[Disclosure of the invention]

本発明者は、前記の問題点に対する研究を鋭意押し進め
た結果、すなわちアルミニウム合金の両面を所定の粗面
化方法によって粗面にした面に、水和酸化処理を施して
得た平版印刷版用支持体の特性を調査したところ、水和
酸化皮膜を付与した場合は、表面処理性及び経済性が陽
極酸化皮膜を付与した平版印刷版用支持体に比べると優
れていることに気付き、さらに検討を加えた結果、水和
酸化処理を施した場合の欠点は、T版印刷版の非直1象
部には感光剤中に含まれる物質が金属間化合物部及びそ
の周辺部における水和酸化皮膜の欠陥部に不可逆的に吸
着し、非画像部に点状のインク汚れが発生し易いことで
あることを見出した。 本発明は上記の知見を基にしてなされたものであり、開
口径約0.05〜0.2μ慣のミクロピットを有する付
着量約0.4〜0.8g/m”の水和酸化皮膜が設けら
れたアルミニウム合金板が加熱調質されてなる平版印刷
版用支持体を提供するものである。 尚、上記の平版印刷版用支持体において、中心線平均粗
さ(lla)が約0.4〜0.8μst、最大粗さ(R
max)が約3〜8μm1粗さ曲線の中心線から1μm
下の線と交差する山の数が約50〜85個72.5mm
の粗面としたアルミニウム合金板の表面に、開口径約0
.05〜0.2μmのミクロピットを有する付着量約0
.4〜0.8g/*”の水和酸化皮膜が設けられ、これ
が加熱調質されてなるもの、さらには厚さ約50〜30
071mのアルミニウム合金の冷間圧延板の少なくとも
一面が略球状の投射材を用いた所定の投射速度、投射密
度にてショツトブラストして中心線平均粗さ(Ra)が
約0.4〜0.8.czm、最大粗さ(Rmax)が約
3〜8μm、粗さ曲線の中心線から1μm下の線と交差
する山の数が約50〜85個72.5m−の粗面とされ
、その粗面に開口径約0.05〜O,ZJiybのミク
ロピットを存する付着量約0.4〜0.8g/m2の水
和酸化皮膜が形成され、これが加熱調質されてなるもの
が望ましい。 ところで、平版印刷版用支持体においては、アルミニウ
ム合金板として、通常、材質^1050あるいは^11
00相当材が用いられ、調質は旧8.1116にされて
いる。又、厚さは約240ないしは300μ鴎の板が用
いられている。この場合、電気・化学的粗面化では平面
性において問題はないが、ショツトブラストの際にはア
ルミニウム合金板が変形したり歪を持ちやすく、支持体
の寸法安定性に支障をきたし務い問題がある。 しかるに、本発明によれば、厚さ50〜300μmのア
ルミニウム合金板でも、寸法安定性を損なうことなく、
平面性が良く、すなわちアルミニウム合金板に印刷適性
を付与すると同時に表面処理時の歪や変形がない。 すなわち、本発明において用いられる冷間圧嘱アルミニ
ウム合金板は、冷間圧延後に通常行われる調質焼鈍がな
されていない状態のものを指し、調質H1nといっなも
のである。 このアルミニウム合金板としては、純アルミ系のほか、
アルミニウムーマグネシウム合金、アルミニウムーマン
ガン合金などを用いることができる。 そして、■加熱調質後の支持体の耐力が18Kg/a−
”以上となり、■ショツトブラスト時の耐歪性が良好で
あり、■連続水和酸化処理時にアルミニウム合金板に皺
が入りにくい、■水和酸化皮膜に欠陥が入りにくい、■
加熱調質性が良好であるといった観点から、板厚として
は50μm以下は好ましくなく、又、300μmをこえ
る場合はコスト高の傾向から、板厚は約50〜300μ
鍮が好ましい。 又、使用合金材質としてはM、が約1.5〜3.0重量
%、Siが約0.1重量%以下、Feが約0.3重量%
以下、Cuが約0.05重1%以下、Znが約0.05
重量%以下、かつ、Cu+Znが約0.03〜0.06
重量%であり、残部が約0.1重量%以下の不可避不純
物及びAlからなるアルミニウム合金であることが望ま
しい。 例えば、H,が3重量%を越えて多くなりすぎると、水
和酸化皮膜に欠陥が生成し易<、Ngが1.5重量%未
満の少なすぎる場合では、支持体の耐力が18Kg/a
m”以上になりにくい、又、Cu十Z口の添加量が0.
03〜0.06重量%の範囲外になると、皮膜欠陥が生
じやすい傾向がある。 アルミニウム合金板のショツトブラストは、圧延板表面
の圧延筋を消して表面を等力比すると共に、多数の凹凸
を密に付与して表面積を増大させ、後続工程で形成する
水和酸化皮膜とあいまって感光剤との密着性を高めるも
のである。 この粗面化は、JIS 80601に規定する中心線平
均粗さ(Ra>が約0.4〜0.8.tzm、最大粗さ
(Rmax)が約3〜8μ鴎、粗さ曲線の中心線から1
μ鋼下の線と交差する山の数が約50〜85個/2.5
n+mの粗面としたアルミニウム合金となるように行な
うことが望ましい。 すなわち、Raが064μm未満の小さすぎる場合では
密着性改良効果が小さく、又、0,8μ稍を越えて大き
すぎると必然的に山の密度が小さくなり、却って密着性
が低下する傾向があるからによる。 又、Rmaxが3μm未満の小さすぎる場合では、ショ
ツトブラストが不充分であり、表面未処理部分があり、
密着性が不充分となり、逆に、8μ翔を越えて大きすぎ
ると、局部的な凹凸部分が増大することになり、印刷汚
れを増長させる傾向があるからによる。 山の数は、JIS B12O3に従って粗さ曲線を得、
その中心線から1μm下に引いた線と交差する山数をも
とめ、長さ2.51当りに換算したものである。そして
、山数が50未満の少なすぎる場合は密着性が低下し、
85を越えて多すぎると、局部的凹凸が増加することに
なり、印刷汚れを増長させる傾向がある。 ショツトブラスト条件は素材板厚、調質条件によって異
なるので一義的に定められないが、投射材の形状は球−
状であることが、後述の°水和酸化処理性(皮膜欠陥が
できにくいこと)から望ましい。 球状の投射材としてはメツシュ約#60〜# 1so(
粒径としては約100〜200μmφ)の鋳鉄製の他、
セラミック製ビーズ(ジルコニアetc、)、エンジニ
アリングプラスチック製ビーズ等が適用できるが、投射
材コスト面、投射材の回収ロス、投射材の摩擦変形とい
う観点から比重の大きな鋳鉄製が望ましい。 加えて球状であること番ミよって、設備(投射ノズル、
インペラー等の部品)の消耗が少なくなり、ショツトブ
ラストに係るコストの大幅な低減が可能になり、かつ、
通常のスチールグリッド、還元鉄粉と比べて酸化皮膜が
厚く、酸化されにくい為、粉塵爆発の危険性も少ない。 又、特開昭62−196190号公報にて提言されてい
るように、投射材の先端部の曲率半径が20Iim以下
の鋭角でない為、アルミニウム合金板に突きささりに<
<、印刷汚れが生じにくいものになる。 投射条件としては、例えばインペラ一方式においては、
投射速度は通常5〜20m+/秒、望ましくは約10〜
151秒、投射密度は100〜400KH/m”、特に
望ましくは約200にg/s”にて実施される。 尚、ショツトブラスト性(表面粗面の等方性)を良好に
する為に、粗面化前の冷間圧延板の表面の中心線平均粗
さ(Ra)を約0.2μ輸以下、好ましくは0.12μ
m以下にしておくことが望ましい。 Raを0.12μm以下であるようにする為には、例え
ばアルミニウム合金圧延材の表面を冷間圧延の最終工程
において、従来材等の製造に使用されてきたMF仕上げ
(+ail! finish)でRaが約0.2〜0.
5μ鏑のものではなく、光沢ロールによってそのRaを
約0.12μm以下にBF仕上げ(Bright fi
nish)、又はLF仕上げ(Luster fini
sh)する方法が考えられる。 ショットプラス!・による粗面化後、投射材を公知のケ
ミカルエツチング等によって除去し、水洗した後、水和
酸化処理により前記粗面に開口径が約0.05〜0.2
μmのミクロピットを有する付着量約0.4〜0.8g
/m”の酸化皮膜を形成する。 水和酸化皮膜はp115〜11の水溶液で処理すること
で形成され、例えばpH6〜8の沸騰純水中に浸漬する
ことにより得られるベーマイト系皮膜、ホウ酸等の弱酸
性物質によりpH5〜6程度に調整された純水系溶液に
浸漬して得られるベーマイト系皮膜、アンモニア、苛性
ソーダ等の塩基性物質によりp]18〜11程度に調整
された純水系溶液に浸漬して得られるベーマイト系皮膜
等がある。 尚、pHが11より大きくなると、金属間化合物及びそ
の周囲における水和酸化皮膜の欠陥部が深く、かつ、大
きくなってインク汚れが発生しやすくなり、逆にpHが
5より小さくなると、皮膜生成速度が小さくなり、生産
性が低下する。 そして、処理溶液中に次亜ハロゲン酸塩、パーオキソポ
ウ酸塩等を添加すると、ミクロピットが緻密になり、感
光剤との密着性が一層向上する。 又、水和酸化皮膜の膜厚が薄すぎると感光剤との密着性
向上及び耐刷性向上に対する効果が小さく、逆に厚くな
りすぎると、水和酸化皮膜の欠陥が増加し、印刷汚れが
増長する傾向にあったことから、水和酸化皮膜の膜厚は
約0.4〜0.8g/m”であることが大事であった。 尚、水和酸化皮膜の感光剤との密着性及び耐刷性の向上
の為にケイ素化合物を介在させることもあり、その場合
に用いられるケイ酸塩溶液としては、例えば水ガラス、
ケイ酸ナトリウム、ケイ酸カリウム、シリカゾル等の水
溶液又は懸濁液を用いることが出来、ケイ酸塩の濃度と
しては通常0.5〜10%の範囲、特に0.5〜5%の
ものを用いることが望ましい。 そして、このようなケイ酸塩含有溶液で水和酸化皮膜に
介在させられるケイ素化合物は、ケイ素換算で約0.0
1−0.15g/+*”の量であることが望ましい、す
なわち、水和酸化皮膜に介在させられるケイ素化合物の
量が少なすぎる場合には、感光剤との密着性の向上効果
等が小さく、逆に多ずぎる場合には、ケイ素化合物の粒
子が水和酸化皮膜表面に不均一に存在するようになり、
この為感光剤との密着性が低下する傾向があるからによ
る。 上記の水和酸化皮膜表面にリン系化合物を介在させると
、感光剤との密着性及び非画像部の耐食性は大111に
向上する。 これは、リン系化合物を含有する水溶液で処理し、乾燥
することによって容易に達成できる0例えば、濃度が5
0pp+s以上、望ましくは約l〜20%となるように
リン系化合物を脱イオン水、上水又は工業用水等の水に
溶解し、かつpH2〜12、望ましくはpH6〜8に調
整されたリン系化合物の水溶液を用いて、温度lO〜1
00℃で、1秒〜10分間、望ましくは約5〜20秒間
浸漬、塗布又はスプレー手段等を講じることで容易に形
成できる。 尚、この水溶液のpH調整は、リン系化合物のplIを
考慮して、リン酸、クエン酸、酢酸、Ni0H1に0■
、Cm(OHL、l・リエタノールアミン、アンモニア
等を用いて行なえば良い。 そして、上記リン系化合物を含む溶液で処理することに
よって水和酸化皮膜系の皮膜上に介在させるリン系化合
物は、耐食性及び塗膜密着性の観点から、リン換算して
約o、oos〜0.15g/m”であることが望ましか
った。 尚、リン系化合物としては、例えば次亜リン酸塩、オル
ト亜リン酸塩、ビロリン酸塩、メタ亜リン酸塩、次リン
酸塩、オルトリン酸塩、メタリン酸塩、l・リボリリン
酸塩、テトラポリリン酸塩、ビロリン酸塩の無機リン酸
塩等の水溶性塩を1種又は2種以上用いることができる
。 そして、リン系化合物溶液による処理に際しては、この
溶液中に例えば0.1〜2%といったように少量の界面
活性剤を加えたもので処理すると一層好ましくなる。す
なわち、水和酸化皮膜に介在させられるものがリン系化
合物だけでなく、界面活性剤も介在させられていると、
リン系化合物の水和酸化皮膜への付着性が改良されてよ
り一層望ましくなることが判明した。 尚、非イオン系界面活性剤としては、例えばポリオキシ
エチレンアルキルアリルエーテル型(ポリオキシエチレ
ンノニルフェニルエーテル、ポリオキシエチレンオクチ
ルフェニルエーテル)、アルキルエーテル型(ポリオキ
シエチレンラウリルエーテル)等を一種又は二種以上用
いることができる。 又、ケイ素化合物、リン系化合物、非イオン系界面活性
剤いずれをも介在させるようにしても良い。 尚、印刷汚れの減少及び耐刷性を同時に満足する為、球
状の投射材によるショツトブラスト粗面と上記の水和酸
化皮膜の生成の組合わせによることが極めて好ましい、
すなわち、球状の投射材の処理による粗面に水和酸化処
理した場合、水和酸化処理後に形成される5〜10μ請
φの皮膜欠陥が少なく、かつ、皮膜欠陥があってもこの
欠陥は小さく、前述の感光剤中に含まれる物質が吸着し
にくい為、印刷時にインクが該部分に凝集しにくかった
からである。 又、耐刷力は、水和酸化皮膜の有する0、05〜062
μ饋φのミクロピットによるアンカー効果によって優れ
たものになっている。 しかしながら、例えば球状の投射材の粗面に対して従来
の陽極酸化皮膜を同程度付与したものでは、印刷汚れは
良好なものの、耐刷力が劣るものとなる。 以上の表面処理により、機械的に付与された略半球状の
凹凸が形成された面上に水和酸化皮膜による多数のミク
ロピットが形成され、感光剤との密着性のよい表面が得
られるが、本発明においては、圧延板を加熱して、アル
ミニウム合金板に所望の特性を付与する。 すなわち、この加熱は、耐力がIl?に117am’以
上になるように板を焼き戻して軟化し、耐疲労強度を向
上させるとともに、機械的粗面化処理の際に生じた歪や
変形を除去して均質で平面性のよい板とし、さらには加
熱によりアルミニウム合金板と水和酸化皮膜との密着性
を更に高める為のものである。 加熱は、雰囲気温度150〜360℃、加熱時間3〜2
0時間の範囲で行なえばよい、又、温度を400〜60
0℃にして短時間加熱することでも可能である。 この加熱条件を調整することにより、加熱後の状態で調
質H24,1122、あるいはH34材相当といった如
く用途に応じた所望の特性の板が得られ、又、硬質の冷
間圧延板を機械的粗面化処理に供することにより従来よ
りも歪や変形の程度が小さい為、この調質に適した条件
内でそれらを除去することが可能になる。 このようにして得られた平版印刷版用支持体の上に、従
来より知られている感光層を設けて、感光性平版印刷版
を得ることができ、これを製版処理して得た平版印刷版
は優れた性能を有している8アルミニウム合金板に適用
される感光剤(感光性物質)は、特に限定されるもので
はなく、一般的に周知のものを適用でき、例えば親水性
ポリマーとジアゾニウム塩からなる組成物、キノンジア
ジド化合物とアルカリ可溶性樹脂との組成物、活性光線
の照射により二l化する不飽和カルボン酸、例えば桂皮
酸、フェニレンジアクリル酸をその楕成成分とするポリ
マー、活性光線の照射により重合反応を起す化合物とバ
インダポリマーとの組成物あるいはアジド系感光性組成
物が挙げられる。 そして、これらの感光剤を種々の良く知られている添加
剤と共に適当な溶媒に溶解し、本発明のアルミニウム合
金板に塗布、乾燥することによって感光性平版印刷板を
得ることができる。 この感光性平版印刷版に被複写物を重ねて常法に従って
露光・現像すれば、親水性、保水性に優れ、かつ、感光
剤からなる画像部とアルミニウム合金板との密着性が極
めて大きく、耐刷力に優れた印刷版を得ることができる
。 そして、本発明のアルミニウム合金製の平版印刷版は、
■従来のものに比べて非画像部の印刷汚れがなく、0表
面処理が低コストで、かつ、両面印刷性が良好なものと
なり、■素材強度の向上による薄肉強靭化材を使用して
ら印刷汚れといった印刷特性に何ら問題はなく、素材コ
ストの低減が達成できる。
As a result of intensive research into the above-mentioned problems, the present inventors have discovered that a lithographic printing plate obtained by subjecting both sides of an aluminum alloy to a roughened surface using a predetermined roughening method and subjected to a hydration oxidation treatment. When we investigated the characteristics of the support, we realized that when a hydrated oxide film was applied, the surface treatment properties and economic efficiency were superior to those for lithographic printing plates that were provided with an anodized oxide film, and we decided to investigate further. As a result of adding the It has been found that the ink is irreversibly adsorbed to the defective areas of the ink, and spots of ink stains are likely to occur in the non-image area. The present invention has been made based on the above findings, and provides a hydrated oxide film having a coating weight of approximately 0.4 to 0.8 g/m'' and having micro pits with an opening diameter of approximately 0.05 to 0.2 μm. The present invention provides a support for a lithographic printing plate, which is formed by heating and tempering an aluminum alloy plate provided with the following: .4~0.8μst, maximum roughness (R
max) is approximately 3 to 8 μm1 1 μm from the center line of the roughness curve
The number of peaks that intersect with the lower line is approximately 50 to 85 72.5 mm
An opening diameter of approximately 0 is placed on the surface of a rough aluminum alloy plate.
.. Adhesion amount approximately 0 with micro pits of 0.05 to 0.2 μm
.. A hydrated oxide film of 4 to 0.8 g/*" is provided, and this is heated and tempered, and furthermore, a thickness of about 50 to 30 g/*" is provided.
At least one side of a cold-rolled aluminum alloy plate having a diameter of 0.071 m was shot blasted using a substantially spherical blasting material at a predetermined blasting speed and blasting density to give a center line average roughness (Ra) of about 0.4 to 0.07 mm. 8. czm, the maximum roughness (Rmax) is approximately 3 to 8 μm, and the number of peaks that intersect with the line 1 μm below the center line of the roughness curve is approximately 50 to 85. It is preferable that a hydrated oxide film with a deposited amount of about 0.4 to 0.8 g/m2 containing micro pits with an opening diameter of about 0.05 to 0.0, ZJiyb is formed, and this is heated and tempered. By the way, in the support for planographic printing plates, aluminum alloy plates are usually made of material ^1050 or ^11.
00 equivalent material is used, and the tempering is set to the old 8.1116. Further, a plate having a thickness of about 240 to 300 μm is used. In this case, there is no problem in terms of flatness with electrochemical roughening, but the aluminum alloy plate is easily deformed and distorted during shot blasting, which impedes the dimensional stability of the support and causes problems. There is. However, according to the present invention, even aluminum alloy plates with a thickness of 50 to 300 μm can be processed without impairing dimensional stability.
It has good flatness, which makes the aluminum alloy plate suitable for printing, and at the same time there is no distortion or deformation during surface treatment. That is, the cold-rolled aluminum alloy plate used in the present invention refers to a sheet that has not been subjected to temper annealing, which is usually performed after cold rolling, and is referred to as temper H1n. As for this aluminum alloy plate, in addition to pure aluminum type,
Aluminum-magnesium alloy, aluminum-manganese alloy, etc. can be used. and ■The yield strength of the support after heat treatment is 18Kg/a-
``With the above results, ■ Strain resistance during shot blasting is good, ■ Wrinkles do not easily appear in the aluminum alloy plate during continuous hydration oxidation treatment, ■ Defects do not easily appear in the hydrated oxide film, ■
From the viewpoint of good thermal refining properties, it is not preferable for the plate thickness to be less than 50 μm, and if it exceeds 300 μm, the cost tends to be high, so the plate thickness should be approximately 50 to 300 μm.
Brass is preferred. In addition, the alloy materials used include approximately 1.5 to 3.0% by weight of M, approximately 0.1% by weight or less of Si, and approximately 0.3% by weight of Fe.
Below, Cu is about 0.05% by weight or less, Zn is about 0.05%
Weight% or less and Cu+Zn is about 0.03 to 0.06
% by weight, and the balance is preferably about 0.1% by weight or less of unavoidable impurities and Al. For example, if the H content is too high (more than 3% by weight), defects are likely to occur in the hydrated oxide film; if the Ng content is too low (less than 1.5% by weight), the yield strength of the support is 18 kg/a.
m" or more, and the amount of Cu added is 0.
If the content is outside the range of 0.03 to 0.06% by weight, film defects tend to occur. Shot blasting of aluminum alloy plates erases the rolling streaks on the surface of the rolled plate to make the surface equal force, and also increases the surface area by densely providing a large number of unevenness, which combines with the hydrated oxide film formed in the subsequent process. This improves the adhesion with the photosensitizer. This roughening is based on the centerline average roughness (Ra> of approximately 0.4 to 0.8.tzm, maximum roughness (Rmax) of approximately 3 to 8μ, and the centerline of the roughness curve specified in JIS 80601). from 1
The number of peaks that intersect with the line under μ steel is approximately 50 to 85/2.5
It is desirable to perform this so that the aluminum alloy has an n+m rough surface. That is, if Ra is too small, less than 0.64 μm, the effect of improving adhesion is small, and if it is too large, exceeding 0.8 μm, the density of the peaks will inevitably become smaller, and the adhesion will tend to deteriorate. by. In addition, if Rmax is too small, less than 3 μm, shot blasting is insufficient and there are untreated areas on the surface.
This is because adhesion becomes insufficient, and conversely, if it is too large, exceeding 8 microns, local unevenness increases, which tends to increase printing stains. The number of peaks is determined by obtaining a roughness curve according to JIS B12O3.
The number of peaks that intersect with a line drawn 1 μm below the center line is calculated, and the number is calculated per length of 2.51. If the number of ridges is too small (less than 50), the adhesion will decrease,
When the number exceeds 85, local unevenness increases, which tends to increase printing stains. Shot blasting conditions cannot be unambiguously determined as they vary depending on the material thickness and tempering conditions, but the shape of the shot material is spherical.
It is desirable that the film be in the form of a hydration oxidation process (hard to form film defects), which will be described later. As a spherical projectile material, mesh approx. #60 to #1so (
In addition to being made of cast iron with a grain size of approximately 100 to 200 μmφ),
Ceramic beads (zirconia, etc.), engineering plastic beads, etc. can be used, but cast iron, which has a large specific gravity, is preferable from the viewpoint of the cost of the shot material, recovery loss of the shot material, and frictional deformation of the shot material. In addition, due to its spherical shape, equipment (projection nozzle,
There is less wear and tear on parts (such as impellers, etc.), making it possible to significantly reduce the cost of shot blasting, and
Compared to regular steel grids and reduced iron powder, it has a thicker oxide film and is less susceptible to oxidation, so there is less risk of dust explosion. In addition, as proposed in Japanese Patent Application Laid-Open No. 196190/1983, the radius of curvature of the tip of the projectile is not an acute angle of 20 Im or less, so it does not stick to the aluminum alloy plate.
<, printing stains are less likely to occur. For example, in the case of one-impeller type, the projection conditions are as follows:
Projection speed is usually 5-20m+/sec, preferably about 10-20m+/sec.
151 seconds, the projection density is 100 to 400 KH/m'', particularly preferably about 200 g/s''. In addition, in order to improve the shot blasting property (isotropy of the rough surface), the center line average roughness (Ra) of the surface of the cold rolled sheet before roughening is preferably about 0.2μ or less. is 0.12μ
It is desirable to keep it below m. In order to make Ra 0.12 μm or less, for example, the surface of a rolled aluminum alloy material is subjected to MF finishing (+ail! finish), which has been used in the production of conventional materials, in the final step of cold rolling to reduce the Ra. is about 0.2 to 0.
Instead of using a 5-μm wire, we use a gloss roll to reduce the Ra to about 0.12 μm or less using a BF finish (Bright fi
nish) or LF finish (Luster fini)
sh) can be considered. Shot plus! After roughening the surface, the shot material is removed by known chemical etching, etc., washed with water, and then subjected to hydration oxidation treatment to give the rough surface an opening diameter of approximately 0.05 to 0.2.
Approximately 0.4 to 0.8 g of adhesion with μm micro pits
/m" oxide film. Hydrated oxide film is formed by treatment with an aqueous solution of p115-11, for example, boehmite-based film obtained by immersion in boiling pure water of pH 6-8, boric acid. A boehmite-based film obtained by immersion in a pure water solution whose pH has been adjusted to about 5 to 6 with a weak acidic substance such as, and a pure water solution whose pH has been adjusted to about 18 to 11 with a basic substance such as ammonia and caustic soda. There are boehmite films etc. obtained by immersion.If the pH is higher than 11, the defects in the intermetallic compound and the hydrated oxide film around it become deep and large, making it easier for ink stains to occur. On the other hand, when the pH is lower than 5, the film formation rate decreases and the productivity decreases.Additionally, when hypohalite, peroxopate, etc. are added to the treatment solution, the micropits become denser. The adhesion with the photosensitizer is further improved. Also, if the thickness of the hydrated oxide film is too thin, the effect of improving adhesion with the photosensitizer and printing durability will be small; conversely, if it is too thick, the hydration Since defects in the oxide film tended to increase and printing stains increased, it was important that the thickness of the hydrated oxide film was about 0.4 to 0.8 g/m''. In addition, in order to improve the adhesion of the hydrated oxide film to the photosensitizer and the printing durability, a silicon compound may be added, and examples of the silicate solution used in this case include water glass, water glass, etc.
Aqueous solutions or suspensions of sodium silicate, potassium silicate, silica sol, etc. can be used, and the concentration of silicate is usually in the range of 0.5 to 10%, particularly 0.5 to 5%. This is desirable. The silicon compound interposed in the hydrated oxide film with such a silicate-containing solution is approximately 0.0 in terms of silicon.
It is desirable that the amount is 1-0.15 g/+*". In other words, if the amount of silicon compound interposed in the hydrated oxide film is too small, the effect of improving the adhesion with the photosensitizer will be small. On the other hand, if there are too many silicon compound particles, the silicon compound particles will be present unevenly on the surface of the hydrated oxide film.
This is because the adhesion with the photosensitizer tends to decrease. When a phosphorus compound is interposed on the surface of the above-mentioned hydrated oxide film, the adhesion to the photosensitive agent and the corrosion resistance of the non-image area are greatly improved. This can be easily achieved by treating with an aqueous solution containing a phosphorous compound and drying, e.g.
A phosphorus compound prepared by dissolving a phosphorus compound in water such as deionized water, tap water, or industrial water to a concentration of 0 pp+s or more, preferably about 1 to 20%, and adjusting the pH to 2 to 12, preferably 6 to 8. Using an aqueous solution of the compound, the temperature lO~1
It can be easily formed by dipping, coating, or spraying at 00° C. for 1 second to 10 minutes, preferably for about 5 to 20 seconds. The pH of this aqueous solution was adjusted by adding 0% to phosphoric acid, citric acid, acetic acid, and Ni0H1, taking into account the plI of phosphorus compounds.
, Cm (OHL, l-liethanolamine, ammonia, etc.).The phosphorus compound interposed on the hydrated oxide film by treatment with a solution containing the phosphorus compound is From the viewpoint of corrosion resistance and paint film adhesion, it was desirable that the phosphorus content be approximately 0.00 to 0.15 g/m'' in terms of phosphorus. Water-soluble inorganic phosphates such as phosphate, birophosphate, metaphosphite, hypophosphate, orthophosphate, metaphosphate, l-ribolyphosphate, tetrapolyphosphate, and birophosphate One or more types of salts can be used. When processing with a phosphorus compound solution, a small amount of surfactant, for example 0.1 to 2%, is added to this solution. In other words, if the hydrated oxide film contains not only a phosphorus compound but also a surfactant,
It has been found that the adhesion of the phosphorus compound to the hydrated oxide film is improved, making it even more desirable. As the nonionic surfactant, for example, one or two types of polyoxyethylene alkyl allyl ether type (polyoxyethylene nonylphenyl ether, polyoxyethylene octylphenyl ether), alkyl ether type (polyoxyethylene lauryl ether), etc. More than one species can be used. Further, any of a silicon compound, a phosphorus compound, and a nonionic surfactant may be present. In addition, in order to simultaneously satisfy the reduction of printing stains and the printing durability, it is extremely preferable to use a combination of the shot blasting rough surface using the spherical projection material and the formation of the above-mentioned hydrated oxide film.
In other words, when the rough surface of a spherical shot material is subjected to hydration oxidation treatment, there are fewer film defects of 5 to 10μ diameter formed after hydration oxidation treatment, and even if there are film defects, these defects are small. This is because the substances contained in the above-mentioned photosensitive agent are difficult to adsorb, making it difficult for ink to aggregate in the area during printing. In addition, the printing durability is 0.05 to 062, which the hydrated oxide film has.
It is excellent due to the anchoring effect of the micro pits of μ and φ. However, for example, if the rough surface of a spherical projection material is coated with the same amount of conventional anodic oxide film, although printing stains are good, printing durability is poor. Through the above surface treatment, a large number of micro pits are formed by a hydrated oxide film on the surface with mechanically applied approximately hemispherical irregularities, and a surface with good adhesion to the photosensitive agent is obtained. In the present invention, a rolled plate is heated to impart desired properties to the aluminum alloy plate. In other words, this heating has a yield strength of Il? The plate is tempered and softened to a thickness of 117 am' or more to improve fatigue resistance, and the distortion and deformation caused during mechanical roughening treatment is removed to create a homogeneous and flat plate. Furthermore, the purpose is to further improve the adhesion between the aluminum alloy plate and the hydrated oxide film by heating. Heating is performed at an ambient temperature of 150 to 360°C and a heating time of 3 to 2
It can be carried out within the range of 0 hours, and the temperature should be set at 400 to 60
It is also possible to heat it for a short time at 0°C. By adjusting these heating conditions, it is possible to obtain a plate with desired characteristics depending on the application, such as heat-treated H24, 1122, or H34 material in the state after heating. By subjecting the surface to roughening treatment, the degree of distortion and deformation is smaller than in the past, so it becomes possible to remove them within conditions suitable for this thermal refining. A conventionally known photosensitive layer can be provided on the lithographic printing plate support thus obtained to obtain a photosensitive lithographic printing plate. The plate has excellent performance.8 The photosensitive agent (photosensitive substance) applied to the aluminum alloy plate is not particularly limited, and generally known ones can be used, such as hydrophilic polymers and Compositions consisting of diazonium salts, compositions of quinone diazide compounds and alkali-soluble resins, polymers whose elliptic components are unsaturated carboxylic acids such as cinnamic acid and phenylene diacrylic acid that undergo dilation upon irradiation with actinic rays, active Examples include a composition of a binder polymer and a compound that undergoes a polymerization reaction upon irradiation with light, or an azide-based photosensitive composition. A photosensitive lithographic printing plate can be obtained by dissolving these photosensitizers together with various well-known additives in an appropriate solvent, applying the solution to the aluminum alloy plate of the present invention, and drying the solution. If a copy is placed on this photosensitive lithographic printing plate and exposed and developed according to a conventional method, it will have excellent hydrophilicity and water retention, and extremely high adhesion between the image area made of the photosensitive agent and the aluminum alloy plate. A printing plate with excellent printing durability can be obtained. The aluminum alloy lithographic printing plate of the present invention is
■Compared to conventional products, there is no printing stain in non-image areas, 0 surface treatment is low cost, and double-sided printability is good. ■Printing using thinner toughening material improves material strength. There are no problems with printing characteristics such as stains, and material costs can be reduced.

【実施例1】 中心線平均粗さRaが0.12μmで、Mgが1.6重
量%、Feが0.251fi%、Siが0.1重量%、
Cuが0.03fi量%、Znが0.O1重量%、その
他年可避不純物元素が0.1重量%以下のアルミニウム
合金板(厚み200μm、調質:HI3)を、球状の投
射材5B−2(鋳鉄、#80〜#1OO1新東工業(株
)製)にてショツトブラスト(投射速度13m/sec
、投射密度200にg/m2N、て表面を砂目立てした
。 この時の最大表面粗さ(Rmax)は5.4μm、中心
線平均粗さRaは0.6μm1粗さ曲線の中心線から1
μm下の線と交差する山の数は60個/2.5mmであ
った。 このアルミニウム合金板を脱脂、水洗後、10%苛性ソ
ーダ水溶液中にてエツチングした。水洗後、30%硝酸
水溶液中にて中和し、充分水洗した。 次いで、次亜塩素酸ナトリウム水溶液(NaOC1濃度
:200pp鴎、pH:1G、o)中に約90℃の温度
下で浸漬し、開口径約0.05〜0.2μmのミクロピ
ットを有し、約0.6g/m’厚の水和酸化皮膜を形成
する。 次いで濃度1.5%の3号水ガラス溶液中(pH11,
4)に約85℃の温度下で浸漬した後、スプレー水洗工
程を経て、アルミニウム合金材表面にケイ素換算で約0
.035g/+m”のケイ素化合物を設ける。 ケイ素化合物付着後、25〜30℃の温度下で濃度15
%のトリポリリン酸ナトリウム水溶液を塗布し、そして
150℃で10分間の熱風乾燥を行ない、リン換算で約
0.03g/腸”の無機リン酸塩を水ガラス処理された
水和酸化皮膜表面に介在させる。 その後、雰囲気温度200℃の大気炉中で加熱し、アル
ミニウム合金板を■21材相当(耐力22Kg/mm”
)のものにした。 このように処理された支持体の表面に所定の感光剤を乾
燥後の塗布重量が2g/m’となるように塗布して感光
層を設けた。 そして、この感光性平版印刷版に所定の露光、現像処理
を行い、得られた刷版をオフセット印刷機にかけて印刷
した。
[Example 1] Center line average roughness Ra is 0.12 μm, Mg is 1.6% by weight, Fe is 0.251fi%, Si is 0.1% by weight,
Cu content is 0.03fi amount%, Zn content is 0.03fi amount%. An aluminum alloy plate (thickness 200 μm, tempering: HI3) containing 1% by weight of O and 0.1% by weight or less of other avoidable impurity elements was made into a spherical projection material 5B-2 (cast iron, #80 to #1OO1 Shinto Kogyo). Co., Ltd.) by shot blasting (projection speed 13 m/sec)
The surface was grained at a projection density of 200 g/m2N. The maximum surface roughness (Rmax) at this time is 5.4 μm, and the center line average roughness Ra is 0.6 μm 1 from the center line of the roughness curve.
The number of peaks intersecting the line below μm was 60/2.5 mm. This aluminum alloy plate was degreased, washed with water, and then etched in a 10% caustic soda aqueous solution. After washing with water, it was neutralized in a 30% aqueous nitric acid solution and thoroughly washed with water. Then, it was immersed in a sodium hypochlorite aqueous solution (NaOC1 concentration: 200 ppp, pH: 1 G, o) at a temperature of about 90 ° C. to form micro pits with an opening diameter of about 0.05 to 0.2 μm, A hydrated oxide film with a thickness of about 0.6 g/m' is formed. Next, in a No. 3 water glass solution with a concentration of 1.5% (pH 11,
4) at a temperature of about 85°C, and then through a spray water washing process, the surface of the aluminum alloy material is coated with about 0% silicon in terms of silicon.
.. 035 g/+m'' of silicon compound is provided. After the silicon compound is deposited, the concentration is 15 at a temperature of 25-30°C.
% sodium tripolyphosphate aqueous solution was applied and dried with hot air at 150°C for 10 minutes to interpose inorganic phosphate in an amount of about 0.03 g/intestine in terms of phosphorus on the surface of the hydrated oxide film treated with water glass. Thereafter, the aluminum alloy plate is heated in an atmospheric furnace at an ambient temperature of 200°C, and the aluminum alloy plate is made into a material equivalent to ■21 material (yield strength: 22 kg/mm).
). A predetermined photosensitive agent was coated on the surface of the support thus treated so that the coating weight after drying was 2 g/m' to form a photosensitive layer. Then, this photosensitive lithographic printing plate was subjected to predetermined exposure and development treatments, and the resulting printing plate was printed using an offset printing machine.

【実施例2】 実施例1において、ケイ素化合物、リン系化合物を介在
させない以外は全て同様に行なった。
[Example 2] The same procedure as in Example 1 was carried out except that no silicon compound or phosphorus compound was used.

【実施例31 実施例1において、リン酸塩水溶液処理を省略してリン
系化合物を付着させない以外は全て同様に行なった。 【実施例4】 実施例1において、アルミニウム合金材を冷間圧延する
工程の最終工程で光沢メツキロールにて仕上げ圧延して
Raを0.03μmにしたアルミニウム合金板とし、か
つ、ショツトブラスト時の投射密度を150にgem”
にする以外は全て同様に行なった。
Example 31 The same procedure as in Example 1 was carried out except that the phosphate aqueous solution treatment was omitted and no phosphorus compound was attached. [Example 4] In Example 1, the aluminum alloy material was finished rolled with a glossy roll in the final step of the cold rolling process to obtain an aluminum alloy plate with an Ra of 0.03 μm, and the projection during shot blasting was performed. Gem density to 150
Everything was done in the same way except for.

【比較例1】 実施rIA1において、アルミニウム合金板を表面処理
後に加熱調質しない以外は全て同様に行なった。
[Comparative Example 1] The same procedure as in Example rIA1 was carried out except that the aluminum alloy plate was not heated and tempered after surface treatment.

【比較例2】 実施M3において、水和酸化皮膜の代わりに20%硫酸
水溶液を用いた陽極酸化皮1ii(皮膜量o、sg/−
勺とした以外は全て同様に行なった。
[Comparative Example 2] In Example M3, anodic oxide film 1ii (film amount o, sg/-
Everything else was done in the same way, except for the difference.

【比較例3] 実施例1において、水和酸化度膜厚を0.9g/m”と
する以外は全く同様に行なった。 【比較例4】 実施例1において、永和酸化皮膜厚をO,Zg/la’
とする以外は全く同様に行なった。
[Comparative Example 3] The same procedure as in Example 1 was carried out except that the hydration oxidation degree film thickness was changed to 0.9 g/m''. [Comparative Example 4] In Example 1, the Eiwa oxide film thickness was changed to O, Zg/la'
It was done in exactly the same way except that.

【比較例5】 実施例1において、水和酸化皮膜のミクロピット径が0
.04μmのものとした以外は全く同様に行った。
[Comparative Example 5] In Example 1, the micro pit diameter of the hydrated oxide film was 0.
.. The process was carried out in exactly the same manner except that the thickness was 0.04 μm.

【比較例61 実施例1において7水和酸化皮膜のミクロピット径が0
.3μ階のものとした以外は全く同様に行った。 【特性】 上記各側で得た刷版の非画像部の汚染と耐刷力を調べた
結果を下記の表に示す。
[Comparative Example 61 In Example 1, the micropit diameter of the heptahydrate oxide film was 0.
.. The process was carried out in exactly the same manner except that the 3μ floor was used. [Characteristics] The table below shows the results of examining the staining and printing durability of the non-image areas of the printing plates obtained on each side above.

Claims (10)

【特許請求の範囲】[Claims] (1)開口径約0.05〜0.2μmのミクロピットを
有する付着量約0.4〜0.8g/m^2の水和酸化皮
膜が設けられたアルミニウム又はアルミニウム合金板が
加熱調質されてなることを特徴とする平版印刷版用支持
体。
(1) An aluminum or aluminum alloy plate provided with a hydrated oxide film with a coating weight of approximately 0.4 to 0.8 g/m^2 and having micro pits with an opening diameter of approximately 0.05 to 0.2 μm is heated and tempered. A support for a lithographic printing plate, characterized in that:
(2)特許請求の範囲第1項記載の平版印刷版用支持体
において、中心線平均粗さ(Ra)が約0.4〜0.8
μm、最大粗さ(Rmax)が約3〜8μm、粗さ曲線
の中心線から1μm下の線と交差する山の数が約50〜
85個/2.5mmの粗面としたアルミニウム又はアル
ミニウム合金板の表面に、開口径約0.05〜0.2μ
mのミクロピットを有する付着量約0.4〜0.8g/
m^2の水和酸化皮膜が設けられ、これが加熱調質され
てなるもの。
(2) In the lithographic printing plate support according to claim 1, the centerline average roughness (Ra) is about 0.4 to 0.8.
μm, the maximum roughness (Rmax) is approximately 3 to 8 μm, and the number of peaks that intersect with the line 1 μm below the center line of the roughness curve is approximately 50 to
85 pieces/Aperture diameter approximately 0.05 to 0.2μ on the surface of a 2.5mm roughened aluminum or aluminum alloy plate.
Deposition amount approximately 0.4 to 0.8 g/m with micro pits
A hydrated oxide film of m^2 is provided, and this is heated and tempered.
(3)特許請求の範囲第1項又は第2項記載の平版印刷
版用支持体において、厚さ約50〜300μmのアルミ
ニウム又はアルミニウム合金の冷間圧延板の少なくとも
一面が略球状の投射材を用いてショットブラストして中
心線平均粗さ(Ra)が約0.4〜0.8μm、最大粗
さ(Rmax)が約3〜8μm、粗さ曲線の中心線から
1μm下の線と交差する山の数が約50〜85個/2.
5mmの粗面とされ、その粗面に開口径約0.05〜0
.2μmのミクロピットを有する付着量約0.4〜0.
8g/m^2の水和酸化皮膜が形成され、これが加熱調
質されてなるもの。
(3) In the support for a lithographic printing plate according to claim 1 or 2, at least one surface of a cold-rolled aluminum or aluminum alloy plate having a thickness of about 50 to 300 μm has a substantially spherical projection material. The center line average roughness (Ra) is approximately 0.4 to 0.8 μm, the maximum roughness (Rmax) is approximately 3 to 8 μm, and the roughness curve intersects with the line 1 μm below the center line. The number of mountains is about 50-85/2.
The rough surface is 5 mm, and the rough surface has an opening diameter of approximately 0.05 to 0.
.. The adhesion amount is approximately 0.4-0.2 μm with micro pits of 2 μm.
A hydrated oxide film of 8g/m^2 is formed and this is heated and tempered.
(4)特許請求の範囲第1項〜第3項記載の平版印刷版
用支持体において、水和酸化皮膜がpH約5〜11の水
溶液で処理されてなるもの。
(4) A lithographic printing plate support according to claims 1 to 3, wherein the hydrated oxide film is treated with an aqueous solution having a pH of about 5 to 11.
(5)特許請求の範囲第1項〜第4項記載の平版印刷版
用支持体において、水和酸化皮膜にケイ素化合物がSi
換算で約0.01〜0.15g/m^2介在しているも
の。
(5) In the support for a lithographic printing plate according to claims 1 to 4, a silicon compound is present in the hydrated oxide film.
About 0.01 to 0.15 g/m^2 in terms of conversion.
(6)特許請求の範囲第1項〜第4項記載の平版印刷版
用支持体において、水和酸化皮膜にリン系化合物がP換
算で約0.005〜0.15g/m^2介在しているも
の。
(6) In the support for a lithographic printing plate according to claims 1 to 4, a phosphorus compound is present in the hydrated oxide film at about 0.005 to 0.15 g/m^2 in terms of P. What you have.
(7)特許請求の範囲第1項〜第3項記載の平版印刷版
用支持体において、アルミニウム合金が、Mg約1.5
〜3.0重量%、Si約0.1重量%以下、Fe約0.
3重量%以下、Cu約0.05重量%以下、Zn約0.
05重量%以下、かつ、Cu+Znが約0.03〜0.
06重量%であり、残部が不可避不純物約0.1重量%
以下とAlからなるもの。
(7) In the lithographic printing plate support according to claims 1 to 3, the aluminum alloy contains about 1.5 Mg
~3.0% by weight, Si about 0.1% by weight or less, Fe about 0.
3% by weight or less, Cu about 0.05% by weight or less, Zn about 0.
0.05% by weight or less, and Cu+Zn is about 0.03 to 0.05% by weight or less.
0.6% by weight, and the remainder is about 0.1% by weight of unavoidable impurities.
Consists of the following and Al.
(8)特許請求の範囲第1項〜第3項記載の平版印刷版
用支持体において、加熱調質後のアルミニウム又はアル
ミニウム合金板の耐力が約18Kg/mm^2以上であ
るもの。
(8) In the lithographic printing plate support according to claims 1 to 3, the yield strength of the aluminum or aluminum alloy plate after heat treatment is about 18 kg/mm^2 or more.
(9)特許請求の範囲第2項又は第3項記載の平版印刷
版用支持体において、中心線平均粗さ(Ra)が約0.
4〜0.8μm、最大粗さ(Rmax)が約3〜8μm
、粗さ曲線の中心線から1μm下の線と交差する山の数
が約50〜85個/2.5mmの粗面となる前の冷間圧
延板の表面の中心線平均粗さ(Ra)が約0.2μm以
下であるもの。
(9) In the support for a lithographic printing plate according to claim 2 or 3, the center line average roughness (Ra) is about 0.
4-0.8μm, maximum roughness (Rmax) about 3-8μm
, the center line average roughness (Ra) of the surface of the cold rolled plate before it becomes a rough surface with the number of peaks intersecting the line 1 μm below the center line of the roughness curve being approximately 50 to 85/2.5 mm. is approximately 0.2 μm or less.
(10)特許請求の範囲第3項記載の平版印刷版用支持
体において、投射材がメッシュ#60〜#150の鋳鉄
を用いてなるもの。
(10) The support for a lithographic printing plate according to claim 3, in which the blasting material is made of cast iron with a mesh size of #60 to #150.
JP3607989A 1989-02-17 1989-02-17 Substrate for lithographic printing plate Pending JPH02215599A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3607989A JPH02215599A (en) 1989-02-17 1989-02-17 Substrate for lithographic printing plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3607989A JPH02215599A (en) 1989-02-17 1989-02-17 Substrate for lithographic printing plate

Publications (1)

Publication Number Publication Date
JPH02215599A true JPH02215599A (en) 1990-08-28

Family

ID=12459735

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3607989A Pending JPH02215599A (en) 1989-02-17 1989-02-17 Substrate for lithographic printing plate

Country Status (1)

Country Link
JP (1) JPH02215599A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6575094B2 (en) * 2000-06-09 2003-06-10 Fuji Photo Film Co., Ltd. Lithographic printing plate support having a roughened surface
EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
WO2010038812A1 (en) 2008-09-30 2010-04-08 富士フイルム株式会社 Electrolytic treatment method and electrolytic treatment device
WO2010150810A1 (en) 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
WO2011078010A1 (en) 2009-12-25 2011-06-30 富士フイルム株式会社 Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6575094B2 (en) * 2000-06-09 2003-06-10 Fuji Photo Film Co., Ltd. Lithographic printing plate support having a roughened surface
US6805051B2 (en) 2000-06-09 2004-10-19 Fuji Photo Film Co., Ltd. Lithographic printing plate support and method of manufacturing the same
EP1625944A1 (en) 2004-08-13 2006-02-15 Fuji Photo Film Co., Ltd. Method of manufacturing lithographic printing plate support
EP1712368A1 (en) 2005-04-13 2006-10-18 Fuji Photo Film Co., Ltd. Method of manufacturing a support for a lithographic printing plate
WO2010038812A1 (en) 2008-09-30 2010-04-08 富士フイルム株式会社 Electrolytic treatment method and electrolytic treatment device
WO2010150810A1 (en) 2009-06-26 2010-12-29 富士フイルム株式会社 Light reflecting substrate and process for manufacture thereof
WO2011078010A1 (en) 2009-12-25 2011-06-30 富士フイルム株式会社 Insulated substrate, process for production of insulated substrate, process for formation of wiring line, wiring substrate, and light-emitting element

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