JPH02217193A - Indium series powdery solder - Google Patents

Indium series powdery solder

Info

Publication number
JPH02217193A
JPH02217193A JP3911789A JP3911789A JPH02217193A JP H02217193 A JPH02217193 A JP H02217193A JP 3911789 A JP3911789 A JP 3911789A JP 3911789 A JP3911789 A JP 3911789A JP H02217193 A JPH02217193 A JP H02217193A
Authority
JP
Japan
Prior art keywords
indium
solder
lead
tin
powder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3911789A
Other languages
Japanese (ja)
Inventor
Shuji Kunimatsu
国末 修二
Yukihiro Tsuge
柘植 幸宏
Mamoru Koyama
まもる 小山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOYO METAL KK
Panasonic Electric Works Co Ltd
Original Assignee
TOYO METAL KK
Matsushita Electric Works Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOYO METAL KK, Matsushita Electric Works Ltd filed Critical TOYO METAL KK
Priority to JP3911789A priority Critical patent/JPH02217193A/en
Publication of JPH02217193A publication Critical patent/JPH02217193A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enable use with rolling reduction at room temp. without any heating by blending the specific ratios of indium, tin and lead to make powdery solder. CONSTITUTION:Powder mixed material composed >=95wt.% of total contents of indium, tin and/or lead, and mixing ratio of these three components is 15-85wt.% indium, 15-85wt.% tin and/or lead is used to the powdery solder and a circuit pattern is formed on a circuit substrate. This is unnecessary to heating, and by pressurizing with roll, etc., diffusion among the powder particles is developed and the powder particles are mutually joined. In the case of containing below 15% indium, this can not be diffused under room temp. rolling reduction and exceeding 85% indium, this can not be pulverized. Blending ratio of thin is desirable to be >=35% and that of lead is desirable to be <=50%. This is unnecessary to heating and melting, and can be used with the rolling reduction at the room temp. and as this is powdery state, the treatment is easy.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、プリント回路板の回路形成などのために用
いられるインジウム系粉末状ハンダに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an indium-based powder solder used for forming circuits on printed circuit boards.

〔従来の技術〕[Conventional technology]

ハンダは、金属材料や電子部品などのろう接材材として
古くから使用されている。ハンダには、棒状もしくは糸
状等に形成された固形ハンダのほかに、粉末状のハンダ
がある。固形ハンダには、たとえば、インジウム(In
 )の入ったインジウム系ハンダがあり、これは、半導
体素子と導体の微小な接続を行うマイクロソルダリング
に用いられている。固形ハンダは、溶かしながら被ハン
ダ物に載せてゆくか、これを溶融しておいてその中に被
ハンダ物をディッピングしてゆくかするようにして使用
される。他方、粉末状ハンダは、フラックス等を含む粘
度の高いビヒクルと混練することにより、ペースト状に
して用いられる。ペースト状ハンダの代表的使用例は、
チップマウント方式実装基板におけるチップ部品のハン
ダ付り法であり、これは、スクリーン印刷法によってハ
ンダペーストをIC基板等の回路パターンの必要部分に
塗布し、チップ部品を装着したのち、リフローによりチ
ップ部品を回路パターンにハンダ溶着する方法である。
Solder has long been used as a soldering material for metal materials, electronic components, etc. Solder includes solid solder in the form of a rod or thread, as well as powdered solder. Solid solder includes, for example, indium (In
), which is used in micro-soldering to make minute connections between semiconductor elements and conductors. Solid solder is used either by melting it and placing it on the object to be soldered, or by melting it and then dipping the object to be soldered into it. On the other hand, powdered solder is used in the form of a paste by kneading it with a highly viscous vehicle containing flux or the like. Typical usage examples of paste solder are:
Chip mount method This is a method of soldering chip components on a mounted board. This method involves applying solder paste to the necessary parts of the circuit pattern of an IC board, etc. using a screen printing method, mounting the chip components, and then reflowing the chip components. This is a method of welding the circuit pattern with solder.

このように、従来は、粉末状ハンダにしろ、固形ハンダ
にしろ、−旦熔融することで、目的の溶着強度や導電性
を確保するようにしていたのである。
In this way, conventionally, whether powdered solder or solid solder is used, the desired welding strength and conductivity have been secured by melting the solder once.

従来のインジウム系ハンダは、一般には、インジウム(
In )が低融点(156℃)である性質を利用し、S
n、Pb、Agなどの1種以」−を含む通常のハンダ合
金組成にInを含有させて、ハンダの溶融点を低下させ
るとともに、併せて、加熱によって金属表面に酸化膜が
形成されないようにするものである。なお、インジウム
が良好なぬれ性を有することを利用して、ガラス等への
ぬれ性を向上させるようにする使用例も、一部にはある
Conventional indium-based solder is generally made of indium (
Taking advantage of the property that In ) has a low melting point (156°C), S
By adding In to a normal solder alloy composition containing one or more of n, Pb, Ag, etc., the melting point of the solder is lowered, and at the same time, an oxide film is not formed on the metal surface by heating. It is something to do. Note that there are some usage examples in which the wettability of indium to glass and the like is improved by taking advantage of the good wettability of indium.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上述のごとく、従来のハンダは、使用に際して、200
〜400°Cに一旦加熱し、溶融しなければならないと
いう煩わしさがある。電子部品の実装の面から見れば、
これは、実装部品に熱影響を不可避的に与えると言う問
題をもたらす。インジウムの添加により低温溶融が可能
になったと言っても、上述のような高温度では、依然と
して、母材表面に、ハンダのぬれ性を低下させる酸化膜
を形成させて、ハンダの歩留を悪くさせる懸念を残す。
As mentioned above, when using conventional solder, 200
There is the trouble of having to heat it once to ~400°C and melt it. From the perspective of mounting electronic components,
This brings about the problem that the mounted components are unavoidably affected by heat. Even though the addition of indium has made it possible to melt at low temperatures, the high temperatures described above still form an oxide film on the surface of the base material that reduces solder wettability, resulting in poor solder yield. Leaving you with concerns.

そごで、この発明は、上記問題に鑑めで、加熱熔融する
ことなく、粉末状のまま使用でき、常温圧下で拡散可能
なインジウム系粉末状ハンダを提供することを課題とす
る。
Therefore, in view of the above-mentioned problems, it is an object of the present invention to provide an indium-based powdered solder that can be used in powder form without being heated and melted, and can be diffused at room temperature and pressure.

〔課題を解決するための手段〕[Means to solve the problem]

前記課題を解決するため、この発明にかかるインジウム
系粉末状ハンダは、全体組成の95−t%以上の成分が
インジウムと錫および/または鉛からなり、これら3成
分相互の配合割合を、インジウム15〜85−t%、錫
および/または鉛15〜85吋%とすることにより、粉
末状であって常温圧下による拡散を可能としている。
In order to solve the above-mentioned problems, the indium-based powder solder according to the present invention consists of indium, tin, and/or lead at 95-t% or more of the total composition, and the mixing ratio of these three components is set to 15% of the total composition. By setting the content to 85-t% and 15 to 85 inch% of tin and/or lead, the powder is in powder form and can be diffused under pressure at room temperature.

この発明にかかるインジウム系粉末状ハンダは、全体組
成の95wt%以上(100wt%を含む)が、上記3
者相互の配合割合において、インジウム、錫および/ま
たは鉛からなるものでなければならない。上記3者以外
の成分を5wt%を越えて含むようであると、常温圧下
による拡散が起きないからである。したがって、この発
明にかかるインジウム系粉末状ハンダは、0.5〜5w
t%の範囲内で銀を含むことができる。銀の添加は、粉
末化を容易にする。さらに、電気導通性を高めることに
も寄与する。なお、ビスマスやアンチモンを05〜5w
t%含むこともある。
In the indium-based powder solder according to the present invention, 95 wt% or more (including 100 wt%) of the total composition is the above-mentioned 3.
It must consist of indium, tin and/or lead in the mutual proportions. This is because if the amount of components other than the above three components exceeds 5 wt%, diffusion under normal temperature and pressure will not occur. Therefore, the indium-based powder solder according to the present invention has a power of 0.5 to 5w.
It can contain silver within a range of t%. Addition of silver facilitates powdering. Furthermore, it also contributes to increasing electrical conductivity. In addition, bismuth and antimony are added at 05~5w.
It may also include t%.

上に見たように、この発明にかかるインジウム系粉末ハ
ンダは、3成分相互の配合割合において、インジウムが
15〜85wt%を占めることが必要である。インジウ
ムが15wt%を下回ると、常温圧下により拡散させる
ことが出来ず、インジウムが85iyt%を上回ると、
粉末化ができないからである。
As seen above, in the indium-based powder solder according to the present invention, it is necessary that indium accounts for 15 to 85 wt % in the blending ratio of the three components. When indium is less than 15wt%, it cannot be diffused under normal temperature and pressure, and when indium exceeds 85iyt%,
This is because it cannot be powdered.

上記3成分相互の配合割合において、錫の配合割合は3
5wt%以上であることが好ましく、鉛の配合割合は5
0ivt%以上であることが好ましい。
In the mixing ratio of the above three components, the mixing ratio of tin is 3
It is preferable that it is 5 wt% or more, and the blending ratio of lead is 5 wt% or more.
It is preferable that it is 0ivt% or more.

後に例示する非酸化雰囲気粉末化法(真空粉末化法)に
よって得られるインジウム系粉末状ハンダは、表面が酸
化されていないため、極めて活性に富み、好ましく用い
られるが、このようなものは、インジウムの配合割合が
多くなると、圧下しなくても拡散が起きて、粉末の凝固
が起き易くなるからである。
Indium-based powdered solder obtained by a non-oxidizing atmosphere powdering method (vacuum powdering method), which will be exemplified later, has an unoxidized surface and is therefore highly active and is preferably used. This is because when the blending ratio of is increased, diffusion occurs even without reduction, making it easier for the powder to coagulate.

錫と鉛は、上記配合割合の範囲内で少なくとも一方が配
合されておれば良いが、両者が併せて配合されるときで
も、上記配合割合を満たすようになっている必要がある
。両者が併用されるときに、その原材料として5n−P
b共晶合金の形で配合されても良い。共晶合金における
両者の重量比率は、はぼ錫63:鉛37である。
It is sufficient that at least one of tin and lead is blended within the range of the above-mentioned blending ratio, but even when both are blended together, it is necessary that the above-mentioned blending ratio is satisfied. When both are used together, 5n-P is used as the raw material.
(b) It may be blended in the form of a eutectic alloy. The weight ratio of both in the eutectic alloy is 63 parts tin:37 parts lead.

粉末化は、従来の粉末状ハンダと同様に行うことができ
る。したがって、アトマイズ法等の公知の種々の粉末化
法を用いることができる。また、粒径の大きな粉末を得
る場合には、溶融金属を高所から落下させて数段に設け
たメツシュの中を通ずことにより、粉末に成形すること
も出来る。しかし、これらの方法では、粉末粒子の表面
に薄い酸化膜が出来て、表面活性が低下する可能性があ
るので、表面活性が高いことを望む場合には、表面酸化
膜の生じにくい非酸化雰囲気粉末化法(真空粉末化法)
を採用するのが良い。真空粉末化法とは、たとえば、第
り図にみるような方法である。すなわち、溶解炉1内で
ハンダ合金を溶融し、熔融したハンダ合金をノズル2を
通して真空タンク3内の高速回転盤4に滴下するのであ
る。′/′g融ハンダ合金は、高速回転盤4の遠心力で
真空タンク3の内壁面に向かって飛散し凝固して、粉末
状となる。得られた粉末状ハンダ5は、コーン状になっ
たタンク3の底から取り出される。図中、6はバルブ7
を備えた取出口である。タンク3内を真空にするのは、
ハンダ合金の酸化を防止するためである。この場合、必
要に応じ、真空にしたのち、Arガス等でタンク内を置
換することも行われる。ハンダ合金の粒度は、用途に応
じて適宜に設定されるが、平均粒径500μm以下とす
るのが一般的であり、用途によっては、数1程度のもの
でも良い。
Powderization can be performed in the same manner as conventional powdered solder. Therefore, various known powdering methods such as atomization can be used. Further, when obtaining powder with a large particle size, it is also possible to form the molten metal into powder by dropping it from a high place and passing it through a mesh provided in several stages. However, with these methods, a thin oxide film is formed on the surface of the powder particles, which may reduce surface activity. Therefore, if high surface activity is desired, use a non-oxidizing atmosphere that does not easily form a surface oxide film. Powdering method (vacuum powdering method)
It is better to adopt The vacuum powderization method is, for example, a method as shown in Figure 3. That is, a solder alloy is melted in a melting furnace 1, and the molten solder alloy is dropped through a nozzle 2 onto a high-speed rotating disk 4 in a vacuum tank 3. The '/'g molten solder alloy is scattered toward the inner wall surface of the vacuum tank 3 by the centrifugal force of the high-speed rotary plate 4, solidifies, and becomes powder. The obtained powdered solder 5 is taken out from the bottom of the cone-shaped tank 3. In the figure, 6 is valve 7
The outlet is equipped with a To create a vacuum inside tank 3,
This is to prevent oxidation of the solder alloy. In this case, if necessary, after creating a vacuum, the inside of the tank may be replaced with Ar gas or the like. The particle size of the solder alloy is appropriately set depending on the application, but the average particle size is generally 500 μm or less, and depending on the application, it may be on the order of several 1.

後述のように、常温下での圧下で粉末粒子個々を拡散接
合するためには、展延性に冨み、がっ、酸化膜の影響を
あまり受けずに拡散して、粉末粒子が互いに接合する金
属が必要である。拡散現象は、熱と圧力と時間のファク
ターで起こり、はとんどの金属においてその現象をみる
ことができるが、常温下で若干の圧力を加えることで拡
散が起きる金属は、金やインジウムのようにごく少数で
ある。この発明では、よりコストを下げるため、比較的
安価なインジウムを採用している。
As will be described later, in order to diffusion bond individual powder particles under pressure at room temperature, it is necessary to use a material that is highly malleable and diffuses without being affected by the oxide film, allowing the powder particles to bond to each other. Requires metal. Diffusion phenomenon occurs due to the factors of heat, pressure, and time, and can be seen in most metals, but metals such as gold and indium that can undergo diffusion by applying a slight pressure at room temperature There are only a few. In this invention, in order to further reduce costs, relatively inexpensive indium is used.

〔作   用〕[For production]

通常のハンダ合金組成に、インジウムを15〜85wt
%含有させると、粉末化が容易である上に、得られた粉
末状ハンダが、常温下での加圧により拡散を起こして、
粉末粒子が互いに接合するとともに導通性を持つように
なるのである。
15-85wt of indium is added to the normal solder alloy composition.
%, it is easy to powderize the solder, and the obtained powdered solder causes diffusion when pressurized at room temperature.
The powder particles bond together and become electrically conductive.

この発明にかかるインジウム系粉末状ハンダは、粉末状
であるが、ペースト状にしなくても、従来のペースト状
ハンダと同様にプリント回路基板の回路パターン形成等
に使用でき、この場合、加熱を必要とせず、ロール等で
加圧することで、粉末粒子に拡散を起こさせ、互いに接
合させるとともに導通性を持たせることができる。具体
的に述べると、このインジウム系粉末状ハンダを、基板
上に粉末のまま電路を描くように載置した後、常温下に
おいて、基板を破壊しない程度の圧力で粉末状ハンダを
加圧し、個々の粉末粒子をつぶし引き伸ばすことで粉末
粒子同士を密着させ、拡散助長により一体化を図るので
ある。上記回路形成のほかに、通常のろう接用途に用い
ることもできることは言うまでもない。
Although the indium-based powder solder according to the present invention is in powder form, it can be used for forming circuit patterns on printed circuit boards in the same way as conventional paste solder without being made into a paste. In this case, heating is not required. By applying pressure with a roll or the like instead of using a roll, it is possible to cause the powder particles to diffuse, bond them to each other, and provide conductivity. Specifically, this indium-based powdered solder is placed on a board as a powder to draw an electric circuit, and then the powdered solder is pressed at room temperature with a pressure that does not destroy the board, and the powdered solder is individually separated. By crushing and stretching the powder particles, the powder particles are brought into close contact with each other and integrated by promoting diffusion. It goes without saying that in addition to the circuit formation described above, it can also be used for ordinary soldering purposes.

この発明にかかるインジウム系粉末状ハンダの用途は、
上記のものに限定されない。たとえば、面発熱体、室内
アンテナ、電磁シールドや静電防止材等にも使用できる
。使用温度は、常温に限定されることもない。
The uses of the indium-based powder solder according to this invention are as follows:
Not limited to the above. For example, it can be used for surface heating elements, indoor antennas, electromagnetic shields, antistatic materials, etc. The operating temperature is not limited to room temperature either.

〔実 施 例〕〔Example〕

以下に、この発明にかかるインジウム系粉末状ハンダを
、参考例、実施例および比較例を参照しつつ、詳細に説
明する。
In the following, the indium-based powder solder according to the present invention will be explained in detail with reference to Reference Examples, Examples, and Comparative Examples.

以下では、まず、インジウムの含有量が粉末化に与える
影響を見た。
Below, we first looked at the effect of indium content on powdering.

参考例1〜8 In−3n系において、インジウムの配合量を変えなが
ら、参考例1〜8のインジウム系ハンダを装造して、粉
末化が出来るか否かを見た。各側において、インジう人
以外の金属は、銀2wt%、残部が錫である。粉末化は
、第1図の装置を用いて行った。得られた各ハンダの粒
度は95μmアンダーであった。
Reference Examples 1 to 8 In the In-3n system, the indium solders of Reference Examples 1 to 8 were packaged while changing the amount of indium to see whether powdering could be achieved. On each side, the metals other than the metal are 2 wt% silver and the balance tin. Powderization was performed using the apparatus shown in FIG. The particle size of each of the obtained solders was under 95 μm.

粉末化を行った結果を第1−1表に示す。The results of powdering are shown in Table 1-1.

参考例9〜15 In−Pb系において、インジウムの配合量を変えなが
ら、参考例9〜15のインジウム系ハンダを製造して、
粉末化が出来るか否かを見た。各別において、インジウ
ム以外の金属は、銀2wt%、残部が鉛である。粉末化
は、第1図の装置を用いて行った。得られた各ハンダの
粒度は90μmアンダーであった。
Reference Examples 9 to 15 In the In-Pb system, indium-based solders of Reference Examples 9 to 15 were manufactured while changing the blending amount of indium,
I looked to see if it could be made into powder. In each case, the metal other than indium was 2 wt% silver, and the balance was lead. Powderization was performed using the apparatus shown in FIG. The particle size of each of the obtained solders was under 90 μm.

粉末化を行った結果を第1−2表に示す。The results of powdering are shown in Table 1-2.

第1表の結果より、粉末粒子の表面が酸化されていない
インジウム系合金において、In−3n系合金では、イ
ンジウムの配合割合を70wt%以上にすると粉末化が
不可能であり、In−Pb系合金では、インジウムの配
合割合を55wt%以上にすると粉末化が不可能である
ことが分かる。
From the results in Table 1, in the case of indium-based alloys whose powder particle surfaces are not oxidized, it is impossible to powderize the In-3n-based alloy when the blending ratio of indium is 70 wt% or more, and the In-Pb-based alloy It can be seen that it is impossible to powder an alloy when the blending ratio of indium is 55 wt% or more.

実施例1〜9、比較例1〜8 つぎに、インジウム量と拡散性について見た、実施例1
〜9と比較例1〜8を説明する。
Examples 1 to 9, Comparative Examples 1 to 8 Next, Example 1 looked at the amount of indium and diffusivity.
-9 and Comparative Examples 1-8 will be explained.

エポキシ系樹脂基板上にアルミ薄板(厚さ0゜07mm
)を張りつけ、縦35×横2+uの長方形の溝を切り抜
き、その中へエポキシ樹脂系接着剤(セメダイン■製の
2液常温硬化型セメダインハイクイツクC)を塗り込み
、その後、第2表記載のハンダ合金組成を持つ実施例1
〜9.比較例1〜8の各粉末状ハンダをふりかけ、接着
剤の硬化完了後アルミ薄板を剥ぎ取り、基板上に縦35
×横2鶴の長方形のハンダ粉末帯を形成した。この場合
、実施例1.5のハンダの粉末化はアトマイズ法で行い
、その他のハンダの粉末化は第1図の装置4 置を用いて行った。
Aluminum thin plate (thickness 0゜07mm) on epoxy resin substrate
), cut out a rectangular groove measuring 35 x 2 + u, and fill it with epoxy resin adhesive (Cemedine Hi-Quick C, a two-component room temperature curing type manufactured by Cemedine ■). Example 1 with solder alloy composition
~9. Sprinkle each powdered solder of Comparative Examples 1 to 8, and after the adhesive has hardened, peel off the aluminum thin plate and place it vertically on the board.
A rectangular solder powder band with two horizontal cranes was formed. In this case, the solder of Example 1.5 was pulverized by the atomization method, and the other solders were pulverized using the apparatus 4 shown in FIG.

そのままでは、どの粉末についても導通が認められなか
ったため、第2図にみるように、試料(基板)11に対
し平ロールおよび網目ロール12によって若干の圧力(
ロール軸両端での(I:1重10kg、合計20kg)
を加え、試料(基板)11を圧下した。図中、13は圧
下前のハンダを示し、14は圧下されたハンダを示す。
Since conductivity was not observed for any of the powders as they were, as shown in FIG. 2, a slight pressure (
At both ends of the roll axis (I: 1 weight 10 kg, total 20 kg)
was added, and the sample (substrate) 11 was pressed down. In the figure, 13 indicates solder before being rolled down, and 14 indicates solder that has been rolled down.

この加圧後の通電性を簡易テスターによって測定した。The conductivity after this pressurization was measured using a simple tester.

圧力、通電性についての測定結果を第2表に示す。Table 2 shows the measurement results for pressure and electrical conductivity.

第2表の結果より、インジウムを15〜85wL%の範
囲内で含む、この発明のインジウム系粉末状ハンダは、
良好な導通性を示したが、インジウムを上記範囲外で含
む比較例1.2や、インジウムに錫・鉛層外の成分(亜
鉛)を配合した比較例3や、インジウムを全く含まない
比較例4〜8は、導通性が乏しいか全く無く、常温圧下
による拡散の起きていないことが分かる。
From the results in Table 2, the indium-based powdered solder of the present invention, which contains indium in the range of 15 to 85 wL%,
Although good conductivity was shown, Comparative Example 1.2 contains indium outside the above range, Comparative Example 3 contains indium with a component outside the tin/lead layer (zinc), and Comparative Example does not contain indium at all. Nos. 4 to 8 had poor or no conductivity, indicating that no diffusion occurred under normal temperature and pressure.

参考のために、この発明にかかるインジウム系粉末状ハ
ンダが、実際の使用に際してどのように経時的な変化を
したかを見た。
For reference, we looked at how the indium-based powder solder according to the present invention changed over time during actual use.

実施例10〜13 インジウムを35〜50wt%含む、粒度95μアンダ
ーの実施例10〜13にかかるインジウム系粉末状ハン
ダを三井東圧化学@製の常温硬化型接着剤を用いて基板
上に張りつけた後、ロールで加圧し、第3図にみるよう
な回路を備えた基板を得た。そして、A−8間の抵抗を
、製造直後、18日後、25日後に簡易テスターで測定
した。測定結果を、ハンダ合金組成、回路厚さなどとと
もに第3表に示す。
Examples 10 to 13 The indium-based powdered solder of Examples 10 to 13 containing 35 to 50 wt% of indium and having a particle size of less than 95 μm was pasted onto a substrate using a room temperature curing adhesive manufactured by Mitsui Toatsu Chemical@. Thereafter, it was pressed with a roll to obtain a substrate with a circuit as shown in FIG. Then, the resistance between A-8 was measured using a simple tester immediately after manufacture, 18 days later, and 25 days later. The measurement results are shown in Table 3 along with the solder alloy composition, circuit thickness, etc.

■ 第3表にみるように、実施例のインジウム系粉末状ハン
ダは、いずれも、経時的な抵抗変化が小さく、回路とし
て好適に用いることができる。
(2) As shown in Table 3, all of the indium-based powder solders of the Examples have small resistance changes over time and can be suitably used as circuits.

〔発明の効果〕〔Effect of the invention〕

この発明にかかるインジウム系粉末状ハンダは、上述の
ように構成されているため、加熱熔融することなく、常
温下で使用することができ、そのように用いても導電性
に問題がない。
Since the indium-based powder solder according to the present invention is configured as described above, it can be used at room temperature without being heated and melted, and there is no problem with conductivity even when used in this way.

特に、この発明にかかるインジウム系粉末状ハンダは、
粉末状であるので、つぎのよう効果を有する。ずなわち
、使用する場合の形状を太細、直曲等自由自在に展開で
きる。凹凸部や穴等であっても配置できる。空気輸送等
による輸送が容易である。表面積が多くなるため、表面
活性が増し、他物体との濡れ性が良く、粉末粒子が凝集
(密着)し易い。供給用等のホッパ内では、ブリッジを
作り難い。リフローして使用する場合に、低温で溶解で
きる。粒子形状を球状とした場合、粉末粒子細々は、ど
のように置かれても同じ形をとるから、置き姿勢が安定
し、かつ、外力によって均一に潰れ易く、拡散効果が向
」−する。
In particular, the indium-based powder solder according to the present invention is
Since it is in powder form, it has the following effects. In other words, the shape when used can be freely developed, such as thick and thin, straight curved, etc. It can be placed even on uneven parts or holes. It is easy to transport by air transport, etc. Since the surface area increases, surface activity increases, wettability with other objects is good, and powder particles tend to aggregate (adhere). It is difficult to create a bridge in a supply hopper. Can be melted at low temperatures when used by reflow. When the particle shape is spherical, the powder particles have the same shape no matter how they are placed, so the placement position is stable, and they are easily crushed uniformly by external force, improving the diffusion effect.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、粉末状ハンダの製造装置を示す簡略断面図、
第2図は、この発明にかかるインジウム系粉末状ハンダ
の使用例を示す側面図、第3図は、この発明の実施例に
かかるハンダを用いて形成された回路バクーンを示す平
面図である。 11・・・基板 12・・・ロール 13・・・圧下前
のハンダ 14・・・圧下後のハンダ 代理人 弁理士  松 本 武 彦
FIG. 1 is a simplified cross-sectional view showing an apparatus for manufacturing powdered solder;
FIG. 2 is a side view showing an example of the use of the indium-based powder solder according to the present invention, and FIG. 3 is a plan view showing a circuit package formed using the solder according to the embodiment of the present invention. 11... Board 12... Roll 13... Solder before rolling 14... Solder agent after rolling Patent attorney Takehiko Matsumoto

Claims (1)

【特許請求の範囲】 1 全体組成の95wt%以上の成分がインジウムと錫
および/または鉛からなり、これら3成分相互の配合割
合を、インジウム15〜85wt%、錫および/または
鉛15〜85wt%とすることにより、粉末状であって
常温圧下による拡散を可能とするインジウム系粉末状ハ
ンダ。 2 錫の配合割合が35wt%以上である請求項1記載
のインジウム系粉末状ハンダ。 3 鉛の配合割合が50wt%以上である請求項1また
は2記載のインジウム系粉末状ハンダ。 4 銀を0.5〜5wt%含む請求項1から3までのい
ずれかに記載のインジウム系粉末状ハンダ。
[Claims] 1. 95 wt% or more of the entire composition consists of indium, tin and/or lead, and the mixing ratio of these three components is 15 to 85 wt% indium and 15 to 85 wt% tin and/or lead. Indium-based powdered solder is powdered and can be diffused under pressure at room temperature. 2. The indium-based powder solder according to claim 1, wherein the blending ratio of tin is 35 wt% or more. 3. The indium-based powder solder according to claim 1 or 2, wherein the blending ratio of lead is 50 wt% or more. 4. The indium-based powder solder according to any one of claims 1 to 3, containing 0.5 to 5 wt% of silver.
JP3911789A 1989-02-17 1989-02-17 Indium series powdery solder Pending JPH02217193A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3911789A JPH02217193A (en) 1989-02-17 1989-02-17 Indium series powdery solder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3911789A JPH02217193A (en) 1989-02-17 1989-02-17 Indium series powdery solder

Publications (1)

Publication Number Publication Date
JPH02217193A true JPH02217193A (en) 1990-08-29

Family

ID=12544141

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3911789A Pending JPH02217193A (en) 1989-02-17 1989-02-17 Indium series powdery solder

Country Status (1)

Country Link
JP (1) JPH02217193A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0615476A (en) * 1992-05-04 1994-01-25 Indium Corp Of America:The Alloy containing tin, silver and indium but free from lead
JPH0788681A (en) * 1993-06-16 1995-04-04 Internatl Business Mach Corp <Ibm> Lead-free high temperature tin-based multi-component solder
US6253988B1 (en) * 1999-03-29 2001-07-03 Antaya Technologies Corporation Low temperature solder
WO2006028668A1 (en) * 2004-09-03 2006-03-16 Intel Corporation Tin/indium lead-free solders for low stress chip attachment
US7776651B2 (en) 2003-03-31 2010-08-17 Intel Corporation Method for compensating for CTE mismatch using phase change lead-free super plastic solders
WO2011027820A1 (en) * 2009-09-04 2011-03-10 千住金属工業株式会社 Lead-free solder alloy, joining member and manufacturing method thereof, and electronic component
WO2011145591A1 (en) * 2010-05-17 2011-11-24 セントラル硝子株式会社 Lead-free solder composition for vehicle
US8771592B2 (en) 2011-02-04 2014-07-08 Antaya Technologies Corp. Lead-free solder composition

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0615476A (en) * 1992-05-04 1994-01-25 Indium Corp Of America:The Alloy containing tin, silver and indium but free from lead
US5580520A (en) * 1992-05-04 1996-12-03 The Indium Corporation Of America Lead-free alloy containing tin, silver and indium
JPH0788681A (en) * 1993-06-16 1995-04-04 Internatl Business Mach Corp <Ibm> Lead-free high temperature tin-based multi-component solder
US6253988B1 (en) * 1999-03-29 2001-07-03 Antaya Technologies Corporation Low temperature solder
US7776651B2 (en) 2003-03-31 2010-08-17 Intel Corporation Method for compensating for CTE mismatch using phase change lead-free super plastic solders
WO2006028668A1 (en) * 2004-09-03 2006-03-16 Intel Corporation Tin/indium lead-free solders for low stress chip attachment
WO2011027820A1 (en) * 2009-09-04 2011-03-10 千住金属工業株式会社 Lead-free solder alloy, joining member and manufacturing method thereof, and electronic component
CN102596487A (en) * 2009-09-04 2012-07-18 千住金属工业株式会社 Lead-free solder alloy, joining member and manufacturing method thereof, and electronic component
JP5041102B2 (en) * 2009-09-04 2012-10-03 千住金属工業株式会社 Lead-free solder alloy, joining member and manufacturing method thereof, and electronic component
US9773721B2 (en) 2009-09-04 2017-09-26 Senju Metal Industry Co., Ltd. Lead-free solder alloy, connecting member and a method for its manufacture, and electronic part
WO2011145591A1 (en) * 2010-05-17 2011-11-24 セントラル硝子株式会社 Lead-free solder composition for vehicle
US8771592B2 (en) 2011-02-04 2014-07-08 Antaya Technologies Corp. Lead-free solder composition
US9975207B2 (en) 2011-02-04 2018-05-22 Antaya Technologies Corporation Lead-free solder composition

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