JPH0221740U

JPH0221740U -

Info

Publication number: JPH0221740U
Application number: JP10025688U
Authority: JP
Priority date: 1988-07-28
Filing date: 1988-07-28
Publication date: 1990-02-14

Description

[Brief explanation of drawings]

第１図〜第３図は本考案の一実施例を示したも
ので、第１図は薄膜デバイス製造設備の平面図、
第２図は第１図の部の拡大図、第３図は第２図
の―線に沿う断面図である。第４図は薄膜デ
バイスの一種である薄膜トランジスタの断面図、
第５図は薄膜トランジスタの製造工程図、第６図
および第７図は従来の薄膜デバイス製造設備の平
面図およびその一部の斜視図である。１……基板、１０……基板キヤリア、１１……
洗浄装置、１２……レジストマスク形成装置、１
２ａ……レジスト塗布部、１２……露光処理部、
１２ｃ……現像処理部、１３……ドライエツチン
グ装置、１４……ウエツトエツチング装置、１５
……スパツタ装置、１６……プラズマＣＶＤ装置
、１７……レジスト剥離装置、３０……ループ状
コンベア、３２……基板授受機構、３３……中継
コンベア、３５ａ……搬入側移載機構、３５ｂ…
…搬出側移載機構と、３７ａ……搬入機構、３７
ｂ……搬出機構、４０……未処理基板搬入コンベ
ア、４１……移載機構、４２……完成品搬出コン
ベア、４３……搬出機構。 1 to 3 show an embodiment of the present invention, and FIG. 1 is a plan view of thin film device manufacturing equipment;
FIG. 2 is an enlarged view of the portion shown in FIG. 1, and FIG. 3 is a sectional view taken along the line -- in FIG. Figure 4 is a cross-sectional view of a thin film transistor, which is a type of thin film device.
FIG. 5 is a manufacturing process diagram of a thin film transistor, and FIGS. 6 and 7 are a plan view and a perspective view of a part of conventional thin film device manufacturing equipment. 1... Board, 10... Board carrier, 11...
Cleaning device, 12...Resist mask forming device, 1
2a...Resist coating section, 12...Exposure processing section,
12c...Development processing section, 13...Dry etching device, 14...Wet etching device, 15
. . . Sputtering device, 16 .
...Export side transfer mechanism, 37a...Carry-in mechanism, 37
b... Carrying-out mechanism, 40... Unprocessed substrate carrying-in conveyor, 41... Transfer mechanism, 42... Finished product carrying-out conveyor, 43... Carrying-out mechanism.

Claims

[Scope of utility model registration request]

A cleaning device, a film deposition device for conductive films, insulating films, and semiconductor films, a resist mask forming device, an etching device, and a resist stripping device are installed along a loop-shaped conveyor that circulates substrates forming thin film devices. are placed between each device and the loop-shaped conveyor, and the substrates conveyed on the loop-shaped conveyor are taken into the device, and the substrates processed by this device are transferred onto the loop-shaped conveyor. 1. A thin film device manufacturing facility characterized by being provided with a substrate transfer mechanism for returning the substrate.