JPH0222521B2 - - Google Patents
Info
- Publication number
- JPH0222521B2 JPH0222521B2 JP55016807A JP1680780A JPH0222521B2 JP H0222521 B2 JPH0222521 B2 JP H0222521B2 JP 55016807 A JP55016807 A JP 55016807A JP 1680780 A JP1680780 A JP 1680780A JP H0222521 B2 JPH0222521 B2 JP H0222521B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- present
- properties
- shaped body
- ring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 claims description 11
- 239000000696 magnetic material Substances 0.000 claims description 8
- 229910000859 α-Fe Inorganic materials 0.000 claims description 6
- 239000000463 material Substances 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 230000003287 optical effect Effects 0.000 claims description 2
- 239000002344 surface layer Substances 0.000 claims 2
- 230000035699 permeability Effects 0.000 description 6
- 229910003460 diamond Inorganic materials 0.000 description 4
- 239000010432 diamond Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000005224 laser annealing Methods 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
- H01F1/34—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials non-metallic substances, e.g. ferrites
- H01F1/342—Oxides
- H01F1/344—Ferrites, e.g. having a cubic spinel structure (X2+O)(Y23+O3), e.g. magnetite Fe3O4
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Soft Magnetic Materials (AREA)
- Hard Magnetic Materials (AREA)
Description
【発明の詳細な説明】
本発明は磁気特性の劣化や回復を目的とした処
理方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a processing method for deteriorating and restoring magnetic properties.
従来より、軟磁性材料の磁気特性は、材料の機
械加工などの影響により大巾に変化することが知
られており、その対策に種々の検討がなされてい
る。例えば、磁気ヘツド用材料では機械加工によ
り透磁率が大巾に劣化し、それを回復させるため
に表面をエツチングするとか、焼鈍するとか、又
は、非常に長時間（１〜２時間）かけて、特性の
劣化の生じないような微少加工を行うなどをして
おり、磁気ヘツド用フエライト等の加工において
はかかる点に対する改善が強く望まれていた。 It has been known that the magnetic properties of soft magnetic materials vary widely due to the influence of material machining, etc., and various studies have been made to counter this. For example, in magnetic head materials, the magnetic permeability is greatly degraded by machining, and in order to restore it, the surface must be etched, annealed, or a very long period of time (1 to 2 hours) is required. Micro-machining has been carried out to prevent deterioration of characteristics, and improvements in this respect have been strongly desired in the machining of ferrite for magnetic heads.
本発明は、このような欠点を改良するとともに
磁気特性に対する制御を容易にならしめるもので
ある。 The present invention aims to improve these drawbacks and facilitate control over magnetic properties.
本発明は、機械加工などの終了した軟磁性材料
の表面に強力に光エネルギー等のエネルギー線投
入し、瞬間的に表面を加熱し、又、冷却し、その
瞬間的な熱変化により、磁気特性を制御するもの
である。 In the present invention, energy beams such as optical energy are powerfully injected onto the surface of a soft magnetic material that has been machined, instantaneously heating and cooling the surface, and the instantaneous thermal change changes the magnetic properties. It controls the
最近、特に半導体のSi単結晶の表面処理法とし
て注目されているレーザーアニーリング法があ
る。このようなレーザーアニーリング法では、単
結晶表面の再結晶化を行い、Si単結晶の表面の結
晶性を改善するのが目的であるのに対し、本発明
は軟磁性材料表面に近在するストレス層の解除に
より、軟質磁性材料のバルク全体の磁気特性を制
御するものであり、基本的に異なつた技術思想で
ある。 Laser annealing has recently been attracting attention as a surface treatment method for semiconductor single crystals of Si. In such laser annealing methods, the purpose is to recrystallize the single crystal surface and improve the crystallinity of the Si single crystal surface. By releasing the layers, the magnetic properties of the entire bulk of the soft magnetic material are controlled, and this is a fundamentally different technical idea.
以下に実施例を交えながら本発明の特徴を述べ
る。 The features of the present invention will be described below with reference to examples.
Mn−Znフエライト（HPF4M2）より、厚さ
0.2mm、外径８mm、内径４mmのリング状体を加工
形成した。最終的には3μｍのダイヤモンドペー
ストを用いて鏡面仕上げを行なつた。この時の透
磁率（0.1MHz）は約2300であつた。これのリン
グ状体の表面を60℃の熱リン酸で約1μｍをエツ
チングした所、透磁率は4100に回復した。しか
し、この方法では表面の凹凸は約0.3μｍと大き
く、最初の凹凸0.05μｍ以下の鏡面状からみると
非常に荒れており、磁気ヘツド等にとつては不都
合な表面となつていた。 Thickness from Mn−Zn ferrite (HPF4M2)
A ring-shaped body with a diameter of 0.2 mm, an outer diameter of 8 mm, and an inner diameter of 4 mm was formed. Finally, a mirror finish was achieved using 3 μm diamond paste. The magnetic permeability (0.1MHz) at this time was approximately 2300. When the surface of this ring-shaped body was etched by about 1 μm with hot phosphoric acid at 60°C, the magnetic permeability was restored to 4100. However, with this method, the surface irregularities were as large as about 0.3 μm, and compared to the initial mirror surface of 0.05 μm or less, the surface was extremely rough, making it inconvenient for magnetic heads and the like.
一方、上記と同様の同一形状のリング状体を、
3μｍのダイヤモンドペーストで鏡面仕上げした
後、いわゆるメカノケミカルラツピング（SiO2
使用）を約2.5時間かけて処理し、仕上げたもの
の特性は約4050で秀れていたが、この方法は非常
に長時間かかることが欠点である。このように、
従来の方法では、磁気特性の回復はできるが他に
不都合が発生していた。 On the other hand, a ring-shaped body of the same shape as above,
After mirror finishing with 3 μm diamond paste, so-called mechanochemical wrapping (SiO 2
It took about 2.5 hours to process and the finished product had excellent properties with a rating of about 4050, but the disadvantage of this method is that it takes a very long time. in this way,
With conventional methods, although the magnetic properties can be restored, other problems have occurred.
次に、本発明の方法を適用した例を述べる3μ
ｍのダイヤモンドペーストで仕上げた磁気材料の
リング状体を、N2気流中に保持した後、300Wの
ハロゲンランプ二本で両側より同時に1.5秒照射
した所、透磁率は2100から4500に回復した。この
とき表面の劣化は認められなかつた。さらに、こ
のリング状体を空気中に保持し、100Wのハロゲ
ンランプで２分照射を行つた所、透磁率は3700、
４分行つた所2200と減少し、透磁率の制御が簡単
にできた。従つて、適正な雰囲気下で短時間、４
〜５分以下の処理で終り、従来のように長時間か
かることがなくなる。このため、制御も楽で、正
確になつた。 Next, we will describe an example of applying the method of the present invention.
After holding a ring-shaped body of magnetic material finished with a diamond paste of 500 mL in a N2 gas flow, the magnetic permeability recovered from 2100 to 4500 when it was irradiated with two 300 W halogen lamps for 1.5 seconds from both sides at the same time. At this time, no surface deterioration was observed. Furthermore, when this ring-shaped body was held in air and irradiated with a 100W halogen lamp for 2 minutes, the magnetic permeability was 3700.
After 4 minutes, it decreased to 2200, making it easy to control the magnetic permeability. Therefore, under suitable atmosphere for a short time, 4
The process takes less than ~5 minutes, so it no longer takes a long time as in the past. This made control easier and more accurate.
本発明の方法は、ハロゲンランプに限らず、レ
ザーや赤外線ランプあるいは電子ビーム等によつ
ても行える。又、既に説明したようにストレス層
の制御により、磁気特性を変化させること（例え
ばエツチング）は、一般に公知であり、従つて本
発明を上記フエライト以外の軟磁性材料にも応用
できるのは明らかである。 The method of the present invention can be carried out not only with a halogen lamp but also with a laser, an infrared lamp, an electron beam, or the like. Furthermore, as already explained, it is generally known that the magnetic properties can be changed by controlling the stress layer (e.g., etching), so it is obvious that the present invention can be applied to soft magnetic materials other than the above-mentioned ferrite. be.
ところで、側面鏡面に仕上げて形成された
VTR用の磁気ヘツドの特性は、上記のリング状
体と同様に劣化したものである。そしてこの
VTR用磁気ヘツドは一部にギヤツプがあり、こ
のギヤツプにガラスが入つている。したがつてこ
の特性の回復は、ギヤツプにガラスが入つている
ため、エツチングや高温の熱処理が難しく、約
400℃での熱処理がなされているが特性のバラツ
キが大きかつた。またダイヤモンド刃で切断した
ままのVTR用磁気ヘツドにおいても同じような
特性バラツキや劣化が認められて、この改善が望
まれていた。本発明の方法を適用すると、このよ
うなVTR用磁気ヘツドにおいても前記のリング
状体とほぼ同一条件で、ヘツドの特性が制御で
き、特性の均質化が行え、ペアーリングが容易に
なるなどの効果が発揮される。本発明を用いれば
磁気ヘツド側面の表面性の変化はなく、ギヤツプ
部のガラスは光を透過しここでの昇温が起らない
ため、ギヤツプの変化も認められず極めて好都合
である。 By the way, the sides are finished with a mirror surface.
The characteristics of the magnetic head for VTRs have deteriorated in the same way as the ring-shaped body described above. and this
A magnetic head for a VTR has a gap in part, and this gap is filled with glass. Therefore, since the gap contains glass, it is difficult to restore this property by etching or high-temperature heat treatment.
Although heat treatment was carried out at 400℃, there were large variations in properties. Furthermore, similar characteristic variations and deterioration have been observed in magnetic heads for VTRs that have been cut with diamond blades, and improvements have been desired. By applying the method of the present invention, the characteristics of the head can be controlled under almost the same conditions as the ring-shaped body described above, and the characteristics can be made homogeneous, making pairing easier. The effect is demonstrated. When the present invention is used, there is no change in the surface properties of the side surfaces of the magnetic head, and since the glass in the gap part transmits light and no temperature rise occurs there, no change in the gap is observed, which is extremely convenient.
以上の説明で明らかなように本発明の方法によ
れば、従来難しかつた軟磁性材料の磁気特性の制
御を容易に行うことができ、軟磁性材料の処理に
すぐれた工業的価値を発揮するものである。 As is clear from the above explanation, according to the method of the present invention, it is possible to easily control the magnetic properties of soft magnetic materials, which has been difficult in the past, and it exhibits excellent industrial value in processing soft magnetic materials. It is something.
Claims (1)
線を短時間注入することにより、表面層のみを加
熱し、前記フエライト材料の磁気特性を変化させ
ることを特徴とする磁性材料の処理方法。1. A method for processing a magnetic material, which comprises heating only the surface layer of the ferrite material by injecting optical energy rays into only the surface layer of the ferrite material for a short period of time, thereby changing the magnetic properties of the ferrite material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1680780A JPS56114305A (en) | 1980-02-13 | 1980-02-13 | Treating method for magnetic material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1680780A JPS56114305A (en) | 1980-02-13 | 1980-02-13 | Treating method for magnetic material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56114305A JPS56114305A (en) | 1981-09-08 |
| JPH0222521B2 true JPH0222521B2 (en) | 1990-05-18 |
Family
ID=11926414
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1680780A Granted JPS56114305A (en) | 1980-02-13 | 1980-02-13 | Treating method for magnetic material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56114305A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101071904B1 (en) * | 2009-05-18 | 2011-10-11 | 한국수력원자력 주식회사 | Method for improving electromagnetic properties of soft magnetic materials using an electron beam treatment technique |
-
1980
- 1980-02-13 JP JP1680780A patent/JPS56114305A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56114305A (en) | 1981-09-08 |
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