JPH02230783A - semiconductor laser equipment - Google Patents
semiconductor laser equipmentInfo
- Publication number
- JPH02230783A JPH02230783A JP4982389A JP4982389A JPH02230783A JP H02230783 A JPH02230783 A JP H02230783A JP 4982389 A JP4982389 A JP 4982389A JP 4982389 A JP4982389 A JP 4982389A JP H02230783 A JPH02230783 A JP H02230783A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- pair
- optical
- laser device
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、複数レーザビームを出射する半導体レーザ装
置に関する.
〔従来の技術〕
光ディスク等の光応用機器において、マルチビーム半導
体レーザ装置の利用が検討され始めている。複数のレー
ザビームに異なる機能を割り振ることによって,光応用
機優の多機能・高速化を目指している.
従来のマルチビーム半導体レーザ装置は、例えばプロシ
ーデイングス・オブ・インターナショナル・シンポジウ
ム・オン・オプテイ力ル メモリ; 1987年,ジャ
パニーズ ジャーナル オブアプライド フイジイツク
ス,26巻(1987年)サブルメント2 6 − 4
Proc.Int.Symp.on Optical
Memory, 1987, Japanese Jo
urnal of AppliedPhysics,
Vol.26 (1987)Supplement 2
6−4や1988年春季第35回応用物理学関係連合講
演会講演予稿集,p.El98,講演番号3 0 p
− Z Q − 31C記載のようなハイブリッド型レ
ーザアレイが知られている.本レーザ装置は一対の半導
体レーザの電極面同士を互いに対向させた構造を特徴と
し、熱干渉を起こさずにビーム間隔を数10μmまで近
接させ得る.ビーム間隔は、光応用機能の光学系を小型
化するためにできる限り近接させることが望ましい.
ところで、前述の光応用機器ではビーム毎に機能が異な
るので、各ビームの光出力を独立に検出しレーザ各々を
個別に制御しなければならない.しかし上記の装置自身
は光検出機能を持っていないので、装置外部に光検出素
子(受光素子)とこれヘビームを導くための光学系を設
ける必要があり,機器のサイズが大きくなるという問題
があった.光応用機器を小型化するためには、レーザ装
置内部に受光素子を設けることが必須である.レーザ装
置内部に受光素子を配置する方法に関しては、従来のシ
ングルビーム半導体レーザ装置のものが知られている.
例えば特開昭60−12786号公報に記載のように、
ビーム出射方向に対して受光素子(チップサイズ約1■
角)の受光面(数100μmφ)が凡そ垂直になるよう
に配置していた.
この方法を上記マルチビーム半導体レーザ装置に適用し
、受光素子を並列に並べた図を第6図に示す.第6図に
おいて、101,102はレーザ、103,104はサ
ブマウント.105,106はマウント,1o7は台座
、108,109は受光素子110,111はそれぞれ
受光素子108,109の受光面である.図から明らか
な様に、この方法では、レーザ101,102同士のビ
ーム間隔は約1mmまで離れてしまう.したがって、レ
ーザ装置自体と光応用機器の光学系のサイズを小型化で
きないという問題がある.さらに、ビームは数10’の
拡がり角度で出射するので、レーザ101のビームが受
光面111に,レーザ102のビームが受光面110に
入射して、大きなクロストークが生じる問題がある.す
なわち、従来の受光素子配置方法をマルチビーム半導体
レーザ装置に流用しても、各ビーム独立検出はできない
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a semiconductor laser device that emits multiple laser beams. [Prior Art] Consideration has begun to be given to the use of multi-beam semiconductor laser devices in optical application equipment such as optical disks. By assigning different functions to multiple laser beams, we aim to increase the functionality and speed of optical applications. Conventional multi-beam semiconductor laser devices are described, for example, in Proceedings of the International Symposium on Optical Memory; 1987, Japanese Journal of Applied Physics, Vol. 26 (1987), Sublument 2, 6-4.
Proc. Int. Symp. on Optical
Memory, 1987, Japanese Jo
urnal of Applied Physics,
Vol. 26 (1987) Supplement 2
6-4, Proceedings of the 35th Applied Physics Association Conference, Spring 1988, p. El98, lecture number 3 0 p.
- Z Q - A hybrid laser array as described in 31C is known. This laser device is characterized by a structure in which the electrode surfaces of a pair of semiconductor lasers face each other, and the beam spacing can be made close to several tens of μm without causing thermal interference. It is desirable to keep the beam spacing as close as possible in order to miniaturize the optical system for optical application functions. By the way, in the above-mentioned optical application equipment, each beam has a different function, so the optical output of each beam must be detected independently and each laser must be controlled individually. However, since the above device itself does not have a photodetection function, it is necessary to install a photodetection element (light receiving element) and an optical system to guide the beam outside the device, which causes the problem of increasing the size of the device. Ta. In order to miniaturize optical equipment, it is essential to provide a light receiving element inside the laser device. Regarding the method of arranging a light receiving element inside a laser device, a method for a conventional single beam semiconductor laser device is known.
For example, as described in JP-A-60-12786,
Light receiving element (chip size approx. 1cm) relative to the beam emission direction
The light-receiving surface (several 100 μm in diameter) of the corner) was arranged so that it was approximately vertical. This method is applied to the above-mentioned multi-beam semiconductor laser device, and FIG. 6 shows a diagram in which the light receiving elements are arranged in parallel. In FIG. 6, 101 and 102 are lasers, and 103 and 104 are submounts. 105 and 106 are mounts, 1o7 is a pedestal, and 108 and 109 are light receiving elements 110 and 111 are light receiving surfaces of the light receiving elements 108 and 109, respectively. As is clear from the figure, in this method, the beam distance between the lasers 101 and 102 is about 1 mm. Therefore, there is a problem that it is not possible to reduce the size of the laser device itself and the optical system of the optical application equipment. Furthermore, since the beam is emitted at a spread angle of several tens of degrees, there is a problem in that the beam of the laser 101 is incident on the light receiving surface 111 and the beam of the laser 102 is incident on the light receiving surface 110, resulting in large crosstalk. That is, even if the conventional method of arranging light receiving elements is applied to a multi-beam semiconductor laser device, each beam cannot be detected independently.
レーザ装置内部に受光素子を配置する方法として,新た
に第7図に示すような方法も考えられる。As a method of arranging the light receiving element inside the laser device, a new method as shown in FIG. 7 can be considered.
第7図において、120,121はレーザ、122,1
23はサブマウント、124,125はマウント、12
6は台座.127,128は受光素子、129,130
はそれぞれ受光素子127,128の受光面である.レ
ーザ120,121と受光素子127, 1 2 8が
、それぞれ共通のサブマウント122,123に積載さ
れている.この方法によれば、ビーム間隔を数10μm
まで近接させ得る。In FIG. 7, 120, 121 are lasers, 122, 1
23 is a submount, 124 and 125 are mounts, 12
6 is the pedestal. 127, 128 are light receiving elements, 129, 130
are the light-receiving surfaces of the light-receiving elements 127 and 128, respectively. Lasers 120, 121 and light receiving elements 127, 128 are mounted on common submounts 122, 123, respectively. According to this method, the beam spacing can be reduced to several tens of μm.
can be brought close to each other.
但し、レーザ120のビームが受光面130に、レーザ
121のビーム受光面129に入射るので、依然として
クロストークの問題が残る.第8図は,横軸にビーム間
隔、縦軸にグロストークをとったグラフである.クロス
トークは、受光面に入射する信号光量に対するクロスト
ーク光量をdB表示で相対的に表した.第7図の結果は
、bの線に示されている(レーザ120,121の端面
と受光面129,130の中心までの距離はそれぞれ5
00μm.レーザ120,121の電極面と受光面12
9,130の段差は100μmである).この結果から
解るように、例えばビーム間隔50μmの場合クロスト
ークが−3.4dBもあり,実用上支障がある。However, since the beam of the laser 120 is incident on the light receiving surface 130 and the beam receiving surface 129 of the laser 121, the problem of crosstalk still remains. Figure 8 is a graph with beam spacing on the horizontal axis and gross talk on the vertical axis. Crosstalk is expressed in dB as the amount of crosstalk light relative to the amount of signal light incident on the light receiving surface. The results in FIG. 7 are shown in the line b (the distances between the end faces of the lasers 120 and 121 and the centers of the light receiving surfaces 129 and 130 are respectively 5
00μm. Electrode surfaces of lasers 120 and 121 and light receiving surface 12
9,130 is 100 μm). As can be seen from this result, for example, when the beam spacing is 50 μm, the crosstalk is as high as −3.4 dB, which is a practical problem.
上記従来のマルチビーム半導体レーザ装置は、光検出機
能について配慮されていない.また、該装置に従来の光
検出技術を適用しても、同一受光素子に複数ビームが入
射するので、クロストークが大きくビーム各々の独立検
出ができないという問題があった.
本発明の目的は、ビーム各々を独立に検出する機能を備
えたマルチビーム半導体レーザ装置を提供し、さらに該
装置の小型化を図ることにある.〔課題を解決するため
の手段〕
本発明は上記目的を達成するために、上記従来の一対の
レーザから出射される2つのビームを一対の光導波路に
それぞれ入射させ,光軸に対して斜めに加工された前記
光導波路の光出射端面によって反射された2つのビーム
を一対の受光素子にそれぞれ入射させたものである.
〔作用〕
上記一対のレーザから出射される2つのビームは、それ
ぞれ別々の光路を通って別個の受光素子に到達するので
、独立に検出される.各ビームは光導波路によって閉じ
込められているので、角度拡がりは生じず受光素子間の
クロストークが防止される.また、上記斜め加工面によ
り光路が方向変換されているので、受光素子同士の受光
面を対向させるような形で配置することが可能であり,
受光素子を並列に並べた場合に比べてレーザ装置が小型
化され得る.
〔実施例〕
以下、本発明の実施例を図面と共に説明する.第1図は
本発明の第1実施例を示す全体斜視図、第2図は第1実
施例の部分拡大図である.まず、全体の構成について述
べる.
第1図及び第2図において、一対の半導体レーザチップ
1,2は、電極面同士が相対向するように配置されてい
る.さらに、レーザ1,2はそれぞれサブマウント3,
・4を介して、空間を隔てて向い合う2つのマウント5
,6上に分離して積載されている.マウント5,6は台
座↓2に固定され、台座12は板に溶接されている.板
22の穴20.21はねじ止め用である.キャップ8は
板22に溶接されており,窓7からレーザ1,2の2本
のビームが出射する.電極ピン13はレーザ1駆動用,
14はレーザ1の光検出用、17はレーザ2駆動用、1
6はレーザ2の光検出用、15はアースピンである.1
8.19は、板22とピン13,14を電気的に絶縁す
るための封止ガラマウント5側(レーザ1側)とマウン
ト6側(レーザ2側)はほぼ同様の構造と部品構成にな
っており(マウント6側は陰になって見えないが)、互
いに対を成して向き合っている.第2図にはマウント5
側だけを拡大して示した.レーザ1のビームは,活性層
31から上方と下方に出射される。The conventional multi-beam semiconductor laser device described above does not take into account the photodetection function. Furthermore, even if conventional photodetection technology was applied to this device, multiple beams would be incident on the same photodetector, so crosstalk would be large and each beam could not be detected independently. SUMMARY OF THE INVENTION An object of the present invention is to provide a multi-beam semiconductor laser device having a function of detecting each beam independently, and to further reduce the size of the device. [Means for Solving the Problems] In order to achieve the above object, the present invention makes two beams emitted from the above-mentioned pair of conventional lasers enter a pair of optical waveguides obliquely with respect to the optical axis. Two beams reflected by the light output end face of the processed optical waveguide are incident on a pair of light receiving elements, respectively. [Operation] The two beams emitted from the pair of lasers travel through separate optical paths and reach separate light-receiving elements, so they are detected independently. Since each beam is confined by an optical waveguide, no angular spread occurs and crosstalk between photodetectors is prevented. In addition, since the direction of the optical path is changed by the diagonally processed surface, it is possible to arrange the light-receiving elements so that their light-receiving surfaces face each other.
The laser device can be made smaller compared to when the photodetectors are arranged in parallel. [Examples] Examples of the present invention will be described below with reference to the drawings. FIG. 1 is an overall perspective view showing a first embodiment of the present invention, and FIG. 2 is a partially enlarged view of the first embodiment. First, we will discuss the overall configuration. In FIGS. 1 and 2, a pair of semiconductor laser chips 1 and 2 are arranged so that their electrode surfaces face each other. Furthermore, the lasers 1 and 2 are provided with submounts 3 and 3, respectively.
・Two mounts 5 facing each other across space via 4
,6 are loaded separately. Mounts 5 and 6 are fixed to pedestal ↓2, and pedestal 12 is welded to the plate. Holes 20 and 21 in plate 22 are for screwing. The cap 8 is welded to a plate 22, and two laser beams 1 and 2 are emitted from the window 7. Electrode pin 13 is for driving laser 1,
14 is for light detection of laser 1, 17 is for driving laser 2, 1
6 is for light detection of laser 2, and 15 is a ground pin. 1
8.19, the sealing glass mount 5 side (laser 1 side) and the mount 6 side (laser 2 side) for electrically insulating the plate 22 and pins 13 and 14 have almost the same structure and component configuration. (although the mount 6 side is in the shadows and cannot be seen), and they face each other in pairs. Figure 2 shows mount 5.
Only the sides are shown enlarged. The beam of the laser 1 is emitted upward and downward from the active layer 31.
下方に出射されたビームは、面32から光導波路9に入
射し、斜め加工面33で反射されて、受光素子11の受
光面35に入射する.光導波路9は接着射34によって
サブマウント10固定され、10はマウント5に固定さ
れている.
次に、各部品の詳細を述べる.本第1実施例を例えば光
ディスク装置に用いる場合は、レーザ1に発振波長78
0nmの低雑音再生用レーザ、レーザ2に発振波長83
0nmの高出力書込用レーザを採用した.レーザチップ
のサイズは、数100μm角、厚さ約100μmである
.サブマウント3.4は電気絶縁性・高熱伝導性SiC
セラミックス(厚さ200μm)から成り、その表面に
は電極配線用のA u / P t / T iメタラ
イズバターン36,37が形成されている.レーザの上
部電極はワイヤ38とパターン36、ワイヤ39を介し
てピン18に接続され、下部電極はパターン37とワイ
ヤ40を介してマウント5にアースされている.ワイヤ
は全てAu線を用いた.光導波路9は、光透過率が良い
ガラス材料、例えば石英ガラスを用いた.作成法は、ま
ずガラス板に垂直面加工と斜め面加工(それぞれ面32
と33に対応)を行ない、これを所望の大きさに切り出
す.第1実施例で使用した光導波路9のサイズは、幅2
00μm.厚さ100μ、長さ1.35m、斜め加工の
角度45゜とした.なお,レーザ1への面32の反射戻
り光を低減するために、面32に無反射コーティングを
施した.レーザ1と面32の距離は50μmにとった.
サブマウント10は,厚さ200μmのSiウェハを切
り出して作成した.受光素子11はPIN型ホトダイオ
ード、受光面35のサイズは300μmφである.受光
素子の上部電極はワイヤ41によってビン14に接続さ
れ、下部電極はマウント5にアースされてぃる.
マウント5,6は、熱伝導率の良いCuから成る.マウ
ント5,6の表面はサブマウント3,4や光検出素子1
1等を半田付けする際の濡れ性を良くするためA u
/ N iメッキが施されている.マウント5,6は、
レーザ1と2の発光点の位置を相対的に位置合わした後
に台座12に半田によって固定される.半田の疲労を低
減するために台座12はマウント5,6と同じ<Cuか
ら成り、表面はメッキされている.台座12の形が階段
状になっているのは(第1図参照).39.41等のワ
イヤ付け作業を行ないやすくするためである。The beam emitted downward enters the optical waveguide 9 from the surface 32, is reflected by the obliquely processed surface 33, and enters the light-receiving surface 35 of the light-receiving element 11. The optical waveguide 9 is fixed to the submount 10 by adhesive injection 34, and the optical waveguide 10 is fixed to the mount 5. Next, we will explain the details of each part. When the first embodiment is used, for example, in an optical disc device, the laser 1 has an oscillation wavelength of 78 cm.
0nm low noise reproduction laser, laser 2 has an oscillation wavelength of 83
Employs a 0nm high-power writing laser. The size of the laser chip is several hundred μm square and approximately 100 μm thick. Submount 3.4 is made of electrically insulating and highly thermally conductive SiC
It is made of ceramics (thickness: 200 μm), and A u / P t / Ti metallized patterns 36 and 37 for electrode wiring are formed on its surface. The upper electrode of the laser is connected to the pin 18 via a wire 38, a pattern 36, and a wire 39, and the lower electrode is grounded to the mount 5 via a pattern 37 and a wire 40. All wires used were Au wires. The optical waveguide 9 is made of a glass material with good light transmittance, such as quartz glass. The creation method is to first process a glass plate vertically and diagonally (32 sides each).
and 33) and cut it out to the desired size. The size of the optical waveguide 9 used in the first embodiment is a width of 2
00μm. The thickness was 100μ, the length was 1.35m, and the diagonal processing angle was 45°. Incidentally, in order to reduce the light reflected back from the surface 32 to the laser 1, a non-reflection coating was applied to the surface 32. The distance between laser 1 and surface 32 was set to 50 μm.
The submount 10 was created by cutting out a 200 μm thick Si wafer. The light receiving element 11 is a PIN type photodiode, and the size of the light receiving surface 35 is 300 μmφ. The upper electrode of the light receiving element is connected to the bottle 14 by a wire 41, and the lower electrode is grounded to the mount 5. The mounts 5 and 6 are made of Cu, which has good thermal conductivity. The surfaces of the mounts 5 and 6 are covered with the submounts 3 and 4 and the photodetector element 1.
A u to improve wettability when soldering 1st grade.
/Ni-plated. Mounts 5 and 6 are
After the positions of the light emitting points of lasers 1 and 2 are relatively aligned, they are fixed to the pedestal 12 by soldering. In order to reduce solder fatigue, the pedestal 12 is made of the same <Cu as the mounts 5 and 6, and its surface is plated. The reason why the pedestal 12 is stepped is that it has a stepped shape (see Figure 1). This is to facilitate the work of attaching wires such as 39 and 41.
本第1実施例によれば、一対の半導体レーザチップから
出射される2つのビームは、それぞれ別別の光導波路よ
って導かれ、一対の受光素子によって検出される.すな
わち、2つのビームを独立に検出できる効果がある.光
導波路の入射面のサイズは、ビーム間クロストークが許
容範囲内に抑えられる程度に小さく、各ビームとの光結
合効率が十分得られる程度に大きい.光結合効率は、レ
ーザチップに対して光導波路(サブマウント)の位置を
調節することで所望の値が得られる.また,斜め加工面
によって光路が方向変換されているので、受光素子を対
向するように配置でき小型集積化が可能になった.さら
にハイブリッド型構造であるので、レーザチップ及び受
光素子の組み合わせを任意に選べ、レーザや受光素子,
光導波路間の相対的な位置関係を必要に応じて簡単に変
更できる利点がある.
本第1実施例の効果を、第8図のグラフに示す.第8図
において、横軸はビーム間隔,縦軸はクロストークであ
る.本第1実施例の結果をaの線に示した.図から,本
第1実施例よれば、ビーム間隔を50μm以下に狭めて
も尚−20dB以下にクロストークが抑えられており、
実用上まったく問題はなく各ビームの独立検出が行なえ
る.前述の第7図の技術の結果(bの線)と比較すれば
、本第1実施例の効果は明らか゛である.上記第1実施
例では、レーザチップと光導波路のサブマウントが異な
っていた.
以下、第2実施例では共通のサブマウントを用いた場合
について説明する.第3図は第2実施例の部分拡出図で
ある.全体的な構成は第1図の第1実施例の同様である
ので省略する.
50はレーザ1と光導波路9、受光素子11共通のサブ
マウントである.SiCセラミックスから成る.受光素
子11の部分には段差が設けられている.表面には部分
的にA u / P t / T iメタライズ(51
,52.53)が施されている.レーザ1の上部電極は
ワイヤ54,パターン51,ワイヤ55を介して電極ピ
ンに接続され、下部電極はパターン52とワイン56に
とってマウント5にアースされている.受光素子11の
上部電極はワイヤ58によって電極ビンに,下部電極は
パターン53とワイヤ57を介してマウント5にアース
される.光導波路9は、表面に部分的にAu/ N i
/ T iメタライズ59が施され、半田6oによっ
てサブマウント50に固定されている。パターン52は
、電極配線と半田付けの両方の役割を兼ねている.
レーザ1側と2側は対称的な構造になっているので、2
側については説明を省略した.本第2実施例によれば、
サブマウント50の上にレーザ1,受光素子11,光導
波路9を予め組み立てておき、後からサブマウント50
をマウント5に固定すればよい.第1実施例が各素子を
マウント5の上に順次組み立てて行かねばならなかった
のに比べて、作業性が向上する効果がある.また、レー
ザ1や受光素子11の極性が変更した場合であっても,
サブマウント50上のメタライズパターンとワイヤ付け
を若干変えることにより対応可能である(第1実施例で
は受光素子11の下部電極の極性がアースに固定されて
いた).第1実施例では接看剤34によって先導波路9
を固定していたが、第2実施例では光導波路9も半田固
定されているので耐熱特性が良く、信頼性が向上する効
果がある.
第4図は、本発明の第3の実施例の側面図である,全体
的な構成は第1図に準ずる.マウント5側と6側は対称
的なので、5側のみ示した.本第3実施例では、レーザ
1と光導波路70の光結台効率を高めるために,光導波
路70の入射面にレンズ71を形成させた.レーザ1か
ら出射したビームは、レンズ71で集光され,面72で
反射されて(図中矢印)受光素子に入射する.本第4実
・施例によれば、レーザビームを高感度で独立に検出で
きる効果がある.
第5図は、本発明の第4実施例の側面図である.全体的
な構成は第1図に準ずる.マウント5側と6側は対称的
なので、5側だけを示す.本第4実施例では、光導波路
73を伝搬するビームの受光素子11への入射効率を高
めるために、面74を曲面形状にして、反射光を受光素
子11の受光面へ集光させた(図中矢印).本第5実施
例によれば、レーザビームの受光効率が向上する効果が
ある.
以上、本発明を図面を用いて説明した.本発明の要件は
,一対の半導体レーザチップから出射される2つのレー
ザ光を一対の光導波路に入射させ、光軸に対して斜めに
加工された前記光導波路の光出射端面によって反射され
た2つのレーザ光を一対の受光素子によって検出したこ
とにある.したがって、本発明はレーザチップ,受光素
子,光導波路の特性,タイプや装置の各構成部品の材料
,サイズ等によって制限されるものではない.光導波路
として、実施例中ではガラス角材を用いたが,ファイバ
やチャンネル型光導波路を採用することも可能である.
レーザチップ,受光素子,光導波路をモノリシックに集
・積化したちのもを互いに対向させて配置するような構
成も採り得る。また、実施例では一対のレーザチチップ
を示したが、更に複数対のチップがある場合でも、本発
明の効果は明らかである.なお、本発明の半導体レーザ
装置により、例えば光ディスク装置,レーザビームプリ
ンタ,光計測センサ等の光応用機器において各レーザチ
ップの独立制御を行ない,多機能・高速化を実現するこ
とができた.
〔発明の効果〕
本発明の半導体レーザ装置によれば、複数のレーザービ
ームを独立に検出することが可能になるので、各レーザ
の独立制御が行なえる.これにより、本装置を用いた光
応用機器の多機能化を簡便に実現できる効果がある.ま
た、本装置は機能が付加されたにも関わらず小型である
ので、光応用機器自体も小型化され得る効果がある.According to the first embodiment, two beams emitted from a pair of semiconductor laser chips are guided by separate optical waveguides and detected by a pair of light receiving elements. In other words, the effect is that the two beams can be detected independently. The size of the entrance surface of the optical waveguide is small enough to suppress inter-beam crosstalk within an acceptable range, and large enough to obtain sufficient optical coupling efficiency with each beam. The desired value of optical coupling efficiency can be obtained by adjusting the position of the optical waveguide (submount) with respect to the laser chip. In addition, since the optical path is changed in direction by the diagonally machined surface, the light-receiving elements can be placed facing each other, making it possible to achieve compact integration. Furthermore, since it has a hybrid structure, you can choose any combination of laser chip and photodetector, and
This has the advantage that the relative positional relationship between optical waveguides can be easily changed as necessary. The effects of the first embodiment are shown in the graph of FIG. In Figure 8, the horizontal axis is the beam spacing and the vertical axis is the crosstalk. The results of this first example are shown on line a. From the figure, according to the first embodiment, even if the beam spacing is narrowed to 50 μm or less, crosstalk is still suppressed to -20 dB or less.
There is no practical problem at all, and each beam can be detected independently. When compared with the result of the technique shown in FIG. 7 (line b) described above, the effect of the first embodiment is clear. In the first embodiment described above, the submounts for the laser chip and the optical waveguide were different. In the second embodiment, a case in which a common submount is used will be described below. Figure 3 is a partially enlarged view of the second embodiment. The overall configuration is the same as that of the first embodiment shown in FIG. 1, so a description thereof will be omitted. 50 is a submount common to the laser 1, the optical waveguide 9, and the light receiving element 11. Made of SiC ceramics. A step is provided at the light receiving element 11. The surface is partially covered with A u / P t / Ti metallization (51
, 52, 53) have been applied. The upper electrode of the laser 1 is connected to the electrode pins via the wire 54, the pattern 51, and the wire 55, and the lower electrode is grounded to the mount 5 for the pattern 52 and the wine 56. The upper electrode of the light receiving element 11 is grounded to the electrode bin via a wire 58, and the lower electrode is grounded to the mount 5 via a pattern 53 and a wire 57. The optical waveguide 9 has a surface partially coated with Au/Ni
/ Ti metallization 59 is applied and fixed to the submount 50 with solder 6o. The pattern 52 serves both as electrode wiring and soldering. Since the laser 1 and 2 sides have a symmetrical structure, the 2
We omitted the explanation of the sides. According to the second embodiment,
The laser 1, the light receiving element 11, and the optical waveguide 9 are assembled on the submount 50 in advance, and the submount 50 is assembled later.
Just fix it to mount 5. Compared to the first embodiment, in which each element had to be assembled on the mount 5 one after another, work efficiency is improved. Furthermore, even if the polarity of the laser 1 or the light receiving element 11 is changed,
This can be achieved by slightly changing the metallization pattern on the submount 50 and the wire attachment (in the first embodiment, the polarity of the lower electrode of the light receiving element 11 was fixed to ground). In the first embodiment, the leading waveguide 9 is
However, in the second embodiment, the optical waveguide 9 is also fixed by soldering, which has good heat resistance characteristics and has the effect of improving reliability. FIG. 4 is a side view of a third embodiment of the present invention, and the overall configuration is similar to FIG. 1. Since the mount 5 and 6 sides are symmetrical, only the 5 side is shown. In the third embodiment, a lens 71 is formed on the incident surface of the optical waveguide 70 in order to increase the efficiency of optical coupling between the laser 1 and the optical waveguide 70. The beam emitted from the laser 1 is focused by a lens 71, reflected by a surface 72 (arrow in the figure), and enters a light receiving element. According to the fourth example, the laser beam can be detected independently with high sensitivity. FIG. 5 is a side view of a fourth embodiment of the present invention. The overall configuration is similar to Figure 1. The mount 5 and 6 sides are symmetrical, so only the 5 side is shown. In the fourth embodiment, in order to increase the incidence efficiency of the beam propagating through the optical waveguide 73 into the light receiving element 11, the surface 74 is curved to condense the reflected light onto the light receiving surface of the light receiving element 11 ( (arrow in figure). According to the fifth embodiment, there is an effect that the light reception efficiency of the laser beam is improved. The present invention has been explained above using the drawings. The requirements of the present invention are that two laser beams emitted from a pair of semiconductor laser chips are incident on a pair of optical waveguides, and two laser beams are reflected by the light output end face of the optical waveguides that is processed obliquely with respect to the optical axis. The reason is that two laser beams are detected by a pair of photodetectors. Therefore, the present invention is not limited by the characteristics and types of the laser chip, photodetector, and optical waveguide, nor by the materials, sizes, etc. of each component of the device. As the optical waveguide, a glass square material was used in the examples, but it is also possible to use a fiber or channel type optical waveguide.
It is also possible to adopt a configuration in which a laser chip, a light receiving element, and an optical waveguide are monolithically integrated and arranged so as to face each other. Furthermore, although a pair of laser chips is shown in the embodiment, the effects of the present invention are obvious even when there are multiple pairs of chips. Furthermore, by using the semiconductor laser device of the present invention, it was possible to independently control each laser chip in optical application equipment such as optical disk devices, laser beam printers, and optical measurement sensors, thereby achieving multifunctionality and high speed. [Effects of the Invention] According to the semiconductor laser device of the present invention, it is possible to independently detect a plurality of laser beams, so each laser can be independently controlled. This has the effect of easily increasing the functionality of optical application equipment using this device. Furthermore, since this device is small despite its added functions, optical application equipment itself can also be made smaller.
第1図は本発明の第1の実施例の全体斜視図、第2図は
第1実施例の部分拡大斜視図、第3図は第2実施例の部
分拡大斜視図、第4図は第3実施例の部分側面図,第5
図は第4実施例の部分側面図、第6図及び第7図のいず
れも従来の光検出技術を示す図、第8図はビーム間隔と
クロストークの関係を示すグラフ図である.
1,2・・・レーザ、3,4・・・サブマウント,5,
6・・・マウント、9・・・光導波路、11・・・受光
素子、12・・・台座、32.33・・・面.7.2
3,4
5・6
?
レーサ
プブマウ′/ト
マフント
先4液浴
台座
70 尤導液み
71 L −/ x−
サブマウント
/03. 109. /27. /273史先粂多1 is an overall perspective view of the first embodiment of the present invention, FIG. 2 is a partially enlarged perspective view of the first embodiment, FIG. 3 is a partially enlarged perspective view of the second embodiment, and FIG. 4 is a partially enlarged perspective view of the second embodiment. Partial side view of 3rd embodiment, 5th
The figure is a partial side view of the fourth embodiment, both Figures 6 and 7 are diagrams showing conventional photodetection technology, and Figure 8 is a graph diagram showing the relationship between beam spacing and crosstalk. 1, 2... Laser, 3, 4... Submount, 5,
6... Mount, 9... Optical waveguide, 11... Light receiving element, 12... Pedestal, 32.33... Surface. 7.2 3,4 5.6? Racepubumau'/Tomafunt tip 4 liquid bath pedestal 70 Liquid guide 71 L-/x- Submount/03. 109. /27. /273 Shisaki Kueta
Claims (1)
が相対向するように配置された半導体レーザ装置におい
て、該一対の半導体レーザチップから出射した2つのレ
ーザ光が一対の光導波路に入射し、且つ光軸に対して斜
めに加工された前記一対の光導波路の光出射端面で反射
したのち、一対の受光素子によつて検出されることを特
徴とする半導体レーザ装置。 2、請求項1記載の半導体レーザ装置において、上記一
対の半導体レーザチップが空間を隔てて向い合う2つの
マウントにそれぞれ分離して積載され、上記一対の光導
波路及び上記一対の受光素子がそれぞれに対応する半導
体レーザチップと同じ該マウント上に積載されているこ
とを特徴とする半導体レーザ装置。 3、請求項1または2記載の半導体レーザ装置において
、上記一対の半導体レーザチップが端面発光型、上記一
対の受光素子が面受光型から成り、該一対の半導体レー
ザチップの光軸がこれに対応する上記一対の光導波路の
光軸とほぼ平行かつ一致し、前記一対の受光素子の光軸
とほぼ直交していることを特徴とする半導体レーザ装置
。 4、請求項2または3記載の半導体レーザ装置において
、上記半導体レーザチップ、上記光導波路または上記受
光素子を電気絶縁材料から成るサブマウント介してマウ
ント上に積載し、該サブマウント表面にメタライズパタ
ーンを形成したことを特徴とする半導体レーザ装置。 5、請求項2から4のいずれかに記載の半導体レーザ装
置において、上記光導波路として、レーザ光の入射面及
び出射面以外の側面の一部にメタライズを施したことを
特徴とする半導体レーザ装置。 6、請求項1記載の半導体レーザ装置において、上記光
導波路のレーザ入射面にレンズを形成したことを特徴と
する半導体レーザ装置。 7、請求項1記載の半導体レーザ装置において、上記光
導波路の斜め加工面を曲面形状としたことを特徴とする
半導体レーザ装置。 8、請求項1記載の半導体レーザ装置を用い前記一対の
半導体レーザチップの2つのレーザ光を独立に検出し、
該レーザ光の出力を個別に制御したことを特徴とする光
応用機器。[Claims] 1. In a semiconductor laser device in which the electrode surfaces of at least one pair of semiconductor laser chips are arranged to face each other, two laser beams emitted from the pair of semiconductor laser chips are connected to a pair of optical waveguides. What is claimed is: 1. A semiconductor laser device, characterized in that the semiconductor laser is detected by a pair of light-receiving elements after being incident on the light-emitting end face of the pair of optical waveguides processed obliquely with respect to the optical axis; 2. The semiconductor laser device according to claim 1, wherein the pair of semiconductor laser chips are separately mounted on two mounts facing each other across a space, and the pair of optical waveguides and the pair of light receiving elements are respectively mounted on two mounts facing each other with a space between them. A semiconductor laser device characterized in that it is mounted on the same mount as a corresponding semiconductor laser chip. 3. In the semiconductor laser device according to claim 1 or 2, the pair of semiconductor laser chips are of an edge-emitting type, and the pair of light-receiving elements are of a surface-emitting type, and the optical axes of the pair of semiconductor laser chips correspond to this. The semiconductor laser device is substantially parallel and coincident with the optical axes of the pair of optical waveguides, and substantially orthogonal to the optical axes of the pair of light receiving elements. 4. The semiconductor laser device according to claim 2 or 3, wherein the semiconductor laser chip, the optical waveguide, or the light receiving element is mounted on a mount via a submount made of an electrically insulating material, and a metallized pattern is formed on the surface of the submount. A semiconductor laser device characterized in that: 5. The semiconductor laser device according to any one of claims 2 to 4, wherein the optical waveguide is metallized on a part of a side surface other than a laser light incident surface and an exit surface. . 6. The semiconductor laser device according to claim 1, wherein a lens is formed on the laser incidence surface of the optical waveguide. 7. The semiconductor laser device according to claim 1, wherein the obliquely machined surface of the optical waveguide is curved. 8. independently detecting two laser beams from the pair of semiconductor laser chips using the semiconductor laser device according to claim 1;
An optical application device characterized in that the output of the laser beam is individually controlled.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4982389A JPH02230783A (en) | 1989-03-03 | 1989-03-03 | semiconductor laser equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4982389A JPH02230783A (en) | 1989-03-03 | 1989-03-03 | semiconductor laser equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02230783A true JPH02230783A (en) | 1990-09-13 |
Family
ID=12841821
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4982389A Pending JPH02230783A (en) | 1989-03-03 | 1989-03-03 | semiconductor laser equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02230783A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0560358A3 (en) * | 1992-03-11 | 1994-05-18 | Sumitomo Electric Industries | Semiconductor laser and process for fabricating the same |
| WO2016170921A1 (en) * | 2015-04-21 | 2016-10-27 | 三菱電機株式会社 | Laser light source module |
-
1989
- 1989-03-03 JP JP4982389A patent/JPH02230783A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0560358A3 (en) * | 1992-03-11 | 1994-05-18 | Sumitomo Electric Industries | Semiconductor laser and process for fabricating the same |
| WO2016170921A1 (en) * | 2015-04-21 | 2016-10-27 | 三菱電機株式会社 | Laser light source module |
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