JPH0223329A - Silver halide photographic sensitive material for light room with improved void quality, etc. - Google Patents

Abstract

PURPOSE:To make possible the hyper rapid processing of the title material, without deteriorating the void quality of the photosensitive material by specifying the amount of gelatin contd. in the photographic constituting layer existing on the side contg. a photosensitive silver halide, the amount of a polymer latex contd. in the photosensitive material, and the gamma value of said material at the time of developing the material respectively, in the specified silver halide photosensitive material for the light room. CONSTITUTION:The photosensitive material has mainly a photosensitive property at a wavelength of 300-450nm, and contains a silver halide particle having a particle size of 0.05-0.20mum, and the amount of the gelatin contd. in the photographic constituting layer existing on the side contg. the photosensitive silver halide is specified to a range of 1.5-3.0g/m<2>. And, the amount of the polymer latex contd. in the photosensitive material is a range of 0.75-1.5g/m<2>, and the gamma-value of the photosensitive material defined by optical density of 0.3-3.0 has substantially >=6.0, at the time of exposing a picture, followed by developing it. Thus, the hyper rapid processing of the photosensitive material makes possible without deteriorating the void quality.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for producing a silver halide photographic material,
More specifically, the present invention relates to a printed photosensitive material having excellent rapid developability.

[Conventional technology]

In recent years, the consumption of silver halide photographic materials has continued to increase. For this reason, the number of silver halide photographic materials to be processed has increased, and there is a demand for speeding up the development process, that is, increasing the amount of processing within the same amount of time.

The above trend can also be seen in the printing plate making field.

In other words, as the immediacy and number of times information is rapidly increasing, it has become necessary to perform printing plate-making work in a short delivery time and in larger quantities. In order to meet such demands of the printing plate making industry, it is necessary to promote the simplification of the printing process and to process printing plate making films more quickly.

Generally, when ultra-rapid processing is performed, the fixing time and washing time are shortened, which increases the concentration of sulfur salts remaining in the processed film, causing the problem that the processed film turns yellow during storage. .

Another problem is that since the development time is short, the density decreases even if the initial sensitivity is adjusted by increasing the development activity of the developer or the temperature of the developer.

Furthermore, the problem of insufficient drying also occurs.

In this specification, ultra-quick processing means that the leading edge of the film is inserted into an automatic developing machine, passes through a developing tank, a transition area, a fixing tank, a transition area, a washing tank, a transition area, and a drying area. [In other words, the total length of the processing line (m) is expressed as the line conveyance speed (m/s
This refers to a process in which the quotient (sec, )) divided by ec, ) is 20 seconds to 60 seconds. The reason why the time for the transition part should be included here is that it is well known in the industry that even in the transition part, the liquid from the previous process is swollen in the gelatin film, so it is virtually impossible to This is because it can be considered that the processing process is progressing.

Japanese Patent Publication No. 51-47045 describes the importance of the amount of gelatin in rapid processing, but the total processing time including the crossing portion is 60 to 120 seconds. However, this amount of time cannot meet the demands of ultra-quick geography in recent years. Reducing the amount of gelatin is an effective method, but
It has been found that reducing the amount of gelatin reduces the quality of punched characters during the printing and turning processes.

The photosensitive material for bright room use used in the booklet turning process uses a developed film on which characters or halftone images are formed as an original, and the original and the photosensitive material for turning are exposed in close contact to perform negative/positive image conversion. Alternatively, it is a photosensitive material used to perform positive image/positive conversion, and has the ability to convert halftone images, line drawings, and character images into negative images/positive images according to their respective halftone dot areas, line widths, and character images. There has been a demand for a light-sensitive material for use in a bright room that has the ability to adjust the tone of halftone dot images and adjust the line width of character line images. However, in the advanced image conversion process of forming cut-out character images by overlapping and repeating, there was a drawback that the quality of the cut-out character images deteriorated compared to the method using the bright room return process used for conventional darkroom photosensitive materials. . The important thing about this is that ideally, the method of forming a cutout character image by overlapping is to perform negative image/positive image conversion according to the halftone dot area and image width of each halftone dot original and line drawing original. While the halftone original is exposed in direct contact with the emulsion surface of the photosensitive material for return, the line drawing original is exposed to the photosensitive material for return with the paste base and the halftone original in between. Become.

For this reason, if an exposure amount is given to faithfully convert a halftone dot document into a negative image/positive image, the line drawing document will be exposed out of focus through the pasting pace and the spacer due to the halftone image.
The line width of the white blank part of the line drawing becomes narrower. This is the cause of the deterioration of the quality of the cut-out character image,
This phenomenon has a large contribution from the light source system, and the exposure latitude of cutout characters in conventional work is narrower than that of general simple inversion, and sufficient exposure control is the basis for stable cutout work. This is well known. However, expectations were higher for the photographic performance of the photosensitive material itself, rather than for preventing the quality deterioration of cut-out character images, which conventional photosensitive materials for bright rooms have, while maintaining adequate exposure control. Initially, reducing the amount of gelatin to enable ultra-rapid processing resulted in a decrease in film thickness, and when exposing halftone dots as a return document, the rate at which the halftone dot area increases with respect to the increase in exposure amount (the thickness of the halftone dots) increases. It was thought that this would improve the printing performance) and the quality of cut-out characters, but the results were contrary to this. Therefore, for rapid processing, it is necessary to take measures to prevent image quality deterioration even if the amount of gelatin is reduced.

[Purpose of the invention]

In view of the above-mentioned problems, an object of the present invention is to provide a bright room silver halide photographic light-sensitive material which is capable of ultra-quick processing in which the total processing time is 20 to 60 seconds.

[Structure of the invention]

The above-mentioned object of the present invention is to provide a silver halide photographic light-sensitive material for bright room use, which contains silver halide grains having a main photosensitivity in the wavelength range of 300 nm to 450 nm and a grain size of 0.05 to 0.20 μm. The amount of gelatin in the photographic constituent layer on the side containing silver halide is in the range of 1.5 to 3.0 g/m'', and the amount of polymer latex in the light-sensitive material is 0.7 g/m''.
When the content is in the range of 5 to 1.5 g/m2 and subjected to image exposure and development processing, the γ value defined as density 0.3 to 3.0 has a value of substantially 6.0 or more. This is achieved using a silver halide photographic light-sensitive material for use in bright rooms.

The details of the present invention will be further explained below.

When producing light-sensitive materials that can be processed ultra-quickly, reducing the amount of gelatin improves the diffusion of the processing liquid into the material and is effective in preventing a decrease in density, but it degrades the cutout performance. Therefore, we considered making the net thicker. That is, conventionally, when exposing halftone dots as a returned document, the idea is to improve the rate at which the halftone dot area increases with respect to the increase in exposure amount to obtain good cutout performance in proper exposure. Regarding the ability to thicken the net, if large grains are contained in the emulsion layer or protective layer, light hits the large grains during exposure and reflects, exposing adjacent silver halide grains. We focused on the irradiation effect, and focused on polymer latex to enhance this effect. When a polymer latex for photosensitive materials is added to a coating emulsion, a regular structure is formed in the ionic solution. In other words, it is called a polymer latex sphere (
(Think of it as a very small plastic pole)
The substances are distributed regularly in the solution. Based on this, attempts are made to improve the light scattering effect of particles by increasing the amount of latex added to pack more solutes of uniform size into a given volume. Based on this, as a result of further research, we were able to achieve the present invention by balancing the amounts of gelatin and polymer latex when performing ultra-rapid geography.

The amount of gelatin in the present invention is the amount per side containing photosensitive silver halogenide, that is, per side, and is 1.5 to 3.0 g/I
2, preferably in the range of 2.0 to 2-5 g/m''.

In addition, one of the important features of the present invention is that the concentration is 0°3~3.
The high-contrast photographic performance of γ of 6.0, which is defined for 0, is applicable to both negative and positive types, but especially in negative type photographic materials, there is a A tetrazolium compound, a hydrazine compound, or a polyalkylene oxide compound is contained in at least one hydrophilic colloid layer containing a photosensitive silver halide emulsion and/or in a layer adjacent thereto, and HQ alone or PQ is used as a developing agent. , or MQ, and is particularly preferably obtained by treatment with a treatment solution having a pH of 1O''13.

First, a method using a tetrazolium compound will be described. The technology of using tetrazolium compounds in silver halide photographic materials is disclosed, for example, in JP-A-52-18317, JP-A-53-17719, JP-A-53-17720, and JP-A-Sho 6.
1-149946 and the like. Hereinafter, this will be referred to as tetrazolium high contrast technology.

Specific examples of the tetrazolium compound used in the present invention include general formulas (1) and (2) described in JP-A-62-11253.
Examples include compounds represented by -2 and -3.

[■-1] [■-2] [■-3] In the formula, RS, R7, Rs, Rs, Riz, R13, R14
and Ras each represent an alkyl group (e.g. methyl group, ethyl group, propyl group, °dodecyl group, etc.), an allyl group, a phenyl group (e.g. phenyl group, tolyl group, hydroxyphenyl group, carboxyphenyl group, aminophenyl group,
mercaptophenyl group, methoxyphenyl group, etc.), naphthyl groups (e.g. α-naphthyl group, β-naphthyl group, hydroxynaphthyl group, carboxynaphthyl group, aminonaphthyl group, etc.), and heterocyclic groups (e.g. thiazolyl group, benzothiazolyl group) , oxacylyl group, pyrimidinyl group, pyridyl group, etc.), and any of these may be a group that forms a metal chelate or a complex.

R6-R11 and R11 are allyl group, phenyl group, naphthyl group, heterocyclic group, alkyl group (e.g. methyl group, ethyl group, propyl group, butyl group/mercaptomethyl group, mercaptoethyl group, etc.), hydroxyl group, alkylphenyl group, alkoxyphenyl group, carboxyl group or its salt, carboxyalkyl group (e.g. methoxycarbonyl group, ethoxycarbonyl group), amino group (e.g. amine group, ethylamino group, anilino group, etc.), mercapto group, nitro group and hydrogen atom D represents a divalent aromatic group; E represents a group selected from an alkylene group, an arylene group, and an aralalkylene group; e represents an anion; and n represents 1 or 2. l: n is 1 when the dashi compound forms an inner salt.

Next, specific examples of the cation moiety of the tetrazolium compound used in the present invention will be shown, but the cation moiety of the compound that can be used in the present invention is not necessarily limited to these.

(T-1) 2-(benzothiazol-2-yl)-
3=722-5-dodecyl-2H-tetrazolium (T-2) 2,3-diphenyl-5-(4-t-
octyloxyphenyl)-2H-tetrazolium (T
-3) 2,3.5-triphenyl-2H-tetrazolium (T-4) 2,3.5-tri(p-carboxyethyl 7-enyl)-2H-tetrazolium (T-5) 2-( benzothiazol-2-yl)
-3=phenyl-5-(o-chlorphenyl)-2
H-tetrazolium (T-12,3-diphenyl-2H-tetrazolium (T-7) 2,3-diphenyl-5-methyl-2
H tetrazolium (T-8) 3-(p-hydroxyphenyl)-
5-Methyl-2-phenyl-28-tetrazolium (
T-9) 2.3-diphenyl-5-ethyl-2H
-Tetrazolium (T-10) 2,3-diphenyl-5-rhohexyl-2H-tetrazolium (T-11) 5-cyano-2,3-diphenyl-2H-tetrazolium (T-12) 2-(benzothiazole -2-yl)-5-phenyl-3-(4-hlyl)-2H-tetrazolium(T-13) 2'-(benzothiazole-2-
yl)-5-(4-chlorophenyl)-3-(4-nitrophenyl)-2H-tetrazolium (T-14) 5-ethoxycarbonyl-2,3-
Di(3-nitrophenyl)-2H-tetrazolium (
T-15) 5-acetyl-2,3-di(p-ethoxyphenyl)-2H-tetrazolium (T-16) 2,5-diphenyl-3-(p-tolyl)-2H-tetrazolium (T-17) 2.5-diphenyl-3-(p~iodophenyl) 2H-tetrazolium (T-18) 2.3-diphenyl-5-(p-diphenyl)-2H-tetrazolium (T-19) 5-(p-bromo phenyl)-2
-Phenyl-3-(2,4,6-1 lychlorophenyl)-2H-tetrazolium (T-20) 3-Cp-hydroxyphenyl)-5~(pnitrophenyl)-2-phenyl-2
H-tetrazolium (T-21) 5-(3,4-dimethoxyphenyl)-3-(2-ethoxyphenyl)l! -(4-methoxyphenyl)-2H-tetrazolium (T-22) 5-(4-cyanophenyl)-2
, 3-diphenyl-2H-tetrazolium (T-23) 3-(p-acetamidophenyl)-2゜5-diphenyl-2H-tetrazolium (T
-24) 5-acetyl-2,3-diphenyl-
2H-Tetrazolium (T-25) 5-(Flu-2yl)-2,3-diphenyl-2H-tetrazolium (T-26) 5-(Flu-2yl)-2,3-
Diphenyl-2H-tetrazolium (T-27) 2.3-diphenyl-5-(pyrid-4yl)-2H-tetrazolium (T-28) 2.3-diphenyl-5-(quinol-2yl)-2H- Tetrazolium (T-29) 2.3-diphenyl-5-(benzoxazol-2yl)-2H-tetrazolium (T-
30) 2.3-diphenyl-5-nitro 2H-
Tetrazolium (T-31) 2.2', 3.3'-tetraphenyl-5°5'-1,4-butylene-di(2H-tetrazolium) (T-32) 2.2', 3.3' −
Tetraphenylene 5゜5'-p-phenylene di(
2H-tetrazolium) (T-33) 2-(4,5
-dimethylthiazol-2yl)-3,5-diphenyl-2H-tetrazolium (T-34) 3,5-diphenyl-2-(triazin2yl-2H-tetrazolium) (T-35) 2-(benzothiazole- 2il)
-3-(4-methoxyphenyl)-5-7ene-2H-tetrazolium (T-36) 2.3-dimethoxyphenyl-5-
722-2H-tetrazolium (T-37) 2.3.5-tris(methoxyphenyl)-2H-tetrazolium (T-38) 2.3-dimethylphenyl-5-phenyl-2H-tetrazolium (T- 39) 2.3-hydroxyethyl-5-phenyl-2H-tetrazolium (T-40) 2.3-hydroxymethyl-5-7ene-2H-tetrazolium (T-41) 2.3-cyanohydroxyphenyl-5- Phenyl-2H-tetrazolium (T-42) 2.3-di(p-chlorophenyl)-
5-7 enyl-2H-tetrazolium (T-43) 2.3-di(hydroxyethoxyphenyl)-5-7 enyl-2H-tetrazolium (T-
44) 2,3-di(2-pyridyl)-5-7enyl-2H-tetrazolium (T-45) 2,3,5-tris(2-pyridyl)
-2H-tetrazolium (T-46) 2.3.5-tris(4-pyridyl)
-2H-Tetrazolium When a tetrazolium compound is used as a non-diffusible compound, a non-diffusible compound obtained by appropriately selecting a cation moiety and an anion moiety is used.

Examples of the anion moiety of the tetrazolium compound used in the present invention include halogen ions such as chloride ion, bromide ion, and iodide ion, acid groups of inorganic acids such as sulfuric acid, nitric acid, and perchloric acid, sulfonic acid,
Acid groups of organic acids such as carboxylic acids, lower alkylbenzenesulfonic acid anions such as p-toluenesulfonic acid anions, higher alkylbenzenesulfonic acid anions such as p-dodecylbenzenesulfonic acid anions, and higher alkyl sulfate ester anions such as lauryl sulfate anions. , dialkyl sulfosuccinate anions such as di-2-ethylhexyl sulfosuccinate anions, polyether alcohol sulfate ester anions such as cetyl polyethenoxysal 1 phosphate anions, higher fatty acid anions such as stearate anions, polyacrylate anions, etc. Examples include polymers with acid groups attached.

By appropriately selecting the anion moiety and the cation moiety, the non-diffusible tetrazolium compound according to the present invention can be synthesized. The compound according to the present invention synthesized in this way is, for example, 2°35-triphenyl-2
H-tetrazolium-dioctyl succinate sulfonate, etc., as detailed in the examples below,
After each soluble salt is dispersed in gelatin, the two are mixed and dispersed in gelatin mud or lix;
Crystals of the oxidizing agent may be synthesized in pure form, dissolved in a suitable solvent (eg dimethyl sulfoxide), and then dispersed into a gelatin matrix.

If it is difficult to achieve uniform dispersion, emulsification and dispersion using an appropriate homogenizer such as an ultrasonic wave or a Manton-Gorlin homogenizer may give good results. In addition, by finely dispersing it in a high boiling point solvent such as dioctyl 7-talate,
It is also possible to protect it and disperse it in a hydrophilic colloid layer.

Next, hydrazine derivatives (e.g. U.S. Pat. No. 4,166.7)
No. 42, No. 4,168.977, No. 4,221.85
No. 7, No. 4,224゜401, No. 4,243.739
No. 4,272.606 and No. 4,311゜781, a negative-working silver halide photographic light-sensitive material to which a specific acylhydrazine compound was added was heated to pH 11.
, 0 to 12.3, and a method (hereinafter referred to as hydrazine high contrast development system) for obtaining high contrast negative images by processing with a solution containing 0.15 mol/Q or more of a sulfite preservative will be described.

Examples of hydrazine derivatives used in this method include aryl hydrazides described in U.S. Pat. No. 4,478,928 in which a sulfinic acid residue is bonded to a hydrazo moiety, as well as Examples include compounds represented by:

General formula (H) R, -N HN HG R2 In the formula, R1 represents an aliphatic group or an aromatic group, and R2 is a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or Represents an unsubstituted alkoxy group or a substituted or unsubstituted aryloxy group, G is a carbonyl group, a sulfonyl group, a sulfoxy group,
Represents a phosphoryl group or an N-substituted or unsubstituted iminomethylene group. The hydrazine derivative represented by the general formula (H) is disclosed in JP-A-62-210458, and the specific example compounds described in the same publication can also be used in the present invention.

In the present invention, the hydrazine derivative is preferably contained in an amount of I X 10-' mol to 5 X to" mol per mole of silver halide, particularly in the range of I This is a preferable addition amount.

In the present invention, when a hydrazine derivative is contained in a photographic light-sensitive material, it is used as an aqueous solution if it is water-soluble, or as an alcohol (for example, methanol or ethanol) if it is water-insoluble.
It may be added to a silver halide emulsion solution or a hydrophilic colloid solution as a solution of a water-miscible organic solvent such as an ester (eg, ethyl acetate) or a ketone (eg, acetone).

A hydrazine derivative may be used alone in the present invention,
Two or more types may be used in combination.

In addition, a method using a polyalkylene oxide compound is known as a lithium-type photographic light-sensitive material, and the lithium-type silver halide light-sensitive material is used as a hydroquinone developer, and the sulfite ion concentration is quite high (0.2 mol/Q or more). High pH (
10.5 or more) and a system (disclosed in Japanese Patent Application Laid-open No. 190943/1983) in which a high-contrast image can be obtained by using a developer containing a nitroindazole compound is also known. (Hereinafter, referred to as rapid squirrel technology.) Next, the polyalkylene oxide compound used in rapid squirrel technology will be explained.

The polyalkylene oxide compound used in the present invention is an alkylene oxide having 2 to 4 carbon atoms, such as ethylene oxide, propylene-1,2-oxide, butylene-1,
a polyalkylene oxide consisting of at least 10 units, such as 2-oxide, preferably ethylene oxide;
It includes condensates with compounds having at least one active hydrogen atom such as water, aliphatic alcohols, aromatic alcohols, fatty acids, organic amines, and hexitol derivatives, or block copolymers of two or more types of polyalkylene oxides. That is, as polyalkylene oxide compounds, specifically polyalkylene glycols polyalkylene glycol alkyl ethers//
// Aryl ethers 11
// (Alkylaryl) esters, polyalkylene glycol esters, polyalkylene glycol fatty acid amides, polyalkylene glycol amine acids, polyalkylene glycol block copolymers, polyalkylene glycol craft polymers, and the like can be used.

There is not only one polyalkylene oxide in the molecule,
Two or more may be included. The lateral polyalkylene oxide chains may then consist of fewer than 10 alkylene oxide units, but the total number of alkylene oxide units in the molecule must be at least 10. If there is more than one polyalkylene oxide in the molecule, each of them may consist of different alkylene oxide units, such as ethylene oxide and propylene oxide. The polyalkylene oxide compound used in the present invention preferably contains from 14 to 100 alkylene oxide units.

Specific examples of the polyalkylene oxide compounds used in the present invention are as follows.

Polyalkylene oxide compound example I HO(CH,CH20)IO2C+2HzaO(C)12cHzo)+aH0(CH
2CH2O) 3゜H C6 old ycH= CHCaHtsOs(CHzCHzO
)+sHCr+112xCOO(CH2CH20)a.

HCr+Ht3CONH(CJCHzO)+3HC8H
*5N(CHzXCHzCHzO)*+)]IO0H(
CH2CH20)a(CH2H20)b(CH2CH2
0) CHl CHl 1+b+c-50 b: (a+c) = 10: 9 In the present invention, the amount of polyalkylene oxide compound added is 1 mol of silver halide;
It is preferable to contain Ag, particularly preferably 10-'' to 10'g/mol Ag.

Furthermore, the following chemical sensitization may or may not be performed,
Non-chemical sensitization is particularly preferred.

Silver halide emulsions include gold compounds such as chloroauric acids and gold trichloride, salts of noble metals such as iridium, sulfur compounds that react with silver salts to form silver sulfide, stannous salts, and reducing compounds such as amines. Sensitivity can be increased without making the particles coarser with a chemical substance.

Further, iron compounds such as salts of noble metals such as iridium and red blood salts may be present during physical ripening of silver halide grains or during nucleation.

The average grain size of the photosensitive silver halide grains used in the present invention is defined as the diameter in the case of spherical grains, or the projected image converted into a circular image of the same area in the case of grains with a shape other than spherical. The average particle size is 0.05 μm to 0.2 μm.

Method for producing silver halide emulsion used in the present invention, sensitization method,
As for binder additives, etc., techniques known in the photographic industry can be used. For example, research on additives
Disclosure Volume 176, No. 17643 (
(December 1978) and Volume 187, No.

18716 (November 1979).

The silver halide emulsion (hereinafter referred to as silver halide emulsion) used in the present invention includes conventional silver halide such as silver bromide, silver iodobromide, silver iodochloride, silver chlorobromide, and silver chloride. Any silver halide emulsion used in can be used, but preferably silver chlorobromide or positive silver halide emulsion containing 60 mol% or more of silver chloride is used as a negative silver halide emulsion. These are silver chlorobromide, silver bromide, and silver iodobromide containing 10 mol% or more of silver bromide.

Silver halide grains used in silver halide emulsions contain cadmium salt, zinc salt, lead salt, thallium salt, iridium salt (complex salts containing), rhodium salt ( Metal ions can be added using at least one selected from iron salts (complex salts containing) and iron salts (complex salts containing iron salts) to contain these metal elements inside the particles and/or on the particle surfaces. In particular, water-soluble rhodium Preferably, it contains salt. Further, by placing the particles in an appropriate reducing atmosphere, reduction sensitizing nuclei can be provided inside the particles and/or on the particle surfaces.

When adding a water-soluble rhodium salt, preferably lX 10
"" l x 10-' mol/Agl l mol is preferred.

As the optical brightener, stilbene-based, triazine-based, pyrazoline-based, coumarin-based, and acetylene-based optical brighteners can be preferably used.

These compounds may be water-soluble, or insoluble ones may be used in the form of a dispersion.

As a matting agent, British Patent No. 1,055,713, U.S. Patent No. 1.939,213, U.S. Patent No. 2,221.87
No. 3, No. 2,268.662, No. 2,332,037
No. 2,376.005, No. 2,391.181, No. 2,701.245, No. 2,992. lO1,
3゜079.257, 3,262.782, 3,516,832, 3゜539.344, 3
, 591.379, 3,754,924, 3.767.448, etc., West German Patent No. 2,592.321, British Patent No. 760.77
5%, same l.

260.772%, U.S. Patent No. 1,201.905;
2.192.241, 3,053.662, 3,062,649, 3,257.206, 3
, No. 322,555, No. 3,353.958, No. 3,
370°951, 3,411,907, 3,4
37.484, 3,523°022, -'3.
No. 615.554, No. 3,635,714, No. 3,7
No. 69゜020, No. 4,021,245, No. 4,02
Inorganic matting agents such as those described in No. 9,504 can be preferably used.

The polymer latex added to the photographic light-sensitive material of the present invention is contained in the photographic emulsion layer and other hydrophilic colloids, and is generally used for the purpose of improving dimensional stability. It refers to a dispersion of a polymer, and in the present invention, it refers to a dispersion of a polymer such as alkyl (meth)acrylate, alkoxy (meth)acrylate, glycidyl (meth)acrylate, methacrylamide, vinyl ester (e.g. vinyl acetate), acrylonitrile, olefin, styrene, etc. Using a polymer whose monomer component is a drug or a combination thereof, or a combination thereof with acrylic acid, methacrylic acid, -1I unsaturated dicarboxylic acid, hydroxyalkyl (meth)acrylate, sulfoalkyl (meth)acrylate, styrene sulfonic acid, etc. be able to.

The amount added is 0.75 to 1.5 g/m2, preferably 1.2 to 1-5 g/m2. Examples of techniques for improving dimensional stability include Japanese Patent Publications Nos. 39-4272 and 39-17.
No. 702, No. 43-13482, U.S. Patent No. 23760
No. 05, No. 2763625, No. 2772166, No. 2852386, No. 2853457, etc.

The light-sensitive material of the present invention can be exposed to electromagnetic waves in a spectral region to which the emulsion layer constituting the light-sensitive material has sensitivity. As the light source, any known light source can be used, such as natural light (sunlight), a tungsten electric lamp, a fluorescent lamp, a quartz lamp, a mercury lamp, a microwave UV lamp, a xenon arc lamp, a carbon arc lamp, a xenon flash lamp, etc. In particular, preferable results can be obtained by imagewise exposing the photosensitive layer of the photosensitive material of the present invention having a maximum sensitivity of 450n+a or less using light that does not substantially contain light of 370nm or less. Especially in bright room photosensitive materials, 400n+
The sensitivity to light of m is 3 of the sensitivity to light of 360 nm.
It is particularly preferable that the ratio is 0 times or more.

Next, methods for "image-sensing the photosensitive layer with light that does not substantially contain light of 370 nm or less" include a method of incorporating an ultraviolet absorber into the photosensitive material, a method of using an optical filter that absorbs ultraviolet light, and a method of using a 370t1m There are methods using a light source that does not substantially emit energy as described below.

First, the first method will be explained.

Here, the ultraviolet absorber increases the inherent sensitivity of the silver halide emulsion by 1.
72 or less, and as this ultraviolet absorber, an ultraviolet absorber having a peak in the range of 300 to 400 nm can be used, and more preferably, a UV absorber having a peak in the range of 300 to 38 nm is used.
It is an ultraviolet absorber that has a peak at 0ni.

As the ultraviolet absorber, for example, a benzotriazole compound substituted with an aryl group, a 4-thiazolidone compound, a benzophenone compound, a cinnamic acid ester compound, a butadiene compound, a benzoxazole compound, and an ultraviolet absorber polymer can be used.

Specific examples of ultraviolet absorbers are given in U.S. Patent No. 3,533,794.
No. 3,314,794, No. 3,352.681, JP-A-46-2784, U.S. Patent No. 3,705,80
No. 5, No. 3, No. 707, No. 375, No. 4,045, 2
No. 29, No. 3,700,455, No. 3,499,76
No. 2, West German Patent Application Publication No. 1,547,563, etc.

In the present invention, specific compounds described in JP-A-62-210458 can be used.

In the present invention, the ultraviolet absorber is added so as to reduce the intrinsic sensitivity of the /10 silver germide emulsion at 360 nm to 1/2 or less, but the amount added is such that the absorbance at 360 nm is 0.3 or more. More preferably, the amount is such that the absorbance at 36Qnm is 0.4 or more.

Although it varies depending on the molar absorption coefficient of the ultraviolet absorber, it is usually 10
-"g/+n" to 1 g/m", preferably 50+ig to 500 B/m".

The ultraviolet absorber of the present invention is contained in an emulsion layer, a surface protective layer, an intermediate layer, etc.

The above ultraviolet absorber may be used in a suitable solvent [e.g. water, alcohol (e.g. methanol, ethanol, propatool, etc.)].
, acetone, methyl cellosolve, etc., or a mixed solvent thereof] and added to the coating solution for a non-photosensitive hydrophilic colloid layer of the present invention.

Two or more of these ultraviolet absorbers can also be used in combination.

In the present invention, the above-mentioned safelight dye and ultraviolet absorber may be present in the same layer or in different layers.

Next, the second method will be explained. Kodak Latchin Filter N is an optical filter that absorbs ultraviolet rays (that is, a light source filter).

It is preferable to use a filter such as -2B that hardly transmits light of 370 nm or less. More specifically, the transmittance is preferably 20% or less, more preferably 10% or less.

Next, a third method will be explained. The light source itself is 370
Examples of light sources that do not substantially emit energy in the region below am are Eye Graphics Co., Ltd.'s Idol Fin, and Dainippon Screen Co., Ltd.'s Printer P for Plate Making.
-Light source for 603 (metal halide lamp TYPE 5P
G-2000 (2KW) manufactured by Nippon Battery Co., Ltd.).

The light source used in this third method is 300 to 4
Of the emission energy in the 20 nm region, 300
Those having an emission energy of 30% or less in the region of ~370 nm are preferably used, and those having an emission energy of 20% or less are particularly preferably used.

Furthermore, commercially available photosensitive materials for bright rooms (for example, Konica Co., Ltd.'s C
RH-100, KUV-1 manufactured by Fuji Photo Film Co., Ltd.
00, etc.) can also be exposed using a light source with a higher capacity than a conventional bright room light source through an optical filter (light source filter) that cuts ultraviolet rays. The high-capacity light source used here is, for example, the high-pressure mercury lamp H-15-L 31 (15K W) manufactured by I-Graphic Co., Ltd.
etc. can be mentioned.

Optical filter that absorbs ultraviolet rays (filter for light source)
When sensitizing is performed between a light source and a photosensitive material, when a layer containing an ultraviolet absorber, etc. is provided in the photosensitive material so that light that does not substantially contain light of 370 nm or less reaches the photosensitive layer, etc. In this case, conventional known light sources can be used. For example, the light source for plate-making printer P-607 (ultra-high pressure mercury lamp: UR) manufactured by Dainippon Screen Co., Ltd.
T-CHM-1000) and P-627FM light source manufactured by the same company.

In the method of the present invention, the exposure time is selected depending on the capacity of the light source used, the sensitivity of the photosensitive material (content - photosensitivity), etc., but is usually 60 seconds to 5 seconds. In some cases, exposure may be performed for a long time (2 to 3 minutes).

Various types of development processing such as black and white, color, and reversal processing using known methods can be used to develop the photosensitive material according to the method of the present invention. It is valid.

In the present invention, dyes used for filter dyes, antihalation, and various other purposes include triallyl dyes, oxanol dyes, hemioxanol dyes, merocyanine dyes, cyanine dyes, styryl dyes, and azo dyes. Among them, oxanol dyes; hemioxanol dyes and merocyanine dyes are useful. Furthermore, compounds described in Japanese Patent Application No. 153156/1988 can be used in the present invention.

That is, the desensitizing dye used to achieve the object of the present invention is preferably a compound in which the sum of the anode potential and the cathode potential of the polarogram is positive, and such compounds are described in numerous patents and literature. Although any desensitizing dye can be used, those represented by the following general formulas (1) to (V) shown in the above-mentioned Japanese Patent Application Publication No. 1999-1999 can be preferably used as desensitizing dyes.

These compounds are described in U.S. Pat. No. 3,567,456;
3,615.639, 3,579.345, 3,615,608, 3,598,596, 3
, No. 598,955, No. 3,592.653, No. 3,
No. 582.343, Special Publication No. 40-26751, No. 40
-27332, 43-13167, 45-88
It can be synthesized with reference to specifications such as No. 33 and No. 47-8746.

General formula (1) General formula (II) General formula CI) and CI [] In the formulas, R1 is hydrogen, a halogen atom, a cyan group, or a nitro group, and R1 and R2 may form an aromatic ring.

R1 and R2 each represent an alkyl group, a lower alkenyl group, a phenyl group or a lower hydroxyalkyl group, R,
and when R2 is other than a hydrogen atom, it may be an aryl group, n is a positive number of 1 to 4, R.

represents a lower alkyl group or a sulfonated lower alkyl group, and X represents an acid anion.

Formula CII J nucleus, nitrobenzoselenazole nucleus, imidazo[4.5-b]quinoxaline nucleus,
3,3-dimethyl-3H-pyrrolo [2,3-b1 pyridine nucleus, 3,3-dialkyl-H-nitroindole nucleus,
Thiazolo[4,5-b1 forms a quinoline nucleus, nitroquinoline nucleus, nitrothiazole nucleus, nitronaphthothiazole nucleus, nitrooxazole nucleus, nitronaphthoxazole nucleus, nitroselenazole nucleus, nitronaphthoselenazole nucleus or nitropyridine nucleus The atomic group required for
is an anion, m and n each represent l or 2. However, when the compound forms an inner salt, n represents l.

General formula (IV) General formula [■] In the formula, R l, R 2, R 3 and R4 are each a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, or a nitro group, and R is a hydrogen atom , represents an alkyl group or a nitro group. Z is a thiazole nucleus which is unsubstituted or substituted with a lower alkyl group, phenyl group, thienyl group, halogen atom, alkoxy group, hydroxy group, cyano group, alkylsulfonyl group, alkoxycarbonyl group, phenylsulfonyl group, or trifluoromethyl group, respectively; , benzothiazole nucleus, naphthothiazole nucleus, oxazole nucleus, benzoxazole nucleus, naphthoxazole nucleus, selenazole nucleus, benzoselenazole nucleus, naphthoselenazole nucleus, thiazoline nucleus, pyridine nucleus, quinoline nucleus, isoquinoline nucleus, 3,3-dialkyl -3H-Indole nucleus, imidazole nucleus, benzimidazole nucleus or 7-timidazole nucleus represents an atomic group necessary to form +LL and L2 are methine chains which are unsubstituted or substituted with a lower alkyl group or an aryl group. R6 and R7 each represent an unsubstituted or substituted alkyl group, alkenyl group, aryl group, sulfoalkyl group, or aralkyl group, X represents an anion, and m and n each represent 1 or 2. However, when the compound forms an inner salt, n represents l.

General formula [■] R2) (e In the general formula (V), R1 and R1 each represent an alkyl group, and R2 represents an aryl group. L+ and 2 are each unsubstituted or substituted with a lower alkyl group or an aryl group. Z represents a methine chain, thiazole nucleus, benzothiazole nucleus, naphthothiazole nucleus, oxazole nucleus, benzoxazole nucleus, naphthoxazole nucleus, selenazole nucleus, benzoselenazole nucleus, naphthoselenazole nucleus, thiazoline nucleus, pyridine nucleus, quinoline nucleus, 3,3-dialkylindolenine nucleus, imidazole nucleus, imidazo [4.
5-b] Atom group necessary to form a quinoxaline nucleus, X represents an anion, m represents a positive integer of 1 to 3, and n represents a positive integer of 1 to 2.

Next, specific examples of the compounds represented by the above general formulas CI) to CV) are shown below. It goes without saying that the present invention is not limited to these compounds. Moreover, in the following exemplified compounds, Pts represents para-toluenesulfonic acid anion.

(Exemplary compound) CH2C)! 208 CH2CHxOHIe N) ICOCH.

C,H.

O2 CI(.

C2H.

The amount of the desensitizing dye used in the present invention is preferably 1 mg to 1,000 mg per mole of silver halide, and is particularly preferably selected within the range of 5 mg to 300 mg. The addition time is
It may be performed during silver halide production, during physical ripening, during chemical ripening, after ripening, or during preparation of the coating solution. Also,
The desensitizing dye of the present invention uses 45
It is desirable to have a low sensitivity of 0 nm or less, and a material with a maximum spectral sensitivity wavelength of 500 am or more is preferred.

The silver halide photographic light-sensitive material of the present invention can be processed using any common printing developer, but in particular, when using a tetrazolium compound or a hydrazine compound among the contrast agents described in the specification, PL (10,0~12.
PQ or M containing 0.5 mol/Q or more sulfite in 9
Particularly favorable results can be obtained by processing with a Q-based developer. In addition, when using a polyalkylene oxide compound, the above PQ.

Favorable results can be obtained by using a so-called Lith type developer in addition to the MQ type developer. However, the present invention is not limited to such combinations.

In the present invention, the fixer preferably contains an AQ compound in order to improve the hardness of the photosensitive material, and it is more preferable that the content is O01 to 39/Q in terms of AI2 in the solution used. .

The preferred concentration of sulfite contained in the fixer is 0.03 to 0.
4 mol/12, more preferably 0.04 to 0.3
Mol/Q.

Preferred Fixer 1) H is 3.9 to 6.5, and at this pH the fixer provides favorable photographic performance, and the effect of the photosensitive material of the present invention becomes remarkable. The most preferred solution is pH
is 4.2 to 5.3.

In the present invention, the total processing time of 20 seconds to 60 seconds is the time that includes all steps of development, fixing, washing, and drying (all including waving), but the number of seconds for development and the number of seconds for fixing are set completely independently. Whichever can be used may be longer, and of course the same number of seconds is particularly preferably developed; fixing 1:0.3 to 1:3. Furthermore, the developing temperature and the fixing temperature may be set completely independently, either one may be higher, and of course they may be the same temperature. Particularly preferably, the fixing temperature is within a range of -15°C to +15°C relative to the developing temperature. Further, it is preferable for the apparatus that the washing water is at room temperature, but the temperature may be raised by installing a temperature controller.

The temperature after development and after fixing is preferably 20° C. to 45° C. from the viewpoint of stability and odor of Asahi Risui.

〔Example〕

Examples of the present invention will be described in detail below, but it goes without saying that the present invention is not limited thereto.

Example 1 A negative silver halide photosensitive material was prepared as a photosensitive material for bright room reversal in the following manner.

(Preparation of emulsion) A silver chlorobromide emulsion having a silver bromide content of 2 mol % was prepared as follows.

An aqueous solution containing 23.9 m9 of pentabromorodium potassium salt, sodium chloride and potassium bromide per 60 g of silver nitrate and an aqueous silver nitrate solution were stirred into an aqueous gelatin solution at 25°C, 30°C, 240°C and 150°C for 25 minutes.
Simultaneously mixed for 1 minute, each with an average particle size of 0.05 μm.

Silver chlorobromide emulsions of 0.10 μm, 0.20 μm, and 0.30 μm were prepared, respectively.

6-methyl-4-hydroxy-1,3,3a,7-chitrazaindene was added to these emulsions as a stabilizer.
After adding 19, it was washed with water and desalted.

To this, 6-methyl 4-hydroxy-1 of 201119,
After adding 3,3a,7-chitrazaindene, sulfur sensitization was performed.

After sulfur sensitization, add the required amount of gelatin and use 6-methyl-4-hydroxy-1,3,3a as a stabilizer.
.

Add 7-chitrazaindene and then add 260II with water.
An emulsion was prepared by finishing I2.

(Preparation of latex (L) for emulsion addition) Add 0.25 to 9 of Meito Sangyo's KMDS (dextran sulfate ester sodium salt) to 40Q of water and 0.05 of ammonium persulfate.
n-butyl acrylate 4.51 to 9, styrene 5
．． Add a mixture of 9 to 49 and 0.1 to acrylic acid over 1 hour, then add 0.005 of ammonium persulfate.
After further stirring for 1.5 hours, the mixture was cooled and the pH was adjusted to 6 with aqueous ammonia.

The obtained latex liquid was filtered using a Whoman GF/D filter, and the particle size was adjusted to 50.5 to 9 with water to obtain a monodisperse latex for adding emulsion liquid with an average particle size of 0.25μ (
L) was created.

The following additives were added to the emulsion to prepare a silver halide emulsion coating solution as described below.

(Preparation of emulsion coating solution) After adding compound (K) 91119 as a bactericide to the emulsion solution, the pH was adjusted to 6.5 using 0.5N sodium hydroxide solution, and then the following compound (T) was added. Add as shown in Table 1-1, and further add 20% saponin per mole of silver halide.
% aqueous solution, 180 mQ of sodium dodecylbenzenesulfonate, 80 ng of 9.5-methylbenztriazole, and the latex liquid (L) for adding the emulsion liquid.
were added as shown in El-(1) to E5-(2) in Table 1-2, the following compound (M) was added at 60 my, and styrene-maleic acid copolymer aqueous polymer was added at 280 my as a thickener.
Add mg sequentially, 4751 with water! Emulsion coating solutions El to E5 as shown in Table 1 were prepared by finishing the emulsion coating solution to 1I2.

Next, an emulsion protective film coating solution was prepared as follows.

(Preparation of emulsion protective film coating solution P-1) Add pure water to gelatin and dissolve at 40°C after swelling, then add 2% aqueous solution of the following compound (Z) as a coating aid.
．． 9Q, the following compound (N) as a filter dye
09. As a matting agent, 20 g of amorphous silica with an average particle size of 8 μm, 10 g of amorphous silica with an average particle size of 3 μm, and 62 g of the following compound (B) were sequentially added, and the pH was further adjusted to 5.4 with citric acid solution, An emulsion protective film coating solution P-1 was prepared by finishing with water.

Compound (T) Compound (Z) Compound (M) Compound (N) Compound (A) Compound (B) Swell gelatin 36 and 9 in water, heat to dissolve, and use the following compound (C-1) as a dye. 9 to 1.6, (C-2)
310g of (C-3), 9 to 1.9g of the above compound (N
) was added as an aqueous solution, and then 2.9 kg of saponin was added as an aqueous solution.
A 0% aqueous solution was added to 1112, and the following compound (
C-4) was added to 5 by 9, and then 63 g of the following compound (C-5) and the following compound (C-4) were added as a methanol solution.
6) was added 2709 times. To this liquid, 8009 styrene-maleic acid copolymer water-soluble polymer was added as a thickener to adjust the viscosity, and the pH was adjusted to 5.4 using an aqueous citric acid solution.Finally, 144 g of glyoxal was added, and water was added to 960 ml. A BC coating liquid B-1 was prepared.

Compound (C-1) Next, a backing coating solution used for coating a backing lower layer was prepared as follows.

(Preparation of backing coating liquid B-1) Compound (C) Compound (C-5) Compound (C-6) Compound (C-3) Compound (C-4) Next, a protective film is applied for coating the protective film layer of the backing layer. Liquid p-2 was prepared as follows.

(Preparation of protective film coating solution P-2) Gelatin 50 and 9 were swollen in water, dissolved by heating, 340 g of 2-sulfonate-succinic acid bis(2-ethylhexyl) ester sodium salt was added, and polymethyl chloride was added as a matting agent. 1.7 methacrylate (average particle size approximately 0.4μ)
To 9, add sodium chloride to 3.4 to 9, further add 1-IKg of glyoxal and 5409 of mucochloric acid, and finish to 100,012 with water to prepare protective film coating solution P-2.

[Creation of evaluation sample]

Each of the above coating liquids was applied to Example-1 of JP-A-59-09941.
It was applied to both sides of a polyethylene terephthalate film (thickness 100 μm) coated with an undercoat layer.
The evaluation sample shown in was prepared.

At that time, a backing lower layer was coated on one side of the support coated with the undercoat layer using coating solution B-1 so that the gelatin dry weight was 2ti/m'', and at the same time a backing protection layer was applied on top of the backing layer. The film layer was coated and dried using protective film liquid P-2 so that the gelatin dry weight was 19/11''. The emulsion layer is then deposited on the other side of the support with a gelatin dry weight surface.
2, and the coated silver amount was 4.0 g/m2, and on top of that, an emulsion protective film layer was applied with protective film liquid P-
Evaluation samples El-(1) to E5-(2) were prepared by coating and drying the emulsion layer at the same time while adding formalin as a hardening agent so that the gelatin dry weight became the value shown in Table 2. child.

Table 1-1 The above samples El-(1) to E5-(2) were each prepared in advance using a bright room printer P-627FM (manufactured by Dainippon Screen) equipped with a non-electrodischarge tube light source manufactured by Fusion (USA). The original and the emulsion surface were brought into close contact and exposed. The developing solution for the obtained sample was determined by the combination with the added contrast enhancer, and the following developing solution and fixing solution were used for the sample to which a tetrazolium compound was added. Further, processing was carried out under rapid development conditions using an automatic developing machine with variable speed. For each treated sample, T was determined in the density range of 0.3 to 3.0, and character performance and cracking tests were conducted to evaluate.

[Developer prescription]

(Composition A) Pure water (ion exchange water) 15Q+n
12 Ethylenediaminetetraacetic acid disodium salt 2g Diethylene glycol 509 Potassium sulfite (55% W/V aqueous solution) 100m4 Potassium carbonate 509 Hydroquinone 1595-Methylbenzotriazole 200mg1-phenyl-5
-Mercaptotetrazole 30mg potassium hydroxide
Amount of potassium bromide to bring the pH of the solution to 10.4
4.5g (composition) Pure water (ion exchange water) 3mQ diethylene glycol 509 ethylenediaminetetraacetic acid disodium salt 251119 acetic acid (9
0% aqueous solution) 0.3mff5-
Nitroindazole 110mg1-
Phenyl-3-pyrazolidone 500mg
When using a developer, the above composition A and composition B were dissolved in 500 I of water in that order, and the resulting solution was finished to 1 I2.

[Fixer prescription]

(Composition A) Ammonium thiosulfate (72.5% W/V aqueous solution) 23
On+71 Sodium Sulfite 9
．． 5g Sodium acetate trihydrate 15.
99 boric acid 6.7g
Sodium citrate dihydrate 2g Acetic acid (90% W/W aqueous solution) 3.1m
12 (Composition) Pure water (ion exchange water) 17mQ sulfuric acid (50% W/W aqueous solution) 5.
89 aluminum sulfate (AQ20. aqueous solution with a converted content of 8.1% L'W)
When using the 26.59 fixer, it was dissolved in 500 ml of water in the order of composition A and composition B, and finished to I+2. The pH of this fixer was about 4.3.

[Quick development processing conditions]

(Process) (Temperature) (Time) (Tank capacity)
Development 35°O 15 seconds 20 (4
0 fixation 35°O 15 seconds
2Off water washing 18℃ 10 seconds
to (20α) drying 40℃
10 seconds 20I2 dryer heat transfer coefficient 1
80Kcaff/hm'' ·°C Automatic developing machine installation environment Humidity (temperature) -23°C, (relative humidity) -40% Each process time includes the so-called wading conveyance time to the next process.

Dry to Dry time: 50 seconds Line speed: 2000 +++ m/win Next, each evaluation method will be explained.

■The γ value is determined by the following formula.

■ Crack test The obtained samples of El-(1) to E5-(2) were
Each sample was cut into a size of 4 cm x 4 cm, and placed in an absolutely dry condition of 0% humidity and 40° C., and the state of the emulsion surface was evaluated on the 5th day. The evaluation ranking is done visually on a 5-level scale, with the best level being 5, where there is no abnormality on the emulsion surface and no signs of cracking, and 1 being the worst. A value of 3 or higher is a practical level.

■Evaluation of cutout character image quality: 50% as cutout character image quality 5
This refers to the image quality in which characters with a width of 30 μm are reproduced when proper exposure is performed so that the halftone dot area becomes 50% of the halftone dot area on the photosensitive material for return, and it is a very good cutout character image quality. On the other hand, the cut-out character image quality 1 refers to an image quality in which only characters with a width of 150 μm or more can be reproduced when the same appropriate exposure is given, and is poor cut-out character quality. A value of 3 or higher is a practical level.

From the results in Table 2, it is clear that the total amount of gelatin in the emulsion layer containing silver halide in a silver halide photosensitive material with a grain size of 0.05 to 0.20 μm is in the range of 2.0 to 3-5 g/m2 and Contains polymer latex of 0.75-1.5g/m2
and a concentration of 0.3 to 3.0.
When a silver halide photographic light-sensitive material with a value of 6.0 or more is subjected to ultra-rapid processing, its cut-out character performance and cracks are reduced. A hydrazine compound and a polyalkylene oxide compound were used as contrast enhancing agents in order to obtain a γ value of 6 or more, which is defined as 0.3 to 3.0.

In the same manner as in Example 1, the particle size was 0.05 μm and 0.05 μm. IIL
Particles of m, 0.211 m, 0.3 μI were prepared. When preparing the emulsion, the above-mentioned hydrazine compound (H) and polyalkylene oxide compound (P) were used instead of the tetrazolium compound.
E0) was added as shown in Table 3-1, and the amount of polymer latex was added as shown in Table 3-2 to prepare a coated emulsion in the same manner as in Example 1. Coating samples H-1-(], )～)l
-5-(2) and P-1-(1) to p-5-(2) were obtained, imagewise exposed and developed in the same manner as in Example 1, and the γ value and cut-out characters were evaluated. The results are shown in Table 4. In addition, H
-1-El-5 was processed using developer B, and P-1-P-5 was processed using developer C. The fixing solution was the above-mentioned compound (H), compound (P), 5-methylbenzotriazole n-butyl jetanolamide water was added and 0.6 g 15.09 Q (pH = 11.6) Developer solution C Konica Corporation ), quick squirrel developer CDL-271A
B was used.

Developing solution B Hydroquinone N-methyl p/Aminophe sodium hydroxide Potassium hydroxide 5/Boric acid Potassium sulfite Ethylenediamine Tetraacetic acid Dina Potassium bromide 45.0g 0.8g 15.09 55.09 45.0g 35.09 110.09 Lium salt 1.0 g 6.0 g -ru 1/2 sulfate From the results in Table 4, it was possible to obtain similarly good results even when a hydrazide compound was used in place of the tetrazolium compound. Similar good results can also be obtained using polyalkylene oxide compounds.

〔Effect of the invention〕

According to the present invention, it was possible to provide a silver halide photographic light-sensitive material for bright room use that enables ultra-quick processing in a total processing time of 20 to 60 seconds without causing deterioration in the quality of cut-out characters.

Claims (1)

[Claims] In a silver halide photographic light-sensitive material for bright room use containing silver halide grains having main photosensitivity at 300 nm to 450 nm and having a grain size of 0.05 to 0.20 μm, the side having photosensitive silver halide The amount of gelatin in the photographic constituent layer is in the range of 1.5 to 3.0 g/m^2, and the amount of polymer latex in the photosensitive material is in the range of 0.75 to 1.5 g/m^2.
When it is contained in the range of 2 and subjected to image exposure and development processing,
The γ value defined at a concentration of 0.3 to 3.0 is substantially 6.0
A silver halide photographic light-sensitive material for bright room use, characterized by having the above value.