JPH02234301A - Luminous material - Google Patents

Luminous material

Info

Publication number
JPH02234301A
JPH02234301A JP5186489A JP5186489A JPH02234301A JP H02234301 A JPH02234301 A JP H02234301A JP 5186489 A JP5186489 A JP 5186489A JP 5186489 A JP5186489 A JP 5186489A JP H02234301 A JPH02234301 A JP H02234301A
Authority
JP
Japan
Prior art keywords
light
luminous
fine particles
less
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5186489A
Other languages
Japanese (ja)
Inventor
Hiroko Ogawa
小川 博子
Yumie Imanishi
今西 由美恵
Hirotsugu Takagi
高木 博嗣
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP5186489A priority Critical patent/JPH02234301A/en
Publication of JPH02234301A publication Critical patent/JPH02234301A/en
Pending legal-status Critical Current

Links

Landscapes

  • Luminescent Compositions (AREA)

Abstract

PURPOSE:To increase luminous intensity or enable the addition of luminous characteristics by impregnating a luminous material with fine particles of IV group elements containing at least a halogen element. CONSTITUTION:A luminous material emitting light when applied with excitation energy is impregnated with IV group elements containing at least a halogen element. In this case, it is preferable from a viewpoint of easy handling to use a luminous material having an aggregate of fine particles formed in such a way that the fine particles are dispersed in a fine particle film or binder deposited in layer on a substrate. Also, the size of the fine particle may be approximately equal to or less than the wave-length of emitted light. In the case of visible rays, the size is approximately equal to or less than 1mum, or preferably equal to or less than 0.1mum, or more preferably equal to or less than 500Angstrom . According to the aforesaid construction, it is possible to make luminous the material that does not emit light at normal temperature or drastically increase luminous intensity. In addition, the material is almost free from a secular change and it is possible for the material to be luminous stably at all times.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は電場.電線,X線.紫外線,あるいは可視光や
赤外線などの励起エネルギーを吸収させる事により、蛍
光や燐光などの光を放出する作用を有する発光部材に関
する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an electric field. Electric wire, X-ray. The present invention relates to a light-emitting member that emits light such as fluorescence or phosphorescence by absorbing excitation energy such as ultraviolet light, visible light, or infrared light.

〔従来の技術〕[Conventional technology]

従来、蛍光や燐光を発する発光部材としては種々のもの
が知られて来た。例えば直接遷移型の半導体であるGa
AsやInPなどの■一v族化合物の結晶やZnS, 
ZnSeなどの■〜■族化合物の結晶で鉱、これらの材
料のバンドギャップよりも大きなエネルギーの光を照射
すると、これを吸収して照射光すなわち励起光よりも低
エネルギーの光を放出して発光する。また、いわゆる間
接遷移型の材料でも例えばSiCなどの様にバンドギャ
ップ内に再結合中心をつくってやればかなり強く発光す
る。また、イオン性の強い結晶では不純物による蛍光が
生じる。例えば、MCI : Tl”ではTl◆イオン
が短波長の励起光により励起され、196n〔および2
49nmに蛍光スペクトルのピークが出る。この様な発
光は電磁波だけでなく電子線によっても引き起こされる
。例えばブラウン管に用いられる蛍光体であるY,02
Sではアクチベータ不純物としてEu″4が加えられ、
赤色の発光が電子線照射により引き起こされる。この様
な例はZnSへの八g8による青の蛍光, ZnF2へ
のMn添加によるオレンジ色の蛍光など多くの例が知ら
れている。また、例えばApplied Physic
s Letters 13 210 (1968)にみ
られるように発光部材に電極をつけて電場をかける事に
よって発光させる方法も従来知られてきた方法である。
Conventionally, various types of light-emitting members that emit fluorescence or phosphorescence have been known. For example, Ga, which is a direct transition type semiconductor,
■Crystals of Group 1V compounds such as As and InP, ZnS,
When crystals of group ■~■ compounds such as ZnSe are irradiated with light of energy greater than the band gap of these materials, they absorb it and emit light with lower energy than the irradiated light, that is, the excitation light, and emit light. do. Furthermore, even a so-called indirect transition type material, such as SiC, emits considerably strong light if a recombination center is created within the band gap. Further, in highly ionic crystals, fluorescence occurs due to impurities. For example, in MCI: Tl'', Tl◆ ions are excited by short wavelength excitation light, and 196n [and 2
A fluorescence spectrum peak appears at 49 nm. Such light emission is caused not only by electromagnetic waves but also by electron beams. For example, Y,02 is a phosphor used in cathode ray tubes.
In S, Eu″4 is added as an activator impurity,
Red light emission is caused by electron beam irradiation. Many examples of this are known, such as blue fluorescence due to 8g8 to ZnS and orange fluorescence due to Mn addition to ZnF2. Also, for example, Applied Physics
Another conventionally known method is to apply an electric field to a light-emitting member by attaching an electrode to the light-emitting member to emit light, as shown in ``S Letters 13, 210 (1968).

例えば、Mnを添加したZnSやCuとCIを添加した
ZnSなどの微結晶粒をバインダーに分散させたものを
発光部材として用い、これに交流電場を印加すると、い
わゆるエレクトロルミネッセンス( EL)による発光
が見られる。これらはディスプレーなどに利用される。
For example, when microcrystalline grains such as ZnS doped with Mn or ZnS doped with Cu and CI are dispersed in a binder as a light emitting member and an alternating current electric field is applied to it, light is emitted by so-called electroluminescence (EL). Can be seen. These are used for displays, etc.

また、m−V族化合物などの直接遷移型半導体のp−ロ
接合を用いた注入発光も現在では良く知られた技術であ
る。さらに、このようないわゆる LEDを改良してレ
ーザー発振させる事を可能にしたものが半導体レーザー
である。これらについては例えばS.M.Sze著のP
hysics of Se+siconductor 
Devices第12章(John Ililey &
 Sons. 1981 )などの標準的な参考書に詳
しく述べられているし、製品も市場に沢山出回っている
Injection light emission using a p-ro junction of a direct transition type semiconductor such as an m-V group compound is also a well-known technology at present. Furthermore, a semiconductor laser is an improved version of such a so-called LED and has made it possible to generate laser oscillation. For example, S. M. P by Sze
dynamics of Se+siliconductor
Devices Chapter 12 (John Ililey &
Sons. (1981) and other standard reference books, and there are many products on the market.

この様に様々な形で励起エネルギーを与える事により、
紫外線、可視光、あるいは赤外線などの光を放出する発
光部材は良く知られたものである。これらの発光特性は
一般に,まずフォト・ルミネッセンスの有無,強弱およ
びその発光波長分布を調べる事によりチェック出来る。
By applying excitation energy in various ways like this,
Light-emitting members that emit light such as ultraviolet light, visible light, or infrared light are well known. Generally, these luminescent characteristics can be checked by first examining the presence or absence of photoluminescence, its intensity, and its emission wavelength distribution.

〔発明が解決しようとしている課題〕[Problem that the invention is trying to solve]

しかしながらその一方で発光強度が弱いものや実用−ト
発光特性を利用できる程に発光しないものも沢山あった
。また、発光の内部量子効率がかなり高い材料であって
も、その屈折率が高いために発光した光が外へ出射でき
る臨界角が小さいため、内部から外へ出られず、外へ出
る前に多重反射をくり返して、減衰してしまう場合も多
い。また、発光した光の波長は吸収もされ易い場合が多
いので内部での多重反射は発光の利用という点で不利で
あり、大きな問題となって来た。これらの問題を解決す
るためには発光部材の物性の改質という側面だけでなく
、上記の様な発光した光の効率的な外部への取り出しを
工夫していく必要があるが、個々のケースでは現象がか
なり複雑になり、これらを総合的に解決して行くのは困
難であった。
However, on the other hand, there were also many that had low luminescence intensity or did not emit light to the extent that their luminous properties could be used for practical purposes. In addition, even if a material has a fairly high internal quantum efficiency for light emission, its high refractive index means that the critical angle at which the emitted light can exit is small, so it cannot escape from the inside and is unable to escape before exiting. In many cases, the light is attenuated due to repeated multiple reflections. Furthermore, since the wavelength of the emitted light is often easily absorbed, multiple internal reflections are disadvantageous in terms of the utilization of the emitted light, and have become a major problem. In order to solve these problems, it is necessary not only to improve the physical properties of the light emitting material, but also to devise ways to efficiently extract the emitted light to the outside as described above. The phenomena became quite complex, and it was difficult to solve them comprehensively.

本発明の目的は、上記の様な発光の弱い材料に関してそ
の実質的な発光強度を増加させ、又は新たに発光特性を
付加させた新規な発光部材を提供することにある。
An object of the present invention is to provide a novel light-emitting member in which the substantial light-emitting intensity of the above-mentioned weak light-emitting materials is increased or new light-emitting characteristics are added.

(課題を解決するための手段) 本発明は、励起エネルギーを付与することにより光を放
出する発光部材において、発光部が少なくともハロゲン
元素を含有する■族元素の微粒子を含むことを特徴とす
る発光部材である。
(Means for Solving the Problems) The present invention provides a light-emitting member that emits light upon application of excitation energy, characterized in that the light-emitting portion contains fine particles of a group III element containing at least a halogen element. It is a member.

特に実用上は、微粒子の集合体が基体上に層状に堆積し
た微粒子膜あるいはバインダー中に微粒子を分散したバ
インダー分散膜となっている発光部材が取り扱い易さの
点から望ましいが、しかし本発明の有効性はこの様な微
粒子膜またはバインダー分散膜のみに限定されるもので
はない。
In particular, from the viewpoint of ease of handling, it is desirable to use a light-emitting member in the form of a fine particle film in which aggregates of fine particles are deposited in a layer on a substrate or a binder-dispersed film in which fine particles are dispersed in a binder. Efficacy is not limited to such particulate or binder dispersed films.

本発明における微粒子はその大きさが発光波長と同程度
又はそれ以下のものであれば良い。可視光の発光の場合
には大体1μ1以下、望ましくは0.1μ園以下、さら
に望ましくは500人以下である。
The fine particles used in the present invention may have a size comparable to or smaller than the emission wavelength. In the case of visible light emission, the number is approximately 1μ1 or less, preferably 0.1μ or less, and more preferably 500 or less.

上記の微粒子の形状は特に制限されるものではないが、
比較的球に近く、大きすぎる粒子が混合しない場合の方
が効果的である。大きさの下限は不明であるが、透過電
子顕微鏡(TEM)及び電界放射型走査電子顕@鏡によ
る観察結果によれば、数lO人の平均粒子を持つ超微粒
子であっても効果が認められる。
Although the shape of the above-mentioned fine particles is not particularly limited,
It is more effective if the particles are relatively spherical and do not contain too large particles. The lower limit of the size is unknown, but according to observation results using a transmission electron microscope (TEM) and a field emission scanning electron microscope, the effect is recognized even with ultrafine particles with an average particle size of several 100 people. .

実用Lは上記の様な本発明の微粒子を取扱うためにはそ
れを何らかの基体上にのせて固定すれば良い。その際個
々の微粒子は必ずしも相互に接触している必要はなく基
体上で孤立していても良いが、一般的には全体としての
発光強度をかせぐため微粒子の集合体、例えば凝集体や
堆積膜などの方が望ましい。
In practical use, in order to handle the fine particles of the present invention as described above, it is sufficient to place them on some kind of substrate and fix them. In this case, the individual fine particles do not necessarily have to be in contact with each other and may be isolated on the substrate, but in general, in order to increase the overall luminescence intensity, it is necessary to form aggregations of fine particles, such as aggregates or deposited films. etc. is preferable.

本発明に係る微粒子において、ハロゲンを含有して発光
強度を驚異的に上げる材料としてはシリコンなどの■族
系の材料であるが、Ge, Cおよびその混合材料でも
効果がある。
In the fine particles according to the present invention, a material containing a halogen and surprisingly increasing the emission intensity is a group II material such as silicon, but Ge, C, and a mixed material thereof are also effective.

本発明の発光部材に用いられる原料ガスとしては、5i
F4, SiCl4だけでなく、Si成膜に使・われる
シランの誘導体例、たとえばSi2F., St2CI
,なども使用可能である。さらに、他の■族系のガス、
たとえば、CF4, CF3DH, 02F6その他の
炭化水素系のガス、また同様にGe型のガスの使用も可
能である。
The raw material gas used in the light emitting member of the present invention is 5i
In addition to F4 and SiCl4, examples of silane derivatives used in Si film formation, such as Si2F. , St2CI
, etc. can also be used. In addition, other group II gases,
For example, it is possible to use CF4, CF3DH, 02F6 and other hydrocarbon gases, as well as Ge type gases.

また%Si系ガスとC系ガス、Si系のガスとGe系の
ガスの様に、2種.3種のガスを混合して使用すること
も可能である。さらに、これらのガスを用いて天然には
存在しない予め活性なガスを生成し、それを希釈して微
粒子を生成することも可能である.たとえば ^十AB,→2^B2 ^:■族元素 B:ハロゲン元素 の反応を起こさせ、活性な八n2ガスを生成させること
ができる. また、キャリアガスにハロゲンガスを導入する、また、
微粒子作成後、ハロゲンガス雰囲気で加熱処理する等に
よりハロゲンを導入することも可能である。
There are also two types of gases, such as %Si-based gas and C-based gas, and Si-based gas and Ge-based gas. It is also possible to use a mixture of three types of gases. Furthermore, it is also possible to use these gases to generate active gases that do not exist in nature and dilute them to generate fine particles. For example, ^1AB,→2^B2 ^: Group ■ element B: Halogen element can be reacted to generate active 8n2 gas. In addition, halogen gas is introduced into the carrier gas, and
After the fine particles are prepared, halogen can be introduced by heat treatment in a halogen gas atmosphere or the like.

さらに、含有させるハロゲンの量は、好ましくはfea
ts%(M.子数としての%)以上、さらに好ましくは
2oat膳%以上がよい。
Furthermore, the amount of halogen to be included is preferably fea
ts% (M.% as number of children) or more, more preferably 2 oat meal% or more.

本発明の発光部材に用いる微粒子の形成方法としては一
般に超微粒子作成に用いられる種々の方法が使用可能で
ある。例えばJapanese Journalof 
Ap9liad Physics, (2], 702
, (1963)に見られる様なガス中蒸発法やChe
sistry Letters, 267,(1986
)に見られるような熱泳動CVD法、あるいは液体中で
合成する方法などが挙げられる。この様な超徴粒子の製
法は超徴粒子の分野で今やよく知られているものであり
、上記の個々の製法に限定されるものではない。これら
の種々の方法については例えば日本化学会編.化学総説
No.48 r超徴粒子J (1985)などに詳しく
紹介されている。
As a method for forming the fine particles used in the light-emitting member of the present invention, various methods generally used for producing ultrafine particles can be used. For example, Japanese Journal of
Ap9liad Physics, (2), 702
, (1963) and Che.
sitry Letters, 267, (1986
Examples include the thermophoretic CVD method as seen in ), or a method of synthesis in a liquid. Such methods for producing super-featured particles are now well known in the field of super-featured particles, and are not limited to the individual production methods described above. For information on these various methods, see, for example, edited by the Chemical Society of Japan. Chemistry review No. 48 r Super Particles J (1985) and other publications.

上述した方法以外により微粒子に少なくともハロゲンを
含有させる方法を用いても良いことはもちろんである。
Of course, a method other than the above-mentioned method may be used to make the fine particles contain at least halogen.

いずれにしてもハロゲンの含有の程度が、発光部材の発
光強度を左右することがわかった。
In any case, it was found that the degree of halogen content affects the luminescence intensity of the light-emitting member.

本発明にあける材料の微粒子化及びハロゲン元素の含有
が発光強度の増大を引き起こす原因については必ずしも
明らかではない。
It is not necessarily clear why the finer particles of the material and the inclusion of a halogen element according to the present invention cause an increase in luminescence intensity.

しかし、材料の微粒子化により表面積が著しく増大した
事により、表面が活性になりたり何らかの物性変化が生
じることが考えられる。
However, since the surface area has significantly increased due to the material becoming finer particles, it is thought that the surface may become active or some physical property change may occur.

また、これとは別に発光部材中心から光が外へ放出され
る時の微粒子化による反射率の減少のために、光の取出
し効率が増加した事も考えられる。さらに、発光部材が
基体上に積層した微粒子膜の場合に、膜の表面から深い
部分で放出された光が微粒子の大きさが光の波長よりも
ずっと小さいために散乱を余り受けずに膜表面へ達する
ために、見かけ上発光強度が増加して見えることも考え
られる。
In addition to this, it is also conceivable that the light extraction efficiency is increased due to a decrease in reflectance due to the formation of fine particles when light is emitted from the center of the light emitting member to the outside. Furthermore, when the light-emitting member is a particulate film laminated on a substrate, the light emitted from a deep part of the surface of the film is not scattered much because the size of the particulates is much smaller than the wavelength of the light. It is also conceivable that the luminescence intensity appears to increase due to the fact that it reaches .

また、微粒子中に少なくともハロゲンを含有することが
ダングリングボンドをへらし、非発光中心をへらして発
光強度が増大することが考えられる。
Furthermore, it is thought that containing at least a halogen in the fine particles reduces dangling bonds, reduces non-luminous centers, and increases luminescence intensity.

さらにハロゲンの導入により光照射や熱に対して安定な
材料を得ることが可能となる。
Furthermore, the introduction of halogen makes it possible to obtain a material that is stable against light irradiation and heat.

また、本発明の発光部材における微粒子が基体,上に堆
積した微粒子膜は、その表面に保護層が設けてあっても
良い。この保謹層は微粒子膜の機械的強度を高め、また
変質による発光層の劣化その他の変化を防止するために
有効である。ボリスチレン.カーボネートその他の有機
ポリマーや石英や低融点ガラスなどの無機ガラス、ある
いは、SiN , a−Cその他のプラズマ重合膜など
が使える.有機ボリマーなどでは溶剤塗布などの方法も
使えて便利である. また、前記微粒子をバインダー分散膜の形で成膜する場
合は、合成樹脂等を加熱蒸着法等で微粒子表面にコーテ
ィング後堆積させる方法、又は、微粒子をバインダー中
で練り、薄いフィルムにひきのばす方法等がある。
Further, the fine particle film in which the fine particles are deposited on the substrate in the light emitting member of the present invention may be provided with a protective layer on its surface. This protection layer is effective for increasing the mechanical strength of the fine particle film and for preventing deterioration and other changes in the light emitting layer due to alteration. Boristyrene. Carbonate and other organic polymers, inorganic glasses such as quartz and low-melting glass, or plasma polymerized films such as SiN, a-C, and others can be used. For organic polymers, it is convenient to use methods such as solvent coating. In addition, when forming the fine particles in the form of a binder-dispersed film, there is a method in which a synthetic resin or the like is coated on the surface of the fine particles using a heating vapor deposition method and then deposited, or a method in which the fine particles are kneaded in a binder and stretched into a thin film. etc.

(実施例〕 以下実施例に基づき、本発明を具体的に説明する. 実施例1 第1図の装置を用いてSi:F:H微粒子をシリコンウ
エハの基体7上に堆積させた。
(Examples) The present invention will be specifically described below based on Examples.Example 1 Si:F:H fine particles were deposited on a silicon wafer substrate 7 using the apparatus shown in FIG.

発光部材の作成は、まずシリコンウェハ基板を基板ホル
ダー6にセットした後、排気系11で下流室4を2 x
 10−’Torrまで減圧した。.次にArと11。
To create the light emitting member, first set the silicon wafer substrate on the substrate holder 6, and then use the exhaust system 11 to open the downstream chamber 4 by 2 x
The pressure was reduced to 10-'Torr. .. Next is Ar and 11.

の混合ガス(混合比1:9)で3%に希釈したSiF4
ガスをガス導入管lOから空調共振器5内へ流量100
5c(:Mで流した。すると空胴共振器S内の圧力は4
 X 10−’Torrとなり、ノズル1からSiF4
を含むガスが下流室4へ吹き出した。この時下流室4内
の圧力は4.5x 10−3Torrとなった。次にマ
イクロ波をマイクロ波発垢器(不図示)から導波管9お
よび石英製の窓8を通して空胴共振器5内へ送り込み、
空胴共娠器5内で放電プラズマを発生させた。マイクロ
波のパワーは1501#であった。するとプラズマ内で
微粒子が形成されて、残りのガス成分とともにノズル1
から下流室4に吹き出し、微粒子ビームとなって下流室
4内の基体7上に衝突し、微粒子を基体7上に固定した
SiF4 diluted to 3% with a mixed gas (mixing ratio 1:9) of
Gas is introduced into the air conditioning resonator 5 from the gas introduction pipe lO at a flow rate of 100.
5c (:M).Then, the pressure inside the cavity resonator S was 4
X 10-'Torr, SiF4 from nozzle 1
Gas containing gas was blown out to the downstream chamber 4. At this time, the pressure inside the downstream chamber 4 was 4.5 x 10-3 Torr. Next, microwaves are sent from a microwave generator (not shown) into the cavity resonator 5 through the waveguide 9 and the quartz window 8.
Discharge plasma was generated within the cavity co-container 5. The power of the microwave was 1501#. Then, fine particles are formed in the plasma and flow into the nozzle 1 along with the remaining gas components.
The particles were blown out into the downstream chamber 4 and collided with the substrate 7 in the downstream chamber 4 as a particle beam, thereby fixing the particles on the substrate 7.

基体7上に付着した微粒子の堆積した層の厚さは5分間
の放電で3.5μmであった。また微粒子の堆積物の色
は黄かっ色の光沢のある膜状の堆積物であった。
The thickness of the layer of fine particles deposited on the substrate 7 was 3.5 μm after 5 minutes of discharge. The color of the fine particle deposits was yellowish-brown and shiny film-like deposits.

実施例2 ?施例1と同様な方法で、原料のガスをStF4からS
iCl2に、かつ希釈するガスをI12100%に、更
に投入するマイクロ波パワーを80VIに変更した以外
は実施例1とまったく同様にして堆積膜を得た。
Example 2? Using the same method as in Example 1, the raw material gas was converted from StF4 to S.
A deposited film was obtained in exactly the same manner as in Example 1, except that iCl2 was used, the diluting gas was changed to 100% I12, and the microwave power input was changed to 80VI.

実施例3 実施例1と同様な方法で、原料ガスをSiF.からGe
F4/Sin4= 174に、かつ希釈するガスを}l
,/Ar=9/1から]1■100%に変更した以外は
、まったく同様にして堆積膜を得た。
Example 3 In the same manner as in Example 1, raw material gas was converted to SiF. From Ge
F4/Sin4=174 and the diluting gas }l
A deposited film was obtained in exactly the same manner except that the ratio was changed from , /Ar=9/1 to ]1■100%.

実施例4 1000℃以上に加熱された固体Si中にSiF.を通
ずことでSi+SiF4→2・SjF2の反応を起こさ
せ、活性なSiF,ガスを生成する。この活性なSiF
2ガスを原料ガスとし、かつ希釈するガスをII,/A
r= 9/1からlh 100%に変更した以外は実施
例1とまったく同様にして堆積膜を得た。
Example 4 SiF. By passing through it, a reaction of Si+SiF4→2.SjF2 is caused, and active SiF and gas are generated. This active SiF
2 gas is used as the raw material gas, and the gas to be diluted is II, /A
A deposited film was obtained in exactly the same manner as in Example 1 except that r=9/1 was changed to lh 100%.

比較例1 実施例1と同様の原料及び希釈ガスで通常のグロー放電
分解法により堆積膜を得た。
Comparative Example 1 A deposited film was obtained by the usual glow discharge decomposition method using the same raw materials and diluent gas as in Example 1.

以上のようにして得た膜を以下の梯にして評価した。The membrane obtained as described above was evaluated using the following ladder.

■堆積膜の形状 FE−SEM (日立製)により膜表面の形状を観察し
た。
(2) Shape of deposited film The shape of the film surface was observed using FE-SEM (manufactured by Hitachi).

■ハロゲンの含有量 島津EPM^/型: EMX−SM (Electro
n Probe MicroAnalysis)にて膜
中のハロゲン含有量を測定した。
■Halogen content Shimadzu EPM^/Model: EMX-SM (Electro
The halogen content in the film was measured using a probe micro analysis.

■フォトルミネセンス 室温でArイオンレーザー(488nm)を照射し、光
電子増倍管にてフォトルミネセンスを観察した。
(2) Photoluminescence Ar ion laser (488 nm) was irradiated at room temperature, and photoluminescence was observed using a photomultiplier tube.

評価結果のまとめを表−1に示す。A summary of the evaluation results is shown in Table-1.

表−! *2》 実施例1を100としたときの相対値また、フ
ォトルミネセンスのスペクトルの例として実施例1のス
ペクトルを第2図に示す。
Table-! *2 >> Relative value when Example 1 is taken as 100 Further, the spectrum of Example 1 is shown in FIG. 2 as an example of the photoluminescence spectrum.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば通常は常温では発
光しない材料を発光させたり、又は通常発光するもので
あっても発光強度を飛躍的に高めたりすることができる
As explained above, according to the present invention, it is possible to make materials that normally do not emit light at room temperature emit light, or to dramatically increase the luminous intensity of materials that normally emit light.

更に、本発明の発光部材は経時的変化がほとんどなく、
常に安定した発光を行うことができるものである。
Furthermore, the light-emitting member of the present invention hardly changes over time,
It is capable of constantly emitting stable light.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の発光部材を作成するのに用いた装置の
例を示す図、第2図は^rイオンレーザー488nmの
励起光によるけい光スペクトルを示す図である。 1・・・・・・縮小拡大ノズル 2・・・・・・ノズルののど部 2a,2b・・・ノズルの開口部 3・・・・・・磁石 4・・・・・・下流室 5・・・・・・空胴共娠器 6・・・・・・基体ホルダー 7・・・・・・基体 8・・・・・・マイクロ波導入窓 9・・・・・・マイクロ波導波管 lO・・・・・・ガス導入口 ■・・・・・・排気系 特許出願人  キヤノン株式会社
FIG. 1 is a diagram showing an example of an apparatus used to produce the light emitting member of the present invention, and FIG. 2 is a diagram showing a fluorescence spectrum caused by excitation light of a 488 nm ion laser. 1...Reduction/expansion nozzle 2...Nozzle throat 2a, 2b...Nozzle opening 3...Magnet 4...Downstream chamber 5. ...Cavity communicator 6 ...Base holder 7 ...Base 8 ...Microwave introduction window 9 ...Microwave waveguide lO ... Gas inlet ■ ... Exhaust system Patent applicant Canon Inc.

Claims (1)

【特許請求の範囲】[Claims]  励起エネルギーを付与することにより光を放出する発
光部材に於いて、発光部材が少なくともハロゲン元素を
含有するIV族元素の微粒子を含むことを特徴とする発光
部材。
1. A light-emitting member that emits light upon application of excitation energy, characterized in that the light-emitting member contains fine particles of a group IV element containing at least a halogen element.
JP5186489A 1989-03-06 1989-03-06 Luminous material Pending JPH02234301A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5186489A JPH02234301A (en) 1989-03-06 1989-03-06 Luminous material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5186489A JPH02234301A (en) 1989-03-06 1989-03-06 Luminous material

Publications (1)

Publication Number Publication Date
JPH02234301A true JPH02234301A (en) 1990-09-17

Family

ID=12898737

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5186489A Pending JPH02234301A (en) 1989-03-06 1989-03-06 Luminous material

Country Status (1)

Country Link
JP (1) JPH02234301A (en)

Similar Documents

Publication Publication Date Title
EP0312383B1 (en) Luminescing member, process for preparation thereof, and electroluminescent device employing same
CN102906222B (en) Luminescent substance
Yunogami et al. Radiation damage in SiO2/Si induced by VUV photons
Guo et al. Aggregation-induced emission enhancement of carbon quantum dots and applications in light emitting devices
TWI589020B (en) Quantum dot composite and optoelectronic device including the same
US7569407B2 (en) Methods of coating semiconductor light emitting elements by evaporating solvent from a suspension
US20170066963A1 (en) Luminescent particle, materials and products including same, and methods
JP2005108843A (en) Light source with phosphor absorbing nanometer-sized VUV
Zhou et al. Hybrid quadrupole plasmon induced spectrally pure ultraviolet emission from a single AgNPs@ ZnO: Ga microwire based heterojunction diode
CN104871326B (en) Light-emitting device
US9487696B2 (en) Phosphor of SiAlON crystal, method for producing phosphor and light emitting device
US9512359B2 (en) Phosphor, method for producing phosphor and light emitting device
JP5819960B2 (en) Carbodiimide luminescent material
JPH02230602A (en) Luminescent member
CN101248157A (en) Formation of solid carbon dioxide species
JP2733228B2 (en) Light emitting member manufacturing method
JP2572023B2 (en) Light emitting member
Thi et al. Eu2+-activated strontium-barium silicate: a positive solution for improving luminous efficacy and color uniformity of white light-emitting diodes
JP7638956B2 (en) Stable phosphor-converted LEDs and systems using same - Patents.com
Loan et al. Utilizing CaCO 3, CaF 2, SiO 2, and TiO 2 particles to enhance color homogeneity and luminous flux of WLEDs.
JPH02234302A (en) Light emitting material
Ho et al. Study of K2SIF6: MN4+@ SIO2 phosphor for white leds with high angular color uniformity
JPH07119404B2 (en) Light emitting member and manufacturing method thereof
KR102438286B1 (en) Phosphor device and method
That et al. Dual-layer remote phosphor structure: a novel technique to enhance the color quality scale and luminous flux of WLEDs