JPH02234308A - Composition for conductive film formation - Google Patents

Composition for conductive film formation

Info

Publication number
JPH02234308A
JPH02234308A JP5453589A JP5453589A JPH02234308A JP H02234308 A JPH02234308 A JP H02234308A JP 5453589 A JP5453589 A JP 5453589A JP 5453589 A JP5453589 A JP 5453589A JP H02234308 A JPH02234308 A JP H02234308A
Authority
JP
Japan
Prior art keywords
conductive film
composition
weight
powder
oxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5453589A
Other languages
Japanese (ja)
Inventor
Yasuto Kudo
康人 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP5453589A priority Critical patent/JPH02234308A/en
Publication of JPH02234308A publication Critical patent/JPH02234308A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks

Landscapes

  • Conductive Materials (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は主として電子部品絶縁基板、特にAIN基板に
導電回路や電極を形成するに用いる導電性被膜形成用組
成物に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention mainly relates to a composition for forming a conductive film used for forming conductive circuits and electrodes on an electronic component insulating substrate, particularly an AIN substrate.

〔従来の技術〕[Conventional technology]

電子部品の回路にはアルミナ基板の上に導電性被膜を形
成したものが多く用いられている。
Alumina substrates with conductive films formed on them are often used in electronic component circuits.

このような絶縁基板上に導電性被膜を形成するには、一
般にAg, Pd,或いはPt等の導電性粉末と、基板
への接着性を与えるための硼珪酸鉛ガラス粉末と、酸化
ビスマスとを含有する固体粉末混合物を有機ビヒクルに
分散したペースト状組成物を作り、このペースト状組成
物をスクリーン印刷法や転写法により基板上に塗布し、
焼成して導電性被膜を形成している。
To form a conductive film on such an insulating substrate, generally conductive powder such as Ag, Pd, or Pt, lead borosilicate glass powder to provide adhesion to the substrate, and bismuth oxide are used. A paste-like composition is prepared by dispersing the solid powder mixture contained in an organic vehicle, and this paste-like composition is applied onto a substrate by a screen printing method or a transfer method,
It is fired to form a conductive film.

電子回路の小型化に伴ないアルミナ基板に代わり、熱伝
導性の良いklH基板が使用されるようになりつつある
が、従来アルミナ基板に使用されてきた導電性被膜形成
用組成物を使用すると、IN基板に接着しないとか、半
田が付着しないなどの問題がある。
With the miniaturization of electronic circuits, klH substrates with good thermal conductivity are being used in place of alumina substrates. There are problems such as not adhering to the IN board or not adhering solder.

〔発朗が解決しようとする課題〕[Issues that Hatsurou tries to solve]

本発明は主としてIN基板への密着性が良好で、半田の
濡れ性が良い導電性被膜形成用組成物を提供することを
課題とする。
The main object of the present invention is to provide a composition for forming a conductive film that has good adhesion to an IN substrate and good solder wettability.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は、貴金属粉末とガラス粉末を含有する固体粉末
混合物を有機ビヒクルに分散してなる導電性被膜形成用
組成物において、前記固体粉末混合物中に前記ガラス粉
末成分としてバナジウム酸化物を五酸化バナジウム換算
で0.5〜6重量%、ガラス粉末を2〜7重量%含有す
ることを特徴とする導電性被膜形成用組成物を課題を解
決するための手段とする。
The present invention provides a conductive film forming composition comprising a solid powder mixture containing noble metal powder and glass powder dispersed in an organic vehicle, in which vanadium oxide is added as the glass powder component to vanadium pentoxide in the solid powder mixture. A means for solving the problem is a composition for forming a conductive film characterized by containing 0.5 to 6% by weight of glass powder and 2 to 7% by weight of glass powder.

本発明に用いる貴金属粉末としては、Ag, Pd、P
tSAu等を用いることができ、これらは単独でも混合
して用いても良く又合金粉末として用いても良い。
The noble metal powder used in the present invention includes Ag, Pd, and Pd.
tSAu etc. can be used, and these may be used alone or in a mixture, or as an alloy powder.

貴金属粉末の配合量は一般に固体粉末混合物中に約73
〜98重量%である。
The amount of precious metal powder in the solid powder mixture is generally about 73
~98% by weight.

ガラス粉末は、固体粉末混合物中に2〜7重量%、4〜
6重量%の配合量が良い。ガラス粉末としては、酸化バ
ナジウム、二酸化珪素、酸化硼素、酸化亜鉛、酸化アル
ミニウム、酸化バリウム、酸化ストロンチウム、酸化カ
ルシウム、酸化鉛等の混合物を熔融して冷却し、ガラス
化したものを粉砕して得ることが出来る。
The glass powder is present in the solid powder mixture in an amount of 2-7% by weight, 4-7% by weight.
A blending amount of 6% by weight is good. Glass powder is obtained by melting a mixture of vanadium oxide, silicon dioxide, boron oxide, zinc oxide, aluminum oxide, barium oxide, strontium oxide, calcium oxide, lead oxide, etc., cooling it, vitrifying it, and pulverizing it. I can do it.

この貴金属粉末、ガラス粉末−の他に、不活性充填剤を
配合することも出来る。不活性充填剤としては、酸化ビ
スマス、酸化マンガン、酸化鋼、酸化コバルト、酸化モ
リブデン、酸化亜鉛、酸化クロム等の顔料を挙げること
が出来、これらは単独或いは混合して用いることができ
る。不活性充填剤は固体粉末混合物中に無くても良いが
、20重量%程yまで混合することが出来る。
In addition to the noble metal powder and glass powder, an inert filler can also be blended. Examples of the inert filler include pigments such as bismuth oxide, manganese oxide, steel oxide, cobalt oxide, molybdenum oxide, zinc oxide, and chromium oxide, which may be used alone or in combination. Inert fillers may be absent from the solid powder mixture, but can be incorporated up to as much as 20% by weight.

上記固体粉末混合物の粒径は10μm以下、好ましくは
2μm以下が良い。
The particle size of the solid powder mixture is preferably 10 μm or less, preferably 2 μm or less.

有機ビヒクルとしては、ターピネオール、プチルカルビ
トール、トルエン等の溶媒に、エチルセルロース、メタ
クリレート樹脂などを溶解した従来から用いられている
ものを用いることが出来る。
As the organic vehicle, conventionally used organic vehicles in which ethyl cellulose, methacrylate resin, etc. are dissolved in a solvent such as terpineol, butyl carbitol, or toluene can be used.

本発明組成物は、従来と同様例えばスリーロルミルを用
いて固体粉末混合物100重量部と有機ビヒクル11〜
35重量部とを混練して作る。
The composition of the present invention is prepared by adding 100 parts by weight of a solid powder mixture and 11 to 10 parts of an organic vehicle using a three-roll mill as in the past.
35 parts by weight.

本発明の組成物を適用する基板としては、A7Nに限ら
れず、熱伝導係数100〜260 W/mK ,熱膨張
係数35〜45X10 /σのものが適している。
The substrate to which the composition of the present invention is applied is not limited to A7N, but substrates having a thermal conductivity of 100 to 260 W/mK and a thermal expansion coefficient of 35 to 45×10 /σ are suitable.

〔作用〕[Effect]

本発明において、ガラス粉末の固体粉末混合物中におけ
る酸合量を2〜7重量%とするのは、2重量%未満では
基板への接着剤としての作用が得られず、接着強度が小
さくなり、7重量%を超えると半田濡れ性が悪くなるか
らである。
In the present invention, the acid content in the solid powder mixture of glass powder is set to 2 to 7% by weight, because if it is less than 2% by weight, it will not work as an adhesive to the substrate and the adhesive strength will be low. This is because if it exceeds 7% by weight, solder wettability will deteriorate.

又、固体粉末混合物中に前記ガラス粉末としてバナジウ
ム酸化物を五酸化バナジウム換算で0.5〜6重量%含
有せしめるのは、0.5重量%未満では基板に対する接
着強度が不充分となり、6重量%を超えると焼成して被
膜とするとき被展の縁がにじみ、回路に短絡を起こしや
すくなるからである。
Furthermore, the reason why vanadium oxide is contained as the glass powder in the solid powder mixture is 0.5 to 6% by weight in terms of vanadium pentoxide because if it is less than 0.5% by weight, the adhesive strength to the substrate will be insufficient. This is because if it exceeds %, the edges of the spread film will bleed when fired to form a film, making it easy to cause short circuits.

〔実施例〕〔Example〕

ガラス粉末として、V O 、SiO 、ZnO, E
 O、2B        2           
  23Pk+O、kl O s BaO等を第1表に
示す割合で配合し、900〜1500σで熔融した後、
急冷却し粒径約2μm以下に粉砕して&−%−gのガラ
ス粉末を準備したO 貴金属粉末としては、粒径1.2μmのAg粉末及び粒
径0.1/jmのP(L粉末、不活性充填剤としてはM
nO s Bi O 、OuOを用意した。
As glass powder, V O , SiO , ZnO, E
O, 2B 2
After blending 23Pk+O, klOs BaO, etc. in the proportions shown in Table 1 and melting at 900 to 1500σ,
The precious metal powders include Ag powder with a particle size of 1.2 μm and P(L powder with a particle size of 0.1/jm). , M as an inert filler
nO s Bi O and OuO were prepared.

有機ビヒクルとしては、エチルセルロース8重量%を含
むタービネオールを準備した。
Turbineol containing 8% by weight of ethyl cellulose was prepared as an organic vehicle.

第2表に示す割合で、貴金属粉末、ガラス粉末、不活性
充填剤粉末を混合し、19種類の固体粉末混合物を調整
した。
Noble metal powder, glass powder, and inert filler powder were mixed in the proportions shown in Table 2 to prepare 19 types of solid powder mixtures.

固体粉末混合物100重量部と、有機ビヒクル20重量
部とをスリーロールミルで混練しペースト化した。
100 parts by weight of the solid powder mixture and 20 parts by weight of the organic vehicle were kneaded in a three-roll mill to form a paste.

第3表に示すようなアルミナ基板用の市販ペーストも試
験に供した。
Commercially available pastes for alumina substrates as shown in Table 3 were also tested.

上記それぞれのペーストをktN 基板(25X25X
0. 625 ms )の表面に所定のパターンにスク
リーン印刷した後、ベルト式焼成炉でピーク温度850
C’、ピーク時間8分、全焼成時間60分で空気雰囲気
焼成した。
Paste each of the above onto a ktN board (25X25X
0. After screen printing a predetermined pattern on the surface of 625 ms), the peak temperature was 850
C', firing was performed in an air atmosphere with a peak time of 8 minutes and a total firing time of 60 minutes.

得られた導電性被膜について半田濡れ性、接着強度、エ
ージング強度、及びにじみ出しについて測定を行なった
。それぞれの測定方法は以下の通りである。
The obtained conductive film was measured for solder wettability, adhesive strength, aging strength, and oozing. The respective measurement methods are as follows.

(1)半田濡れ性 lQms角の導電性被膜のパターン上に、7ラツクスを
塗布し、表面の酸化膜を除去した後該パターンを230
σに保ったPb− Sn ( Pb/Sn = 37 
/ 6.3 )半田浴に5秒間浸漬し、引き上げて冷却
後パターン上の半田濡れ面積比率を求める。
(1) Solder wettability 7 lux was applied on a conductive film pattern of 1Qms square, and after removing the oxide film on the surface, the pattern was
Pb-Sn kept at σ (Pb/Sn = 37
/6.3) Immerse it in a solder bath for 5 seconds, pull it out, and after cooling, determine the solder wet area ratio on the pattern.

(2)  接着強度 2闘角の導電性被戻のパターン上に直径0.65闘のS
nメッキ銅線をPb−Sn半田で半田付けし、垂直方向
に銅線を引っ張り、剥離時の引っ張り力を求める。
(2) S with a diameter of 0.65 on a pattern of conductive backing with an adhesive strength of 2 and an angle of 2.
An n-plated copper wire is soldered with Pb-Sn solder, the copper wire is pulled in the vertical direction, and the tensile force at the time of peeling is determined.

(3)エージング強度 2鱈角の導電性被膜のパターン上に直径0.65鶴のS
nメツキ@線をPb−Sn半田で半田付けし、150σ
の恒温槽中に300時間放置した後、接着強度と同様の
引っ張り力を求める。
(3) S with a diameter of 0.65 on a conductive film pattern with an aging strength of 2 cod angles
Solder the n-plated @ wire with Pb-Sn solder, 150σ
After being left in a constant temperature bath for 300 hours, the tensile force similar to the adhesive strength was determined.

(4)にじみ出し観察 導電性被膜中のガラス成分が、パターン部分から導電性
被膜のついていない部分に浸出すると、基板に茶色系統
の着色が生ずるので、その状態を肉眼で観察する。
(4) Observation of oozing When the glass component in the conductive coating leaches from the patterned area to the area where the conductive coating is not attached, a brownish coloration occurs on the substrate, so this condition is observed with the naked eye.

上記の測定結果を第4表に示す。The above measurement results are shown in Table 4.

半田濡れ性は80%以上、接着強度は4,Qlcg以上
、エージング強度は2.OJC9以上が製品として要求
されるので、合格値に○印を、不合格値にX印を付けて
示している。
Solder wettability is 80% or more, adhesive strength is 4.Qlcg or more, and aging strength is 2. Since the product is required to have an OJC of 9 or higher, the passing values are marked with a circle, and the failing values are marked with an x.

本発明の試験黒1〜l3は、上記の特性をすべて合格し
ているが、比較例AI4〜19は何れかの特性が不合格
であり、又アルミナ基板用市販ベース}A,B,O品は
、にじみ出しは認められないものの特性が総て不合格で
ある。
Test blacks 1 to 13 of the present invention passed all of the above characteristics, but comparative examples AI4 to 19 failed in any of the characteristics, and commercially available base products for alumina substrates A, B, and O products Although no oozing was observed, all characteristics failed.

第  1  表  (重量%) 第  2  表(重量%) 〔発明の効果〕 本発明によれば、 AIN基板又はこれに類似の物 性を有する基板に適した導電性被膜形成用組成物を提供
できる。
Table 1 (wt%) Table 2 (wt%) [Effects of the Invention] According to the present invention, it is possible to provide a composition for forming a conductive film suitable for an AIN substrate or a substrate having physical properties similar thereto.

出 願 人 住友金属鉱山株式会社 手 統 補 正 書 (自発) (IJ 明細書4頁下から3行、 5頁下から6行、 6頁下から7行、 7頁4行、 同下から6 行の 各行中の 「C゜」 を lfJ と訂正する。Out wish Man Sumitomo Metal Mining Co., Ltd. hand control Supplementary Positive book (spontaneous) (I.J. 3 lines from the bottom of page 4 of the specification, 6 lines from the bottom of page 5, 7 lines from the bottom of page 6, 7 pages, 4 lines, 6 from below line in each row "C゜" of lfJ I am corrected.

l. 事件の表示 平成 年 特 許 願 第 号 発明の名称 導電性被膜形成用組成物 λ 補正をする者 事件との関係l. Display of incidents Heisei Year Special permission wish No. issue name of invention Composition for forming conductive film λ Person who makes corrections Relationship with the incident

Claims (1)

【特許請求の範囲】[Claims] (1)貴金属粉末とガラス粉末とを含有する固体粉末混
合物を有機ビヒクルに分散してなる導電性被膜形成用組
成物において、前記固体粉末混合物中に前記ガラス粉末
成分としてバナジウム酸化物を五酸化バナジウム換算で
0.5〜6重量%、ガラス粉末を2〜7重量%含有する
ことを特徴とする導電性被膜形成用組成物。
(1) In a conductive film forming composition comprising a solid powder mixture containing noble metal powder and glass powder dispersed in an organic vehicle, vanadium oxide is added as the glass powder component to vanadium pentoxide in the solid powder mixture. A composition for forming a conductive film, characterized in that it contains 0.5 to 6% by weight of glass powder and 2 to 7% by weight of glass powder.
JP5453589A 1989-03-07 1989-03-07 Composition for conductive film formation Pending JPH02234308A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5453589A JPH02234308A (en) 1989-03-07 1989-03-07 Composition for conductive film formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5453589A JPH02234308A (en) 1989-03-07 1989-03-07 Composition for conductive film formation

Publications (1)

Publication Number Publication Date
JPH02234308A true JPH02234308A (en) 1990-09-17

Family

ID=12973358

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5453589A Pending JPH02234308A (en) 1989-03-07 1989-03-07 Composition for conductive film formation

Country Status (1)

Country Link
JP (1) JPH02234308A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999021193A1 (en) * 1997-10-16 1999-04-29 Tdk Corporation Conductor paste and nonreversible circuit elements made by using the same
WO2007072249A3 (en) * 2005-12-22 2008-02-28 Koninkl Philips Electronics Nv Porous circuitry material for led submounts
JP2012012228A (en) * 2010-06-29 2012-01-19 Asahi Glass Co Ltd Glass frit, and conductive paste and electronic device using the same
JP2022089460A (en) * 2020-12-04 2022-06-16 住友金属鉱山株式会社 Thick film conductor, composition for formation thereof and thick film conductor paste containing the composition for formation thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999021193A1 (en) * 1997-10-16 1999-04-29 Tdk Corporation Conductor paste and nonreversible circuit elements made by using the same
US6110569A (en) * 1997-10-16 2000-08-29 Tdk Corporation Conductive paste and non-reciprocal device using the same
WO2007072249A3 (en) * 2005-12-22 2008-02-28 Koninkl Philips Electronics Nv Porous circuitry material for led submounts
JP2012012228A (en) * 2010-06-29 2012-01-19 Asahi Glass Co Ltd Glass frit, and conductive paste and electronic device using the same
JP2022089460A (en) * 2020-12-04 2022-06-16 住友金属鉱山株式会社 Thick film conductor, composition for formation thereof and thick film conductor paste containing the composition for formation thereof

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