JPH02245702A - Anti-reflection film and its manufacturing method - Google Patents
Anti-reflection film and its manufacturing methodInfo
- Publication number
- JPH02245702A JPH02245702A JP1066193A JP6619389A JPH02245702A JP H02245702 A JPH02245702 A JP H02245702A JP 1066193 A JP1066193 A JP 1066193A JP 6619389 A JP6619389 A JP 6619389A JP H02245702 A JPH02245702 A JP H02245702A
- Authority
- JP
- Japan
- Prior art keywords
- film
- refractive index
- ultrafine particles
- glass substrate
- particles
- Prior art date
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Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は超微粒子膜利用装置に係り、特に陰極線管の反
射防止膜として有効な簿膜に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus using an ultrafine particle film, and particularly to a film effective as an antireflection film for cathode ray tubes.
ガラス表面の反射率を低減する膜(反射防止膜)に関す
る研究は古く、カメラ・メガネなどのレンズに利用され
てきた。Jfi在は、VDTの反射光を低減するための
反射防止フィルタなどに用いられている1反射防止膜に
はさまざまなものがあるが、現在利用されているものは
主に、多層膜と不均質膜である。Research on films that reduce the reflectance of glass surfaces (anti-reflection films) has been going on for a long time, and they have been used in lenses for cameras and glasses. There are various types of anti-reflection films used in anti-reflection filters to reduce reflected light from VDTs, but the ones currently in use are mainly multilayer films and non-uniform films. It is a membrane.
多層1摸とはガラス表面に低屈折率物質、高屈折率物質
を交互に積層した構成であり、その反射防止効果は各層
間での光学的干渉作用の総合効果である。多層膜に関し
てはフイヂツクス・オブ・スイン・フィルムの2号(1
964年)第243項(Physics of Th1
n Fil+ms 2 、 (1964) P。A multilayer structure is a structure in which low refractive index materials and high refractive index materials are alternately laminated on the glass surface, and its antireflection effect is the overall effect of optical interference between each layer. Regarding multilayer films, Physics of Spin Film No. 2 (1
964) Section 243 (Physics of Th1
n Fil+ms 2 , (1964) P.
243〜P、284)から第284項に論じられている
。243-P, 284) to 284.
また、膜の厚味方向に屈折率分布を持つ膜を不均質膜と
いうが、この膜の平均屈折率が基板ガラスよりも低い場
合、反射防止膜となる。不均質膜ではガラス表面を多孔
質化したものが一般的である。ガラス表面に島状の金属
蒸着膜を形成後、スパッタエツチングにより微細な凹凸
を形成して不均質膜を作り1反射率を低減する方法がア
ップライド・フイヂツクス・レター36号(1980年
)の第727項から第730項(Appl、Phys、
Lett 。Further, a film having a refractive index distribution in the thickness direction of the film is called an inhomogeneous film, but if the average refractive index of this film is lower than that of the substrate glass, it becomes an antireflection film. Inhomogeneous membranes generally have a porous glass surface. A method of reducing reflectance by forming an inhomogeneous film by forming fine irregularities by sputter etching after forming an island-shaped metal vapor deposited film on the glass surface is described in Upward Physics Letter No. 36 (1980). Paragraphs 727 to 730 (Appl, Phys,
Lett.
36 (1980)P、727〜P、730)において
論じられている。また、ゾーダライムガラスを5iOz
過飽和のHzSiFe溶液に浸せきし、表面を多孔質化
して反射率を低減させる方法がソーラー・エネルギ、6
号(1980年)の第28項から第34項(Solar
Energy 6 (1980)P 。36 (1980) P, 727-P, 730). In addition, 5iOz of Zodarime glass
Solar Energy, 6
(1980), paragraphs 28 to 34 (Solar
Energy 6 (1980) P.
28〜P、34)において論じられている。28-P, 34).
上記従来技術、多層膜は形成方法がスパッタリング、真
空蒸着法に限ら九、かつ膜厚の高精度制御が必要である
ため、コストが高くかつ大面積化が難しいという問題が
あった。スパッタエツチングによって不均質膜を形成す
る方法も、コストが高くかつ大面積化が難しいという問
題があった。In the prior art, the multilayer film can be formed only by sputtering or vacuum evaporation, and requires highly accurate control of the film thickness, so there are problems in that it is expensive and difficult to increase in area. The method of forming a heterogeneous film by sputter etching also has the problems of high cost and difficulty in increasing the area.
HzSiFe溶液に浸せきし、表面を多孔質化して不均
質膜を形成する方法は、微細な凹凸が形成し難く、十分
な反射防止機能が生じない、また十分に微細な凹凸でな
いために1反射率とともに透過率も低減するという問題
があった。The method of forming a heterogeneous film by immersing it in a HzSiFe solution and making the surface porous makes it difficult to form fine irregularities and does not provide a sufficient antireflection function. At the same time, there was a problem in that the transmittance also decreased.
本発明の目的は低コストでかつ、大面積化が容易な反射
防止膜を形成することにある。An object of the present invention is to form an antireflection film that is low cost and easy to increase in area.
光の反射は屈折率が急変する界面で生じるため、逆に界
面において屈折率が徐々に変化すれば反射は生じなくな
る0通常、ソーダガラス(屈折率約1.53)の反射防
止には、最も低反射率の物質フッ化マグネシウム(Mg
Fz)(屈折率1.38)をスパッタ等によって蒸着さ
せているが、ガラス基板とMgFs膜の界面、M g
F z膜と空気(屈折率約1.O)との界面で屈折率が
急変するため反射防止効果は十分ではない、従って、ガ
ラス基板に近い屈折率から徐々に空気に近い屈折率へ変
化する膜が形成できれば、有効な反射防止効果が得られ
る。Reflection of light occurs at an interface where the refractive index changes suddenly, so if the refractive index changes gradually at the interface, reflection will no longer occur.Normally, the most effective way to prevent reflection of soda glass (refractive index of approximately 1.53) is to Substance with low reflectance Magnesium fluoride (Mg
Mg
The antireflection effect is not sufficient because the refractive index changes suddenly at the interface between the Fz film and air (refractive index approximately 1.0).Therefore, the refractive index gradually changes from a refractive index close to that of the glass substrate to a refractive index close to that of air. If a film can be formed, an effective antireflection effect can be obtained.
そこで、ガラス基板とMgFsとの中間の屈折率を持つ
物質、例えば5ift(屈折率1.46)の超微粒子と
MgFz超微粒子を混合してガラス基板に塗布し、その
混合比を膜厚方向で変える、すなわちガラス基板面から
塗布膜表面に向って徐々に5iOz超微粒子の混合比を
減らし、MgFx超微粒子の混合比を増すことで、塗布
面とガラス基板との界面における屈折率変化がよりゆる
やかとなり、有効な反射防止効果が図れる。また、本方
法によって、大面積の反射防止膜を低コストで形成する
ことができる。Therefore, a substance with a refractive index between that of a glass substrate and MgFs, for example, ultrafine particles of 5ift (refractive index 1.46) and ultrafine MgFz particles are mixed and coated on a glass substrate, and the mixing ratio is adjusted in the film thickness direction. In other words, by gradually decreasing the mixing ratio of 5iOz ultrafine particles and increasing the mixing ratio of MgFx ultrafine particles from the glass substrate surface to the coating film surface, the refractive index change at the interface between the coating surface and the glass substrate becomes more gradual. Therefore, an effective antireflection effect can be achieved. Moreover, by this method, a large-area antireflection film can be formed at low cost.
ガラス基板に近い屈折率を持つ物質(例えば5iOz)
と空気に近い屈折率を持つ物’ff(例えばMgFz)
とを混合する際に超微粒子を用いることで、両物質が光
の波長より小さなレベルで均一に混合することができる
。そのため、その屈折率は5iftとMgFxとの体積
分率に対応した平均的屈折率となる。すなわち、5if
t超微粒子とM g F x超微粒子とを混合した超微
粒子膜において、膜厚方向Xの位置における平均的屈折
率n (x)は、同位置におけるSiOzM3微粒子の
体積分率をV (s)とすると、n(x)=1.46X
V(s)+1.38X(1−v(s))と示せる。従っ
て膜厚方向に混合比を変えれば屈折率も対応して変化し
、ガラス基板と塗布膜との界面の屈折率変化がゆるやか
となる。A substance with a refractive index close to that of the glass substrate (e.g. 5iOz)
and a substance with a refractive index close to that of air (e.g. MgFz)
By using ultrafine particles when mixing both substances, it is possible to uniformly mix both substances at a level smaller than the wavelength of light. Therefore, its refractive index becomes an average refractive index corresponding to the volume fraction of 5ift and MgFx. That is, 5if
In an ultrafine particle film in which t ultrafine particles and M g F x ultrafine particles are mixed, the average refractive index n (x) at a position in the film thickness direction Then, n(x)=1.46X
It can be shown as V(s)+1.38X(1-v(s)). Therefore, if the mixing ratio is changed in the film thickness direction, the refractive index will also change correspondingly, and the refractive index change at the interface between the glass substrate and the coating film will be gradual.
また、混合比の異なる塗布膜を積み重ねることで、膜全
体として平均的屈折率が徐々に炭化する膜を形成するこ
とができる。Furthermore, by stacking coating films having different mixing ratios, it is possible to form a film whose average refractive index gradually carbonizes as a whole.
以下、本発明の実施例を第1図〜第3図により説明する
。Embodiments of the present invention will be described below with reference to FIGS. 1 to 3.
第1図は、ガラス基板上に本発明の超微粒子膜を形成し
た時の断面図であり、第2図は前記超微粒子膜の膜厚方
向に対する平均屈折率の変化を示す図である。FIG. 1 is a cross-sectional view when an ultrafine particle film of the present invention is formed on a glass substrate, and FIG. 2 is a diagram showing changes in the average refractive index of the ultrafine particle film in the film thickness direction.
まず、エチルシリケート(Si(OCzHδ)4〕をエ
タノールに溶解し、さらに水、硝酸、イソプロピルアル
コール、アセチルアセトンを加えた溶剤に、5iOz超
微粒子を加えて超音波振動により十分に分散させたa
S x Oz超微粒子の量は、上記溶剤IQに対して、
25gとしたa S iOx超微粒子分散後、さらにシ
トラコン酸を加え、十分に溶解させた。シトラコン酸の
址は上記溶剤IQに対してlogとした。その後、さら
に超音波振動を加えて、5ift超微粒子の十分な分散
、各成分の十分な混合を図った0以上の混合を終えた溶
剤を溶剤Aとする。First, 5iOz ultrafine particles were added to a solvent in which ethyl silicate (Si(OCzHδ)4) was dissolved in ethanol, water, nitric acid, isopropyl alcohol, and acetylacetone were added, and the particles were thoroughly dispersed by ultrasonic vibration.
The amount of S x Oz ultrafine particles is, relative to the above solvent IQ,
After dispersing the a SiOx ultrafine particles to 25 g, citraconic acid was further added and sufficiently dissolved. The amount of citraconic acid was expressed as a log of the above solvent IQ. Thereafter, ultrasonic vibration was further applied, and the solvent was designated as solvent A after 0 or more mixing was completed in order to achieve sufficient dispersion of the 5ift ultrafine particles and sufficient mixing of each component.
上記溶剤Aに、あらかじめM g F x超微粒子、エ
チルシリケートをエタノールに分散しておいた溶剤Bを
加え、超音波振動によって均一に混合した。溶剤B中の
M g F x超微粒子量は溶剤IQに対し、約25g
である。溶剤Aと溶剤Bとの混合比を変えて、5iOa
超微粒子とM g F z超微粒子の混合比を変える。Solvent B, in which M g F x ultrafine particles and ethyl silicate had been previously dispersed in ethanol, was added to the above solvent A and mixed uniformly by ultrasonic vibration. The amount of M g F x ultrafine particles in solvent B is approximately 25 g relative to solvent IQ.
It is. By changing the mixing ratio of solvent A and solvent B, 5iOa
The mixing ratio of ultrafine particles and M g F z ultrafine particles is changed.
まず、5i01L超微粒子とM g F z超微粒子の
体積分率が7:3になるように溶剤Aと溶剤Bとを混合
した溶剤をガラス板面上に滴下し、さらにスピンナーで
均一に塗布した後、空気中で40℃に約10分間保って
上記塗布膜を乾燥させた。乾燥後、さらに5iOz超微
粒子とM g F z超微粒子の体積分率が1:1にな
るように混合した溶剤を滴下し、スピンナーで均一に塗
布した。その後。First, a mixture of solvent A and solvent B was dropped onto the glass plate surface so that the volume fraction of 5i01L ultrafine particles and M g F z ultrafine particles was 7:3, and the mixture was evenly applied using a spinner. Thereafter, the coating film was dried by keeping it at 40° C. for about 10 minutes in air. After drying, a solvent containing 5 iOz ultrafine particles and M g F z ultrafine particles mixed at a volume fraction of 1:1 was further added dropwise and uniformly applied using a spinner. after that.
160℃で45分間空気中で焼成し、エチルシリケート
を熱分解して5ift化したa M g F z超微粒
子、5ift超微粒子は熱分解で生じた5i(lzによ
ってガラス基板上に強固に固着される。The a M g F z ultrafine particles and 5ift ultrafine particles obtained by firing in air at 160°C for 45 minutes to thermally decompose ethyl silicate and 5ift ultrafine particles are firmly fixed on the glass substrate by 5i (lz) generated by thermal decomposition. Ru.
このようにして形成した超微粒子膜の断面を電子顕微鏡
で観察したところ、第1図に示すように5iOz超微粒
子とMgF’2超微粒子が7:3となるPPI<第1層
)が約0.1μm 、1 : 1となる層(第2層)が
約0.1μmで計約0.2μm膜厚の、5ins超微粒
子、MgFx超微粒子が均一に混合して、密に堆積した
膜がN1!察された。When the cross section of the ultrafine particle film thus formed was observed with an electron microscope, as shown in Figure 1, the ratio of 5iOz ultrafine particles to MgF'2 ultrafine particles was 7:3, and the PPI <first layer) was approximately 0. .1μm, 1:1 layer (second layer) is about 0.1μm, total film thickness is about 0.2μm, 5ins ultrafine particles and MgFx ultrafine particles are uniformly mixed, and the densely deposited film is N1. ! It was noticed.
上記の超微粒子膜の、膜厚方向に対する平均屈折率の変
化を5iOz超微粒子とM g Fx超微粒子の体積分
率から算出した結果を第2図に示す、aは空気の屈折率
で約1.0 bは第1層の屈折率で約1.42、Cは
第2Mの屈折率で約1.44゜dはソーダガラスの屈折
率で約1.53である。Figure 2 shows the results of calculating the change in average refractive index in the film thickness direction of the above ultrafine particle film from the volume fractions of 5iOz ultrafine particles and M g Fx ultrafine particles, where a is the refractive index of air and is approximately 1. .0b is the refractive index of the first layer, which is approximately 1.42, and C is the refractive index of the second layer, which is approximately 1.44.degree.d is the refractive index of soda glass, which is approximately 1.53.
膜全体としては、屈折率が徐々に変化しているため、塗
布膜とガラス基板との界面における反射率を低減する効
果がある。また、超微粒子によって膜を形成しているた
め、塗・布膜表面に微小な凹凸が生じ、塗布膜表面での
反射を低減する結果となっている。Since the refractive index of the film as a whole changes gradually, it has the effect of reducing the reflectance at the interface between the coating film and the glass substrate. Furthermore, since the film is formed of ultrafine particles, minute irregularities occur on the surface of the coated film, resulting in a reduction in reflection on the surface of the coated film.
上記の超微粒子膜を形成したガラス基板と未処理のガラ
ス基板に対して、5°の入射角度で波長400〜700
nmの光を入射させ、その反射率を測定し結果を第3図
に示す、IIA中■が上記超微粒子膜を形成したガラス
板の反射特性であり、■が未処理のガラス板の反射特性
である。A wavelength of 400 to 700 was applied at an incident angle of 5° to the glass substrate on which the above ultrafine particle film was formed and the untreated glass substrate.
3 nm light was incident, and its reflectance was measured, and the results are shown in Figure 3. In IIA, ■ is the reflection characteristic of the glass plate on which the above ultrafine particle film was formed, and ■ is the reflection characteristic of the untreated glass plate. It is.
全波長域において本発明の反射防止膜は未処理のガラス
板の約1/4まで反射率が低減している。In the entire wavelength range, the antireflection film of the present invention has a reflectance reduced to about 1/4 of that of an untreated glass plate.
また透過率は、波長400〜700nm間の積分値で示
すと、未処理ガラス板が92%に対して本発明の反射防
止膜を形成したガラス板は約86%となる。可視光全領
域で低反射であり、かつ透過率が高いため、VDT (
ビジュアル・デイスプレィ・ターミナル)に対する反射
防止膜として好適である。Furthermore, when the transmittance is expressed as an integral value between wavelengths of 400 to 700 nm, the untreated glass plate has a transmittance of 92%, whereas the glass plate coated with the antireflection film of the present invention has a transmittance of about 86%. VDT (
It is suitable as an antireflection coating for visual display terminals).
なお1本実施例では混合比を変えた2層としたが、より
多層として平均屈折率の変化をより小刻みとすれば反射
防止効果は一層増すこととなる。In this example, two layers were used with different mixing ratios, but if more layers were used and the average refractive index was changed in smaller increments, the antireflection effect would further increase.
本発明によれば、簡単な塗布法をくり返すことで屈折率
が連続変化した膜を形成できるため、反射防止膜を低コ
ストで製造できる、さらに大面積の反射防止膜も容易に
形成できる効果がある。According to the present invention, it is possible to form a film with a continuously changing refractive index by repeating a simple coating method, so that an anti-reflection film can be manufactured at low cost, and furthermore, a large-area anti-reflection film can be easily formed. There is.
第1図は本発明の一実施例の反射防止膜の断面図、第2
図は上記反射防止膜の膜厚方向に対する屈折率の変化を
示した図、第3図は本発明の一実施例の反射防止膜と未
処理ガラス板との波長400〜700nm間の反射率を
示す特性図である。FIG. 1 is a cross-sectional view of an antireflection film according to an embodiment of the present invention, and FIG.
The figure shows the change in refractive index of the anti-reflection film in the film thickness direction, and Figure 3 shows the reflectance between the anti-reflection film of one embodiment of the present invention and an untreated glass plate in the wavelength range of 400 to 700 nm. FIG.
Claims (1)
以上の超微粒子が混在し、膜厚方向にその混合比が変化
することを特徴とする反射防止膜。 2、超微粒子を主体とする反射防止膜において、2種類
以上の超微粒子が混在し、その混合比が異なる薄層が2
層以上形成されていることを特徴とする反射防止膜。 3、超微粒子を主体とする反射防止膜の形成方法におい
て、2種類以上の超微粒子を混合し、その混合比が異な
る薄層を積層して膜厚方向に超微粒子の混合比を変化さ
せることを特徴とする反射防止膜の製作方法。[Scope of Claims] 1. An antireflection film mainly composed of ultrafine particles, characterized in that two or more types of ultrafine particles coexist, and the mixing ratio thereof changes in the film thickness direction. 2. In an antireflection film mainly composed of ultrafine particles, there are two thin layers in which two or more types of ultrafine particles coexist and their mixing ratios differ.
An antireflection film characterized by being formed of more than one layer. 3. In the method of forming an anti-reflection film mainly composed of ultrafine particles, two or more types of ultrafine particles are mixed, and thin layers with different mixing ratios are laminated to vary the mixing ratio of the ultrafine particles in the film thickness direction. A method for producing an antireflection film characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1066193A JPH02245702A (en) | 1989-03-20 | 1989-03-20 | Anti-reflection film and its manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1066193A JPH02245702A (en) | 1989-03-20 | 1989-03-20 | Anti-reflection film and its manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02245702A true JPH02245702A (en) | 1990-10-01 |
Family
ID=13308766
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1066193A Pending JPH02245702A (en) | 1989-03-20 | 1989-03-20 | Anti-reflection film and its manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02245702A (en) |
Cited By (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0778476A2 (en) | 1995-12-07 | 1997-06-11 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
| US6383620B1 (en) | 1996-08-14 | 2002-05-07 | Daikin Industries, Ltd. | Antireflection article |
| US6383559B1 (en) | 1995-12-07 | 2002-05-07 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
| US6791649B1 (en) | 1999-09-28 | 2004-09-14 | Fuji Photo Film Co., Ltd. | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate |
| EP1475217A1 (en) | 2003-05-08 | 2004-11-10 | Fuji Photo Film Co., Ltd. | Antiglare film, method of producing the same, anti-reflection film, polarizing plate, and image display device |
| WO2005063484A1 (en) | 2003-12-26 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Antireflection film, polarizing plate, method for producing them, liquid crystal display element, liquid crystal display device, and image display device |
| JP2005352303A (en) * | 2004-06-11 | 2005-12-22 | Pentax Corp | Antireflection film and optical element having antireflection film |
| JP2006259711A (en) * | 2005-02-18 | 2006-09-28 | Canon Inc | Optical transparent member and optical system using the same |
| WO2008030364A3 (en) * | 2006-09-07 | 2008-05-08 | Guardian Industries | Solar cell with antireflective coating comprising metal fluoride and/or silica and method of making same |
| JP2009162852A (en) * | 2007-12-28 | 2009-07-23 | Canon Electronics Inc | Optical element |
| US7745900B2 (en) * | 2005-08-24 | 2010-06-29 | Micron Technology, Inc. | Method and apparatus providing refractive index structure for a device capturing or displaying images |
| US7824740B2 (en) | 2004-03-26 | 2010-11-02 | Fujifilm Corporation | Anti-reflection film, production of anti-reflection film, and multi-layer film producing apparatus |
| EP2120256A3 (en) * | 2008-05-16 | 2011-05-04 | Samsung Electronics Co., Ltd. | Optical element, light-emitting device having the same and method of manufacturing the same |
| JP2013508778A (en) * | 2009-10-24 | 2013-03-07 | スリーエム イノベイティブ プロパティズ カンパニー | Gradient low refractive index articles and methods |
| US8501270B2 (en) | 2005-02-18 | 2013-08-06 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
| JP2014052608A (en) * | 2012-09-10 | 2014-03-20 | Sharp Corp | Light-diffusing member with polarizing plate, method for manufacturing light-diffusing member with polarizing plate, and display device |
| KR20140077449A (en) * | 2012-12-14 | 2014-06-24 | 엘지디스플레이 주식회사 | Organic light emitting display panel |
| WO2015159839A1 (en) * | 2014-04-15 | 2015-10-22 | 旭硝子株式会社 | Anti-reflection laminate and method for producing same |
| KR20190128736A (en) | 2017-03-31 | 2019-11-18 | 군제 가부시키가이샤 | Antireflection film |
| JP2021535439A (en) * | 2018-11-02 | 2021-12-16 | エルジー・ケム・リミテッド | Circularly polarizing plate |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2601123A (en) * | 1947-04-05 | 1952-06-17 | American Optical Corp | Composition for reducing the reflection of light |
| JPS52116255A (en) * | 1976-03-26 | 1977-09-29 | Nippon Chemical Ind | Thin film for infrared ray with optional refractive index |
| JPS5949501A (en) * | 1982-09-16 | 1984-03-22 | Toray Ind Inc | Transparent material having antireflection film |
| JPS6088901A (en) * | 1983-10-20 | 1985-05-18 | Seiko Epson Corp | Synthetic resin lens |
| JPS6217044A (en) * | 1985-07-12 | 1987-01-26 | Hoya Corp | Formation of antireflection film resistant to laser damage and having high wear resistance on optical element surface |
| JPS63193101A (en) * | 1987-02-06 | 1988-08-10 | Hitachi Ltd | anti-reflection film |
| JPH01312501A (en) * | 1988-06-10 | 1989-12-18 | Asahi Optical Co Ltd | Formation of antireflection film for plastic lens |
-
1989
- 1989-03-20 JP JP1066193A patent/JPH02245702A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2601123A (en) * | 1947-04-05 | 1952-06-17 | American Optical Corp | Composition for reducing the reflection of light |
| JPS52116255A (en) * | 1976-03-26 | 1977-09-29 | Nippon Chemical Ind | Thin film for infrared ray with optional refractive index |
| JPS5949501A (en) * | 1982-09-16 | 1984-03-22 | Toray Ind Inc | Transparent material having antireflection film |
| JPS6088901A (en) * | 1983-10-20 | 1985-05-18 | Seiko Epson Corp | Synthetic resin lens |
| JPS6217044A (en) * | 1985-07-12 | 1987-01-26 | Hoya Corp | Formation of antireflection film resistant to laser damage and having high wear resistance on optical element surface |
| JPS63193101A (en) * | 1987-02-06 | 1988-08-10 | Hitachi Ltd | anti-reflection film |
| JPH01312501A (en) * | 1988-06-10 | 1989-12-18 | Asahi Optical Co Ltd | Formation of antireflection film for plastic lens |
Cited By (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6383559B1 (en) | 1995-12-07 | 2002-05-07 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
| EP0778476A2 (en) | 1995-12-07 | 1997-06-11 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
| US6383620B1 (en) | 1996-08-14 | 2002-05-07 | Daikin Industries, Ltd. | Antireflection article |
| US6791649B1 (en) | 1999-09-28 | 2004-09-14 | Fuji Photo Film Co., Ltd. | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate |
| US6917400B2 (en) | 1999-09-28 | 2005-07-12 | Fuji Photo Film Co., Ltd. | Anti-reflection film, polarizing plate comprising the same, and image display device using the anti-reflection film or the polarizing plate |
| US7427371B2 (en) | 2003-05-08 | 2008-09-23 | Fujifilm Corporation | Method of producing anti-glare film |
| EP1475217A1 (en) | 2003-05-08 | 2004-11-10 | Fuji Photo Film Co., Ltd. | Antiglare film, method of producing the same, anti-reflection film, polarizing plate, and image display device |
| WO2005063484A1 (en) | 2003-12-26 | 2005-07-14 | Fuji Photo Film Co., Ltd. | Antireflection film, polarizing plate, method for producing them, liquid crystal display element, liquid crystal display device, and image display device |
| US7824740B2 (en) | 2004-03-26 | 2010-11-02 | Fujifilm Corporation | Anti-reflection film, production of anti-reflection film, and multi-layer film producing apparatus |
| JP2005352303A (en) * | 2004-06-11 | 2005-12-22 | Pentax Corp | Antireflection film and optical element having antireflection film |
| JP2006259711A (en) * | 2005-02-18 | 2006-09-28 | Canon Inc | Optical transparent member and optical system using the same |
| US8501270B2 (en) | 2005-02-18 | 2013-08-06 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
| US7931936B2 (en) | 2005-02-18 | 2011-04-26 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
| US7811684B2 (en) | 2005-02-18 | 2010-10-12 | Canon Kabushiki Kaisha | Optical transparent member and optical system using the same |
| US7745900B2 (en) * | 2005-08-24 | 2010-06-29 | Micron Technology, Inc. | Method and apparatus providing refractive index structure for a device capturing or displaying images |
| US8119440B2 (en) | 2005-08-24 | 2012-02-21 | Micron Technology, Inc. | Method and apparatus providing refractive index structure for a device capturing or displaying images |
| WO2008030364A3 (en) * | 2006-09-07 | 2008-05-08 | Guardian Industries | Solar cell with antireflective coating comprising metal fluoride and/or silica and method of making same |
| JP2009162852A (en) * | 2007-12-28 | 2009-07-23 | Canon Electronics Inc | Optical element |
| EP2120256A3 (en) * | 2008-05-16 | 2011-05-04 | Samsung Electronics Co., Ltd. | Optical element, light-emitting device having the same and method of manufacturing the same |
| JP2013508778A (en) * | 2009-10-24 | 2013-03-07 | スリーエム イノベイティブ プロパティズ カンパニー | Gradient low refractive index articles and methods |
| JP2014052608A (en) * | 2012-09-10 | 2014-03-20 | Sharp Corp | Light-diffusing member with polarizing plate, method for manufacturing light-diffusing member with polarizing plate, and display device |
| KR20140077449A (en) * | 2012-12-14 | 2014-06-24 | 엘지디스플레이 주식회사 | Organic light emitting display panel |
| WO2015159839A1 (en) * | 2014-04-15 | 2015-10-22 | 旭硝子株式会社 | Anti-reflection laminate and method for producing same |
| KR20190128736A (en) | 2017-03-31 | 2019-11-18 | 군제 가부시키가이샤 | Antireflection film |
| JP2021535439A (en) * | 2018-11-02 | 2021-12-16 | エルジー・ケム・リミテッド | Circularly polarizing plate |
| US11985847B2 (en) | 2018-11-02 | 2024-05-14 | Lg Chem, Ltd. | Circularly polarizing plate |
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