JPS6217044A - Formation of antireflection film resistant to laser damage and having high wear resistance on optical element surface - Google Patents
Formation of antireflection film resistant to laser damage and having high wear resistance on optical element surfaceInfo
- Publication number
- JPS6217044A JPS6217044A JP60152311A JP15231185A JPS6217044A JP S6217044 A JPS6217044 A JP S6217044A JP 60152311 A JP60152311 A JP 60152311A JP 15231185 A JP15231185 A JP 15231185A JP S6217044 A JPS6217044 A JP S6217044A
- Authority
- JP
- Japan
- Prior art keywords
- optical element
- laser damage
- antireflection film
- resistant
- org
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 13
- 230000015572 biosynthetic process Effects 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 26
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 239000011248 coating agent Substances 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 12
- 239000008119 colloidal silica Substances 0.000 claims abstract description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000002156 mixing Methods 0.000 claims abstract description 5
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 4
- 239000002184 metal Substances 0.000 claims description 11
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000003960 organic solvent Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 239000000243 solution Substances 0.000 claims description 6
- 238000005299 abrasion Methods 0.000 claims description 4
- 239000011259 mixed solution Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 abstract description 6
- 239000000377 silicon dioxide Substances 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 4
- 239000010419 fine particle Substances 0.000 abstract description 3
- 230000003301 hydrolyzing effect Effects 0.000 abstract description 2
- 239000002904 solvent Substances 0.000 abstract 4
- 239000006185 dispersion Substances 0.000 abstract 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- 239000011521 glass Substances 0.000 description 8
- 239000005304 optical glass Substances 0.000 description 6
- 230000007062 hydrolysis Effects 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 238000007598 dipping method Methods 0.000 description 3
- 210000002268 wool Anatomy 0.000 description 3
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000012643 polycondensation polymerization Methods 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002386 leaching Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- AJSTXXYNEIHPMD-UHFFFAOYSA-N triethyl borate Chemical compound CCOB(OCC)OCC AJSTXXYNEIHPMD-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
- H01S3/0346—Protection of windows or mirrors against deleterious effects
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
- Lasers (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野1
本発明はレーザーシステムに使用される光学素子用のガ
ラス表面にシリカ微粉末を含むガラス質被膜より成るレ
ーザーダメージに強く、耐摩耗性の高い反射防止膜を形
成することに関する。[Detailed Description of the Invention] [Industrial Application Field 1] The present invention is a glass coating for optical elements used in laser systems, which is resistant to laser damage and has high abrasion resistance and is made of a glassy coating containing fine silica powder. It relates to forming an anti-reflection coating.
[従来の技術ル
−ザー発振システム内には、多くの光学素子(窓、レン
ズ)としてのガラスが使用されているが、それらの光学
素子に反射防止膜を形成さゼて、レーザー出力を効率よ
く取り出す工夫が施されている。その方法としては、負
空蒸着法、表面化学処理法が知られている。[Conventional technology - Glass is used as many optical elements (windows, lenses) in laser oscillation systems, but anti-reflection coatings are formed on these optical elements to improve the efficiency of laser output. It is designed to be easily removed. As the method, negative air deposition method and surface chemical treatment method are known.
[発明が解決しようとする問題点]
真空蒸着法による多層膜コーティングで反射防化膜を形
成した場合には、レーザー光に対するダメージ闇値が低
い(4〜5 J/cm2.1.06μm、パルス幅1n
s)ため、レーザーシステムの出力が制限されてしまう
。また、化学処理法でガラス表面からの成分の選択溶出
により、ガラス表面に多孔質で屈折率勾配をもった反射
防止膜を形成した場合には、レーザー光に対するダメー
ジ闇値は高い(15〜20J/cm2.1.06μm1
パルス幅1ns)が、表面層は非常に弱く、容易に傷が
つく。また汚れが付着した場合手払きで除去することが
できないため、取り扱いがむずかしくなる。もうひとつ
の化学処理法で、光学ガラス素子の表面に金属アルコレ
ートの加水分解により作られたゾル溶液をコーディング
し、熱処理してガラス質被膜を作り、これをリーチング
することにより、多孔質で屈折率勾配をもった反射防止
膜を形成した場合にも、ガラス自身の表面の選択溶出に
よる反射防止膜の場合と同様な問題点が存在している。[Problems to be Solved by the Invention] When an antireflection film is formed by multilayer coating using a vacuum evaporation method, the damage value against laser light is low (4 to 5 J/cm2.1.06 μm, pulse Width 1n
s), which limits the output of the laser system. In addition, when a porous antireflection film with a refractive index gradient is formed on the glass surface by selective elution of components from the glass surface using a chemical treatment method, the damage value against laser light is high (15 to 20 J /cm2.1.06μm1
The pulse width is 1 ns), but the surface layer is very weak and easily scratched. Furthermore, if dirt adheres to the surface, it cannot be removed by hand, making it difficult to handle. Another chemical treatment method is to coat the surface of an optical glass element with a sol solution made by hydrolysis of metal alcoholate, heat treat it to create a glassy film, and leaching it to create a porous and refractive film. Even when an anti-reflection film is formed with a gradient in rate, the same problems as in the case of an anti-reflection film based on selective elution from the surface of the glass itself exist.
本発明は以上のような問題点を解決するために、レーザ
ーダメージ閾値が高く、かつ耐摩耗性の高い反射防止膜
を作ることを目的としたものである。In order to solve the above-mentioned problems, the present invention aims to produce an antireflection film that has a high laser damage threshold and high wear resistance.
[問題点を解決するだめの手段]
本発明は、有機溶媒または水に分散させたコロイダルシ
リカに金属アルコレートを1種または2種以上混合し、
アルコールなどの有機溶媒で稀釈し、撹拌混合して、加
水分解、部分縮重合させて得たゾル溶液に光学ガラス素
子を浸漬し引き上げる方法でコーティングし、乾燥、加
熱処理を行なうことによって作成されたシリカ微粒子を
含む多孔質のガラス質被膜が、耐摩耗性が高く、かつレ
ーザーダメージ閾値の高い反射防止膜となることを見い
出した。ここで、シリカ微粒子はコロイダルシリカで水
またはアルコール等の有機溶媒に分散させた5μO1〜
40μmの粒径のものが用いられる。金属アルコレート
は一般式Me (OR)。[Means for Solving the Problems] The present invention involves mixing one or more metal alcoholates with colloidal silica dispersed in an organic solvent or water,
It is created by coating an optical glass element by dipping it in a sol solution obtained by diluting it with an organic solvent such as alcohol, stirring and mixing it, and then subjecting it to hydrolysis and partial condensation polymerization, followed by drying and heat treatment. We have discovered that a porous glassy coating containing fine silica particles provides an antireflection coating with high wear resistance and a high laser damage threshold. Here, the silica fine particles are colloidal silica dispersed in water or an organic solvent such as alcohol.
A particle size of 40 μm is used. Metal alcoholates have the general formula Me (OR).
(nはMeの配位数)nであらわされ、Meは酸化物と
してガラスを形成しつる金属元素でSi、Al1、B、
Naであり、RはCH3、C2H5、C3H7、C4H
9のアルキル基であり、たとえばs i (OC2Ha
)4 、Af (OC2H5)3、B (OC4H9
)3が用いられる。稀釈のための有機溶媒はメタノール
、エタノール、イソプロピルアルコール、ブタノール、
アセチルアセトンなどが用いられる。(n is the coordination number of Me) Me is a metal element that forms glass as an oxide, such as Si, Al1, B,
Na, R is CH3, C2H5, C3H7, C4H
9 alkyl group, for example, s i (OC2Ha
)4, Af (OC2H5)3, B (OC4H9
)3 is used. Organic solvents for dilution include methanol, ethanol, isopropyl alcohol, butanol,
Acetylacetone and the like are used.
]ロイダルシリカ1モルに対して金属アルコレート0.
1〜511−ルの範囲で加え、さらに稀釈のための有機
溶媒が適量添加され、混合撹拌の後、加水分解のための
水が、HCl又はHNO31m性で金属アルコレート1
モルに対して1〜8モルの範囲で加え、充分混合撹拌さ
れる。このようにして、加水分解、部分縮重合されたゾ
ル溶液がコーテイング液とされる。] 0.0% metal alcoholate per mole of rhoidal silica.
A suitable amount of an organic solvent for dilution is added, and after mixing and stirring, water for hydrolysis is mixed with HCl or HNO31m and metal alcoholate 1
It is added in a range of 1 to 8 moles per mole, and thoroughly mixed and stirred. The sol solution subjected to hydrolysis and partial condensation polymerization in this manner is used as a coating liquid.
反射防止膜を形成するとき、その膜厚は、反射防止した
い波長により、nd=π/4の式で(n:膜屈折率、λ
:反射率minにおける波長、d:膜厚)決められるが
、膜厚のコントロールは、コーテイング液の粘性と引き
上げスピードで行われる。When forming an anti-reflection film, the film thickness is determined by the formula nd = π/4 (n: film refractive index, λ
: wavelength at reflectance min, d: film thickness), and the film thickness is controlled by the viscosity of the coating liquid and the pulling speed.
光学ガラス素子は、上記コーテイング液に浸漬し、引き
上げる方法でコーティングされる。30℃〜120℃の
乾燥の後、300℃〜800℃酸素ガス雰囲気中で加熱
処理することにより、反射防止膜が形成される。The optical glass element is coated by dipping it in the coating liquid and pulling it up. After drying at 30° C. to 120° C., an antireflection film is formed by heat treatment at 300° C. to 800° C. in an oxygen gas atmosphere.
本発明により光学ガラス素子1個7〜10%ある反射損
失が、上記のような簡単な湿式コーティング法で、シリ
カ微粒子を含むガラス被膜を形成することにより、0.
1〜1.0%まで低下され、かつスチールウールでこす
っても傷のつかない丈夫な反射防止膜となった。According to the present invention, the reflection loss of 7 to 10% per optical glass element can be reduced to 0.0 by forming a glass film containing silica fine particles using the simple wet coating method as described above.
The antireflection coating was reduced to 1 to 1.0%, and the result was a durable antireflection film that would not be scratched even when rubbed with steel wool.
コロイダルシリカを含むことで反射防止効果があられた
のは、シリカ微粒子は加熱による収縮が小さく、金属ア
ルコレートよりなるゲル部の大きな収縮により、シリカ
微粒子に保持された空間が、膜内に均一に作られ、屈折
率が低い多孔質となるためであると考えられる。The anti-reflection effect achieved by containing colloidal silica is because silica particles shrink less when heated, and the large shrinkage of the gel part made of metal alcoholate allows the spaces held by the silica particles to be uniformly distributed within the film. This is thought to be due to the fact that it becomes porous and has a low refractive index.
レーザーシステム内で使用される光学ガラス素子に本発
明による反射防止膜を形成することにより、レーザー出
力を効率よく取り出すことが可能になった。レーザーダ
メージ閾値および耐摩耗性の向上については、以下の実
施例で具体的に述べる。なお、この発明は以下の実施例
の範囲に限定されるものではない。By forming an antireflection film according to the present invention on an optical glass element used in a laser system, it has become possible to efficiently extract laser output. Improvements in laser damage threshold and wear resistance will be specifically described in the following examples. Note that the present invention is not limited to the scope of the following examples.
[実施例]
実施例1
エタノール分散コロイダルシリカ1モルにテトラエトキ
シシラン1モルを加え、エタノール20モルで稀釈した
混合液に塩酸酸性の水を2モル加え、充分混合撹拌して
加水分解、部分縮重合させたコロイダルシリカを含むゾ
ル溶液に光学素子の石英ガラスを浸漬し、一定スピード
で引き上げることによってコーティングした。これを室
温乾燥、120℃乾燥の後、390℃まで徐々に昇渇し
、酸素ガス雰囲気中で10時間保持し、多孔質のガラス
質被膜とした。[Example] Example 1 Add 1 mole of tetraethoxysilane to 1 mole of ethanol-dispersed colloidal silica and dilute with 20 moles of ethanol. Add 2 moles of water acidified with hydrochloric acid and thoroughly mix and stir to cause hydrolysis and partial condensation. The quartz glass of the optical element was immersed in a sol solution containing polymerized colloidal silica and then pulled up at a constant speed to coat it. After drying at room temperature and at 120°C, the temperature was gradually raised to 390°C and kept in an oxygen gas atmosphere for 10 hours to form a porous glass film.
このガラス質被膜を施した石英ガラスの反射率曲線は第
1図に示すが、330nmの波長で反射率の極小値0.
2χ (片面)を示しており、Nddopeのガラスレ
ーザーの3ω光の光学素子として有用である。レーザー
ダメージ閾値は、8 J/cta2で従来の蒸着膜2〜
5J/Cll12より高い耐力を示した。The reflectance curve of quartz glass coated with this glassy coating is shown in FIG. 1, and the reflectance has a minimum value of 0.0 at a wavelength of 330 nm.
2χ (single-sided), and is useful as an optical element for 3ω light of Nddope glass lasers. The laser damage threshold is 8 J/cta2, which is 8 J/cta2.
It showed higher yield strength than 5J/Cll12.
またステンレスウールによるこすりテストでも肉眼では
傷の発生は認められなかった。In addition, no scratches were observed with the naked eye in a rubbing test with stainless wool.
実施例2
イソプロピルアルコール分散コロイダルシリカ1.25
モル、テトラエトキシシラン1モル、イソプロピルアル
コール10モルの混合液に塩!u性の水4モルを加え、
撹拌しながら40℃で加水分解させた後にトリエトキシ
ボロン1モルをイソプロピルアルコール0.5モルで稀
釈したものを加え、充分混合撹拌し、作成したゾル溶液
をコーテイング液とした。Example 2 Isopropyl alcohol dispersed colloidal silica 1.25
Mol, salt in a mixture of 1 mole of tetraethoxysilane and 10 moles of isopropyl alcohol! Add 4 moles of u-based water,
After hydrolyzing at 40° C. with stirring, 1 mole of triethoxyboron diluted with 0.5 mole of isopropyl alcohol was added, thoroughly mixed and stirred, and the resulting sol solution was used as a coating liquid.
光学ガラス素子に浸漬し、引き上げる法によりコーティ
ングし、120℃で乾燥の後に500℃までゆっくり昇
温し、酸素ガス雰囲気中で15時間保持し、多孔質のガ
ラス質被膜とした。この反射防止膜の形成によって反射
率は第2図に示すように片面で350nmで0.5χま
で低下した。レーザーダメージ閾値は、Ndレーザー3
ω光で10J/Cm2どなった。また、ステンレスウー
ルによるこすりテストでは肉眼では全り(口が認められ
なかった。An optical glass element was coated by dipping and pulling up, and after drying at 120°C, the temperature was slowly raised to 500°C and held in an oxygen gas atmosphere for 15 hours to form a porous glassy coating. By forming this antireflection film, the reflectance decreased to 0.5χ at 350 nm on one side, as shown in FIG. Laser damage threshold is Nd laser 3
It was 10J/Cm2 with ω light. In addition, in a rubbing test with stainless wool, no mouth was observed with the naked eye.
第1図、第2図はそれぞれ実施例1、実施例2に述べた
反射防止膜の反射率曲線である。
出 願 人 ホーヤ株式会社
代 理 人 朝 倉 正 幸第1図
χ(nm)
′22図
入(nml
」ヨ 続 ?t13 、+E Yq昭和6
0年8月8日FIG. 1 and FIG. 2 are reflectance curves of the antireflection films described in Example 1 and Example 2, respectively. Applicant Hoya Co., Ltd. Agent Masayuki Asakura Figure 1 χ (nm) '22 illustration (nml) Continued ?t13, +E Yq Showa 6
August 8, 0
Claims (1)
ダルシリカに金属アルコレートを一種または2種以上を
混合し、アルコールなどの有機溶媒に溶解した混合液を
加水分解し部分縮重合させたゾル溶液をコーティングし
、熱処理することにより、シリカ微粒子を含むガラス質
被膜を形成することを特徴とするレーザーダメージに強
く、耐摩耗性の高い反射防止膜を光学素子表面に形成す
る方法。 2 コロイダルシリカ:金属アルコレートの混合モル比
が1:0.1〜5であることを特徴とする特許請求の範
囲第1項記載のレーザーダメージに強く耐摩耗性の高い
反射防止膜を光学素子表面に形成する方法。 3 金属アルコレートは、一般式Me(OR)_nであ
らわされ、Meは金属元素Si、Al、Na、Bであり
、RはCH_3、C_2H_5、C_3H_7、C_4
H_9アルキル基であることを特徴とする特許請求の範
囲第1項記載レーザーダメージに強く耐摩耗性の高い反
射防止膜を光学素子表面に形成する方法。[Scope of Claims] 1. On the surface of an optical element, one or more metal alcoholates are mixed with colloidal silica dispersed in water or an organic solvent, and the mixed solution dissolved in an organic solvent such as alcohol is hydrolyzed. By coating a condensation-polymerized sol solution and heat-treating it, a glassy film containing fine silica particles is formed to form an anti-reflection film that is resistant to laser damage and has high abrasion resistance on the surface of optical elements. Method. 2. The antireflection coating resistant to laser damage and having high abrasion resistance as set forth in claim 1, characterized in that the mixing molar ratio of colloidal silica:metal alcoholate is 1:0.1 to 5, is used in an optical element. How to form on the surface. 3 Metal alcoholate is represented by the general formula Me(OR)_n, where Me is a metal element Si, Al, Na, or B, and R is CH_3, C_2H_5, C_3H_7, C_4
A method for forming an antireflection film on the surface of an optical element that is resistant to laser damage and has high abrasion resistance, as set forth in claim 1, wherein the H_9 alkyl group is a H_9 alkyl group.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60152311A JPS6217044A (en) | 1985-07-12 | 1985-07-12 | Formation of antireflection film resistant to laser damage and having high wear resistance on optical element surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60152311A JPS6217044A (en) | 1985-07-12 | 1985-07-12 | Formation of antireflection film resistant to laser damage and having high wear resistance on optical element surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6217044A true JPS6217044A (en) | 1987-01-26 |
Family
ID=15537748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60152311A Pending JPS6217044A (en) | 1985-07-12 | 1985-07-12 | Formation of antireflection film resistant to laser damage and having high wear resistance on optical element surface |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6217044A (en) |
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63193101A (en) * | 1987-02-06 | 1988-08-10 | Hitachi Ltd | anti-reflection film |
| JPS6476001A (en) * | 1987-09-18 | 1989-03-22 | Hitachi Ltd | Antireflection film |
| JPH02245702A (en) * | 1989-03-20 | 1990-10-01 | Hitachi Ltd | Anti-reflection film and its manufacturing method |
| JPH02256001A (en) * | 1988-10-31 | 1990-10-16 | Sumitomo Cement Co Ltd | Glass or plastic product having antireflection coating, its production and coating composition |
| FR2762097A1 (en) * | 1997-04-10 | 1998-10-16 | Corning Sa | Optical article with anti=reflective coating |
| EP0973639A4 (en) * | 1997-04-10 | 2000-07-19 | Corning Inc | Optical article with anti-reflecting coating, corresponding coating material and coating method |
| WO2001042156A1 (en) * | 1999-12-13 | 2001-06-14 | Nippon Sheet Glass Co., Ltd. | Low-reflection film and solar cell panel |
| CN1109254C (en) * | 1998-02-20 | 2003-05-21 | 中国科学院山西煤炭化学研究所 | Preparation of membrane for preventing injury from laser beam |
| CN109111123A (en) * | 2018-09-07 | 2019-01-01 | 中国工程物理研究院激光聚变研究中心 | Surface defect processing method and laser curing processing system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57169704A (en) * | 1981-04-13 | 1982-10-19 | Nippon Telegr & Teleph Corp <Ntt> | Production for optical waveguide film |
-
1985
- 1985-07-12 JP JP60152311A patent/JPS6217044A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57169704A (en) * | 1981-04-13 | 1982-10-19 | Nippon Telegr & Teleph Corp <Ntt> | Production for optical waveguide film |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63193101A (en) * | 1987-02-06 | 1988-08-10 | Hitachi Ltd | anti-reflection film |
| JPS6476001A (en) * | 1987-09-18 | 1989-03-22 | Hitachi Ltd | Antireflection film |
| JPH02256001A (en) * | 1988-10-31 | 1990-10-16 | Sumitomo Cement Co Ltd | Glass or plastic product having antireflection coating, its production and coating composition |
| JPH02245702A (en) * | 1989-03-20 | 1990-10-01 | Hitachi Ltd | Anti-reflection film and its manufacturing method |
| FR2762097A1 (en) * | 1997-04-10 | 1998-10-16 | Corning Sa | Optical article with anti=reflective coating |
| EP0973639A4 (en) * | 1997-04-10 | 2000-07-19 | Corning Inc | Optical article with anti-reflecting coating, corresponding coating material and coating method |
| CN1109254C (en) * | 1998-02-20 | 2003-05-21 | 中国科学院山西煤炭化学研究所 | Preparation of membrane for preventing injury from laser beam |
| WO2001042156A1 (en) * | 1999-12-13 | 2001-06-14 | Nippon Sheet Glass Co., Ltd. | Low-reflection film and solar cell panel |
| US6921578B2 (en) | 1999-12-13 | 2005-07-26 | Nippon Sheet Glass Co., Ltd. | Low-reflection glass article |
| CN109111123A (en) * | 2018-09-07 | 2019-01-01 | 中国工程物理研究院激光聚变研究中心 | Surface defect processing method and laser curing processing system |
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