JPH0224951A - Correction method for drift of specimen position - Google Patents

Correction method for drift of specimen position

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Publication number
JPH0224951A
JPH0224951A JP63175758A JP17575888A JPH0224951A JP H0224951 A JPH0224951 A JP H0224951A JP 63175758 A JP63175758 A JP 63175758A JP 17575888 A JP17575888 A JP 17575888A JP H0224951 A JPH0224951 A JP H0224951A
Authority
JP
Japan
Prior art keywords
sample
drift
specimen
tunnel current
analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63175758A
Other languages
Japanese (ja)
Inventor
Yuji Sakai
境 悠治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP63175758A priority Critical patent/JPH0224951A/en
Publication of JPH0224951A publication Critical patent/JPH0224951A/en
Pending legal-status Critical Current

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Abstract

PURPOSE:To enhance the drift correction accuracy and shorten the measuring time by sensing drift of the specimen position with a tunnel current measuring means on the specimen holder side, and controlling a specimen position micro- movement mechanism. CONSTITUTION:In an analyzing device with possibility of analysis of a specimen 1 in its heated condition, a tunnel current measuring means due to a location sensing chip 6 and a reference position meter 7 installed on a specimen holder 3 senses the tunnel current corresponding to the position drift of the specimen 1 originating from thermal drift of specimen stage 6. This current is fed back through a drift correction circuit 8, and a specimen position micro-movement adjusting mechanism 4 consisting of piezo ceramic element is controlled, and thus the specimen position drift correction accuracy is enhanced and possible drift variation during correction is prevented to lead to shortening of the measuring time for analysis.

Description

【発明の詳細な説明】 〔産業上の利用分野) 本発明は、試料の加熱状態での分析が可能になった分析
装置に関し、特に試料の加熱状態での試料位置を補正す
るための試料位置のドリフト補正方式に関する。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to an analyzer that is capable of analyzing a sample in a heated state, and particularly relates to an analyzer that enables analysis of a sample in a heated state. This paper relates to a drift correction method.

(従来の技術〕 SEM(走査電子顕微鏡)やAES (オージェ電子分
光装置)、走査型RHEED (反射高速回折)装置で
は、例えば鉄鋼等の試料を加熱状態にするご七により、
粒塊が吹き出したり拡散する様子が分析できる。このよ
うな分析のため、試料ホルダーに加熱装置を備えている
。通常、試料ホルダーは、試料ステージに搭載され試料
ステージを移動させて分析位置を決定しているが、試料
加熱時に試料ステージも加熱されてしまうと、熱膨張に
より分析位置が動いてしまうという問題が生じる。その
ために、試料まわりの熱絶縁を良くして、試料のみが加
熱し、試料ステージ等には熱が伝わらないようにしてい
る。
(Prior art) In SEM (scanning electron microscope), AES (Auger electron spectroscopy), and scanning RHEED (reflection high-speed diffraction) devices, for example, a sample such as steel is heated.
It is possible to analyze how the particles blow out and spread. For such analysis, the sample holder is equipped with a heating device. Normally, the sample holder is mounted on a sample stage and the analysis position is determined by moving the sample stage. However, if the sample stage is also heated when the sample is heated, the analysis position may move due to thermal expansion. arise. For this purpose, the thermal insulation around the sample is improved so that only the sample is heated and no heat is transmitted to the sample stage or the like.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

しかしながら、試料を600°C程度の高温に加熱する
と、加熱時の輻射熱等が試料ステージの熱ドリフトとな
り、その結果分析時の試料位置のドリフトになって現れ
てしまう。特に分析領域が1μm以下の狭い領域になる
と、そのドリフトが無視できないため、分析前に熱ドリ
フトが止まるか又は一定になるまで待つ必要があり、分
析に長時間が必要となっている。もし、ドリフトがある
一定のスピードになれば、ステージで位置の補正が可能
であるが、やはりそれまでに長時間が必要となる。
However, when a sample is heated to a high temperature of about 600° C., the radiant heat generated during heating results in a thermal drift of the sample stage, resulting in a drift in the sample position during analysis. Particularly when the analysis region is narrow, 1 μm or less, the drift cannot be ignored, so it is necessary to wait until the thermal drift stops or becomes constant before analysis, which requires a long time for analysis. If the drift reaches a certain speed, the stage can correct the position, but it will take a long time to do so.

本発明は、上記課題を解決するものであって、試料の加
熱状態を分析する際に試料位置のドリフト補正を精度よ
く行うことができる試料位置のドリフト補正方式を提供
することを目的とする。
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a sample position drift correction method that can accurately perform sample position drift correction when analyzing the heating state of a sample.

〔課題を解決するための手段〕[Means to solve the problem]

そのために本発明は、試料の加熱状態での分析が可能に
なった分析装置において、試料ホルダーと試料ステージ
との間に試料位置微動機構を備えると共に試料ホルダー
側にトンネル電流測定手段を備え、試料位置のドリフト
をトンネル電流測定手段により検出し、試料位置微動機
構を制御して試料位置を補正するように構成したことを
特徴とするものである。
To this end, the present invention provides an analyzer capable of analyzing a sample in a heated state, which is equipped with a sample position fine movement mechanism between the sample holder and the sample stage, and a tunnel current measuring means on the sample holder side. The present invention is characterized in that the position drift is detected by a tunnel current measuring means, and the sample position is corrected by controlling the sample position fine movement mechanism.

〔作用〕[Effect]

本発明の試料位置のドリフト補正方式では、試料の加熱
により試料位置が変化すると、トンネル電流が変化する
ので、トンネル電流が一定になるように試料位置微動機
構を制御することによって試料位置が補正される。この
ようにトンネル電流により試料位置のドリフトを検出す
るので、ドリフト量を5〜10人程度までおさえること
ができる。
In the sample position drift correction method of the present invention, when the sample position changes due to heating of the sample, the tunnel current changes, so the sample position is corrected by controlling the sample position fine movement mechanism so that the tunnel current remains constant. Ru. Since the drift of the sample position is detected using the tunnel current in this way, the amount of drift can be suppressed to about 5 to 10 people.

[実施例] 以下、図面を参照しつつ実施例を説明する。[Example] Examples will be described below with reference to the drawings.

第1図は本発明に係る試料位置のドリフト補正方式の1
実施例を示す図であり、1は試料、2は試料加熱装置、
3は試料ホルダー、4は圧電セラミックス、5は試料ス
テージ、6は位置検出チップ、7は基準位置計、8はド
リフト補正回路を示す。
FIG. 1 shows a sample position drift correction method according to the present invention.
1 is a diagram showing an example, 1 is a sample, 2 is a sample heating device,
3 is a sample holder, 4 is a piezoelectric ceramic, 5 is a sample stage, 6 is a position detection chip, 7 is a reference position meter, and 8 is a drift correction circuit.

第1図において、試料加熱装置2は、試料ホルダー3内
に組み立てられたものであり、試料1を試料加熱装置2
にマウントしてから試料ステージ5に置かれる。試料ホ
ルダー3には、位置検出チップ6が取り付けられ、この
位置検出チップ6に対向して基(七位置計7が配置され
る。基準位置計7は、試料加熱装置2が組み込まれた試
料ホルダー3とは独立して取り付けられたもので、熱的
にも独立しており、分析位置が決定された後に、試料ホ
ルダー3に近づけて基準位置とする。これら位置検出チ
ップ6と基準位置計7との間には、/Nイアスが印加さ
れていて、両者を接近(約5〜10人程度まで)させる
といわゆるトンネル電流が流れる。また、この試料ホル
ダー3の下側、試料ステージ5との間は圧電セラミック
ス(ピエゾ素子)4で結合される。そして、位置検出チ
ンプロと基準位置計7により試料ホルダー3の熱ドリフ
トを検出し、圧電セラミックス4を微動位置制御機構と
して試料ホルダー3のドリフト補正を行うのがドリフト
補正回路8である。そのためこのドリフト補正回路8は
、位置検出子ツブ6に流れるトンネル電流を検出して増
幅し、トンネル電流が一定になるように圧電セラミック
ス4にフィードバックするものである。
In FIG. 1, a sample heating device 2 is assembled inside a sample holder 3, and a sample 1 is placed in the sample heating device 2.
and then placed on the sample stage 5. A position detection chip 6 is attached to the sample holder 3, and a base (seven position meter 7) is arranged opposite to this position detection chip 6.The reference position meter 7 is a sample holder with a built-in sample heating device 2 3 and are thermally independent, and after the analysis position is determined, it is brought close to the sample holder 3 and used as the reference position.These position detection chip 6 and reference position meter 7 /Nias is applied between the sample holder 3 and the sample stage 5, and when the two are brought close together (approximately 5 to 10 people), a so-called tunnel current flows. The space is connected by a piezoelectric ceramic (piezo element) 4. Then, the thermal drift of the sample holder 3 is detected by the position detection chimper and the reference position meter 7, and the drift of the sample holder 3 is corrected using the piezoelectric ceramic 4 as a fine position control mechanism. This is carried out by the drift correction circuit 8. Therefore, this drift correction circuit 8 detects and amplifies the tunnel current flowing through the position detector knob 6, and feeds it back to the piezoelectric ceramic 4 so that the tunnel current becomes constant. It is.

上記の構成により、試料を加熱状態で分析しようとする
場合には、まず、試料ステージ5のX、Y、Z移動機構
の操作により分析位置を選ぶ。しかる後、Vi準位置計
7を試料ホルダー3に取り付けられた位置検出チップ6
に近づける。両者が約5〜IO人程度まで接近し、トン
ネル電流が流れると、その位置を基準位置として基準位
置計7を固定する。この状態で試料加熱装置2を動作さ
せ試料1を加熱する。そして、所定の温度例えば600
゛Cに達したところで分析を開始する。加熱によって試
料ホルダー2にドリフトが現れると、位置検出チンプロ
と基準位置計7との間の路線が変化し、トンネル電流が
変化する。このトンネル電流の変化により、ドリフト補
正回路8が動作し、トンネル電流が一定になるように圧
電セラミックス4にフィードバックすることにより、圧
電セラミックス4でドリフトを補正する。
With the above configuration, when a sample is to be analyzed in a heated state, an analysis position is first selected by operating the X, Y, and Z movement mechanisms of the sample stage 5. After that, the Vi quasi-position meter 7 is attached to the position detection chip 6 attached to the sample holder 3.
get closer to When the two approaches to about 5 to 10 people and a tunnel current flows, the reference position meter 7 is fixed with that position as the reference position. In this state, the sample heating device 2 is operated to heat the sample 1. Then, a predetermined temperature, for example 600
The analysis begins when the temperature reaches ゛C. When a drift appears in the sample holder 2 due to heating, the line between the position detecting tipper and the reference position meter 7 changes, and the tunnel current changes. Due to this change in tunnel current, the drift correction circuit 8 operates and feeds back to the piezoelectric ceramic 4 so that the tunnel current becomes constant, thereby correcting the drift in the piezoelectric ceramic 4.

なお、本発明は、上記の実施例に限定されるものではな
く、種々の変形が可能である。例えばトンネル電流によ
る位置検出手段をX、7両方向に設け、それに対応して
ピエゾ索子による微動位置制御機構をX、7両方向駆動
できるようにしておけば、どの方向にトリフトシても二
次元的にその補正が可能になるが、通常は構造上からド
リフトの生しる方向が一方向に決まってしまうので、そ
の方向にのみ補正を行えるように構成してもよいことは
勿論である。
Note that the present invention is not limited to the above embodiments, and various modifications are possible. For example, if a position detection means using tunnel current is provided in both the X and 7 directions, and a fine movement position control mechanism using a piezo rod can be driven in both the X and 7 directions, no matter which direction the trift is moved, it will be two-dimensional. This can be corrected, but since the direction in which the drift occurs is usually determined to be one direction due to the structure, it is of course possible to configure the structure so that the correction can be performed only in that direction.

〔発明の効果) 以上の説明から明らかなように、本発明によれば、トン
ネル電流をモニターしてピエゾ索子で構成する微動位置
制御機構にフィードバックし、位置精度を出すので、従
来の熱ドリフトを約5〜10人程度まで大幅に減少でき
、ドリフトの補正精度も高めることができる。従って、
試料を加熱状態で分析する場合にも、熱ドリフトが止ま
るまで待たなくても分析を行うことができるので、分析
時間の短縮を図ることができる。
[Effects of the Invention] As is clear from the above description, according to the present invention, the tunnel current is monitored and fed back to the fine position control mechanism composed of piezo ropes to achieve positional accuracy, which eliminates the conventional thermal drift. It is possible to significantly reduce the number of people involved to about 5 to 10 people, and it is also possible to improve the accuracy of drift correction. Therefore,
Even when analyzing a sample in a heated state, the analysis can be performed without waiting until the thermal drift stops, so the analysis time can be shortened.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明に係る試料位置のドリフト補正方式の1
実施例を示す図である。 l・・・試料、2・・・試料加熱装置、3・・・試料ホ
ルダ、4・・・圧電セラミックス、5・・・試料ステー
ジ、6・・・位置検出チップ、7・・・基準位置計、8
・・・ドリフト補正回路。 出 願 人  日本電子株式会社
FIG. 1 shows a sample position drift correction method according to the present invention.
It is a figure showing an example. l...sample, 2...sample heating device, 3...sample holder, 4...piezoelectric ceramics, 5...sample stage, 6...position detection chip, 7...reference position meter , 8
...Drift correction circuit. Applicant: JEOL Ltd.

Claims (2)

【特許請求の範囲】[Claims] (1)試料の加熱状態での分析が可能になった分析装置
において、試料ホルダーと試料ステージとの間に試料位
置微動機構を備えると共に試料ホルダー側にトンネル電
流測定手段を備え、試料位置のドリフトをトンネル電流
測定手段により検出し、試料位置微動機構を制御して試
料位置を補正するように構成したことを特徴とする試料
位置のドリフト補正方式。
(1) In an analyzer that is capable of analyzing a sample in a heated state, it is equipped with a sample position fine movement mechanism between the sample holder and the sample stage, as well as a tunnel current measuring means on the sample holder side, to prevent drift of the sample position. A sample position drift correction method, characterized in that the sample position is detected by a tunnel current measuring means, and the sample position is corrected by controlling a sample position fine movement mechanism.
(2)試料位置微動機構を圧電素子で構成したことを特
徴とする請求項1記載の試料位置のドリフト補正方式。
(2) The sample position drift correction method according to claim 1, wherein the sample position fine movement mechanism is constituted by a piezoelectric element.
JP63175758A 1988-07-14 1988-07-14 Correction method for drift of specimen position Pending JPH0224951A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63175758A JPH0224951A (en) 1988-07-14 1988-07-14 Correction method for drift of specimen position

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63175758A JPH0224951A (en) 1988-07-14 1988-07-14 Correction method for drift of specimen position

Publications (1)

Publication Number Publication Date
JPH0224951A true JPH0224951A (en) 1990-01-26

Family

ID=16001739

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63175758A Pending JPH0224951A (en) 1988-07-14 1988-07-14 Correction method for drift of specimen position

Country Status (1)

Country Link
JP (1) JPH0224951A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003007328A1 (en) * 2001-07-13 2003-01-23 Nanofactory Instruments Ab Device for reducing the impact of distortions in a microscope
JP2015088417A (en) * 2013-11-01 2015-05-07 株式会社日立ハイテクノロジーズ Charged particle beam apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003007328A1 (en) * 2001-07-13 2003-01-23 Nanofactory Instruments Ab Device for reducing the impact of distortions in a microscope
US6924489B2 (en) 2001-07-13 2005-08-02 Nanofactory Instruments Ab Device for reducing the impact of distortions in a microscope
JP2015088417A (en) * 2013-11-01 2015-05-07 株式会社日立ハイテクノロジーズ Charged particle beam apparatus
WO2015064691A1 (en) * 2013-11-01 2015-05-07 株式会社日立ハイテクノロジーズ Charged particle beam device

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