JPH02250252A - Scanning type reflection and diffraction electron microscope - Google Patents

Scanning type reflection and diffraction electron microscope

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Publication number
JPH02250252A
JPH02250252A JP1072078A JP7207889A JPH02250252A JP H02250252 A JPH02250252 A JP H02250252A JP 1072078 A JP1072078 A JP 1072078A JP 7207889 A JP7207889 A JP 7207889A JP H02250252 A JPH02250252 A JP H02250252A
Authority
JP
Japan
Prior art keywords
electron beam
specimen
signal
sample
scanning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1072078A
Other languages
Japanese (ja)
Other versions
JP2737220B2 (en
Inventor
Takao Marui
隆雄 丸井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP1072078A priority Critical patent/JP2737220B2/en
Publication of JPH02250252A publication Critical patent/JPH02250252A/en
Application granted granted Critical
Publication of JP2737220B2 publication Critical patent/JP2737220B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Abstract

PURPOSE:To irradiate specimen surface with an electron beam always in constant circular form by adjusting the focal distance of an electron beam and its profile in accordance with the inclining angle of the specimen. CONSTITUTION:A magnetification adjusting circuit 5 adjusts the ratio of the Y-direction scan amount of an electron beam scan signal given by a scan signal generator 10 to its scan amount in the X direction in conformity to a specimen inclination angle signal sensed by an inclining angle sensor 4 so that the electron beam scans over the specimen surface in its zone approximated to the display screen of a CRT 3. A focal point adjusting circuit 7 controls an electron lens 8 so that the focus of electron beam lies in the measuring center of the specimen S surface and moves the focal point in accordance with the specimen inclination angle signal, while an astigmatism correction circuit 9 feeds a convergent intensity adjusting signal according to the specimen inclination signal to an astigmatism correction coil 11, and thus the convergent intensity in Y direction is adjusted. This ensures that the irradiation spot of the electron beam on the specimen S surface becomes genuine circle at all times.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、走査型反射回折電子顕微鏡に関する(従来の
技術) 走査型反射回折電子顕微鏡において、−次電子ビームに
対しである傾斜角で置かれた試料を観察する場合、電子
ビームの走査量をX、Y方向とも同じにしておくと、試
料面の走査範囲はY方向に伸長したものとなるから、Y
方向走査量をX方向走査量より小さくしてお(必要があ
り、試料に照射する一次電子ビームを傾斜方向(Y方向
)に走査すると、Y方向の照射位置により、電子ビーム
の焦点位置が試料表面から離れるため、−次電子ビーム
の焦点距離を変更しなければ、試料に照射される電子ビ
ームの照射スポットの大きさが変わり、鮮明な画像が得
られないと云う問題がある。
DETAILED DESCRIPTION OF THE INVENTION (Industrial Field of Application) The present invention relates to a scanning reflection diffraction electron microscope (prior art) In a scanning reflection diffraction electron microscope, an electron beam is When observing a sample that has been scratched, if the scanning amount of the electron beam is the same in both the X and Y directions, the scanning range of the sample surface will be extended in the Y direction.
The amount of scanning in the direction must be smaller than the amount of scanning in the Since the electron beam is separated from the surface, unless the focal length of the -order electron beam is changed, the size of the irradiation spot of the electron beam that irradiates the sample changes, making it impossible to obtain a clear image.

また、電子ビームの焦点は理想的には点であるが、実際
には収差および回折の影響で成る大きさがあり、試料面
が傾斜しているので、第2図Aに示すように、試料面に
断面真円の一次電子ビームを照射しても、試料面に照射
される電子ビームの照射スポットPは長円形となり、測
定映像に縦方向と横方向でぼけの程度が異なることが生
じる云う問題があり、試料面に真円の一次電子ビーム照
射スポットを投射しようとすれば、第2図Bに示すよう
に、試料面の傾斜角度の合わせて、断面が横長の長円形
の照射ビームを試料に照射するようにしなければならな
い。
In addition, ideally the focus of the electron beam is a point, but in reality it has a size due to the effects of aberrations and diffraction, and the sample surface is inclined, so the focus of the electron beam is Even if the surface is irradiated with a primary electron beam with a perfect cross section, the irradiation spot P of the electron beam irradiated onto the sample surface becomes an oval shape, and the degree of blurring in the measurement image differs in the vertical and horizontal directions. If there is a problem and you try to project a perfectly circular primary electron beam irradiation spot onto the sample surface, as shown in Figure 2B, the irradiation beam will have a horizontally oblong cross section, depending on the inclination angle of the sample surface. The sample must be irradiated.

そのような問題を解消する方法として、試料傾斜角によ
る像の歪やぼけを補正する方法として、特許公報昭63
−36110号において、−次電子ビームの走査範囲、
焦点位置を調整できるようにした提案がなされている。
As a method to solve such problems, a method for correcting image distortion and blur caused by the specimen tilt angle was proposed in Japanese Patent Publication No. 63.
-36110, the scanning range of the −order electron beam,
Proposals have been made in which the focal position can be adjusted.

この方法は、電子ビームのY方向の走査量をX方向の走
査量に比し小さくし、試料面においてCRT画面と相似
な長方形の範囲を走査させるようにし、試料の傾斜角度
に対応してY方向の走査信号の増幅度を手動で調整する
と共に、調整したY方向の走査信号を、電子レンズの焦
点調整コイルに重畳させることにより、電子ビームの焦
点値1が絶えず試料面に位置するようにして、傾斜した
試料面を走査する電子ビームの照射スポットの大きさを
一定にしていた、しかし、この方法では、試料面の傾斜
角度に対応して、電子レンズの焦点調整コイルに重畳さ
せるY方向の走査信号を、手動で調整しなければならず
、操作が大変面倒である上、照射スポットが試料の傾斜
方向に延びた長円であるなめ、測定画像に縦方向と横方
向とで分解能の異なるぼけが生じ、且つそのぼけの程度
が試料の傾斜角によって変化すると云う問題が残ってい
た。
In this method, the scanning amount of the electron beam in the Y direction is made smaller than the scanning amount in the By manually adjusting the amplification degree of the scanning signal in the Y direction and superimposing the adjusted scanning signal in the Y direction on the focusing coil of the electron lens, the focus value 1 of the electron beam is constantly positioned at the sample surface. However, in this method, the size of the irradiation spot of the electron beam that scans the tilted sample surface was kept constant. However, in this method, the size of the irradiation spot of the electron beam that scans the tilted sample surface is The scanning signal must be adjusted manually, which is very cumbersome to operate, and since the irradiation spot is an ellipse extending in the direction of the sample inclination, the measurement image has a high resolution in both the vertical and horizontal directions. The problem remained that different blurring occurred and the degree of blurring varied depending on the tilt angle of the sample.

(発明が解決しようとする課題) 本発明は、試料の傾斜角度に対応して、電子ビームの焦
点距離及びビーム形状を調整し、試料面に常時同じ円形
の電子ビームが照射されるようにすることを目的とする
(Problems to be Solved by the Invention) The present invention adjusts the focal length and beam shape of the electron beam in accordance with the inclination angle of the sample, so that the sample surface is always irradiated with the same circular electron beam. The purpose is to

(課題を解決するための手段) 走査型反射回折電子顕微鏡装置において、試料面の傾斜
角度を検出する傾斜角度検出手段と、上記傾斜角度検出
手段からの試料傾斜信号に応じてX方向とY方向の走査
量の比を調整する調整手段と、Y方向の走査信号に連動
し上記傾斜角度検出手段からの試料傾斜信号に応じて電
子レンズの収束強度を制御する手段と、上記試料傾斜信
号応じて非点補正コイルのX或はY方向又はX、Y方向
の収束強度を制御する非点補正手段とを設けた。
(A means to solve issues) In the scanning -type reflection times, in the electron microscope device, the inclination angle detection means to detect the inclined angle of the sample surface and the sample tiled signal from the above -sled angle detection means means for controlling the convergence strength of the electron lens in accordance with the sample tilt signal from the tilt angle detection means in conjunction with the scanning signal in the Y direction; Astigmatism correction means for controlling the convergence strength of the astigmatism correction coil in the X or Y direction or in the X and Y directions is provided.

(作用) 走査型反射回折電子m微鏡装置において、歪やぼけの無
い像を得るためには、試料表面上において、CRT画面
と相似な長方形の範囲を一定の大きさの円形の電子ビー
ム照射スポットで走査しなければならない、更に、試料
表面が傾斜している場合には、傾斜方向(Y方向)の走
査に連動して、電子ビームの焦点位置を調整しなければ
ならない。しかも、−次電子ビームに対する試料の傾斜
角度の変更に対応して、上記の調整を変更しなければな
らない。
(Function) In order to obtain an image without distortion or blur in a scanning reflection diffraction electron microscope device, a circular electron beam of a certain size is irradiated onto a rectangular area similar to a CRT screen on the sample surface. The spot must be scanned. Furthermore, if the sample surface is tilted, the focal position of the electron beam must be adjusted in conjunction with scanning in the tilt direction (Y direction). Moreover, the above adjustment must be changed in response to a change in the inclination angle of the sample with respect to the -order electron beam.

本発明は、試料面においてCRT画面と相似な長方形の
範囲を走査させる方法として、試料面の傾斜角度を検出
し、その試料傾斜信号に応じて、CRT画面の形状に合
うように、電子ビームのY方向の走査量をX方向の走査
量に比し小さくし、傾斜した試料面を走査する電子ビー
ムの照射スポットの大きさを一定にする方法として、上
記試料傾斜信号に応じて調整したY方向の走査信号を信
号を電子レンズの焦点制御信号に重畳させた。従って、
Y方向の走査信号に連動して、試料の傾斜角度に応じて
電子レンズの焦点位置が移動することになり、電子レン
ズの焦点位置が試料表面に絶えず位置するようになった
。更に、試料面に照射される電子ビーム照射スポットを
真円形とする方法として、第2図Bに示すように、電子
ビームを非点収束ビームとし、同ビームのX方向収束線
が試料面上に照射されるようにし、かつ、上記試料傾斜
信号により、非点補正回路を駆動して、非点補正コイル
のY方向或はX方向又はX、Y方向の収束強度を制御し
、試料の傾斜に対応して電子ビームの断面形状における
長径と短径の比が変更され、試料表面に照射される電子
ビームの照射スポットが絶えず真円形になるようにした
ので、試料面の傾斜にかかわらず測定画像において、X
方向、Y方向の分解能が常に同一になる。
The present invention is a method for scanning a rectangular range similar to a CRT screen on a sample surface by detecting the tilt angle of the sample surface and adjusting the electron beam to match the shape of the CRT screen according to the sample tilt signal. As a method of making the scanning amount in the Y direction smaller than the scanning amount in the The scanning signal was superimposed on the focus control signal of the electronic lens. Therefore,
In conjunction with the scanning signal in the Y direction, the focal position of the electron lens moves according to the inclination angle of the sample, so that the focal position of the electron lens is constantly located on the sample surface. Furthermore, as a method of making the electron beam irradiation spot irradiated onto the sample surface a perfect circle, as shown in Figure 2B, the electron beam is made into an astigmatic beam, and the X-direction convergence line of the beam is placed on the sample surface. The astigmatism correction circuit is driven by the sample inclination signal to control the convergence strength of the astigmatism correction coil in the Y direction, the X direction, or the X and Y directions, and Correspondingly, the ratio of the major axis to the minor axis in the cross-sectional shape of the electron beam was changed so that the irradiation spot of the electron beam on the sample surface was always a perfect circle, so the measurement image could be maintained regardless of the inclination of the sample surface. In, X
The resolution in both the direction and the Y direction is always the same.

(実施例) 第1図に本発明の一実施例を示す。第1図において、S
は試料で電子銃から照射される電子線を回折する。1は
回折電子検出器で試料Sからの回折電子を検出する。2
は2次電子検出器で試料Sから放射される2次電子を検
出する。3はCRTで回折電子検出器1或は2次電子検
出器で検出された信号を映像表示する。4は傾斜角度検
出器で試料の傾斜角度調整機構と連動した機構により、
試料の傾斜角度を検出する。5は倍率調整回路で、走査
信号発生器10からの電子ビーム走査信号のY方向の走
査量とX方向の走査量の比を、上記傾斜角度検出器4で
検出された試料傾斜角度信号により調整し、電子ビーム
が試料面上をCRT3の表示画面と相銀な領域で走査す
るようにする。
(Example) FIG. 1 shows an example of the present invention. In Figure 1, S
diffracts the electron beam irradiated from the electron gun onto the sample. 1 is a diffraction electron detector that detects diffraction electrons from the sample S. 2
detects secondary electrons emitted from the sample S with a secondary electron detector. 3 is a CRT for displaying a signal detected by the diffraction electron detector 1 or the secondary electron detector as an image. 4 is an inclination angle detector, which is linked to the inclination angle adjustment mechanism of the sample.
Detect the tilt angle of the sample. Reference numeral 5 denotes a magnification adjustment circuit that adjusts the ratio of the scanning amount in the Y direction and the scanning amount in the X direction of the electron beam scanning signal from the scanning signal generator 10 using the sample tilt angle signal detected by the tilt angle detector 4. Then, the electron beam scans the sample surface in an area that is in phase with the display screen of the CRT 3.

7は焦点調整回路で、試料S表面の測定中心に電子ビー
ムの焦点く詳しくは、非点収束ビームのX方向収束線の
近・くの点で、照射スポットのX方向の幅が走査ピッチ
と等しくなる点)が位置するように焦点制御信号を発信
して電子レンズ8を制御すると共に、上記傾斜角度検出
器4で検出された試料傾斜角度信号に応じて増幅したY
方向走査信号を上記焦点制御信号に重畳し、Y方向走査
信号に連動して試料傾斜角度信号に応じて焦点位置を移
動させる。9は非点補正回路で、上記試料傾斜信号に応
じた収束強度調整信号を、非点補正コイル11に加え、
Y方向の収束強度を調整することで、上記試料傾斜信号
に応じて照射スポットのY方向の長さを変えて、試料表
面に照射される電子ビーム照射スポットPを絶えず真円
形になるようにする。
7 is a focus adjustment circuit that focuses the electron beam on the measurement center of the surface of the sample S. Specifically, it focuses the electron beam at a point near the X-direction convergence line of the astigmatic beam, and the width of the irradiation spot in the X-direction is equal to the scanning pitch. The electron lens 8 is controlled by transmitting a focus control signal so that the point of equalization) is located, and the Y amplified according to the sample tilt angle signal detected by the tilt angle detector 4 is transmitted.
A direction scanning signal is superimposed on the focus control signal, and the focus position is moved in accordance with the sample tilt angle signal in conjunction with the Y direction scanning signal. 9 is an astigmatism correction circuit which applies a convergence strength adjustment signal corresponding to the sample tilt signal to the astigmatism correction coil 11;
By adjusting the convergence intensity in the Y direction, the length of the irradiation spot in the Y direction is changed according to the sample tilt signal, so that the electron beam irradiation spot P that irradiates the sample surface is constantly made into a perfect circle. .

〈発明の効果) 本発明によれば、試料の傾斜角度に対応して、電子ビー
ムの焦点距離及びビーム形状を調整し、試料面に常時同
じ円形の電子ビームを照射できるようになったことによ
り、試料角度に対する電子ビームの走査制御の調整操作
が容易になると共に、表示画面の歪みやぼけがなくなり
、分解能が一段と向上した。
<Effects of the Invention> According to the present invention, the focal length and beam shape of the electron beam can be adjusted in accordance with the inclination angle of the sample, and the sample surface can always be irradiated with the same circular electron beam. This made it easier to adjust the scanning control of the electron beam relative to the sample angle, eliminating distortion and blurring of the display screen, and further improving resolution.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例の構成図、第2図は電子ビー
ムのX方向の走査説明図である。 S・・・試料、1・・・回折電子検出器、2・・・2次
電子検出器、3・・・CRT、4・・・傾斜角度検出器
、5m倍率調整回路、6・・・走査コイル、7・・・焦
点調整回路、8・・・電子レンズ、9・・・非点補正回
路、10・・・走査信号発生器、11・・・非点補正コ
イル。
FIG. 1 is a configuration diagram of an embodiment of the present invention, and FIG. 2 is an explanatory diagram of scanning of an electron beam in the X direction. S... Sample, 1... Diffraction electron detector, 2... Secondary electron detector, 3... CRT, 4... Tilt angle detector, 5m magnification adjustment circuit, 6... Scanning Coil, 7... Focus adjustment circuit, 8... Electronic lens, 9... Astigmatism correction circuit, 10... Scanning signal generator, 11... Astigmatism correction coil.

Claims (1)

【特許請求の範囲】[Claims]  試料面の傾斜角度を検出する傾斜角度検出手段と、上
記傾斜角度検出手段からの試料傾斜信号に応じてX方向
とY方向の走査量の比を調整する調整手段と、Y方向の
走査信号に連動し上記傾斜角度検出手段からの試料傾斜
信号に応じて電子レンズの収束強度を制御する手段と、
上記試料傾斜信号に応じて非点補正コイルX、Y方向の
収束強度を制御する非点補正手段とを設けたことを特徴
とする走査型反射回折電子顕微鏡。
an inclination angle detection means for detecting the inclination angle of the sample surface; an adjustment means for adjusting the ratio of the scanning amount in the X direction and the Y direction according to the sample inclination signal from the inclination angle detection means; means for controlling the convergence strength of the electron lens in accordance with the sample tilt signal from the tilt angle detection means;
A scanning reflection diffraction electron microscope characterized in that it is provided with astigmatism correction means for controlling convergence strength in the X and Y directions of the astigmatism correction coil in accordance with the sample tilt signal.
JP1072078A 1989-03-24 1989-03-24 Scanning reflection diffraction electron microscope Expired - Lifetime JP2737220B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1072078A JP2737220B2 (en) 1989-03-24 1989-03-24 Scanning reflection diffraction electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1072078A JP2737220B2 (en) 1989-03-24 1989-03-24 Scanning reflection diffraction electron microscope

Publications (2)

Publication Number Publication Date
JPH02250252A true JPH02250252A (en) 1990-10-08
JP2737220B2 JP2737220B2 (en) 1998-04-08

Family

ID=13479014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1072078A Expired - Lifetime JP2737220B2 (en) 1989-03-24 1989-03-24 Scanning reflection diffraction electron microscope

Country Status (1)

Country Link
JP (1) JP2737220B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2000016372A1 (en) * 1998-09-11 2000-03-23 Japan Science And Technology Corporation High energy electron diffraction apparatus
KR100384727B1 (en) * 1994-12-28 2003-08-14 가부시끼가이샤 히다치 세이사꾸쇼 Scanning electron microscope and sample observation method using it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100384727B1 (en) * 1994-12-28 2003-08-14 가부시끼가이샤 히다치 세이사꾸쇼 Scanning electron microscope and sample observation method using it
WO2000016372A1 (en) * 1998-09-11 2000-03-23 Japan Science And Technology Corporation High energy electron diffraction apparatus
US6677581B1 (en) 1998-09-11 2004-01-13 Japan Science And Technology Corporation High energy electron diffraction apparatus

Also Published As

Publication number Publication date
JP2737220B2 (en) 1998-04-08

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