JPH02250253A - Charged particle drawing device for thin film specimen and thin film specimen fixing jig - Google Patents
Charged particle drawing device for thin film specimen and thin film specimen fixing jigInfo
- Publication number
- JPH02250253A JPH02250253A JP1072119A JP7211989A JPH02250253A JP H02250253 A JPH02250253 A JP H02250253A JP 1072119 A JP1072119 A JP 1072119A JP 7211989 A JP7211989 A JP 7211989A JP H02250253 A JPH02250253 A JP H02250253A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- sample
- fixing jig
- charged particle
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims description 37
- 239000002245 particle Substances 0.000 title claims description 18
- 238000001514 detection method Methods 0.000 claims description 11
- 230000005540 biological transmission Effects 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 3
- 238000011109 contamination Methods 0.000 abstract description 2
- 238000001459 lithography Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012790 confirmation Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はＸ線マスク及び半導体薄膜デバイス等の薄膜試
料にパターンを描画する装置及びこの装置に用いる薄膜
試料固定治具に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for drawing patterns on thin film samples such as X-ray masks and semiconductor thin film devices, and a thin film sample fixing jig used in this apparatus.
従来、試料にパターンを描画するときには厚膜状態でパ
ターン描画し、該工程後、真空系外に試料を取り出し、
別工程としてこれを薄膜化するか、真空排気に充分耐え
る強度の薄膜試料を用いており、特に予備排気時におけ
る薄膜破損の有無の確認は行っていなかった。Conventionally, when drawing a pattern on a sample, the pattern is drawn in a thick film state, and after the process, the sample is taken out of the vacuum system.
This was either made into a thin film as a separate process, or a thin film sample strong enough to withstand vacuum evacuation was used, and the presence or absence of damage to the thin film during preliminary evacuation was not specifically checked.
上述した従来のパターン描画に用いる荷電粒子描画装置
及び試料固定治具には薄膜試料描画について特段の考慮
はなされておらず、また、描画装置の真空作業室前段の
予備排気室における真空排気時に薄膜が破損しても特に
これを検知する手段はなかった。そのため、破損した薄
膜が描画装置の真空作業室に入ると重大な被害を生じる
ことがあり、この危険の可能性のため前述の荷電粒子描
画装置は事実上薄膜試料の描画には用いられていなかっ
た。The charged particle drawing device and sample fixing jig used in the conventional pattern drawing described above do not have any special consideration for drawing a thin film sample, and the thin film is Even if it were damaged, there was no way to detect it. Therefore, if a damaged thin film enters the vacuum working chamber of the lithography system, it may cause serious damage, and due to the possibility of this danger, the charged particle lithography system described above is virtually not used for lithography of thin film samples. Ta.
本発明の目的は上記課題を解消して薄膜試料の描画を実
現した荷電粒子描画装置及び試料固定治具を提供するこ
とにある。An object of the present invention is to provide a charged particle drawing device and a sample fixing jig that solve the above-mentioned problems and realize drawing of a thin film sample.
上記目的を達成するため１本発明による薄膜試料用荷電
粒子描画装置は、試料を収容する真空作業室と、試料上
に荷電粒子ビームを照射する荷電粒子描画鏡筒と、真空
作業室内への試料の搬入に先立って試料を待機させる予
備排気室とを有する荷電粒子描画装置において、前記予
備排気室内に。In order to achieve the above objects, the charged particle drawing apparatus for thin film samples according to the present invention includes a vacuum working chamber that accommodates a sample, a charged particle drawing lens barrel that irradiates a charged particle beam onto the sample, and a charged particle drawing apparatus for thin film samples that contains a sample in the vacuum working chamber. In a charged particle drawing apparatus having a preliminary evacuation chamber in which a sample is placed on standby prior to being carried in, the charged particle lithography apparatus includes a pre-evacuation chamber in which a sample is placed on standby before being carried into the pre-evacuation chamber.
薄膜試料の薄膜の有無を無接触で確認検知する試料検知
装置を装備したものである。It is equipped with a sample detection device that detects the presence or absence of a thin film in a thin film sample without contact.
また、前記荷電粒子の描画装置の薄膜試料固定治具にお
いては、前記予備排気室内に設置された試料検知装置か
ら発した光線を通過させる透過孔を、前記薄膜試料に対
向する固定用治具の基板面に開口したものである。Further, in the thin film sample fixing jig of the charged particle drawing device, a transmission hole through which the light beam emitted from the sample detection device installed in the preliminary exhaust chamber passes is formed in the fixing jig facing the thin film sample. It has an opening on the substrate surface.
以下に本発明の実施例を図によって説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図において、１は電子銃、電磁光学系、ビーム偏向
器などを備えた公知の荷電粒子描画鏡筒である。該鏡筒
１内に生じさせた荷電ビームはその直下の真空作業室２
内に出射し、Ｘ、Ｙテーブル３上に搬入された試料４上
に荷電ビームによるパターンの描写が行われる。真空作
業室２の前段には予備排気室５を有している。In FIG. 1, reference numeral 1 denotes a known charged particle drawing lens barrel equipped with an electron gun, an electromagnetic optical system, a beam deflector, and the like. The charged beam generated in the lens barrel 1 is sent to the vacuum working chamber 2 directly below it.
A pattern is drawn on the sample 4 carried onto the X, Y table 3 by the charged beam. A pre-evacuation chamber 5 is provided upstream of the vacuum work chamber 2.
試料４は固定治具６に搭載され、予備排気室５内に搬入
後、該室５内は脱気される。第１図中、７は真空作業室
２と予備排気室５間を隔離するシャッターである。以上
の構成は従来の荷電粒子描画装置と同じである。本発明
は前記予備排気室５内に、搬入された試料４の有無を確
認検知する手段を装備したものである。The sample 4 is mounted on a fixture 6, and after being carried into the preliminary evacuation chamber 5, the interior of the chamber 5 is evacuated. In FIG. 1, 7 is a shutter that isolates the vacuum working chamber 2 and the preliminary evacuation chamber 5. The above configuration is the same as a conventional charged particle drawing device. In the present invention, the preliminary evacuation chamber 5 is equipped with means for confirming and detecting the presence or absence of the sample 4 carried therein.
実施例は光学的に検知確認する試料検知装置８を用いた
例を示す。第１図において、９は光源、１．０は光検出
器である。光源９と光検出器１０とは固定治具６の搬入
位置の上方で、垂直軸に対し、定角度をなして対称位置
に設置されている。したがって、予備排気室５内に搬入
された固定治具６に薄膜試料４がセットされていれば、
光源９よす発した光は薄膜試料４の面上で反射し、その
反射光が光検出器１．０に受光され、光検出器１０から
の出力の有無を検知することによって薄膜試料４の有無
を確認検知することができる。The embodiment shows an example using a sample detection device 8 that performs optical detection and confirmation. In FIG. 1, 9 is a light source and 1.0 is a photodetector. The light source 9 and the photodetector 10 are installed at symmetrical positions above the loading position of the fixture 6 and at a constant angle with respect to the vertical axis. Therefore, if the thin film sample 4 is set on the fixture 6 carried into the preliminary evacuation chamber 5,
The light emitted from the light source 9 is reflected on the surface of the thin film sample 4, and the reflected light is received by the photodetector 1.0. By detecting the presence or absence of the output from the photodetector 10, the thin film sample 4 is detected. The presence or absence can be detected.
第２図に試料検知装置の他の実施例を示す１本実施例は
試料の透過光を検知する方式の検知装置を用いた例であ
る。第２図において、予備排気室５内の上部には固定治
具６の搬入位置に対応して複数の光源９が設置され、各
光源９に向き合せて下部に光検出器１０をそれぞれ設置
したものである。FIG. 2 shows another embodiment of the sample detection device. This embodiment is an example using a detection device of a type that detects light transmitted through a sample. In FIG. 2, a plurality of light sources 9 were installed at the upper part of the preliminary exhaust chamber 5 in correspondence with the loading position of the fixing jig 6, and a photodetector 10 was installed at the lower part facing each light source 9. It is something.
また、固定治具６の底面の基板６ａには、各光源９と光
検出［１１０間の光軸に対応して透過孔１１が開口され
ている。なお、予備排気室５には、その底部の両端及び
固定治具６を搬入する中央部位に真空排気ロ又′−１±
大気流入口１２が開口されており、前記透過孔１１は固
定治具６内を通しての排気及び流入空気の通過孔にもな
っている。Further, in the substrate 6a on the bottom surface of the fixing jig 6, transmission holes 11 are opened corresponding to the optical axes between each light source 9 and the photodetector [110]. The preliminary evacuation chamber 5 has vacuum evacuation holes at both ends of its bottom and at the center where the fixing jig 6 is carried.
An air inlet 12 is opened, and the permeation hole 11 also serves as a passage hole for exhaust and inflow air through the fixing jig 6.
本実施例によれば、予備排気室５内に搬入された固定治
具６上に薄膜試料４が搭載されていれば。According to this embodiment, if the thin film sample 4 is mounted on the fixing jig 6 carried into the preliminary evacuation chamber 5.
光源９から出射した光は薄膜試料４のＷＩＩＸＫを通し
て光検出器１０に受光され、薄膜試料４を通過した光の
強度が減するため、光検出器ｌＯに受光した光の強度を
測定することによって薄膜試料４の有無を検知できる。The light emitted from the light source 9 is received by the photodetector 10 through WIIXK of the thin film sample 4, and since the intensity of the light passing through the thin film sample 4 decreases, by measuring the intensity of the light received by the photodetector lO, The presence or absence of the thin film sample 4 can be detected.
以上いずれの実施例においても試料の有無を無接触で光
学的に検知するため、試料を傷付けることがなく、また
、試料薄膜の厚味に無関係に検出できる。なお、試料検
知装置は無接触で検知できるものであれば必ずしも光学
的に検知する場合に限らない。In any of the above embodiments, since the presence or absence of a sample is optically detected without contact, the sample is not damaged and can be detected regardless of the thickness of the sample thin film. Note that the sample detection device is not necessarily limited to optical detection as long as it can detect without contact.
〔発明の効果〕
以上のように本発明によるときには予備排気室内で真空
作業室への搬入に先立って固定治具上の試料の有無、ひ
いては薄膜試料の薄膜敲損の有無の確認、検知が可能と
なり、描画装置の真空作業室内への破損した試料の持ち
込みを防止して真空作業室内の汚染、事故発生を未然に
阻止することができる効果を有する。[Effects of the Invention] As described above, according to the present invention, it is possible to check and detect the presence or absence of a sample on a fixing jig in the pre-evacuation chamber and, further, the presence or absence of thin film damage on a thin film sample before transporting it to a vacuum work chamber. This has the effect of preventing damaged samples from being brought into the vacuum working chamber of the lithography apparatus, thereby preventing contamination and accidents within the vacuum working chamber.
第１図は本発明の一実施例を示す断面略示図。
第２図は固定用治具の他の実施例を示す要部拡大断面図
である。
１・・・荷電粒子描画鏡筒 ２・・・真空作業室４・
・・薄膜試料 ５・・・予備排気室６・・・
固定治具 ８・・・試料検知装置９１１．光
源 １０・・・光検出器１１・・・透過
孔FIG. 1 is a schematic cross-sectional view showing one embodiment of the present invention. FIG. 2 is an enlarged sectional view of a main part showing another embodiment of the fixing jig. 1... Charged particle drawing lens barrel 2... Vacuum work chamber 4.
...Thin film sample 5...Preliminary exhaust chamber 6...
Fixing jig 8...Sample detection device 911. Light source 10... Photodetector 11... Transmission hole
Claims (2)
ビームを照射する荷電粒子描画鏡筒と、真空作業室内へ
の試料の搬入に先立って試料を待機させる予備排気室と
を有する荷電粒子描画装置において、前記予備排気室内
に、薄膜試料の薄膜の有無を無接触で確認検知する試料
検知装置を装備したことを特徴とする薄膜試料用荷電粒
子描画装置。(1) A charging system that has a vacuum work chamber that accommodates a sample, a charged particle drawing lens barrel that irradiates a charged particle beam onto the sample, and a preliminary evacuation chamber that waits for the sample before carrying it into the vacuum work chamber. A charged particle drawing apparatus for a thin film sample, characterized in that the preliminary exhaust chamber is equipped with a sample detection device for confirming and detecting the presence or absence of a thin film on a thin film sample without contact.
記予備排気室内に設置された試料検知装置から発した光
線を通過させる透過孔を、前記薄膜試料に対向する固定
用治具の基板面に開口したことを特徴とする請求項（１
）に記載の薄膜試料用荷電粒子描画装置の薄膜試料固定
治具。(2) In the fixing jig on which the thin film sample is mounted, a transmission hole through which the light beam emitted from the sample detection device installed in the preliminary exhaust chamber passes is formed on the substrate surface of the fixing jig facing the thin film sample. Claim (1) characterized in that it opens to
) A thin film sample fixing jig for a charged particle drawing device for thin film samples.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1072119A JPH02250253A (en) | 1989-03-23 | 1989-03-23 | Charged particle drawing device for thin film specimen and thin film specimen fixing jig |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1072119A JPH02250253A (en) | 1989-03-23 | 1989-03-23 | Charged particle drawing device for thin film specimen and thin film specimen fixing jig |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02250253A true JPH02250253A (en) | 1990-10-08 |
Family
ID=13480145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1072119A Pending JPH02250253A (en) | 1989-03-23 | 1989-03-23 | Charged particle drawing device for thin film specimen and thin film specimen fixing jig |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02250253A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009025316A (en) * | 2008-09-30 | 2009-02-05 | Terumo Corp | Component measuring device |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57136320A (en) * | 1981-02-17 | 1982-08-23 | Toshiba Corp | Exchanger for sample in electron-ray drawing device |
-
1989
- 1989-03-23 JP JP1072119A patent/JPH02250253A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57136320A (en) * | 1981-02-17 | 1982-08-23 | Toshiba Corp | Exchanger for sample in electron-ray drawing device |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009025316A (en) * | 2008-09-30 | 2009-02-05 | Terumo Corp | Component measuring device |
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