JPH022544A - Silver halide photographic sensitive material - Google Patents
Silver halide photographic sensitive materialInfo
- Publication number
- JPH022544A JPH022544A JP14948688A JP14948688A JPH022544A JP H022544 A JPH022544 A JP H022544A JP 14948688 A JP14948688 A JP 14948688A JP 14948688 A JP14948688 A JP 14948688A JP H022544 A JPH022544 A JP H022544A
- Authority
- JP
- Japan
- Prior art keywords
- group
- tetrazolium
- silver halide
- layer
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 99
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 52
- 239000004332 silver Substances 0.000 title claims abstract description 52
- 239000000463 material Substances 0.000 title claims abstract description 39
- 239000000839 emulsion Substances 0.000 claims abstract description 25
- 239000000084 colloidal system Substances 0.000 claims abstract description 23
- 150000001450 anions Chemical group 0.000 claims abstract description 17
- 150000001768 cations Chemical group 0.000 claims abstract description 10
- 229910052717 sulfur Inorganic materials 0.000 claims description 14
- 125000004434 sulfur atom Chemical group 0.000 claims description 12
- 125000003831 tetrazolyl group Chemical group 0.000 abstract description 9
- 239000010410 layer Substances 0.000 description 34
- 108010010803 Gelatin Proteins 0.000 description 19
- 239000008273 gelatin Substances 0.000 description 19
- 229920000159 gelatin Polymers 0.000 description 19
- 235000019322 gelatine Nutrition 0.000 description 19
- 235000011852 gelatine desserts Nutrition 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 16
- 239000011248 coating agent Substances 0.000 description 14
- 238000000576 coating method Methods 0.000 description 14
- 150000001875 compounds Chemical group 0.000 description 12
- 230000001681 protective effect Effects 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 9
- 239000000203 mixture Substances 0.000 description 9
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- 125000000217 alkyl group Chemical group 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 238000011161 development Methods 0.000 description 7
- 239000002245 particle Substances 0.000 description 7
- 238000012545 processing Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 6
- 125000003118 aryl group Chemical group 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 5
- 229910021607 Silver chloride Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 4
- 239000000975 dye Substances 0.000 description 4
- 125000000623 heterocyclic group Chemical group 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 125000001424 substituent group Chemical group 0.000 description 4
- ZNVBVIZZKGKHRB-UHFFFAOYSA-N 2-(5-dodecyl-3-phenyl-1H-tetrazol-2-yl)-1,3-benzothiazole Chemical compound N=1C2=CC=CC=C2SC=1N1NC(CCCCCCCCCCCC)=NN1C1=CC=CC=C1 ZNVBVIZZKGKHRB-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 238000009501 film coating Methods 0.000 description 3
- 150000004820 halides Chemical class 0.000 description 3
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 3
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 3
- 235000019252 potassium sulphite Nutrition 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 229930182490 saponin Natural products 0.000 description 3
- 150000007949 saponins Chemical class 0.000 description 3
- 235000017709 saponins Nutrition 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002562 thickening agent Substances 0.000 description 3
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 3
- WFTGTFCWWWPJAF-UHFFFAOYSA-N 1-(2,3-diphenyl-1H-tetrazol-5-yl)ethanone Chemical compound N1C(C(=O)C)=NN(C=2C=CC=CC=2)N1C1=CC=CC=C1 WFTGTFCWWWPJAF-UHFFFAOYSA-N 0.000 description 2
- XXWAHKICOZTQOW-UHFFFAOYSA-N 1-[2,3-bis(4-ethoxyphenyl)-1H-tetrazol-5-yl]ethanone Chemical compound C1=CC(OCC)=CC=C1N1N(C=2C=CC(OCC)=CC=2)N=C(C(C)=O)N1 XXWAHKICOZTQOW-UHFFFAOYSA-N 0.000 description 2
- FJMPZWOQMLJCRS-UHFFFAOYSA-N 2,3-diphenyl-1h-tetrazole-5-carbonitrile Chemical compound N1C(C#N)=NN(C=2C=CC=CC=2)N1C1=CC=CC=C1 FJMPZWOQMLJCRS-UHFFFAOYSA-N 0.000 description 2
- RAECFAXTJBDZOD-UHFFFAOYSA-N 2-[5-(2-chlorophenyl)-3-phenyl-1H-tetrazol-2-yl]-1,3-benzothiazole Chemical compound ClC1=CC=CC=C1C1=NN(C=2C=CC=CC=2)N(C=2SC3=CC=CC=C3N=2)N1 RAECFAXTJBDZOD-UHFFFAOYSA-N 0.000 description 2
- FQYLAHZWZVBJMI-UHFFFAOYSA-N 2-[5-(4-chlorophenyl)-3-(4-nitrophenyl)-1H-tetrazol-2-yl]-1,3-benzothiazole Chemical compound C1=CC([N+](=O)[O-])=CC=C1N1N(C=2SC3=CC=CC=C3N=2)NC(C=2C=CC(Cl)=CC=2)=N1 FQYLAHZWZVBJMI-UHFFFAOYSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- XKAKMCNHHNUUGN-UHFFFAOYSA-N 4-(5-methyl-3-phenyl-1H-tetrazol-2-yl)phenol Chemical compound N1C(C)=NN(C=2C=CC=CC=2)N1C1=CC=C(O)C=C1 XKAKMCNHHNUUGN-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- CLBBPIXTSBIWOX-UHFFFAOYSA-N C1=CC(CC)=CC=C1N1N(C=2C=CC(CC)=CC=2)N=C(C=2C=CC(CC)=CC=2)N1 Chemical compound C1=CC(CC)=CC=C1N1N(C=2C=CC(CC)=CC=2)N=C(C=2C=CC(CC)=CC=2)N1 CLBBPIXTSBIWOX-UHFFFAOYSA-N 0.000 description 2
- DFQVGTFDFGVTGK-KVVVOXFISA-M ClC(C(=O)[O-])CCCCCC\C=C/CCCCCCCC.[K+] Chemical compound ClC(C(=O)[O-])CCCCCC\C=C/CCCCCCCC.[K+] DFQVGTFDFGVTGK-KVVVOXFISA-M 0.000 description 2
- ZGTMUACCHSMWAC-UHFFFAOYSA-L EDTA disodium salt (anhydrous) Chemical compound [Na+].[Na+].OC(=O)CN(CC([O-])=O)CCN(CC(O)=O)CC([O-])=O ZGTMUACCHSMWAC-UHFFFAOYSA-L 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical group [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 2
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 239000012752 auxiliary agent Substances 0.000 description 2
- 229920002301 cellulose acetate Polymers 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- GXNZYSHGDTVEFI-UHFFFAOYSA-N ethyl 2,3-bis(3-nitrophenyl)-1H-tetrazole-5-carboxylate Chemical compound N1C(C(=O)OCC)=NN(C=2C=C(C=CC=2)[N+]([O-])=O)N1C1=CC=CC([N+]([O-])=O)=C1 GXNZYSHGDTVEFI-UHFFFAOYSA-N 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 230000007774 longterm Effects 0.000 description 2
- 239000006224 matting agent Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001155 polypropylene Polymers 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 125000000714 pyrimidinyl group Chemical group 0.000 description 2
- 229940079877 pyrogallol Drugs 0.000 description 2
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 2
- 150000003839 salts Chemical class 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
- 125000004417 unsaturated alkyl group Chemical group 0.000 description 2
- NJVOHKFLBKQLIZ-UHFFFAOYSA-N (2-ethenylphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1C=C NJVOHKFLBKQLIZ-UHFFFAOYSA-N 0.000 description 1
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical group C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- RVXJIYJPQXRIEM-UHFFFAOYSA-N 1-$l^{1}-selanyl-n,n-dimethylmethanimidamide Chemical compound CN(C)C([Se])=N RVXJIYJPQXRIEM-UHFFFAOYSA-N 0.000 description 1
- GGZHVNZHFYCSEV-UHFFFAOYSA-N 1-Phenyl-5-mercaptotetrazole Chemical compound SC1=NN=NN1C1=CC=CC=C1 GGZHVNZHFYCSEV-UHFFFAOYSA-N 0.000 description 1
- NXVHEHXRZVQDCR-UHFFFAOYSA-N 1-n,1-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1C NXVHEHXRZVQDCR-UHFFFAOYSA-N 0.000 description 1
- WLDWSGZHNBANIO-UHFFFAOYSA-N 2',5'-Dihydroxyacetophenone Chemical compound CC(=O)C1=CC(O)=CC=C1O WLDWSGZHNBANIO-UHFFFAOYSA-N 0.000 description 1
- DPKOCFTZJRJTQL-UHFFFAOYSA-N 2,4-diamino-5-methylphenol Chemical compound CC1=CC(O)=C(N)C=C1N DPKOCFTZJRJTQL-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- WFXLRLQSHRNHCE-UHFFFAOYSA-N 2-(4-amino-n-ethylanilino)ethanol Chemical compound OCCN(CC)C1=CC=C(N)C=C1 WFXLRLQSHRNHCE-UHFFFAOYSA-N 0.000 description 1
- HIGSPBFIOSHWQG-UHFFFAOYSA-N 2-Isopropyl-1,4-benzenediol Chemical compound CC(C)C1=CC(O)=CC=C1O HIGSPBFIOSHWQG-UHFFFAOYSA-N 0.000 description 1
- XQHGAEQBYRZJIX-UHFFFAOYSA-N 2-amino-4-chloro-6-phenylphenol Chemical compound NC1=CC(Cl)=CC(C=2C=CC=CC=2)=C1O XQHGAEQBYRZJIX-UHFFFAOYSA-N 0.000 description 1
- LGXONQNQFVDTOL-UHFFFAOYSA-N 2-amino-5-(dimethylamino)phenol Chemical compound CN(C)C1=CC=C(N)C(O)=C1 LGXONQNQFVDTOL-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- ZGJUJDQANIYVAL-UHFFFAOYSA-N 2-methyl-4-morpholin-4-ylaniline Chemical compound C1=C(N)C(C)=CC(N2CCOCC2)=C1 ZGJUJDQANIYVAL-UHFFFAOYSA-N 0.000 description 1
- OVOZYARDXPHRDL-UHFFFAOYSA-N 3,4-diaminophenol Chemical compound NC1=CC=C(O)C=C1N OVOZYARDXPHRDL-UHFFFAOYSA-N 0.000 description 1
- KMFMGDTYKKZYSE-UHFFFAOYSA-N 4,5-dihydro-1h-pyrazol-3-amine Chemical compound NC1=NNCC1 KMFMGDTYKKZYSE-UHFFFAOYSA-N 0.000 description 1
- SOVXTYUYJRFSOG-UHFFFAOYSA-N 4-(2-hydroxyethylamino)phenol Chemical compound OCCNC1=CC=C(O)C=C1 SOVXTYUYJRFSOG-UHFFFAOYSA-N 0.000 description 1
- ODWZWRYCMIZFNP-UHFFFAOYSA-N 4-(4-amino-n-butylanilino)butane-2-sulfonic acid Chemical compound OS(=O)(=O)C(C)CCN(CCCC)C1=CC=C(N)C=C1 ODWZWRYCMIZFNP-UHFFFAOYSA-N 0.000 description 1
- OUIITAOCYATDMY-UHFFFAOYSA-N 4-amino-2-phenylphenol Chemical compound NC1=CC=C(O)C(C=2C=CC=CC=2)=C1 OUIITAOCYATDMY-UHFFFAOYSA-N 0.000 description 1
- IOTZAKSXYYYPKL-UHFFFAOYSA-N 4-amino-5-methyl-2-phenyl-4h-pyrazol-3-one Chemical compound O=C1C(N)C(C)=NN1C1=CC=CC=C1 IOTZAKSXYYYPKL-UHFFFAOYSA-N 0.000 description 1
- XSFKCGABINPZRK-UHFFFAOYSA-N 4-aminopyrazol-3-one Chemical class NC1=CN=NC1=O XSFKCGABINPZRK-UHFFFAOYSA-N 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- ZFIQGRISGKSVAG-UHFFFAOYSA-N 4-methylaminophenol Chemical compound CNC1=CC=C(O)C=C1 ZFIQGRISGKSVAG-UHFFFAOYSA-N 0.000 description 1
- FFAJEKUNEVVYCW-UHFFFAOYSA-N 4-n-ethyl-4-n-(2-methoxyethyl)-2-methylbenzene-1,4-diamine Chemical compound COCCN(CC)C1=CC=C(N)C(C)=C1 FFAJEKUNEVVYCW-UHFFFAOYSA-N 0.000 description 1
- URAARCWOADCWLA-UHFFFAOYSA-N 4-pyrrolidin-1-ylaniline Chemical compound C1=CC(N)=CC=C1N1CCCC1 URAARCWOADCWLA-UHFFFAOYSA-N 0.000 description 1
- BISHACNKZIBDFM-UHFFFAOYSA-N 5-amino-1h-pyrimidine-2,4-dione Chemical compound NC1=CNC(=O)NC1=O BISHACNKZIBDFM-UHFFFAOYSA-N 0.000 description 1
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- 102000009027 Albumins Human genes 0.000 description 1
- 108010088751 Albumins Proteins 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- RZEPYZSVCXMAHT-UHFFFAOYSA-N C1=CC(OCCOCCO)=CC=C1N1N(C=2C=CC(OCCOCCO)=CC=2)N=C(C=2C=CC(OCCOCCO)=CC=2)N1 Chemical compound C1=CC(OCCOCCO)=CC=C1N1N(C=2C=CC(OCCOCCO)=CC=2)N=C(C=2C=CC(OCCOCCO)=CC=2)N1 RZEPYZSVCXMAHT-UHFFFAOYSA-N 0.000 description 1
- WBXBJBYZEHDWJZ-UHFFFAOYSA-N C=1C=C(N2N(N=C(N2)C=2C=CC(CC=3C=CC=CC=3)=CC=2)C=2C=CC(CC=3C=CC=CC=3)=CC=2)C=CC=1CC1=CC=CC=C1 Chemical compound C=1C=C(N2N(N=C(N2)C=2C=CC(CC=3C=CC=CC=3)=CC=2)C=2C=CC(CC=3C=CC=CC=3)=CC=2)C=CC=1CC1=CC=CC=C1 WBXBJBYZEHDWJZ-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PQUCIEFHOVEZAU-UHFFFAOYSA-N Diammonium sulfite Chemical compound [NH4+].[NH4+].[O-]S([O-])=O PQUCIEFHOVEZAU-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- SXRSQZLOMIGNAQ-UHFFFAOYSA-N Glutaraldehyde Chemical compound O=CCCCC=O SXRSQZLOMIGNAQ-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WRUZLCLJULHLEY-UHFFFAOYSA-N N-(p-hydroxyphenyl)glycine Chemical compound OC(=O)CNC1=CC=C(O)C=C1 WRUZLCLJULHLEY-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 description 1
- XEIPQVVAVOUIOP-UHFFFAOYSA-N [Au]=S Chemical compound [Au]=S XEIPQVVAVOUIOP-UHFFFAOYSA-N 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000004480 active ingredient Substances 0.000 description 1
- 239000008272 agar Substances 0.000 description 1
- 235000010419 agar Nutrition 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000000783 alginic acid Substances 0.000 description 1
- 235000010443 alginic acid Nutrition 0.000 description 1
- 229920000615 alginic acid Polymers 0.000 description 1
- 229960001126 alginic acid Drugs 0.000 description 1
- 150000004781 alginic acids Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 description 1
- 125000005907 alkyl ester group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- HTKFORQRBXIQHD-UHFFFAOYSA-N allylthiourea Chemical compound NC(=S)NCC=C HTKFORQRBXIQHD-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- YKOQAAJBYBTSBS-UHFFFAOYSA-N biphenyl-2,3-diol Chemical compound OC1=CC=CC(C=2C=CC=CC=2)=C1O YKOQAAJBYBTSBS-UHFFFAOYSA-N 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 150000003841 chloride salts Chemical class 0.000 description 1
- NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000012792 core layer Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- AXDDJHKBOYNJPY-UHFFFAOYSA-L dipotassium;carboxylato carbonate Chemical compound [K+].[K+].[O-]C(=O)OC([O-])=O AXDDJHKBOYNJPY-UHFFFAOYSA-L 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 1
- 125000000031 ethylamino group Chemical group [H]C([H])([H])C([H])([H])N([H])[*] 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229960002449 glycine Drugs 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 238000005658 halogenation reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 125000004464 hydroxyphenyl group Chemical group 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 125000001288 lysyl group Chemical group 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NPKFETRYYSUTEC-UHFFFAOYSA-N n-[2-(4-amino-n-ethyl-3-methylanilino)ethyl]methanesulfonamide Chemical compound CS(=O)(=O)NCCN(CC)C1=CC=C(N)C(C)=C1 NPKFETRYYSUTEC-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 125000000913 palmityl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- LVTJOONKWUXEFR-FZRMHRINSA-N protoneodioscin Natural products O(C[C@@H](CC[C@]1(O)[C@H](C)[C@@H]2[C@]3(C)[C@H]([C@H]4[C@@H]([C@]5(C)C(=CC4)C[C@@H](O[C@@H]4[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@@H](O)[C@H](O[C@H]6[C@@H](O)[C@@H](O)[C@@H](O)[C@H](C)O6)[C@H](CO)O4)CC5)CC3)C[C@@H]2O1)C)[C@H]1[C@H](O)[C@H](O)[C@H](O)[C@@H](CO)O1 LVTJOONKWUXEFR-FZRMHRINSA-N 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- IYKVLICPFCEZOF-UHFFFAOYSA-N selenourea Chemical compound NC(N)=[Se] IYKVLICPFCEZOF-UHFFFAOYSA-N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 125000001273 sulfonato group Chemical group [O-]S(*)(=O)=O 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 150000003536 tetrazoles Chemical group 0.000 description 1
- 125000000335 thiazolyl group Chemical group 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- 125000001425 triazolyl group Chemical group 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/08—Sensitivity-increasing substances
- G03C1/09—Noble metals or mercury; Salts or compounds thereof; Sulfur, selenium or tellurium, or compounds thereof, e.g. for chemical sensitising
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/067—Additives for high contrast images, other than hydrazine compounds
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はミハロゲン化銀写真感光材料に関し、更に詳し
くは、安定な現像液によってコントラストが高い画像が
得られ、かつ高温、高湿条件下での保存安定性が改良さ
れtこハロゲン化銀写真感光材料に関する。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a silver mihalide photographic light-sensitive material, and more specifically, it is capable of producing images with high contrast using a stable developer, and is capable of being used under high temperature and high humidity conditions. This invention relates to a silver halide photographic material which has improved storage stability.
最近、ハロゲン化銀写真感光材料を用いる画像処理はエ
レクトロニクスの発達に伴ない、レーザー光や発光ダイ
オードによるハロゲン化銀写真感光材料上でのデジタル
出力としてのとり出し方式が普及しつつある。Recently, in image processing using silver halide photographic materials, with the development of electronics, a method of outputting digital output from the silver halide photographic materials using laser light or light emitting diodes has become popular.
このような画像処理システムを安定に行なうためには、
処理液の安定性を追求するばかりでなく、ハロゲン化銀
写真感光材料の写真性能の安定性をも改良することが強
く要求されている。In order to operate such an image processing system stably,
There is a strong demand not only to improve the stability of processing solutions, but also to improve the stability of the photographic performance of silver halide photographic materials.
すなわち、上記感光材料の長期間の経時安定性、更には
高温、高湿条件下における極めて優れた保存安定性が望
まれる。That is, it is desired that the above-mentioned photosensitive materials have long-term stability over time and further excellent storage stability under high temperature and high humidity conditions.
高いコントラストを得る方法として、従来から比較的微
粒子で粒子径分布が狭く、かつ塩化銀含有率の高い塩臭
化銀乳剤からなる感光材料を亜硫酸塩濃度が非常に小さ
いアルカリハイドロキノン現像液で処理する方法、所謂
リス現像法が知られている。Conventionally, as a method to obtain high contrast, a photosensitive material consisting of a silver chlorobromide emulsion with relatively fine grains, a narrow particle size distribution, and a high silver chloride content is processed with an alkaline hydroquinone developer having a very low sulfite concentration. A method, the so-called Lith development method, is known.
しかし、この方法を用いると現像液中の亜硫酸イオン濃
度が小さい為保恒性が極めて悪く、かつハイドロキノン
単体主薬を用いる為に迅速処理ができないという欠点を
有していた。However, when this method is used, the storage stability is extremely poor because the concentration of sulfite ions in the developer is low, and rapid processing is not possible because hydroquinone is used as a single active ingredient.
保恒性が良好で迅速処理が可能な超加成性現像主薬を含
有し、比較的高濃度の亜硫酸塩を含有する所謂PQ型あ
るいはl1lQ型の現像液による処理によって高いコン
トラストが得られる感光材料としてテトラゾリウム化合
物を支持体上の親水性コロイド層中に含有させ、これを
超加成性型現像液で処理する技術が、例えば特開昭52
−18317号、同53−17719号及び同53−1
7720号に開示されている。A photosensitive material that contains a super-additive developing agent that has good storage stability and can be processed quickly, and that can obtain high contrast by processing with a so-called PQ type or 111Q type developer that contains a relatively high concentration of sulfite. For example, a technique in which a tetrazolium compound is contained in a hydrophilic colloid layer on a support and treated with a superadditive type developer is disclosed in JP-A No. 52, for example.
-18317, 53-17719 and 53-1
No. 7720.
これらの酸化性を有するテトラゾリウム化合物を含有す
る感光材料を超加成性型現像液で処理し、高いコントラ
ストを有する銀画像を得る方法は従来技術に対して極め
て画期的技術である。The method of obtaining a silver image with high contrast by processing a photosensitive material containing these oxidizing tetrazolium compounds with a superadditive type developer is an extremely innovative technology compared to the conventional technology.
しかしながら、上記の如き技術においては、高温、高湿
等の条件下において感度が変動し、またコントラストが
低下するという欠点を有している。However, the above-mentioned techniques have the disadvantage that the sensitivity fluctuates under conditions such as high temperature and high humidity, and the contrast decreases.
更に、交線スクリーン又はコンタクトスクリーンを介し
て原稿の撮影を行う場合、特に高いコントラストを要求
されるが、前記技術は必ずしも十分満足なコントラスト
が得られないため、その改良が望まれていた。Further, when photographing a document through an intersection screen or a contact screen, particularly high contrast is required, and since the above-mentioned techniques do not always provide a sufficiently satisfactory contrast, improvements have been desired.
本発明の目的は、第1に自動酸化を受は難い保恒性の良
好な安定な現像液を用いて処理しても充分に高いコント
ラストを有する画像が得られるノ翫ロゲン化銀写真感光
材料を提供することにあり、その第2は画像が高コント
ラストであると同時に高温、高湿条件下においても安定
な7%ロゲン化銀写真感光材料を提供することにある。The object of the present invention is, firstly, to produce a silver halide photographic light-sensitive material that can produce images with sufficiently high contrast even when processed using a stable developer that is resistant to autooxidation and has good storage stability. The second objective is to provide a 7% silver halide photographic material that has high contrast images and is stable even under high temperature and high humidity conditions.
上記本発明の目的は、支持体の少なくとも1面に、少な
くとも1層の親水性コロイド層()10ゲン化銀乳剤層
を含む)を塗設してなる/Xロゲン化銀写真感光材料に
おいて、前記親水性コロイド層中にアニオン部及びカチ
オン部からなるテトラゾリウム化合物を含有し、かつ該
テトラゾリウム化合物のアニオン部が硫黄原子化されて
いるノ\ロゲン化銀写真感光材料により達成することが
できる。The object of the present invention is to provide a silver halide photographic material comprising at least one hydrophilic colloid layer (including a silver halide emulsion layer) coated on at least one side of a support. This can be achieved by using a silver halide photographic light-sensitive material in which the hydrophilic colloid layer contains a tetrazolium compound consisting of an anion part and a cation part, and the anion part of the tetrazolium compound is converted into a sulfur atom.
但しスルホン酸基の硫黄原子は本発明の硫黄原子に当ら
ない。However, the sulfur atom of the sulfonic acid group does not correspond to the sulfur atom of the present invention.
以下、本発明を更に詳細1こ説明する。Hereinafter, the present invention will be explained in more detail.
本発明は、支持体上に塗設されI;少なくとも1層の親
水性コロイド層中に、アニオン部力(硫黄イヒされたテ
トラゾリウム化合物を含有せしめtこことを特徴とする
が、上記テトラゾリウム化合物【±下記一般式CI)、
(I[)又は(III)で示すこと力(できる。The present invention is characterized in that a tetrazolium compound coated on a support and at least one hydrophilic colloid layer contains an anionic (sulfur-absorbed) tetrazolium compound; ±the following general formula CI),
(I[) or (III) shows the power (can be done).
一般式(In)
式中、R+、Rs、R4,Rs、Rs、Re、R+a及
びR11は、それぞれアルキル基(例えばメチル基、二
qル基、プロピル基、ドデシル基等)、アルケニル基(
例えばビニル基、アリル基、プロペニル基等)、アリー
ル基(例えばフェニル基、トリル基、ヒドロキシフェニ
ル基、カルボキシフェニル基、アミノフェニル基、メル
カプトフェニル基、α−ナフチル基、β−す7チル基、
ヒドロキシナフチル基カルボキシナフチル基、アミノナ
フチル基等)、及び複素環基(例えばチアゾリル基、ペ
ンゾチγゾリル基、オキサシリル基、ピリミジニル基、
(゛リジル基等)から選ばれる基を表し、これらはいず
れも金属キレートあるいは錯体を形成するよ)な基でも
よい。General formula (In) In the formula, R+, Rs, R4, Rs, Rs, Re, R+a and R11 each represent an alkyl group (for example, a methyl group, a diqyl group, a propyl group, a dodecyl group, etc.), an alkenyl group (
(e.g. vinyl group, allyl group, propenyl group, etc.), aryl group (e.g. phenyl group, tolyl group, hydroxyphenyl group, carboxyphenyl group, aminophenyl group, mercaptophenyl group, α-naphthyl group, β-su7tyl group,
hydroxynaphthyl group, carboxynaphthyl group, aminonaphthyl group, etc.), and heterocyclic groups (e.g., thiazolyl group, penzothiγzolyl group, oxacylyl group, pyrimidinyl group,
It represents a group selected from (such as a lysyl group), and any of these may be a group that forms a metal chelate or a complex.
Rz、Rs及びR2はそれぞれアリル基、置換基を有し
てもよいフェニル基、置換基を有してもよいナフチル基
、複素環基、アルキル基(例えばメチル基、エチル基、
プロピル基、ブチル基、メルカプトメチル基、メルカプ
トエチル基等)、ヒドロキシル基、カルボキシル基又は
その塩、アルコキシカルボニル基(例えばメトキシカル
ボニル基、エトキシカルボニル基等)、アミノ基(例え
ばアミノ基、エチルアミノ基、アニリノ基等)、メルカ
プト基、ニトロ基又は水素原子から選ばれる基を表し、
Dは2価の芳香族基を表し、Eはアルキレン基、アリレ
ン基、アラルアルキレン基から選ばれる基を表し、Xθ
は硫黄原子化されたアニオンを表し、nはl又は2の整
数を表す。ただし化合物が分子内塩を形成する場合nは
1である。Rz, Rs and R2 each represent an allyl group, a phenyl group which may have a substituent, a naphthyl group which may have a substituent, a heterocyclic group, an alkyl group (for example, a methyl group, an ethyl group,
propyl group, butyl group, mercaptomethyl group, mercaptoethyl group, etc.), hydroxyl group, carboxyl group or its salt, alkoxycarbonyl group (e.g. methoxycarbonyl group, ethoxycarbonyl group, etc.), amino group (e.g. amino group, ethylamino group) , anilino group, etc.), a mercapto group, a nitro group, or a hydrogen atom,
D represents a divalent aromatic group, E represents a group selected from an alkylene group, an arylene group, an aralalkylene group, and Xθ
represents a sulfur atomized anion, and n represents an integer of l or 2. However, when the compound forms an inner salt, n is 1.
次ぎに前記一般式(I)、(n)又は(I[[)で表さ
れるテトラゾリウム化合物のカチオン部の具体例を示す
が、本発明はこれらのみに限定されるものではない。Next, specific examples of the cation moiety of the tetrazolium compound represented by the general formula (I), (n) or (I[[) will be shown, but the present invention is not limited to these.
例示化合物:
(1) 2−(ベンゾチアゾール−2−イル)−3−
フェニル−5−ドデシル−2H−テトラゾリウム(2)
2.3−ジフェニル−5−(4−t−オクチルオキ
シフェニル)−2H−テトラゾリウム
(3) 2.3.54リフェニル−2H−テトラゾリ
ウム
(4) 2.3.5−1−リ(p−カルボキシエチル
フェニル)−2H−テトラゾリウム
(5) 2−(ベンゾチアゾール−2−イル)−3−
フェニル−5−(o−クロルフェニル)−2H−テトラ
ゾリウム
(6) 2.3−ジフェニル−2H−テトラゾリウム
(7) 2.3−ジフェニル−5−メチル−2H−テ
トラゾリウム
(8) 3−(p−ヒドロキシフェニル)−5−メチ
ル−2−フェニル−2H−テトラゾリウム
(9) 2.3−ジフェニル−5−エチル−2H−テ
トラゾリウム
(10) 2.3−ジフェニル−5−n−ヘキシル−
2H−テトラゾリウム
(11) 5−シアノ−2,3−ジフェニル−2H−
テトラゾリウム
(12) 2−(ベンゾチアゾール−2−イル)−5
−フェニル−3−(4−トリル)−2H−テトラゾリウ
ム(13) 2−(ベンゾチアゾール−2−イル)−
5−(4−クロロフェニル)−3−(4−ニトロフェニ
ル)−2H−テトラゾリウム
(14) 5−エトキシカルボニル−2,3−ジ(3
−ニトロフェニル)−2H−テトラゾリウム
(15) 5−アセチル−2,3−ジ(p−エトキシ
フェニル)−2H−テトラゾリウム
(16) 2.5−ジフェニル−3−(p−トリール
)−28−テトラゾリウム
(17) 2.5−ジフェニル−3−(p−ヨードフ
ェニル)−28−テトラゾリウム
(till) 2.3−ジフェニル−5−(p−ジフ
ェニル)−214−テトラゾリウム
(19) 5−(p−ブロモフェニル)−2−フェニ
ル−3−(2,4,6−)リクロルフェニル)−2H−
テトラゾリウム
(20) 3−(p−/\イドロキシフエニル)−5
−(p−ニトロフェニル)−2−フェニル−28−テト
ラゾリウム
(21) 5−(3,4−ジメトキシフェニル)−3
−(2−エトキシフェニル)−2−(4−メトキシ7エ
二ル)−2H−テトラゾリウム
(22) 5−(4−シアノフェニル)−2,3−ジ
7工二ルー2 H−テトラゾリウム
(23) 3−(p−アセトアミドフェニル)−2,
5−シフ−ニル−2H−テトラゾリウム
(24) 5−アセチル−2,3−ジフェニル−2H
−テトラゾリウム
(25) 5−(フルー2−イル)−2,3−ジフェ
ニル−211−テトラゾリウム
(26) 5−(チエシー2−イル)−2,3−ジフ
ェニル−28−テトラゾリウム
(27) 2.3−ジフェニル−5−(ピリド−4−
イル)−2H−テトラゾリウA
(28) 2.3−ジフェニル−5−(キノール−2
−イル)−2[I−テトラゾリウム
(29) 2.3−ジフェニル−5−(ペンゾオキサ
ゾールー2−イル)−2H−テトラゾリウム(30)
2,3.5−トリ(p−エチルフェニル)−2H−テ
トラゾリウム
(31) 2.3.5−トリ(p−アリルフェニル)
−2H−テトラゾリウム
(32) 2,3.5−トリ(p−ヒドロキシエチル
オキシエトキシフェニル)−2H−テトラゾリウム(3
3) 2,3.5−)す(p−ドデシルフェニル)−
2H−テトラゾリウム
(34) 2,3.5−トリ(p−ベンジルフェニル
)−2H−テトラゾリウム
次に前記一般式(1)、(II)又は(III)で表さ
れるテトラゾリウム化合物のアニオン部は下記一般式(
a) 、 (b) 、 (C) 、 (d)又は(e)
で表すことができる。Exemplary compounds: (1) 2-(benzothiazol-2-yl)-3-
Phenyl-5-dodecyl-2H-tetrazolium (2)
2.3-diphenyl-5-(4-t-octyloxyphenyl)-2H-tetrazolium (3) 2.3.54liphenyl-2H-tetrazolium (4) 2.3.5-1-ly(p-carboxy ethylphenyl)-2H-tetrazolium (5) 2-(benzothiazol-2-yl)-3-
Phenyl-5-(o-chlorophenyl)-2H-tetrazolium (6) 2.3-diphenyl-2H-tetrazolium (7) 2.3-diphenyl-5-methyl-2H-tetrazolium (8) 3-(p- Hydroxyphenyl)-5-methyl-2-phenyl-2H-tetrazolium (9) 2.3-diphenyl-5-ethyl-2H-tetrazolium (10) 2.3-diphenyl-5-n-hexyl-
2H-tetrazolium (11) 5-cyano-2,3-diphenyl-2H-
Tetrazolium (12) 2-(benzothiazol-2-yl)-5
-Phenyl-3-(4-tolyl)-2H-tetrazolium(13) 2-(benzothiazol-2-yl)-
5-(4-chlorophenyl)-3-(4-nitrophenyl)-2H-tetrazolium (14) 5-ethoxycarbonyl-2,3-di(3
-nitrophenyl)-2H-tetrazolium (15) 5-acetyl-2,3-di(p-ethoxyphenyl)-2H-tetrazolium (16) 2,5-diphenyl-3-(p-tolyl)-28-tetrazolium (17) 2.5-diphenyl-3-(p-iodophenyl)-28-tetrazolium (till) 2.3-diphenyl-5-(p-diphenyl)-214-tetrazolium (19) 5-(p-bromo phenyl)-2-phenyl-3-(2,4,6-)lychlorophenyl)-2H-
Tetrazolium (20) 3-(p-/\idroxyphenyl)-5
-(p-nitrophenyl)-2-phenyl-28-tetrazolium (21) 5-(3,4-dimethoxyphenyl)-3
-(2-ethoxyphenyl)-2-(4-methoxy7enyl)-2H-tetrazolium (22) 5-(4-cyanophenyl)-2,3-di7enyl-2H-tetrazolium (23 ) 3-(p-acetamidophenyl)-2,
5-Sif-nyl-2H-tetrazolium (24) 5-acetyl-2,3-diphenyl-2H
-tetrazolium (25) 5-(fluor-2-yl)-2,3-diphenyl-211-tetrazolium (26) 5-(thiec-2-yl)-2,3-diphenyl-28-tetrazolium (27) 2.3 -diphenyl-5-(pyrido-4-
yl)-2H-tetrazoliu A (28) 2.3-diphenyl-5-(quinol-2
-yl)-2[I-tetrazolium (29) 2.3-diphenyl-5-(penzoxazol-2-yl)-2H-tetrazolium (30)
2,3.5-tri(p-ethylphenyl)-2H-tetrazolium (31) 2.3.5-tri(p-allylphenyl)
-2H-tetrazolium (32) 2,3.5-tri(p-hydroxyethyloxyethoxyphenyl)-2H-tetrazolium (3
3) 2,3.5-)su(p-dodecylphenyl)-
2H-tetrazolium (34) 2,3.5-tri(p-benzylphenyl)-2H-tetrazolium Next, the anion part of the tetrazolium compound represented by the above general formula (1), (II) or (III) is as follows. General formula (
a), (b), (C), (d) or (e)
It can be expressed as
一般式(a)
式中、Rlzは炭素原子数1〜32のアルキル基で、例
えばメチル基、エチル基、プロピル基、ヘキシル基、ノ
ニル基、ドデシル基、ヘキサデシル基等を表すが、これ
らの基は少なくとも1つの硫黄原子を含む。nは1〜3
の整数を表わし、n、はO〜4の整数を表す。General formula (a) In the formula, Rlz represents an alkyl group having 1 to 32 carbon atoms, such as a methyl group, an ethyl group, a propyl group, a hexyl group, a nonyl group, a dodecyl group, a hexadecyl group, etc. contains at least one sulfur atom. n is 1 to 3
represents an integer of 0 to 4, and n represents an integer of 0 to 4.
一般式(b) R,3−OCo−cH。General formula (b) R,3-OCo-cH.
RIM 0CO−C1l RIM
一般式(c)
Rls −OCOC1b
Rlz−OCOCR
RIM 0COCH−R+s
式中、R、、、R、、、R、、、R、、及びR1は、そ
れぞれ炭素原子数1〜32の直鎖又は分岐状のアルキル
基で、例えばメチル基、エチル基、ブチル基、イソブチ
ル基、ペンチル基、ヘキシル基、オクチル基、ノニル基
、デシル基、ドデシル基、オクタデシル基等を表すが環
状をなすアルキル基でもよく、これらの基は少なくとも
1つの硫黄原子を含む。またR 13.R141Rl@
+R+を及びRIMは、それぞれアリール基、例えばフ
ェニル基、ナフチル基等を表し、これらのアリール基は
少なくとも1つの硫黄原子を含む。RIM 0CO-C1l RIM General formula (c) Rls -OCOC1b Rlz-OCOCR RIM 0COCH-R+s In the formula, R, , , R, , , R, , , R, and R1 each have 1 to 32 carbon atoms. A straight-chain or branched alkyl group, such as a methyl group, ethyl group, butyl group, isobutyl group, pentyl group, hexyl group, octyl group, nonyl group, decyl group, dodecyl group, octadecyl group, etc., but is cyclic. Alkyl groups may also be used, and these groups contain at least one sulfur atom. Also R 13. R141Rl@
+R+ and RIM each represent an aryl group, such as a phenyl group, a naphthyl group, etc., and these aryl groups contain at least one sulfur atom.
さらにR1,及びR8,はカルボキシラド基、スルホナ
ト基又はリン酸基等の酸基を表す。Further, R1 and R8 represent an acid group such as a carboxylad group, a sulfonate group or a phosphoric acid group.
一般式(d)
式中、R8゜は炭素原子数1〜32の飽和、不飽和の直
鎖又は分岐状のアルキル基を表し、例えば飽和アルキル
基としては、メチル基、エチル基、ブチル基、イソブチ
ル基、ヘキシル基、ドデシル基、オクタデシル基等を表
し、不飽和アルキル基としては例えばアリル基、プデニ
ル基、オクテニル基等を表す。そしてこれらの飽和、不
飽和のアルキル基は少なくとも1つの硫黄原子を含む。General formula (d) In the formula, R8 represents a saturated or unsaturated linear or branched alkyl group having 1 to 32 carbon atoms, and examples of the saturated alkyl group include a methyl group, an ethyl group, a butyl group, It represents an isobutyl group, a hexyl group, a dodecyl group, an octadecyl group, etc., and as an unsaturated alkyl group, it represents, for example, an allyl group, a podenyl group, an octenyl group, etc. These saturated and unsaturated alkyl groups contain at least one sulfur atom.
R2及びn、は1〜3の整数を示す。またn、はO〜6
の整数を表す。R2 and n represent integers of 1 to 3. Also, n is O~6
represents an integer.
一般式(e)
式中、Yは硫黄原子、セレン原子、酸素原子、窒素原子
又はR12基(ここでRlzは水素原子又はN−
炭素原子数1〜3のアルキル基、例えばメチル基、エチ
ル基を表す)を表しRtlは、前記一般式(a)におけ
るR1□で表される基と同義の基又は少なくとも1つの
硫黄原子を含むアリール基(例えばフェニル基、ナフチ
ル基等)を表す。またZは、5員又は6員ヘテロ環を形
成するのに必要な原子群を表し、これらの例としては、
チアゾール環、セレナゾール環、オキサゾール環、イミ
ダゾール環、5ピラゾール環、トリアゾール環、テトラ
ゾール環、ピリミジン環。トリアジン環等を挙げること
が(・きる。General formula (e) In the formula, Y is a sulfur atom, a selenium atom, an oxygen atom, a nitrogen atom, or a R12 group (where Rlz is a hydrogen atom or an N- alkyl group having 1 to 3 carbon atoms, such as a methyl group, an ethyl group Rtl represents a group having the same meaning as the group represented by R1□ in the general formula (a) or an aryl group containing at least one sulfur atom (eg, phenyl group, naphthyl group, etc.). In addition, Z represents an atomic group necessary to form a 5- or 6-membered heterocycle, examples of which include:
Thiazole ring, selenazole ring, oxazole ring, imidazole ring, 5-pyrazole ring, triazole ring, tetrazole ring, pyrimidine ring. Examples include triazine rings.
上記のへテロ環には更にアルキル基、アリール基等の置
換基を有してもよく、またこれらの置換基には硫黄原子
を含む。The above heterocycle may further have a substituent such as an alkyl group or an aryl group, and these substituents contain a sulfur atom.
次に上記一般式
(a)
乃至
(e)
で表されるテト
ラゾリウム化合物のアニオン部の具体例を示す2が、本
発明に用いることのできる化合物はこれらに限定される
ものではない。Next, specific examples of the anion moiety of the tetrazolium compounds represented by the above general formulas (a) to (e) are shown in 2, but the compounds that can be used in the present invention are not limited to these.
例示化合物 C,II。Exemplary compound C.II.
本発明に用いられるテトラゾリウム化合物の具体例とし
ては、上記カチオン部の具体例とアニオン部の具体例と
の総ての組合せをあげることができる。Specific examples of the tetrazolium compound used in the present invention include all combinations of the above-mentioned specific examples of the cation moiety and specific examples of the anion moiety.
本発明に係わるアニオン部が硫黄原子化されたテトラゾ
リウム化合物は、先づ硫黄原子化されt;アニオン部を
有する上記例示化合物にみられるようなカリウム塩又は
ナトリウム塩化合物から合成される。The tetrazolium compound in which the anion moiety is sulfur-atomized according to the present invention is synthesized from a potassium salt or sodium salt compound as seen in the above-mentioned exemplified compounds which are first sulfur-atomized and have a sulfur atom.
例えば特開昭49−46733’)、同50−1652
5号、及ヒ同51−32322号等に記載された方法に
より合成することができる。For example, JP 49-46733'), JP 50-1652
It can be synthesized by the method described in No. 5 and No. 51-32322.
上記硫黄原子化されたアニオン部を有するカリウム塩又
はナトリウム塩化合物と前記の本発明に係わるカチオン
部を有するテトラゾリウム化合物のハロゲン化物を混合
することによって合成することができる。It can be synthesized by mixing the potassium salt or sodium salt compound having a sulfur atomized anion moiety and the halide of the tetrazolium compound having a cation moiety according to the present invention.
本発明においては、従ってカチオン部を有するテトラゾ
リウム化合物のハロゲン化物と硫*JJK子化されたア
ニオン部を有するカリウム塩又はナトリウム塩化合物と
をハロゲン化銀乳剤に添加することによって親水性コロ
イド層中に分散させても混合し一体化されるので本発明
の効果すなわち、高コントラスト化と高温、高湿下にお
ける安定性の向上を得ることができる。Accordingly, in the present invention, a halide of a tetrazolium compound having a cation moiety and a potassium salt or sodium salt compound having a sulfurized anion moiety are added to a silver halide emulsion to form a hydrophilic colloid layer. Even if they are dispersed, they are mixed and integrated, so that the effects of the present invention, that is, high contrast and improved stability under high temperature and high humidity conditions can be obtained.
またさらには、上記本発明に係わるカチオン部、アニオ
ン部をそれぞれ有する再化合物を別々に、例えばその一
方をハロゲン化銀乳剤層に添加し、他方をその隣接層中
に添加せしめても、重層塗布に際して再化合物が相互拡
散を起し、混合により一体化されるので、この場合でも
本発明の効果を得ることができる。Furthermore, even if the above-mentioned recompounds having a cation moiety and an anion moiety according to the present invention are added separately, for example, one of them is added to a silver halide emulsion layer and the other is added to an adjacent layer, multilayer coating is possible. In this case, the recompounds undergo interdiffusion and are integrated by mixing, so the effects of the present invention can be obtained even in this case.
本発明に使用するテトラゾリウム化合物は、1種を用い
てもよく、また、2種以上を任意の比率で組み合わせて
併用することもできる。The tetrazolium compounds used in the present invention may be used alone or in combination of two or more in any ratio.
本発明の好ましい一つの実施態様として、本発明に係わ
るテトラゾリウム化合物をノ\ロゲン化銀乳剤層中に添
加することが挙げられる。また本発明の別の好ましい実
施態様においては、ハロゲン化銀乳剤層を含む親水性コ
ロイド層に直接隣接する親水性コロイド層、又は中間層
を介して隣接する親水性コロイド層に添加される。One preferred embodiment of the present invention is to add the tetrazolium compound according to the present invention to the silver emulsion layer. In another preferred embodiment of the present invention, it is added to a hydrophilic colloid layer directly adjacent to a hydrophilic colloid layer containing a silver halide emulsion layer, or to a hydrophilic colloid layer adjacent via an intermediate layer.
また別の態様としては、本発明に係わるテトラゾリウム
化合物を適当な有機溶媒、例えばメタノール、エタノー
ル等のアルコール類やエーテル類、エステル類等に溶解
してオーバーコート法等により感光材料のハロゲン化銀
乳剤層側の最外層になる部分に直接塗布して感光材料に
含有せしめてもよい。In another embodiment, the tetrazolium compound according to the present invention is dissolved in a suitable organic solvent, for example, alcohols such as methanol and ethanol, ethers, esters, etc., and a silver halide emulsion of a light-sensitive material is prepared by an overcoating method or the like. It may also be incorporated into the photosensitive material by directly applying it to the outermost layer of the layer side.
本発明に係わるテトラゾリウム化合物は本発明の感光材
料中に含有されるハロゲン化銀1モル当りI X 10
−’モルから10モルまで、特に2X10’t−ルから
2 X 10−’モルまでの範囲で用いるのが好ましい
。 本発明が適用される感光材料のノ10ゲ。The tetrazolium compound according to the present invention contains I x 10 per mole of silver halide contained in the light-sensitive material of the present invention.
It is preferred to use a range from -' mol to 10 mol, especially from 2 x 10' t-ole to 2 x 10-' mol. No. 10 of photosensitive materials to which the present invention is applied.
化銀乳剤層に用いるハロゲン化銀としては、臭化銀、塩
臭化銀、沃臭化銀、塩沃臭化銀、塩化銀等の通常のハロ
ゲン化銀写真乳剤に使用される任意のものが包含される
。特にメタルハライドや高圧水銀灯を光源に使用したプ
リンターを用いて露光する明室返し感光材料として使用
する場合、ハロゲン化#i組成は塩化銀90モル%以上
を含む塩臭化銀から実質的になるものが好適であるが、
通常のオルソ又はパンクロ増感された暗室用高感度タイ
プの感光材料の場合は、塩化銀60モル%以上を含むハ
ロゲン化銀からなるものが好適である。The silver halide used in the silver emulsion layer may be any one used in ordinary silver halide photographic emulsions, such as silver bromide, silver chlorobromide, silver iodobromide, silver chloroiodobromide, silver chloride, etc. is included. In particular, when used as a photosensitive material exposed in a bright room using a printer using a metal halide or high-pressure mercury lamp as a light source, the halide #i composition consists essentially of silver chlorobromide containing 90 mol% or more of silver chloride. is preferred, but
In the case of ordinary ortho- or panchromatic-sensitized high-sensitivity darkroom photosensitive materials, those made of silver halide containing 60 mol % or more of silver chloride are suitable.
これらのハロゲン化銀は粗粒そのものでも、微粒子のも
のでもよく、任意の公知の方法、例えば米国特許第2.
592.250号、同第3.276.877号、同第3
.317.322号、同vg2,222.264+、同
第3.320.069号、同第3,206.313号の
各明細書あるいは 「ジャーナル・オグ・フォードグラ
フィック・サイエンス (J、 Phot、 5ci−
)J第12巻、第5号 (9,10月号)、1964年
、242〜251頁等に記載されている方法等によって
11製することができる。また異なる方法で調製したハ
ロゲン化銀を混合して用いることもできる。These silver halides may be coarse-grained or fine-grained, and can be prepared using any known method, such as that described in US Pat.
No. 592.250, No. 3.276.877, No. 3
.. 317.322, vg2,222.264+, 3.320.069, and 3,206.313, or the Journal of Ford Graphic Science (J, Phot, 5ci-
) J Vol. 12, No. 5 (September and October issue), 1964, pages 242-251, etc. It is also possible to mix and use silver halides prepared by different methods.
本発明のハロゲン化銀乳剤層中に含有せしめられるハロ
ゲン化銀は、限定的ではないが、平均粒子サイズ0.0
5〜1.5ミクロン、好ましくはO01〜0゜5ミクロ
ンで、かつ全粒子数の少なくとも75%、好ましくは8
0%以上が前記平均粒子サイズの0.5〜1.5@、好
ましくは0.6〜1.4倍の粒子サイズを有するハロゲ
ン化銀を含むことが望ましい。Although the silver halide contained in the silver halide emulsion layer of the present invention is not limited, the average grain size is 0.0.
5 to 1.5 microns, preferably O01 to 0.5 microns, and at least 75% of the total particle number, preferably 8
It is desirable that 0% or more contains silver halide having a grain size of 0.5 to 1.5@, preferably 0.6 to 1.4 times the average grain size.
本発明の最も好ましい一実施例によれば、本発明のハロ
ゲン化銀は0.lO〜0.3μlの平均粒子サイズを有
し、かつ全粒子の80%以上が平均粒子サイズの0.6
〜1.4倍の粒子サイズを有する塩臭化銀あるいは塩沃
臭化銀である。According to one most preferred embodiment of the invention, the silver halide of the invention is 0. It has an average particle size of lO ~ 0.3 μl, and more than 80% of the total particles have an average particle size of 0.6 μl.
It is silver chlorobromide or silver chloroiodobromide having a grain size of ~1.4 times.
本発明において用いられるハロゲン化銀は種々の化学増
感剤によって増感することができる。増感剤としては、
例えば活性ゼラチン、硫酸増感剤(チオ硫酸ソーダ、ア
リルチオカルバミド、チオ尿素、アリルイソチアシアネ
ート等)セレン増感剤(N 、N−ジメチルセレノ尿素
、セレノ尿素等)、還元増感剤(トリエチレンテトラミ
ン、塩化第2スズ等)、例えばカリウムクロロオーライ
ト、カリウムオーリチオシアネート、カリウムクロロオ
ーレート、2−オーロスルホベンゾチアゾールメチルク
ロライド、アンモニウムクロロパラデート、カリウムク
ロロオーレ−ト、ナトリウムクロロバラダイト等で代表
される各種貴金属増感剤等をそれぞれ単独で、あるいは
2種以上併用して用いることができる。なお金増感剤を
使用する場合は、助剤的にロダンアンモンを使用するこ
ともできる。The silver halide used in the present invention can be sensitized with various chemical sensitizers. As a sensitizer,
For example, activated gelatin, sulfuric acid sensitizers (sodium thiosulfate, allylthiocarbamide, thiourea, allyl isothiacyanate, etc.), selenium sensitizers (N, N-dimethylselenourea, selenourea, etc.), reduction sensitizers (trisulfate, etc.), ethylenetetramine, stannic chloride, etc.), such as potassium chlorooleite, potassium aurithiocyanate, potassium chlorooleate, 2-oresulfobenzothiazole methyl chloride, ammonium chloroparadate, potassium chlorooleate, sodium chlorovaradite, etc. Various noble metal sensitizers represented by can be used alone or in combination of two or more. When using a metal sensitizer, rhodanammonium can also be used as an auxiliary agent.
また、これらのハロゲン化銀結晶粒子内にイリジウム、
ロジウム、オスミウム、ビスマス、コバルト、ニッケル
、パラジウム、ルテニウム、鉄、銅、亜鉛、鉛、カドミ
ウム等の原子を含有せしめてもよい。これらの原子を含
有せしめる場合、ハロゲン化銀1モル当り10−”〜1
O−2モル当り含有させるのが好ましく、特に10−’
〜io−’モル含有させるのが好適である。In addition, iridium,
Atoms such as rhodium, osmium, bismuth, cobalt, nickel, palladium, ruthenium, iron, copper, zinc, lead, and cadmium may be contained. When these atoms are contained, the content is 10-'' to 1 per mole of silver halide.
It is preferable to contain per mole of O-2, especially 10-'
It is preferable to contain ~io-' moles.
また本発明に用いられるハロゲン化銀乳剤は表面潜像型
であっても内部潜像型であってもよい。Further, the silver halide emulsion used in the present invention may be of a surface latent image type or an internal latent image type.
更に種々の異なる方法によって調製されたハロゲン化銀
を混合してもよい。結晶形は立方体、8面体、14面体
、球形いずれの形でも何ら制限されないO
本発明による前記ハロゲン化銀及びテトラゾリウム化合
物は親水性コロイド層中に添加せしめられる。本発明に
特に有利に用いられる親水性コロイドはゼラチンである
が、ゼラチン以外の親水性コロイドとしては、例えばコ
ロイド状アルブミン、寒天、アラビアゴム、アルギン酸
、加水分解されたセルロースアセテート、アクリルアミ
ド、イミド化ポリアミド、ポリビニルアルコール、加水
分解されたポリビニルアセテート、ゼラチン誘導体、例
えば米国特許第2.614.928号、同第2,525
,753号等に記載されている如きフェニルカルバミル
ゼラチン、アシル化ゼラチン、フタル化ゼラチン、ある
いは米国特許第2.548,520号、同第2,831
,767号等に記載されている如きアクリル酸スチレン
、アクリル酸エステル、メタクリル酸、メタクリルm・
。Additionally, silver halides prepared by a variety of different methods may be mixed. The crystal shape may be cubic, octahedral, tetradecahedral, or spherical without any limitation.The silver halide and tetrazolium compounds according to the present invention are added to the hydrophilic colloid layer. The hydrophilic colloid particularly advantageously used in the present invention is gelatin, but hydrophilic colloids other than gelatin include, for example, colloidal albumin, agar, gum arabic, alginic acid, hydrolyzed cellulose acetate, acrylamide, and imidized polyamide. , polyvinyl alcohol, hydrolyzed polyvinyl acetate, gelatin derivatives, such as U.S. Pat.
phenylcarbamyl gelatin, acylated gelatin, phthalated gelatin as described in U.S. Pat. No. 2,548,520, U.S. Pat.
Styrene acrylate, acrylic ester, methacrylic acid, methacrylic m.
.
エステル等のエチレン基を持つ重合可能な単量体をゼラ
チンにグラフト重合したもの等を挙げることができ、こ
れらの親水性コロイドはハロゲン化銀を含有しない層、
例えばハレーシコン防止層、保護層、中間層等にも適用
できる。Examples include gelatin graft polymerized with a polymerizable monomer having an ethylene group such as an ester, and these hydrophilic colloids can be used as a layer containing no silver halide,
For example, it can be applied to anti-halogenation layers, protective layers, intermediate layers, etc.
本発明の感光材料は、前記のハロゲン化銀及びテトラゾ
リウム化合物を含有する親水性コロイド層を適当な写真
用支持体に塗設してなるが、本発明に用いられる支持体
としては、例えばバライタ紙、ポリエチレン被覆紙、ポ
リプロピレン合成紙、ガラス板、セルロースアセテート
、セルロースナイトレート、例えばポリエチレンテレフ
タレート等のポリエステルフィルム、ポリアミドフィル
ム、ポリプロピレンフィルム、ホリカーポネートフィル
ム、ポリスチレンフィルム等が代表的なものとして包含
され、これらの支持体は、それぞれハロゲン化銀写真感
光材料の使用目的に応じて適宜選択される。The light-sensitive material of the present invention is formed by coating a hydrophilic colloid layer containing the above-mentioned silver halide and tetrazolium compound on a suitable photographic support. Examples of the support used in the present invention include baryta paper. Typical examples include polyethylene coated paper, polypropylene synthetic paper, glass plates, cellulose acetate, cellulose nitrate, polyester films such as polyethylene terephthalate, polyamide films, polypropylene films, polycarbonate films, polystyrene films, etc. These supports are appropriately selected depending on the intended use of the silver halide photographic material.
本発明に係る感光材料;よ、上記のように支持体の少な
くとも1面に少なくとも1層のハロゲン化銀を含有する
親水性コロイド層即ちハロゲン化銀乳剤層を有し、核層
を包含する該層側の親水性コロイド層(ハロゲン化銀乳
剤層以外の親水性コロイド層としては例えば保護層、下
引層、フィルター層、中間層等が挙げられる。)の少な
くとも1層中に本発明に係わるテトラゾリウム化合物を
含有するものであるが、該層側に適度の膜厚を有する保
護層、即ち好ましくは0.1−10μm1特に好ましく
は0.8〜2μmのゼラチン保護層が塗設されているの
が望ましい。The light-sensitive material according to the present invention has at least one silver halide-containing hydrophilic colloid layer, that is, a silver halide emulsion layer, on at least one surface of the support, and includes a core layer. In at least one of the hydrophilic colloid layers on the layer side (hydrophilic colloid layers other than the silver halide emulsion layer include, for example, a protective layer, a subbing layer, a filter layer, an intermediate layer, etc.), there is a compound according to the present invention. Although it contains a tetrazolium compound, a protective layer having an appropriate thickness, that is, preferably a gelatin protective layer of 0.1 to 10 μm, particularly preferably 0.8 to 2 μm, is coated on the layer side. is desirable.
本発明に用いられる前記親水性コロイドには必要に応じ
て各種写真用添加剤、例えばゼラチン可塑剤、硬膜剤、
界面活性剤、画像安定剤、紫外線吸収剤、アンチスティ
ン剤、pi調整剤、酸化防止剤、帯電防止剤、増粘剤、
粒状性向上剤、染料、モルダント、増白剤、現像速度調
整剤、マット剤等を本発明の効果が損なわれない範囲内
で使用することができる。The hydrophilic colloid used in the present invention may contain various photographic additives, such as gelatin plasticizers, hardeners,
Surfactant, image stabilizer, ultraviolet absorber, antistain agent, pi adjuster, antioxidant, antistatic agent, thickener,
Graininess improvers, dyes, mordants, brighteners, development speed regulators, matting agents, and the like can be used within the range that does not impair the effects of the present invention.
本発明の感光材料の現像処理に際して用いられる現像液
中に含有せしめる現像剤として下記のものが挙げられる
。Examples of the developer that can be included in the developer used in developing the photosensitive material of the present invention include the following.
+l0−(CI −Ctl)n −OH型現像剤として
は、カテコール、ピロガロール及びその誘導体ならびに
アスコルビン酸が代表的なもので、ハイドロキノン、ク
ロロハイドロキノン、ブロモハイドロキノン、イソプロ
ピルハイドロキノン、トルハイドロキノン、メチルハイ
ドロキノン、2.3−ジクロロハイドロキノン、2.5
−ジメチルハイドロキノン、2゜3−ジブロモハイドロ
キノン、2.5−ジハイドロキシアセトフエノン、2,
5−ジエチルハイドロキノン、2.5−ジーp−7エネ
チルハイドロキノン、2.5〜ジベンゾイルアミノハイ
ドロキノン、カテコール、4−クロロカテコール、3−
フェニルカテコール、4−フェニル−カテコール、3−
メトキシ−カテコール、4−アセチル−ピロガロール−
4−(2’ヒドロキシベンゾイル)ピロガロール、アス
コルビン酸ソーダ等がある。Typical +l0-(CI-Ctl)n-OH type developers include catechol, pyrogallol and its derivatives, and ascorbic acid, as well as hydroquinone, chlorohydroquinone, bromohydroquinone, isopropylhydroquinone, toluhydroquinone, methylhydroquinone, .3-dichlorohydroquinone, 2.5
-dimethylhydroquinone, 2゜3-dibromohydroquinone, 2,5-dihydroxyacetophenone, 2,
5-diethylhydroquinone, 2.5-di-p-7enethylhydroquinone, 2.5-dibenzoylaminohydroquinone, catechol, 4-chlorocatechol, 3-
Phenylcatechol, 4-phenyl-catechol, 3-
Methoxy-catechol, 4-acetyl-pyrogallol-
Examples include 4-(2'hydroxybenzoyl)pyrogallol and sodium ascorbic acid.
また、lo−(CI1− CI)N−NHt型現像剤と
しては、オルト及びパラのアミンフェノール又はアミノ
ピラゾロンが代表的なもので、4−アミノフェノール、
2.アミノ−6−フェニルフェノール、2−アミノ−4
−クロロ−6−フェニルフェノール、4−アミノ−2−
フェニルフェノール、3.4−ジアミノフェノール、3
−メチル−4,6−ジアミノフェノール、2.4−シア
ミルゾルシノール、2.4.6−トリアミノフェノール
、N−メチル−p−アミノフェノール、N−β−ヒドロ
キシエチル−p−アミノフェノール、p−ヒドロキシフ
ェニルアミノ酢酸、2−アミ更に、HzN (C=
C)n N11t型現像剤としては、例えば4−アミ
ノ−2−メチル−N、N−ジエチルアニリン、2.4−
ジアミノ−N、N−ジエチルアニリン、N−(4−アミ
ノ−3−メチルフェニル)−モルホリン、p−フェニレ
ンジアミン、4−アミノ−N、N−ジメチル−3−ヒド
ロキシアニリン、N N N ’N ’−テトラメチル
パラフェニレンジアミン、4−アミノ−N−エチル−N
−(β−ヒドロキシエチル)−アニリン、・1〜アミノ
−3−メチル−N−エチル−N−(β−ヒドロキシエチ
ル)−アニリン、4−アミノ−N−エチル−(β−メト
キシエチル)−3−メチル−アニリン、4−アミノ−3
−メチル−N−エチル−N−(β−メチルスルホンアミ
ドエチル)−アニリン、4−アミノ−N−プチルーN−
γ−スルホブチルアニリン、1−(4−アミノフェニル
)−ピロリジン; 6−アミノ−1−エチル、■、2゜
3.4−テトラハイドロキノン、9−アミノイユロリデ
イン等があり、ヘテロ環型現像剤とては、例、tlfl
−フェニル−3−ピラゾリドン、l−フェニル−4−ア
ミノ−5−ピラゾロン、1−(p−アミノ7エ二ル)−
3−アミノ−2−ピラゾリン、1−フェニル−3−メチ
ル−4−アミノ−5−ピラゾロン、5−アミノウラシル
、等を挙げることができる。In addition, typical lo-(CI1-CI)N-NHt type developers include ortho and para amine phenols or aminopyrazolones, including 4-aminophenol,
2. Amino-6-phenylphenol, 2-amino-4
-chloro-6-phenylphenol, 4-amino-2-
Phenylphenol, 3,4-diaminophenol, 3
-Methyl-4,6-diaminophenol, 2.4-cyamylsorcinol, 2.4.6-triaminophenol, N-methyl-p-aminophenol, N-β-hydroxyethyl-p-aminophenol, p-hydroxyphenylaminoacetic acid, 2-aminoacetic acid, and HzN (C=
C)n N11t type developers include, for example, 4-amino-2-methyl-N, N-diethylaniline, 2.4-
Diamino-N, N-diethylaniline, N-(4-amino-3-methylphenyl)-morpholine, p-phenylenediamine, 4-amino-N, N-dimethyl-3-hydroxyaniline, N N N 'N' -tetramethylparaphenylenediamine, 4-amino-N-ethyl-N
-(β-hydroxyethyl)-aniline, 1-amino-3-methyl-N-ethyl-N-(β-hydroxyethyl)-aniline, 4-amino-N-ethyl-(β-methoxyethyl)-3 -methyl-aniline, 4-amino-3
-Methyl-N-ethyl-N-(β-methylsulfonamidoethyl)-aniline, 4-amino-N-butyl-N-
γ-sulfobutylaniline, 1-(4-aminophenyl)-pyrrolidine; 6-amino-1-ethyl, Agents include, for example, tlfl
-Phenyl-3-pyrazolidone, l-phenyl-4-amino-5-pyrazolone, 1-(p-amino7enyl)-
Examples include 3-amino-2-pyrazoline, 1-phenyl-3-methyl-4-amino-5-pyrazolone, 5-aminouracil, and the like.
その他、T、H,ジェームス著ザ・セオリイ・オブ・ザ
・ホトグラフィック・プロセス第4版(The The
ory or PI+otographic Proc
ess、 Fourth Edition)m291〜
334頁及びジャーナル・オブ・ザ・アメリカン・、ケ
ミカル・ソサエティ(Journal or theA
merican Chemical 5ociety)
第73巻、*3,100頁(1951)に記載されてい
るごとき現像剤が本発明に有効に使用し得るものである
。これらの現像剤は単独で使用しても2種以上組合せて
もよいが、2種以上を組合せて用いる方が好ましい、ま
た本発明に使用する現像液には保恒剤として、例えば亜
硫酸ソーダ、亜硫酸カリ、亜硫酸アンモン等の亜硫酸塩
を用いても、本発明の効果が損なわれることはなく、本
発明の1つの特徴として挙げることができる。また保恒
剤としてヒドロキシルアミン、ヒドラジド化合物を用い
てもよい。その他−般白黒現像液で用いられるような苛
性アルカリ、炭酸アルカリ又はアミンなどによるpiの
調整とバッファー機能をもたせること、及びブロム力り
など無機現像抑制及びペンツトリアゾールなど有機現像
抑制剤エチレンジアミン四酢酸等の金属イオン捕捉剤、
メタノール、エタノール、ベンジルアルコール、ポリア
ルキレンオキシド等の現像促進剤、アルキルアリールス
ルホン酸ナトリウム、天然のサポニン、糖類又は前記化
合物のアルキルエステル物等の界面活性剤、グルタルア
ルデヒド、ホルマリン、グリオキザール等の硬膜剤、硫
酸ナトリウム等のイオン強度調整剤等の添加を行なうこ
とは任意である。Other books include The Theory of the Photographic Process, 4th edition, by T. H. James.
ory or PI+otographic Proc
ess, Fourth Edition) m291~
334 pages and Journal of the American Chemical Society.
merican Chemical 5ociety)
The developer described in Vol. 73, *3, p. 100 (1951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more types, but it is preferable to use two or more types in combination.The developer used in the present invention may also contain preservatives such as sodium sulfite, Even if sulfites such as potassium sulfite and ammonium sulfite are used, the effects of the present invention are not impaired and can be cited as one of the features of the present invention. Furthermore, hydroxylamine and hydrazide compounds may be used as preservatives. Others - adjustment of pi with caustic alkali, alkali carbonate, or amine used in general black and white developers, and provision of a buffer function; inorganic development inhibitors such as bromine; organic development inhibitors such as penttriazole; ethylenediaminetetraacetic acid, etc. metal ion scavenger,
Development accelerators such as methanol, ethanol, benzyl alcohol, and polyalkylene oxide, surfactants such as sodium alkylarylsulfonate, natural saponins, sugars or alkyl esters of the above compounds, and hardening agents such as glutaraldehyde, formalin, and glyoxal. It is optional to add ionic strength adjusting agents such as sodium sulfate and the like.
以下、実施例を挙げて本発明をさらに具体的に説明する
。本発明の技術的範囲は以下の実施例によって何等制限
されるものではなく、種々多様の実施態様が可能なもの
である。Hereinafter, the present invention will be explained in more detail with reference to Examples. The technical scope of the present invention is not limited in any way by the following examples, and various embodiments are possible.
特に本発明の実施態様は、高感度ハロゲン化銀写真感光
材料、いわゆる暗室タイプのハロゲン化銀写真感光材料
にて説明するが、本発明はこれによって何等制限される
ものではない。In particular, embodiments of the present invention will be explained using a high-sensitivity silver halide photographic light-sensitive material, a so-called darkroom type silver halide photographic light-sensitive material, but the present invention is not limited thereto in any way.
実施例1
同時混合法を用いて塩臭化銀乳剤(銀1モル当り塩化銀
95モル%含有)を調製した。Example 1 A silver chlorobromide emulsion (containing 95 mol % silver chloride per mol silver) was prepared using a simultaneous mixing method.
硝酸銀の水溶液と、塩化ナトリウム及び臭化カリウムを
含む水溶液とを、60°Cにおいてゼラチン水溶液中に
攪拌しながら2分間で連続添加して平均粒径0.25μ
mの塩臭化銀乳剤粒子を形成させた。An aqueous solution of silver nitrate and an aqueous solution containing sodium chloride and potassium bromide were continuously added to an aqueous gelatin solution at 60°C with stirring for 2 minutes to obtain an average particle size of 0.25μ.
m silver chlorobromide emulsion grains were formed.
この乳剤を水洗、脱塩後、50°Cで常法に従い金−硫
黄増感し、次に安定剤として2−メチル−4−ヒドロキ
シ−1,3,3a、7−テトラザインデン化合物とゼラ
チン水溶液を加えた。After washing and desalting this emulsion, it was gold-sulfur sensitized at 50°C according to a conventional method, and then a 2-methyl-4-hydroxy-1,3,3a,7-tetrazaindene compound and gelatin were added as stabilizers. Aqueous solution was added.
更にオルソ増感色素として下記の化合物を150rag
/銀モル添加した。Furthermore, 150 rag of the following compound as ortho-sensitizing dye
/silver mole added.
(増感色素)
次いで塗布液助剤としてサポニンの20%水溶液ヲハロ
ゲン化銀1モル当り3gならびに増粘剤としてスチレン
−マレイン酸共重合体ポリマーを2g加えてハロゲン化
銀1モル当り1.5Qに仕上げて塗布液を調製した。(Sensitizing dye) Next, 3 g of a 20% aqueous solution of saponin per mole of silver halide as a coating liquid auxiliary agent and 2 g of a styrene-maleic acid copolymer as a thickener were added to give a solution of 1.5 Q per mole of silver halide. After finishing, a coating solution was prepared.
この乳剤塗布液を6分割し、各々下記第1表に記載され
たカチオン部を有するテトラゾリウム化合物のクロライ
ド塩を添加した。This emulsion coating solution was divided into six parts, and a chloride salt of a tetrazolium compound having a cation moiety listed in Table 1 below was added to each part.
次に、乳剤用保護膜塗布液を下記に従い調製した。Next, a protective film coating solution for emulsion was prepared according to the following procedure.
(乳剤用保護膜塗布液の調整)
ゼラチンIkgに純水1OI2を加え膨潤後40°Cに
加温し、マット剤とて不定形の平均粒径3μのシリカゲ
ルを30gゼラチンに分散して加え、2oQに仕上げて
保護膜を調製した。この保護膜液を6分割し、各々に下
記表1に示されたアニオン部を有するテトラゾリウム化
合物のナトリウム塩を加えた。(感光材料の調製)
r引加工済みの厚さ100μmのポリエチレンテレフタ
レートベース支持体上に、前記により調製された乳剤塗
布液及び保護膜用塗布液とを組み合わせ銀量が3.5g
/m”、ゼラチンが1.5g/+a”、保護膜用ゼラチ
ンの付量がIg/+s″になるように塗布した。塗布条
件として塗布スピード100m/分、減率部湿球は24
°Cであった。(Preparation of protective film coating solution for emulsion) Add 10I2 of pure water to 1kg of gelatin, swell, and then warm to 40°C. Add amorphous silica gel with an average particle size of 3μ as a matting agent dispersed in 30g of gelatin. A protective film was prepared by finishing to 2oQ. This protective film solution was divided into six parts, and a sodium salt of a tetrazolium compound having an anion moiety shown in Table 1 below was added to each part. (Preparation of photosensitive material) The emulsion coating solution prepared above and the coating solution for a protective film were combined on a polyethylene terephthalate base support with a thickness of 100 μm that had been subjected to r drawing, and the amount of silver was 3.5 g.
/m'', gelatin was 1.5 g/+a'', and the amount of gelatin for the protective film was Ig/+s''.The coating conditions were a coating speed of 100 m/min, and a waning rate wet bulb of 24.
It was °C.
このようにして表1に示された如き6種のテスト試料が
得られた。Six test samples as shown in Table 1 were thus obtained.
保護膜の塗布時に保護膜塗布液にホルムアルデヒド、エ
チレンイミンの2種類の硬膜剤を併用して添加し硬膜化
した。At the time of coating the protective film, two types of hardening agents, formaldehyde and ethyleneimine, were added in combination to the protective film coating solution to harden the film.
支持体の乳剤塗布面とは反対側に下記処方のバッキング
溶液を塗布し同時にその上に下記組成の保護層を塗布し
た。A backing solution having the following formulation was applied to the opposite side of the support from the emulsion-coated side, and at the same time, a protective layer having the following composition was applied thereon.
(バッキング溶液の調製)
ゼラチン1kg中に純水20Qを加え、膨潤後、温度4
0℃に加温してから、添加剤として下記構造式(イ)及
び(ロ)で表される化合物のそれぞれ10%水溶液80
01及び2%水溶液4Qを加え、更に染料として下記構
造式(ハ)で示される化合物の5%水溶液1 、200
mQを加え、その上増粘剤としてスチレン−マレイン酸
の共重合体を16g1塗布助剤としてサポニンを16g
加えた後、純水を加えて30Qに仕上げIこ 。(Preparation of backing solution) Add 20Q of pure water to 1 kg of gelatin, and after swelling,
After heating to 0°C, add 10% aqueous solutions of compounds represented by the following structural formulas (a) and (b) as additives to 80% each.
Add 01 and 2% aqueous solution 4Q, and further add 5% aqueous solution 1,200 of a compound represented by the following structural formula (c) as a dye.
mQ and 16 g of styrene-maleic acid copolymer as a thickener and 16 g of saponin as a coating aid.
After adding pure water, finish to 30Q.
塗布液のpHは5.5にクエン酸ナトリウムで調節し、
ゼラチン量1.8g/ m”となるように塗布した。The pH of the coating solution was adjusted to 5.5 with sodium citrate,
The gelatin amount was applied at 1.8 g/m''.
構造式(イ)
So 、 Na
構造式(ロ)
So 、 Na
構造式(ハ)
(バッキング用保護膜塗布液の調M)
通常の感光材料における乳剤の保護膜に準じて調製した
。塗布したゼラチン量は1g7m2であっlこ 。Structural formula (a) So, Na Structural formula (b) So, Na Structural formula (c) (Preparation M of coating solution for protective film for backing) It was prepared in accordance with the protective film for emulsion in ordinary light-sensitive materials. The amount of gelatin applied was 1g7m2.
表1においては、前記乳剤塗布液及び保護膜液を用いた
テストサンプルを順次試料N001〜6とし Iこ 。In Table 1, the test samples using the emulsion coating liquid and the protective film liquid are sequentially designated as Samples No. 001 to 6.
上記テストサンプルを常法に従ってタングステン光によ
る階段露光を与えた後、下記の処方による現像液及び市
販の定着液とを用いて現像タンク容量40Qの自動現像
機にて処理した。The above test sample was subjected to stepwise exposure with tungsten light according to a conventional method, and then processed in an automatic developing machine with a developing tank capacity of 40Q using a developer having the following formulation and a commercially available fixer.
(工 程) (ii 度) (時 間)現
像 30 ’0 30
秒定 着 〃 2
o秒水 洗 常温
20秒〔現像液組成〕
(組成 A)
純水 150rIIQ
エチレンジアミン四酢酸二ナトリウム
塩
2g亜硫酸カリウム(55%水溶液) 1
00m(2炭酸カリウム 50
gハイドロキノン 10g5−メ
チルベンゾトリアゾール 200mg1−フェニ
ル−5−メルカプト
テトラゾール 30mg臭化カリウ
ム 2g(組成り)
ジエチレングリコール 50g純水
3IIIQエチレンジア
ミン四酢酸二ナトリウム
塩
25mg酢酸(90%溶液)
0.3rrr05−ニトロインダゾール
110a+gl−フェニルー3−ピラゾリドン
200mg亜硫酸カリウム(55%水溶液)
1mff現像液の使用時に純水500mQ中に上記組成
人1組成りの順に溶かし、IQに仕上げて用いた。(process) (ii degrees) (time)
Statue 30 '0 30
Fixed in seconds 〃 2
Wash with water for o seconds at room temperature
20 seconds [Developer composition] (Composition A) Pure water 150rIIQ
Ethylenediaminetetraacetic acid disodium salt
2g potassium sulfite (55% aqueous solution) 1
00m (potassium dicarbonate 50
g Hydroquinone 10g 5-methylbenzotriazole 200mg 1-phenyl-5-mercaptotetrazole 30mg Potassium bromide 2g (composition) Diethylene glycol 50g Pure water
3IIIQ Ethylenediaminetetraacetic acid disodium salt
25mg acetic acid (90% solution)
0.3rrr05-nitroindazole
110a+gl-phenyl-3-pyrazolidone
200mg potassium sulfite (55% aqueous solution)
When using a 1 mff developer, the above compositions were dissolved in 500 mQ of pure water in the order of composition 1 and finished to IQ before use.
これらのテスト試料について、塗布直後及び−定期間後
のコントラストの変化を調べるため、上記テスト試料を
25℃で相対湿度50%で調湿後、写真用バリア包材に
密封して50°Cで30日間加熱処理し Iこ 。For these test samples, in order to investigate the change in contrast immediately after application and after a certain period of time, the above test samples were conditioned at 25°C and 50% relative humidity, sealed in photographic barrier packaging material, and incubated at 50°C. Heat treated for 30 days.
(比較化合物)
II□C−C00CII ICH(C11□)、CI+
。(Comparative compound) II□C-C00CII ICH (C11□), CI+
.
NaO,S llc C00CToC1l(CIl
z)xcHsC2H。NaO, S llc C00CToC1l(CIl
z)xcHsC2H.
上記表1においてコントラストは示性曲線で濃度1.0
から2.5を得る各点間の傾きを表す値である。In Table 1 above, the contrast is an indication curve with a density of 1.0.
It is a value representing the slope between each point to obtain 2.5 from .
この表から本発明の化合物が添加された白黒ハロゲン化
銀写真感光材料は、本発明以外のテトラゾリウム化合物
が添加された感光材料に比較して著じるしく超硬調であ
り、しかも高温、高湿下で長期間保存しても、その硬調
性にまったく変化が見られず安定であることが判る。From this table, it can be seen that the black and white silver halide photographic light-sensitive materials to which the compound of the present invention has been added have significantly higher contrast than the light-sensitive materials to which tetrazolium compounds other than the present invention have been added, and have been exposed to high temperatures and high humidity. It can be seen that even after long-term storage under low conditions, no change was observed in the contrast characteristics, indicating that it is stable.
一方テトラゾリウム化合物を含有しない比較試料(1)
は全く軟調であり、印刷用リス型感光材料としては使用
し得ないものであることもわかった。On the other hand, a comparative sample (1) that does not contain a tetrazolium compound
It was also found that the image had a completely soft tone and could not be used as a lithographic photosensitive material for printing.
親水性コロイド層中に本発明に係わるテトラゾリウム化
合物を含有せしめた感光材料は、安定性のよい現像液を
用いることができ、コントラストが高く、かつ高温、高
湿条件下においても画像特性の安定した感光材料である
。The photosensitive material containing the tetrazolium compound according to the present invention in the hydrophilic colloid layer can use a developer with good stability, has high contrast, and has stable image characteristics even under high temperature and high humidity conditions. It is a photosensitive material.
Claims (1)
ロイド層(ハロゲン化銀乳剤層を含む)を塗設してなる
ハロゲン化銀写真感光材料において、前記親水性コロイ
ド層の少なくとも1層中にアニオン部及びカチオン部か
らなるテトラゾリウム化合物を含有し、かつ該テトラゾ
リウム化合物のアニオン部が硫黄原子化されていること
を特徴とするハロゲン化銀写真感光材料。In a silver halide photographic material comprising at least one hydrophilic colloid layer (including a silver halide emulsion layer) coated on at least one side of a support, in at least one of the hydrophilic colloid layers. 1. A silver halide photographic material comprising a tetrazolium compound consisting of an anion part and a cation part, the anion part of the tetrazolium compound being converted into a sulfur atom.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14948688A JPH022544A (en) | 1988-06-16 | 1988-06-16 | Silver halide photographic sensitive material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14948688A JPH022544A (en) | 1988-06-16 | 1988-06-16 | Silver halide photographic sensitive material |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH022544A true JPH022544A (en) | 1990-01-08 |
Family
ID=15476207
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14948688A Pending JPH022544A (en) | 1988-06-16 | 1988-06-16 | Silver halide photographic sensitive material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH022544A (en) |
-
1988
- 1988-06-16 JP JP14948688A patent/JPH022544A/en active Pending
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