JPH0227310B2 - SERAMIKUSUNOMETARAIZUHO - Google Patents
SERAMIKUSUNOMETARAIZUHOInfo
- Publication number
- JPH0227310B2 JPH0227310B2 JP5284385A JP5284385A JPH0227310B2 JP H0227310 B2 JPH0227310 B2 JP H0227310B2 JP 5284385 A JP5284385 A JP 5284385A JP 5284385 A JP5284385 A JP 5284385A JP H0227310 B2 JPH0227310 B2 JP H0227310B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- rare earth
- ceramics
- metallized layer
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000919 ceramic Substances 0.000 claims description 35
- 238000000034 method Methods 0.000 claims description 22
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 13
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 12
- 239000005751 Copper oxide Substances 0.000 claims description 11
- 229910000431 copper oxide Inorganic materials 0.000 claims description 11
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 10
- 239000005995 Aluminium silicate Substances 0.000 claims description 9
- 235000012211 aluminium silicate Nutrition 0.000 claims description 9
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 claims description 9
- 229940116318 copper carbonate Drugs 0.000 claims description 6
- GEZOTWYUIKXWOA-UHFFFAOYSA-L copper;carbonate Chemical compound [Cu+2].[O-]C([O-])=O GEZOTWYUIKXWOA-UHFFFAOYSA-L 0.000 claims description 6
- 230000001590 oxidative effect Effects 0.000 claims description 6
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 5
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims description 5
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 5
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 claims description 5
- 238000001465 metallisation Methods 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 27
- 239000000853 adhesive Substances 0.000 description 11
- 230000001070 adhesive effect Effects 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- -1 hydride compound Chemical class 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000007654 immersion Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000011247 coating layer Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 239000005749 Copper compound Substances 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 3
- 150000001880 copper compounds Chemical class 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 235000007173 Abies balsamea Nutrition 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004857 Balsam Substances 0.000 description 2
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- 244000018716 Impatiens biflora Species 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical group [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- ZXSQEZNORDWBGZ-UHFFFAOYSA-N 1,3-dihydropyrrolo[2,3-b]pyridin-2-one Chemical compound C1=CN=C2NC(=O)CC2=C1 ZXSQEZNORDWBGZ-UHFFFAOYSA-N 0.000 description 1
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical group O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- PCEXQRKSUSSDFT-UHFFFAOYSA-N [Mn].[Mo] Chemical compound [Mn].[Mo] PCEXQRKSUSSDFT-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 238000005219 brazing Methods 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 1
- IKNAJTLCCWPIQD-UHFFFAOYSA-K cerium(3+);lanthanum(3+);neodymium(3+);oxygen(2-);phosphate Chemical compound [O-2].[La+3].[Ce+3].[Nd+3].[O-]P([O-])([O-])=O IKNAJTLCCWPIQD-UHFFFAOYSA-K 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 229910052590 monazite Inorganic materials 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 1
- 239000011225 non-oxide ceramic Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000003891 oxalate salts Chemical class 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- HBEQXAKJSGXAIQ-UHFFFAOYSA-N oxopalladium Chemical compound [Pd]=O HBEQXAKJSGXAIQ-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910003445 palladium oxide Inorganic materials 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- CLSUSRZJUQMOHH-UHFFFAOYSA-L platinum dichloride Chemical compound Cl[Pt]Cl CLSUSRZJUQMOHH-UHFFFAOYSA-L 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 229910001958 silver carbonate Inorganic materials 0.000 description 1
- LKZMBDSASOBTPN-UHFFFAOYSA-L silver carbonate Substances [Ag].[O-]C([O-])=O LKZMBDSASOBTPN-UHFFFAOYSA-L 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000009864 tensile test Methods 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical group [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Parts Printed On Printed Circuit Boards (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
産業上の利用分野
本発明は、セラミクスのメタライズ方法に関す
る。
従来技術とその問題点
セラミクスは、一般に耐熱性、耐摩耗性、絶縁
性等に優れているものの、耐衝撃性に劣る為、構
造材料としては、金属との接合体として使用され
ることが多い。セラミクスと金属とを接合する場
合には、予めセラミクス表面をメタライズしてお
く必要があり、又、セラミクスを導電材料として
使用する場合にも、その表面をメタライズしてお
く必要がある。
セラミクスのメタライズ法としては、テレフン
ケン法、活性金属法、水素化合物法、酸化物ソル
ダー法、炭酸銀法等が知られているが、テレフン
ケン法以外の方法は、ほとんど使用されていな
い。これは、工程が複雑であるのみならず、得ら
れたメタライズ層の接着強度、耐熱衝撃性、耐化
学薬品性等が充分でない場合が多いからである。
現在一般的に使用されているテレフンケン法にお
いては、セラミクス表面にモリブデン―マンガン
を被覆し、非酸化雰囲気中1400〜1700℃程度の高
温で焼き付け処理した後、金属メツキを行ない、
次いで再度非酸化性雰囲気中で加熱することによ
り、安定化したメタライズ層を形成させている。
しかしながら、この方法においても、多段階にわ
たる煩雑な工程が必要であり、加熱温度が高いと
いう欠点が存在する。
本発明者等は、従来技術の上記の如き欠点を解
消すべく研究を進めた結果、炭酸銅、硫酸銅、硫
化銅、酸化銅及び塩化銅の少なくとも1種と
SiO2及びカオリンの少なくとも1種との混合物、
或いは該混合物に酸化スズを加えた配合物、又は
該混合物にパラジウム、酸化バラジウム及び塩化
白金の少なくとも1種を加えた配合物をセラミク
スの被覆材として使用する場合には、比較的低温
下の簡易な工程により接着強度、耐熱衝撃性、耐
化学薬品性、導電性等の諸物性に優れたメタライ
ズ層がセラミクス上に形成されることを見出し、
これ等の知見に基く発明についですでに特許出願
済である(特開昭59―207887号、特開昭60―
21888号、特開昭61―86488号、特開昭61―146778
号)。
問題点を解決するための手段
本発明者は、セラミクスのメタライズ法につき
更に研究を進めた結果、炭酸銅等の銅化合物、
SiO2及びカオリンの少なくとも1種並びに希土
類元素及びその化合物の少なくとも1種からなる
混合物をセラミクスの被覆材として使用する場合
には、やはり低温下での簡易な操作により各種の
物性に優れたメタライズ層が得られることを見出
した。即ち、本発明は、(i)炭酸銅、硫酸銅、硫化
銅、酸化銅及び塩化銅の少なくとも1種、(ii)
SiO2及びカオリンの少なくとも1種、並びに(iii)
希土類元素及びその化合物の少なくとも1種から
なる混合物をセラミクス表面に付与し、酸化性雰
囲気中900〜1300℃で焼付けた後、焼付け層を還
元処理することを特徴とするセラミクスのメタラ
イズ法に係る。
本発明において被覆材として使用する炭酸銅、
硫酸銅、硫化銅、酸化銅及び塩化銅は、いずれも
通常粉末の形態で用いる。粉末の粒度は、特に限
定されないが、通常100μm以下より好ましくは
50μm以下である。
SiO2及びカオリンも、粉末として使用するこ
とが好ましく、その粒度は、上記化合物の場合と
同様である。
本発明において被覆材の他の成分として使用す
る希土類元素は、スカンジウム(原子番号21)、
イツトリウム(原子番号39)及び原子番号57から
71にいたる15元素の計17元素である。これ等は、
La、Ce、Pr、Nd、Pm及びSmからなるセリウ
ム族希土類元素とそれ以外のものからなるイツト
リウム族希土類元素とに分類されるが、セリウム
族希土類元素の方が、メタライズ層の接着強度等
の物性をより大きく向上させるので、より好まし
い。希土類元素は、炭酸塩、シユウ酸塩、リン酸
塩、硝酸塩、硫酸塩、酸化物、水酸化物、過酸化
物、ハロゲン化物、硫化物等の化合物の形態で使
用しても良い。希土類元素は及びその化合物も、
粉末として使用することが好ましく、その粒度も
前記銅化合物の場合と同様である。尚、希土類元
素は、化学的性質が極めてよく似ており、本発明
においてもそれぞれがほぼ同様な効果を奏する。
従つて、希土類元素源としては、モナザイト等の
混合鉱物を使用することが出来る。
本発明被覆材における各成分の使用割合は、炭
酸銅、硫酸銅、硫化銅、酸化銅及び塩化銅の少な
くとも1種80〜30重量%程度、SiO2及びカオリ
ンの少なくとも1種5〜30重量%程度(好ましく
は7〜20重量%)、希土類元素及びその化合物の
少なくとも1種10〜60重量%程度(好ましくは20
〜50重量%)とするのが適当である。SiO2及
び/又はカオリンが5重量%未満の場合には、メ
タライズ層表面の平滑性及び光沢が不充分となる
ことがあり、一方30重量%を上回る場合には、メ
タライズ層の導電性が低下する傾向がある。希土
類元素及びその化合物の少なくとも1種が10重量
%未満又は60重量%を上回る場合には、メタライ
ズ層の接着強度が充分に向上しないので、いずれ
も好ましくない。
本発明方法は、通常以下の様にして実施され
る。上記の組成を有する被覆材を粉末状態で又は
ペースト化して、メタライズ層を形成すべきセラ
ミクス表面に撒布又は塗布する。ペースト化する
場合には、粉末混合物に適当にバインダー及びそ
の溶剤、例えばバルサム及びスクリーンオイル等
を適量加えればよい。セラミクスに対する付与量
は、特に限定されず、所望のメタライズ層の厚さ
に応じて適宜決定される。次いで、被覆材を付与
されたセラミクスを酸化性雰囲気中で加熱し、被
覆層を焼付ける。酸化性雰囲気としては、特に限
定されないが、特殊なものを使用する必要はな
く、空気、空気と窒素との混合気等を使用すれば
よい。加熱条件は、セラミクスの形状及び寸法、
被覆材の組成及び付与量等により変り得るが、通
常900〜1300℃程度で5〜60分間程度加熱する。
かくして、酸化銅以外の銅化合物は酸化銅とな
り、希土類元素及び/又はその化合物は酸化物と
なつて、酸化銅及び希土類元素酸化物を主体とし
且つSiO2及び/又はカオリン粉末を含有する被
膜がセラミクスに密着する。この際、酸化銅の融
液の一部がセラミクス内に浸透するので、得られ
るメタライズ層の接着強度が向上する。又、希土
類元素及び/又はその化合物の併用により、メタ
ライズ層の接着強度が著るしく改善させるのみな
らず、耐化学薬品性も大きく改善される。更に、
SiO2及び/又はカオリンの使用により、メタラ
イズ層の均一性、表面の平滑性及び光沢が著るし
く高められる。加熱温度が900℃未満の場合には、
セラミクス内への酸化銅融液の浸透が充分でない
為、接着強度が不充分となり、一方1300℃を上回
る場合には、被覆層の粘性が低下して、流出する
危険性がある。
次いで、上記の如くして焼付け層を形成された
セラミクスを還元処理する。還元方法は、酸化銅
及び希土類元素化合物が銅及び希土類元素に還元
されるならば、特に限定されない。代表的な還元
処理方法としては、水素雰囲気、一酸化炭素雰囲
気等の還元性雰囲気中での加熱、エタノール、メ
タノール、プロパノール等のアルコール類への浸
漬、石油ベンジン、ホルムアルデヒド等の還元性
溶媒への浸漬、ジメチルアミンボラン水溶液への
浸漬等を挙げることができる。還元性雰囲気中で
加熱する場合の温度は、焼付け層の分解、変質等
を防ぐために前記焼付け温度よりも低いことが好
ましく、通常200〜900℃程度とし、時間は通常5
〜60分間程度とする。また、還元性溶媒への浸漬
による場合は、セラミクスを通常200〜500℃程度
好ましくは300℃前後に加熱後上記還元性溶媒に
10〜60秒程度浸漬すれば良い。また、ジメチルア
ミンボラン水溶液への浸漬による場合は、セラミ
クスを通常40〜60℃程度に加熱後、該水溶液に10
〜60秒間浸漬すれば良い。
上記還元処理により極めて優れた導電性を有す
る銅―希土類元素からなるメタライズ層がセラミ
クス表面に形成される。
斯くしてメタライズされたセラミクスには、必
要に応じて、常法例えばロウ接等により、各種金
属を容易に接合することができる。
本発明によりメタライズできるセラミクスとし
ては、特に限定されず、例えば窒化珪素、サイア
ロン、炭化珪素、窒化アルミニウム等の非酸化物
系セラミクス、アルミナ、ジルコニア、ムライ
ト、ベリリア、マグネシア、コージライト等の酸
化物系セラミクスを挙げることができる。
発明の効果
本発明によれば、従来法に比べて低温で焼付け
後、還元処理するという極めて簡便な操作で、セ
ラミクス表面にメタライズ層が形成できる。得ら
れたメタライズ層は、導電性に優れ且つ接着強度
及び耐化学薬品性が極めて高く、またメタライズ
層の均一性、特に表面の平滑性及び光沢に優れて
いるので、商品価値が高い。
本発明によりメタライズされたセラミクスは、
上記の如き性能を有するので、セラミクスパツケ
ージ、IC基板のプリント配線等の電子部品、セ
ラミクスを用いた耐摩耗性部品、耐熱性部品等に
好適に使用できる。
実施例
以下、実施例を挙げて、本発明を更に具体的に
説明する。
実施例 1
酸化銅粉末70重量部に対してSiO210重量部、
Nd2O320重量部及びバルサム10重量部を混合して
ペースト状とし、これを平板正方形の窒化珪素、
サイアロン、炭化珪素、アルミナ及びジルコニア
の夫々の焼結体の表面に0.1g/cm2塗布した。次
いで、電気炉を用いて空気中にて各焼結体を1100
℃で30分間焼成し、焼付け被覆層を形成した。引
続き焼成したものを乾燥器中で60℃で加熱した
後、ジメチルアミンボランの5%溶液中に浸漬し
た。これによつて焼付け被覆層が還元され、金属
銅のメタライズ層が形成された。下記第1表に還
元前後における電気抵抗値(電圧1000V)を示
す。還元後のメタライズ層は、極めて優れた導電
性を有していることが明らかである。
かくして得たメタライズ層を有する各セラミク
スと銅片とを銀ロウを用いてロウ接し、秤量
2ton、及び荷重速度5mm/minの引張試験機を用
いて、メタライズ層の接着強度を測定したとこ
ろ、第1表に示す如く、いずれも極めて強く接着
されていることが判明した。
INDUSTRIAL APPLICATION FIELD The present invention relates to a method for metallizing ceramics. Conventional technology and its problems Although ceramics generally have excellent heat resistance, abrasion resistance, and insulation properties, they have poor impact resistance, so they are often used as structural materials in conjunction with metals. . When joining ceramics and metal, it is necessary to metalize the surface of the ceramic in advance, and when using ceramic as a conductive material, the surface must also be metalized. As methods for metallizing ceramics, the Telefunken method, active metal method, hydride compound method, oxide solder method, silver carbonate method, etc. are known, but methods other than the Telefunken method are rarely used. This is because not only the process is complicated, but also the adhesive strength, thermal shock resistance, chemical resistance, etc. of the obtained metallized layer are often insufficient.
In the currently commonly used Telefunken method, the ceramic surface is coated with molybdenum-manganese, baked at a high temperature of about 1400 to 1700°C in a non-oxidizing atmosphere, and then metal plated.
Then, by heating again in a non-oxidizing atmosphere, a stabilized metallized layer is formed.
However, this method also requires a complicated multi-step process and has drawbacks such as high heating temperature. As a result of conducting research to eliminate the above-mentioned drawbacks of the prior art, the present inventors discovered that at least one of copper carbonate, copper sulfate, copper sulfide, copper oxide, and copper chloride.
A mixture with at least one of SiO 2 and kaolin,
Alternatively, when using a compound obtained by adding tin oxide to the above mixture, or a compound obtained by adding at least one of palladium, palladium oxide, and platinum chloride to the above mixture as a coating material for ceramics, it is possible to use a simple method at a relatively low temperature. discovered that a metallized layer with excellent physical properties such as adhesive strength, thermal shock resistance, chemical resistance, and electrical conductivity could be formed on ceramics through a process that
Patent applications have already been filed for inventions based on these findings (JP-A-59-207887, JP-A-60-
No. 21888, JP-A-61-86488, JP-A-61-146778
issue). Means for Solving the Problems As a result of further research into metallization methods for ceramics, the present inventor discovered that copper compounds such as copper carbonate,
When using a mixture consisting of at least one of SiO 2 and kaolin and at least one of rare earth elements and their compounds as a coating material for ceramics, it is possible to use a metallized layer with excellent physical properties that can be easily operated at low temperatures. was found to be obtained. That is, the present invention provides (i) at least one of copper carbonate, copper sulfate, copper sulfide, copper oxide, and copper chloride; (ii)
at least one of SiO 2 and kaolin, and (iii)
The present invention relates to a method for metallizing ceramics, which is characterized in that a mixture consisting of at least one rare earth element and its compound is applied to the surface of ceramics, baked at 900 to 1300°C in an oxidizing atmosphere, and then the baked layer is subjected to reduction treatment. Copper carbonate used as a coating material in the present invention,
Copper sulfate, copper sulfide, copper oxide and copper chloride are all usually used in powder form. The particle size of the powder is not particularly limited, but is usually less than 100 μm, preferably
It is 50μm or less. SiO 2 and kaolin are also preferably used as powders, the particle size of which is similar to that of the above compounds. The rare earth elements used as other components of the coating material in the present invention include scandium (atomic number 21),
Yztrium (atomic number 39) and from atomic number 57
There are 15 elements, totaling 17 elements. These are
It is classified into cerium group rare earth elements consisting of La, Ce, Pr, Nd, Pm and Sm and yttrium group rare earth elements consisting of other elements, but cerium group rare earth elements have higher adhesive strength etc. of metallized layer. It is more preferable because it improves the physical properties to a greater extent. Rare earth elements may be used in the form of compounds such as carbonates, oxalates, phosphates, nitrates, sulfates, oxides, hydroxides, peroxides, halides, and sulfides. Rare earth elements and their compounds are
It is preferable to use it as a powder, and its particle size is also the same as that of the copper compound. Incidentally, the chemical properties of rare earth elements are very similar, and in the present invention, each of them has almost the same effect.
Therefore, mixed minerals such as monazite can be used as the rare earth element source. The proportion of each component used in the coating material of the present invention is approximately 80 to 30% by weight of at least one of copper carbonate, copper sulfate, copper sulfide, copper oxide, and copper chloride, and 5 to 30% by weight of at least one of SiO 2 and kaolin. (preferably 7 to 20% by weight), at least one of rare earth elements and their compounds, about 10 to 60% by weight (preferably 20% by weight)
~50% by weight) is appropriate. If SiO 2 and/or kaolin is less than 5% by weight, the surface smoothness and gloss of the metallized layer may become insufficient, while if it exceeds 30% by weight, the conductivity of the metallized layer will decrease. There is a tendency to If the content of at least one of the rare earth elements and their compounds is less than 10% by weight or more than 60% by weight, the adhesive strength of the metallized layer will not be sufficiently improved, so either is not preferred. The method of the present invention is usually carried out as follows. The coating material having the above composition is sprinkled or applied in powder form or in the form of a paste onto the ceramic surface on which the metallized layer is to be formed. In the case of making a paste, an appropriate amount of a binder and its solvent, such as balsam and screen oil, may be added to the powder mixture. The amount applied to ceramics is not particularly limited, and is appropriately determined depending on the desired thickness of the metallized layer. Next, the ceramic coated with the coating material is heated in an oxidizing atmosphere to bake the coating layer. The oxidizing atmosphere is not particularly limited, but there is no need to use a special atmosphere, and air, a mixture of air and nitrogen, or the like may be used. The heating conditions depend on the shape and dimensions of the ceramics,
Although it may vary depending on the composition of the coating material and the amount applied, it is usually heated at about 900 to 1300°C for about 5 to 60 minutes.
In this way, copper compounds other than copper oxide become copper oxide, rare earth elements and/or their compounds become oxides, and a coating mainly composed of copper oxide and rare earth element oxides and containing SiO 2 and/or kaolin powder is formed. Adheres to ceramics. At this time, a portion of the copper oxide melt permeates into the ceramics, thereby improving the adhesive strength of the resulting metallized layer. In addition, the combined use of rare earth elements and/or their compounds not only significantly improves the adhesive strength of the metallized layer, but also greatly improves chemical resistance. Furthermore,
The use of SiO 2 and/or kaolin significantly increases the homogeneity, surface smoothness and gloss of the metallization layer. If the heating temperature is less than 900℃,
Since the penetration of the copper oxide melt into the ceramic is insufficient, the adhesive strength is insufficient. On the other hand, if the temperature exceeds 1300°C, the viscosity of the coating layer decreases and there is a risk of it flowing out. Next, the ceramic on which the baked layer has been formed as described above is subjected to a reduction treatment. The reduction method is not particularly limited as long as the copper oxide and rare earth element compound is reduced to copper and rare earth element. Typical reduction treatment methods include heating in a reducing atmosphere such as a hydrogen atmosphere or carbon monoxide atmosphere, immersion in an alcohol such as ethanol, methanol, or propanol, or immersion in a reducing solvent such as petroleum benzine or formaldehyde. Examples include immersion, immersion in a dimethylamine borane aqueous solution, and the like. When heating in a reducing atmosphere, the temperature is preferably lower than the baking temperature to prevent decomposition and alteration of the baked layer, and is usually about 200 to 900°C, and the time is usually about 5.
~60 minutes. In addition, in the case of immersion in a reducing solvent, the ceramic is usually heated to about 200 to 500°C, preferably around 300°C, and then soaked in the reducing solvent.
Just soak it for about 10 to 60 seconds. In addition, in the case of immersion in a dimethylamine borane aqueous solution, the ceramic is usually heated to about 40 to 60°C, and then immersed in the aqueous solution for 10 minutes.
Just soak for ~60 seconds. By the above reduction treatment, a metallized layer made of copper and rare earth elements having extremely excellent conductivity is formed on the ceramic surface. If necessary, various metals can be easily joined to the thus metallized ceramics by conventional methods such as brazing. Ceramics that can be metallized according to the present invention are not particularly limited, and include non-oxide ceramics such as silicon nitride, sialon, silicon carbide, and aluminum nitride, and oxide ceramics such as alumina, zirconia, mullite, beryllia, magnesia, and cordierite. Ceramics can be mentioned. Effects of the Invention According to the present invention, a metallized layer can be formed on a ceramic surface by an extremely simple operation of baking at a lower temperature and then performing a reduction treatment than in the conventional method. The obtained metallized layer has excellent conductivity, extremely high adhesive strength and chemical resistance, and is also excellent in uniformity, particularly surface smoothness and gloss, so it has high commercial value. The ceramics metallized according to the present invention are
Since it has the above-mentioned performance, it can be suitably used for ceramic package, electronic parts such as printed wiring of IC boards, wear-resistant parts using ceramics, heat-resistant parts, etc. Examples Hereinafter, the present invention will be explained in more detail with reference to Examples. Example 1 10 parts by weight of SiO 2 to 70 parts by weight of copper oxide powder,
20 parts by weight of Nd 2 O 3 and 10 parts by weight of balsam are mixed to form a paste, and this is made into a flat square silicon nitride,
A coating of 0.1 g/cm 2 was applied to the surface of each sintered body of sialon, silicon carbide, alumina, and zirconia. Next, each sintered body was heated to 1100 ml in air using an electric furnace.
It was baked at ℃ for 30 minutes to form a baked coating layer. The calcined material was then heated in a dryer at 60 DEG C. and then immersed in a 5% solution of dimethylamine borane. This reduced the baked coating layer and formed a metallized layer of metallic copper. Table 1 below shows the electrical resistance values (voltage 1000V) before and after reduction. It is clear that the metallized layer after reduction has extremely good electrical conductivity. Each ceramic having a metallized layer thus obtained and a copper piece were soldered using silver solder, and weighed.
The adhesion strength of the metallized layer was measured using a tensile testing machine with a load of 2 tons and a loading rate of 5 mm/min, and as shown in Table 1, it was found that the adhesion was extremely strong in both cases.
【表】
比較例 1
実施例1において、Nd2O3を使用しない以外は
同様にしてメタライズ層を有する各セラミクスを
得てメタライズ層の接着強度を測定した。焼付け
層の還元前後における電気抵抗値および接着強度
の測定結果を下記第2表に示す。[Table] Comparative Example 1 Each ceramic having a metallized layer was obtained in the same manner as in Example 1 except that Nd 2 O 3 was not used, and the adhesive strength of the metallized layer was measured. The measurement results of the electrical resistance value and adhesive strength of the baked layer before and after reduction are shown in Table 2 below.
【表】
第1表及び第2表に示す結果から、本発明の希
土類化合物を用いた方法によるメタライズ層は、
希土類化合物を用いなかつたものに比して強い接
着強度を有することが明白である。[Table] From the results shown in Tables 1 and 2, the metallized layer formed by the method using the rare earth compound of the present invention is
It is clear that the adhesive strength is stronger than that without using the rare earth compound.
Claims (1)
銅の少なくとも1種、(ii)SiO2及びカオリンの少
なくとも1種、並びに(iii)希土類元素及びその化合
物の少なくとも1種からなる混合物をセラミクス
表面に付与し、酸化性雰囲気中900〜1300℃で焼
付けた後、焼付け層を還元処理することを特徴と
するセラミクスのメタライズ法。1 Consists of (i) at least one of copper carbonate, copper sulfate, copper sulfide, copper oxide and copper chloride, (ii) at least one of SiO 2 and kaolin, and (iii) at least one of rare earth elements and their compounds. A ceramic metallization method characterized by applying a mixture to a ceramic surface, baking it at 900 to 1300°C in an oxidizing atmosphere, and then subjecting the baked layer to a reduction treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5284385A JPH0227310B2 (en) | 1985-03-15 | 1985-03-15 | SERAMIKUSUNOMETARAIZUHO |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5284385A JPH0227310B2 (en) | 1985-03-15 | 1985-03-15 | SERAMIKUSUNOMETARAIZUHO |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61215280A JPS61215280A (en) | 1986-09-25 |
| JPH0227310B2 true JPH0227310B2 (en) | 1990-06-15 |
Family
ID=12926123
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5284385A Expired - Lifetime JPH0227310B2 (en) | 1985-03-15 | 1985-03-15 | SERAMIKUSUNOMETARAIZUHO |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0227310B2 (en) |
-
1985
- 1985-03-15 JP JP5284385A patent/JPH0227310B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61215280A (en) | 1986-09-25 |
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