JPS6410471B2 - - Google Patents
Info
- Publication number
- JPS6410471B2 JPS6410471B2 JP16076887A JP16076887A JPS6410471B2 JP S6410471 B2 JPS6410471 B2 JP S6410471B2 JP 16076887 A JP16076887 A JP 16076887A JP 16076887 A JP16076887 A JP 16076887A JP S6410471 B2 JPS6410471 B2 JP S6410471B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- ceramics
- ceramic
- metallic
- metallized layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000919 ceramic Substances 0.000 claims description 39
- 238000000034 method Methods 0.000 claims description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 15
- 229910052802 copper Inorganic materials 0.000 claims description 15
- 239000010949 copper Substances 0.000 claims description 15
- 239000000203 mixture Substances 0.000 claims description 15
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 14
- 239000005751 Copper oxide Substances 0.000 claims description 12
- 229910000431 copper oxide Inorganic materials 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 11
- 239000004332 silver Substances 0.000 claims description 11
- OMZSGWSJDCOLKM-UHFFFAOYSA-N copper(II) sulfide Chemical compound [S-2].[Cu+2] OMZSGWSJDCOLKM-UHFFFAOYSA-N 0.000 claims description 10
- 230000001590 oxidative effect Effects 0.000 claims description 8
- 239000010410 layer Substances 0.000 description 26
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 14
- 239000011247 coating layer Substances 0.000 description 12
- 239000000853 adhesive Substances 0.000 description 11
- 230000001070 adhesive effect Effects 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 8
- 239000005749 Copper compound Substances 0.000 description 5
- 150000001880 copper compounds Chemical class 0.000 description 5
- 239000000843 powder Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- 235000007173 Abies balsamea Nutrition 0.000 description 3
- 239000004857 Balsam Substances 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 244000018716 Impatiens biflora Species 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- LTPBRCUWZOMYOC-UHFFFAOYSA-N Beryllium oxide Chemical compound O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- -1 sialon Chemical compound 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 229910001923 silver oxide Inorganic materials 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- ZXSQEZNORDWBGZ-UHFFFAOYSA-N 1,3-dihydropyrrolo[2,3-b]pyridin-2-one Chemical compound C1=CN=C2NC(=O)CC2=C1 ZXSQEZNORDWBGZ-UHFFFAOYSA-N 0.000 description 1
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- VCUFZILGIRCDQQ-KRWDZBQOSA-N N-[[(5S)-2-oxo-3-(2-oxo-3H-1,3-benzoxazol-6-yl)-1,3-oxazolidin-5-yl]methyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical group O=C1O[C@H](CN1C1=CC2=C(NC(O2)=O)C=C1)CNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F VCUFZILGIRCDQQ-KRWDZBQOSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- PCEXQRKSUSSDFT-UHFFFAOYSA-N [Mn].[Mo] Chemical compound [Mn].[Mo] PCEXQRKSUSSDFT-UHFFFAOYSA-N 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- YCKOAAUKSGOOJH-UHFFFAOYSA-N copper silver Chemical compound [Cu].[Ag].[Ag] YCKOAAUKSGOOJH-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 229910052863 mullite Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 1
- 239000011225 non-oxide ceramic Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- BDTUSRNSKHCUSO-UHFFFAOYSA-N oxocopper oxosilver Chemical compound O=[Cu].O=[Ag] BDTUSRNSKHCUSO-UHFFFAOYSA-N 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- LKZMBDSASOBTPN-UHFFFAOYSA-L silver carbonate Substances [Ag].[O-]C([O-])=O LKZMBDSASOBTPN-UHFFFAOYSA-L 0.000 description 1
- 229910001958 silver carbonate Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
Landscapes
- Ceramic Products (AREA)
Description
産業上の利用分野
本発明は、セラミツクスの簡便なメタライズ方
法に関する。
従来の技術とその問題点
一般に、セラミツクスは、耐熱性、耐摩耗性、
絶縁性等に優れている反面、脆く衝撃に弱いた
め、構造材料として用いる場合には、金属との接
合体にして使用されることが多く、この場合には
金属銀とセラミツクスを接合する前に、まずセラ
ミツクス表面をメタライズする必要がある。ま
た、セラミツクスを導電材料として用いる場合に
は、セラミツクス表面にメタライズを行つて使用
されている。
セラミツクスのメタライズ方法としては、テレ
フンケン法、活性金属法、水素化合物法、酸化物
ソルダー法、炭酸銀法等が知られている。これら
の内、テレフンケン法以外の方法には、工程が複
雑であるのに加えて、メタライズ層の接着強度、
耐熱衝撃性、耐化学薬品性等が充分でない場合が
あるため、現在のところテレフンケン法によるの
が一般的である。テレフンケン法は、セラミツク
ス表面にモリブデン−マンガンを被覆し、非酸化
性雰囲気中1400〜1700℃という高温で焼付け、そ
の上に金属メツキを行い、更に被膜の安定化のた
めに再度非酸化性雰囲気中で加熱することにより
メタライズし、次いで必要に応じて金属をロウ接
するものであり、作業工程が長く且つ煩雑である
という大きな欠点があるのに加えて、加熱温度が
高いという欠点もある。
問題点を解決するための手段
本発明者は、上記欠点を解消されたセラミツク
スのメタライズ方法を開発するため鋭意研究した
結果、酸化銅又は(及び)硫化銅を被覆層として
用いるときには空気等の酸化雰囲気中にて比較的
低温で焼付けができ、次いで焼付け層を還元処理
すれば極めて簡便にメタライズできること(尚、
被覆層として硫化銅を単独で用いる方法について
は、別途出願した。)、この際被覆層として金属銀
又は(及び)金属銅を併用するとメタライズ層表
面の平滑性が向上すること、得られたメタライズ
層は導電性に優れ且つ接着強度が高いこと等を見
出し、本発明を完成するに至つた。
即ち本発明は、酸化銅又は(及び)硫化銅と金
属銀又は(及び)金属銅との混合物を、セラミツ
クス表面に被覆し、酸化性雰囲気中900〜1300℃
で加熱して焼付けた後、焼付け層を還元処理する
ことを特徴とするセラミツクスのメタライズ方法
に係る。
本発明において被覆層として用いる酸化銅及
び/又は硫化銅と金属銀及び/又は金属銅との混
合物は、通常粉末状のものを使用する。酸化銅と
硫化銅とを用いるときの両者の使用割合は、任意
で良い。
本発明においては、被覆層として酸化銅又は
(及び)硫化銅(以下、単に銅化合物という)に
金属銀又は(及び)金属銅を併用することにより
メタライズ層表面の平滑性を向上させることがで
きる。金属銀又は(及び)金属銅としても、通常
粉末状のものを使用し、使用割合は、銅化合物と
の合計重量の80%程度を上限とするのが適当であ
る。80重量%を越える場合には、メタライズ層の
接着強度が低下する傾向があるので、好ましくな
い。
本発明における被覆層形成材料としては、銅化
合物と金属銀及び/又は金属銅との混合物を粉末
状のまま使用しても良いし、適当なバインダー及
びその溶剤、例えばスクリーンオイル等の印刷用
インキ、バルサム等の適宜の量用いてペースト状
にして使用しても良い。
粉末状又はペースト状の銅化合物と金属銀及
び/又は金属銅との混合物をメタライズが必要な
セラミツクス表面に撒布又は塗付して被覆する。
被覆する量は、特に限定されず、所望のメタライ
ズ層の厚さに応じて、適宜決定される。次に、上
記で被覆されたセラミツクスを酸化性雰囲気中に
て加熱して被覆層を焼付ける。酸化性雰囲気とし
ては、特殊なものを使用する必要はなく、空気、
空気と窒素との混合気等を使用すれば充分であ
る。また、加熱条件としては、セラミツクスの形
状、大きさや用いた被覆層の種類、被覆量等によ
り変化するが、通常900〜1300℃の温度で5〜60
分間程度加熱する。この加熱によりは酸化銅−酸
化銀(硫化銅、金属銅は酸化されて酸化銅とな
り、金属銀は酸化されて酸化銀となる)を含有し
てなる被覆がセラミツクスに密着する。この際、
酸化銅の融液がセラミツクス内に一部浸透する
(酸化銅を用いたときには、酸化銅に酸化される
際に発生する硫黄が、この浸透を更に助長する)
ことにより接着強度が高められる。加熱温度が
900℃より低い場合は上記のような浸透が起こら
ず接着強度が不充分になり、又1300℃より高い場
合は被覆層の粘性が低下して流出することがある
ので好ましくない。
次に、上記により焼付け層が施されたセラミツ
クスを還元処理する。還元方法としては、特に限
定されず、酸化銅、酸化銀がこれらの金属に還元
されるならばどんな方法でもよく、例えば水素雰
囲気、一酸化炭素雰囲気等の還元性雰囲気中での
加熱、エタノール、メタノール、プロパノール等
のアルコール、ベンジン、ホルマリン等の還元性
溶媒への浸漬等を挙げることができる。還元性雰
囲気中で加熱する場合の温度は、焼付け層の分
解、変質等を防ぐために前記焼付け温度よりも低
いことが好ましく、通常200〜900℃程度とし、時
間は通常5〜60分間程度とする。また還元性溶媒
への浸漬による場合は、セラミツクスを通常200
〜500℃程度好ましくは300℃前後に加熱後、上記
還元性溶媒に10〜60秒間程度浸漬すれば良い。
上記還元処理により、極めて優れた導電性を有
する銅−銀メタライズ層がセラミツクス表面に形
成される。
本発明においては、銅化合物と金属銀及び/又
は金属銅との混合物をセラミツクス表面に付与し
た後、酸化性雰囲気中で焼成し、次いで還元処理
することを必須とする。若し、酸化性雰囲気中で
の焼成を行なうことなく直接還元処理を行なう場
合には、酸化銅の融液がセラミツクス内に深く浸
透しないので、メタライズ層とセラミツクスとの
接着強度が極めて低くなり、実用に供し得ない。
かくしてメタライズされたセラミツクスには、
必要に応じて、常法例えばロウ接等により、各種
金属を容易に接合することができる。
本発明によりメタライズできるセラミツクスと
しては、特に限定されず、例えば窒化珪素、サイ
アロン、炭化珪素、窒化アルミニウム等の非酸化
物セラミツクス、アルミナ、ジルコニア、ムライ
ト、ベリリア、マグネシア、コージーライト等の
酸化物系セラミツクスを挙げることができる。
本発明によれば、従来法に比べて低温で焼付け
後、還元処理するという極めて簡便な操作で、セ
ラミツクス表面にメタライズ層が形成できる。得
られたメタライズ層は、導電性に優れ且つ接着強
度が高く、メタライズ層の平滑性が向上するとい
う効果が得られる。
本発明によりメタライズされたセラミツクス
は、上記の如き性能を有するので、セラミツクス
パツケージ等の電子部品、セラミツクスを用いた
耐磨耗性部品、耐熱性部品等に好適に使用でき
る。
尚、本発明の方法は、ニツケル板、銅板等の金
属板にも応用でき、被覆層を還元すれば強固な保
護膜を得ることができる。
以下、実施例を挙げて、本発明を更に具体的に
説明する。
実施例 1
酸化銅粉末90重量%と金属銀粉末10重量%とを
混合したもの100重量部に対してバルサム10重量
部を混合して、ペースト状の混合物を得た。これ
を平板正方形の窒化珪素(Si3N4)、サイアロン、
炭化珪素(SiC)、アルミナ又はジルコニアの焼
結体の表面に0.1g/cm2塗付した。次に、電気炉を
用い空気中にて1100℃で30分間焼成して、焼付け
被覆層を形成した。引続き焼成したものを乾燥器
中で300℃に加熱した後、市販のエタノール中に
浸漬した。これによつて焼付け被覆層が還元さ
れ、金属銅と金属銀からなるメタライズ層が形成
された。下記第1表に還元前後における、1000V
の電圧で測定した電気抵抗値を示した。還元後の
メタライズ層は、極めて優れた導電性を有してい
ることが判る。
かくして得たメタライズ層を有する各セラミツ
クスと銅片とを銀ロウを用いてロウ接し、秤量
2ton及び荷重速度5mm/minの引張試験機を用い
て、メタライズ層の接着強度を測定したところ、
いずれも極めて強く接着されていることが判つ
た。結果を下記第1表に併記した。
INDUSTRIAL APPLICATION FIELD The present invention relates to a simple method for metallizing ceramics. Conventional technology and its problems In general, ceramics have high heat resistance, wear resistance,
Although it has excellent insulation properties, it is brittle and susceptible to impact, so when used as a structural material, it is often used as a bonded product with metal. First, it is necessary to metalize the ceramic surface. Furthermore, when ceramics are used as a conductive material, the surface of the ceramics is metallized. Known methods for metallizing ceramics include the Telefunken method, the active metal method, the hydride method, the oxide solder method, and the silver carbonate method. Among these methods, methods other than the Telefunken method have complicated processes, as well as the adhesive strength of the metallized layer,
Since thermal shock resistance, chemical resistance, etc. may not be sufficient, the Telefunken method is generally used at present. In the Telefunken method, the ceramic surface is coated with molybdenum-manganese, baked at a high temperature of 1400 to 1700°C in a non-oxidizing atmosphere, plated with metal, and then coated again in a non-oxidizing atmosphere to stabilize the coating. The method involves metallizing by heating the metal, and then brazing the metals as necessary, which has major disadvantages in that the working process is long and complicated, and also in that the heating temperature is high. Means for Solving the Problems As a result of intensive research to develop a ceramic metallization method that eliminates the above-mentioned drawbacks, the present inventor found that when copper oxide or (and) copper sulfide is used as a coating layer, oxidation of air, etc. Baking can be carried out at a relatively low temperature in an atmosphere, and then the baked layer can be subjected to a reduction treatment, making it extremely easy to metallize (in addition,
A separate application has been filed regarding a method of using copper sulfide alone as a coating layer. ), we discovered that when metallic silver or (and) metallic copper is used in combination as a coating layer, the smoothness of the surface of the metallized layer improves, and that the obtained metallized layer has excellent conductivity and high adhesive strength. The invention was completed. That is, the present invention coats a ceramic surface with a mixture of copper oxide or (and) copper sulfide and metallic silver or (and) metallic copper, and heats the ceramic surface at 900 to 1300°C in an oxidizing atmosphere.
The present invention relates to a method for metallizing ceramics, which is characterized in that the baked layer is subjected to a reduction treatment after being heated and baked. The mixture of copper oxide and/or copper sulfide and metallic silver and/or metallic copper used as the coating layer in the present invention is usually in powder form. When using copper oxide and copper sulfide, the ratio of both may be arbitrary. In the present invention, the smoothness of the surface of the metallized layer can be improved by using copper oxide or (and) copper sulfide (hereinafter simply referred to as a copper compound) in combination with metallic silver or (and) metallic copper as a coating layer. . Metallic silver and/or metallic copper are usually used in powder form, and the proportion used is preferably about 80% of the total weight with the copper compound at the upper limit. If it exceeds 80% by weight, the adhesive strength of the metallized layer tends to decrease, which is not preferable. As the material for forming the coating layer in the present invention, a mixture of a copper compound and metallic silver and/or metallic copper may be used in powder form, or a suitable binder and its solvent, such as printing ink such as screen oil, may be used. It may be used in the form of a paste using an appropriate amount of balsam or the like. A mixture of a powdered or paste-like copper compound and metallic silver and/or metallic copper is sprinkled or applied onto the ceramic surface that requires metallization to coat it.
The amount of coating is not particularly limited, and is appropriately determined depending on the desired thickness of the metallized layer. Next, the ceramic coated above is heated in an oxidizing atmosphere to bake the coating layer. There is no need to use a special oxidizing atmosphere; air,
It is sufficient to use a mixture of air and nitrogen. The heating conditions vary depending on the shape and size of the ceramic, the type of coating layer used, the amount of coating, etc., but are usually 900 to 1300℃ and 5 to 60℃.
Heat for about a minute. By this heating, a coating containing copper oxide-silver oxide (copper sulfide, metallic copper is oxidized to become copper oxide, and metallic silver is oxidized to become silver oxide) adheres to the ceramic. On this occasion,
The copper oxide melt partially penetrates into the ceramics (when copper oxide is used, the sulfur generated when it is oxidized to copper oxide further promotes this penetration)
This increases the adhesive strength. heating temperature
If it is lower than 900°C, the above-mentioned penetration will not occur and the adhesive strength will be insufficient, and if it is higher than 1300°C, the viscosity of the coating layer will decrease and it may flow out, which is not preferable. Next, the ceramics on which the baked layer has been applied as described above is subjected to a reduction treatment. The reduction method is not particularly limited, and any method may be used as long as copper oxide and silver oxide are reduced to these metals, such as heating in a reducing atmosphere such as a hydrogen atmosphere or a carbon monoxide atmosphere, ethanol, Examples include immersion in alcohols such as methanol and propanol, and reducing solvents such as benzene and formalin. When heating in a reducing atmosphere, the temperature is preferably lower than the baking temperature to prevent decomposition, alteration, etc. of the baked layer, and is usually about 200 to 900°C, and the time is usually about 5 to 60 minutes. . In addition, when immersing ceramics in reducing solvents, ceramics are usually
After heating to about ~500°C, preferably around 300°C, it may be immersed in the above-mentioned reducing solvent for about 10 to 60 seconds. By the above reduction treatment, a copper-silver metallized layer having extremely excellent conductivity is formed on the ceramic surface. In the present invention, it is essential that a mixture of a copper compound and metallic silver and/or metallic copper be applied to the ceramic surface, then fired in an oxidizing atmosphere, and then subjected to a reduction treatment. If direct reduction treatment is performed without firing in an oxidizing atmosphere, the copper oxide melt will not penetrate deeply into the ceramics, so the adhesive strength between the metallized layer and the ceramics will be extremely low. It cannot be put to practical use. In this way, metallized ceramics have
If necessary, various metals can be easily joined by conventional methods such as brazing. Ceramics that can be metallized according to the present invention are not particularly limited, and include, for example, non-oxide ceramics such as silicon nitride, sialon, silicon carbide, and aluminum nitride, and oxide ceramics such as alumina, zirconia, mullite, beryllia, magnesia, and cordierite. can be mentioned. According to the present invention, a metallized layer can be formed on a ceramic surface by an extremely simple operation of baking at a lower temperature and then performing a reduction treatment compared to conventional methods. The obtained metallized layer has excellent conductivity and high adhesive strength, and the smoothness of the metallized layer is improved. Since the metallized ceramic according to the present invention has the above-mentioned performance, it can be suitably used for electronic parts such as ceramic packages, wear-resistant parts using ceramics, heat-resistant parts, etc. The method of the present invention can also be applied to metal plates such as nickel plates and copper plates, and a strong protective film can be obtained by reducing the coating layer. EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples. Example 1 10 parts by weight of a mixture of 90% by weight copper oxide powder and 10% by weight metal silver powder was mixed with 10 parts by weight of balsam to obtain a paste-like mixture. This is made of flat square silicon nitride (Si 3 N 4 ), sialon,
0.1 g/cm 2 was applied to the surface of a sintered body of silicon carbide (SiC), alumina, or zirconia. Next, it was baked in air at 1100° C. for 30 minutes using an electric furnace to form a baked coating layer. The calcined product was then heated to 300° C. in a dryer and then immersed in commercially available ethanol. As a result, the baked coating layer was reduced, and a metallized layer consisting of metallic copper and metallic silver was formed. Table 1 below shows 1000V before and after reduction.
The electrical resistance value measured at the voltage of It can be seen that the metallized layer after reduction has extremely excellent conductivity. Each ceramic having a metallized layer thus obtained and a copper piece were soldered using silver solder, and weighed.
The adhesive strength of the metallized layer was measured using a tensile tester with a load rate of 2 tons and a loading rate of 5 mm/min.
It was found that both were extremely strongly bonded. The results are also listed in Table 1 below.
【表】
また、メタライズ層表面は凹凸が殆んどなく、
平滑性に優れていた。
実施例 2
硫化銅粉末90重量%と金属銀粉末10重量%とを
混合したもの100重量部に対してバルサム10重量
部を混合して、ペースト状の混合物を得た。これ
を用いて、実施例1と同様にして各セラミツクス
にメタライズ層を形成した。実施例1と同様にし
て測定した電気抵抗値及び接着強度を下記第2表
に示した。[Table] In addition, the surface of the metallized layer has almost no unevenness,
It had excellent smoothness. Example 2 10 parts by weight of a mixture of 90% by weight of copper sulfide powder and 10% by weight of metallic silver powder was mixed with 10 parts by weight of balsam to obtain a paste-like mixture. Using this, a metallized layer was formed on each ceramic in the same manner as in Example 1. The electrical resistance value and adhesive strength measured in the same manner as in Example 1 are shown in Table 2 below.
【表】
また、メタライズ層表面は凹凸が殆んどなく、
平滑性に優れていた。
比較例 1
実施例1と同様にして得た酸化銅粉末と金属銀
粉末とを含むペースト状混合物を実施例1と同様
にして各種のセラミツクス焼結体に塗布した後、
水素−窒素混合物からなる還元性雰囲気中900℃
で30分間焼成した。
かくして得たメタライズ層を有する各セラミツ
クスと銅片とを実施例1と同様にしてロウ接し、
メタライズ層とセラミツクスとの接着強度を測定
したところ、いずれの場合にも50Kg/cm2未満であ
り、実用に供し得ないものであつた。
比較例 2
実施例2と同様にして得た硫化銅粉末と金属銀
粉末とを含むペースト状混合物を実施例1と同様
にして各種のセラミツクス焼結体に塗布した後、
水素−窒素混合物からなる還元性雰囲気中950℃
で30分間焼成した。
かくして得たメタライズ層を有する各セラミツ
クスと銅片とを実施例1と同様にしてロウ接し、
メタライズ層とセラミツクスとの接着強度を測定
したところ、いずれの場合にも50Kg/cm2未満であ
り、実用に供し得ないものであつた。[Table] In addition, the surface of the metallized layer has almost no unevenness,
It had excellent smoothness. Comparative Example 1 A paste mixture containing copper oxide powder and metal silver powder obtained in the same manner as in Example 1 was applied to various ceramic sintered bodies in the same manner as in Example 1, and then
900℃ in a reducing atmosphere consisting of a hydrogen-nitrogen mixture
Baked for 30 minutes. Each ceramic having a metallized layer thus obtained and a copper piece were brazed together in the same manner as in Example 1,
When the adhesive strength between the metallized layer and the ceramics was measured, it was less than 50 Kg/cm 2 in all cases, and could not be put to practical use. Comparative Example 2 A paste mixture containing copper sulfide powder and metal silver powder obtained in the same manner as in Example 2 was applied to various ceramic sintered bodies in the same manner as in Example 1, and then
950℃ in a reducing atmosphere consisting of a hydrogen-nitrogen mixture
Baked for 30 minutes. Each ceramic having a metallized layer thus obtained and a copper piece were brazed together in the same manner as in Example 1,
When the adhesive strength between the metallized layer and the ceramics was measured, it was less than 50 Kg/cm 2 in all cases, and could not be put to practical use.
Claims (1)
び)金属銅との混合物を、セラミツクス表面に被
覆し、酸化性雰囲気中900〜1300℃で加熱して焼
付けた後、焼付け層を還元処理することを特徴と
するセラミツクスのメタライズ方法。1. A mixture of copper oxide or (and) copper sulfide and metallic silver or (and) metallic copper is coated on the ceramic surface, heated and baked at 900 to 1300°C in an oxidizing atmosphere, and then the baked layer is subjected to reduction treatment. A method for metallizing ceramics, which is characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16076887A JPS632874A (en) | 1987-06-27 | 1987-06-27 | Metallization of ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16076887A JPS632874A (en) | 1987-06-27 | 1987-06-27 | Metallization of ceramics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS632874A JPS632874A (en) | 1988-01-07 |
| JPS6410471B2 true JPS6410471B2 (en) | 1989-02-21 |
Family
ID=15722038
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16076887A Granted JPS632874A (en) | 1987-06-27 | 1987-06-27 | Metallization of ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS632874A (en) |
-
1987
- 1987-06-27 JP JP16076887A patent/JPS632874A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS632874A (en) | 1988-01-07 |
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