JPH02276242A - Diffusion furnace device - Google Patents
Diffusion furnace deviceInfo
- Publication number
- JPH02276242A JPH02276242A JP9800489A JP9800489A JPH02276242A JP H02276242 A JPH02276242 A JP H02276242A JP 9800489 A JP9800489 A JP 9800489A JP 9800489 A JP9800489 A JP 9800489A JP H02276242 A JPH02276242 A JP H02276242A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- radiator
- air
- fans
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 title claims description 12
- 239000002351 wastewater Substances 0.000 claims abstract description 3
- 238000001816 cooling Methods 0.000 claims description 5
- 239000000498 cooling water Substances 0.000 abstract description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract 1
- 238000007670 refining Methods 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Landscapes
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は拡散炉装置に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a diffusion furnace apparatus.
従来、半導体装置の製造に用いられる拡散炉装置は、拡
散炉を冷却するためのラジェター用のファンの回転数は
常に一定であり、従って冷却後の排気風量も常に一定で
あった。そのため、拡散炉のヒーター温度の変化により
、冷却後の排気温度はかなり変動していた。Conventionally, in a diffusion furnace apparatus used for manufacturing semiconductor devices, the rotation speed of a radiator fan for cooling the diffusion furnace is always constant, and therefore the exhaust air volume after cooling is also always constant. Therefore, the exhaust gas temperature after cooling fluctuated considerably due to changes in the heater temperature of the diffusion furnace.
上述した従来の拡散炉装置は、排気風量が常に一定で排
気温度が変動するために、室内に排気する場合は、室温
が極部的に変動するため室内全体の温度管理が難しくな
るという問題が生じていた。又、排気された空気を室外
に排気するシステムでは、排気温度の高低にかかわらず
常に同一の風量を室外に捨てるために、捨てた分だけク
リーンエアを精製せねばならず、むだが生じていた。In the conventional diffusion furnace device described above, the exhaust air volume is always constant and the exhaust temperature fluctuates, so when exhausting the air indoors, the room temperature fluctuates locally, making it difficult to control the temperature throughout the room. It was happening. In addition, in systems that exhaust exhausted air outdoors, in order to always discard the same amount of air outdoors regardless of whether the exhaust temperature is high or low, the amount of clean air that is discarded must be purified, resulting in waste. .
本発明の拡散炉装置は、拡散炉ヒーター部からの放熱を
ファンにより強制的にラジェターを通過させ冷却する機
構を持つ拡散炉装置において、ラジェター通過後の空気
の温度またはラジェターからの排水の温度に応じて前記
ファンの回転数を制御するものである。The diffusion furnace device of the present invention is a diffusion furnace device that has a mechanism for forcing the heat radiated from the diffusion furnace heater part to pass through the radiator using a fan to cool it down. The rotation speed of the fan is controlled accordingly.
第１図は本発明の第１の実施例の模式図である。 FIG. 1 is a schematic diagram of a first embodiment of the present invention.
半導体基板処理用の炉芯管１の回りにはヒーター２が巻
かれ、炉芯管１を加熱出来る様に構成さている。又ヒー
ター２の外周部には、冷却用の空気１０が矢印の方向へ
と流れる様な構造となっている。冷却水３は矢印方向に
流れ、途中に熱交換用のラジェター４が取付けられてい
る。空気１０はファン５によって炉体外部より装置内に
入り、ラジェター４を通過して冷却水により冷やされ、
ダクト６から排出される。A heater 2 is wound around a furnace core tube 1 for semiconductor substrate processing, and is configured to heat the furnace core tube 1. Further, the outer circumference of the heater 2 is structured so that cooling air 10 flows in the direction of the arrow. Cooling water 3 flows in the direction of the arrow, and a radiator 4 for heat exchange is attached in the middle. Air 10 enters the device from outside the furnace body by a fan 5, passes through a radiator 4, and is cooled by cooling water.
It is discharged from duct 6.
またファン５の前にはラジェター通過後の空気の温度を
測定出来る温度計７が取付けられており、この温度の信
号を出力することによりファン回転数コントローラ８の
演算機能がその温度に応じた最適な回転数でファンを制
御し、ダクト６への排気量を調整する。In addition, a thermometer 7 that can measure the temperature of the air after passing through the radiator is installed in front of the fan 5, and by outputting this temperature signal, the calculation function of the fan rotation speed controller 8 is adjusted to the optimum temperature according to the temperature. The fan is controlled at a certain rotation speed, and the amount of exhaust air to the duct 6 is adjusted.
このように構成された第１の実施例によれば、排出され
る空気の温度により排気量が調整されるため、従来に比
べ排気量を少くすることができる。According to the first embodiment configured in this manner, the amount of exhaust air is adjusted depending on the temperature of the air to be exhausted, so that the amount of exhaust air can be made smaller than in the past.
第２図は本発明の第２の実施例の模式図である。FIG. 2 is a schematic diagram of a second embodiment of the invention.
この第２の実施例ではラジェターより排出された冷却水
３の水温を水温計９により測定し、その水温に応じてフ
ァン５の回転数を制御するように構成しである。In this second embodiment, the temperature of the cooling water 3 discharged from the radiator is measured by a water thermometer 9, and the rotation speed of the fan 5 is controlled in accordance with the measured water temperature.
この第２の実施例では、冷却水の水温に応じてファンの
回転数を制御するために、第１の実施例の場合と比べ応
答性は悪いが、ファンの回転数の増減が極端でなくなる
ため、ファン５の負荷を低減できる利点がある。In this second embodiment, since the fan rotation speed is controlled according to the temperature of the cooling water, the response is lower than in the first embodiment, but the increase and decrease in the fan rotation speed is not extreme. Therefore, there is an advantage that the load on the fan 5 can be reduced.
以上説明したように本発明は、ファンの回転数をラジェ
ター通過後の空気の温度またはラジェターからの排水の
温度に応じて制御することにより、排気温度及び排気風
量を制御出来るという効果がある。従って室内の温度管
理が容易になると゛共に、クリーンエアの精製量を少く
できる。As explained above, the present invention has the effect that the exhaust temperature and the exhaust air volume can be controlled by controlling the rotation speed of the fan according to the temperature of the air after passing through the radiator or the temperature of the waste water from the radiator. Therefore, indoor temperature control becomes easier, and the amount of purified clean air can be reduced.
第１図及び第２図は本発明の第１及び第２の実施例の模
式図である。
ｌ・・・炉芯管、２・・・ヒーター ３・・・冷却水、
４・・・ラジェター、５・・・ファン、６・・・排気ダ
クト、７・・・温度計、８・・・ファン回転数コントロ
ーラ、９・・・水温計、１０・・・空気。1 and 2 are schematic diagrams of first and second embodiments of the present invention. l...furnace core tube, 2...heater 3...cooling water,
4...Radiator, 5...Fan, 6...Exhaust duct, 7...Thermometer, 8...Fan speed controller, 9...Water temperature gauge, 10...Air.
Claims (1)
ジエターを通過させ冷却する機構を持つ拡散炉装置にお
いて、ラジエター通過後の空気の温度またはラジエター
からの排水の温度に応じて前記ファンの回転数を制御す
ることを特徴とする拡散炉装置。In a diffusion furnace device having a mechanism for forcing heat dissipated from a diffusion furnace heater part to pass through a radiator using a fan for cooling, the number of rotations of the fan is adjusted according to the temperature of air after passing through the radiator or the temperature of waste water from the radiator. A diffusion furnace device characterized by controlling.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9800489A JPH02276242A (en) | 1989-04-17 | 1989-04-17 | Diffusion furnace device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9800489A JPH02276242A (en) | 1989-04-17 | 1989-04-17 | Diffusion furnace device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02276242A true JPH02276242A (en) | 1990-11-13 |
Family
ID=14207566
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9800489A Pending JPH02276242A (en) | 1989-04-17 | 1989-04-17 | Diffusion furnace device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02276242A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS489243U (en) * | 1971-06-15 | 1973-02-01 |
-
1989
- 1989-04-17 JP JP9800489A patent/JPH02276242A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS489243U (en) * | 1971-06-15 | 1973-02-01 |
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