JPH0227723A - Organic solvent drying device - Google Patents
Organic solvent drying deviceInfo
- Publication number
- JPH0227723A JPH0227723A JP17642288A JP17642288A JPH0227723A JP H0227723 A JPH0227723 A JP H0227723A JP 17642288 A JP17642288 A JP 17642288A JP 17642288 A JP17642288 A JP 17642288A JP H0227723 A JPH0227723 A JP H0227723A
- Authority
- JP
- Japan
- Prior art keywords
- organic solvent
- dried
- drying
- article
- paper
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003960 organic solvent Substances 0.000 title claims abstract description 37
- 238000001035 drying Methods 0.000 title claims abstract description 36
- 238000001816 cooling Methods 0.000 claims abstract description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 48
- 239000000463 material Substances 0.000 claims description 10
- 238000010438 heat treatment Methods 0.000 claims description 6
- 238000011084 recovery Methods 0.000 abstract description 2
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 238000010586 diagram Methods 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N methanol Natural products OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Landscapes
- Drying Of Solid Materials (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、箱を伏せたような形状の被乾燥物の乾燥に好
適な、有機溶剤乾燥方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to an organic solvent drying method suitable for drying a material to be dried that has the shape of an upside-down box.
半導体ウェハなどの超晴密洗浄では、最終の乾燥法とし
てＩＰＡベーパなどの有機溶剤による乾燥法を用いてい
る。上記有機溶剤乾燥法は例えばＩＰＡ（イソプロピル
・アルコール）のようなベーパを水分と置換させて乾燥
するもので、一般には第４図に例示するように１石英あ
るいはステンレスなどで作られた乾燥槽２の底部にＩＰ
Ａ３を注入し、上記乾燥槽２の内部に例えばウェハケー
ス１のような被乾燥物を設置し、上記乾燥槽２の底部（
第４図（ａ））または底部と側壁（第４図（ｂ））をヒ
ータ４で加熱しながらＩＰＡのベーパを発生させる。上
記ＩＰＡは通常のメチルあるいはエチルアルコールより
は気化しにくいが、沸点が８２．４℃であるため比較的
気化しゃすく、乾燥槽２内のウェハケース１に付着した
水分を取込んで置換する。水分がＩＰＡに置換されたウ
ェハケース１を乾燥槽２から引出すと、上記乾燥槽２の
上部に設けた冷却部５を通過する際にＩＰＡは被乾燥物
表面から蒸発して乾燥される。In ultra-clear cleaning of semiconductor wafers and the like, a drying method using an organic solvent such as IPA vapor is used as the final drying method. The organic solvent drying method described above is a method of drying by replacing moisture with a vapor such as IPA (isopropyl alcohol).Generally, as shown in Fig. 4, 1 a drying tank made of quartz or stainless steel, 2 IP on the bottom of
A3 is injected, an object to be dried such as a wafer case 1 is placed inside the drying tank 2, and the bottom of the drying tank 2 (
IPA vapor is generated while heating the bottom portion and side walls (FIG. 4(b)) with the heater 4 (FIG. 4(a)). Although the above-mentioned IPA is less likely to vaporize than ordinary methyl or ethyl alcohol, since its boiling point is 82.4° C., it is relatively less likely to vaporize, and takes in and replaces the moisture attached to the wafer case 1 in the drying tank 2. When the wafer case 1 in which the moisture has been replaced with IPA is pulled out from the drying tank 2, the IPA evaporates from the surface of the object to be dried and is dried as it passes through the cooling section 5 provided at the top of the drying tank 2.
上記従来技術は、被乾燥物の形状が例えば箱を逆さまに
伏せたような形状の場合には、上記被簡毒物の内部にま
で有機溶剤のベーパが入り込まないため、有機溶剤の置
換が十分に行われず、したがって、被乾燥物の完全な乾
燥ができないという問題がある。In the conventional technology described above, when the shape of the object to be dried is, for example, a box turned upside down, the organic solvent vapor does not penetrate into the object to be poisoned, so that the organic solvent cannot be replaced sufficiently. Therefore, there is a problem that the material to be dried cannot be completely dried.
乾燥槽内の有機溶剤を加熱し気化させると同時に、被乾
燥物内部を減圧する手段を設けることにより達成される
。This is achieved by providing means for heating and vaporizing the organic solvent in the drying tank and at the same time reducing the pressure inside the material to be dried.
本発明は１箱を逆さまに伏せたような被乾燥物の内部も
、十分に乾燥できる有機溶剤の乾燥装置を得ることを目
的とする６
〔作用〕
有機溶剤のベーパが十分に細部まで到達しにくい形状の
被乾燥物、例えば１箱を逆さまに伏せたような形状の被
乾燥物の場合には、ヒータで間接的に加熱し上昇した有
機溶剤のベーパも、従来技術では上記被乾燥物の内部に
充満する空気や水滴を圧縮するだけであり、上記水分を
有機溶剤のベーパで完全に置換することができない６本
発明は。The purpose of the present invention is to obtain an organic solvent drying device that can sufficiently dry the inside of an object to be dried, such as an upside down box. In the case of a difficult-to-dry object, such as an upside-down box, the organic solvent vapor that rises due to indirect heating with a heater can be removed by conventional techniques. The present invention only compresses the air and water droplets that fill the interior, and cannot completely replace the moisture with organic solvent vapor.
上記被乾燥物の内部に排気装置の排気管先端を導入し、
被乾燥物内部の圧力を減圧することによって、上記被乾
燥物内部で有機溶剤ベーパの流れを生じさせ、上記被乾
燥物内部の隅々まで有機溶剤のベーパを送り込み、有機
溶剤と置換をすることが可能になる。Introduce the tip of the exhaust pipe of the exhaust device into the interior of the material to be dried,
By reducing the pressure inside the object to be dried, a flow of organic solvent vapor is generated inside the object to be dried, and the organic solvent vapor is sent to every corner of the object to be dried to replace the organic solvent. becomes possible.
つぎに本発明の実施例を図面とともに説明する。 Next, embodiments of the present invention will be described with reference to the drawings.
第１図は本発明による有機溶剤乾燥装置の一実施例を示
す説明図、第２図は上記乾燥装置の他の実施例を示す説
明図、第３図（ａ）および（ｂ）は局部的に加圧するこ
とによって、有機溶剤ベーパへの置換を行わせる装置の
例をそれぞれ示す図である。FIG. 1 is an explanatory diagram showing one embodiment of the organic solvent drying device according to the present invention, FIG. 2 is an explanatory diagram showing another embodiment of the above-mentioned drying device, and FIGS. 3(a) and (b) are FIG. 3 is a diagram illustrating an example of an apparatus that replaces an organic solvent with vapor by applying pressure to the organic solvent.
第１図において、乾燥槽２は底部に加熱用ヒータ４を備
えて、有機溶剤、例えばイソプロピルアルコール（ＩＰ
Ａ）３を注入するとともに、開口部近傍に冷却管５を設
けている。上記乾燥槽２の内部には被乾燥物１例えば箱
を逆さまに伏せたような形状の被乾燥物ｌＯが設置され
ている。第１図に示す実施例では、水流ポンプ（アスピ
レータ）７、流量調整バルブ８および回収タンク６から
なる排気装置の、排気管１１の先端を、上記被乾燥物Ｉ
Ｏの内側に導いている。上記排気装置は流量調整バルブ
８により、Ｎつまたは高圧空気をアスピレータ７の内部
細管から噴射させ、排気管１１の先端を減圧すもので、
このようにして減圧すると、矢印で示すような有機溶剤
のベーパの流れを生じ。In FIG. 1, a drying tank 2 is equipped with a heater 4 at the bottom and is used to dry organic solvents such as isopropyl alcohol (IP).
A) 3 is injected, and a cooling pipe 5 is provided near the opening. Inside the drying tank 2, an object to be dried 1, for example, an object to be dried 1O shaped like an upside down box is installed. In the embodiment shown in FIG. 1, the tip of an exhaust pipe 11 of an exhaust system consisting of a water pump (aspirator) 7, a flow rate adjustment valve 8, and a recovery tank 6 is connected to the drying material I
It leads to the inside of O. The above exhaust device injects N or high-pressure air from the internal thin tube of the aspirator 7 using the flow rate adjustment valve 8 to reduce the pressure at the tip of the exhaust pipe 11.
When the pressure is reduced in this way, organic solvent vapor flows as shown by the arrow.
上記被乾燥物の内部が有機溶剤のベーパに置換され、冷
却コイル５の間を通過する際に完全に乾燥する。上記減
圧は数ａｔｍ程度でよい。The interior of the object to be dried is replaced with organic solvent vapor and is completely dried when passing between the cooling coils 5. The above-mentioned reduced pressure may be about several atm.
第２図に示す他の実施例は、被乾燥物１０の内部に導入
された排気管１１を直接ポンプ９で吸引して排気を行う
例であって、上記実施例と同様に被乾燥物１０が減圧さ
れることにより、矢印で示すような有機溶剤のベーパの
流れを生じて有機溶剤ベーパの置換が行われて、乾燥す
る。Another embodiment shown in FIG. 2 is an example in which the exhaust pipe 11 introduced into the material to be dried 10 is directly suctioned by the pump 9 to exhaust the material, and similarly to the above embodiment, the material to be dried is When the pressure is reduced, organic solvent vapor flows as shown by the arrow, replacing the organic solvent vapor and drying.
なお、上記実施例では被乾燥物１０の内部で有機溶剤ベ
ーパの置換を生じさせるために、上記被乾燥物１０の内
部を減圧したが、第３図（ａ）および（ｂ）に示すよう
に、ノズル１２の先端を加圧する方法も考えられるが、
上記乾燥槽２における内圧上昇の危険性があり、また、
加圧された有機溶剤ベーパの噴射によってベーパ気流に
乱れを発生し。In the above example, the pressure inside the object to be dried 10 was reduced in order to cause the organic solvent vapor to be replaced inside the object to be dried, but as shown in FIGS. 3(a) and (b), , a method of pressurizing the tip of the nozzle 12 is also considered,
There is a risk of an increase in internal pressure in the drying tank 2, and
The injection of pressurized organic solvent vapor creates turbulence in the vapor flow.
乾燥槽２の外部に有機溶剤ベーパが溢れ出し１作業環境
の汚染や爆発を生じる危険性があり、好ましくない。This is undesirable since organic solvent vapor overflows outside the drying tank 2 and may contaminate the working environment or cause an explosion.
上記のように本発明による有機溶剤乾燥装置は、内部に
被乾燥物を設置した乾燥槽の、加熱装置を備えた底部に
イソプロピルアルコール（ＩＰＡ）のような有機溶剤を
注入し、上記乾燥槽の開口部近傍に冷却コイルを設けた
有機溶剤乾燥装置において、上記被乾燥物の内部に、排
気装置の排気管を導入したことにより、従来は完全な乾
燥が困難であった、箱を逆さまに伏せたような形状の被
乾燥物の内部でも、減圧による有機溶剤ベーパの流れを
生じ、それにより、上記被乾燥物内部で有機溶剤ベーパ
への置換が行われ、十分な乾燥を行うことが可能である
。As described above, the organic solvent drying apparatus according to the present invention injects an organic solvent such as isopropyl alcohol (IPA) into the bottom of the drying tank in which the material to be dried is installed and is equipped with a heating device. In an organic solvent drying device with a cooling coil installed near the opening, the exhaust pipe of the exhaust device is introduced inside the object to be dried, making it possible to place the box upside down, which was previously difficult to dry completely. Even inside the object to be dried, which has a shape like this, a flow of organic solvent vapor occurs due to the reduced pressure, and as a result, the inside of the object to be dried is replaced with organic solvent vapor, making it possible to perform sufficient drying. be.
第１図は本発明による有機溶剤乾燥装置の一実施例を示
す説明図、第２図は上記乾燥装置の他の実施例を示す説
明図、第３図（ａ）および（ｂ）は局部的に加圧する装
置の例をそれぞれ示す図、第４図（ａ）および（ｂ）は
従来のＩＰＡベーパ乾燥装置をそれぞれ示す説明図であ
る。
２・・・乾燥槽
３・・・有機溶剤、例えばイソプロピルアルコール（Ｉ
ＰＡ）
４・・・加熱装置 ５・・・冷却コイル】０・
・被乾燥物 １１・・・排気管第
代理人弁理士 中 村 純之助
１Ｍ＃、ｉ賦を
第
２図FIG. 1 is an explanatory diagram showing one embodiment of the organic solvent drying device according to the present invention, FIG. 2 is an explanatory diagram showing another embodiment of the above-mentioned drying device, and FIGS. 3(a) and (b) are FIGS. 4(a) and 4(b) are explanatory diagrams showing conventional IPA vapor drying apparatuses, respectively. 2...Drying tank 3...Organic solvent, such as isopropyl alcohol (I
PA) 4...Heating device 5...Cooling coil】0・
・Things to be dried 11...Exhaust pipe representative patent attorney Junnosuke Nakamura 1M#, i installment in Figure 2
Claims (1)
えた底部にイソプロピルアルコール（ＩＰＡ）のような
有機溶剤を注入し、上記乾燥槽の開口部近傍に冷却コイ
ルを設けた有機溶剤乾燥装置において、上記被乾燥物の
内部に、排気装置の排気管を導入したことを特徴とする
有機溶剤乾燥装置。1. An organic solvent such as isopropyl alcohol (IPA) is injected into the bottom of a drying tank with a heating device in which the material to be dried is installed, and a cooling coil is installed near the opening of the drying tank. An organic solvent drying device characterized in that an exhaust pipe of an exhaust device is introduced into the interior of the object to be dried.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17642288A JPH0227723A (en) | 1988-07-15 | 1988-07-15 | Organic solvent drying device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17642288A JPH0227723A (en) | 1988-07-15 | 1988-07-15 | Organic solvent drying device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0227723A true JPH0227723A (en) | 1990-01-30 |
Family
ID=16013423
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17642288A Pending JPH0227723A (en) | 1988-07-15 | 1988-07-15 | Organic solvent drying device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0227723A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5520744A (en) * | 1993-05-17 | 1996-05-28 | Dainippon Screen Manufacturing Co., Ltd. | Device for rinsing and drying substrate |
| JP2021109996A (en) * | 2020-01-08 | 2021-08-02 | 凸版印刷株式会社 | Tungsten blank and method for manufacturing tungsten processed product |
-
1988
- 1988-07-15 JP JP17642288A patent/JPH0227723A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5520744A (en) * | 1993-05-17 | 1996-05-28 | Dainippon Screen Manufacturing Co., Ltd. | Device for rinsing and drying substrate |
| JP2021109996A (en) * | 2020-01-08 | 2021-08-02 | 凸版印刷株式会社 | Tungsten blank and method for manufacturing tungsten processed product |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100335322B1 (en) | Processing method such as semiconductor wafer and processing device therefor | |
| US5968285A (en) | Methods for drying and cleaning of objects using aerosols and inert gases | |
| US8640359B2 (en) | Substrate treating apparatus and substrate treating method | |
| US6270584B1 (en) | Apparatus for drying and cleaning objects using controlled aerosols and gases | |
| US5964958A (en) | Methods for drying and cleaning objects using aerosols | |
| JP6801926B2 (en) | Substrate processing method and substrate processing equipment | |
| KR100480588B1 (en) | Drying method of semiconductor device by using vacuum dryer | |
| JP6623077B2 (en) | Substrate processing apparatus and substrate processing method | |
| JPH0227723A (en) | Organic solvent drying device | |
| JP2000517111A (en) | Alcohol steam dryer | |
| KR100730449B1 (en) | Apparatus for decompression drying | |
| JP2003517917A (en) | Improved object drying and cleaning process using controlled spray and gas quality | |
| US6231684B1 (en) | Apparatus and method for precision cleaning and drying systems | |
| CN1393910A (en) | Injecting device for treating glass substrate or wafer | |
| JP3247673B2 (en) | Wafer drying apparatus and method | |
| JP4350843B2 (en) | Supercritical dryer | |
| JP2000232088A (en) | Method for cleaning and drying semiconductor wafers | |
| JP2003092256A (en) | Substrate processing apparatus and substrate processing method | |
| KR960026310A (en) | Wafer Drying Equipment and Drying Method | |
| EP0886548A1 (en) | Method and apparatus for drying and cleaning objects using aerosols | |
| JPH02277236A (en) | Cleaning apparatus | |
| JP2008028323A (en) | Substrate processing apparatus | |
| JP4776479B2 (en) | Substrate processing equipment | |
| JP2026038344A (en) | Treatment system and method for manufacturing an article | |
| KR20050100481A (en) | Apparatus for drying a wafer |