JPH0227834B2 - - Google Patents
Info
- Publication number
- JPH0227834B2 JPH0227834B2 JP60147541A JP14754185A JPH0227834B2 JP H0227834 B2 JPH0227834 B2 JP H0227834B2 JP 60147541 A JP60147541 A JP 60147541A JP 14754185 A JP14754185 A JP 14754185A JP H0227834 B2 JPH0227834 B2 JP H0227834B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- circuit board
- conductor
- multilayer circuit
- tungsten
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Production Of Multi-Layered Print Wiring Board (AREA)
Description
産業上の利用分野
本発明は、厚膜回路部品、IC、LSIなどの高密
度実装に好適な多層回路基板に関するものであ
る。
従来の技術
近年、機器の小型化や多機能の要望が年を追つ
て強くなつてきているが、これらの要望に応える
ため、回路部品の高密度実装が重要な技術となつ
てきている。特にIC、LSIの発達や抵抗器、コン
デンサ等の厚膜化技術の発達にともない回路部品
の実装が益々高密度化へと移行しつつある。部品
の高密度実装を実現するには部品を小さくするこ
とと同時に基板の配線密度を高くすることが重要
である。基板の配線密度を高めるには、基板を多
層構造とし、配線層を基板内部に形成する方法が
最も効果が大きい。
従来の多層基板としては、アルミナとタングス
テン(W)、又はアルミナとモリブデン(Mo)
による絶縁層、導体層を交互に積層したものがあ
る。
発明が解決しようとする問題点
しかし、上記の基板には次の問題点がある。
(i) 部品の半田付を可能にするために、多層基板
表面のタングステン、又はモリブデンの導体層
上にニツケル、金などのメツキを施す必要があ
る。
(ii) 厚膜素子としてグレーズ抵抗素子やコンデン
サ素子を形成するためには、空気中で高温
(800〜900℃)処理する必要があるが、タング
ステンやモリブデンのような容易に酸化される
導体材料は酸素雰囲気中での処理ができないた
め厚膜素子を直接形成する回路基板として不向
きである。
これらの理由から、アルミナ多層配線基板とし
て十分な条件を備えていなかつた。
問題点を解決するための手段
上記問題点を解決するために本発明の多層回路
基板はアルミナを主成分とする絶縁層とタングス
テン金属からなる導体層とを交互に積層してなる
積層部と、該積層部の最上層絶縁層に設けられた
導体露出部上に内部導体層と導通するように形成
した、タングステンに還元されない低融点ガラス
及び貴金属からなる導電性被覆材と、前記最上層
材絶縁層上に設けられ、前記被覆材の延設部を電
極とする厚膜抵抗素子及び前記延設部に電気的に
接続された電子部品装着用の銀−パラジウム系導
体パツドと配線パターンとから構成されたもので
ある。
作 用
本発明は上記の構成による、導電性充填材のガ
ラス成分としてタングステンに還元されない低融
点のガラスを用いるため、空気中の高温下でも導
体燃結層(タングステン或いはモリブデン)が酸
化されずに良好に電気導通性が得られ、該充填材
を介することによつて、抵抗やコンデンサの厚膜
素子を最上層に空気中にて形成可能となり、くわ
えて、厚膜抵抗のレーザによるトリミングも下地
が高アルミナであるところから安定に行なえるこ
ととなる。
さらには、被覆材中に非常に活性な酸化触媒で
あるPtを適量含有するため、被覆材焼成時のバ
インダ燃焼が効率よく行われ、ガラス軟化時のポ
アの発生防止や、樹脂の未燃焼による炭化物の残
渣発生防止が図られ、被覆効果が増加し、高信頼
性の多層基板を提供することが可能となる。
実施例
以下本発明の実施例について、図面を参照しな
がら説明する。
第1図は本発明の一実施例を示したものであり
1,2,及び3はアルミナ絶縁層、4及び5はタ
ングステンまたはモリブデン導体層、6はタング
ステン又はモリブデンに還元されない低融点ガラ
スと貴金属とからなる被覆材、7,9は銀−パラ
ジウム導体、8はルテニウム系厚膜抵抗素子であ
る。
つぎに具体例を示す。
アルミナを主成分をし、それに焼結助剤を添加
した無機粉末と、PVB(ポリ・ビニル・ブチラー
ル)と、可塑剤とからなるグリーンシートをドク
タブレード法をも用いて作成した、これにタング
ステンまたはモリブデンを主成分とし導体焼結助
剤を含む導体混合物に適量のエトセル系ビヒクル
を加えて混練した導体ペーストと、前記グリーン
シートと同じ無機組成をもつアルミナペーストと
を交互に印刷し多層化した。この工程で上層のア
ルミナ層には下部タングステン導体層の一部を露
出するように300μm角の孔を設けた。これを
1550〜1650℃の還元雰囲気中で焼成した。焼結後
の基板の収縮率は約16%であつた。
次に、焼結多層構造体の表面孔部に軟化点が約
540℃でB2O3とBaOを主成分とするガラス粉末と
銀粉末からなるペーストをスクリーン印刷し、最
上層アルミナ層の孔部を被覆するとともに抵抗素
子用の電極となる延設部を有するパターンを形成
した。これを釣鐘状の温度プロフアイルを有し、
ピーク温度が850℃の厚膜焼成炉に通した。次い
で、ルテニウム系グレーズ抵抗膜と銀−パラジウ
ム導体膜を必要パターンに印刷、形成し、上記厚
膜焼成炉に通した。
このようにして得られた回路基板では、銀−ガ
ラス材料から構成された被覆材の導体層が基板表
面に強固に密着し、さらに下部導体層との電気的
導通が十分確保されていた。下部導体層と上部電
極との間(図2における4−7間)の電気抵抗
(Rc)を評価したところ3〜5mΩ程度であつ
た。また被覆材の延設部を電極として形成したル
テニウム系抵抗素子は、従来のAg−Pd電極を用
いたものとほぼ同じ抵抗値を示し、極めて良いマ
ツチング性を示した。また、被覆材とマウント用
Ag−Pd電極界面の電気的導通においても極めて
良好な特性を示し、その界面において抵抗が増加
するような現象はみられなかつた。
さらに、この回路基板の被覆部の安定性を調べ
るためにプレツシヤ−クツカーテスト(121℃2
気圧)を行い48時間後の電気抵抗Rcを測定した。
第1表には具体例で得られた試料のPt含有量、
及び電極層間の電気抵抗Rc(Ω)をそれぞれ示
す。なお試料番号2〜4が本発明の実施例に相当
する。
第1表に示される様に、試料番号1や、試料番
号5の被覆材を設けた場合、初期値的には低抵抗
の導通が得られるが、プレツシヤ−クツカーテス
ト後抵抗値の増加がみられ、ときには数十kΩと
いう高抵抗となる。
INDUSTRIAL APPLICATION FIELD The present invention relates to a multilayer circuit board suitable for high-density mounting of thick film circuit components, ICs, LSIs, and the like. Conventional Technology In recent years, the demand for smaller devices and multi-functionality has become stronger over the years, and in order to meet these demands, high-density mounting of circuit components has become an important technology. In particular, with the development of ICs and LSIs and the development of thick film technology for resistors, capacitors, etc., the mounting of circuit components is becoming increasingly dense. In order to realize high-density mounting of components, it is important to reduce the size of the components and simultaneously increase the wiring density of the board. The most effective way to increase the wiring density of a board is to make the board a multilayer structure and form the wiring layers inside the board. Conventional multilayer substrates include alumina and tungsten (W), or alumina and molybdenum (Mo).
There is one in which insulating layers and conductive layers are laminated alternately. Problems to be Solved by the Invention However, the above substrate has the following problems. (i) To enable soldering of components, it is necessary to plate the tungsten or molybdenum conductor layer on the surface of the multilayer board with nickel, gold, or the like. (ii) In order to form glazed resistor elements and capacitor elements as thick film elements, it is necessary to process them in air at high temperatures (800 to 900°C), but conductive materials that are easily oxidized such as tungsten and molybdenum are Since it cannot be processed in an oxygen atmosphere, it is not suitable as a circuit board on which thick film elements are directly formed. For these reasons, sufficient conditions have not been provided for an alumina multilayer wiring board. Means for Solving the Problems In order to solve the above problems, the multilayer circuit board of the present invention includes a laminated portion formed by alternately laminating insulating layers mainly composed of alumina and conductive layers made of tungsten metal; A conductive covering material made of low melting point glass and noble metal that is not reduced to tungsten and formed on the exposed conductor part provided in the uppermost insulating layer of the laminated part so as to be electrically conductive with the inner conductor layer, and the uppermost insulating layer material. Consisting of a thick film resistance element provided on the layer and using the extended portion of the covering material as an electrode, a silver-palladium conductor pad for mounting electronic components electrically connected to the extended portion, and a wiring pattern. It is what was done. Effects The present invention has the above-described structure, and since a low melting point glass that is not reduced to tungsten is used as the glass component of the conductive filler, the conductor sintered layer (tungsten or molybdenum) is not oxidized even under high temperatures in the air. Excellent electrical conductivity is obtained, and by using the filler, thick film elements such as resistors and capacitors can be formed on the top layer in air, and in addition, laser trimming of thick film resistors can also be performed on the base layer. Since it has high alumina, it can be carried out stably. Furthermore, since the coating material contains an appropriate amount of Pt, which is a highly active oxidation catalyst, the binder burns efficiently when the coating material is fired, preventing the formation of pores during glass softening, and preventing unburned resin from forming. The generation of carbide residues is prevented, the coating effect is increased, and a highly reliable multilayer substrate can be provided. Embodiments Examples of the present invention will be described below with reference to the drawings. Figure 1 shows an embodiment of the present invention, in which 1, 2, and 3 are alumina insulating layers, 4 and 5 are tungsten or molybdenum conductor layers, and 6 is a low-melting glass and noble metal that cannot be reduced to tungsten or molybdenum. 7 and 9 are silver-palladium conductors, and 8 is a ruthenium-based thick film resistance element. Next, a specific example will be shown. A green sheet made of inorganic powder mainly composed of alumina with a sintering aid added, PVB (poly vinyl butyral), and a plasticizer was created using the doctor blade method. Alternatively, a conductor paste made by adding and kneading an appropriate amount of Ethocel vehicle to a conductor mixture containing molybdenum as a main component and a conductor sintering aid, and an alumina paste having the same inorganic composition as the green sheet are alternately printed to form a multilayer structure. . In this step, a 300 μm square hole was formed in the upper alumina layer to expose a portion of the lower tungsten conductor layer. this
It was fired in a reducing atmosphere at 1550-1650°C. The shrinkage rate of the substrate after sintering was about 16%. Next, the softening point of the surface pores of the sintered multilayer structure is approximately
A paste consisting of glass powder and silver powder mainly composed of B 2 O 3 and BaO is screen printed at 540℃ to cover the pores of the top alumina layer and has an extension that serves as an electrode for the resistor element. formed a pattern. This has a bell-shaped temperature profile,
It was passed through a thick film firing furnace with a peak temperature of 850°C. Next, a ruthenium-based glaze resistive film and a silver-palladium conductive film were printed and formed into a required pattern, and passed through the thick film firing furnace. In the circuit board thus obtained, the conductive layer of the covering material made of silver-glass material was firmly adhered to the surface of the substrate, and electrical continuity with the lower conductive layer was sufficiently ensured. When the electrical resistance (Rc) between the lower conductor layer and the upper electrode (between 4 and 7 in FIG. 2) was evaluated, it was about 3 to 5 mΩ. Furthermore, a ruthenium-based resistance element formed using the extended portion of the covering material as an electrode showed approximately the same resistance value as that using a conventional Ag-Pd electrode, and exhibited extremely good matching properties. Also available for cladding and mounting.
The electrical conductivity at the Ag-Pd electrode interface also showed extremely good characteristics, and no phenomenon of increased resistance was observed at the interface. Furthermore, in order to investigate the stability of the coating part of this circuit board, a pressure-cutting car test (121℃ 2
48 hours later, the electrical resistance Rc was measured.
Table 1 shows the Pt content of samples obtained in specific examples,
and the electrical resistance Rc (Ω) between the electrode layers. Note that sample numbers 2 to 4 correspond to Examples of the present invention. As shown in Table 1, when the covering material of Sample No. 1 or Sample No. 5 is provided, conduction with low resistance is obtained at the initial value, but the resistance value increases after the pressure cutter test. The resistance is sometimes as high as several tens of kilohms.
【表】
これは低軟化点ガラス、銀粉末とPt粉末とを
ペースト状にするために混ぜたビヒクル中の樹脂
成分のうち界面付近(被覆材と内部導体層間)の
ものが、ガラスが軟化したのちに燃焼飛散しよう
とするため、焼成後ポアがガラス内部に多く発生
する。そして、このポアが高温高湿中で、界面付
近の内部導体層の酸化、腐食を促進するためであ
ると考えられる。
これに比べて、本発明による多層基板は被覆材
中に非常に活性な酸化触媒剤であるPtを0.5〜
5.0wt%含有することにより、ガラスが軟化する
以前にペースト状のバインダ(樹脂成分)を燃焼
飛散させ、その後内部導体層の酸化が進行するま
えにガラスが軟化して被覆する。このためプレツ
シヤ−クツカーテストなどの苛酷な条件下でも被
覆材と内部導体は良好な導電性を保ちながら、内
層導体の酸化、腐食等を防ぐことができる。
なお、実施例では、内部導体層4,5はタング
ステンを用いたがモリブデンを使用することも可
能である。
また内部導体層と被覆材とは接しているため、
内部導体層中にPt、その他の金属(Pd、Co、
Ni、Mn、Ru)を添加することによつても、同
様の効果が得られる。
発明の効果
以上説明したように、本発明はアルミナを主成
分とする絶縁層とタングステン金属からなる導体
層とを交互に積層してなる積層部と、該積層部の
最上層に設けられた導体露出部上に内部導体層と
導通するように形成したタングステンに還元され
ない低融点ガラス、及びAgを主成分とする貴金
属からなる導電性被覆材と、前記被覆材と接続さ
れた電子部品装着用の導体パツドと配線パターン
とから構成されたことを特徴とする多層回路基板
において、導体露出部上に形成された導電性被覆
材中に非常に活性な酸化触媒であるPtを0.5〜
5.0wt%含有することにより、ガラスが軟化する
以前にペースト中のバインダ(樹脂成分)を充分
燃焼飛散させ、その後内部導体層の酸化が進行す
るまえにガラスが軟化して被覆する。このため内
層導体の酸化、腐食の原因となる外気や水分の浸
透が少ない緻密な構造を焼成工程において形成す
ることができ、さらには空気中、高温(800〜900
℃)で焼成する厚膜抵抗素子やコンデンサ素子を
最外層に形成することが可能となる。しかも、内
部配線層はタングステンやモリブデンで多層化さ
れているため、廉価であり、厚膜素子のみならず
チツプ部品やIC高密度で実装することが可能で
ある。特に本発明では被覆材が緻密で高安定化さ
れているため、高信頼性の多層基板が提供でき
る。[Table] This is a low-softening point glass, and among the resin components in the vehicle mixed with silver powder and Pt powder to make a paste, the resin components near the interface (between the coating material and the internal conductor layer) soften the glass. Since the glass tends to burn and scatter later, many pores are generated inside the glass after firing. It is thought that this is because these pores promote oxidation and corrosion of the internal conductor layer near the interface in high temperature and high humidity environments. In comparison, the multilayer substrate according to the present invention contains Pt, a highly active oxidation catalyst, in the coating material from 0.5 to 0.5%.
By containing 5.0 wt%, the paste-like binder (resin component) is burned and scattered before the glass softens, and then the glass softens and covers the internal conductor layer before oxidation progresses. Therefore, even under severe conditions such as the pressure-cutting test, the coating material and the internal conductor can maintain good conductivity while preventing oxidation, corrosion, etc. of the internal layer conductor. In the embodiment, the internal conductor layers 4 and 5 are made of tungsten, but molybdenum may also be used. Also, since the internal conductor layer and the covering material are in contact,
Pt and other metals (Pd, Co,
A similar effect can also be obtained by adding Ni, Mn, Ru). Effects of the Invention As explained above, the present invention includes a laminated part formed by alternately laminating an insulating layer mainly composed of alumina and a conductive layer made of tungsten metal, and a conductor provided on the top layer of the laminated part. A conductive coating material made of a low-melting glass that cannot be reduced to tungsten and a noble metal mainly composed of Ag, formed on the exposed part so as to be electrically conductive with the internal conductor layer, and a conductive coating material for mounting electronic components connected to the coating material. In a multilayer circuit board characterized by comprising a conductor pad and a wiring pattern, 0.5 to 0.5 to 0.5% of Pt, a highly active oxidation catalyst, is contained in the conductive coating formed on the exposed conductor.
By containing 5.0 wt%, the binder (resin component) in the paste is sufficiently burned and scattered before the glass softens, and then the glass softens and covers the internal conductor layer before oxidation progresses. Therefore, it is possible to form a dense structure in the firing process with less penetration of outside air and moisture that can cause oxidation and corrosion of the inner conductor.
This makes it possible to form thick film resistive elements and capacitor elements in the outermost layer, which are fired at temperatures (°C). Moreover, since the internal wiring layer is multilayered with tungsten and molybdenum, it is inexpensive, and it is possible to mount not only thick film elements but also chip parts and ICs at high density. In particular, in the present invention, since the covering material is dense and highly stable, a highly reliable multilayer substrate can be provided.
第1図は本発明の一実施例の多層回路基板の断
面図、第2図は同基板の要部拡大断面図である。
1,2,3……アルミナ絶縁層、4,5……タ
ングステン導体、6,10……タングステンに還
元されない低融点ガラスと貴金属とから構成され
た被覆材、7,9……Ag−Pd導体、8……ルテ
ニウム系厚膜抵抗素子、11……貴金属素子。
FIG. 1 is a sectional view of a multilayer circuit board according to an embodiment of the present invention, and FIG. 2 is an enlarged sectional view of a main part of the same board. 1, 2, 3... Alumina insulating layer, 4, 5... Tungsten conductor, 6, 10... Covering material composed of low melting point glass and noble metal that cannot be reduced to tungsten, 7, 9... Ag-Pd conductor , 8... Ruthenium-based thick film resistance element, 11... Noble metal element.
Claims (1)
ン金属からなる導体層とを交互に積層してなる積
層部と、該積層部の最上層に設けられた導体露出
部上に内部導体層と導通するように形成したタン
グステンに還元されない低融点ガラス、及びAg
を主成分とする貴金属からなる導電性被覆材と、
前記被覆材と接続された電子部品装着用の導体パ
ツドと配線パターンとから構成されたことを特徴
とする多層回路基板。 2 導体層をモリブデンとした特許請求の範囲第
1項記載の多層回路基板。 3 低融点ガラスとして(BaO−B2O3)を含む
非還元性酸化物より構成された特許請求の範囲第
1項記載の多層回路基板。 4 導電性被覆材中の貴金属としてPtを0.5〜
5.0wt%含有することを特徴とする特許請求の範
囲第1項記載の多層回路基板。 5 積層部内導体中にPt、Pd、Co、Ni、Mu、
Ruを含む特許請求の範囲第4項記載の多層回路
基板。[Claims] 1. A laminated part formed by alternately laminating an insulating layer mainly composed of alumina and a conductive layer made of tungsten metal, and an inner layer on an exposed conductor part provided on the top layer of the laminated part. Low melting point glass that is not reduced to tungsten and Ag formed to be electrically conductive with the conductor layer
A conductive coating material made of a precious metal whose main component is
A multilayer circuit board comprising a conductor pad for mounting electronic components connected to the covering material and a wiring pattern. 2. The multilayer circuit board according to claim 1, wherein the conductor layer is made of molybdenum. 3. The multilayer circuit board according to claim 1, which is made of a non-reducible oxide containing (BaO-B 2 O 3 ) as the low melting point glass. 4 Pt as a noble metal in the conductive coating material from 0.5 to
The multilayer circuit board according to claim 1, characterized in that it contains 5.0 wt%. 5 Pt, Pd, Co, Ni, Mu,
The multilayer circuit board according to claim 4, which contains Ru.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60147541A JPS628595A (en) | 1985-07-04 | 1985-07-04 | multilayer circuit board |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60147541A JPS628595A (en) | 1985-07-04 | 1985-07-04 | multilayer circuit board |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS628595A JPS628595A (en) | 1987-01-16 |
| JPH0227834B2 true JPH0227834B2 (en) | 1990-06-20 |
Family
ID=15432650
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60147541A Granted JPS628595A (en) | 1985-07-04 | 1985-07-04 | multilayer circuit board |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS628595A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6077492A (en) * | 1983-10-04 | 1985-05-02 | 日本碍子株式会社 | Ceramic multilayer circuit board and method of producing same |
-
1985
- 1985-07-04 JP JP60147541A patent/JPS628595A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS628595A (en) | 1987-01-16 |
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