JPH02279330A - Profile flexible printed wiring board - Google Patents

Profile flexible printed wiring board

Info

Publication number
JPH02279330A
JPH02279330A JP10201889A JP10201889A JPH02279330A JP H02279330 A JPH02279330 A JP H02279330A JP 10201889 A JP10201889 A JP 10201889A JP 10201889 A JP10201889 A JP 10201889A JP H02279330 A JPH02279330 A JP H02279330A
Authority
JP
Japan
Prior art keywords
film
fpc
heat
flexible printed
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10201889A
Other languages
Japanese (ja)
Other versions
JP2877831B2 (en
Inventor
Taiichi Kurome
泰一 黒目
Nobuaki Ito
伸明 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP1102018A priority Critical patent/JP2877831B2/en
Publication of JPH02279330A publication Critical patent/JPH02279330A/en
Application granted granted Critical
Publication of JP2877831B2 publication Critical patent/JP2877831B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Laminated Bodies (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

PURPOSE:To obtain a profile FPC possible in molding processing while holding soldering resistance by using a heat-resistant film having a specific heat- shrinkage factor and a heat-softening point as a base film or a cover film. CONSTITUTION:A base film or cover film constituting a profile flexible printed wiring board (FPC) is composed of a heat-resistant film having a heat-shrinkage factor of 1.5% or less at 250 deg.C, a heat-softening point of 200 - 350 deg.C under load of 0.5kg/mm<2> and having no m.p. at 400 deg.C or less. The profile FPC means one not having a perfectly flat plate-shape but having unevenness at least on a part of a surface and heat-molding processing (draw forming) is applied to at least one of the base film or cover film used in the FPC. By this method, the profile FPC capable of molding processing while holding soldering resistance is obtained.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はフレキシブルプリント配線板(以下、FPCと
略す)に関するものであり、さらに詳しくは表面に凹凸
が形成された耐ハンダ性を有するFPCに関するもので
ある。
Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a flexible printed wiring board (hereinafter abbreviated as FPC), and more particularly relates to an FPC having solder resistance and having an uneven surface. It is something.

[従来の技術] 電気、電子工業分野において機器の小型化などの観点か
ら、FPCが多用されつつある。このFPCの一般的な
構成は、基材フィルムの片面あるいは両面に電気回路を
形成し、その上にカバーフィルムを積層したりレジスト
インクを塗布したりしたものである。従来、基材フィル
ムあるいはカバーフィルムに使用されてきたのは実質的
に芳香族ポリイミドフィルムとポリエチレンテレフタレ
ート(PET)フィルムであり、部品実装の際にハンダ
浴浸漬、ウェーブソルダリング、リフローソルダリング
などのFPC全面あるいはかなりの部分をハンダ付けす
る実装方法が採られるような耐ハンダ性を要する場合に
は芳香族ポリイミドフィルムが使用され、部分的なスポ
ット的ハンダ付けしか必要でない場合にはPETフィル
ムが使用されている。また電子機器等の難燃性の規制か
らFPCに使用するフィルムに自己消火性が要求される
場合にも芳香族ポリイミドフィルムが使用されている。
[Prior Art] FPCs are being used frequently in the electric and electronic industries from the viewpoint of downsizing equipment. The general structure of this FPC is such that an electric circuit is formed on one or both sides of a base film, and a cover film is laminated thereon or a resist ink is applied thereon. Conventionally, aromatic polyimide films and polyethylene terephthalate (PET) films have been used as base films or cover films, and when mounting components, various methods such as solder bath dipping, wave soldering, and reflow soldering are used. Aromatic polyimide film is used when solder resistance is required, such as when the entire FPC or a large portion of the FPC is soldered, and PET film is used when only spot soldering is required. has been done. Aromatic polyimide films are also used when films used in FPCs are required to have self-extinguishing properties due to flame retardant regulations for electronic devices and the like.

[発明が解決しようとする課題] これまでのFPCは、部品実装し機器へ組み込まれた後
では折り曲げあるいは屈曲させられた状態になってはい
るが、FPC自体はあくまで平板状であり、電気部品は
平面上に並べられているだけで、FPCの実装上の機能
とは単に平面的な配線板であったにすぎない。したがっ
て従来はFPCの実装密度を上げると言っても配線間を
狭くするといった2次元的な方法しか採り得ず、FPC
に使用されたフィルムも電気回路を平面的に保持する機
能以上のものは与えられていなかったのが現状である。
[Problems to be solved by the invention] Conventional FPCs have been bent or bent after mounting components and incorporating them into equipment, but the FPC itself has a flat plate shape and cannot be used for electrical components. are simply arranged on a flat surface, and the mounting function of the FPC is simply that of a flat wiring board. Therefore, in the past, even if it was said to increase the packaging density of FPC, it was only possible to take a two-dimensional method such as narrowing the distance between wires.
At present, the film used for this purpose had no function beyond holding the electrical circuit flat.

表面に凹凸を付与して3次元的な異形FPCを実現する
ことは、PETフィルムの場合絞り成形できることから
可能性があるが、PETフィルムでは耐ハンダ性に劣る
ために応用範囲が極めて狭くなり現実性に乏しい。
It is possible to create a three-dimensional irregularly shaped FPC by adding irregularities to the surface because PET film can be drawn and formed, but PET film has poor solder resistance, so the range of applications is extremely narrow and it is not practical. lacking in sex.

一方、耐ハンダ性を必要とするFPCに使用される芳香
族ポリイミドフィルムは、一般に成形加工性(加熱成形
)が非常に悪いため、平板状のFPC以外のものを製造
することは工業的に無理があり、FPCの機能を拡大す
る上で制約となっていた。
On the other hand, aromatic polyimide films used in FPCs that require solder resistance generally have very poor moldability (heat forming), making it industrially impossible to manufacture anything other than flat FPCs. This has been a constraint on expanding the functions of FPC.

本発明は以上のような問題を改善するため、異形のFP
Cを可能にし、従来にない機能を持ったFPCを提供す
ることを目的とする。
In order to improve the above-mentioned problems, the present invention provides an irregularly shaped FP.
The purpose is to provide an FPC with unprecedented functions.

[課題を解決するための手段] 本発明は、表面に凹凸が形成された異形フレキシブルプ
リント配線板(異形FPC)において、該異形FPCを
構成する基材フィルム、カバーフィルムが、250℃で
の熱収縮率1.5%以下、0.5kg/mイ荷重下での
熱軟化点が200°C以上350℃以下であり、かつ4
00℃以下に融点を有しない耐熱フィルムから成ること
を特徴とするものである。
[Means for Solving the Problems] The present invention provides a modified flexible printed wiring board (deformed FPC) having irregularities formed on its surface, in which a base film and a cover film constituting the deformed FPC are heated at 250°C. The shrinkage rate is 1.5% or less, the thermal softening point under a load of 0.5 kg/m is 200°C or more and 350°C or less, and 4
It is characterized by being made of a heat-resistant film that does not have a melting point below 00°C.

本発明の異形FPCとは、全くの平板状ではなく表面の
少なくとも一部に凹凸が形成されているものを指し、F
PCに使用されている基材フィルムあるいはカバーフィ
ルムの少なくとも一方に加熱成形加工(絞り成形)が施
されているものである。凹凸の大きさ、形状、絞り比等
は特に限定はなく、例えばメンブレンスイッチにおいて
クリック感を出すために成形されるドーム状の窪みのよ
うな小さな凹凸から、例えばFPC全体が箱型のように
成形されたものまでも含む。
The irregularly shaped FPC of the present invention refers to one that is not completely flat but has irregularities formed on at least a part of its surface, and
At least one of the base film and the cover film used in the PC is subjected to thermoforming (drawing). There are no particular limitations on the size, shape, aperture ratio, etc. of the unevenness, and it can range from small unevenness such as a dome-shaped depression formed to create a click feeling in a membrane switch to a box-like shape in which the entire FPC is formed. Including those that have been.

本発明における耐熱フィルムとは400℃以下に融点を
有しない耐熱フィルムを指し、400°C以下に融点を
持つものは成形金型との離型性が悪く不適である。該耐
熱フィルムを構成する耐熱ポリマーの具体例としては芳
香族ポリアミド、芳香族ポリイミド、ポリパラバン酸な
どが挙げられ、これらの中では芳香族ポリアミドが最も
好ましく、また芳香族ポリイミドとしては、従来から多
く生産されているピロメリット酸二無水物と4.4′−
ジアミノジフェニルエーテルを原料とするポリイミドフ
ィルムでは成形性が悪く不適であるが、最近開発された
ビフェニルテトラカルボン酸二無水物とジアミノジフェ
ニルエーテルを原料とするポリイミドフィルムでは良好
な成形性を示す。
The heat-resistant film in the present invention refers to a heat-resistant film that does not have a melting point below 400°C, and those having a melting point below 400°C are unsuitable because of their poor releasability from the molding die. Specific examples of the heat-resistant polymer constituting the heat-resistant film include aromatic polyamide, aromatic polyimide, polyparabanic acid, etc. Among these, aromatic polyamide is the most preferred. Pyromellitic dianhydride and 4.4'-
Polyimide films made from diaminodiphenyl ether have poor formability and are unsuitable, but recently developed polyimide films made from biphenyltetracarboxylic dianhydride and diaminodiphenyl ether show good formability.

本発明における芳香族ポリアミドフィルムとは、一般式
  −NH−At1−NHCO−ArI −CO−また
は  −NH−Ar3−CO で示される繰返し構成単位を単独または共重合の形で含
む芳香族ポリアミド重合体あるいはそれらの混合物から
成るフィルムである。
The aromatic polyamide film in the present invention is an aromatic polyamide polymer containing repeating structural units represented by the general formula -NH-At1-NHCO-ArI-CO- or -NH-Ar3-CO, either alone or in copolymerized form. Or a film made of a mixture thereof.

ここでArI、Ar2、Ar3は少なくとも1個の芳香
環を含み、同一でも異なっていてもよく、これらの代表
例としては次のものが挙げられる。
Here, ArI, Ar2, and Ar3 contain at least one aromatic ring and may be the same or different, and representative examples thereof include the following.

Xは、 OCR2S O2− の中から選ばれる。またこれらの芳香環の環上の水素原
子の一部または全部がハロゲン基、ニトロ基、CI〜C
3のアルキル基、01〜C3のアルコキシ基から選ばれ
る置換基で置換されているものも含む。更に上記一般式
中でアミド結合を構成する窒素原子に結合する水素原子
が置換基で置換されているものも含む。
X is selected from OCR2SO2-. In addition, some or all of the hydrogen atoms on the aromatic rings are halogen groups, nitro groups, CI to C
It also includes those substituted with a substituent selected from 3 alkyl groups and 01 to C3 alkoxy groups. Furthermore, it also includes those in which the hydrogen atom bonded to the nitrogen atom constituting the amide bond in the above general formula is substituted with a substituent.

本発明のFPCで使用する基材フィルムあるいはカバー
フィルムは、250℃での熱収縮率が1゜5%以下、好
ましくは1.0%以下、かつ0.5kg / m rd
の荷重下での熱軟化点が200℃以上350℃以下、好
ましくは200℃以上300℃以下であることが必要で
ある。ここで熱軟化点とは、0.5 kg / m r
d荷重下でフィルムを5℃/分の速度で昇温したとき、
フィルムの伸びが原長の10%となる時の温度を意味す
る。
The base film or cover film used in the FPC of the present invention has a heat shrinkage rate of 1.5% or less at 250°C, preferably 1.0% or less, and 0.5kg/m rd.
It is necessary that the thermal softening point under a load is 200°C or more and 350°C or less, preferably 200°C or more and 300°C or less. Here, the thermal softening point is 0.5 kg/m r
When the temperature of the film was raised at a rate of 5°C/min under a load of d,
It means the temperature at which the elongation of the film becomes 10% of its original length.

本発明のような耐ハンダ性を有する異形FPCにおいて
は、耐ハンダ性を規定する無荷重状態下の寸法変化率で
ある熱収縮率と成形加工性を規定する熱軟化点が重要で
ある。熱収縮率が165%より大きいと、ハンダ実装時
にFPCに皺が生じたりするため不適である。一方成形
加工は、実際の加工工程では数十〜数百℃/秒の速度で
フィルムは昇温されるため、測定し得る特性値との整合
性が問題であったが、上述のような熱軟化点と関係付け
た場合、熱軟化点が350℃より大きい場合、高温下で
のフィルムの伸び速度が小さすぎて均一な成形ができず
、また200°Cより小さい場合ハンダ付は時にフィル
ムの平面性が保てず不適であることが、種々の実験から
見出された。
In a deformed FPC having solder resistance like the present invention, the heat shrinkage rate, which is the rate of dimensional change under no-load conditions, which defines the solder resistance, and the thermal softening point, which defines the moldability, are important. If the thermal shrinkage rate is greater than 165%, it is unsuitable because wrinkles may occur in the FPC during solder mounting. On the other hand, in the actual processing process, the temperature of the film is raised at a rate of several tens to hundreds of degrees Celsius/second, so consistency with measurable characteristic values has been an issue. In relation to the softening point, if the thermal softening point is higher than 350°C, the elongation rate of the film is too low at high temperatures and uniform molding is not possible, and if it is lower than 200°C, soldering may sometimes cause the film to elongate. It has been found through various experiments that flatness cannot be maintained and it is unsuitable.

[製造方法] 次に、本発明の異形FPCの製造方法を芳香族ポリアミ
ドの場合を例にとって説明する。
[Manufacturing Method] Next, a method for manufacturing a irregularly shaped FPC of the present invention will be explained using aromatic polyamide as an example.

芳香族ポリアミドの重合はアミド系溶媒中での低温溶液
重合法や水系媒体を用いた界面重合法など公知の重合法
により行なうことができ特に限定されない。次に重合で
得られたポリマー溶液、あるいはポリマーを単離した後
に溶媒に再溶解したポリマー溶液からフィルムを製膜す
る。ここで使用する溶媒にはアミド系溶媒あるいは硫酸
などがあるが、装置の腐蝕という面からはアミド系溶媒
を用いる系の方が好ましい。
Polymerization of the aromatic polyamide can be carried out by known polymerization methods such as low-temperature solution polymerization in an amide solvent and interfacial polymerization using an aqueous medium, and is not particularly limited. Next, a film is formed from a polymer solution obtained by polymerization or a polymer solution obtained by redissolving the polymer in a solvent after isolation. The solvents used here include amide solvents and sulfuric acid, but systems using amide solvents are preferable from the viewpoint of corrosion of the equipment.

製膜は公知の溶液製膜法によって行なうことができ、乾
式、湿式、乾湿式などの区別が溶液製膜法にはあるが、
いずれでもよく特に限定されない。
Film formation can be performed by a known solution film forming method, and there are distinctions among solution film forming methods such as dry method, wet method, dry-wet method, etc.
Either one is fine and there is no particular limitation.

製膜中に通常フィルムは、250℃〜350℃で0.1
〜10分間程度の熱処理とフィルム長手方向、幅方向に
1.0〜5.0倍程度の延伸操作が施されるが、これら
の操作条件はフィルム特性のうち熱収縮率や熱膨張係数
などに影響するため、ポリマー組成に応じて本発明に必
要な特性値となるように条件を適当に選択する。
During film formation, the film usually has a temperature of 0.1 at 250℃ to 350℃.
The film is heat treated for about 10 minutes and stretched 1.0 to 5.0 times in the longitudinal and width directions, but these operating conditions affect the film properties such as thermal shrinkage and thermal expansion coefficient. Therefore, conditions are appropriately selected depending on the polymer composition so as to obtain the characteristic values necessary for the present invention.

得られたフィルムを基材フィルムあるいはカバーフィル
ムとして用いてFPCを製造するには、従来の芳香族ポ
リイミドフィルムを使用する場合と同様の方法によれば
よい。基材フィルム上に電気回路を形成する方法として
は銅箔、アルミ箔などを接着剤によって積層するかメツ
キ法、蒸着法によって銅やアルミなどを積層した後にエ
ツチング法によって回路形成する方法と、銅ペースト、
カーボンペースト、銀ペーストなどをスクリーン印刷す
る方法、あるいはこれらの組合せなどがあるが特に限定
されない。ただし耐ハンダ性あるいは電気容量の点から
は銅箔を積層後これをエツチング加工する方法が好まし
く、更に電気回路もフィルムと一体に加熱成形加工する
場合には使用する銅箔は電解銅箔よりは圧延銅箔の方が
箔の展性の点から好ましい。
To manufacture an FPC using the obtained film as a base film or cover film, the same method as in the case of using a conventional aromatic polyimide film may be used. There are two ways to form an electric circuit on a base film: by laminating copper foil, aluminum foil, etc. with adhesive, by plating method, by laminating copper or aluminum by vapor deposition method, and then forming the circuit by etching method. paste,
Methods include screen printing of carbon paste, silver paste, etc., or a combination thereof, but are not particularly limited. However, from the point of view of solder resistance or electric capacity, it is preferable to laminate copper foil and then etch it.Furthermore, if the electric circuit is to be heat-formed integrally with the film, the copper foil used is better than electrolytic copper foil. Rolled copper foil is preferable from the viewpoint of malleability of the foil.

電気回路形成後は、必要に応じてスルーホール加工を行
ないカバーフィルムの積層あるいはレジストインクの塗
布、穴開は加工、外形打抜き加工などを行なってFPC
が製造される。
After the electric circuit is formed, through-hole processing is performed as necessary, cover film is laminated or resist ink is applied, holes are processed, and outline punching is performed to complete the FPC.
is manufactured.

凹凸を付与する方法としては、金型による成形、加熱治
具の押付けなどが挙げられるが、いずれにしても数秒〜
数十秒の間にフィルムを250°C〜400℃程度に加
熱すると同時に圧力を加えてフィルムを変形させればよ
い。例えば金型で加工する場合、金型温度を300℃以
上に加熱しておき、フィルムあるいは平板状のFPCを
プレスし、金型を250℃程度以下に冷却してから離型
すると、所定の凹凸が付与された成形品が得られる。こ
の凹凸を形成する工程は、フィルム単体の時点、電気回
路を形成した時点、カバーフィルム積層等が終った時点
、平板状のFPCに部品実装した後などいずれの時でも
よく特に限定されない。
Methods for imparting unevenness include molding with a mold, pressing with a heating jig, etc., but in any case, it takes only a few seconds or more.
The film may be deformed by heating the film to about 250° C. to 400° C. and applying pressure at the same time for several tens of seconds. For example, when processing with a mold, the temperature of the mold is heated to 300°C or higher, a film or flat FPC is pressed, the mold is cooled to 250°C or lower, and then the mold is released. A molded article is obtained. The process of forming the unevenness may be performed at any time, such as when forming the film alone, when forming an electric circuit, after laminating a cover film, etc., or after mounting components on a flat FPC, and is not particularly limited.

[用途] 以上のようにして得られた表面に凹凸を有する異形FP
Cは、従来一般にFPCが使用されている電気、電子機
器において使用することができ、特に単なる平板状の配
線板以上の機能をFPCに付加することが望ましい場合
に好ましく用いられる。FPCが異形であることによる
新たな機能としては、例えば、ICのペアチップが納ま
るような窪みをFPCに形成することでICの封止や端
子の結線を容易にしたり、メンブレンスイッチの接点部
にドーム型の突起を持ったFPCを作成することによっ
てFPC自体にスイッチ操作時のクリック感を出す機能
を与えたり、その他部品実装の高密度化、簡単化する機
能が考えられる。
[Application] Irregular-shaped FP with uneven surface obtained as above
C can be used in electrical and electronic equipment in which FPCs have been commonly used, and is particularly preferably used when it is desirable to add functions to the FPC that go beyond just a flat wiring board. New functions resulting from the irregular shape of the FPC include, for example, forming a recess in the FPC to accommodate a pair of IC chips to facilitate IC sealing and terminal connection, and adding a dome to the contact area of a membrane switch. By creating an FPC with mold-shaped protrusions, it is possible to give the FPC itself a function that produces a click feeling when operating a switch, or to increase the density and simplify the mounting of components.

[特性の評価方法] 本発明の特性値の評価方法は次のとおりである。[Characteristics evaluation method] The method for evaluating characteristic values of the present invention is as follows.

(1)熱収縮率 幅10mm、試長100mmのフィルムサンプルを無荷
重の状態で熱風オーブンによって250℃、10分間熱
処理を行ない次式によって熱収縮率を算出した。
(1) Heat Shrinkage A film sample with a width of 10 mm and a sample length of 100 mm was heat treated in a hot air oven at 250° C. for 10 minutes without any load, and the heat shrinkage was calculated using the following formula.

熱収縮率(%) ■ 熱軟化点 熱機械分析計(TMA)において、フィルム片に0. 
5 (kg/mrrr)の荷重が掛るようにセットし、
室温から5(’C/分)の昇温速度で加熱した時のフィ
ルム伸びを測定した。この伸びが試験片の片長に対して
10%となった時の温度を熱軟化点とした。
Thermal shrinkage rate (%) ■ In a thermal softening point thermomechanical analyzer (TMA), a film piece has a 0.
Set it so that a load of 5 (kg/mrrr) is applied,
The elongation of the film was measured when it was heated from room temperature at a heating rate of 5 ('C/min). The temperature at which this elongation became 10% of the length of the test piece was defined as the thermal softening point.

[実施例] 本発明を実施例に基づいて説明する。[Example] The present invention will be explained based on examples.

実施例I N−メチルピロリドン(NMP)中に0,9モル比に相
当する2−クロル−p−フ二二レンジアミンと0.1モ
ル比に相当する4、4′−ジアミノジフェニルエーテル
とを溶解させ、これに0.2モル比に相当するテレフタ
ル酸クロリドと0.8モル比に相当する2−クロルテレ
フタル酸クロリドを添加し、2時間撹拌して重合を完了
した。これを水酸化カルシウムで中和し、ポリマ濃度1
1重量%、粘度3200ボイズの芳香族ポリアミド溶液
を得た。
Example I Dissolving 2-chloro-p-phenyl diamine corresponding to a 0.9 molar ratio and 4,4'-diaminodiphenyl ether corresponding to a 0.1 molar ratio in N-methylpyrrolidone (NMP) Terephthalic acid chloride in a molar ratio of 0.2 and 2-chloroterephthalic acid chloride in a molar ratio of 0.8 were added thereto, and the mixture was stirred for 2 hours to complete the polymerization. This was neutralized with calcium hydroxide, and the polymer concentration was 1
An aromatic polyamide solution having a concentration of 1% by weight and a viscosity of 3200 voids was obtained.

このポリマ溶液をステンレス製のエンドレスベルト上に
流延し、150℃の熱風で5分間加熱して溶媒乾燥を行
ない自己保持性を得たフィルムをベルトから連続的に剥
離した。次に水槽へフィルムを導入して残存溶媒と中和
で生じた無機塩の抽出を行ない、ステンターで水分の乾
燥と熱処理を行なって厚さ25μmの芳香族ポリアミド
フィルムを得た。この間に、フィルム長手方向、幅方向
に各々1.1倍、1.3倍の延伸を行ない、熱処理は3
10℃で2分間行なった。
This polymer solution was cast onto a stainless steel endless belt and heated with hot air at 150°C for 5 minutes to dry the solvent, and the film that had achieved self-retention properties was continuously peeled off from the belt. Next, the film was introduced into a water tank to extract the remaining solvent and inorganic salts generated by neutralization, and the water was dried using a stenter and heat treatment was performed to obtain an aromatic polyamide film with a thickness of 25 μm. During this time, the film was stretched 1.1 times and 1.3 times in the longitudinal direction and width direction, respectively, and the heat treatment was performed 3 times.
This was carried out at 10°C for 2 minutes.

得られたフィルムの物性値はフィルム長手方向、幅方向
各々について、熱収縮率(250°C)が0゜8%、0
,5%、熱軟化点が244°C,24,0℃であった。
The physical properties of the obtained film are as follows: heat shrinkage rate (250°C) is 0°8%, 0° in the longitudinal direction and the width direction.
, 5%, and the thermal softening point was 244°C, 24.0°C.

次に厚さ35μmの圧延銅箔をフィルムに、熱硬化型変
性エポキシ系接着剤によって積層して銅張板とした後、
銅箔をエツチング加工して電気回路を形成して平板状の
FPCを得た。
Next, a rolled copper foil with a thickness of 35 μm was laminated onto a film using a thermosetting modified epoxy adhesive to form a copper clad board.
A flat FPC was obtained by etching the copper foil to form an electric circuit.

次に300°Cに加熱した金型で上記の平板状FPCを
プレスし、金型が250℃程度・に冷却した後にこれを
取出した。この成形加工によってF I)Cに深さ5m
m、直径15mmのドーム型の窪みを数ケ所成形するこ
とができ、銅箔回路が窪みが掛った部分も回路は断線1
7なかった。更に得られた異形FPCを280°Cのハ
ンダ浴に30秒間浸漬したところFPCに皺などは生ぜ
ず良好な耐ハンダ性を示した。
Next, the flat FPC was pressed using a mold heated to 300°C, and after the mold had cooled to about 250°C, it was taken out. This molding process creates a depth of 5m in FI)C.
m, dome-shaped depressions with a diameter of 15 mm can be formed in several places, and the circuit will not be disconnected even in the areas where the copper foil circuit is covered with depressions.
There was no 7. Furthermore, when the obtained irregularly shaped FPC was immersed in a solder bath at 280° C. for 30 seconds, no wrinkles were formed on the FPC and it exhibited good solder resistance.

実施例2 ジアミン成分として0. 8モル比に相当する2−クロ
ル−p−フェニレンジアミンと0. 2モル比に相当す
る4、4′−ジアミノジフェニルスルホンを用い、酸ク
ロリド成分としてテレフタル酸クロリドを用いて実施例
1と同様の方法で重合、中和、製膜を行ない厚さ25μ
mの芳香族ポリアミドフィルムを得た。
Example 2 0.0 as a diamine component. 2-chloro-p-phenylenediamine corresponding to a molar ratio of 0.8 to 2-chloro-p-phenylenediamine. Polymerization, neutralization, and film formation were carried out in the same manner as in Example 1 using 4,4'-diaminodiphenylsulfone corresponding to a molar ratio of 2 and terephthalic acid chloride as the acid chloride component to obtain a film having a thickness of 25 μm.
An aromatic polyamide film of m was obtained.

得られたフィルムの物性値はフィルム長手方向、幅方向
各々について、熱収縮率0.5%、0.3%、熱軟化点
283℃、281℃であった。
The physical properties of the obtained film were a heat shrinkage rate of 0.5% and 0.3%, and a heat softening point of 283°C and 281°C in the film longitudinal direction and width direction, respectively.

次に実施例1と同様にして銅箔積層、エツチング加工、
加熱成形を行なったところ、成形性は良好で皺などのな
い異形FPCが得られ、また耐ハンダ性も良好であった
Next, in the same manner as in Example 1, copper foil lamination, etching processing,
When heat molding was performed, a deformed FPC with good moldability and no wrinkles was obtained, and the solder resistance was also good.

比較例1 メタフェニレンイソフタルアミドをNMP中に溶解させ
たポリマ溶液(ポリマ濃度17重量%、粘度2600ボ
イズ)から実施例1と同様にして製膜を行ない厚さ25
μmの芳香族ポリアミドフィルムを得た。ただし製膜中
の条件は、フィルム長手方向、幅方向各々について延伸
倍率1゜4倍、1.6倍、熱処理300℃、2分間であ
る。
Comparative Example 1 A film was formed in the same manner as in Example 1 from a polymer solution in which metaphenylene isophthalamide was dissolved in NMP (polymer concentration 17% by weight, viscosity 2600 voids) to a thickness of 25
A μm aromatic polyamide film was obtained. However, the conditions during film formation were a stretching ratio of 1.4 times and 1.6 times in the longitudinal and width directions of the film, respectively, and heat treatment at 300° C. for 2 minutes.

得られたフィルムの物性値はフィルム長手方向、幅方向
各々について、熱収縮率1.8%、18.5%、熱軟化
点217℃、215℃であった。
The physical properties of the obtained film were a heat shrinkage rate of 1.8% and 18.5%, and a heat softening point of 217°C and 215°C in the film longitudinal direction and width direction, respectively.

次に実施例1と同様にして平板状のFPCを作成し、加
熱成形を行なったところ、FPCの成形性は良好であっ
たが、260℃のハンダ浴に浸漬したところフィルムの
収縮による皺が生じ、耐ハンダ性が不良であった。
Next, a flat FPC was prepared in the same manner as in Example 1, and heat molded. The moldability of the FPC was good, but when immersed in a solder bath at 260°C, wrinkles due to shrinkage of the film were observed. The solder resistance was poor.

比較例2 ピロメリット酸二無水物と4,4′−ジアミノジフェニ
ルエーテルを原料として製造された芳香族ポリイミドフ
ィルム(厚さ25μm1デユポン社製)を用いて実施例
1と同様の方法で平板状のFPCを作成した。フィルム
の物性値はフィルム長手方向、幅方向各々について、熱
収縮率0.2%、0゜1%、熱軟化点374℃、375
°Cであった。
Comparative Example 2 A flat FPC was produced in the same manner as in Example 1 using an aromatic polyimide film (thickness 25 μm, manufactured by Dupont) manufactured using pyromellitic dianhydride and 4,4'-diaminodiphenyl ether as raw materials. It was created. The physical properties of the film are as follows: heat shrinkage rate: 0.2%, 0°1%, heat softening point: 374°C, 375°C in the longitudinal direction and width direction, respectively.
It was °C.

作成したFPCで加熱成形加工を試みたが、金型温度4
00℃でも成形が悪く、FPCのフィルム部分の破れ、
銅箔回路の破断、窪みの位置の周囲で皺が発生するなど
の問題が生じ、異形FPCは作成できなかった。
I tried heat molding processing with the created FPC, but the mold temperature was 4.
Even at 00℃, the molding was poor and the FPC film part was torn.
Problems such as breakage of the copper foil circuit and generation of wrinkles around the position of the recesses occurred, making it impossible to create an irregularly shaped FPC.

[発明の効果コ 本発明では特定の熱収縮率、熱軟化点を有する耐熱フィ
ルムを基板フィルムあるいはカバーフィルムとして用い
てFPCを製造するため、得られたFPCは耐ハンダ性
を有しながら成形加工が可能となり、従来の平板状FP
Cにはなかった機能を持つ異形FPCが可能となった。
[Effects of the invention] In the present invention, a heat-resistant film having a specific heat shrinkage rate and heat softening point is used as a substrate film or a cover film to manufacture an FPC, so the obtained FPC has solder resistance and can be easily molded. This makes it possible to replace the conventional flat FP.
It has become possible to create a variant FPC with functions not available in C.

Claims (2)

【特許請求の範囲】[Claims] (1)表面に凹凸が形成された異形フレキシブルプリン
ト配線板(異形FPC)において、該異形FPCを構成
する基材フィルムが、250℃での熱収縮率1.5%以
下、0.5kg/mm^2荷重下での熱軟化点が200
℃以上350℃以下であり、かつ400℃以下に融点を
有しない耐熱フィルムから成ることを特徴とする異形フ
レキシブルプリント配線板。
(1) In a modified flexible printed wiring board (deformed FPC) with irregularities formed on the surface, the base film constituting the deformed FPC has a heat shrinkage rate of 1.5% or less at 250°C and 0.5 kg/mm. ^2Thermal softening point under load is 200
1. A irregularly shaped flexible printed wiring board characterized by being made of a heat-resistant film having a melting point of not less than 350° C. and not 400° C. or less.
(2)表面に凹凸が形成された異形フレキシブルプリン
ト配線板(異形FPC)において、該異形FPCを構成
するカバーフィルムが、250℃での熱収縮率1.5%
以下、0.5kg/mm^2荷重下での熱軟化点が20
0℃以上350℃以下であり、かつ400℃以下に融点
を有しない耐熱フィルムから成ることを特徴とする異形
フレキシブルプリント配線板。
(2) In a modified flexible printed circuit board (deformed FPC) with irregularities formed on its surface, the cover film that constitutes the deformed FPC has a heat shrinkage rate of 1.5% at 250°C.
Below, the thermal softening point under a load of 0.5kg/mm^2 is 20
1. A irregularly shaped flexible printed wiring board comprising a heat-resistant film having a melting point of 0° C. or more and 350° C. or less and not having a melting point of 400° C. or less.
JP1102018A 1989-04-21 1989-04-21 Deformed flexible printed wiring board Expired - Fee Related JP2877831B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1102018A JP2877831B2 (en) 1989-04-21 1989-04-21 Deformed flexible printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1102018A JP2877831B2 (en) 1989-04-21 1989-04-21 Deformed flexible printed wiring board

Publications (2)

Publication Number Publication Date
JPH02279330A true JPH02279330A (en) 1990-11-15
JP2877831B2 JP2877831B2 (en) 1999-04-05

Family

ID=14316014

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1102018A Expired - Fee Related JP2877831B2 (en) 1989-04-21 1989-04-21 Deformed flexible printed wiring board

Country Status (1)

Country Link
JP (1) JP2877831B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58178905A (en) * 1982-04-13 1983-10-20 帝人株式会社 Aromatic polyamide film insulating electric member
JPS61236825A (en) * 1985-04-15 1986-10-22 Toray Ind Inc Aromatic polyamide film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58178905A (en) * 1982-04-13 1983-10-20 帝人株式会社 Aromatic polyamide film insulating electric member
JPS61236825A (en) * 1985-04-15 1986-10-22 Toray Ind Inc Aromatic polyamide film

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