JPH022831U - - Google Patents
Info
- Publication number
- JPH022831U JPH022831U JP7902288U JP7902288U JPH022831U JP H022831 U JPH022831 U JP H022831U JP 7902288 U JP7902288 U JP 7902288U JP 7902288 U JP7902288 U JP 7902288U JP H022831 U JPH022831 U JP H022831U
- Authority
- JP
- Japan
- Prior art keywords
- processing apparatus
- wafer processing
- heater
- inert gas
- inner tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010438 heat treatment Methods 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 claims 4
- 239000011261 inert gas Substances 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
Landscapes
- Weting (AREA)
Description
第１図は本考案に係るウエハ処理装置用ヒータ
の実施例を示す断面図、第２図は同説明図である
。 １……内管、２……外管、３……発熱体、４…
…空間、５……熱電対、６……温度計、７……電
源。
の実施例を示す断面図、第２図は同説明図である
。 １……内管、２……外管、３……発熱体、４…
…空間、５……熱電対、６……温度計、７……電
源。
Claims (1)
- ウエハに溶液処理を行う薬液槽を備えるウエハ
処理装置の、前記薬液槽内に配置されるウエハ処
理装置用ヒータにおいて、発熱体を二重石英管の
内管内に収め、且つ内管と外管とで挾まれる空間
に減圧した不活性ガスを封入すると共に、該不活
性ガスの温度を当該空間に配設した温度センサで
検知するようにしたことを特徴とするウエハ処理
装置用ヒータ。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7902288U JPH022831U (ja) | 1988-06-15 | 1988-06-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7902288U JPH022831U (ja) | 1988-06-15 | 1988-06-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH022831U true JPH022831U (ja) | 1990-01-10 |
Family
ID=31303911
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7902288U Pending JPH022831U (ja) | 1988-06-15 | 1988-06-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH022831U (ja) |
-
1988
- 1988-06-15 JP JP7902288U patent/JPH022831U/ja active Pending