JPH02284010A - Measuring device for film thickness of resin film - Google Patents
Measuring device for film thickness of resin filmInfo
- Publication number
- JPH02284010A JPH02284010A JP10351289A JP10351289A JPH02284010A JP H02284010 A JPH02284010 A JP H02284010A JP 10351289 A JP10351289 A JP 10351289A JP 10351289 A JP10351289 A JP 10351289A JP H02284010 A JPH02284010 A JP H02284010A
- Authority
- JP
- Japan
- Prior art keywords
- light
- light intensity
- film
- light receiving
- film thickness
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011347 resin Substances 0.000 title claims abstract description 13
- 229920005989 resin Polymers 0.000 title claims abstract description 13
- 238000001514 detection method Methods 0.000 claims description 4
- 230000000630 rising effect Effects 0.000 abstract description 11
- 238000005259 measurement Methods 0.000 abstract description 10
- 239000000463 material Substances 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- 238000006073 displacement reaction Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 229920006255 plastic film Polymers 0.000 description 2
- 235000008708 Morus alba Nutrition 0.000 description 1
- 240000000249 Morus alba Species 0.000 description 1
- 210000003323 beak Anatomy 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野コ
本発明はプラスチックフィルム等の樹脂膜の厚みを計測
するための計測装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a measuring device for measuring the thickness of a resin film such as a plastic film.
[従来の技術]
一般に、プラスチックフィルムのラミネート装置では、
品質向上及びフィルム原材料の節約等の点からフィルム
膜厚を一定に制御する必要がある。[Prior Art] Generally, in a plastic film laminating device,
It is necessary to control the film thickness to a constant level in order to improve quality and save film raw materials.
このためにはフィルム膜厚を精度よく検出することが不
可欠である。For this purpose, it is essential to accurately detect the film thickness.
従来、フィルム膜厚を検出する際には、フィルムに赤外
線を照射してフィルムによる赤外線の吸収量に基づいて
フィルム膜厚を検出する計411装置、ベータ線あるい
はX線等の放射線をフィルムに照射してフィルムによる
放射線の吸収量に基づいてフィルム膜厚を検出する計測
装置、及びロール上を移動するフィルム及び基準面(ロ
ール表面)にレーザ光を照射しつつ走査して基準面とフ
ィルム表面との変位に基づいてフィルム膜厚を検出する
計測装置が用いられている。Conventionally, when detecting film thickness, there are a total of 411 devices that irradiate the film with infrared rays and detect the film thickness based on the amount of infrared rays absorbed by the film, and a total of 411 devices that irradiate the film with radiation such as beta rays or X-rays. A measurement device that detects the film thickness based on the amount of radiation absorbed by the film, and a measurement device that scans and irradiates the film and reference surface (roll surface) moving on a roll with a laser beam to detect the difference between the reference surface and the film surface. A measuring device is used that detects the film thickness based on the displacement of the film.
[発明が解決しようとする課題]
ところで、上述の赤外線を用いる計測装置の場合、赤外
線の吸収量がフィルムの材質により異なるため、予めフ
ィルム材質ごとに膜厚が既知であるフィルムを用いて、
赤外線吸収量を校正しておかねばならず、校正のための
作業が極めて面倒である。さらに、基材が透明であるか
、不透明であるかによりそれぞれ赤外線透過形または赤
外線反射形の計測装置を用いねばならない。即ち、基材
の種類によって計測装置を使い分けねばならない。[Problems to be Solved by the Invention] By the way, in the case of the above-mentioned measuring device that uses infrared rays, since the amount of infrared absorption varies depending on the material of the film, it is possible to use a film whose thickness is known in advance for each film material.
The amount of infrared absorption must be calibrated, and the work for calibration is extremely troublesome. Furthermore, depending on whether the base material is transparent or opaque, an infrared transmission type or infrared reflection type measuring device must be used, respectively. That is, different measuring devices must be used depending on the type of base material.
また、基材に文字等が印刷されている場合、印刷顔料に
赤外線が吸収され、膜厚の計JDJに誤差が生じるとい
う問題点がある。Further, when characters or the like are printed on the base material, there is a problem that infrared rays are absorbed by the printed pigment, causing an error in the total film thickness JDJ.
上述の放射線を用いる計測装置の場合、同様に放射線の
吸収量がフィルムの材質により異なるため、予めフィル
ム材質ごとに膜厚が既知であるフィルムを用いて、放射
線吸収量を校正しておかねばならず、校正のための作業
が極めて面倒である。In the case of the above-mentioned measuring device that uses radiation, the amount of radiation absorbed similarly varies depending on the material of the film, so the amount of radiation absorbed must be calibrated in advance using a film whose thickness is known for each film material. First, the work for calibration is extremely troublesome.
また、放射線を用いているから管理に特別の配慮をしな
ければななず、加えて、原子核の崩壊は不規則であるか
ら、放射線の強度にふらつきがある。Furthermore, since radiation is used, special care must be taken in its management, and in addition, the decay of atomic nuclei is irregular, so the intensity of the radiation fluctuates.
そのため、膜厚計測時間を長くして膜厚計測値を平均し
て膜厚計、(Fl精度を向上しなければならず、いずれ
にしても膜厚計311精度が劣化するという問題点があ
る。Therefore, it is necessary to increase the film thickness measurement time and average the film thickness measurement values to improve the accuracy of the film thickness meter (Fl), but in any case, there is a problem that the accuracy of the film thickness meter 311 deteriorates. .
一方、上述の変位によって膜厚の計測を行う計測装置の
場合、ロールの真円度及びロールの回転こ伴う振動の影
響を受け、膜厚計測精度が低下するという問題点がある
。即ち、ロールを回転しつつ間けつ的に膜厚を計測して
いるから、ロールの回転位置によって計測誤差が生じる
という問題点がある。On the other hand, in the case of a measuring device that measures the film thickness by the above-mentioned displacement, there is a problem that the film thickness measurement accuracy decreases due to the influence of the roundness of the roll and the vibrations accompanying the rotation of the roll. That is, since the film thickness is measured intermittently while rotating the roll, there is a problem in that measurement errors occur depending on the rotational position of the roll.
本発明の目的は簡単な構成で極めて高精度にフィルム膜
厚を計測lできる計測l装置を提供することにある。An object of the present invention is to provide a measurement device that can measure film thickness with extremely high accuracy with a simple configuration.
[課題を解決するための手段]
本発明によれば、ロール表面に沿って移動する樹脂膜の
膜厚を計測するための計測装置であって、該ロール表面
の接線方向に進行する光を送出する光源と、該光源から
の光を受ける受光素子を複数備え該受光素子が前記ロー
ルの径方向に配列された受光部と、前記ロールと前記受
光部との間に配置されたレンズ系と、前記受光素子に連
結され該受光素子毎の光強度を検出し複数の光強度信号
を出力する光強度検出手段と、前記複数の光強度信号に
基づいて樹脂膜の膜厚を求める処理手段とをaすること
を特徴とする樹脂膜の膜厚計71PI装置が得られる。[Means for Solving the Problems] According to the present invention, there is provided a measuring device for measuring the film thickness of a resin film moving along a roll surface, which transmits light traveling in a tangential direction of the roll surface. a light source, a light receiving unit including a plurality of light receiving elements that receive light from the light source and the light receiving elements are arranged in a radial direction of the roll, and a lens system disposed between the roll and the light receiving unit; a light intensity detection means connected to the light receiving element to detect the light intensity of each light receiving element and output a plurality of light intensity signals; and a processing means for determining the film thickness of the resin film based on the plurality of light intensity signals. A resin film thickness meter 71PI device is obtained, which is characterized by a.
[作用]
本発明では、光源からロール表面の接線方向に進行する
光を送出する。この光はロール上にある樹脂膜によって
回折されてレンズ系に入射される。[Function] In the present invention, light traveling in the tangential direction of the roll surface is emitted from the light source. This light is diffracted by the resin film on the roll and enters the lens system.
このレンズ系は受光部の反対側における結像位置がロー
ル表面の近傍となるようにロールと受光部との間に配置
される。つまり、実質的に受光部が近傍に配置されたこ
とになる。この結果、回折パターンの傾きが急となって
受光部に与えられる。This lens system is arranged between the roll and the light receiving section so that the imaging position on the opposite side of the light receiving section is near the surface of the roll. In other words, the light receiving section is substantially arranged nearby. As a result, the slope of the diffraction pattern becomes steeper and is applied to the light receiving section.
各受光素子で受けた光はそれぞれ光強度検出手段でその
強度が検出され、これら検出光強度に基づいて処理手段
は樹脂膜の膜厚を算出する。このように、複数の受光素
子で回折光を受けているから測定範囲が広くなり、かつ
高い分解能を得ることができる。The intensity of the light received by each light receiving element is detected by the light intensity detection means, and the processing means calculates the thickness of the resin film based on the detected light intensities. In this way, since the diffracted light is received by a plurality of light receiving elements, the measurement range is widened and high resolution can be obtained.
[実施例] 以下本発明について実施例に基づいて説明する。[Example] The present invention will be described below based on examples.
まず、第1図を参照して、光源(図示せず)がらの下行
光を遮蔽物(遮蔽板)1の縁(エツジ)で遮蔽すると、
スクリーン2上に明暗のパターンが生じる。即ち、第1
図に示すように、遮蔽物1の右側において光強度が変化
するパターンが生じる。First, referring to FIG. 1, if the downward light from the light source (not shown) is blocked by the edge of the shield (shielding plate) 1, then
A bright and dark pattern is created on the screen 2. That is, the first
As shown in the figure, a pattern in which the light intensity changes occurs on the right side of the shielding object 1.
この現象は一般にフレネル回折と呼ばれおり、スクリー
ン2上の光強度の変化は解析的に求めることが可能であ
る。そして遮蔽物1のエツジが左右に移動すると、この
光強度パターンはエツジの移動方向にエツジの移動量と
同じ移動量だけ移動する。つまり、エツジの延長線上に
あるスクリーン2上の点Pと第1のビークQとの距、f
itxはエツジとスクリーン2との距離zに比例する。This phenomenon is generally called Fresnel diffraction, and the change in light intensity on the screen 2 can be determined analytically. When the edge of the shielding object 1 moves from side to side, this light intensity pattern moves in the direction of edge movement by the same amount of movement as the edge. In other words, the distance between the point P on the screen 2 on the extension line of the edge and the first beak Q, f
itx is proportional to the distance z between the edge and the screen 2.
即ち、xocFrの関係にあり、エツジの変位量と回折
パターンの移動量とは一致する。That is, there is a relationship xocFr, and the amount of edge displacement and the amount of movement of the diffraction pattern match.
ところで、フィルムのラミネート装置においては、押出
成形機から押出されたフィルムはロールに沿って所定の
方向に移動される。従って、光源からロールの接線方向
に照射した光、つまり、ロールの表面に照射した光はロ
ール表面で回折されてスクリーン上に光強度パターン(
回折パターン)が生じる。前述のように、この光強度パ
ターンは遮蔽物の位置によって異なるから、即ち、ロー
ル上を移動するフィルムの厚さで異なるから、例えば、
フィルムの厚さがdlからd2に変化すると、光強度パ
ターンはΔk(Δに−d2−d、)だけフィルムの厚さ
の変化方向に移動する。従って、光強度パターンの移動
変化を検出することによってフィルム膜厚を計−11J
することができる。By the way, in a film laminating apparatus, a film extruded from an extrusion molding machine is moved in a predetermined direction along rolls. Therefore, the light irradiated from the light source in the tangential direction of the roll, that is, the light irradiated onto the roll surface, is diffracted by the roll surface and a light intensity pattern (
diffraction pattern). As mentioned above, this light intensity pattern varies with the position of the shield, i.e. with the thickness of the film moving on the roll, e.g.
When the film thickness changes from dl to d2, the light intensity pattern moves by Δk (Δ−d2−d,) in the direction of film thickness change. Therefore, by detecting the moving change in the light intensity pattern, the film thickness can be measured by -11J.
can do.
ここで、第2図を参照して、本発明によるフィルム膜厚
計測装置について説明する。Here, with reference to FIG. 2, a film thickness measuring device according to the present invention will be explained.
本発明によるフィルム膜厚計II−j装置は光源11、
この光源11とレンズ系12を介して対向して配置され
た受光部13、受光部13に接続された光強度検出装置
14、及び光強度検出装置14に接続された処理装置1
5を備えている。The film thickness meter II-j device according to the present invention includes a light source 11;
A light receiving section 13 disposed facing the light source 11 via a lens system 12, a light intensity detecting device 14 connected to the light receiving section 13, and a processing device 1 connected to the light intensity detecting device 14.
5.
光?R11と受光部13とはローラ16をはさんで配置
されており、光源11からの光はローラ16の接線方向
に進行する。第3図に示すように光源11からの光軸上
において受光部13とローラ16との間にはレンズ系1
2が配置されている。light? R11 and the light receiving section 13 are arranged with the roller 16 in between, and the light from the light source 11 travels in the tangential direction of the roller 16. As shown in FIG. 3, a lens system 1 is located between the light receiving section 13 and the roller 16 on the optical axis from the light source 11.
2 is placed.
レンズ系12の配置位置はレンズ系12による一方の結
像位置(虚像の位置、つまり、仮想スクリーン12aの
位置)がローラ16の表面近傍となるように決定される
。これによって、受光部13には拡大された回折パター
ンが入射されることになる。The arrangement position of the lens system 12 is determined so that one image formation position (the position of the virtual image, that is, the position of the virtual screen 12a) by the lens system 12 is near the surface of the roller 16. As a result, the enlarged diffraction pattern is incident on the light receiving section 13.
受光部13は複数の受光素子13aを備えており、これ
ら複数の受光素子13aは第3図に示すようにローラ1
6の径方向に配列されている(受光素子13aは下側か
ら上側に向かって1番目、2番目、・・・1番目の順で
配列されている)。上記の受光部13は例えばCCDで
構成されている。The light receiving section 13 includes a plurality of light receiving elements 13a, and these plurality of light receiving elements 13a are connected to the roller 1 as shown in FIG.
6 (the light receiving elements 13a are arranged in the order of 1st, 2nd, . . . 1st from the bottom to the top). The light receiving section 13 described above is composed of, for example, a CCD.
光強度検出装置14は複数の光強度検出器14aを備え
ており、各受光素子13aは対応する光強度検出器14
aに接続されている。The light intensity detector 14 includes a plurality of light intensity detectors 14a, and each light receiving element 13a corresponds to the corresponding light intensity detector 14.
connected to a.
ここで、第4図に示すように回折パターンの立ち上がり
部分が1番目の受光素子13aに対応し、一つの受光素
子13aが受ける移動範囲(回折パターンの範囲)がx
umであるとすると、フィルム膜の膜厚の変化、つまり
膜厚の変位2はz−i x十f (P+ )t、tm−
(1)で表される。Here, as shown in FIG. 4, the rising portion of the diffraction pattern corresponds to the first light-receiving element 13a, and the movement range (range of the diffraction pattern) that one light-receiving element 13a receives is x
um, the change in the thickness of the film, that is, the displacement 2 of the film thickness, is z−ix×f(P+)t,tm−
It is expressed as (1).
ここで、P、は1番目の受光素子13aの受光強度、f
(P、)は受光強度Plから算出した移動量(変位量)
を示す。Here, P is the light receiving intensity of the first light receiving element 13a, f
(P,) is the amount of movement (displacement) calculated from the received light intensity Pl
shows.
つまり、後述するように第(1)式の右辺第1項は膜厚
の変位を粗く示し、第2項は膜厚の細かい変位を示すこ
とになる。In other words, as will be described later, the first term on the right side of equation (1) roughly indicates a change in film thickness, and the second term indicates a fine change in film thickness.
受光部13はローラ16上にフィルム17が存在しない
状態で1番目の受光素子13a(最下端に位置する受光
素子13a)が回折パターンの立ち上がり部分に対応し
ている。つまり、1番目の受光素子13aが基桑となっ
ている。従って、ローラ16上にフィルム17が存在す
る状態ではフ例えば、i (i≧2)番目の受光素子1
3aが回折パターンの立ち上がり部分に対応することに
なる。In the light receiving section 13, when the film 17 is not present on the roller 16, the first light receiving element 13a (the light receiving element 13a located at the lowest end) corresponds to the rising portion of the diffraction pattern. In other words, the first light receiving element 13a is the base mulberry. Therefore, when the film 17 is present on the roller 16, for example, the i-th (i≧2) light receiving element 1
3a corresponds to the rising portion of the diffraction pattern.
各受光素子13aで受光された光は光強度検出器14a
にそれぞれ与えられ、ここで光強度が検出され、光強度
信号として出力される。そして、これら光強度信号は処
理装置15に入力される。The light received by each light receiving element 13a is detected by a light intensity detector 14a.
The light intensity is detected here and output as a light intensity signal. These light intensity signals are then input to the processing device 15.
処理装置15には所定のスレッシュホールドレベルが予
め設定されており、このスレッシュホールドレベルは回
折パターンの立ち上がり部分に対応する光強度に定めら
れている。A predetermined threshold level is preset in the processing device 15, and this threshold level is set to a light intensity corresponding to the rising portion of the diffraction pattern.
ところで、フィルム17の膜厚が変化すると、回折パタ
ーンの立ち上がり部分に対応する受光素子13aが変わ
ることになる。つまり、各受光素子13aに入射される
光の強度が変化することになる。これによって、各光強
度検出器14aから出力される光強度信号が変化する。By the way, when the thickness of the film 17 changes, the light receiving element 13a corresponding to the rising portion of the diffraction pattern changes. In other words, the intensity of light incident on each light receiving element 13a changes. This changes the light intensity signal output from each light intensity detector 14a.
処理装置〕5はこれらの光強度信号から各受光素子13
aに入射された受光量(光強度)を知り、上述のスレッ
シュホールドレベルによって回折パターンの立ち上がり
部分に対応する受光素子13aを特定する。Processing device] 5 processes each light receiving element 13 from these light intensity signals.
The amount of light received (light intensity) incident on a is known, and the light receiving element 13a corresponding to the rising portion of the diffraction pattern is specified using the above-mentioned threshold level.
例えば、(i+1)番目の受光素子13aが回折パター
ンの立ち上がり部分に対応していると特定する。そして
、処理装置15は(i+1)番目の受光素子13aに入
射された光の強度(P+++)も用いて、上述の第(1
)式によってフィルム膜厚の変化を求める。つまり、フ
ィルム膜厚の変化(z)−(i+1)x+f (P++
+ )を求める。For example, it is specified that the (i+1)th light receiving element 13a corresponds to the rising portion of the diffraction pattern. Then, the processing device 15 also uses the intensity (P+++) of the light incident on the (i+1)th light receiving element 13a to
) Find the change in film thickness using the formula. In other words, the change in film thickness (z)-(i+1)x+f (P++
+).
ここでは、(1+1)Xによって、即ち、回折パターン
の立ち上がり部分に対応する受光素子13aの位置に基
づいて粗くフィルム膜厚の変化を求め、さらに、(i+
1)番目の受光素子13aの光強度P4,1はフィルム
嘆Iゾの微小な変化に対応して変化するからこのP1+
1からフィルム膜厚の微小な変化f(P++t)を求め
て、実際のフィルム膜厚の変化(2)を求める。このよ
うにして、連続してフィルム膜厚の変化を計njする。Here, the change in film thickness is roughly determined based on (1+1)X, that is, the position of the light receiving element 13a corresponding to the rising portion of the diffraction pattern, and further, (i+
1) Since the light intensity P4,1 of the th light-receiving element 13a changes in response to minute changes in the film angle, this P1+
A minute change f(P++t) in the film thickness is determined from 1, and an actual change (2) in the film thickness is determined. In this way, changes in film thickness are continuously measured.
[発明の効果]
以上説明したように、本発明ではレンズ系を用いて実質
的に回折パターンを拡大して、さらに、複数の受光素子
を用いて樹脂膜厚の変化に応じる回折パターンの変化を
光強度(受光量)の変化で捕らえているから、広い測定
範囲が確保できるばかりでなく高い分解能を確保てきる
。従って、樹脂膜厚を簡単にしかも極めて精度よく計測
することができる。[Effects of the Invention] As explained above, in the present invention, a lens system is used to substantially enlarge a diffraction pattern, and a plurality of light-receiving elements are used to change the diffraction pattern in response to changes in resin film thickness. Because it detects changes in light intensity (amount of received light), it not only ensures a wide measurement range but also high resolution. Therefore, the resin film thickness can be easily measured with extremely high accuracy.
第1図はフレネル回折を説明するための図、第2図は本
発明によるフィルム膜厚計測装置の一実施例を示す図、
第3図は第2図に示すフィルム膜厚計測装置の要部を示
す図、第4図は本発明によるフィルム膜厚計′1p1装
置の動作を説明するための図である。
11・・・光源、12・・・レンズ系、13・・・受光
部、14・・・光強度検出装置、15・・・処理装置、
16・・・ローラ、17・・・フィルム。
鵠4図
L−i [、i+1FIG. 1 is a diagram for explaining Fresnel diffraction, FIG. 2 is a diagram showing an embodiment of the film thickness measuring device according to the present invention,
FIG. 3 is a diagram showing essential parts of the film thickness measuring device shown in FIG. 2, and FIG. 4 is a diagram for explaining the operation of the film thickness measuring device '1p1 according to the present invention. DESCRIPTION OF SYMBOLS 11... Light source, 12... Lens system, 13... Light receiving part, 14... Light intensity detection device, 15... Processing device,
16...roller, 17...film. Moe 4 figure L-i [, i+1
Claims (1)
るための計測装置であって、該ロール表面の接線方向に
進行する光を送出する光源と、該光源からの光を受ける
受光素子を複数備え該受光素子が前記ロールの径方向に
配列された受光部と、前記ロールと前記受光部との間に
配置されたレンズ系と、前記受光素子に連結され該受光
素子毎の光強度を検出し複数の光強度信号を出力する光
強度検出手段と、前記複数の光強度信号に基づいて樹脂
膜の膜厚を求める処理手段とを有することを特徴とする
樹脂膜の膜厚計測装置。1. A measuring device for measuring the film thickness of a resin film moving along a roll surface, which includes a light source that emits light traveling in a tangential direction to the roll surface, and a light receiving element that receives light from the light source. a plurality of light receiving sections in which the light receiving elements are arranged in the radial direction of the roll; a lens system disposed between the roll and the light receiving section; and a lens system connected to the light receiving elements and configured to adjust the light intensity of each light receiving element. A resin film thickness measuring device comprising a light intensity detection means for detecting and outputting a plurality of light intensity signals, and a processing means for determining the film thickness of the resin film based on the plurality of light intensity signals. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10351289A JPH02284010A (en) | 1989-04-25 | 1989-04-25 | Measuring device for film thickness of resin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10351289A JPH02284010A (en) | 1989-04-25 | 1989-04-25 | Measuring device for film thickness of resin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02284010A true JPH02284010A (en) | 1990-11-21 |
Family
ID=14356016
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10351289A Pending JPH02284010A (en) | 1989-04-25 | 1989-04-25 | Measuring device for film thickness of resin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02284010A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006510495A (en) * | 2002-12-19 | 2006-03-30 | レニショウ パブリック リミテッド カンパニー | Tool analysis apparatus and method |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322759A (en) * | 1976-08-16 | 1978-03-02 | Oki Electric Ind Co Ltd | Thickness de tector of plate form objects |
-
1989
- 1989-04-25 JP JP10351289A patent/JPH02284010A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5322759A (en) * | 1976-08-16 | 1978-03-02 | Oki Electric Ind Co Ltd | Thickness de tector of plate form objects |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006510495A (en) * | 2002-12-19 | 2006-03-30 | レニショウ パブリック リミテッド カンパニー | Tool analysis apparatus and method |
| JP4750422B2 (en) * | 2002-12-19 | 2011-08-17 | レニショウ パブリック リミテッド カンパニー | Tool analysis apparatus and method |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6246050B1 (en) | Optical encoders using non-patterned targets | |
| KR101414707B1 (en) | X-ray imaging apparatus and x-ray imaging method | |
| CA2672679A1 (en) | Method and apparatus for thickness measurement | |
| US4150282A (en) | Detector for bidirectional movement of an extensible member in an electronic digital scale | |
| JPS63173904A (en) | Noncontact space measurement and device thereof | |
| JP5808015B2 (en) | Defect inspection method | |
| JPH05231985A (en) | Method and device for measuring refractive power in optical system | |
| US5066129A (en) | Optical linear encoder with light quantity calabration | |
| JPH02284010A (en) | Measuring device for film thickness of resin film | |
| JPS63288292A (en) | Rotating interrupter alignment device | |
| US4369733A (en) | Toner concentration control apparatus | |
| US5506407A (en) | High resolution high speed film measuring apparatus and method | |
| KR101240792B1 (en) | Encoder and light receiving device for encoder | |
| JPS6315767Y2 (en) | ||
| US4592650A (en) | Apparatus for projecting a pattern on a semiconductor substrate | |
| JPS61155803A (en) | Width measuring instrument | |
| JPH01291104A (en) | Film thickness measuring instrument for resin film | |
| JPH02284009A (en) | Measuring device for film thickness of resin film | |
| JPH0629698B2 (en) | Edge detection device | |
| JPH047803B2 (en) | ||
| JPH02284011A (en) | Measuring device for film thickness of resin film | |
| JPS55154402A (en) | Shape measuring apparatus | |
| RU2017084C1 (en) | Device for indication and visual observation of ir-range electromagnetic radiation | |
| JPH1019757A (en) | Particle size distribution analyzer | |
| JPH01193604A (en) | Thickness measuring device for film-like objects |