JPH02288295A - Manufacturing method of printed wiring board - Google Patents

Manufacturing method of printed wiring board

Info

Publication number
JPH02288295A
JPH02288295A JP1107458A JP10745889A JPH02288295A JP H02288295 A JPH02288295 A JP H02288295A JP 1107458 A JP1107458 A JP 1107458A JP 10745889 A JP10745889 A JP 10745889A JP H02288295 A JPH02288295 A JP H02288295A
Authority
JP
Japan
Prior art keywords
resin
conductive layer
layer
thermosetting
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1107458A
Other languages
Japanese (ja)
Inventor
Eiichi Tsunashima
瑛一 綱島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP1107458A priority Critical patent/JPH02288295A/en
Publication of JPH02288295A publication Critical patent/JPH02288295A/en
Pending legal-status Critical Current

Links

Landscapes

  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE:To make the material of a resin inductive layer solventless, as a printing method for a circuit board provided with a step, so as to prevent generation of bubbles thereby preventing the withstand voltage from decreasing by forming a resin conductives layer out of thermosetting material so that it may cover the upper surface and the side face of the resin inductive layer extensively and that the ends may reach the surface of a resin insulating plate. CONSTITUTION:The hardening of a resin conductive layer is done by thermosetting, and the thermosetting temperature is in the range not exceeding Tg of a resin insulating plate and lower than Tg by 20 deg.C or less and the hardening of a resin inductive layer is done by thermosetting before hardening of the resin conductive layer, and the hardening temperature is lower than Tg of the resin insulating plate by 20 deg.C or more, and further, a second resin insulating layer is provided at the upper layer of the resin conductive layer, and the hardening is done by thermosetting. The conductive resin layer is surely printed astride the face of the resin insulating plate 1 so that the circuit-board conductor pattern 2 and the resin inductive layer may not be exposed. As a printing method for the resin inductive layer 3, stencil printing is more advantageous than screen printing since it does not engulf bubbles. As material of the resin inductive layer 3, epoxy resin is made a basis.

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、エレクトロニクス機器に収納するプリント配
線板の製造方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a method of manufacturing a printed wiring board to be housed in electronic equipment.

(従来の技術) 従来1回路板に対して電磁シールドを必要とする箇所に
対して、金属箔を被せたり1回路板金体を金属ケースに
収納し、フィルタを設けて、正常な信号以外の周波数(
雑音)の発生を外部に伝導。
(Prior art) Conventionally, parts of a circuit board that require electromagnetic shielding are covered with metal foil, or the circuit board is housed in a metal case, and a filter is installed to prevent frequencies other than normal signals. (
conducts noise (noise) to the outside.

あるいは輻射の形で漏洩させない技術が存在している。Alternatively, there is a technology that prevents leakage in the form of radiation.

また絶縁フィルム、または印刷絶縁樹脂上に、金属層ま
たは、金属粉を含む層をシールド層として貼付、印刷、
積層または蒸着して行うことも提案されている。
In addition, a metal layer or a layer containing metal powder is pasted as a shield layer on an insulating film or printed insulating resin, printed,
It has also been proposed to perform the process by laminating or vapor depositing.

さらに、また、次のような新提案もされている。Furthermore, the following new proposals have also been made.

これは、回路基板の片面または両面に存在する印刷導体
の特定部分に、絶縁性の樹脂誘電層をスクリーン印刷等
の手段で形成し、その上に、樹脂導電層を形成するもの
で、構造的には第2図に示すように、樹脂絶縁板または
絶縁シート1上に形成される回路状導電体パターン2を
形成し、その上に樹脂誘電層3を設け、その上に樹脂導
電層4を形成しである。
This is a method in which an insulating resin dielectric layer is formed on a specific part of the printed conductor on one or both sides of the circuit board by means such as screen printing, and a resin conductive layer is formed on top of that, resulting in a structural As shown in FIG. 2, a circuit-like conductive pattern 2 is formed on a resin insulating plate or an insulating sheet 1, a resin dielectric layer 3 is provided thereon, and a resin conductive layer 4 is formed on it. It is formed.

(発明が解決しようとする課題) ところで、この提案では樹脂誘電層3の端部AよりBに
水平に定間隔りを設けて、樹脂導電層4を樹脂誘電層3
の端面より後退させている。上記の定間隔を設けるのは
、まず導電体パターン2(代表例として1選択的にエツ
チングによって形成)と樹脂導電層4(代表例として、
銅ペーストのスクリーン・メツシュ印刷と、加熱硬化に
よって形成)の沿面距離を長く保つことによって、相互
に短絡するのを防ぐためである。また、樹脂導電層4の
印刷精度が良くないのを補なうためである。
(Problem to be Solved by the Invention) In this proposal, regular intervals are provided horizontally from end A to B of the resin dielectric layer 3, and the resin conductive layer 4 is connected to the resin dielectric layer 3.
It is set back from the end face. The reason for providing the above-mentioned regular intervals is to first form the conductive pattern 2 (formed by selective etching as a typical example) and the resin conductive layer 4 (as a typical example,
This is to prevent mutual short-circuiting by maintaining a long creepage distance of the copper paste (formed by screen mesh printing and heat curing). This is also to compensate for the poor printing accuracy of the resin conductive layer 4.

印刷精度は印刷機・印刷版などによっても左右されるが
、印刷される材料の特性や管理の技術によっても影響さ
れる。不要輻射の防止技術にとって、重要なことは、輻
射の防止程度と、その永続性であって、前者は特性周波
数域での減衰度(デシベル)、後者は導体抵抗値の変化
とマイグレイジョン(電食)の大きさが問題となる。第
2図に示す従来例は、回路状導電体パターン2、樹脂誘
電Jf#3の大気中に露出している部分8,9があるの
で、不要輻射の防止程度が満足のいくものではない。
Printing accuracy is affected not only by the printing machine and printing plate, but also by the characteristics of the material being printed and management technology. What is important for unnecessary radiation prevention technology is the degree of radiation prevention and its persistence. The problem is the magnitude of electrolytic corrosion. In the conventional example shown in FIG. 2, since there are portions 8 and 9 of the circuit conductor pattern 2 and the resin dielectric Jf#3 exposed to the atmosphere, the degree of prevention of unnecessary radiation is not satisfactory.

また、樹脂誘電層として、市販のソルダレジスト(メラ
ミン、フェノール、酸無水物硬化エポキシ樹脂、イミダ
ソール硬化エポキシ樹脂など)が樹脂絶縁板1を熱的に
破壊しない加熱硬化によって使用されているが、前記の
ソルダレジストは、印刷、硬化時に気泡が発生し、また
塩素(CI)、ナトリウム(Na)等の不純物を有し、
亜鉛(Zn)、二酸化珪素のエアロジル、アンチモン(
sb)等のマイグレイジョン抑制剤を有しないので、樹
脂誘電層3の耐電圧は不安定であり、マイグレイジョン
による変色、絶縁抵抗劣化、短絡などが比較的、短時日
のうちにおこり、不要輻射の減衰効果が減少するのは勿
論、導電パターン2の機能を失わせるものであった。
Furthermore, as the resin dielectric layer, a commercially available solder resist (melamine, phenol, acid anhydride-cured epoxy resin, imidasol-cured epoxy resin, etc.) is used by heating and curing the resin insulating board 1 without thermally destroying it. Solder resists generate bubbles during printing and curing, and also contain impurities such as chlorine (CI) and sodium (Na).
Zinc (Zn), Aerosil silicon dioxide, antimony (
Since it does not contain migration inhibitors such as sb), the withstand voltage of the resin dielectric layer 3 is unstable, and discoloration, insulation resistance deterioration, short circuits, etc. due to migration occur within a relatively short period of time, making it unnecessary. Not only the radiation attenuation effect was reduced, but also the conductive pattern 2 lost its function.

本発明の目的は、従来の欠点を解消し、導電体パターン
と樹脂導電層にはさまれる樹脂誘電層を露出させず、ま
た段差のある回路板に対する印刷法として、樹脂誘電層
の材料を無溶剤化して気泡の発生するのを防ぎ、耐電圧
の低下を防止した優れたプリント配線板の製造方法を提
供することである。
The purpose of the present invention is to eliminate the conventional drawbacks, to avoid exposing the resin dielectric layer sandwiched between the conductor pattern and the resin conductive layer, and to eliminate the material of the resin dielectric layer as a printing method for circuit boards with steps. An object of the present invention is to provide an excellent method for manufacturing a printed wiring board that prevents generation of bubbles due to solventization and prevents a decrease in withstand voltage.

(課題を解決するための手段) 本発明のプリント配線板の製造方法は、樹脂絶縁板の両
面に、それぞれ印刷法により回路状導電体パターンを平
行導電層として形成し、かつ、この平行導電層は、樹脂
絶縁板を挟む構造であって、さらに回路状導電体パター
ンに厚さ15/71I以上のピンホールのない樹脂誘電
層を、その表面および側面に連続的にスクリーン法また
はステンシル法により印刷形成して、上下左右を覆い、
最後に、樹脂誘電層を隔てて樹脂導電層を、平行導電層
と対向させて配置し、かつ樹脂導電層の端部を樹脂絶縁
板の回路状導電体パターンのない絶縁面にまで拡張し、
樹脂誘電層を被覆するものである。また樹脂導電層の硬
化を熱硬化で行い、かつその硬化温度が樹脂絶縁板の’
rgを超えず、Tgより20℃以内低い範囲であり、ま
た樹脂誘電層の硬化を熱硬化で樹脂導電層の硬化前に行
い、かつ、その硬化温度が、樹脂絶縁板のTgより20
℃以上低めであり、また樹脂導電層の上層に、第2の樹
脂絶縁層を設け、かつその硬化を熱硬化で行い、かつそ
の硬化温度が樹脂導電層の熱硬化温度を超えるものであ
り、また樹脂導電層と第2の樹脂絶縁層との熱硬化を同
時に、樹脂導電層の’rgを超えない温度で行うもので
あり、また、第2の樹脂絶縁層の印刷を、樹脂導電層ま
たはその半田コートの揮発性でハロゲン非含有のレベリ
ングを適用した範囲をこえて拡張して印刷形成するもの
である。また同時熱硬化を行うにあたって樹脂導電層中
の溶剤や未硬化分を完全に除去するために、樹脂導電層
中の樹脂の1g以下で、かつ70℃以上の予備加熱を樹
脂導電層に施すものであり、また樹脂導電層の熱硬化を
不活性雰囲気中で、好ましくは窒素分圧60〜90の分
圧を持つ準不活性気溜中で行うものであり、導電性樹脂
の加熱によって硬化したのち、外気に接する回路状導電
体パターンに対する油の付着、空気酸化、熱酸化などを
防ぐために、半田付は性のあるロジン、合成ロジンまた
は0.001重量%以下にハロゲン化物の含有量を規制
したフラックス樹脂を溶剤によりフラックス樹脂液とし
て、70℃以下の温度で加熱し固着するものであり、ま
た、熱硬化を行ったのち、フラックス樹脂液を樹脂導電
層に設け、半田のリフローコーティングを行うものであ
り、さらに、熱硬化の樹脂導電層を樹脂絶縁層で選択的
または全面および側面において、外気と接触しないよう
に印刷し、熱硬化するものである。
(Means for Solving the Problems) The method for manufacturing a printed wiring board of the present invention includes forming circuit-like conductor patterns as parallel conductive layers on both sides of a resin insulating board by a printing method, and has a structure in which a resin insulating plate is sandwiched, and a pinhole-free resin dielectric layer with a thickness of 15/71I or more is printed continuously on the surface and side surfaces of the circuit conductor pattern by a screen method or a stencil method. form and cover the top, bottom, left and right,
Finally, a resin conductive layer is placed opposite the parallel conductive layer across the resin dielectric layer, and the end of the resin conductive layer is extended to the insulating surface of the resin insulating plate without the circuit conductor pattern,
It covers the resin dielectric layer. In addition, the resin conductive layer is cured by heat curing, and the curing temperature is equal to that of the resin insulating board.
rg and within 20°C lower than Tg, and the resin dielectric layer is cured by thermosetting before the resin conductive layer, and the curing temperature is 20°C lower than Tg of the resin insulating board.
℃ or lower, and a second resin insulating layer is provided on the upper layer of the resin conductive layer, and the curing is performed by thermosetting, and the curing temperature exceeds the thermosetting temperature of the resin conductive layer, Further, the resin conductive layer and the second resin insulating layer are thermally cured at the same time at a temperature not exceeding 'rg of the resin conductive layer, and the second resin insulating layer is printed on the resin conductive layer or the second resin insulating layer. Printing extends beyond the scope of application of volatile, halogen-free leveling of the solder coat. In addition, in order to completely remove the solvent and uncured components in the resin conductive layer during simultaneous thermal curing, the resin conductive layer is preheated to 70°C or higher with less than 1 g of resin in the resin conductive layer. In addition, the resin conductive layer is thermally cured in an inert atmosphere, preferably in a semi-inert atmosphere having a nitrogen partial pressure of 60 to 90, and the conductive resin is cured by heating. Later, in order to prevent oil adhesion, air oxidation, thermal oxidation, etc. to the circuit conductor pattern that is in contact with the outside air, soldering must be done with rosin, synthetic rosin, or with a halide content of 0.001% by weight or less. The flux resin is converted into a flux resin liquid using a solvent, and is fixed by heating at a temperature of 70°C or less.Furthermore, after thermosetting, the flux resin liquid is applied to the resin conductive layer, and solder reflow coating is performed. Furthermore, the thermosetting resin conductive layer is printed with a resin insulating layer selectively or on the entire surface and sides so as not to come into contact with the outside air, and then thermosetted.

(作 用) 本発明によれば、4電体パターンと樹脂導電層とに挟ま
れる樹脂誘電層が不要輻射の媒体として、波長短縮、再
輻射を行うので、この樹脂誘電層を露出させないように
、樹脂導電層で覆う。つぎに、段差ある回路板に対する
印刷法として樹脂誘電層の材料を無溶剤化し、またメツ
シュスクリーンをステンシルにかえたので、どちらも気
泡(空気。
(Function) According to the present invention, the resin dielectric layer sandwiched between the four-electric pattern and the resin conductive layer acts as a medium for unnecessary radiation and performs wavelength shortening and re-radiation, so the resin dielectric layer should not be exposed. , covered with a resin conductive layer. Next, as a printing method for circuit boards with uneven surfaces, we changed the material of the resin dielectric layer to a solvent-free material and replaced the mesh screen with a stencil, so both of them contained air bubbles (air bubbles).

水蒸気、樹脂中の溶剤、揮発分)の発生を防ぎ、耐電圧
の低下を防止する。また印刷する樹脂誘電層の材質およ
び硬化剤、ならびにその残溜、イオン性不純物量の制限
は、電食およびマイグレイジョンによる絶縁抵抗劣化を
全く起こさない。
This prevents the generation of water vapor, solvents in resin, volatile matter) and prevents a drop in withstand voltage. Furthermore, by limiting the material and curing agent of the printed resin dielectric layer, its residual content, and the amount of ionic impurities, insulation resistance deterioration due to electrolytic corrosion and migration will not occur at all.

(実施例) 本発明の一実施例を第1図に基づいて説明する。(Example) An embodiment of the present invention will be described based on FIG.

第1図は本発明の方法で製造したプリント配線板の断面
図である。同図において、第2図に示した従来と同じ部
分には同一符号を付しである。
FIG. 1 is a sectional view of a printed wiring board manufactured by the method of the present invention. In this figure, the same parts as the conventional one shown in FIG. 2 are given the same reference numerals.

第1図において、1は樹脂絶縁板で、その両表面に回路
状導電体パターン2,2′を形成し、導電体パターン2
,2′の全体を覆うように樹脂誘電層3,3′で被覆し
、その上に樹脂誘電層3゜3′の全体を覆うように樹脂
導電層4,4′を、その端部が前記樹脂絶縁板1の回路
状導電体パターンのない絶縁面にまで達するように形成
し、さらにその上を樹脂層5,5′で被覆しである。
In FIG. 1, 1 is a resin insulating plate, on both surfaces of which circuit-like conductive patterns 2 and 2' are formed.
. It is formed so as to reach the insulating surface of the resin insulating plate 1 where there is no circuit-like conductor pattern, and further covered with resin layers 5 and 5'.

まず、第1図に示すように、導電性樹脂層は、回路状導
電体パターン2および樹脂誘電層3を露出させないよう
に、必ず樹脂絶縁板1の面にまたがって印刷する樹脂誘
電層3の印刷方法としては。
First, as shown in FIG. 1, the conductive resin layer is printed across the surface of the resin insulating board 1 so as not to expose the circuit conductor pattern 2 and the resin dielectric layer 3. As for the printing method.

スクリーン印刷よりステンシル印刷の方が、気泡を巻き
込まないので有利である。樹脂誘電層3の材質としてエ
ポキシ樹脂を基調とするが、Cg。
Stencil printing is more advantageous than screen printing because it does not introduce air bubbles. The material of the resin dielectric layer 3 is based on epoxy resin, and Cg.

Na等のイオン性不純物は5ppm(121℃抽出水)
以下が望ましい。硬化剤としては、移行抑制、金属微粒
子を含む芳香族アミンアダクト化合物のイオン性不純物
5 ppm以下のものを無溶剤で、5〜90重量%、好
ましくは20〜50重量%を用いる。硬化温度としては
85〜220℃、好ましくは105〜150℃が望まし
い。印刷厚さとしては、1回印刷で15μm程度が標準
であるが、マスクによっては5〜50.4+mに可変可
能であり、また複数回印刷によってJIXさを増すこと
も可能である。実験的な耐電圧としては、40℃90%
RI−Iで240H加湿後85℃または130℃テAc
250−2000V、 DC500−2500Vが得ら
れた。
Ionic impurities such as Na are 5ppm (121℃ extracted water)
The following are desirable. As the curing agent, a solvent-free one which suppresses migration and contains 5 ppm or less of ionic impurities of an aromatic amine adduct compound containing fine metal particles is used in an amount of 5 to 90% by weight, preferably 20 to 50% by weight. The curing temperature is preferably 85 to 220°C, preferably 105 to 150°C. The standard printing thickness is about 15 μm in one printing, but it can be varied from 5 to 50.4+m depending on the mask, and it is also possible to increase the JIX thickness by printing multiple times. The experimental withstand voltage is 40℃90%
85℃ or 130℃ after 240H humidification with RI-I
250-2000V and DC500-2500V were obtained.

以下、製造条件を種々変えた場合に得られた結果につい
て述へる。
Below, the results obtained when various manufacturing conditions were changed will be described.

■第1図に示すように、厚さ1戸の樹脂絶縁板1の両面
に、厚さ35μmの銅箔からなる導電体パターン2,2
′が形成される6樹脂絶縁板1はガラス布基板に芳香族
アミンアダクト硬化型エポキシ樹脂を含浸している。導
電体パターン2,2′の上を全面的に被覆するように樹
脂誘電層3゜3′を2回印刷後、樹脂絶縁板1と一緒に
150℃の大気雰囲気炉に入れて約50分加熱し熱硬化
する。
■As shown in Figure 1, conductive patterns 2, 2 made of copper foil with a thickness of 35 μm are placed on both sides of a resin insulation board 1 with a thickness of 1.
The six-resin insulating plate 1 on which ' is formed is a glass cloth substrate impregnated with an aromatic amine adduct curing type epoxy resin. After printing the resin dielectric layer 3°3' twice so as to completely cover the conductive patterns 2 and 2', it was placed in an atmospheric furnace at 150°C together with the resin insulating plate 1 and heated for about 50 minutes. and heat cure.

熱硬化して樹脂誘電層3,3′の厚さは30μm(厚さ
+sjMとなる予定のものを2回印刷)とする。次に銅
粉と、芳香族アミンアダクト50部とエポキシ樹脂50
部の樹脂とからなる樹脂導電層4,4′で、樹脂誘電層
3,3′を全面的に被覆し、さらに、第1図(a)に示
すように第2の樹脂導電層5,5′で被覆する。別紙第
1表は、本発明により製造したプリント配線板と従来の
プリント配線板とにおけるシールド効果すなわち輻射の
減衰度の比較を表わしたものである。
The thickness of the heat-cured resin dielectric layers 3, 3' is 30 μm (thickness + sjM is printed twice). Next, add copper powder, 50 parts of aromatic amine adduct, and 50 parts of epoxy resin.
The resin dielectric layers 3, 3' are entirely covered with a resin conductive layer 4, 4' consisting of a resin of ’. Table 1 of the appendix shows a comparison of the shielding effect, that is, the degree of attenuation of radiation, between the printed wiring board manufactured according to the present invention and the conventional printed wiring board.

■樹脂絶縁板1がTg115℃の場合には樹脂導電層4
,4′として、■:光硬化(アクリル樹脂に光重合開始
剤としてキノン配分)型を用いた場合。
■If the resin insulating plate 1 has a Tg of 115°C, the resin conductive layer 4
, 4', ■: When a photocuring (quinone distribution as a photopolymerization initiator in acrylic resin) type is used.

[相]、[株]:熱硬化温度135℃、150℃(エポ
キシ樹脂。
[Phase], [Stock]: Thermosetting temperature 135°C, 150°C (epoxy resin.

酸無水物硬化剤)、◎熱硬化温度130℃(芳香族アミ
ン硬化剤)のものを使用する。
Acid anhydride curing agent) and ◎ heat curing temperature of 130°C (aromatic amine curing agent) are used.

■、■、[株]、◎の場合の減衰度の比較を別紙第2表
に示す。
A comparison of the degree of attenuation in the cases of ■, ■, [Stock], and ◎ is shown in Appendix Table 2.

減衰度の差は使用した樹脂導電層の樹脂の差によっても
あられれる。
Differences in the degree of attenuation can also be caused by differences in the resin used for the resin conductive layer.

■樹脂誘電層3の硬化温度を、4!1脂絶縁板1のTg
115℃として、硬化温度を115℃、130℃。
■ Set the curing temperature of the resin dielectric layer 3 to 4!1 Tg of the resin insulating board 1.
The curing temperature was 115°C and 130°C.

145℃と設定した場合、 A:樹脂誘電層をメラミン、フォルマリンまたはうるし
としたときの耐電圧(40’C90%RH,240H後
) B:エポキシ、イミダゾールのときの耐電圧C:エポキ
シ、芳香族アミンダクトのときの耐電圧 としたときのA(従来例)、B(従来例)、C(本発明
)の比較を別紙第3表に示す。
When set at 145℃, A: Withstand voltage when resin dielectric layer is melamine, formalin, or lacquer (40'C 90% RH, after 240H) B: Withstand voltage when epoxy, imidazole is used C: Epoxy, aroma A comparison of A (conventional example), B (conventional example), and C (invention) in terms of withstand voltage for group amine ducts is shown in Appendix Table 3.

■樹脂導電層の硬化温度を130℃として形成した後の
保護コートとして厚さ15Ijmの第2の樹脂絶縁層を
設けるに際し、この硬化温度を次のように設定して、下
部の樹脂導電層の抵抗値をみる。樹脂導電層の硬化温度
をこえて、第2の樹脂絶縁層を加熱硬化すると、下部の
樹脂導電層4に悪影響を及ぼすので、前記硬化温度をこ
えず10℃以上にならぬようにするのがよく、本発明の
場合が最も安定している。その結果を別紙第4表に示す
■When forming a second resin insulating layer with a thickness of 15 Ijm as a protective coat after forming the resin conductive layer at a curing temperature of 130°C, the curing temperature is set as follows to form the lower resin conductive layer. Check the resistance value. If the second resin insulating layer is heated and cured above the curing temperature of the resin conductive layer, it will have an adverse effect on the lower resin conductive layer 4, so it is best not to exceed the curing temperature above 10°C. In general, the case of the present invention is the most stable. The results are shown in Appendix Table 4.

■樹脂導電層4と第2の樹脂導電層5との熱硬化を同時
に樹脂導電層4のT g145℃を超えない温度で行っ
た。本発明の方法により、始めて、樹脂導電層の抵抗値
変化を伴なわずに行うことができた。その結果を別紙第
5表に示す。
(2) The resin conductive layer 4 and the second resin conductive layer 5 were simultaneously thermally cured at a temperature not exceeding T g of the resin conductive layer 4 of 145°C. By the method of the present invention, for the first time, it was possible to carry out the process without changing the resistance value of the resin conductive layer. The results are shown in Appendix Table 5.

■樹脂導電層4を加熱後、半田コートを行い。■After heating the resin conductive layer 4, apply solder coating.

樹脂導電層4の抵抗値の安定化を計る。半田コートは一
種のりフローソルダリングであって、a−釦60/40
の半田デイプとレベリングによって行う。
The resistance value of the resin conductive layer 4 is stabilized. The solder coat is a type of glue flow soldering, and the a-button is 60/40
This is done by solder dipping and leveling.

この際フラックスの使用は必要であるが、使用するフラ
ックスに影響されて、抵抗値の変化が大きくなったり、
導体面の発銹をおこす市販のハロゲン化物を0.1〜0
.3重量%添加したものと、本発明に使用するロジンオ
イル系揮発性フラックスの使用では、大きな差を生じる
。すなわち加湿(40℃90%RH,240H)後の抵
抗値変化をフラックスだけを塗布し、220℃のりフロ
ー温度半田なしで通過させた結果を別紙第6表に示す。
Although it is necessary to use flux at this time, the change in resistance value may increase due to the influence of the flux used.
Commercially available halides that cause rusting on conductor surfaces should be removed from 0.1 to 0.
.. There is a big difference between the rosin oil-based volatile flux used in the present invention and the rosin oil-based volatile flux added in an amount of 3% by weight. That is, Table 6 of the appendix shows the resistance change after humidification (40° C., 90% RH, 240 hours) when only flux was applied and the sample was passed through a flow temperature of 220° C. without soldering.

樹脂導電ペーストに半田コートした場合、フラックスの
内部残溜した場合の吸湿による導体抵抗値変化を比較し
た結果、本発明のようにロジンオイルフラックスを用い
ると導体抵抗値変化と、洗浄除去の必要性のない点で、
実用価値多大である。
As a result of comparing the change in conductor resistance due to moisture absorption when a resin conductive paste is coated with solder and when flux remains inside, it is found that when rosin oil flux is used as in the present invention, there is a change in conductor resistance and the need for cleaning and removal. At the point where there is no
It has great practical value.

■樹脂導電層と第2樹脂絶縁層とを同時に熱硬化するに
際して、熱硬化直前の樹脂導電層中の気化成分を除去し
て、第2樹脂絶縁層の樹脂への影響を減少する。気化成
分中、樹脂よりガスを放出するときに、樹脂のTgある
いは硬化温度をこえて加熱すると、樹脂導電層の導電特
性に影響する。
(2) When thermosetting the resin conductive layer and the second resin insulating layer at the same time, vaporized components in the resin conductive layer immediately before thermosetting are removed to reduce the influence on the resin of the second resin insulating layer. When gas is released from the resin in the vaporized components, heating beyond the Tg or curing temperature of the resin will affect the conductive properties of the resin conductive layer.

樹脂導電層について、硬化温度を130℃、Tgを80
℃と145℃の2種類とし、第2樹脂絶縁層の硬化温度
を120℃とする。このとき同時加熱硬化条件を130
℃とした場合に、予備加熱温度の程度と、その条件とを
検討すると別紙第7表に示すようになる。
For the resin conductive layer, the curing temperature was 130°C and the Tg was 80°C.
C. and 145.degree. C., and the curing temperature of the second resin insulating layer is 120.degree. At this time, the simultaneous heat curing conditions were set to 130
℃, the degree of preheating temperature and its conditions are shown in Table 7 of the appendix.

本発明の処方Cでは導電樹脂層について、樹脂のTgよ
り低く、かつ70℃以上の予備加熱を行っておけば、1
30℃の同時加熱後において、第2樹脂絶縁層のふくれ
はない。
In formulation C of the present invention, if the conductive resin layer is preheated to a temperature lower than the Tg of the resin and at least 70°C,
After simultaneous heating at 30° C., there is no blistering of the second resin insulating layer.

■樹脂導電層4の硬化温度を130℃として形成するの
に空気に触れる部分は、酸化して色調が損なわれる。ば
かりでなく、接触抵抗値、半田付は性が損なわれる。硬
化時間として、たとえば30〜120分が設定される。
(2) When the resin conductive layer 4 is formed at a curing temperature of 130° C., the portions exposed to air will be oxidized and the color tone will be impaired. Not only that, but the contact resistance value and soldering properties are impaired. The curing time is set to, for example, 30 to 120 minutes.

ここで空気中での変色と半田付は性を別紙第8表に示す
The properties of discoloration and soldering in air are shown in Appendix Table 8.

95%以下では、酸洗、溶剤洗で酸化物を除去し、水洗
、乾燥の工程を経なければならない。本発明は、この工
程を不必要とするものである。酸化の度合が大きくなる
と、外観劣化、半田コートの仕上げなどの支障をきたし
、接触抵抗値、さらには導体抵抗値の増加による支障を
生ずるものである。
If it is less than 95%, the oxide must be removed by pickling and solvent washing, followed by water washing and drying. The present invention makes this step unnecessary. When the degree of oxidation increases, it causes problems such as deterioration of appearance and finish of solder coat, and also causes problems due to increase in contact resistance value and furthermore, conductor resistance value.

■樹脂導電層4のうち第2絶縁樹脂層に覆れない部分を
、空気中に放置すると、時間の経過につれて変色、半田
付は性の低下がおこる。そのため、半田付けを妨害しな
いコーティングが望まれる。フラックスとして、市販の
ロジン系を用いた場合には、かえって酸化を促進する。
(2) If the portion of the resin conductive layer 4 that is not covered by the second insulating resin layer is left in the air, discoloration and deterioration of solderability will occur over time. Therefore, a coating that does not interfere with soldering is desired. When a commercially available rosin type flux is used, oxidation is promoted instead.

市販のフラックスには0.1〜0.3重量%のハロゲン
化物を活性剤として含むからである。ハロゲン化物を全
く含まないロジンでは、そのTgが70℃以下であり、
本発明の用途には不適当である。たとえば、85℃85
%RH中で電界をかけると、電食をおこし、変色または
半田付は性の不良を起こす。しかし、樹脂導電層4の保
護のためには、Tgを135℃以上とした合成ロジンで
あって、ハロゲン化物を含まないか、またはo、ooi
重量%(溶剤を揮発させたのち)含むTgを105℃以
上とした合成ロジンまたはロジン油105℃から180
℃で気化(揮発し去るもの)の使用がよい。この状態を
別紙第9表に示す。
This is because commercially available fluxes contain 0.1 to 0.3% by weight of halide as an activator. Rosin that does not contain any halides has a Tg of 70°C or less,
It is unsuitable for use in the present invention. For example, 85℃85
When an electric field is applied in %RH, electrolytic corrosion occurs, and discoloration or soldering causes poor quality. However, in order to protect the resin conductive layer 4, a synthetic rosin with a Tg of 135° C. or higher, containing no halide, or o, ooi
Synthetic rosin or rosin oil with a Tg of 105°C or higher (after volatilizing the solvent) from 105°C to 180% by weight
It is best to use a vaporizer (one that evaporates away) at ℃. This state is shown in Appendix Table 9.

[相]上記■に示した熱硬化を130℃の不活性雰囲気
中で行った樹脂導電層4に対して半田のりフローソルダ
リングを行うと、リフローソルダリング後のフラックス
洗浄を省略しても完備やその他の故障の原因にはならな
い。
[Phase] If solder paste flow soldering is performed on the resin conductive layer 4 which has been thermally cured in an inert atmosphere at 130°C as shown in (1) above, the result will be complete even if flux cleaning after reflow soldering is omitted. or other malfunctions.

■上記■に示した条件で熱硬化した樹脂導電層4を第1
図(b)に示すように樹脂絶縁層6,6′の表面および
孔7の壁面8の面に同時に形成、硬化して孔7における
スルーホールを形成、または、および樹脂絶縁板1の端
面に必要に応じて樹脂誘電層3と同じ材質で、樹脂誘電
層3と分離して同時形成する。
■The resin conductive layer 4 thermoset under the conditions shown in ■ above is applied to the first layer.
As shown in Figure (b), it is simultaneously formed on the surfaces of the resin insulating layers 6, 6' and the wall surface 8 of the hole 7, and is cured to form a through hole in the hole 7, or on the end surface of the resin insulating plate 1. If necessary, it is made of the same material as the resin dielectric layer 3, and is formed separately and simultaneously with the resin dielectric layer 3.

この方法は、板端面、孔壁面への樹脂導電層の印刷を付
加工程なしで達成することができる。
This method allows printing of a resin conductive layer on the end surfaces of the plate and the wall surfaces of the holes without any additional steps.

(発明の効果) 本発明によれば、導体パターン層と樹脂導電層とに挟ま
れる樹脂誘電層が不要輻射の媒体として、波長短縮、再
輻射となるので、その樹脂誘電層を露出させず、樹脂導
電層で覆うものであり、次に、段差のある回路板に対す
る印刷法として、樹脂誘電層の材料を無溶剤化し、また
メツシュスクリーンをステンシルにかえ、気泡の発生を
防止し、さらに印刷する樹脂絶縁層の材質および硬化剤
とその残溜、イオン性不純物量の制限により、電食およ
びマイグレションによる絶縁抵抗の劣化を防止すること
ができ、 その実用上の効果は極めて犬で ある。
(Effects of the Invention) According to the present invention, the resin dielectric layer sandwiched between the conductor pattern layer and the resin conductive layer acts as a medium for unnecessary radiation, shortens the wavelength, and causes re-radiation, so the resin dielectric layer is not exposed. Next, as a printing method for circuit boards with steps, the material for the resin dielectric layer was made solvent-free, and the mesh screen was replaced with a stencil to prevent air bubbles from forming. Deterioration of insulation resistance due to electrolytic corrosion and migration can be prevented by limiting the material of the resin insulation layer, the curing agent, its residual content, and the amount of ionic impurities, and its practical effects are extremely significant.

第1表 第2表 第9表 85℃85%RH100V DC印加テノ腐食発生Table 1 Table 2 Table 9 85℃85%RH100V DC applied teno corrosion occurred

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は(a)、 (b)はそれぞれ本発明の一実施例
におけるプリント配線板の断面図、第2図は従来のプリ
ント配線板の断面図である。 1 ・・・樹脂絶縁板、 2,2″・・・回路状導電体
パターン、 3,3′ ・・・樹脂誘電層、 4,4′
・・・樹脂導電層、 5・・・第2の樹脂導電層、6.
6’ ・・・樹脂絶縁層、 7・・・孔、 8・・・壁
面。 特許出願人 松下電器産業株式会社 第5表 ノ′ −)L7 ( 8グ面
FIGS. 1A and 1B are sectional views of a printed wiring board according to an embodiment of the present invention, and FIG. 2 is a sectional view of a conventional printed wiring board. 1...Resin insulating plate, 2,2''...Circuit-like conductor pattern, 3,3'...Resin dielectric layer, 4,4'
... Resin conductive layer, 5... Second resin conductive layer, 6.
6'... Resin insulating layer, 7... Hole, 8... Wall surface. Patent applicant: Matsushita Electric Industrial Co., Ltd. Table 5 No'-) L7 (Table 8)

Claims (11)

【特許請求の範囲】[Claims] (1)樹脂絶縁板の両面に、回路状導電体パターンをそ
れぞれ熱硬化性材料で形成し、前記導電体パターンの上
表面および側面を全面的に被覆する熱硬化性材料の樹脂
誘電層を形成し、次に前記樹脂誘電層の上表面および側
面を全面的に被覆してその端部が前記樹脂絶縁板の表面
にまで達するように熱硬化性材料で樹脂導電層を形成し
、要すればさらにその上を樹脂層で被覆することを特徴
とするプリント配線板の製造方法。
(1) A circuit-like conductor pattern is formed on both sides of a resin insulating plate using a thermosetting material, and a resin dielectric layer made of a thermosetting material is formed to completely cover the upper surface and side surfaces of the conductor pattern. Next, a resin conductive layer is formed using a thermosetting material so that the upper surface and side surfaces of the resin dielectric layer are completely covered and the ends thereof reach the surface of the resin insulating plate, and if necessary, A method for producing a printed wiring board, which further comprises covering the printed wiring board with a resin layer.
(2)樹脂導電層の硬化を熱硬化でおこない、かつその
硬化温度が樹脂絶縁板のTg(ガラス転移温度)を超え
ずTgより20℃以内低い範囲である請求項(1)記載
のプリント配線板の製造方法。
(2) The printed wiring according to claim (1), wherein the resin conductive layer is cured by thermosetting, and the curing temperature is within a range of not exceeding the Tg (glass transition temperature) of the resin insulating board but less than 20°C lower than the Tg. Method of manufacturing the board.
(3)樹脂誘電層の硬化を熱硬化で樹脂導電層の硬化前
に行い、かつ、その硬化温度が、樹脂絶縁板のTgより
20℃以上低めである請求項(1)記載のプリント配線
板の製造方法。
(3) The printed wiring board according to claim (1), wherein the resin dielectric layer is cured by thermosetting before the resin conductive layer is cured, and the curing temperature is 20° C. or more lower than the Tg of the resin insulating board. manufacturing method.
(4)樹脂導電層の上層に、第2の樹脂絶縁層を設け、
かつその硬化を熱硬化で行い、かつその硬化温度が前記
樹脂導電層の熱硬化温度を超える請求項(1)記載のプ
リント配線板の製造方法。
(4) providing a second resin insulating layer on the resin conductive layer;
The method for manufacturing a printed wiring board according to claim 1, wherein the curing is carried out by thermosetting, and the curing temperature exceeds the thermosetting temperature of the resin conductive layer.
(5)樹脂導電層と第2の樹脂絶縁層との熱硬化を同時
に、前記樹脂導電層のTgを超えない温度で行う請求項
(1)記載のプリント配線板の製造方法。
(5) The method for manufacturing a printed wiring board according to claim 1, wherein the resin conductive layer and the second resin insulating layer are thermally cured simultaneously at a temperature not exceeding Tg of the resin conductive layer.
(6)第2の樹脂絶縁層の印刷を、樹脂導電層またはそ
の半田コートの揮発性でハロゲン非含有のレベリングを
適用した範囲を超えて拡張して、印刷形成する請求項(
5)記載のプリント配線板の製造方法。
(6) A claim in which the printing of the second resin insulating layer is extended beyond the range in which volatile, halogen-free leveling of the resin conductive layer or its solder coating is applied.
5) The method for manufacturing the printed wiring board described above.
(7)同時熱硬化を行うにあたって、樹脂導電層中の溶
剤や未硬化分を完全に除去するために、前記樹脂、導電
層中の樹脂のTg以下で、かつ70℃以上の予備加熱を
前記樹脂導電層に対して行う請求項(5)記載のプリン
ト配線板の製造方法。
(7) When performing simultaneous thermal curing, in order to completely remove the solvent and uncured components in the resin conductive layer, preheating is performed at a temperature below the Tg of the resin and the resin in the conductive layer and above 70°C. The method for manufacturing a printed wiring board according to claim 5, wherein the method is performed on a resin conductive layer.
(8)樹脂導電層の熱硬化を不活性雰囲気中で、好まし
くは窒素分圧60〜90の分圧を持つ準不活性気溜中で
行う請求項(4)記載のプリント配線板の製造方法。
(8) The method for manufacturing a printed wiring board according to claim (4), wherein the thermosetting of the resin conductive layer is carried out in an inert atmosphere, preferably in a semi-inert gas reservoir having a nitrogen partial pressure of 60 to 90. .
(9)導電体パターンを導電性樹脂の加熱によって硬化
形成したのち外気に接する回路状導電体パターンに対す
る油の付着、空気酸化、熱酸化などを防ぐために、半田
付け性のあるロジン、合成ロジン又は0.001重量%
以下にハロゲン化物の含有量を規制したフラックス樹脂
を溶剤によりフラックス樹脂液として、70℃以下の温
度で加熱し固着する請求項(2)記載のプリント配線板
の製造方法。
(9) In order to prevent oil adhesion, air oxidation, thermal oxidation, etc. to the circuit conductor pattern that is exposed to the outside air after the conductive pattern is hardened and formed by heating the conductive resin, solderable rosin, synthetic rosin, or 0.001% by weight
3. The method of manufacturing a printed wiring board according to claim 2, wherein a flux resin having a regulated halide content is prepared as a flux resin liquid using a solvent, and is heated and fixed at a temperature of 70° C. or lower.
(10)熱硬化を行ったのち、前記フラックス樹脂液を
樹脂導電層に設け、半田のリフローコーティングを行う
請求項(9)記載のプリント配線板の製造方法。
(10) The method for manufacturing a printed wiring board according to claim (9), wherein after thermosetting, the flux resin liquid is provided on the resin conductive layer and solder reflow coating is performed.
(11)熱硬化の樹脂導電層を、樹脂絶縁層で選択的ま
たは全面および側面において、外気と接触しないように
印刷し、熱硬化する請求項(1)記載のプリント配線板
の製造方法。
(11) The method for producing a printed wiring board according to claim (1), wherein the thermosetting resin conductive layer is printed selectively or on the entire surface and side surfaces of the thermosetting resin conductive layer so as not to come into contact with the outside air, and then thermosetting.
JP1107458A 1989-04-28 1989-04-28 Manufacturing method of printed wiring board Pending JPH02288295A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1107458A JPH02288295A (en) 1989-04-28 1989-04-28 Manufacturing method of printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1107458A JPH02288295A (en) 1989-04-28 1989-04-28 Manufacturing method of printed wiring board

Publications (1)

Publication Number Publication Date
JPH02288295A true JPH02288295A (en) 1990-11-28

Family

ID=14459685

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1107458A Pending JPH02288295A (en) 1989-04-28 1989-04-28 Manufacturing method of printed wiring board

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Country Link
JP (1) JPH02288295A (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS596861B2 (en) * 1975-05-19 1984-02-15 オオツカセイヤク カブシキガイシヤ Method for producing 5-[(2-halogeno-1-hydroxy)alkyl[carbostyryl derivative]
JPS62219692A (en) * 1986-03-20 1987-09-26 株式会社東芝 Thick film multilayer circuit board
JPS63114191A (en) * 1986-10-31 1988-05-19 株式会社日立製作所 Printed wiring board
JPS6489495A (en) * 1987-09-30 1989-04-03 Noritake Co Ltd Composite multilayer substrate for hybrid ic

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS596861B2 (en) * 1975-05-19 1984-02-15 オオツカセイヤク カブシキガイシヤ Method for producing 5-[(2-halogeno-1-hydroxy)alkyl[carbostyryl derivative]
JPS62219692A (en) * 1986-03-20 1987-09-26 株式会社東芝 Thick film multilayer circuit board
JPS63114191A (en) * 1986-10-31 1988-05-19 株式会社日立製作所 Printed wiring board
JPS6489495A (en) * 1987-09-30 1989-04-03 Noritake Co Ltd Composite multilayer substrate for hybrid ic

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