JPH0228911B2 - KONETSUDENDOSEIDENKIZETSUENKIBAN - Google Patents
KONETSUDENDOSEIDENKIZETSUENKIBANInfo
- Publication number
- JPH0228911B2 JPH0228911B2 JP4045681A JP4045681A JPH0228911B2 JP H0228911 B2 JPH0228911 B2 JP H0228911B2 JP 4045681 A JP4045681 A JP 4045681A JP 4045681 A JP4045681 A JP 4045681A JP H0228911 B2 JPH0228911 B2 JP H0228911B2
- Authority
- JP
- Japan
- Prior art keywords
- glass cloth
- boron nitride
- hexagonal boron
- substrate
- metal plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Insulated Metal Substrates For Printed Circuits (AREA)
Description
【発明の詳細な説明】
本発明は、熱放散性と耐電圧が良好で信頼性が
高い高熱伝導性電気絶縁基板に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a highly reliable electrically insulating substrate with good heat dissipation properties and withstand voltage, and high thermal conductivity.
従来から熱放散性を必要とするパワーICを含
む混成集積回路用基板として、セラミツクやガラ
ス基板が用いられているが、これらの基板は切
断、孔あけ等の後加工が困難であるとともに熱放
散性も不十分であつた。 Ceramic and glass substrates have traditionally been used as substrates for hybrid integrated circuits including power ICs that require heat dissipation, but these substrates are difficult to perform post-processing such as cutting and drilling holes, and they also have poor heat dissipation properties. Sexuality was also insufficient.
又、金属板と熱硬化性樹脂との複合絶縁板やア
ルミニウム板の表面に電気絶縁性のアルマイト皮
膜を形成したものなどが開発されているが、前者
は有機質が絶縁層であるために熱伝導性が悪く、
又後者は基板の温度が上昇した場合にアルマイト
皮膜にひび割れが入り、電気絶縁性が著しく低下
するなどの欠点があつた。 In addition, composite insulating plates made of a metal plate and thermosetting resin, and those with an electrically insulating alumite film formed on the surface of an aluminum plate, etc., have been developed, but the former has an organic insulating layer that makes it difficult to conduct heat. bad sex,
The latter also had the disadvantage that the alumite film cracked when the temperature of the substrate increased, resulting in a significant drop in electrical insulation.
本発明は、これらの欠点を解消し、熱伝導性と
ともに耐電圧が良好であり、且つ電気絶縁層の厚
さが均一な高信頼性のある高熱伝導性電気絶縁基
板を提供するものである。この基板は、各種の集
積回路用基板、その他の印刷配線板、放熱板等に
好適なものである。 The present invention eliminates these drawbacks and provides a highly reliable, highly thermally conductive electrically insulating substrate that has good thermal conductivity and withstand voltage, and has a uniform electrically insulating layer thickness. This substrate is suitable for various integrated circuit boards, other printed wiring boards, heat sinks, and the like.
本発明に関連して、先に形状因子が1.0〜1.4で
平滑な面を有する多面体状の金属酸化物粒子を有
機質高分子中に分散させた混合物からなる皮膜を
金属板上に設けることにより、熱放散性が良好な
高熱伝導性電気絶縁基板が得られることを発見
し、これを提案したが、その後の研究により、こ
の基板をつくる上において、金属板上に上記混合
物を塗布し、乾燥工程を経て、プレスにより加
圧、加熱して硬化1体化する際に、金属板端部か
ら有機質高分子及び金属酸化物粒子が流出し、絶
縁層の厚さが不均一になること、及び絶縁層中に
気泡が残留するため耐電圧性が不均一になる等の
問題があり、これを避けようとすると有機質高分
子等の流出防止手段を別に設けねばならず、生産
性の低下等を来たすことがわかつた。 In connection with the present invention, by first providing on a metal plate a film made of a mixture of polyhedral metal oxide particles having a shape factor of 1.0 to 1.4 and smooth surfaces dispersed in an organic polymer, We discovered that a highly thermally conductive electrically insulating substrate with good heat dissipation properties could be obtained and proposed this, but subsequent research revealed that in order to make this substrate, we applied the above mixture onto a metal plate and required a drying process. When the metal plate is pressurized and heated to harden into a single body, the organic polymer and metal oxide particles flow out from the edge of the metal plate, causing the thickness of the insulating layer to become uneven and the insulation to deteriorate. There are problems such as non-uniform voltage resistance due to air bubbles remaining in the layer, and if this is to be avoided, a separate means to prevent organic polymers from flowing out must be provided, resulting in a decrease in productivity, etc. I found out.
これらの問題点を改善する為に、更に検討を行
なつた結果、ガラスクロス中に前記混合物を介在
させるとともに、そのガラスクロスを金属板上に
固着し、1体化させて基板を構成することによ
り、熱放散性を損うことなく耐電圧が良好で絶縁
層の厚さが均一な高信頼性のある高熱伝導性電気
絶縁基板が得られることを見出し、特許出願し
た。この中には更に熱伝導性を改良する為に前記
した特定形状の金属酸化物粒子に加えて熱伝導性
の良い六方晶BN、BeO等を添加したものも含ま
れている。 In order to improve these problems, as a result of further studies, we found that the above mixture was interposed in the glass cloth, and the glass cloth was fixed on a metal plate to form an integrated substrate. It was discovered that a highly reliable, highly thermally conductive electrical insulating substrate with good withstand voltage and a uniform thickness of the insulating layer can be obtained without impairing heat dissipation properties, and a patent application has been filed. These include those to which hexagonal BN, BeO, etc., which have good thermal conductivity, are added in addition to the above-mentioned metal oxide particles of a specific shape in order to further improve thermal conductivity.
但し、この場合は前記金属酸化物と併用してい
るため、その添加量には限度があつた。 However, in this case, since it was used in combination with the metal oxide, there was a limit to the amount added.
一方、ICの高密度が更に進むにつれ、基板に
対して、更に熱放散性が良いことが要求されるよ
うになつた。このような事情に鑑みて、上記基板
に対して、六方晶BNを多量部数添加、或は、六
方晶BNのみを添加するのを試作評価した結果、
次の如き問題点があることがわかつた。即ち、一
般に市販されているBN微粉は、粒径が小さく、
又、有機高分子に対しての濡れが悪い為に、基板
の耐電圧が低下し、又金属板、ガラスクロスに対
しての密着強度が低下することがわかつた。 On the other hand, as the density of ICs continues to increase, substrates are required to have even better heat dissipation properties. In view of these circumstances, as a result of a prototype evaluation of adding a large amount of hexagonal BN or adding only hexagonal BN to the above substrate,
The following problems were found. In other words, the generally commercially available BN fine powder has a small particle size and
In addition, it was found that due to poor wetting with organic polymers, the withstand voltage of the substrate was lowered, and the adhesion strength to metal plates and glass cloth was lowered.
本発明は、これらの欠点を解消し、熱伝導性、
耐電圧と共に密着強度が良好であり、且つ電気絶
縁層の厚さが均一な高信頼性のある高熱伝導性電
気絶縁基板を得ることを目的に開発したものであ
り、その特徴は上記した基板においてボロンナイ
トライド微粉末を特定の結合剤を用い焼結粒子に
して使用する点にある。 The present invention eliminates these drawbacks and improves thermal conductivity,
It was developed with the aim of obtaining a highly reliable, highly thermally conductive electrically insulating substrate that has good withstand voltage and adhesion strength, and has a uniform electrically insulating layer thickness. The point is that boron nitride fine powder is used in the form of sintered particles using a specific binder.
即ち、本発明の第1は金属板とガラスクロスと
がカルシウム硼酸塩又は硼ケイ酸ガラスを結合剤
とする六方晶ボロンナイトライドの焼結粒子と有
機質高分子との混合物で1体に固着している高熱
伝導性電気絶縁基板であり、第2の発明はこの基
板のガラスクロス上に金属箔が一体に固着してい
る高熱伝導性電気絶縁基板である。これらの場合
においてガラスクロス及び金属箔は金属板の片面
又は両面に固着させることができる。 That is, the first aspect of the present invention is that a metal plate and a glass cloth are fixed together with a mixture of sintered particles of hexagonal boron nitride and an organic polymer using calcium borate or borosilicate glass as a binder. The second invention is a highly thermally conductive electrically insulating substrate in which a metal foil is integrally fixed on the glass cloth of this substrate. In these cases, the glass cloth and metal foil can be fixed to one or both sides of the metal plate.
以下本発明を詳しく説明する。 The present invention will be explained in detail below.
六方晶ボロンナイトライド微粉末の焼結結合剤
としては種々のものが知られているが、焼結粒子
を本発明の基板に使用する場合は結合剤としては
カルシウム硼酸塩又は硼ケイ酸ガラスが好まし
い。 Various types of sintering binders for hexagonal boron nitride fine powder are known, but when sintered particles are used in the substrate of the present invention, calcium borate or borosilicate glass is used as the binder. preferable.
カルシウム硼酸塩は3CaO・B2O3、CaO・
B2O3、CaO・2B2O3等の組成のものであり、勿
論これらは混合したものでもよい。即ち、CaOと
B2O3のモル比で表わせばCaO/B2O3が0.5〜3の
範囲の組成にして使用するのが好ましい。CaO/
B2O3が0.5より小さいと吸湿性を示し、基板の耐
電圧が低下し、又3より大きいと結合剤としての
結合力が弱い。 Calcium borate is 3CaO・B 2 O 3 , CaO・
It has a composition of B 2 O 3 , CaO.2B 2 O 3 , etc., and of course a mixture of these may be used. That is, CaO and
It is preferable to use a composition in which CaO/B 2 O 3 is in the range of 0.5 to 3 in terms of the molar ratio of B 2 O 3 . CaO/
When B 2 O 3 is less than 0.5, it exhibits hygroscopicity and the withstand voltage of the substrate decreases, and when it is more than 3, the bonding force as a binder is weak.
硼けい酸ガラスとしては、硼酸の含有量は、3
〜10重量%が好ましい。硼酸が10重量%を越える
と吸湿性を示し基板の耐電圧が低下し、硼酸が3
重量%未満では結合剤としての結合力が弱い。 As for borosilicate glass, the content of boric acid is 3
~10% by weight is preferred. If boric acid exceeds 10% by weight, it becomes hygroscopic and the withstand voltage of the substrate decreases.
If it is less than % by weight, the binding force as a binder is weak.
これらの結合剤の添加量は、六方晶ボロンナイ
トライドに対して1〜20重量%好ましくは2〜15
重量%である。添加量が1重量%未満では、焼結
した六方晶ボロンナイトライド粉末の粒子の強度
が弱く、有機高分子物質への混合に際して粒子の
崩壊が生じ、基板の耐電圧が低下し、20重量%を
越えると基板の熱伝導率が低下する。 The amount of these binders added is preferably 1 to 20% by weight based on hexagonal boron nitride, preferably 2 to 15% by weight.
Weight%. If the amount added is less than 1% by weight, the strength of the sintered hexagonal boron nitride powder particles will be weak, and the particles will collapse when mixed with the organic polymer material, reducing the withstand voltage of the substrate. If the value exceeds 100%, the thermal conductivity of the substrate will decrease.
六方晶ボロンナイトライドの焼結粒子を得るに
は先ず六方晶ボロンナイトライドと上記の結合剤
とをボールミル等で混合した後、混合粉末を常温
加圧下で成型し、非酸化性雰囲気下、温度1000〜
2000℃で焼結するか、上記条件下で圧力50〜450
Kg/cm2で熱圧成型して六方晶ボロンナイトライド
の焼結体とする。次いでこの六方晶ボロンナイト
ライドの焼結体を粉砕機で粉砕するか、又は、切
削機等により切削した後、これを粉砕し更に所望
の粒径以下の粒子に篩分し、六方晶ボロンナイト
ライドの焼結粒子とする。粒子の大きさは、最大
粒径がガラスクロスの厚さと同程度が好ましく、
又ガラスクロスの中に入ることができるようにす
る必要があるが通常は最大50μ程度が適当であ
り、下限はあまり小さいと前記したような問題が
生ずるので2μ程度が好ましい。 To obtain sintered particles of hexagonal boron nitride, first, hexagonal boron nitride and the above-mentioned binder are mixed in a ball mill, etc., then the mixed powder is molded under pressure at room temperature, and then heated under non-oxidizing atmosphere at temperature. 1000~
Sinter at 2000℃ or pressure 50-450 under the above conditions
A sintered body of hexagonal boron nitride is formed by hot pressure molding at Kg/cm 2 . Next, this sintered body of hexagonal boron nitride is crushed with a crusher or cut with a cutting machine, etc., and then crushed and further sieved to particles with a desired particle size or less to obtain hexagonal boron nitride. Let it be sintered particles of Ride. As for the size of the particles, it is preferable that the maximum particle size is about the same as the thickness of the glass cloth.
Also, it is necessary to be able to enter the glass cloth, but normally a maximum of about 50μ is appropriate, and the lower limit is preferably about 2μ, since if it is too small, the above-mentioned problem will occur.
これらの粒子粉末と有機質高分子との混合物を
用いてガラスクロスと金属板とを1体化させるに
は、例えば、ガラスクロスに混合物を塗布し、こ
れを金属板に重ね合せ、乾燥し、次いで加圧下で
加熱硬化する。更に金属箔を1体化させるにはガ
ラスクロス上に金属箔を載せ、上記同様処理すれ
ばよい。金属箔は銅、アルミニウム、ニツケル等
が用いられる。 In order to integrate a glass cloth and a metal plate using a mixture of these particle powders and an organic polymer, for example, the mixture is applied to a glass cloth, the mixture is placed on a metal plate, dried, and then Heat cured under pressure. Furthermore, in order to integrate the metal foil, the metal foil may be placed on a glass cloth and treated in the same manner as described above. The metal foil used is copper, aluminum, nickel, or the like.
焼結六方晶ボロンナイトライド粒子はガラスク
ロスの網目の中に均一に分散し、プレス時に均一
な絶縁層が形成され気泡の残留がない高信頼性を
持つ高熱伝導性電気絶縁基板が得られる。 The sintered hexagonal boron nitride particles are uniformly dispersed within the mesh of the glass cloth, forming a uniform insulating layer during pressing, resulting in a highly reliable, highly thermally conductive electrically insulating substrate with no residual bubbles.
六方晶ボロンナイトライド粉末の有機質高分子
への添加量は、重量で10〜150%が適当である。 The appropriate amount of hexagonal boron nitride powder added to the organic polymer is 10 to 150% by weight.
本発明に用いられる有機質高分子としては、エ
ポキシ樹脂、フエノール樹脂、ポリイミド樹脂等
であり、又ガラスクロスは平織り或は、朱子織り
のいずれでもよく、ガラスクロスの表面処理の有
無及び種類は特に限定されないが、使用される有
機質高分子に適合したカツプリング剤等によつて
処理されたものが好ましい。 The organic polymers used in the present invention include epoxy resins, phenolic resins, polyimide resins, etc. The glass cloth may be either plain weave or satin weave, and the presence or absence of surface treatment and type of glass cloth are particularly limited. However, it is preferable to use a coupling agent or the like that is compatible with the organic polymer used.
ガラスクロスの厚さは30〜110μmの範囲の中
から必要な絶縁層の厚さに応じて選択され、そし
て六方晶ボロンナイトライドと有機質高分子との
混合物がガラスクロスの網目内を充填するように
構成される。 The thickness of the glass cloth is selected from a range of 30 to 110 μm depending on the thickness of the required insulating layer, and the mixture of hexagonal boron nitride and organic polymer is selected so that the inside of the mesh of the glass cloth is filled. It is composed of
本発明に用いられる金属板は、アルミニウム、
鉄、銅等が適用され、その表面処理の有無は限定
されない。これらの金属板の厚さはIC基板等で
は一般に0.5〜3mmの範囲のものが用いられる。 The metal plate used in the present invention is aluminum,
Iron, copper, etc. are used, and the presence or absence of surface treatment is not limited. The thickness of these metal plates is generally in the range of 0.5 to 3 mm for IC boards and the like.
次に金属板にガラスクロスを前記混合物で1体
化させる方法の1例について説明する。 Next, an example of a method for integrating glass cloth with the mixture onto a metal plate will be described.
先ずガラスクロスを金属板上に重ね合せ、ガラ
スクロス上に混合物をスプレーガン、フローコー
ター、糊付機等により塗布する。塗布量はガラス
クロスがかくれる程度が適当である。塗布後は
120〜150℃で数十分乾燥する。次いで圧力70〜
120Kg/cm2、温度150〜200℃の条件で約40〜70分
間、加圧、加熱して金属板とガラスクロスを圧着
する。この際ガラスクロス上に金属箔を置いて圧
着すれば金属箔張り高熱伝導性絶縁基板が得られ
る。 First, a glass cloth is placed on a metal plate, and a mixture is applied onto the glass cloth using a spray gun, a flow coater, a gluing machine, or the like. The appropriate amount of application is enough to cover the glass cloth. After application
Dry at 120-150℃ for several minutes. Then the pressure is 70~
Pressure and heat are applied to bond the metal plate and the glass cloth at a pressure of 120 kg/cm 2 and a temperature of 150 to 200° C. for about 40 to 70 minutes. At this time, by placing a metal foil on the glass cloth and press-bonding it, a metal foil-covered insulating substrate with high thermal conductivity can be obtained.
以下実施例により本発明を具体的に説明する。 The present invention will be specifically explained below using Examples.
実施例 1
CaO・B2O3の結合剤を5重量%添加した六方
晶ボロンナイトライド粉末をアルミナ製ボールミ
ルで混合した後、温度1800℃、圧力120Kg/cm2で
熱圧成型して焼結体を得、次いでこれを粉砕し、
粒度44μ以下に篩分けして六方晶ボロンナイトラ
イドの焼結粒子を得た。Example 1 Hexagonal boron nitride powder to which 5% by weight of CaO・B 2 O 3 binder was added was mixed in an alumina ball mill, then hot-press molded at a temperature of 1800°C and a pressure of 120 kg/cm 2 and sintered. obtain the body, then crush it,
Sintered particles of hexagonal boron nitride were obtained by sieving to a particle size of 44μ or less.
2m/m厚のアルミニウム板(縦20cm、横20
cm)に50μm厚のガラスクロス(日東紡製WE−
05)を載せ、このガラスクロス上に、上記の粒子
粉末30重量部とエポキシ樹脂75重量部及びアミン
系硬化液から成るメチル・エチルケトン35重量部
との混合溶液を糊付機を用いて塗布し、120℃で
10分間乾燥後、圧力100Kg/cm2温度150℃の加圧、
加熱下で60分間キユアーして高熱伝導性電気絶縁
基板を得た。この基板の貫層破壊電圧は45〜55
(KV/mm)で、引きはがし強さは、1.5Kg/cmで
あつた。 2m/m thick aluminum plate (height 20cm, width 20cm
cm) with 50 μm thick glass cloth (Nittobo WE-
05), and on this glass cloth, a mixed solution of 30 parts by weight of the above particle powder, 75 parts by weight of epoxy resin, and 35 parts by weight of methyl ethyl ketone consisting of an amine hardening liquid was applied using a gluing machine. , at 120℃
After drying for 10 minutes, pressurize at a pressure of 100Kg/ cm2 and a temperature of 150℃.
A highly thermally conductive electrically insulating substrate was obtained by curing for 60 minutes under heating. The translayer breakdown voltage of this board is 45-55
(KV/mm), and the peel strength was 1.5 Kg/cm.
又熱伝導度を測定するため前記したガラスクロ
ス、六方晶ボロンナイトライド及びエポキシ樹脂
の同一組成のもので、厚み0.5mmのシートを作成
した。上記と同様にしてキユアーした後、熱伝導
度を測定したところ、0.6Kcal/m・hr・℃であ
つた。比較のため、六方晶ボロンナイトライドの
代りに形状因子(長径/短形)1.0〜1.4で同粒度
のコランダム粒子を用いた以外は前記同様にして
シートをつくり、熱伝導度を測定した。結果は
0.42Kcal/m・hr・℃で本発明のものより小さか
つた。 In order to measure thermal conductivity, sheets with a thickness of 0.5 mm were prepared from glass cloth, hexagonal boron nitride, and epoxy resin having the same composition as described above. After curing in the same manner as above, the thermal conductivity was measured and found to be 0.6 Kcal/m·hr·°C. For comparison, a sheet was made in the same manner as described above, except that corundum particles with a shape factor (major axis/rectangular shape) of 1.0 to 1.4 and the same particle size were used instead of hexagonal boron nitride, and the thermal conductivity was measured. Result is
It was 0.42 Kcal/m·hr·°C, which was smaller than that of the present invention.
実施例 2
六方晶ボロンナイトライド焼結粒子として、
SiO2/B2O3=9/1(重量比)の結合剤を8重量
%添加し実施例1と同様にして得たものを用い
た。又基板の製作も実施例1の如く行なつた。こ
のものの貫層破壊電圧は40〜50(KV/mm)で、
引きはがし強さは、1.4Kg/cmであつた。Example 2 As hexagonal boron nitride sintered particles,
A material obtained in the same manner as in Example 1 with the addition of 8% by weight of a binder with SiO 2 /B 2 O 3 =9/1 (weight ratio) was used. The substrate was also manufactured in the same manner as in Example 1. The through-layer breakdown voltage of this product is 40 to 50 (KV/mm),
The peel strength was 1.4 kg/cm.
比較例 1
六方晶ボロンナイトライド粉末として、市販の
もの(粒径2μ以下)をそのまま使用した。この
ものを用いた基板の貫層破壊電圧は0〜30
(KV/mm)で、引きはがし強さは0.5Kg/cmであ
つた。Comparative Example 1 A commercially available hexagonal boron nitride powder (particle size of 2 μm or less) was used as it was. The translayer breakdown voltage of the substrate using this material is 0 to 30
(KV/mm), and the peel strength was 0.5 Kg/cm.
Claims (1)
又は硼ケイ酸ガラスを結合剤とする六方晶ボロン
ナイトライドの焼結粒子と有機質高分子との混合
物で1体に固着されてなる高熱伝導性電気絶縁基
板。 2 金属板とガラスクロス及びその上の金属箔と
がカルシウム硼酸塩又は硼ケイ酸ガラスを結合剤
とする六方晶ボロンナイトライドの焼結粒子と有
機高分子との混合物で1体に固着されてなる高熱
伝導性電気絶縁基板。[Claims] 1. A metal plate and a glass cloth are fixed together with a mixture of sintered particles of hexagonal boron nitride and an organic polymer using calcium borate or borosilicate glass as a binder. A highly thermally conductive electrically insulating substrate. 2. The metal plate, the glass cloth, and the metal foil on it are fixed together with a mixture of sintered particles of hexagonal boron nitride and organic polymer using calcium borate or borosilicate glass as a binder. A highly thermally conductive electrically insulating substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4045681A JPH0228911B2 (en) | 1981-03-23 | 1981-03-23 | KONETSUDENDOSEIDENKIZETSUENKIBAN |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4045681A JPH0228911B2 (en) | 1981-03-23 | 1981-03-23 | KONETSUDENDOSEIDENKIZETSUENKIBAN |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57155794A JPS57155794A (en) | 1982-09-25 |
| JPH0228911B2 true JPH0228911B2 (en) | 1990-06-27 |
Family
ID=12581137
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4045681A Expired - Lifetime JPH0228911B2 (en) | 1981-03-23 | 1981-03-23 | KONETSUDENDOSEIDENKIZETSUENKIBAN |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0228911B2 (en) |
-
1981
- 1981-03-23 JP JP4045681A patent/JPH0228911B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57155794A (en) | 1982-09-25 |
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