JPH02289433A - Optical device forming mold - Google Patents
Optical device forming moldInfo
- Publication number
- JPH02289433A JPH02289433A JP10846589A JP10846589A JPH02289433A JP H02289433 A JPH02289433 A JP H02289433A JP 10846589 A JP10846589 A JP 10846589A JP 10846589 A JP10846589 A JP 10846589A JP H02289433 A JPH02289433 A JP H02289433A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mold
- layer
- base material
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 14
- 239000010408 film Substances 0.000 claims abstract description 70
- 239000000463 material Substances 0.000 claims abstract description 27
- 239000010409 thin film Substances 0.000 claims abstract description 20
- 229910019590 Cr-N Inorganic materials 0.000 claims abstract description 11
- 229910019588 Cr—N Inorganic materials 0.000 claims abstract description 11
- 239000000919 ceramic Substances 0.000 claims abstract description 10
- 229910018509 Al—N Inorganic materials 0.000 claims abstract description 3
- 238000000465 moulding Methods 0.000 claims description 24
- 150000001875 compounds Chemical class 0.000 claims description 3
- 230000003746 surface roughness Effects 0.000 abstract description 5
- 239000005304 optical glass Substances 0.000 abstract description 4
- 238000001659 ion-beam spectroscopy Methods 0.000 abstract description 2
- 238000009751 slip forming Methods 0.000 abstract 1
- 239000011521 glass Substances 0.000 description 6
- 230000035882 stress Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 238000005336 cracking Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/10—Die base materials
- C03B2215/12—Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
- C03B2215/22—Non-oxide ceramics
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/31—Two or more distinct intermediate layers or zones
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
- C03B2215/34—Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】 ［産業上の利用分野］ 本発明は、光学素子成形用型に関する。[Detailed description of the invention] [Industrial application field] The present invention relates to a mold for molding an optical element.
−ａに、光学ガラスを加熱プレスにより所望形状に成形
して光学素子を得ることが広く行われている。この加熱
プレス手段による場合、成形用型の離型性の良いことは
勿論、特に型基材と膜との密着性の高いことが非常に重
要である。膜剥離が生じると、膜剥離面にガラスが融着
し、型として長寿命の使用が不可能になってしまうから
である。-a, it is widely practiced to obtain an optical element by molding optical glass into a desired shape by hot pressing. When using this hot press method, it is of course very important that the mold has good releasability, and particularly that the adhesiveness between the mold base material and the film is high. This is because if the film peels off, the glass will be fused to the film peeled surface, making it impossible to use the mold for a long life.
密着性は、成形用型の成形面に形成する薄膜層の応力等
に大きく依存している。Adhesion largely depends on the stress of the thin film layer formed on the molding surface of the mold.
従来、光学素子成形用型としては、ＳｉＣ等のセラミッ
クスからなる型基材の表面に真空蒸着によりＣｒ単体膜
を施し、そのＣｒ単体膜上にＣｒ−Ｎ系膜を施し、更に
そのＣｒ−Ｎ系膜上にＣｒ−Ｃ系膜を施して三層構造の
被膜を形成したものがある。Conventionally, as a mold for molding an optical element, a single Cr film is applied by vacuum evaporation on the surface of a mold base material made of ceramic such as SiC, a Cr-N film is applied on the single Cr film, and then a Cr-N film is applied on the surface of the mold base material made of ceramic such as SiC. There is one in which a Cr--C based film is applied on a Cr--based film to form a three-layered coating.
しかし、上記従来の成形用型を用いて５５０″Ｃ以上の
型温度で連続成形を行うと、中間層のＣｒ単体膜は酸化
によってＣｒ酸化膜となってしまった。However, when continuous molding was performed using the conventional molding mold at a mold temperature of 550''C or higher, the Cr single film in the intermediate layer became a Cr oxide film due to oxidation.
Ｃｒ酸化物になると、結晶粒が拡大して多孔質な膜とな
り、特に型基材との界面ではそれが顕著であった。また
、Ｃｒ酸化物は、ＳｉＣ等のセラミックスに比して線膨
張率が大きく、成形離型時のヒートシー！７りと引張力
が加わって、膜を引き剥す力がかかるために、膜として
の結合が破壊され、微小剥離が発生した。In the case of Cr oxide, the crystal grains expanded to form a porous film, which was particularly noticeable at the interface with the mold base material. In addition, Cr oxide has a higher linear expansion coefficient than ceramics such as SiC, and has a higher coefficient of linear expansion than ceramics such as SiC. A tensile force was applied to the film, causing a force to peel off the film, which broke the bond as a film and caused micro-peeling.
この結果、大きな膜剥離を生じると、型成形面に膜段差
を生じ、ガラス成形品の転写面に剥＃側の跡が残ってし
まった。また、成形用型の膜剥離面にガラスが接触して
微小焼付きが生じることにより、ガラス成形品にクレー
タ状の欠陥を発生させてしまった。このように、成形品
の外観不良が多発することにより、外観歩留りが低下す
るという問題があった。As a result, when a large amount of film peeling occurred, a film step was created on the molding surface, and marks on the peeled side remained on the transfer surface of the glass molded product. Further, the glass came into contact with the film peeling surface of the mold, causing micro-seizure, resulting in crater-like defects in the glass molded product. As described above, there is a problem in that the appearance yield is reduced due to frequent appearance defects of molded products.
本発明は、かかる従来の問題点に鑑みてなされたもので
、型基材に対する被膜の密着性が高く、ガラスの焼付き
を生じることのない長寿命の光学素子成形用型を提供す
ることを目的とする。The present invention was made in view of such conventional problems, and it is an object of the present invention to provide a mold for molding an optical element that has a high adhesiveness of the coating to the mold base material and has a long life without causing glass seizure. purpose.
上記目的を達成するために、本発明は、セラミックスか
らなる型基材とＣｒ−Ｎ系膜またはＣｒ−Ｃ系膜との間
にＣｒ−＾ＩＮ化合物からなる薄膜を中間層として形成
し、光学素子成形用型を構成した。In order to achieve the above object, the present invention forms a thin film made of a Cr-^IN compound as an intermediate layer between a mold base material made of ceramics and a Cr-N film or a Cr-C film. A mold for element molding was constructed.
本発明において、Ｃｒ−Ａ ｊ！−Ｎｉｌ膜は、金属間
化合物Ｃｒ−Ａｊ！を被覆材料とし、ＰＶＤ成膜法によ
り形成する。In the present invention, Cr-A j! -Nil film is an intermetallic compound Cr-Aj! is used as a coating material, and is formed by a PVD film forming method.
上記構成の光学素子成形用型におけるＣｒ−Ａ ｌ −
Ｎ薄膜は、Ｃｒ窒化物、 ＡＩ！窒化物＋ Ｃｒ酸化
物およびＡｌ酸化物の混合体薄膜であるために、熱間に
おいて酸化が進行しないので、すなわち不活性であるの
で、膜として劣化しない、また、熱間（５５０℃以上）
で熱応力変化すると、膜内部応力は、はとんど「ゼロ」
に近イ以した圧縮応力になる。さらに、ビッカース硬廣
計（２５〜２００ｇ、１０秒）で圧痕形態を見ても、い
ずれもシャープな形態を保っており、膜割れによる剥離
がない。Cr-A l − in the mold for molding an optical element having the above configuration
N thin film is Cr nitride, AI! Since it is a mixture thin film of nitride + Cr oxide and Al oxide, oxidation does not proceed in hot conditions, that is, it is inactive, so it does not deteriorate as a film, and it can be used in hot conditions (550°C or higher).
When the thermal stress changes at
The compressive stress will be close to A. Furthermore, when looking at the indentation form using a Vickers hardness tester (25 to 200 g, 10 seconds), all of the indentations maintained sharp forms, and there was no peeling due to film cracking.
したがって、熱間における経時変化がないので、型基材
に対するＣ「−Ａｌ−Ｎｌ膜の密着性が非常に高い。Therefore, since there is no change over time in hot conditions, the adhesion of the C'-Al-Nl film to the mold base material is very high.
さらに、Ｃｒ−＾１−Ｎｌ膜は、Ｃｒ系の材料からなる
膜であるので、この薄膜上に成膜するＣｒ−Ｎ系膜やＣ
ｒ−Ｃ系膜との密着性も高い。Furthermore, since the Cr-^1-Nl film is a film made of a Cr-based material, the Cr-N-based film and the Cr-based film formed on this thin film are
It also has high adhesion to r-C-based films.
（第１実施例）
本実施例の光学素子成形用型は、第１図に示すように、
ＳｉＣからなる型基材１と、型基材ｌの成形基礎面１ａ
に被着された三層構造の薄膜層２とから構成されている
。型基材１の成形基礎面１ａは、表面粗度Ｒｏａｍ−０
，０８ａｍ以下に研磨仕上げされている。また、薄膜層
２は、型基材１側から順に第１Ｎ目がＣ「−＾１Ｎ膜３
、第２層目がＣｒ−Ｎ膜４、第３Ｎ目がＣｒ−Ｃ膜５か
らなっている。薄膜Ｎ２の各膜は、それぞれイオンビー
ムスパッタリング法により形成した。 Ｃｒ−Ａ １−
Ｎ１１３の膜厚はｄ−０，３ｐｍ 、０ｒ−Ｎ膜４の膜
厚はｄ−０，３μｓ＋、ＣｒＣ膜５の膜厚はｄ −０，
４μ樽とした。(First Example) As shown in FIG. 1, the mold for molding an optical element of this example was
A mold base material 1 made of SiC and a molding base surface 1a of the mold base material l
It consists of a three-layer structure thin film layer 2 deposited on the substrate. The molding base surface 1a of the mold base material 1 has a surface roughness of Roam-0.
,08am or less. Further, in the thin film layer 2, the first N is C'-^1N film 3 in order from the mold base material 1 side.
, the second layer is a Cr--N film 4, and the third layer is a Cr--C film 5. Each film of the thin film N2 was formed by an ion beam sputtering method. Cr-A 1-
The thickness of N113 is d-0.3pm, the thickness of 0r-N film 4 is d-0.3μs+, and the thickness of CrC film 5 is d-0.
It was made into a 4μ barrel.
このような構成の光学素子成形用型の薄膜Ｎ２の表面硬
度（ビッカース硬度）は、Ｈシー１３８゜ｋｇｆ／閣”
（２５ｇＦ荷重）であり、十分な硬度を有していた。The surface hardness (Vickers hardness) of the thin film N2 of the mold for molding optical elements having such a configuration is 138゜kgf/kaku.
(25 gF load), and had sufficient hardness.
また、本実施例の成形用型を用いて、フリント系光学ガ
ラスを型温度５５０℃以上で連続成形したところ、膜剥
離がなく、微小剥離から生じる微小焼付きも発生しなか
った。そして、表面粗度および硬度もほとんど変化が認
められなかった。これらの結果を次長に示した。Furthermore, when flint-based optical glass was continuously molded using the mold of this example at a mold temperature of 550° C. or higher, there was no film peeling, and no micro-seizing caused by micro-separation occurred. Also, almost no change was observed in surface roughness and hardness. These results were shown to the deputy director.
（第２実施例）
本実施例の光学素子成形用型は、第２図に示すように、
ＳｉＣからなる型基材１と、型基材ｌの成形基礎面１ａ
に被着された二層構造の薄膜層６とから構成されている
。型基材１の成形基礎面１ａは、第１実施例と同様にし
て、表面粗度Ｒａｍ。−〇、０８μｍ以下に研磨仕上げ
されている。また、薄膜層６は、型基材１側から順に第
１層目がＣｒ−ＡＩＮ膜３、第２層目がＣｒ−Ｃ膜５か
らなっている。(Second Example) As shown in FIG. 2, the mold for molding an optical element of this example is
A mold base material 1 made of SiC and a molding base surface 1a of the mold base material l
It consists of a two-layer structure thin film layer 6 deposited on the. The molding base surface 1a of the mold base material 1 has a surface roughness of Ram in the same manner as in the first embodiment. -〇, Polished to 08 μm or less. Further, the thin film layer 6 is composed of a Cr-AIN film 3 as a first layer and a Cr-C film 5 as a second layer in order from the mold base material 1 side.
薄膜Ｎ６の各膜は、それぞれＨＶＤ法により形成した。Each film of thin film N6 was formed by the HVD method.
Ｃｒ−＾ｌ−Ｎ膜３の膜厚はｄ −０，２ｐｍ 、Ｃ
ｒ−Ｃ膜５の膜厚ばｄ ＝ ０．３μ論とした。The film thickness of the Cr-^l-N film 3 is d −0,2 pm, C
The film thickness of the r-C film 5 was assumed to be d = 0.3μ.
このような構成の光学素子成形用型の薄膜Ｎ６の表面硬
度は、Ｈν＝ １３１０ｋｇｆ／■”（２５ｇｆ荷重）
であり、十分な硬度を有していた。The surface hardness of the thin film N6 of the mold for molding optical elements having such a configuration is Hν = 1310 kgf/■” (25 gf load)
and had sufficient hardness.
また、本実施例の成形用型を用いて、フリント系光学ガ
ラスを型温度５５０°Ｃ以上で連続成形したところ、膜
剥離がなく、微小剥離から生じる微小焼付きも発生しな
かった。そして、表面粗度および硬度もほとんど変化が
認められなかった。これらの結果を前記表に示した。Further, when a flint-based optical glass was continuously molded using the molding mold of this example at a mold temperature of 550° C. or higher, there was no film peeling, and no micro-seizing caused by micro-separation occurred. Also, almost no change was observed in surface roughness and hardness. These results are shown in the table above.
なお、比較のため、ＳｉＣからなる型基材に中間層とし
てＣｒ単体膜を第１ＦＪ目に施し、Ｃｒ単体膜上にＣｒ
−Ｎ膜を施し、さらにＣｒ−Ｎ膜上にＣｒ−Ｃ膜を施し
た従来例の成形用型についても、上記実施例と同様の条
件で成形を行い、その結果を前記表に併記した。For comparison, a single Cr film was applied as an intermediate layer to a mold base material made of SiC at the first FJ, and a single Cr film was applied on the single Cr film.
Molding was performed using the conventional molding mold in which a -N film was applied and a Cr-C film was further applied on the Cr-N film under the same conditions as in the above example, and the results are also shown in the table above.
前記各実施例において、Ｃｒ−Ａ １−Ｎ膜３は、型基
材１との密着性が高く、またＣｒ−Ｎ膜４やＣｒ−Ｃ膜
５との密着性も高かった。すなわち、Ｃｒ−Ａ Ｉ！−
Ｎ膜３は、熱間（５５（Ｌ’Ｃ以上）状態で膜の内部応
力が「ゼロ」に近位した圧縮応力のままでほとんど変化
なく、応力剥離発生が極めて少ない膜であった。In each of the examples described above, the Cr-A 1-N film 3 had high adhesion to the mold base material 1, and also had high adhesion to the Cr-N film 4 and the Cr-C film 5. That is, Cr-A I! −
In the N film 3, the internal stress of the film in the hot state (55 (L'C or more)) remained at the compressive stress close to "zero" with almost no change, and the stress peeling was extremely rare.
なお、各実施例において、型基材１はＳｉＣから形成し
たが、本発明はかかる実施例に限定されるものではなく
、ＷＣ＋ ５ｌｓＮ４． Ｂ４ＣＩ （：ｒ３Ｃ１等
のセラミックスを用いてもよい。In each example, the mold base material 1 was formed from SiC, but the present invention is not limited to such examples, and the mold base material 1 was formed from SiC. Ceramics such as B4CI (:r3C1) may also be used.
以上のように、本発明の光学素子成形用型によれば、セ
ラミックスからなる型基材とＣｒ−Ｎ系膜またはＣｒ−
Ｃ系膜との間にＣｒ−Ａ ｌ−Ｎ化合物からなる薄膜を
中間層として形成しているので、型基材に対する薄膜の
密着性が非常に高く、膜剥離面に発生するガラスの焼付
きがなくなり、型寿命が著しく長くなる。As described above, according to the mold for molding an optical element of the present invention, the mold base material made of ceramics and the Cr-N film or Cr-
Since a thin film made of a Cr-Al-N compound is formed as an intermediate layer between the C-based film and the film, the adhesion of the thin film to the mold base material is extremely high, and the glass burn-in that occurs on the film peeling surface is prevented. , and the mold life is significantly extended.
第１図および第２図はそれぞれ本発明に係る光学素子成
形用型の第１実施例および第２実施例を示す縦断面図で
ある。
ｌ・・・型基材
２．６・・・薄膜層
３−Ｃｒ−＾ｊ！ −ＮＩＩＱ
４・・・Ｃｒ−Ｎ
３・・・Ｃｒ−ＣFIG. 1 and FIG. 2 are longitudinal cross-sectional views showing a first embodiment and a second embodiment of an optical element molding mold according to the present invention, respectively. l... Type base material 2.6... Thin film layer 3-Cr-^j! -NIIQ 4...Cr-N 3...Cr-C
Claims (1)
はＣｒ−Ｃ系膜との間にＣｒ−Ａｌ−Ｎ化合物からなる
薄膜を中間層として形成したことを特徴とする光学素子
成形用型。(1) A mold for molding an optical element, characterized in that a thin film made of a Cr-Al-N compound is formed as an intermediate layer between a mold base material made of ceramics and a Cr-N film or a Cr-C film. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10846589A JPH02289433A (en) | 1989-04-27 | 1989-04-27 | Optical device forming mold |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10846589A JPH02289433A (en) | 1989-04-27 | 1989-04-27 | Optical device forming mold |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02289433A true JPH02289433A (en) | 1990-11-29 |
Family
ID=14485452
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10846589A Pending JPH02289433A (en) | 1989-04-27 | 1989-04-27 | Optical device forming mold |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02289433A (en) |
-
1989
- 1989-04-27 JP JP10846589A patent/JPH02289433A/en active Pending
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