JPH0229475A - Production of antimony resinate - Google Patents
Production of antimony resinateInfo
- Publication number
- JPH0229475A JPH0229475A JP63179668A JP17966888A JPH0229475A JP H0229475 A JPH0229475 A JP H0229475A JP 63179668 A JP63179668 A JP 63179668A JP 17966888 A JP17966888 A JP 17966888A JP H0229475 A JPH0229475 A JP H0229475A
- Authority
- JP
- Japan
- Prior art keywords
- antimony
- resinate
- acid
- ink
- carboxylic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Inks, Pencil-Leads, Or Crayons (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、電子工業用材料として使用される余液や白金
液等のインク成分等として特に有用なアンチモンレジネ
ートの製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a method for producing antimony resinate, which is particularly useful as an ink component such as leftover liquid or platinum liquid used as a material for the electronic industry.
（従来技術とその問題点）
従来の電子工業用インク等においては、例えば該インク
を基板上に塗布され乾燥工程を経た後、加熱焼付けされ
るが、密着強度が弱いため基板から金や白金等の薄膜が
はげてしまうという欠点があった。(Prior art and its problems) In conventional ink for the electronic industry, for example, the ink is applied onto a substrate, undergoes a drying process, and is then heated and baked. However, due to the weak adhesion strength, gold, platinum, etc. are removed from the substrate. The drawback was that the thin film of the film peeled off.
（発明の目的）
本発明者は前記密着力の弱さを解消するために余液や白
金液等のインクにアンチモン化合物を添加することによ
り、金や白金等と前記基板との密着性を良好にすること
ができるとの観点から種々のアンチモン化合物を検討し
て本発明に到達したものである。(Objective of the Invention) In order to solve the above-mentioned weak adhesion, the present inventor has improved the adhesion between gold, platinum, etc. and the above-mentioned substrate by adding an antimony compound to ink such as leftover liquid or platinum liquid. The present invention was arrived at by studying various antimony compounds from the viewpoint of the ability to
（問題点を解決するための手段）
本発明は、アンチモン化合物を有機カルボン酸と反応さ
せることによりアンチモンレジネートを製造することを
特徴とする方法である。(Means for Solving the Problems) The present invention is a method characterized in that antimony resinate is produced by reacting an antimony compound with an organic carboxylic acid.
以下本発明をより詳細に説明する。The present invention will be explained in more detail below.
本発明で製造されるアンチモンレジネートは主として電
子工業用インクの添加物として使用することができる。The antimony resinate produced according to the present invention can be used primarily as an additive in inks for the electronic industry.
該アンチモンレジネートのアンチモン源はアンチモン化
合物とし、レジネート源は有機カルボン酸とする。使用
できる有機カルボン酸は前記アンチモン化合物と反応し
てアンチモンレジネートを形成するものであれば特に限
定されず、例えば２エチルへキサン酸やオクタン酸のよ
うな脂肪族カルボン酸、安息香酸のような芳香族カルボ
ン酸、アビエチン酸のようなテルペン系カルボン酸、あ
るいはナフテン酸のような脂環式カルボン酸等を使用す
ることができる。The antimony source of the antimony resinate is an antimony compound, and the resinate source is an organic carboxylic acid. The organic carboxylic acid that can be used is not particularly limited as long as it reacts with the antimony compound to form antimony resinate, and includes, for example, aliphatic carboxylic acids such as 2-ethylhexanoic acid and octanoic acid, and aromatic carboxylic acids such as benzoic acid. Group carboxylic acids, terpene carboxylic acids such as abietic acid, or alicyclic carboxylic acids such as naphthenic acid can be used.
前記アンチモン化合物と有機カルボン酸との反応方法は
特に限定されず、例えばテルペン油のような適宜の溶媒
中で還流下又は適宜の温度でアンチモン化合物と所定の
有機カルボン酸を反応させることにより所望のアンチモ
ンレジネートを得ることができる。The method of reaction between the antimony compound and the organic carboxylic acid is not particularly limited, and for example, the desired reaction can be performed by reacting the antimony compound with the specified organic carboxylic acid in an appropriate solvent such as terpene oil under reflux or at an appropriate temperature. Antimony resinate can be obtained.
該アンチモンレジネートは例えば電子工業用インクの添
加物として使用し基板等に塗布し乾燥、焼成すると、該
インクと前記基板との密着性が向上しシンタリング等の
ない性能及び外観が優れた導伝体または半導体基板を得
ることができる。For example, when the antimony resinate is used as an additive in ink for the electronic industry and applied to a substrate, etc., dried, and fired, the adhesion between the ink and the substrate improves, resulting in a conductive material with excellent performance and appearance without sintering. A semiconductor substrate can be obtained.
（実施例）
以下本発明方法の一実施例を記載するが、該実施例は本
発明を限定するものではない。(Example) An example of the method of the present invention will be described below, but this example is not intended to limit the present invention.
実施例に
酸化アンチモン（１８，０ｇ、０．０６２モル）とガム
ロジン（１８，７ｇ、 主成分Ｌ！アビエチン酸）を混
合し、溶媒をテルペン油として１７０℃で２時間還流し
た。還流後、クロロホルムを加え濾過し濾液を得た。該
濾液にヘキサンを加えることにより、黄褐色の沈＃（５
，１ｇ）が得られた。該沈殿の定量分析を行ったところ
アンチモンを７．５％含有し、又、構造解析を行った結
果該沈澱がアビエチン酸のカルボン酸基にアンチモンが
配位したアンチモンレジネートであることが分かった。In Example, antimony oxide (18.0 g, 0.062 mol) and gum rosin (18.7 g, main component L! abietic acid) were mixed and refluxed at 170° C. for 2 hours using terpene oil as a solvent. After refluxing, chloroform was added and filtered to obtain a filtrate. By adding hexane to the filtrate, a yellowish brown precipitate (#5
, 1 g) was obtained. Quantitative analysis of the precipitate revealed that it contained 7.5% antimony, and structural analysis revealed that the precipitate was antimony resinate in which antimony was coordinated to the carboxylic acid group of abietic acid.
実施例２
ガムロジンに換えてオクタン酸８．９ｇを使用して実施
例１と同様にしてアンチモンレジネートを得た。Example 2 Antimony resinate was obtained in the same manner as in Example 1 except that 8.9 g of octanoic acid was used in place of gum rosin.
実施例３
実施例１及び２で得たアンチモンレジネートを用いて、
下記の成分を混合して有機金インク及び有機白金インク
とした。Example 3 Using the antimony resinate obtained in Examples 1 and 2,
Organic gold ink and organic platinum ink were prepared by mixing the following components.
有機金インクは
樹脂酸金 ２０重量％樹脂酸ロジウ
ム ０．０５重量％樹脂酸ビスマス
０．３重１％樹脂酸クロム ０．０
４重重遣アンチモンレジネー） ０．０２重量％
樹脂酸バナジウム ０．０３重盪％アルキッド
樹脂 ６．０重量％尿素メラミン樹脂
３．０重量％口ジン誘導体樹脂 ２．０
重量％テルペンアルコール 残 部
有機白金インクは
樹脂酸白金 １５重量％樹脂酸ロジウ
ム ０．０５重盪％樹脂酸ビスマス
０．５重量％樹脂酸クロム ０．０６
重壜％アンチモンレジネート０．０３重量％
樹脂酸バナジウム ０．０５重量％アルキッド
樹脂 ６．５重量％尿素メラミン樹脂
３．０重量％口ジン誘導体樹脂 ３．
０重世％テルペンアルコール 残 部
該インクをセラミックス及びガラスの２０ｍｍ Ｘ ４
ＱｍＩＩｌｘ ｌ ｍｍを基板片にスクリーン印刷で塗
布し、室温で１５分間乾燥し、１５０℃で１０分間加熱
乾燥させた後、有機金インクは７００℃で２０分間焼成
し、有機白金インクは７５０℃で２０分間焼成したとこ
ろ、シンタリングのない０．１μｍの薄膜を形成してい
た。Organic gold ink consists of gold resinate, 20% by weight rhodium resinate, and 0.05% bismuth resinate.
0.3wt 1% chromium resinate 0.0
Quadruple weighted antimony resin) 0.02% by weight
Vanadium resinate 0.03% by weight Alkyd resin 6.0% by weight Urea melamine resin
3.0% by weight gin derivative resin 2.0
Weight % terpene alcohol Balance organic platinum ink is platinum resin acid 15 weight % rhodium resin acid 0.05 weight % bismuth resin acid
0.5% by weight chromium resinate 0.06
Heavy bottle% Antimony resinate 0.03% by weight Vanadium resinate 0.05% by weight Alkyd resin 6.5% by weight Urea melamine resin
3.0% by weight Kujin derivative resin 3.
0 weight percent terpene alcohol, the rest of the ink was placed on a 20 mm x 4 ceramic and glass plate.
After applying QmIIlx l mm to a piece of substrate by screen printing, drying at room temperature for 15 minutes, and heating drying at 150°C for 10 minutes, the organic gold ink was baked at 700°C for 20 minutes, and the organic platinum ink was baked at 750°C. When baked for 20 minutes, a 0.1 μm thin film without sintering was formed.
（発明の効果）
本発明方法によると、アンチモン化合物を有機カルボン
酸と反応させることにより有機溶剤に可溶なアンチモン
レジネートを製造することができる。(Effects of the Invention) According to the method of the present invention, antimony resinate soluble in an organic solvent can be produced by reacting an antimony compound with an organic carboxylic acid.
従って該アンチモンレジネートを例えば電子工業用イン
クの添加物として使用すると、基板との密着性に優れ、
シンタリング等のない性能及び外観が優れた導伝体また
は半導体基板を得ることができる。Therefore, when the antimony resinate is used as an additive in ink for the electronic industry, it has excellent adhesion to the substrate,
A conductor or semiconductor substrate with excellent performance and appearance without sintering etc. can be obtained.
勿論本発明方法により製造されるアンチモンレジネート
は電子工業用インク以外の用途にも使用することが可能
である。Of course, the antimony resinate produced by the method of the present invention can be used for purposes other than inks for the electronic industry.
（実施態様）
（１）アンチモン化合物がスチピン、三酸化アンチモン
、三硫化アンチモン、五酸化アンチモン、五酸化アンチ
モン水和物、三硫化アンチモン、五フッ化アンチモン、
三塩化アンチモン、三臭化アンチモン、五フッ化アンチ
モン、五塩化アンチモン、四塩化アンチモンである請求
項１に記載のアンチモンレジネートの製造方法。(Embodiment) (1) The antimony compound is stipine, antimony trioxide, antimony trisulfide, antimony pentoxide, antimony pentoxide hydrate, antimony trisulfide, antimony pentafluoride,
The method for producing an antimony resinate according to claim 1, wherein the antimony resinate is antimony trichloride, antimony tribromide, antimony pentafluoride, antimony pentachloride, or antimony tetrachloride.
（２）有機カルボン酸が脂肪族カルボン酸及び脂環式カ
ルボン酸である請求項１に記載のアンチモンレジネート
の製造方法。(2) The method for producing antimony resinate according to claim 1, wherein the organic carboxylic acid is an aliphatic carboxylic acid or an alicyclic carboxylic acid.
（３〉脂肪族カルボン酸及び脂環式カルボン酸が、２−
エチルへキサン酸、オクタン酸、ナフテン酸及び了ビニ
チン酸から選択される実施態様（２）に記載のアンチモ
ンレジネートの製造方法。(3> Aliphatic carboxylic acid and alicyclic carboxylic acid are 2-
The method for producing an antimony resinate according to embodiment (2), wherein the antimony resinate is selected from ethylhexanoic acid, octanoic acid, naphthenic acid and divinitic acid.
（４）有機カルボン酸が芳香族カルボン酸である請求項
１に記載のアンチモンレジネートの製造方法。(4) The method for producing antimony resinate according to claim 1, wherein the organic carboxylic acid is an aromatic carboxylic acid.
Claims (1)
とによりアンチモンレジネートを製造することを特徴と
する方法。1. A method characterized by producing antimony resinate by reacting an antimony compound with an organic carboxylic acid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63179668A JPH0229475A (en) | 1988-07-19 | 1988-07-19 | Production of antimony resinate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63179668A JPH0229475A (en) | 1988-07-19 | 1988-07-19 | Production of antimony resinate |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0229475A true JPH0229475A (en) | 1990-01-31 |
Family
ID=16069788
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63179668A Pending JPH0229475A (en) | 1988-07-19 | 1988-07-19 | Production of antimony resinate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0229475A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2253635A (en) * | 1991-01-25 | 1992-09-16 | Amp Akzo Corp | Heat decomposable compositions containing organogold compound and glass forming resinate |
| CN110453203A (en) * | 2019-08-13 | 2019-11-15 | 北京科技大学 | A kind of organic chemical additive for gold paste material and its application method |
-
1988
- 1988-07-19 JP JP63179668A patent/JPH0229475A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2253635A (en) * | 1991-01-25 | 1992-09-16 | Amp Akzo Corp | Heat decomposable compositions containing organogold compound and glass forming resinate |
| CN110453203A (en) * | 2019-08-13 | 2019-11-15 | 北京科技大学 | A kind of organic chemical additive for gold paste material and its application method |
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