JPH02298941A - Antistatic layer - Google Patents
Antistatic layerInfo
- Publication number
- JPH02298941A JPH02298941A JP1119591A JP11959189A JPH02298941A JP H02298941 A JPH02298941 A JP H02298941A JP 1119591 A JP1119591 A JP 1119591A JP 11959189 A JP11959189 A JP 11959189A JP H02298941 A JPH02298941 A JP H02298941A
- Authority
- JP
- Japan
- Prior art keywords
- group
- antistatic layer
- groups
- general formula
- antistatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002245 particle Substances 0.000 claims abstract description 15
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 12
- 229920001600 hydrophobic polymer Polymers 0.000 claims abstract description 12
- 239000002985 plastic film Substances 0.000 claims abstract description 8
- 229920006255 plastic film Polymers 0.000 claims abstract description 8
- 150000003839 salts Chemical class 0.000 claims abstract description 7
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 5
- 239000001257 hydrogen Substances 0.000 claims abstract description 5
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims abstract description 5
- 125000005529 alkyleneoxy group Chemical group 0.000 claims abstract description 4
- 125000005843 halogen group Chemical group 0.000 claims abstract description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 11
- 229920001940 conductive polymer Polymers 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 2
- 238000011161 development Methods 0.000 abstract description 14
- 238000012545 processing Methods 0.000 abstract description 8
- 239000004848 polyfunctional curative Substances 0.000 abstract description 3
- 230000015556 catabolic process Effects 0.000 abstract 1
- 238000006731 degradation reaction Methods 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 abstract 1
- -1 silver halide Chemical class 0.000 description 31
- 239000010410 layer Substances 0.000 description 29
- 229910052709 silver Inorganic materials 0.000 description 22
- 239000004332 silver Substances 0.000 description 22
- 239000000463 material Substances 0.000 description 19
- 229920000642 polymer Polymers 0.000 description 16
- 238000000034 method Methods 0.000 description 14
- 239000000839 emulsion Substances 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 108010010803 Gelatin Proteins 0.000 description 10
- 229920000159 gelatin Polymers 0.000 description 10
- 239000008273 gelatin Substances 0.000 description 10
- 235000019322 gelatine Nutrition 0.000 description 10
- 235000011852 gelatine desserts Nutrition 0.000 description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- 239000004816 latex Substances 0.000 description 8
- 229920000126 latex Polymers 0.000 description 8
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 239000011734 sodium Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 229920000139 polyethylene terephthalate Polymers 0.000 description 4
- 239000005020 polyethylene terephthalate Substances 0.000 description 4
- 229910052708 sodium Inorganic materials 0.000 description 4
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 4
- 125000000542 sulfonic acid group Chemical group 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000011575 calcium Substances 0.000 description 3
- 229910052791 calcium Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 208000028659 discharge Diseases 0.000 description 3
- 238000007720 emulsion polymerization reaction Methods 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- CMCWWLVWPDLCRM-UHFFFAOYSA-N phenidone Chemical compound N1C(=O)CCN1C1=CC=CC=C1 CMCWWLVWPDLCRM-UHFFFAOYSA-N 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 2
- LPYUENQFPVNPHY-UHFFFAOYSA-N 3-methoxycatechol Chemical compound COC1=CC=CC(O)=C1O LPYUENQFPVNPHY-UHFFFAOYSA-N 0.000 description 2
- FJWJYHHBUMICTP-UHFFFAOYSA-N 4,4-dimethylpyrazolidin-3-one Chemical compound CC1(C)CNNC1=O FJWJYHHBUMICTP-UHFFFAOYSA-N 0.000 description 2
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 2
- LRUDIIUSNGCQKF-UHFFFAOYSA-N 5-methyl-1H-benzotriazole Chemical compound C1=C(C)C=CC2=NNN=C21 LRUDIIUSNGCQKF-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- ZTHYODDOHIVTJV-UHFFFAOYSA-N Propyl gallate Chemical compound CCCOC(=O)C1=CC(O)=C(O)C(O)=C1 ZTHYODDOHIVTJV-UHFFFAOYSA-N 0.000 description 2
- CZPWVGJYEJSRLH-UHFFFAOYSA-N Pyrimidine Chemical compound C1=CN=CN=C1 CZPWVGJYEJSRLH-UHFFFAOYSA-N 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical class C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 125000005250 alkyl acrylate group Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 235000010323 ascorbic acid Nutrition 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
- 239000011668 ascorbic acid Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 2
- 239000012964 benzotriazole Substances 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000009472 formulation Methods 0.000 description 2
- LEQAOMBKQFMDFZ-UHFFFAOYSA-N glyoxal Chemical compound O=CC=O LEQAOMBKQFMDFZ-UHFFFAOYSA-N 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 2
- 235000019252 potassium sulphite Nutrition 0.000 description 2
- 239000003755 preservative agent Substances 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- 230000008313 sensitization Effects 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 description 1
- QDNPCYCBQFHNJC-UHFFFAOYSA-N 1,1'-biphenyl-3,4-diol Chemical compound C1=C(O)C(O)=CC=C1C1=CC=CC=C1 QDNPCYCBQFHNJC-UHFFFAOYSA-N 0.000 description 1
- KSLKGJFWSBFHRC-UHFFFAOYSA-N 1,3-dichloro-2,4-dihydro-1,3,5-triazine;sodium Chemical compound [Na].ClN1CN=CN(Cl)C1 KSLKGJFWSBFHRC-UHFFFAOYSA-N 0.000 description 1
- OXLXSOPFNVKUMU-UHFFFAOYSA-N 1,4-dioctoxy-1,4-dioxobutane-2-sulfonic acid Chemical class CCCCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCCCC OXLXSOPFNVKUMU-UHFFFAOYSA-N 0.000 description 1
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 1
- NXVHEHXRZVQDCR-UHFFFAOYSA-N 1-n,1-n-diethyl-2-methylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1C NXVHEHXRZVQDCR-UHFFFAOYSA-N 0.000 description 1
- AHABMLPWPUZVOI-UHFFFAOYSA-N 1-n,1-n-diethylbenzene-1,2,4-triamine Chemical compound CCN(CC)C1=CC=C(N)C=C1N AHABMLPWPUZVOI-UHFFFAOYSA-N 0.000 description 1
- XIROXSOOOAZHLL-UHFFFAOYSA-N 2',3',4'-Trihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C(O)=C1O XIROXSOOOAZHLL-UHFFFAOYSA-N 0.000 description 1
- YZDIUKPBJDYTOM-UHFFFAOYSA-N 2,5-diethylbenzene-1,4-diol Chemical compound CCC1=CC(O)=C(CC)C=C1O YZDIUKPBJDYTOM-UHFFFAOYSA-N 0.000 description 1
- BDKLKNJTMLIAFE-UHFFFAOYSA-N 2-(3-fluorophenyl)-1,3-oxazole-4-carbaldehyde Chemical compound FC1=CC=CC(C=2OC=C(C=O)N=2)=C1 BDKLKNJTMLIAFE-UHFFFAOYSA-N 0.000 description 1
- XQHGAEQBYRZJIX-UHFFFAOYSA-N 2-amino-4-chloro-6-phenylphenol Chemical compound NC1=CC(Cl)=CC(C=2C=CC=CC=2)=C1O XQHGAEQBYRZJIX-UHFFFAOYSA-N 0.000 description 1
- UDVRKKAWBVVSAM-UHFFFAOYSA-N 2-amino-6-phenylphenol Chemical compound NC1=CC=CC(C=2C=CC=CC=2)=C1O UDVRKKAWBVVSAM-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- REFDOIWRJDGBHY-UHFFFAOYSA-N 2-bromobenzene-1,4-diol Chemical compound OC1=CC=C(O)C(Br)=C1 REFDOIWRJDGBHY-UHFFFAOYSA-N 0.000 description 1
- IQMGXSMKUXLLER-UHFFFAOYSA-N 2-hydroxy-5-sulfobenzoic acid;sodium Chemical compound [Na].OC(=O)C1=CC(S(O)(=O)=O)=CC=C1O IQMGXSMKUXLLER-UHFFFAOYSA-N 0.000 description 1
- ZGJUJDQANIYVAL-UHFFFAOYSA-N 2-methyl-4-morpholin-4-ylaniline Chemical compound C1=C(N)C(C)=CC(N2CCOCC2)=C1 ZGJUJDQANIYVAL-UHFFFAOYSA-N 0.000 description 1
- AGBXYHCHUYARJY-UHFFFAOYSA-N 2-phenylethenesulfonic acid Chemical compound OS(=O)(=O)C=CC1=CC=CC=C1 AGBXYHCHUYARJY-UHFFFAOYSA-N 0.000 description 1
- YBMTWYWCLVMFFD-UHFFFAOYSA-N 3-methylbutyl 3,4,5-trihydroxybenzoate Chemical compound CC(C)CCOC(=O)C1=CC(O)=C(O)C(O)=C1 YBMTWYWCLVMFFD-UHFFFAOYSA-N 0.000 description 1
- WWOBYPKUYODHDG-UHFFFAOYSA-N 4-chlorocatechol Chemical compound OC1=CC=C(Cl)C=C1O WWOBYPKUYODHDG-UHFFFAOYSA-N 0.000 description 1
- BQCIJWPKDPZNHD-UHFFFAOYSA-N 5-bromo-2h-benzotriazole Chemical compound C1=C(Br)C=CC2=NNN=C21 BQCIJWPKDPZNHD-UHFFFAOYSA-N 0.000 description 1
- INVVMIXYILXINW-UHFFFAOYSA-N 5-methyl-1h-[1,2,4]triazolo[1,5-a]pyrimidin-7-one Chemical compound CC1=CC(=O)N2NC=NC2=N1 INVVMIXYILXINW-UHFFFAOYSA-N 0.000 description 1
- WSGURAYTCUVDQL-UHFFFAOYSA-N 5-nitro-1h-indazole Chemical compound [O-][N+](=O)C1=CC=C2NN=CC2=C1 WSGURAYTCUVDQL-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- NOWKCMXCCJGMRR-UHFFFAOYSA-N Aziridine Chemical compound C1CN1 NOWKCMXCCJGMRR-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- RPWFJAMTCNSJKK-UHFFFAOYSA-N Dodecyl gallate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 RPWFJAMTCNSJKK-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical class C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- AVXURJPOCDRRFD-UHFFFAOYSA-N Hydroxylamine Chemical compound ON AVXURJPOCDRRFD-UHFFFAOYSA-N 0.000 description 1
- NWBJYWHLCVSVIJ-UHFFFAOYSA-N N-benzyladenine Chemical compound N=1C=NC=2NC=NC=2C=1NCC1=CC=CC=C1 NWBJYWHLCVSVIJ-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910021607 Silver chloride Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 1
- XCFIVNQHHFZRNR-UHFFFAOYSA-N [Ag].Cl[IH]Br Chemical compound [Ag].Cl[IH]Br XCFIVNQHHFZRNR-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000003172 aldehyde group Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 125000004069 aziridinyl group Chemical group 0.000 description 1
- 150000001556 benzimidazoles Chemical class 0.000 description 1
- 150000001565 benzotriazoles Chemical class 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- XOPOEBVTQYAOSV-UHFFFAOYSA-N butyl 3,4,5-trihydroxybenzoate Chemical compound CCCCOC(=O)C1=CC(O)=C(O)C(O)=C1 XOPOEBVTQYAOSV-UHFFFAOYSA-N 0.000 description 1
- IYCOKCJDXXJIIM-UHFFFAOYSA-N butyl prop-2-enoate;prop-2-enoic acid;styrene Chemical compound OC(=O)C=C.C=CC1=CC=CC=C1.CCCCOC(=O)C=C IYCOKCJDXXJIIM-UHFFFAOYSA-N 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- ZUIVNYGZFPOXFW-UHFFFAOYSA-N chembl1717603 Chemical compound N1=C(C)C=C(O)N2N=CN=C21 ZUIVNYGZFPOXFW-UHFFFAOYSA-N 0.000 description 1
- AJPXTSMULZANCB-UHFFFAOYSA-N chlorohydroquinone Chemical compound OC1=CC=C(O)C(Cl)=C1 AJPXTSMULZANCB-UHFFFAOYSA-N 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000011033 desalting Methods 0.000 description 1
- PQZTVWVYCLIIJY-UHFFFAOYSA-N diethyl(propyl)amine Chemical compound CCCN(CC)CC PQZTVWVYCLIIJY-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- AFOSIXZFDONLBT-UHFFFAOYSA-N divinyl sulfone Chemical group C=CS(=O)(=O)C=C AFOSIXZFDONLBT-UHFFFAOYSA-N 0.000 description 1
- 239000000555 dodecyl gallate Substances 0.000 description 1
- 235000010386 dodecyl gallate Nutrition 0.000 description 1
- 229940080643 dodecyl gallate Drugs 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical class OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 1
- 229940015043 glyoxal Drugs 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine Substances NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 229920000831 ionic polymer Polymers 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Chemical class CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 230000002335 preservative effect Effects 0.000 description 1
- 239000000473 propyl gallate Substances 0.000 description 1
- 235000010388 propyl gallate Nutrition 0.000 description 1
- 229940075579 propyl gallate Drugs 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical class O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000001397 quillaja saponaria molina bark Substances 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229930182490 saponin Natural products 0.000 description 1
- 150000007949 saponins Chemical class 0.000 description 1
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 1
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 1
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229940087562 sodium acetate trihydrate Drugs 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- FZHLWVUAICIIPW-UHFFFAOYSA-M sodium gallate Chemical compound [Na+].OC1=CC(C([O-])=O)=CC(O)=C1O FZHLWVUAICIIPW-UHFFFAOYSA-M 0.000 description 1
- 235000011121 sodium hydroxide Nutrition 0.000 description 1
- OZSMDXCTZNLHPP-FJOGWHKWSA-M sodium;(z)-but-2-enedioic acid;2-phenylethenesulfonate Chemical compound [Na+].OC(=O)\C=C/C(O)=O.[O-]S(=O)(=O)C=CC1=CC=CC=C1 OZSMDXCTZNLHPP-FJOGWHKWSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000003107 substituted aryl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 125000000626 sulfinic acid group Chemical group 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical group 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 229920001567 vinyl ester resin Chemical class 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、プラスチックフィルム支持体用の帯電防止層
に関し、特に帯電防止能の優れたハロゲン化銀写真感光
材料に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to an antistatic layer for a plastic film support, and more particularly to a silver halide photographic material with excellent antistatic ability.
一般にプラスチイックフィルム支持体は、帯電性が強く
、これが使用上多くの制約を与えている例は多い。例え
ばハロゲン化銀写真感光材料においてはポリエチレンテ
レフタレートのような支持体が一般に使用されるが1、
特に冬季の如き低湿度において帯電し易い。最近のよう
に高感度写真乳剤を高速度で塗布したり、高感度の感光
材料を自動プリンターを通して露光処理をする場合、特
に帯電防止対策が重要である。Generally, plastic film supports have strong electrostatic properties, and this often imposes many restrictions on their use. For example, supports such as polyethylene terephthalate are generally used in silver halide photographic materials.
It is easy to be charged especially in low humidity such as winter. Antistatic measures are especially important when high-speed photographic emulsions are coated at high speeds or when high-sensitivity photosensitive materials are exposed to light using automatic printers, as has been the case recently.
感光材料が帯電すると、その放電によりスタチックマー
クがでt;す、またはゴミ等の異物を付着し、これによ
りピンホールを発生させたりして著しく品質を劣化し、
その修正のため非常に作業性をおとしてしまう。このた
め、一般に感光材料では帯電防止剤が使用され、最近で
は、含フツ素界面活性剤、カチオン界面活性剤、両性界
面活性剤、ポリエチレンオキサイド基を含有する界面活
性剤ないし高分子化合物、スルホン酸又はリン酸基を分
子内に有するポリマー等が用いられている。When a photosensitive material is charged, static marks are created due to the discharge, or foreign matter such as dust is attached, which causes pinholes and significantly deteriorates the quality.
The work efficiency is greatly reduced due to the correction. For this reason, antistatic agents are generally used in photosensitive materials, and recently, fluorine-containing surfactants, cationic surfactants, amphoteric surfactants, surfactants or polymer compounds containing polyethylene oxide groups, and sulfonic acid Alternatively, a polymer having a phosphoric acid group in the molecule is used.
特にフッ素系界面活性剤による帯電列調整、あるいは導
電性ポリマーによる導電性向上が多く使用されてきてお
り、例えば特開昭49−91165号および同4912
1523号lこはポリマー主鎖中に解離基を有するイオ
ン型ポリマーを適用する例が開示されている。In particular, adjusting the charge series using fluorine-based surfactants or improving conductivity using conductive polymers has been widely used, for example, in JP-A-49-91165 and JP-A-4912.
No. 1523 discloses an example in which an ionic polymer having a dissociative group in the polymer main chain is applied.
しかしながら、これらの従来技術では、現像処理により
、帯電防止能が大幅に劣化してしまう。However, in these conventional techniques, the antistatic ability is significantly deteriorated by the development process.
これはアルカリを用いる現像工程、酸性の定着工程、水
洗等の工程を経ることにより帯電防止能が失われるもの
と思われる。This is thought to be because the antistatic ability is lost through processes such as a developing process using an alkali, an acidic fixing process, and washing with water.
したがって印刷感光材料等のように、処理済みフィルム
をさらに用いてプリントするような場合に、ゴミの付着
によるピンホール発生等の問題を生ずる。このため例え
ば特開昭55−84658号、同61−174542号
ではカルボキシル基を有する水溶性導電性ポリマー、カ
ルボキシル基を有する疎水性ポリマー及び多官能アジリ
ジンからなる帯電防止層が提案されている。Therefore, when a processed film is further used for printing, such as with printing photosensitive materials, problems such as pinholes occur due to adhesion of dust. For this reason, for example, JP-A-55-84658 and JP-A-61-174542 propose an antistatic layer comprising a water-soluble conductive polymer having a carboxyl group, a hydrophobic polymer having a carboxyl group, and a polyfunctional aziridine.
この方法によれば処理後にも帯電防止能を残すことがで
きるが、疎水性ポリマー粒子の分散安定性が悪く、膜中
で凝集をおこし、帯電防止層の透明性を損なうという欠
点があった。According to this method, the antistatic ability can be maintained even after treatment, but the dispersion stability of the hydrophobic polymer particles is poor, causing aggregation in the film, which impairs the transparency of the antistatic layer.
上記のような問題に対し、本発明の目的は、透明性の優
れたヘーズのないプラスチイックフィル“ム支持体用の
帯電防止層を提供することであり、別の目的としては、
帯電防止に優れたハロゲン化銀写真感光材料を提供する
ことである。In view of the above-mentioned problems, an object of the present invention is to provide an antistatic layer for a plastic film support having excellent transparency and no haze.
An object of the present invention is to provide a silver halide photographic material having excellent antistatic properties.
本発明の上記目的は、■水溶性導電性ポリマー、■疎水
性°ポリマー粒子、■硬膜剤の反応生成物からなる帯電
防止層を有してなるプラ゛スチックフイルム支持体にお
いて、該疎水性ポリマー粒子が、スルホン酸硫酸エステ
ル基またはその塩のうちの少なくとも1つの基を有し、
かっ硬膜剤として一般式CI)を含有することを特徴と
する帯電防止層により達成される。The above object of the present invention is to provide a plastic film support having an antistatic layer comprising a reaction product of (1) a water-soluble conductive polymer, (2) hydrophobic polymer particles, and (3) a hardening agent. the polymer particles have at least one group of a sulfonic acid sulfate group or a salt thereof;
This is achieved by an antistatic layer characterized in that it contains the general formula CI) as a hardening agent.
一般式(1)
R,、R,は炭素数4までのアルキル基を表し、互いに
異なっていてもよい。X l、X *、X s、X a
は、水素、炭素数3までのアルキル基、ハロゲン原子を
表し、互いに異なっていてもよい。Lは単なる結合で、
炭素数4までのアルキル基、アルキレンオキシ基を表す
。General formula (1) R,, R, represent an alkyl group having up to 4 carbon atoms, and may be different from each other. X l, X *, X s, X a
represent hydrogen, an alkyl group having up to 3 carbon atoms, or a halogen atom, and may be different from each other. L is just a bond,
Represents an alkyl group or alkyleneoxy group having up to 4 carbon atoms.
以下、本発明の詳細について説明する。The details of the present invention will be explained below.
本発明の水溶性導電性ポリマーについては、スルホンr
lll&、flLmエステル基、4級アンモニウム塩、
3級アンモニウム塩、カルボキシル基、ポリエチレンオ
キシド基から選ばれる少なくともlっの導電性基を有す
るポリマーが挙げられる。これらの基のうちスルホン酸
基、硫酸エステル基、4級アンモニウム塩基が好ましい
。 導電性基はポリマー1分子当たり5重量%以上を必
要とする。For the water-soluble conductive polymer of the present invention, sulfone r
lll&, flLm ester group, quaternary ammonium salt,
Examples include polymers having at least one conductive group selected from tertiary ammonium salts, carboxyl groups, and polyethylene oxide groups. Among these groups, sulfonic acid groups, sulfuric acid ester groups, and quaternary ammonium bases are preferred. The amount of conductive groups required is 5% by weight or more per polymer molecule.
水溶性の導電性ポリマー中にはカルボキシ基、ヒドロキ
シ基、アミノ基、エポキシ基、アジリジン基、活性メチ
レン基、スルフィン酸基、アルデヒド基、ビニルスルホ
ン基を含んでいるのが好ましい。The water-soluble conductive polymer preferably contains a carboxy group, a hydroxy group, an amino group, an epoxy group, an aziridine group, an active methylene group, a sulfinic acid group, an aldehyde group, and a vinyl sulfone group.
これらの基はポリマー1分子当たり5重量%以上必要と
する。ポリマーの分子量は3000〜100000であ
り、好ましくは3500〜50000である。These groups are required in an amount of 5% by weight or more per polymer molecule. The molecular weight of the polymer is 3,000 to 100,000, preferably 3,500 to 50,000.
以下、本発明に用いられる水溶性導電性ポリマーの化合
物例を挙げるがこれに限定されるものではない。Examples of water-soluble conductive polymer compounds used in the present invention are listed below, but the present invention is not limited thereto.
(1) ホモボリマー (2) ホモポリマー (3) Ii、Hs ?1・ Cα CH。(1) Homobolimer (2) Homopolymer (3) Ii, Hs ? 1・ Cα CH.
■
1勾2.5万
?H・
M″q1万
M=tO,6万
(23)デキストランサル7エイト
置換度 2.0 M−10万
M”=10万
i#6万
x:y:z−60:10二30
Mζ6万
尚、上記(1)〜(31)において、X+’l+2はそ
れぞれ単量体成分のモル%を、゛又Mは平均分子量(本
明細書中、平均分子量とは数平均分子量を示す。)を表
す。■ 1 grade 25,000? H・M″q10,000M=tO, 60,000 (23) Degree of dextransal 78 substitution 2.0 M-100,000M”=100,000i#60,000x:y:z-60:10230Mζ60,000 In addition, in the above (1) to (31), X+'l+2 each represents the mol% of the monomer component, and M represents the average molecular weight (in this specification, the average molecular weight refers to the number average molecular weight). represent.
これらのポリマーは市販又は常法によって得られる七ツ
マ−を重合することにより合成することが出来る。These polymers can be synthesized by polymerizing heptamers that are commercially available or obtained by conventional methods.
次に本発明の水溶性導電性ポリマ一層中に含有させる疎
水性ポリマー粒子は、スルホン酸基、硫酸エステル基又
はその塩のうちの少なくとも1つを有し、実質的に水に
溶解しない所謂ラテックス状で含有されている。この疎
水性ポリマーは、スチレン、スチレン誘導体、アルキル
アクリレート、アルキルメタクリレート、オレフィン誘
導体、ハロゲン化エチレン誘導体、アクリルアミド誘導
体、メタクリルアミド誘導体、ビニルエステル誘導体、
アクリロニトリル等の中から任意の組み合わせで選ばれ
た七ツマ−を重合して得られる。特にスチレン誘導体、
アルキルアクリレート、アルキルメタクリレートが少な
くとも30−Tニル%含有されているのが好ましい。特
に50モル%以上が好ましい。Next, the hydrophobic polymer particles contained in one layer of the water-soluble conductive polymer of the present invention are so-called latex particles that have at least one of a sulfonic acid group, a sulfuric acid ester group, or a salt thereof, and are substantially insoluble in water. Contained in the form of This hydrophobic polymer includes styrene, styrene derivatives, alkyl acrylates, alkyl methacrylates, olefin derivatives, halogenated ethylene derivatives, acrylamide derivatives, methacrylamide derivatives, vinyl ester derivatives,
It is obtained by polymerizing heptamers selected from acrylonitrile and the like in any combination. Especially styrene derivatives,
Preferably, the alkyl acrylate or alkyl methacrylate content is at least 30-Tyl%. Particularly preferred is 50 mol% or more.
スルホン酸基、硫酸エステル基またはその塩を有するモ
ノマーは20モル%以下が好ましい。The monomer having a sulfonic acid group, a sulfuric acid ester group, or a salt thereof is preferably 20 mol % or less.
スルホン酸基、硫酸エステル基又はその塩を導入するた
めの七ツマ−としては、下記一般式〔■〕で表されるも
のが好ましい。As the hexamer for introducing a sulfonic acid group, a sulfuric acid ester group, or a salt thereof, those represented by the following general formula [■] are preferable.
(II) R
□
<cH2−c)−
R:炭素数1〜4のアルキル基、水素原子、ハロゲン
L : −C−、−NH−、−0−、からなる結合基か
ら選ばれる少なくとも1つの基を有し炭素数1〜6の2
価、又は基アリール基、置換アリ−ルール基
A:炭素数1〜12のアルキル基、アルケニル基、アリ
ール基
a、b:Q又はl
X : SO3M、 O3OxM、 Mはカチオン
又は水素一般式(II)で表されるモノマーとして好ま
しいものの具体例を挙げる。(II) R □ <cH2-c)- R: alkyl group having 1 to 4 carbon atoms, hydrogen atom, halogen L: at least one bonding group selected from -C-, -NH-, -0-, 2 having a group and having 1 to 6 carbon atoms
or group aryl group, substituted aryl group A: C1-C12 alkyl group, alkenyl group, aryl group a, b: Q or l X: SO3M, O3OxM, M is a cation or hydrogen General formula (II ) Specific examples of preferred monomers are listed below.
3、 4゜
5、 6゜
疎水性ポリマーをラテックス状にするには乳化重合をす
る、固体状のポリマーを低沸点溶媒に溶かして微分散後
、溶媒を留去するという2つの方法があるが粒径が細か
く、シかもそろったものができるという点で乳化重合す
ることが好ましい。3, 4゜5, 6゜There are two methods to make a latex from a hydrophobic polymer: emulsion polymerization, or dissolving a solid polymer in a low boiling point solvent, finely dispersing it, and then distilling off the solvent. Emulsion polymerization is preferred because it produces particles with fine particle size and uniform grain size.
乳化重合の際に用いる界面活性剤としては、アニオン性
、ノニオン性を用いるのが好ましく、七ツマ−に対し1
0重量%以下が好ましい。As the surfactant used during emulsion polymerization, it is preferable to use an anionic or nonionic surfactant.
It is preferably 0% by weight or less.
多量の界面活性剤は導電性層をくもらせる原因となる。A large amount of surfactant causes clouding of the conductive layer.
疎水性ポリマーの分子量は3000以上であれば良く、
分子量による透明性の差はほとんどない。The molecular weight of the hydrophobic polymer may be 3000 or more,
There is almost no difference in transparency depending on molecular weight.
本発明の疎水性ポリマーの具体例を挙げる。Specific examples of the hydrophobic polymer of the present invention will be given below.
2゜ コtJ3Na 3 。2゜ KotJ3Na 3.
4 。4.
5、clI3
11゜
しi3
本発明の導電性層を硬化する一般式CI)について説明
する。5, clI3 11° and i3 General formula CI) for curing the conductive layer of the present invention will be explained.
R、、R!:炭素数4までのアルキル基を表し、互いに
異なっていてもよい。R,,R! : Represents an alkyl group having up to 4 carbon atoms, and may be different from each other.
X 、、X 2.X 、、X 4:水素、炭素数3まで
のアルキル基、ハロゲン原子を表し、互いに異
なっていてもよい。X,,X2. X , , X 4 represents hydrogen, an alkyl group having up to 3 carbon atoms, or a halogen atom, and may be different from each other.
L:単なる結合、炭素数4までのアルキレン基、アルキ
レンオキシ基を表す。L: represents a simple bond, an alkylene group having up to 4 carbon atoms, or an alkyleneoxy group.
次に具体的化合物例を挙げる。Next, specific examples of compounds will be given.
I−I CH,O,5−cHz−CI、−SO,CH
3I 2 CHsOsS−(CI2片So、CH。I-I CH,O,5-cHz-CI,-SO,CH
3I 2 CHsOsS- (CI2 piece So, CH.
■−3CL(hS CHzイCHz)zCH*5(hc
Hsl−4CH,O,5−ClバCH2)0(CH2h
CH25(hcHxI−5CQ CQ
CH303S CH(CH2)4CH5O3CH3これ
らの化合物は米国特許2,726.162号の明細書の
記載を参考にして合成することができる。■-3CL (hS CHZ) zCH*5 (hc
Hsl-4CH,O,5-Cl(CH2)0(CH2h
CH25(hcHxI-5CQ CQ CH303S CH(CH2)4CH5O3CH3 These compounds can be synthesized with reference to the description in the specification of US Pat. No. 2,726.162.
本発明では導電性層が透明支持体上に塗設される。透明
支持体は写真用のもの全てが使えるが好ましくは、可視
光を90%以上透過するように作られたポリエチレンテ
レフタレート又はセルローストリアセテートである。In the present invention, a conductive layer is coated on a transparent support. Although any photographic transparent support can be used, polyethylene terephthalate or cellulose triacetate, which is made to transmit 90% or more of visible light, is preferable.
これらの透明支持体は、当業者に良く知られた方法で作
成されるものであるが、場合によっては光透過を実質的
に阻害しないように染料を若干添加して青味付けしたり
しても良い。These transparent supports are prepared by methods well known to those skilled in the art, but in some cases, a slight amount of dye may be added to give them a blue tint so as not to substantially inhibit light transmission. good.
本発明の支持体は、コロナ放電処理をした後ラテックス
ポリマーを含有する下引層が塗設されていてもよい。コ
ロナ放電処理は、エネルギー値として1mW〜l KW
/m’minが特に好ましく適用される。The support of the present invention may be coated with a subbing layer containing a latex polymer after being subjected to a corona discharge treatment. Corona discharge treatment has an energy value of 1 mW to 1 KW.
/m'min is particularly preferably applied.
又特に好ましくは、ラテックス下引層塗布後導電性層を
塗設する前にコロナ放電処理を再度行うと良い。Particularly preferably, corona discharge treatment is performed again after applying the latex undercoat layer and before applying the conductive layer.
本発明の導電性層は感光性層より支持体側にあってもよ
いし、感光層に対し支持体の反対側、いわゆる背面にあ
ってもよい。The conductive layer of the present invention may be located closer to the support than the photosensitive layer, or may be located on the opposite side of the support to the photosensitive layer, ie, on the back surface.
本発明は、支持体上に形成される感光材料金てに応用す
ることができる。例えばハロゲン化銀カラー感光材料、
レントゲン用感光材料、製版用感光材料等である。The present invention can be applied to photosensitive materials formed on a support. For example, silver halide color photosensitive materials,
These include photosensitive materials for X-rays and photosensitive materials for plate making.
本発明の感光材料に用いるハロゲン化銀乳剤には、ハロ
ゲン化銀として、臭化銀、塩化銀、沃臭化銀、塩臭化銀
、塩沃臭化銀等の通常のハロゲン化銀乳剤に使用される
任意のものを用いる事かでさ、ハロゲン化銀粒子は、酸
性法、中性法及びアンモニア法のいずれで得られたもの
でもよい。The silver halide emulsion used in the light-sensitive material of the present invention includes conventional silver halide emulsions such as silver bromide, silver chloride, silver iodobromide, silver chlorobromide, and silver chloroiodobromide. The silver halide grains may be obtained by any of the acid method, neutral method, and ammonia method.
ハロゲン化銀粒子は、粒子内において均一な一ハロゲン
化銀組成分布を有するものでも、粒子の内部と表面層と
でハロゲン化銀組成が異なるコア/フェル粒子であって
もよく、潜像が主として表面に形成されるような粒子で
あっても、又主として粒子内部に形成されるような粒子
でもよい。Silver halide grains may have a uniform silver monohalide composition distribution within the grain, or may be core/fel grains in which the silver halide composition differs between the interior and surface layer of the grain, in which the latent image is mainly The particles may be formed on the surface or may be formed primarily inside the particles.
本発明に用いられるハロゲン化銀乳剤は、例えば米国特
許2,444.607号、同2,716.062号、同
3.512.982号、西独間出願公告1.189.3
80号、同2,058゜626号、同2.118.41
1号、特公昭43−4133号、米国特許3,342,
596号、特公昭47−4417号、西独国出願公告2
.149.789号、特公昭39−2825号、特公昭
49−13566号等の各明細書又は公報に記載されて
いる化合物、好ましくは、例えば5.6− トリメチレ
ン−7−ヒドロキシン−5−トリアゾロ (1,5−a
)ピリミジン、5.6−テトラメチレンー7−ヒドロキ
シーS−トリアゾロ(1,5−a)ピリミジン、5−メ
チル−7−ヒドロキシ−5−トリアゾロ(1、5−a)
ピリミジン、5−メチル−7−ヒドロキシ−s−トリア
ゾロ(1,5−a)ピリミジン、7−ヒドロキシン−s
−トリアシロン(1,5−a)ピリミジン、5−メチル
−6−ブロモーフーヒドロキシーs−トリアゾロ(1゜
5−a)ピリミジン、没食子酸エステル(例えば没食子
酸イソアミル、没食子酸ドデシル、没食子酸プロピル、
没食子酸ナトリウム)、メルカプタン類(l−フェニル
−5−メルカプトテトラゾール、2−メルカプトベンツ
チアゾール)、ベンゾトリアゾール類(5−ブロムベン
ツトリアゾール、5−メチルヘンットリアゾール)、ベ
ンツイミダゾール類(6−ニドロペンツイミダゾール)
等を用いて安定化することができる。Examples of the silver halide emulsion used in the present invention include U.S. Pat. No. 2,444.607, U.S. Pat.
No. 80, No. 2,058゜626, No. 2.118.41
No. 1, Special Publication No. 43-4133, U.S. Patent No. 3,342,
No. 596, Special Publication No. 47-4417, West German Application Publication 2
.. Compounds described in specifications or publications such as No. 149.789, Japanese Patent Publication No. 39-2825, and Japanese Patent Publication No. 49-13566, preferably, for example, 5,6-trimethylene-7-hydroxyne-5-triazolo (1,5-a
) Pyrimidine, 5,6-tetramethylene-7-hydroxy-S-triazolo(1,5-a) Pyrimidine, 5-methyl-7-hydroxy-5-triazolo(1,5-a)
Pyrimidine, 5-methyl-7-hydroxy-s-triazolo(1,5-a)pyrimidine, 7-hydroxy-s
- triacylon(1,5-a)pyrimidine, 5-methyl-6-bromohydroxy-s-triazolo(1°5-a)pyrimidine, gallic acid esters (e.g. isoamyl gallate, dodecyl gallate, propyl gallate) ,
Sodium gallate), mercaptans (l-phenyl-5-mercaptotetrazole, 2-mercaptobenzthiazole), benzotriazoles (5-bromobenztriazole, 5-methylhenttriazole), benzimidazoles (6-nidro penzimidazole)
It can be stabilized using etc.
本発明に係るハロゲン化銀写真感光材料及び/又は現像
液中には、アミノ化合物を含有することができる。The silver halide photographic material and/or developer according to the present invention may contain an amino compound.
又現像性を高めるために、フェニドンやハイドロキノン
のような現像主薬、ベンゾトリアゾールのような抑制剤
を乳剤側に含有せしめることができる。或いは処理液の
処理能力を上げるために、バッキング層に現像主薬や抑
制剤を含有せしめることができる。Further, in order to improve the developability, a developing agent such as phenidone or hydroquinone or an inhibitor such as benzotriazole may be contained in the emulsion. Alternatively, in order to increase the processing ability of the processing solution, the backing layer may contain a developing agent or an inhibitor.
本発明に特に有利に用いられる親水性コロイドはゼラチ
ンである。A hydrophilic colloid used with particular advantage in the present invention is gelatin.
本発明に用いられるゼラチンは、アルカリ処理、酸処理
いずれも用いることが出来るが、オセインゼラチンを用
いる場合にはカルシウム或いは鉄分を取り除くことが好
ましい。好ましい含有量としてカルシウム分は1〜99
9ppmであるが、更に好ましくはi500ppmであ
り、鉄分は0.001−50ppが好ましく、更に好ま
しくは0.11−1Oppである。このようにカルシウ
ム分や鉄分の量を調節する方法は、ゼラ°チン水溶液を
イオン交換装置に通すことにより達成することができる
。The gelatin used in the present invention can be treated with either alkali treatment or acid treatment, but when using ossein gelatin, it is preferable to remove calcium or iron. The preferred calcium content is 1-99
The iron content is preferably 9 ppm, more preferably i500 ppm, and the iron content is preferably 0.001-50 ppm, more preferably 0.11-1 Opp. The amount of calcium and iron can be adjusted in this manner by passing an aqueous gelatin solution through an ion exchange device.
本発明に係るハロゲン化銀写真感光材料の現像に用いら
れる現像主薬としてはカテコール、ピロガロール及びそ
の誘導体ならびにアスコルビン酸、クロロハイドロキノ
ン、ブロモハイドロキノン、メチルハイドロキノン、2
.3−ジブロモハイドロキノン、2.5−ジエチルハイ
ドロキノン、カテコール、4−クロロカテコール、4−
フェニル−カテコール、3−メトキシ−カテコール、4
−アセチル−ピロガロール、アスコルビン酸ソーダ等が
ある。Developing agents used in developing the silver halide photographic material according to the present invention include catechol, pyrogallol and its derivatives, ascorbic acid, chlorohydroquinone, bromohydroquinone, methylhydroquinone, 2
.. 3-dibromohydroquinone, 2,5-diethylhydroquinone, catechol, 4-chlorocatechol, 4-
Phenyl-catechol, 3-methoxy-catechol, 4
-Acetyl-pyrogallol, sodium ascorbic acid, etc.
又、HO−(CH−CI)、 −NH2型現像剤として
は、オルト及びパラのアミノフェノールが代表的なもの
で、4−アミノフェノール、2−アミノ−6−フェニル
フェノール、2−アミノ−4−クロロ−6−フェニルフ
ェノール、N−メチル−p−アミノフェニール等がある
。Further, as the HO-(CH-CI), -NH2 type developer, ortho and para aminophenols are typical, and 4-aminophenol, 2-amino-6-phenylphenol, 2-amino-4 -chloro-6-phenylphenol, N-methyl-p-aminophenyl, and the like.
更に、82N−(CH= CH)、−NH!型現像剤と
しては例えば4−アミノ−2−メチル−N、N−ジエチ
ルアニリン、2.4−ジアミノ−N、N−ジエチルアニ
リン、N−(4−アミノ−3−メチルフェニル)−モル
ホリン、p−フェニレンジアミン等がある。Furthermore, 82N-(CH=CH), -NH! Examples of mold developers include 4-amino-2-methyl-N,N-diethylaniline, 2,4-diamino-N,N-diethylaniline, N-(4-amino-3-methylphenyl)-morpholine, p -Phenylenediamine, etc.
ヘテロ環型現像剤としては、■−フェニルー3−ピラゾ
リドン、l−フェニル−4,4−ジメチル−3−ピラゾ
リドン、l−フェニル−4−メチル−4−ヒドロキシメ
チル−3−ピラゾリドンのような3−ピラゾリドン類、
l−フェニルー4−アミノー5−ピラゾロン、5−アミ
ノラウシル等を挙げることができる。Examples of the heterocyclic developer include 3-phenyl-3-pyrazolidone, l-phenyl-4,4-dimethyl-3-pyrazolidone, and l-phenyl-4-methyl-4-hydroxymethyl-3-pyrazolidone. pyrazolidones,
Examples include l-phenyl-4-amino-5-pyrazolone and 5-aminolaucil.
T、H,ジェームス著ザ・セオリイ・オブ・ザ・ホトグ
ラフィック・プロセス第4版(The Theory
ofPhotographic Process Fo
urth Edition)第291〜334頁及びジ
ャーナル・オブ・ジ・アメリカン・ケミカル・ソサエテ
ィ(Journal of the American
Chemical 5ociety)第73巻、第3.
100頁(1951)に記載されているごとき現像剤が
本発明に有効に使用し得るものである。これらの現像剤
は単独で使用しても2種以上組み合わせてもよいが、2
種以上を組み合わせて用いる方が好ましい。又本発明に
かかる感光材料の現像に使用する現像液には保恒剤とし
て、例えば亜硫酸ソーダ、亜硫酸カリ、等の亜硫酸塩を
用いても、本発明の効果が損なわれることはない。The Theory of the Photographic Process, 4th Edition, by T. H. James.
ofPhotographic Process Fo
urth Edition) pages 291-334 and Journal of the American Chemical Society (Journal of the American Chemical Society).
Chemical 5ociety) Volume 73, No. 3.
Developers such as those described on page 100 (1951) can be effectively used in the present invention. These developers may be used alone or in combination of two or more, but
It is preferable to use a combination of two or more species. Further, even if a sulfite salt such as sodium sulfite or potassium sulfite is used as a preservative in the developer used for developing the photosensitive material according to the invention, the effects of the invention will not be impaired.
又保恒剤としてヒドロキシルアミン、ヒドラジド化合物
を用いることができ、この場合その使用量は現像液IQ
当たり5〜500gが好ましく、より好ましくは20〜
200gである。Hydroxylamine and hydrazide compounds can also be used as preservatives, and in this case, the amount used depends on the developer IQ.
It is preferably 5 to 500g, more preferably 20 to 500g.
It is 200g.
又現像液には有機溶媒としてグリコール類を含有させて
もよく、そのようなグリコール類としてはエチレングリ
コール、ジエチレングリコール、プロピレングリコール
、トリエチレングリコール、1.4−ブタンジオール、
l、5−ベンタンジオール等があるが、ジエチレングリ
コールが好ましく用いられる。そしてこれらグリコール
類の好ましい使用量は現像液IQ当たり5〜500gで
、より好ましくは20〜200gである。これらの有機
溶媒は単独でも併用しても用いることができる。Further, the developer may contain glycols as an organic solvent, and such glycols include ethylene glycol, diethylene glycol, propylene glycol, triethylene glycol, 1,4-butanediol,
Among them, diethylene glycol is preferably used. The amount of these glycols used is preferably 5 to 500 g, more preferably 20 to 200 g, per developer IQ. These organic solvents can be used alone or in combination.
本発明に係るハロゲン化銀写真感光材料は、上記のごと
き現像抑制剤を含んだ現像液を用いて現像処理すること
により極めて保存安定性に優れた感光材料を得ることが
できる。The silver halide photographic light-sensitive material according to the present invention can be developed with a developer containing the above-mentioned development inhibitor to obtain a light-sensitive material with extremely excellent storage stability.
上記の組成になる現像液のpH値は好ましくは9〜13
であるが、保恒性及び写真特性上からpH値は10−1
2の範囲が更に好ましい。現像液中の陽イオンについて
は、ナトリウムよりカリウムイオンの比率が高い程現像
液の活性度を高めることができるので好ましい。The pH value of the developer having the above composition is preferably 9 to 13.
However, the pH value is 10-1 from the viewpoint of storage stability and photographic properties.
A range of 2 is more preferred. Regarding cations in the developer, it is preferable that the ratio of potassium ions is higher than that of sodium because the activity of the developer can be increased.
本発明に係るハロゲン化銀写真感光材料は、種々の条件
で処理することができる。処理温度は、例えば現像温度
は50℃以下が好ましく、特に25℃〜40℃前後が好
ましく、又現像時間は2分以内に終了することが一般的
であるが、特に好ましくは10秒〜50秒が好効果をも
たらすことが多い。又現像以外の処理工程、例えば水洗
、停止、安定、定着、更に必要に応じて前硬膜、中和等
の工程を採用することは任意であり、これらは適宜省略
することもできる。更に又、これらの処理は皿現像、枠
現像などいわゆる手現像処理でも、ローラー現像、ハン
ガー現像など機械現像であってもよい。The silver halide photographic material according to the present invention can be processed under various conditions. As for the processing temperature, for example, the development temperature is preferably 50°C or lower, particularly preferably around 25°C to 40°C, and the developing time is generally completed within 2 minutes, particularly preferably 10 seconds to 50 seconds. often has positive effects. Furthermore, it is optional to employ processing steps other than development, such as washing with water, stopping, stabilizing, fixing, and if necessary, prehardening and neutralization, and these steps can be omitted as appropriate. Furthermore, these treatments may be so-called manual development such as plate development or frame development, or mechanical development such as roller development or hanger development.
以下実施例によって本発明を具体的に説明する。 EXAMPLES The present invention will be specifically explained below with reference to Examples.
尚、当然のことではあるが、本発明は以下述べる実施例
に限定されるものではない。It should be noted that, as a matter of course, the present invention is not limited to the embodiments described below.
実施例−1
下引き処理したポリエチレンテレフタレートにコロナ放
電した後下記構成の帯電防止液を、10m12/dm”
になる様に33m/minの速さでロールフィツトコー
ティングパン及びエアーナイフを使用して塗布した。Example-1 After performing corona discharge on subbing-treated polyethylene terephthalate, an antistatic liquid having the following composition was applied at 10 m12/dm.
The coating was carried out using a roll-fit coating pan and an air knife at a speed of 33 m/min so that the coating amount was as follows.
水溶性導電性ポリマー(A ) 6g1Q本
発明のラテックス (B ) 4g/Q硬膜
剤(C) Cl−2) 1.5g/1
290℃、2分間乾燥し140”0.90秒間熱処理し
た。Water-soluble conductive polymer (A) 6g/1Q Latex of the present invention (B) 4g/Q Hardener (C) Cl-2) 1.5g/1
It was dried at 290° C. for 2 minutes and heat treated at 140” for 0.90 seconds.
この帯電防止層の上にゼラチンを2.0g/m”になる
様に塗布しベース試験を行った。ゼラチンの硬膜剤とし
ては、ホルマリン、2.4−ジクロロ−6−ヒドロキシ
S−)リアジンナトリウムを用いた。A base test was conducted by coating gelatin at a concentration of 2.0 g/m'' on this antistatic layer.Formalin, 2.4-dichloro-6-hydroxy S-) Sodium gin was used.
結果を表−1に示す。The results are shown in Table-1.
(1)ヘーズ試験
東京電色株式会社製濁計Modil T−2600D
Aを用いフィルム支持体上を測定してヘーズを百分表−
1
実施例−2
pH3,0の酸性雰囲気下でコントロールダブルジェッ
ト法によりロジウムを銀1モル当たり10−’モル含有
する粒子を作成した。粒子の成長は、ベンジルアデニン
を1%のゼラチン水溶液IQ当たり30mg含有する系
で行った。銀とハライドの混合後6−メチルー4−ヒド
ロキン−1,3,3a、7テトラザインデンをハロゲン
化銀1モル当たり600mg加え、その後水洗、脱塩し
た。(1) Haze test Tokyo Denshoku Co., Ltd. Turbidimeter Modil T-2600D
Measure the haze on the film support using A.
1 Example-2 Particles containing 10-' mol of rhodium per mol of silver were prepared by a controlled double jet method in an acidic atmosphere with a pH of 3.0. Particle growth was carried out in a system containing 30 mg of benzyladenine per 1% aqueous gelatin solution IQ. After mixing silver and halide, 600 mg of 6-methyl-4-hydroquine-1,3,3a,7tetrazaindene per mole of silver halide was added, followed by washing with water and desalting.
次いで、ハロゲン化銀1モル当たり60mgの6−メチ
ル−4−ヒドロキシ−1,3,3a、7−テトラザイン
デンを加えた後、イオウ増感をした。イオウ増感後安定
剤として6−メチル−4−ヒドロキシ−1,3,3a、
7−テトラザインデンを加えた。Next, 60 mg of 6-methyl-4-hydroxy-1,3,3a,7-tetrazaindene per mole of silver halide was added, followed by sulfur sensitization. 6-methyl-4-hydroxy-1,3,3a as a stabilizer after sulfur sensitization;
7-Tetrazaindene was added.
(ハロゲン化銀乳剤層)
前記各乳剤に添加剤を下記の付量になるよう調整添加し
、ポリ(ビニリデンクロライド−イタコン酸)ラテック
ス下引処理した(100μm厚さ)ポリエチレンテレフ
タレート支持体上に塗布した。(Silver halide emulsion layer) Additives were added to each of the above emulsions in the amounts shown below, and coated on a polyethylene terephthalate support (100 μm thick) that had been subbed with poly(vinylidene chloride-itaconic acid) latex. did.
ラテックスポリマー:スチレン−ブチルアクリレート−
アクリル酸
3元共重合ポリマー 1−0g/m2テトラフ
ェニルホスホニウム
タロライド 30mg/m”サ
ポニン 200mg/m”ポ
リエチレングリコール 100mg/m!ドテ
シルベンゼンスルホン酸
ナトリウム loOmg/m”
ハイドロキノン 200mg/m”
フェニドン 100mg/m”
スチレンスルホン酸ナトリウム−
マレイン酸重合体(Mw=25万) 200mg
/m”没食子酸ブチルエステル 500mg
/m”30mg/m”
5−メチルベンゾトリアゾール 30n+g/a
+22−メルカプトベンツイミダゾール−5−スルホン
酸 30mg/m”イナートオ
セインゼラチン(等電点4.9)1.5g/mν
1−(p−アセチルアミドフェニル)−5メルカプトテ
トラゾール 30mg/m”銀量
2.8 g/m”(乳剤層保護膜)
乳剤層保護膜として、下記の付量になるよう調製塗布い
こ。Latex polymer: styrene-butyl acrylate
Acrylic acid tertiary copolymer polymer 1-0g/m2 Tetraphenylphosphonium taloride 30mg/m"Saponin 200mg/m"Polyethylene glycol 100mg/m! Sodium dotecylbenzenesulfonate loOmg/m”
Hydroquinone 200mg/m”
Phenidone 100mg/m”
Sodium styrene sulfonate-maleic acid polymer (Mw=250,000) 200mg
/m” gallic acid butyl ester 500mg
/m"30mg/m" 5-methylbenzotriazole 30n+g/a
+22-mercaptobenzimidazole-5-sulfonic acid 30 mg/m" Inatoossein gelatin (isoelectric point 4.9) 1.5 g/mv 1-(p-acetylamidophenyl)-5-mercaptotetrazole 30 mg/m" Silver amount
2.8 g/m" (emulsion layer protective film) Prepare and apply the following coating amount as an emulsion layer protective film.
弗素化ジオクチルスルホコハク酸
エステル 300mg/m”マ
ット剤:ポリメタクリル酸メチル
(平均粒径3.5μm) 100mg
/m”硝酸リチウム塩 30mg/
m”酸処理ゼラチン(等電点7.0) 1.2
g/m”コロイダルシリカ 50mg
/m”スチレンスルホン酸ナトリウム−
マレイン酸共重合体 100mg/m”
CH3CQ0
(バッキング層)
乳剤層とは反対側の支持体に、予め30W/m”min
のパワーでコロナ放電した後、ポリ(ビニリデンクロラ
イド−イタコン酸)ラテックスポリマーをヘキサメチレ
ンアジリジン硬膜剤の存在下で塗布し更に本発明の帯電
防止層を実施例−1と同様に塗設し、ついでこの層上に
下記組成のバッキング染料を含有するバッキング層を塗
布した。ゼラチン層はグリオキザール及びl−オキシ−
3,5−ジクロロ−S−トリアジンナトリウム塩で硬膜
した。Fluorinated dioctyl sulfosuccinate 300mg/m" Matting agent: Polymethyl methacrylate (average particle size 3.5μm) 100mg
/m” lithium nitrate salt 30mg/
m” acid-treated gelatin (isoelectric point 7.0) 1.2
g/m” colloidal silica 50mg
/m” Sodium styrene sulfonate-maleic acid copolymer 100mg/m”
CH3CQ0 (backing layer) 30W/m”min was applied to the support opposite to the emulsion layer in advance.
After corona discharge with the power of A backing layer containing a backing dye having the following composition was then applied onto this layer. The gelatin layer contains glyoxal and l-oxy-
Hardening was done with 3,5-dichloro-S-triazine sodium salt.
(バッキング層)
ハイドロキノン 100mg/m
”フェニドン 30+ng/
m”ラテックスポリマー:ブチルアクリレート−スチレ
ン−アクリル酸共重合体 0.5g/m”スチレン−
マレインM 共II 合体100mg/m”クエン酸
40mg/m”ベンゾトリ
アゾール loOmg/m”スチレンス
ルホン酸ソーター
マレイン酸共重合体 200mg/m’
硝酸リチウム塩 30mg/m2
バッキング染料(a )、 (b )、 (c )オセ
インゼラチン 2.0g/m”(a
)
(b)
(C)
So、Na
以上のようにして得られた試料を全面露光し下記に示す
現像液、定着液を使用して現像処理した後膜付ヘーズ試
験を行った。(Backing layer) Hydroquinone 100mg/m
“Phenidone 30+ng/
m" latex polymer: Butyl acrylate-styrene-acrylic acid copolymer 0.5g/m" styrene-
Malein M co-II combined 100mg/m” citric acid
40mg/m" benzotriazole loOmg/m" styrene sulfonic acid sorter maleic acid copolymer 200mg/m'
Lithium nitrate salt 30mg/m2
Backing dye (a), (b), (c) Ossein gelatin 2.0g/m” (a
) (b) (C) So, Na The entire surface of the sample obtained as described above was exposed and developed using the developer and fixer shown below, and then a film haze test was conducted.
〈現像液処方〉
ハイドロキノン 25g1−7エ
ニルー4.4ジメチル−3−
ピラゾリドン 0.4g臭化ナ
トリウム 3g5−メチルベンゾ
トリアゾール 0.3g5−ニトロインダゾール
0.05g5gジエチルアミノプロパン−
2−ジオール10g亜硫酸カリウム
90g5−スルホサリチル酸ナトリウム 75g
エチレンジアミン四酢酸ナトリウム 2g水でlQに
仕上げ・た。<Developer formulation> Hydroquinone 25g 1-7enyl-4.4dimethyl-3-pyrazolidone 0.4g Sodium bromide 3g 5-methylbenzotriazole 0.3g 5-nitroindazole 0.05g 5g diethylaminopropane
2-diol 10g potassium sulfite
90g Sodium 5-sulfosalicylate 75g
Sodium ethylenediaminetetraacetate - Finished to 1Q with 2g water.
pHは、苛性ソーダで11.5とした。The pH was adjusted to 11.5 with caustic soda.
〈定着液処方〉
(組成A)
チオ硫酸アンモニウム(72,5w%水溶液)40mQ
亜硫酸ナトリウム 17g酢酸ナト
リウム・3水塩 6.5g硼酸
6gクエン酸ナトリウム・2
水塩 2g酢酸(90w%水溶液)
13.6mQ(組成り)
純水(イオン交換水) 17mQ硫酸
(50w%の水溶液) 3.0g硫酸アル
ミニウム(Aff、O,換算含量が8.1w%の水溶液
)20g
定着液の使用時に水500IIIQ中に上記組成人1組
成りの順に溶かし、lQに仕上げて用いた。<Fixer formulation> (Composition A) Ammonium thiosulfate (72.5w% aqueous solution) 40mQ Sodium sulfite 17g Sodium acetate trihydrate 6.5g Boric acid
6g sodium citrate 2
Water salt 2g acetic acid (90w% aqueous solution)
13.6mQ (composition) Pure water (ion-exchanged water) 17mQ sulfuric acid (50w% aqueous solution) 3.0g aluminum sulfate (Aff, O, aqueous solution with a converted content of 8.1w%) 20g Water 500IIIQ when using the fixer The above-mentioned compositions were dissolved in the order of composition 1 and finished to 1Q for use.
この定着液のpHは約5.6であった。The pH of this fixer was about 5.6.
く現像処理条件〉
(工程) (温度) (時間)現像
40℃ 8秒
定着 35℃ 8秒
水洗 常温 lθ秒
評価は以下のよう1こし゛て行い、結果を^−2に示し
た。Development processing conditions> (Process) (Temperature) (Time) Development
Fixing at 40°C for 8 seconds, washing with water at 35°C for 8 seconds, room temperature lθ seconds evaluation was carried out as follows, and the results are shown in ^-2.
くヘーズ試験〉
東京電色株式会社製濁度計MODEL T −260O
DAを用いフィルム支持体を測定してヘーズを百分率で
示した。Haze test> Turbidity meter MODEL T-260O manufactured by Tokyo Denshoku Co., Ltd.
The film support was measured using DA and the haze was expressed as a percentage.
表−2
表−2の結果から本発明による試料は表面比抵抗が低く
ヘーズにも優れている事がわかる。Table 2 From the results in Table 2, it can be seen that the samples according to the present invention have a low surface resistivity and are excellent in haze.
また、乳剤層中のヒドラジン化合物を下記テトラゾリウ
ム塩に代えても同様な効果があった。Furthermore, similar effects were obtained by replacing the hydrazine compound in the emulsion layer with the following tetrazolium salt.
テトラゾリウム化合物
ポリマー及び化合物の添加量単位はg / m 2で表
す。The addition amount unit of the tetrazolium compound polymer and the compound is expressed in g/m2.
表面比抵抗はΩ/0mである。The surface resistivity is Ω/0m.
本発明により、透明性に優れヘーズのないプラスチック
フィルム用帯電防止層及び現像等の処理後も帯電防止性
能の劣化しないハロゲン化銀写真感光材料を提供するこ
とができた。According to the present invention, it was possible to provide an antistatic layer for a plastic film with excellent transparency and no haze, and a silver halide photographic material whose antistatic performance does not deteriorate even after processing such as development.
Claims (1)
子、(3)硬膜剤の反応生成物からなる帯電防止層を有
してなるプラスチックフィルム支持体において、該疎水
性ポリマー粒子が、スルホン酸硫酸エステル基またはそ
の塩のうちの少なくとも1つの基を有し、かつ硬膜剤と
して下記一般式〔 I 〕で表される化合物を含有するこ
とを特徴とする帯電防止層。 一般式〔 I 〕 ▲数式、化学式、表等があります▼ 〔R_1、R_2は炭素数4までのアルキル基を表し、
互いに異なつていてもよい。X_1、X_2、X_3、
X_4は、水素、炭素数3までのアルキル基、ハロゲン
原子を表し、互いに異なっていてもよい。Lは単なる結
合で、炭素数4までのアルキル基、アルキレンオキシ基
を表す。〕In a plastic film support comprising an antistatic layer comprising a reaction product of (1) a water-soluble conductive polymer, (2) hydrophobic polymer particles, and (3) a hardening agent, the hydrophobic polymer particles An antistatic layer having at least one group selected from a sulfonic acid sulfate group or a salt thereof, and containing a compound represented by the following general formula [I] as a hardening agent. General formula [I] ▲Mathematical formulas, chemical formulas, tables, etc. are available▼ [R_1 and R_2 represent alkyl groups with up to 4 carbon atoms,
They may be different from each other. X_1, X_2, X_3,
X_4 represents hydrogen, an alkyl group having up to 3 carbon atoms, or a halogen atom, and may be different from each other. L is a simple bond and represents an alkyl group or alkyleneoxy group having up to 4 carbon atoms. ]
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1119591A JPH02298941A (en) | 1989-05-12 | 1989-05-12 | Antistatic layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1119591A JPH02298941A (en) | 1989-05-12 | 1989-05-12 | Antistatic layer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02298941A true JPH02298941A (en) | 1990-12-11 |
Family
ID=14765168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1119591A Pending JPH02298941A (en) | 1989-05-12 | 1989-05-12 | Antistatic layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02298941A (en) |
-
1989
- 1989-05-12 JP JP1119591A patent/JPH02298941A/en active Pending
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