JPH02299143A - Image forming device - Google Patents

Image forming device

Info

Publication number
JPH02299143A
JPH02299143A JP11861889A JP11861889A JPH02299143A JP H02299143 A JPH02299143 A JP H02299143A JP 11861889 A JP11861889 A JP 11861889A JP 11861889 A JP11861889 A JP 11861889A JP H02299143 A JPH02299143 A JP H02299143A
Authority
JP
Japan
Prior art keywords
metal back
film thickness
image forming
center
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11861889A
Other languages
Japanese (ja)
Inventor
Toshihiko Takeda
俊彦 武田
Ichiro Nomura
一郎 野村
Tetsuya Kaneko
哲也 金子
Yoshikazu Sakano
坂野 嘉和
Haruto Ono
治人 小野
Hidetoshi Suzuki
英俊 鱸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP11861889A priority Critical patent/JPH02299143A/en
Publication of JPH02299143A publication Critical patent/JPH02299143A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2201/00Electrodes common to discharge tubes
    • H01J2201/30Cold cathodes
    • H01J2201/316Cold cathodes having an electric field parallel to the surface thereof, e.g. thin film cathodes
    • H01J2201/3165Surface conduction emission type cathodes

Landscapes

  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)

Abstract

PURPOSE:To uniform luminescence brightness by continuously changing the film thickness of the metal back of a fluorescent face in response to the degree of the discharged current decrease due to the temperature rise of an element. CONSTITUTION:The film thickness of the metal back 6 of a fluorescent face is continuously changed so that it is made thinnest at the center section and thicker toward the periphery section. When phosphors 7 are illuminated by the fixed accelerating voltage, the permeability of electrons is reduced at the thick portion of the metal back film thickness and the luminescence brightness is made low, and the permeability is increased at the thin portion and the luminescence brightness is made high. When surface conductive type electron emitting elements connected in parallel are driven, the center section has a temperature higher than that of the periphery section due to the difference of heat radiation, the electron emission characteristic is deteriorated, and the discharged current is decreased. When the metal back thickness of the fluorescent face is changed, uniform luminescence can be obtained without using special driving or constitution.

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、複数の表面伝導形電子放出素子と蛍光面から
成る画像形成装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an image forming apparatus comprising a plurality of surface conduction electron-emitting devices and a phosphor screen.

[従来の技術1 従来、簡単な構造で電子の放出が得られる素子として、
例えば、エム アイ エリンソン(M、 I。
[Prior art 1] Conventionally, as an element that can emit electrons with a simple structure,
For example, M.I. Ellingson (M, I.

Elinson)等によって発表された冷陰極素子が知
られている。[ラジオ エンジニアリング エレクトロ
ン フイジイツス(Radio Eng、 Elect
ron。
A cold cathode device announced by John Elinson et al. is known. [Radio Engineering Electron Physics (Radio Eng, Elect
Ron.

Phys、 )第1O巻、1290〜1296頁、19
65年]この種の電子放出素子としては、前記エリンソ
ン等により開発された8口0□(sb)薄膜を用いたも
の、Au薄膜によるもの[ジー・ディトマー“スイン 
ソリド フィルムス″’ (G、 Dittmer:T
h1nSolid Fi1ms″′)、9巻、317頁
、  (1972年)l、ITO薄膜によるもの[エム
 ハートウェル アンド シー ジー フォンスタッド
“アイ イーイー イー トランス”イー ディー コ
ンフ(M、  Hartwell and C,G、 
 Fonstad:  “IEEεTrans、 ED
 Conf、  ” ) 519頁、  (1975年
)]、カーボン薄膜によるもの[荒木久他: “真空”
Phys, ) Volume 1O, pp. 1290-1296, 19
1965] This type of electron-emitting device includes one using an 8-hole 0□ (sb) thin film developed by Ellingson et al., and one using an Au thin film [G.
Solid Films'' (G, Dittmer: T
h1nSolid Fi1ms''), vol. 9, p. 317, (1972) ITO thin film [M. Hartwell and C.G.
Fonstad: “IEEεTrans, ED
Conf, ”) p. 519, (1975)], carbon thin film [Hisashi Araki et al.: “Vacuum”
.

第26巻、第1号、22頁、  (1983年)]など
が報告されている。
Vol. 26, No. 1, p. 22 (1983)].

これらは、成膜技術やフォトリソグラフィー技術の進歩
とあいまって、基板上に多数の素子を形成することが可
能となりつつあり、マルチ電子源を用いた各種画像形成
装置への応用が期待されている。
Coupled with advances in film-forming technology and photolithography technology, it is becoming possible to form a large number of elements on a substrate, and this is expected to be applied to various image-forming devices using multiple electron sources. .

[発明が解決しようとする課題] しかしながら、従来表面伝導形電子放出素子は、熱電子
源のような温度上昇を必要としないが微小電極間隔部に
通電を行うため、極めて小さいながらも放出部を流れる
電流の一部は発熱として消費される。従って、本素子を
同一基板上に複数配列した画像形成装置を考えた場合に
は、上記発熱が無視できないほど大きくなる。
[Problems to be Solved by the Invention] However, conventional surface conduction electron-emitting devices do not require temperature rise unlike thermionic sources, but because electricity is applied to the minute electrode spacing, the emission region is extremely small. A portion of the flowing current is consumed as heat generation. Therefore, when considering an image forming apparatus in which a plurality of these elements are arranged on the same substrate, the heat generation described above becomes so large that it cannot be ignored.

また、本発明者らが検討を行った結果、表面伝導形放出
素子は温度上昇に敏感であり、その電子放出特性は、素
子温度が100℃程度になると劣化が始まることが分か
つており、極めて多くの放出素子を配列する必要がある
大型画像形成装置に応用した場合には素子自体から発生
する熱及びその蓄熱効果によって放出電流が減少すると
いう欠点がある。
Furthermore, as a result of studies conducted by the present inventors, it has been found that surface conduction type emitters are sensitive to temperature increases, and that their electron emission characteristics begin to deteriorate when the element temperature reaches about 100°C. When applied to a large-sized image forming apparatus in which a large number of emitting elements need to be arranged, there is a drawback that the emitting current is reduced due to the heat generated from the elements themselves and the heat storage effect thereof.

さらに、同一基板上に本素子が縦横に配列するため、基
板の温度上昇は1つの基板内で一様ではなく、中心付近
の温度が最も高(なり、周辺部分は放熱の良さから、中
心に比べ低温のままとなる。このため、素子の劣化も中
心付近が最大となり、画像形成装置とした場合の輝度ム
ラとして現れるという欠点があった。
Furthermore, since the devices are arranged vertically and horizontally on the same board, the temperature rise of the board is not uniform within one board, but the temperature near the center is the highest (the temperature is highest near the center), and the peripheral part has good heat dissipation. Therefore, the deterioration of the element is greatest near the center, which has the disadvantage of appearing as uneven brightness when used as an image forming apparatus.

[課題を解決するための手段及び作用]本発明によれば
、素子駆動による発熱によって中心部と周辺部に放出電
流の差が生じたところを定常状態として、放出電流の減
少した中心部分に対応する蛍光面のメタルバック厚を周
辺部分より薄くしてお(ことで、輝度ムラを最小限にお
さえることができる。
[Means and effects for solving the problem] According to the present invention, the area where a difference in emission current occurs between the center and the periphery due to the heat generated by driving the element is regarded as a steady state. By making the metal back of the phosphor screen thinner than the surrounding area, uneven brightness can be minimized.

さらに本発明を図面を用いて詳細に説明する。Further, the present invention will be explained in detail using the drawings.

第2図は、本発明で用いられる、ライン状に並列接続さ
れた表面伝導形電子放出素子をラインごとに駆動し、一
定時間経過後の素子基板上の温度分布を表わす概略図で
ある。並列接続された各素子の初期特性はほぼ均一であ
るため、l素子当りの発熱量は均等であるが、放熱の違
いによって中心部が周辺部に比べ高い温度になっている
。これは、l素子当りの消費電力が一定であれば、いか
なる駆動方法を用いても同じである。
FIG. 2 is a schematic diagram showing the temperature distribution on the device substrate after a certain period of time when surface conduction electron-emitting devices connected in parallel in a line are driven line by line, which is used in the present invention. Since the initial characteristics of each element connected in parallel are almost uniform, the amount of heat generated per element is equal, but the temperature in the center is higher than that in the periphery due to differences in heat radiation. This is the same no matter what driving method is used as long as the power consumption per element is constant.

画像形成装置として、ガラス等の絶縁性基板上に必要十
分な数の素子を配置し、必要十分な放出電流の得られる
程度の印加電圧で駆動した場合、中心部分の温度は10
0℃を超えることが分かつており、これは電子放出特性
を劣化させ始める温度である。
As an image forming apparatus, when a necessary and sufficient number of elements are arranged on an insulating substrate such as glass and driven with an applied voltage that can obtain a necessary and sufficient emission current, the temperature of the center part is 10
It has been found that the temperature exceeds 0° C., which is the temperature at which the electron emission properties begin to deteriorate.

従って、表面伝導形放出素子を縦横に配列した画像形成
装置では、中心付近の放出電流低下は避。
Therefore, in an image forming apparatus in which surface conduction type emission elements are arranged vertically and horizontally, a drop in emission current near the center can be avoided.

けられない。そこで本発明では、放出電流の差を蛍光面
のメタルバック膜厚Φ差によって吸収し、最終的な発光
輝度の均一化をはかることを特徴としている。
I can't kick it. Therefore, the present invention is characterized in that the difference in emission current is absorbed by the difference in metal back film thickness Φ of the phosphor screen, and the final luminance is made uniform.

第1図は、本発明の特徴をよ(表わす蛍光面のメタルバ
ック6膜厚の分布を示す概略図である。
FIG. 1 is a schematic diagram showing the distribution of the thickness of the metal back 6 on the phosphor screen, which shows the features of the present invention.

膜厚は中心部で最も薄く、周辺部に広がるに従って厚く
なるよう、連続的に変化させである。このため、一定の
加速電圧で蛍光体7を発光させる場合には、メタルバッ
ク膜厚の厚い部分では、電子の透過率が低下して発光輝
度は低(なり、薄い部分では透過率が高いため、発光輝
度も高くなる。
The film thickness changes continuously, being the thinnest at the center and becoming thicker as it spreads toward the periphery. Therefore, when the phosphor 7 is made to emit light with a constant accelerating voltage, the transmittance of electrons decreases in the thick part of the metal back film and the emission brightness is low (in contrast, the transmittance is high in the thin part) , the luminance of light emission also increases.

実際の膜厚は、用いる材料、放出電流の減少の度合、加
速電圧等を総合して決定される。第3図に、加速電圧8
KVのときのアルミニウムメタルバック膜厚と電子の透
過率の関係を示す。同図からも明らかなように、基板温
度上昇によって放出電流が50%減少する場合には、例
えば加速電圧を8KV一定、材料としてアルミニウムを
用いて、中心部を200人、周辺部を3000人とすれ
ばよい。
The actual film thickness is determined based on the material used, the degree of reduction in emission current, the accelerating voltage, etc. In Figure 3, the acceleration voltage 8
The relationship between the aluminum metal back film thickness and electron transmittance at KV is shown. As is clear from the figure, if the emission current decreases by 50% due to an increase in the substrate temperature, for example, if the acceleration voltage is kept constant at 8KV and aluminum is used as the material, 200 people in the center and 3000 people in the peripheral area. do it.

また、メタルバックの形成方法は、通常行われるいかな
る方法を用いても良いが、同一面内で膜厚分布を必要と
し、かつ100人単大の制御性を要求されるため真空蒸
着等の方法が望ましい。
The metal back may be formed by any commonly used method, but since it requires film thickness distribution within the same plane and controllability for 100 people, methods such as vacuum evaporation may be used. is desirable.

[実施例] 以下に、本発明の実施例を示す。[Example] Examples of the present invention are shown below.

見立■ユ 次に述べるようにして、第4図に模式的に示されるよう
な画像形成装置を作製した。
An image forming apparatus as schematically shown in FIG. 4 was manufactured as described below.

先ず十分脱脂、洗浄を行った2インチ角の石英基板1上
に、通常のフォトリソグラフィ技術を用いて表面伝導形
電子放出素子の電極2,3を形成した。電極材料はニッ
ケルであり、その膜厚はほぼ2000人である。また、
正電極2と負電極3の微小間隔部4の間隔は2Pl!!
であり、その幅は300 p、11である。さらに5 
lラインには1rBII+ピツチで40素子が並列接続
されており、これが15ライン、従って基板l上に40
X 15= 600ケ所の電子放出素子部が形成された
First, electrodes 2 and 3 of a surface conduction electron-emitting device were formed on a 2-inch square quartz substrate 1 which had been thoroughly degreased and cleaned using a conventional photolithography technique. The electrode material is nickel, and its film thickness is approximately 2000 mm. Also,
The interval between the minute interval portion 4 between the positive electrode 2 and the negative electrode 3 is 2Pl! !
and its width is 300 p, 11. 5 more
On the l line, 40 elements are connected in parallel at 1rBII+ pitch, and this is 15 lines, so there are 40 elements on the board l.
X 15 = 600 electron-emitting device portions were formed.

次にこの基板l上に、有機パラジウム化合物を含む有機
溶媒(奥野製薬工業製キャタペースト−ccp)をスピ
ンコータを用いて回転塗布した後、空気中で250℃、
10分間の焼成を行いパラジウムを微粒子化し、微小電
極間隔部4をパラジウムの島構造を有する不連続状態膜
として素子基板を完成した。
Next, an organic solvent containing an organic palladium compound (Catapaste-ccp manufactured by Okuno Pharmaceutical Co., Ltd.) was spin-coated onto this substrate l using a spin coater, and then coated at 250°C in air.
Firing was performed for 10 minutes to turn palladium into fine particles, and an element substrate was completed with the microelectrode spacing section 4 as a discontinuous film having an island structure of palladium.

こうして得られた素子基板の駆動時の温度上昇を測定す
るため、基板1の裏面の中央部と周辺部に同心円状に熱
電対を設け、基板全体をI X 10−’Torr程度
に保たれた真空容器中に入れて電子放出実験を行った。
In order to measure the temperature rise during driving of the thus obtained element substrate, thermocouples were placed concentrically in the center and periphery of the back surface of the substrate 1, and the entire substrate was maintained at approximately I x 10-'Torr. Electron emission experiments were conducted in a vacuum container.

駆動方法は、ライン順次駆動とし、素子両端にかかる電
圧V、を10〜14Vの間で変化させ駆動周波数を30
KHzとした。その結果、L=14Vのときに最も温度
上昇が激しく、定常状態に達した時に、中央付近で最も
温度が高くほぼ150℃、最外周部分で最も温度が低く
ほぼ100℃であった。この状態で素子基板上部に設け
た蛍光板5にIKVの電圧を印加して放出される電子線
による発光を観察したところ、中央付近の高温になって
いる部分に対応した位置の輝度は、目視で明らかに低下
しているのが確認され、放出電流が減少していることが
示された。
The driving method is line sequential driving, and the voltage V applied to both ends of the element is varied between 10 and 14 V, and the driving frequency is set to 30 V.
KHz. As a result, when L=14V, the temperature rise was the most severe, and when a steady state was reached, the temperature was highest near the center, approximately 150°C, and the lowest temperature was approximately 100°C, near the outermost periphery. In this state, when an IKV voltage was applied to the fluorescent screen 5 provided on the top of the element substrate and the emission of electron beams was observed, the brightness at the position corresponding to the high temperature area near the center was visually observed. A clear decrease was confirmed, indicating that the emission current was decreasing.

また、1ライン毎にパルス駆動した時の放出電流を測定
したところ、基板中央の1ラインから放出される電流I
□はV、= 14Vのときに!、=2μ八基板両への1
ラインからの放出電流■、、はv、=14Vのとき1.
、=6μAであった。従って、1素子当りの平均では、
中央部が50 n A s両端では150nAとなる。
In addition, when we measured the emission current when pulse-driven for each line, we found that the current I
□ is V, when = 14V! , = 1 to 2μ8 substrates
The emission current from the line is 1 when v = 14V.
, = 6 μA. Therefore, on average per element,
It is 50 nA at the center and 150 nA at both ends.

この結果、素子の温度が150 ”C近くに達したとき
、中央部の素子は、放出電流が両端に比べほぼ1/3と
なっている。
As a result, when the temperature of the element reaches nearly 150''C, the emission current of the element at the center is approximately 1/3 of that at both ends.

これらの結果より、蛍光体の発光輝度を均一にするため
に、中央部のメタルバック厚を500人、周辺部を20
00人とした蛍光体基板5を用いて、再度ライン駆動に
よる全面発光の実験を行ったところ、目視ではほぼ全面
に均一な発光となった。
From these results, in order to make the luminance of the phosphor uniform, the thickness of the metal back in the central part should be 500 mm, and the thickness of the metal back in the peripheral area should be 20 mm.
Using the phosphor substrate 5 of 0.00 people, an experiment was conducted again to emit light over the entire surface by line driving, and visually it was found that the light emitted was uniform over almost the entire surface.

及ELMユ さらに、大型の画像形成装置に応用するため、素子基板
に10インチ角のガラス基板を用いて実施例1と同様の
素子を作製した。素子ピッチをIIII!I、lライン
当りZOO素子並列とじ6oラインを配列した。
Furthermore, for application to a large-sized image forming apparatus, an element similar to that of Example 1 was fabricated using a 10-inch square glass substrate as the element substrate. III element pitch! ZOO elements were arranged in parallel and 6o lines were arranged per line.

駆動方法は、実施例1と同様であるが、素子数増°加に
伴う温度上昇を避けるため、各ラインの駆動電圧を最大
12Vに抑えた。この時の中心部の最高温度は120℃
程度となり、放出特性の劣化は小さい、一方、駆動電圧
低下による放出電流の減少によって生じる発光輝度低下
を補うために、加速電圧V、をより高(する必要があり
、本実施例ではV、=10KVとした。また、素子基板
中心部の放出電流の減少率(L+/Ieix too)
はほぼ50%であった。
The driving method was the same as in Example 1, but the driving voltage of each line was suppressed to a maximum of 12 V in order to avoid a temperature rise due to an increase in the number of elements. The maximum temperature in the center at this time is 120℃
On the other hand, in order to compensate for the decrease in luminance caused by the decrease in emission current due to the decrease in drive voltage, the acceleration voltage V, must be set higher (in this example, V, = 10 KV.In addition, the reduction rate of the emission current at the center of the element substrate (L+/Ieix too)
was almost 50%.

加速電圧V、=10にVのときの、電子線透過率が最小
50%になるメタルバック厚はほぼ2500人、最大で
100%かつメタルバックとして有効な膜厚はほぼ30
0人ということから、本素子に最適な蛍光面のメタルバ
ック厚は、中心部300人、周辺部2500人である。
When the acceleration voltage V=10 is V, the metal back thickness at which the electron beam transmittance is at least 50% is approximately 2500, and the maximum is 100% and the film thickness effective as a metal back is approximately 30.
0, the optimum metal back thickness of the phosphor screen for this device is 300 at the center and 2500 at the periphery.

そこで、一様に蛍光体を塗布し、さらにニトロセルロー
スでフィルミングした蛍光面上に、2ケ所に蒸着源を持
つ真空蒸着機を使ってアルミニウムを蒸着した。特に中
心部を薄膜とするため、蒸発源との中間に円形の金属メ
ツシュを固定して蒸着した。
Therefore, on a phosphor screen that had been uniformly coated with phosphor and then filmed with nitrocellulose, aluminum was vapor-deposited using a vacuum evaporator with two evaporation sources. In order to form a particularly thin film in the center, a circular metal mesh was fixed and evaporated between the evaporation source and the evaporation source.

こうして得られた蛍光板を用いて実験を行ったところ、
■、= 12Vでも十分な発光輝度が得られ、目視では
均一な発光であった。
When we conducted an experiment using the fluorescent screen obtained in this way, we found that
(2) Sufficient light emission brightness was obtained even at =12V, and the light emission was uniform when visually observed.

[発明の効果] 以上説明したように、表面伝導形電子放出素子を用いた
画像形成装置で、蛍光面のメタルバック厚を素子の温度
上昇による放出電流減少の度合に合わせて連続的な膜厚
の変化を与えることで、特殊な駆動、構成を用いること
なく均一な発光が得られるという効果がある。
[Effects of the Invention] As explained above, in an image forming apparatus using a surface conduction electron-emitting device, the thickness of the metal back of the phosphor screen can be adjusted continuously to match the degree of decrease in emission current due to temperature rise of the device. By providing a change in , there is an effect that uniform light emission can be obtained without using any special drive or configuration.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に用いられる蛍光体基板及びメタルバッ
クの膜厚分布、第2図は本発明に用いられる電子放出素
子部の概略及び同一面内の温度分布′、第3図はメタル
バック厚と電子線の透過率の関係を示す図、第4図は実
施例1で作製した画像形成装置の概略図である。
Fig. 1 shows the film thickness distribution of the phosphor substrate and metal back used in the present invention, Fig. 2 shows the outline of the electron-emitting device part and the temperature distribution in the same plane used in the present invention, and Fig. 3 shows the metal back. FIG. 4, which is a diagram showing the relationship between thickness and electron beam transmittance, is a schematic diagram of the image forming apparatus manufactured in Example 1.

Claims (4)

【特許請求の範囲】[Claims] (1)少なくとも複数の表面伝導形電子放出素子と蛍光
面とメタルバックから成る画像形成装置において、蛍光
面に付着されたメタルバックに膜厚分布を持つことを特
徴とする画像形成装置。
(1) An image forming apparatus comprising at least a plurality of surface conduction electron-emitting devices, a phosphor screen, and a metal back, characterized in that the metal back attached to the phosphor screen has a film thickness distribution.
(2)前記膜厚が中央部で薄く、周辺部では厚くなるこ
とを特徴とする請求項1記載の画像形成装置。
(2) The image forming apparatus according to claim 1, wherein the film thickness is thinner at the center and thicker at the periphery.
(3)前記膜厚を、放出素子から放出される電流量に応
じて変化させたことを特徴とする請求項2記載の画像形
成装置。
(3) The image forming apparatus according to claim 2, wherein the film thickness is changed depending on the amount of current emitted from the emitting element.
(4)前記放出電流の変化が、素子の温度上昇によるこ
とを特徴とする請求項3記載の画像形成装置。
(4) The image forming apparatus according to claim 3, wherein the change in the emission current is due to an increase in temperature of the element.
JP11861889A 1989-05-15 1989-05-15 Image forming device Pending JPH02299143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11861889A JPH02299143A (en) 1989-05-15 1989-05-15 Image forming device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11861889A JPH02299143A (en) 1989-05-15 1989-05-15 Image forming device

Publications (1)

Publication Number Publication Date
JPH02299143A true JPH02299143A (en) 1990-12-11

Family

ID=14741005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11861889A Pending JPH02299143A (en) 1989-05-15 1989-05-15 Image forming device

Country Status (1)

Country Link
JP (1) JPH02299143A (en)

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