JPH0230333B2 - - Google Patents
Info
- Publication number
- JPH0230333B2 JPH0230333B2 JP60164427A JP16442785A JPH0230333B2 JP H0230333 B2 JPH0230333 B2 JP H0230333B2 JP 60164427 A JP60164427 A JP 60164427A JP 16442785 A JP16442785 A JP 16442785A JP H0230333 B2 JPH0230333 B2 JP H0230333B2
- Authority
- JP
- Japan
- Prior art keywords
- prepreg
- addition
- resin
- imide resin
- imide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Reinforced Plastic Materials (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
〔技術分野〕
この発明は、付加型イミド樹脂プリプレグの製
法に関するものである。
〔背景技術〕
従来、多層プリント配線板など積層板製造用の
樹脂としては、優れた接着性、耐薬品性、電気特
性、機械特性などを有するエポキシ樹脂材料が多
く使用されてきたが、高密度実装用の高多層プリ
ント配線板に使用した場合は実装面での耐熱性の
問題やレジンスミアや厚み方向の熱膨張などによ
る導通信頼性の低下の問題が生じる。そこで、こ
れらの問題を解決するために積層板製造用の樹脂
としてポリイミドなどの耐熱樹脂が開発されて実
用化に至つている。特に、不飽和ビスイミドとジ
アミンとを反応させた付加型ポリイミドは、高密
度化するための細線化や微細孔あけなどの高精度
加工が可能である、厚み方向の熱膨張率が小さく
てスルーホールメツキによる導通信頼性が高い、
ドリル加工工程でのスミア発生がない、高温時の
導体密着力および硬度が高く実装性が向上する、
高温(200℃)での連続使用に耐える、などの特
長を有しているため、多層プリント配線板の材料
として多く使用されるに至つているものである。
しかし、近年大型コンピユーター用などの多層
プリント配線板などの多層プリント配線板にあつ
てはより高密度実装化や高多層化される傾向があ
り、このために回路の微細化やスルーホール穴径
の縮小の要求が高まつており、この要求を実現す
るために、従来よりさらに高いレベルの密着性が
基板に要求されるようになつている。密着性につ
いては、回路の微細化により回路と樹脂との密着
性が高くなければならないのは当然であるが、樹
脂を含浸する基材と樹脂との密着性も高くなけれ
ばならない。なぜならば、基材と樹脂との密着性
が低いと、多層プリント配線板に穴明け加工をお
こなうときに基材と樹脂との間に微細な剥離が生
じることになるという不都合が発生するからであ
る。
ところが、上記付加型ポリイミドのワニスを基
材に含浸させると共に乾燥させてプリプレグを調
製し、このプリプレグを用いてプリント配線板の
基板を作成すると、大型コンピユーター用等の多
層プリント配線板レベルでの樹脂と基材との密着
性を十分に得ることができず、ドリル加工による
穴あけ工程で微細な基材と樹脂間の界面剥離が生
じ易い場合が多いものであつた。
〔発明の目的〕
この発明は、上記の点に鑑みてなされたもので
あり、高密度実装可能な密着性に優れる積層板用
付加型イミド樹脂プリプレグの製法を提供するこ
とを目的とするものである。
〔発明の開示〕
前記のような目的を達成するため、発明者ら
は、一般に知られている付加型イミド樹脂プリプ
レグを用いた場合、基材と樹脂との密着性が不十
分になる原因を研究した。その結果、一般の付加
型イミド樹脂プレポリマーは、プレポリマー末端
がアミノ基になつているものよりも、不飽和イミ
ド基になつているものが多く存在することがわか
つた。一般にガラス基材等の表面処理剤として
は、エポキシシラン系、クロルシラン系、カチオ
ニツクシラン系等の処理剤が用いられているが、
これらの表面処理剤は、マレイミド基よりも、む
しろ、アミノ基と反応しやすいため、不飽和イミ
ド基末端を多く持つ一般の付加型イミド樹脂プレ
ポリマーは、基材との密着性が不十分になつてい
ることがわかつた。また、アミノ基末端を多く含
むプレポリマーは、表面処理剤との反応性に富ん
でいるばかりでなく、後の2次含浸で塗られた通
常のワニスとの反応性にも富んでおり、表面処理
剤と通常の樹脂との間で両方に強固に結合するた
めに優れた密着性を得ることができることを見い
だした。発明者らは、さらに研究を重ねた結果、
樹脂と基材の密着性が十分な付加型イミド樹脂と
その製造方法を見い出し、ここに、以下の発明を
完成した。
すなわち、この発明は、不飽和ビスイミドとジ
アミンより合成した付加型イミド樹脂プレポリマ
ーを基材に含浸して付加型イミド樹脂プリプレグ
を製造するに際し、ビスイミド/ジアミンが2.0
モル/1.1モル〜2.0モル/3.0モルの比率で合成し
た、固型分濃度1〜30%のプレポリマー溶液を基
材に1次含浸させ乾燥させて1次プリプレグを
得、これにさらに別途調製した付加型イミド樹脂
プレポリマー溶液を含浸、乾燥させることを特徴
とする付加型イミド樹脂プリプレグの製法を要旨
としている。
以下に、この発明を詳しく説明する。
ここで、不飽和ビス―イミドは(1)式で、ジアミ
ンは(2)式であらわされる。
(式中Dは炭素―炭素の二重結合を含む2価の
基をあらわし、Aは少なくとも2個の炭素原子を
含む2価の基をあらわす)
H2N―B―NH2 (2)
(式中Bは30個以下の炭素原子を有する2価の
基をあらわす)
上記式(1)(2)におけるAおよびBは同一かまたは
異なるものいずれでもよく、また13個よりも少な
い炭素原子を持つている直鎖のもしくは分枝した
アルキレン基か、環の中に5個もしくは6個の炭
素原子を持つている環状アルキレン基か、O,N
およびS原子の少なくも1個を含む異種環状基
か、またはフエニレンもしくは多環状芳香族基に
することもできる。これらの種々の基は反応条件
のもとで不必要な副反応を与えない置換基を持つ
ていてもよい。また上記A,Bは、たくさんのフ
エニレン基か、直接にまたは2価の原子または次
のような群で結合された脂環状の基とすることも
できる。すなわち、例えば、それらは酸素または
硫黄か、炭素原子1個から3個のアルキレンの群
か、または次の群のちうの1つである。
―NR4―、―P(O)R3―、―N=N―、
[Technical Field] The present invention relates to a method for producing addition-type imide resin prepreg. [Background technology] Conventionally, epoxy resin materials with excellent adhesive properties, chemical resistance, electrical properties, mechanical properties, etc. have been often used as resins for manufacturing laminates such as multilayer printed wiring boards. When used in a high-multilayer printed wiring board for mounting, there are problems with heat resistance on the mounting surface and a reduction in continuity reliability due to resin smear and thermal expansion in the thickness direction. In order to solve these problems, heat-resistant resins such as polyimide have been developed and put into practical use as resins for manufacturing laminates. In particular, addition-type polyimide, which is made by reacting unsaturated bisimide with diamine, has a low coefficient of thermal expansion in the thickness direction and can be processed with high precision, such as thinning wires for high density and making micro holes. High continuity reliability due to plating
There is no smearing during the drilling process, and the conductor adhesion and hardness at high temperatures improve mounting performance.
Because it has features such as being able to withstand continuous use at high temperatures (200°C), it has come to be widely used as a material for multilayer printed wiring boards. However, in recent years, multilayer printed wiring boards such as those used in large computers have become more densely packaged and multilayered, resulting in smaller circuits and through-hole diameters. There is an increasing demand for miniaturization, and in order to meet this demand, substrates are required to have a higher level of adhesion than before. Regarding adhesion, it is natural that the adhesion between the circuit and the resin must be high due to the miniaturization of the circuit, but the adhesion between the resin and the base material impregnated with the resin must also be high. This is because if the adhesion between the base material and the resin is low, there will be an inconvenience in that minute peeling will occur between the base material and the resin when drilling holes in a multilayer printed wiring board. be. However, when preparing a prepreg by impregnating a base material with the above-mentioned addition-type polyimide varnish and drying it, and using this prepreg to create a substrate for a printed wiring board, the resin can be used at the level of a multilayer printed wiring board for large computers, etc. It was not possible to obtain sufficient adhesion between the resin and the base material, and in many cases, fine interfacial peeling between the base material and the resin was likely to occur during the drilling process. [Purpose of the Invention] The present invention has been made in view of the above points, and an object thereof is to provide a method for manufacturing an addition-type imide resin prepreg for laminates that has excellent adhesion and allows for high-density mounting. be. [Disclosure of the Invention] In order to achieve the above object, the inventors have solved the cause of insufficient adhesion between the base material and the resin when using a generally known addition type imide resin prepreg. Researched. As a result, it was found that more common addition-type imide resin prepolymers have unsaturated imide groups at the end of the prepolymer than amino groups. Generally, epoxysilane-based, chlorosilane-based, cationic silane-based processing agents are used as surface treatment agents for glass substrates, etc.
These surface treatment agents tend to react more easily with amino groups than with maleimide groups, so general addition-type imide resin prepolymers, which have many unsaturated imide groups at their ends, have insufficient adhesion to the substrate. I realized that I am getting used to it. In addition, prepolymers containing a large number of amino group terminals are not only highly reactive with surface treatment agents, but also highly reactive with ordinary varnish applied in the subsequent secondary impregnation. It has been found that excellent adhesion can be obtained between the processing agent and the common resin because both are strongly bonded to each other. As a result of further research, the inventors found that
We have discovered an addition-type imide resin with sufficient adhesion between the resin and the base material and a method for producing the same, and have now completed the following invention. That is, in the present invention, when producing an addition-type imide resin prepreg by impregnating a base material with an addition-type imide resin prepolymer synthesized from unsaturated bisimide and diamine, the bisimide/diamine ratio is 2.0.
A prepolymer solution synthesized at a ratio of mol/1.1 mol to 2.0 mol/3.0 mol and having a solid content concentration of 1 to 30% is first impregnated into a base material and dried to obtain a primary prepreg, which is further prepared separately. The gist of this paper is a method for producing an addition-type imide resin prepreg, which is characterized by impregnating and drying an addition-type imide resin prepolymer solution. This invention will be explained in detail below. Here, the unsaturated bis-imide is represented by formula (1), and the diamine is represented by formula (2). (In the formula, D represents a divalent group containing a carbon-carbon double bond, and A represents a divalent group containing at least two carbon atoms.) H 2 N-B-NH 2 (2) ( In the formula (B represents a divalent group having 30 or less carbon atoms) A and B in the above formulas (1) and (2) may be the same or different; linear or branched alkylene groups with 5 or 6 carbon atoms in the ring, O,N
and a heterocyclic group containing at least one S atom, or a phenylene or polycyclic aromatic group. These various groups may have substituents that do not give rise to unnecessary side reactions under the reaction conditions. The above A and B can also be a large number of phenylene groups, or an alicyclic group bonded directly or with divalent atoms or the following groups. Thus, for example, they are oxygen or sulfur, the group of alkylenes of 1 to 3 carbon atoms, or one of the following groups: -NR 4 -, -P(O)R 3 -, -N=N-,
【式】―CO―O―、―SO2―、―
SiR3R4―、―CONH―、―NY―CO―X―CO―
NY―、―O―CO―X―CO―O―、
[Formula] -CO-O-, -SO 2 -, - SiR 3 R 4 -, -CONH-, -NY-CO-X-CO-
NY―, -O―CO―X―CO―O―,
【式】【formula】
【式】
上記式中R3,R4およびYは各々炭素原子1個
から4個のアルキル基、環中に5個もしくは6個
の炭素原子を持つ環状アルキル基、もしくはフエ
ニルまたは多環状芳香族基をあらわし、Xは13個
より少ない炭素原子をもつている直鎖もしくは分
枝したアルキレン基、環中に5個もしくは6個の
炭素原子を持つている環状アルキレン基、または
単環もしくは多環状アリレン基をあらわす。
基Dは(3)式のエチレン系無水物(不飽和ジカル
ボン酸無水物)から誘導されるのもで、例えばマ
レイン酸無水物、シトラコン酸無水物、テトラヒ
ドロフタル酸無水物、イタコン酸無水物、および
シクロジエンとこれらの無水物の1つの間に起こ
るデイールス―アルダー反応の生成物を挙げるこ
とができる。
使用することのできる式(1)の好ましい不飽和ビ
ス―イミドとしては次のものを挙げることができ
る。マレイン酸N・N′―エチレン―ビス―イミ
ド、マレイン酸N・N′―ヘキサメチレン―ビス
―イミド、マレイン酸N・N′―メタフエニレン
―ビス―イミド、マレイン酸N・N′―パラフエ
ニレン―ビス―イミド、マレイン酸N・N′―4,
4′―ジフエニルメタン―ビス―イミド、<N・
N′―メチレンビス(N―フエニルマレイミド)
とも言う>、マレイン酸N・N′―4,4′―ジフエ
ニルエーテル―ビス―イミド、マレイン酸N・
N′―4,4′―ジフエニルスルホン―ビス―イミ
ド、マレイン酸N・N′―4,4′―ジシクロヘキシ
ルメタン―ビス―イミド、マレイン酸N・N′―
α・α′―4.4′―ジメチレンシクロヘキサン―ビス
―イミド、マレイン酸N・N′―メタキシリレン
―ビス―イミド、マレイン酸N・N′―ジフエニ
ルシクロヘキサン―ビス―イミドなどである。
また、使用することのできる式(2)の好ましいジ
アミンとしては次のものを挙げることができる。
4,4′―ジアミノジシクロヘキシルメタン、1・
4′―ジアミノシクロヘキサン、2,6―ジアミノ
ピリジン、メタフエニレンジアミン、パラフエニ
レンジアミン、4.4′―ジアミノ―ジフエニルメタ
ン、2,2―ビス―(4―アミノフエニル)プロ
パン、ベンジジン、4,4′―ジアミノジフエニル
オキサイド、4,4′―ジアミノジフエニルサルフ
アイド、4,4′―ジアミノジフエニルスルフオ
ン、ビス―(4―アミノフエニル)ジフエニルシ
ラン、ビス―(4―アミノフエニル)メチルフオ
スフインオキサイド、ビス―(3―アミノフエニ
ル)メチルフオスフインオキサイド、ビス―(4
―アミノフエニル)フエニルフオスフインオキサ
イド、ビス―(4―アミノフエニル)フエニラミ
ン、1,5―ジアミノナフタレン、メタキシリレ
ンジアミン、パラキシリレンジアミン、1,1―
ビス―(パラアミノフエニル)フタラン、ヘキサ
メチレンジアミンなどである。
上記不飽和ビスイミドとジアミンとを極性溶剤
中で反応させてプレポリマー溶液を調製するもの
であるが、使用する極性溶剤としては例えば、N
―メチルピロリドン、N・N―ジメチルホルムア
ミド、N・N―ジメチルアセトアミド、ジメチル
スルホキシドなど好ましいものとして挙げること
ができ、これらを1種または2種以上を混合して
用いることができる。
この発明にかかる付加型イミド樹脂プリプレグ
の製法に用いるプレポリマーは、前記のような不
飽和ビスイミドとジアミンを反応させて得られる
が、仕込みモル比が前記のようになつている必要
がある。すなわち、ビスイミド2.0モルに対し、
ジアミンが1.1モルより少ないと、得られたプレ
ポリマーは、末端が不飽和イミド基になつている
ものが多くなつてしまう。また、ビスイミド2.0
モルに対し、ジアミンが3.0モルより多いと、ゲ
ル化時間の短い樹脂になり、含浸した基材を乾燥
する際乾燥条件のコントロールが困難である。し
たがつて、ビスイミド2.0モルに対し、ジアミン
が1.1〜3.0モルとなつている必要がある。また、
ビスイミドとジアミンより合成されたプレポリマ
ー溶液において、固形分濃度が1%より小さい
と、プレポリマー溶液粘度が低すぎるため、含浸
時、適量の樹脂が付着しない。固型分濃度が30%
を越えると、含浸時、基材の繊維間まで充分ワニ
スが浸透せず、後の積層板となつてからの密着性
を考慮したとき好ましくない。したがつて、プレ
ポリマー溶液の固型分濃度が1〜30%となつてい
る必要がある。つぎに、1次含浸時の乾燥温度が
140℃より低いと、Nメチルピロリドンやジメチ
ルアセトアミドのような高沸点極性溶媒を十分蒸
発させることが困難となる。乾燥温度が165℃を
越えると、プレポリマーの高分子化が急速に起こ
り、乾燥のコントロールが困難になる。したがつ
て、1次含浸時の乾燥温度は140〜165℃であるこ
とが好ましい。
また、2次含浸に用いるプレポリマー溶液の樹
脂分子量分布が、未反応原料30〜55%、分子量
400以上15000以下の成分が39〜65%、分子量が
15000を越える成分が1.8〜6.8%となつているこ
とが好ましい。
1次プリプレグの樹脂分子量分布としては、未
反応原料が18〜35%、分子量400以上15000以下の
成分が51〜70%、分子量が15000を越える成分が
5〜15%となつていることが好ましい。
ここで、分子量分布はDMF溶媒を使用し、分
離カラムとして昭和電工製AD―803/S(8.0×
250mm、理論段数6000段)を2本装着したゲル浸
透クロマトグラフ(東洋ソーダ製HLC−803D)
により測定した。分子量の計算は、5種類の単分
散ポリエチレングリコールおよびエチレングライ
コールモノマーのリテンシヨンタイムと分子量の
常用対数から、3次式の回帰曲線を求め、これを
試料に適用し、試料のリテンシヨンタイムから逆
に分子量を求めるという方法で行つた。また、各
成分の割合(%)は、示差屈折計(128×10-8RI
単位)を用い、試料濃度を0.5±0.2%、試料注入
量を100μとして測定し、屈折計出力0〜1V記
録計への出力0〜10mV,チヤート速度5mm/分
として得られたクロマトグラムを、必要な分子量
区分に分け、切りぬき重量法により、それぞれの
比率を求めた。
2次含浸時、用いる付加型イミド樹脂プレポリ
マー溶液としては、ビスイミドとジアミンとを極
性溶剤中で反応させてプレポリマー溶液とするこ
ともできるし、また、市販の付加型イミド樹脂を
極性溶剤に溶解させてプレポリマー溶液とするこ
ともできる。
次に、この発明の実施例および比較例について
説明する。
(ワニス 1)
N・N′―メチレンビス(N―フエニルマレイ
ミド、以下、「BMI」と記す)を1074g、4,
4′―ジアミノ―ジフエニルメタン(以下、
「DDM」と記す)を400g、N・N―ジメチルア
セトアミド(以下、「DMAC」と記す)を983g、
それぞれ、34つ口フラスコに計量して仕込
み、撹拌棒、温度計、冷却器をこのフラスコに取
り付けたのち、オイルバスによつて加熱をおこな
つて反応温度70℃で300分間の反応をおこなわせ、
次に15分間で室温まで冷却してプレポリマー溶液
を得た。このプレポリマー溶液を1000g取り、こ
れに、2000gのDMACを加え、均一になるまで
撹拌し、1次含浸用ワニスを得た。
(ワニス 2)
BMI1074g、DDM600g、DMAC1116gをワ
ニス1製造の場合と同様に反応させてプレポリマ
ー溶液を得た。このプレポリマー溶液を1000g取
り、これに2000gのDMACを加え、均一になる
まで撹拌し、1次含浸用ワニスを得た。
(ワニス 3)
ワニス1の製造で得られた、プレポリマー溶液
(原液)を100gとり、2900gのDMACを加え、
均一になるまで撹拌し、1次含浸用ワニスを得
た。
(ワニス 4)
BMI1500g、DDM198g、DMAC1132gをワ
ニス1製造の場合と同様に反応させてプレポリマ
ー溶液を得た。このプレポリマー溶液を1000g取
り、これに2000gのDMACを加え、均一になる
まで撹拌し、1次含浸用ワニスを得た。
(ワニス 5)
ワニス1の製造で得られたプレポリマー溶液
(原液)を10g取り、2990gのDMACを加え、均
一になるまで撹拌し、1次含浸用ワニスを得た。
各ワニスの特性は第1表のようである。[Formula] In the above formula, R 3 , R 4 and Y are each an alkyl group having 1 to 4 carbon atoms, a cyclic alkyl group having 5 or 6 carbon atoms in the ring, or phenyl or a polycyclic aromatic group. a straight-chain or branched alkylene group having less than 13 carbon atoms, a cyclic alkylene group having 5 or 6 carbon atoms in the ring, or a monocyclic or polycyclic group; Represents an arylene group. Group D is derived from the ethylenic anhydride (unsaturated dicarboxylic anhydride) of formula (3), such as maleic anhydride, citraconic anhydride, tetrahydrophthalic anhydride, itaconic anhydride, and the products of the Diels-Alder reaction which take place between cyclodienes and one of these anhydrides. Preferred unsaturated bis-imides of formula (1) that can be used include the following. Maleic acid N・N′-ethylene-bis-imide, maleic acid N・N′-hexamethylene-bis-imide, maleic acid N・N′-metaphenylene-bis-imide, maleic acid N・N′-paraphenylene-bis-imide -imide, maleic acid N・N'-4,
4'-diphenylmethane-bis-imide, <N.
N'-methylenebis(N-phenylmaleimide)
Also referred to as>, maleic acid N・N′-4,4′-diphenyl ether-bis-imide, maleic acid N・N′-4,4′-diphenyl ether-bis-imide
N′-4,4′-diphenylsulfone-bis-imide, maleic acid N・N′-4,4′-dicyclohexylmethane-bis-imide, maleic acid N・N′-
These include α·α′-4.4′-dimethylenecyclohexane-bis-imide, maleic acid N·N′-methaxylylene-bis-imide, maleic acid N·N′-diphenylcyclohexane-bis-imide, and the like. Further, as preferred diamines of formula (2) that can be used, the following can be mentioned.
4,4'-diaminodicyclohexylmethane, 1.
4'-diaminocyclohexane, 2,6-diaminopyridine, metaphenylenediamine, paraphenylenediamine, 4,4'-diamino-diphenylmethane, 2,2-bis-(4-aminophenyl)propane, benzidine, 4,4'- Diaminodiphenyl oxide, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminodiphenyl sulfone, bis-(4-aminophenyl) diphenylsilane, bis-(4-aminophenyl)methylphosphine oxide, bis- (3-aminophenyl)methylphosphine oxide, bis-(4
-aminophenyl) phenylphosphine oxide, bis-(4-aminophenyl) phenylamine, 1,5-diaminonaphthalene, metaxylylene diamine, paraxylylene diamine, 1,1-
Bis-(para-aminophenyl) phthalane, hexamethylene diamine, etc. A prepolymer solution is prepared by reacting the unsaturated bisimide and diamine in a polar solvent.
Preferred examples include -methylpyrrolidone, N·N-dimethylformamide, N·N-dimethylacetamide, and dimethyl sulfoxide, and these can be used alone or in combination of two or more. The prepolymer used in the method for producing the addition-type imide resin prepreg according to the present invention is obtained by reacting the above-mentioned unsaturated bisimide and diamine, but the molar ratio of the ingredients must be as described above. That is, for 2.0 moles of bisimide,
If the amount of diamine is less than 1.1 mol, the resulting prepolymer will have many unsaturated imide groups at the ends. Also, bisimide 2.0
If the amount of diamine is more than 3.0 moles per mole, the resin will have a short gelation time, and it will be difficult to control the drying conditions when drying the impregnated base material. Therefore, the amount of diamine needs to be 1.1 to 3.0 moles per 2.0 moles of bisimide. Also,
In a prepolymer solution synthesized from bisimide and diamine, if the solid content concentration is less than 1%, the viscosity of the prepolymer solution is too low and an appropriate amount of resin will not adhere during impregnation. Solid content concentration is 30%
If it exceeds this value, the varnish will not penetrate sufficiently between the fibers of the base material during impregnation, which is undesirable when considering the adhesion of the laminated board. Therefore, it is necessary that the solid content concentration of the prepolymer solution is 1 to 30%. Next, the drying temperature during the primary impregnation is
If the temperature is lower than 140°C, it becomes difficult to sufficiently evaporate high-boiling polar solvents such as N-methylpyrrolidone and dimethylacetamide. If the drying temperature exceeds 165°C, polymerization of the prepolymer will occur rapidly, making drying difficult to control. Therefore, the drying temperature during the primary impregnation is preferably 140 to 165°C. In addition, the resin molecular weight distribution of the prepolymer solution used for secondary impregnation is 30 to 55% of the unreacted raw material, and the molecular weight
39-65% of components are 400 to 15,000, molecular weight is
Preferably, the amount of components exceeding 15,000 is 1.8 to 6.8%. The resin molecular weight distribution of the primary prepreg is preferably such that unreacted raw materials account for 18 to 35%, components with a molecular weight of 400 to 15,000 account for 51 to 70%, and components with a molecular weight of over 15,000 account for 5 to 15%. . Here, the molecular weight distribution was determined using DMF solvent and the separation column was Showa Denko AD-803/S (8.0×
Gel permeation chromatograph (Toyo Soda HLC-803D) equipped with two 250 mm, 6000 theoretical plates)
It was measured by Calculation of molecular weight involves finding a cubic regression curve from the retention times of five types of monodisperse polyethylene glycol and ethylene glycol monomer and the common logarithm of the molecular weight, applying this to the sample, and calculating from the retention time of the sample. On the other hand, we used the method of determining the molecular weight. In addition, the proportion (%) of each component was determined using a differential refractometer (128×10 -8 RI
The sample concentration was 0.5 ± 0.2%, the sample injection amount was 100μ, the refractometer output was 0 to 1V, the recorder output was 0 to 10mV, and the chart speed was 5mm/min. It was divided into necessary molecular weight categories and the respective ratios were determined by the cut-out weight method. The addition-type imide resin prepolymer solution used at the time of secondary impregnation can be prepared by reacting bisimide and diamine in a polar solvent, or by using a commercially available addition-type imide resin in a polar solvent. It can also be dissolved to form a prepolymer solution. Next, examples and comparative examples of the present invention will be described. (Varnish 1) 1074g of N・N'-methylenebis (N-phenylmaleimide, hereinafter referred to as "BMI"), 4,
4'-diamino-diphenylmethane (hereinafter referred to as
400g of N/N-dimethylacetamide (hereinafter referred to as "DMAC"),
Each was weighed and charged into a 34-necked flask, and a stirring rod, thermometer, and condenser were attached to the flask, and then heated in an oil bath and reacted for 300 minutes at a reaction temperature of 70°C. ,
Next, the mixture was cooled to room temperature for 15 minutes to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 2) 1074 g of BMI, 600 g of DDM, and 1116 g of DMAC were reacted in the same manner as in the case of producing Varnish 1 to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 3) Take 100g of the prepolymer solution (undiluted solution) obtained in the production of Varnish 1, add 2900g of DMAC,
The mixture was stirred until it became uniform to obtain a varnish for primary impregnation. (Varnish 4) BMI1500g, DDM198g, and DMAC1132g were reacted in the same manner as in the case of producing Varnish 1 to obtain a prepolymer solution. 1,000 g of this prepolymer solution was taken, 2,000 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. (Varnish 5) 10 g of the prepolymer solution (undiluted solution) obtained in the production of Varnish 1 was taken, 2990 g of DMAC was added thereto, and the mixture was stirred until homogeneous to obtain a varnish for primary impregnation. The characteristics of each varnish are shown in Table 1.
【表】
(1次プリプレグ1〜3、5〜6)
上のようにして得られたワニスを、それぞれ、
含浸用バツトに移し、300×300mmのクロルシラン
系処理剤で表面処理を行つた105g/m2のガラス
クロスをバツト内のワニスに浸して含浸を行い、
蒸気乾燥機で150℃、10分間の乾燥を行い、1次
プリプレグを得た。
(1次プリプレグ4)
乾燥を160℃で5分間行つた他は、1次プリプ
レグ1の製造と同様にして1次プリプレグを得
た。
(1次プリプレグ7)
乾燥を120℃で30分間行つた他は、1次プリプ
レグ1の製造と同様にして1次プリプレグを得
た。
各1次プリプレグの特性は第2表のようであ
る。[Table] (Primary prepregs 1 to 3, 5 to 6) The varnishes obtained as above were
Transfer to an impregnating vat, and impregnate a 300 x 300 mm 105 g/m 2 glass cloth whose surface has been treated with a chlorosilane treatment agent by dipping it into the varnish in the vat.
Drying was performed in a steam dryer at 150°C for 10 minutes to obtain a primary prepreg. (Primary prepreg 4) A primary prepreg was obtained in the same manner as in the production of primary prepreg 1, except that drying was performed at 160° C. for 5 minutes. (Primary prepreg 7) A primary prepreg was obtained in the same manner as in the production of primary prepreg 1, except that drying was performed at 120° C. for 30 minutes. The characteristics of each primary prepreg are shown in Table 2.
【表】
(実施例1〜4および比較例1〜3)
つぎに、上記で得られた1次プリプレグ1〜7
に、プレポリマー溶液(BMI1074g、DDM297
g、DMAC914gを70℃、300分間反応させて得
た。)を含浸し、150℃10分乾燥して最終プリプレ
グを得た。
(実施例5)
1次プリプレグ1に、市販付加型イミド樹脂
1500gを1000gのDMACに均一に溶解させたプ
レポリマー溶液を含浸し、150℃で10分間乾燥し
て最終プリプレグを得た。
第3表に各最終プリプレグの特性を示す。[Table] (Examples 1 to 4 and Comparative Examples 1 to 3) Next, primary prepregs 1 to 7 obtained above
Then, prepolymer solution (BMI1074g, DDM297
g, was obtained by reacting 914 g of DMAC at 70°C for 300 minutes. ) and dried at 150°C for 10 minutes to obtain the final prepreg. (Example 5) A commercially available addition type imide resin was added to the primary prepreg 1.
A final prepreg was obtained by impregnating 1500 g of a prepolymer solution uniformly dissolved in 1000 g of DMAC and drying at 150° C. for 10 minutes. Table 3 shows the properties of each final prepreg.
【表】
実施例5は市販ワニスを2次含浸
実施例1〜5、比較例1〜3で得られた最終プ
リプレグ30枚をプレート金型の間に離型紙を介し
て入れ、実在40Kg/cm2、170℃、90分間の成形を
行い、これを冷却した後取り出し、20℃、2時間
のポストキユアに供し、厚さ3mmの積層板を得
た。この積層板を高速ドリルマシンのテーブル上
に固定し、0.5mmφドリル刃(ユニオンツール社
製)を用いて回転数80000rpm、送り速度1.0m/
minの穴明け条件で、1000個の穴を連続的に明け
た。そして、1000個目の穴の壁面を走査型電子顕
微鏡で観察を行い、界面剥離の有無を調べた。結
果を第4表に示す。[Table] Example 5 is secondary impregnation with commercially available varnish. 30 final prepreg sheets obtained in Examples 1 to 5 and Comparative Examples 1 to 3 were placed between plate molds with release paper interposed, and the actual weight was 40 kg/cm. 2 , molding was carried out at 170°C for 90 minutes, and after cooling, it was taken out and subjected to post-curing at 20°C for 2 hours to obtain a laminate with a thickness of 3 mm. This laminate was fixed on the table of a high-speed drill machine, and a 0.5 mmφ drill blade (manufactured by Union Tool Co., Ltd.) was used to rotate at a rotation speed of 80,000 rpm and a feed rate of 1.0 m/min.
1000 holes were continuously drilled under min drilling conditions. The wall surface of the 1000th hole was then observed using a scanning electron microscope to check for interfacial delamination. The results are shown in Table 4.
【表】
それ以下○
〔発明の効果〕
この発明は、以上のようであるので、高密度実
装可能な積層板用プリプレグを提供することがで
きる。【table】
Less than that ○
[Effects of the Invention] As described above, the present invention can provide a laminate prepreg that can be mounted at high density.
Claims (1)
加型イミド樹脂プレポリマーを基材に含浸して付
加型イミド樹脂プリプレグを製造するに際し、ビ
スイミド/ジアミンが2.0モル/1.1モル〜2.0モ
ル/3.0モルの比率で合成した、固型分濃度1〜
30%のプレポリマー溶液を基材に1次含浸させ乾
燥させて1次プリプレグを得、これにさらに別途
調製した付加型イミド樹脂プレポリマー溶液を含
浸、乾燥させることを特徴とする付加型イミド樹
脂プリプレグの製法。 2 1次含浸時の乾燥が140〜165℃で行われる特
許請求の範囲第1項記載の付加型イミド樹脂プリ
プレグの製法。[Claims] 1. When manufacturing an addition-type imide resin prepreg by impregnating a base material with an addition-type imide resin prepolymer synthesized from unsaturated bisimide and diamine, bisimide/diamine is 2.0 mol/1.1 mol to 2.0 mol. /3.0 mol ratio, solid content concentration 1~
An addition-type imide resin characterized in that a base material is first impregnated with a 30% prepolymer solution and dried to obtain a primary prepreg, which is further impregnated with a separately prepared addition-type imide resin prepolymer solution and dried. Prepreg manufacturing method. 2. The method for producing an addition type imide resin prepreg according to claim 1, wherein drying during the primary impregnation is carried out at 140 to 165°C.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60164427A JPS6225133A (en) | 1985-07-25 | 1985-07-25 | Production of addition-type imide resin prepreg |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60164427A JPS6225133A (en) | 1985-07-25 | 1985-07-25 | Production of addition-type imide resin prepreg |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6225133A JPS6225133A (en) | 1987-02-03 |
| JPH0230333B2 true JPH0230333B2 (en) | 1990-07-05 |
Family
ID=15792945
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60164427A Granted JPS6225133A (en) | 1985-07-25 | 1985-07-25 | Production of addition-type imide resin prepreg |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6225133A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0431435A (en) * | 1990-05-28 | 1992-02-03 | Matsushita Electric Works Ltd | Addition type imide resin prepolymer and resin film prepared therefrom |
| JPH05148360A (en) * | 1991-11-29 | 1993-06-15 | Matsushita Electric Works Ltd | Production of polyimide resin |
| KR100910767B1 (en) | 2007-11-13 | 2009-08-04 | 삼성정밀화학 주식회사 | Method for producing thermoplastic resin prepreg with improved impregnation and thermoplastic resin prepreg manufactured by the method |
| RU2015129822A (en) | 2008-05-15 | 2015-11-10 | Р-Тек Уено, Лтд. | PHARMACEUTICAL COMPOSITION FOR TREATING EYE DRY AND / OR DAMAGE TO THE CONJUNCTIVES AND CORNITAS |
| JP2024010421A (en) * | 2022-07-12 | 2024-01-24 | 信越化学工業株式会社 | Method for manufacturing prepreg for low dielectric materials and method for manufacturing printed wiring board |
-
1985
- 1985-07-25 JP JP60164427A patent/JPS6225133A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6225133A (en) | 1987-02-03 |
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