JPH02308105A - Color filter and its production - Google Patents

Abstract

PURPOSE:To eliminate the diffusion of impurities into the liq. crystal in a colored layer and to prevent the generation of open defects due to the defective coverage of the colored layer with a transparent conductive film by forming an org. insulating film and an inorg. insulting film on the colored layer. CONSTITUTION:The glass substrate 1 is made of ''Pyrex(R)'' glass, for example, the colored layer 2 is formed from a polyimide in which a pigment is dispersed by printing, etc., and the org. insulating film 3 is a high-purity acrylic resin film formed by printing, etc. The inorg. insulating film 4 is a silicon oxide film formed by sputtering, etc., the transparent conductive film 5 is an ITO (indium-tin-oxide) film formed by sputtering, etc., and an oriented film 6 is a polyimide film formed by a transfer method, etc. The org. insulating film 3 is formed on the colored layer 2 in 0.5-5 mum thickness, and the inorg. insulating film 4 is formed in 0.08-3 mum thickness. Consequently, the diffusion of impurities into the colored layer 2 is prevented, the coverage of the transparent conductive film 5 is improved, and the generation of open defects is prevented.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a color filter for a liquid crystal flat display and a method for manufacturing the same, for example, a color filter for a TPT drive liquid crystal flat display and a method for manufacturing the same.

(Prior Art) FIG. 4 is a process sectional view showing a conventional color filter for liquid crystal flat display and its manufacturing method disclosed in, for example, Japanese Unexamined Patent Publication No. 59-10988.
1) is a glass substrate, (2) is a colored layer, (4) is an inorganic insulating film, (5) is a transparent conductive film, and (6) is an insulating film.

Next, the manufacturing method will be explained. A colored layer (2) is formed on a glass substrate (1) by a commonly used screen printing method.The colored layer (2) is made of, for example, polyimide in which a pigment is dispersed. ITO (Indium-Tin-O
A transparent conductive film (5) such as an xide) film is formed. An insulating film (6) made of silicon nitride or the like is formed on the transparent conductive film (7) by sputtering or the like. Furthermore, this insulation M (
6) An alignment treatment film (7) made of acrylic resin or the like is formed on top to obtain a color filter for a liquid crystal flat display.

(Problems to be Solved by the Invention) Conventional color filters for liquid crystal displays have been constructed as described above, and it is difficult to thicken the insulating film on the transparent conductive film to prevent voltage drop. Film thickness zoooo
i or less.

Therefore, the effect of preventing impurities from the colored layer into the liquid crystal is small, and when a transparent conductive film is formed on the colored layer, open defects are likely to occur due to poor coverage of the transparent conductive film at the colored layer cross section. There was a problem.

This invention was made in order to solve the above-mentioned problems, and it is possible to prevent impurity diffusion from the colored layer into the liquid crystal, and to improve the coverage of the transparent conductive film at the difference between the colored layers. The object of the present invention is to obtain a color filter and a method for manufacturing the same that can prevent the occurrence of open defects.

[Means to solve the problem]

A color filter and a method for manufacturing the same according to the present invention form an organic insulating film and an inorganic insulating film between a colored layer and a transparent conductive film layer.

[For production]

The color filter and its manufacturing method in this invention include:
By forming an organic insulating film and an inorganic insulating film between the colored layer and the transparent conductive film layer, impurity diffusion in the colored layer is prevented, the coverage of the transparent conductive film is improved, and the occurrence of open defects is prevented. .

〔Example〕

An embodiment of the present invention will be described below with reference to the drawings. 1st
In the figure, +11 is a glass substrate such as a Pyrex glass substrate, (2) is a colored layer made of polyimide with dispersed pigment formed by a printing method, etc., and (3) is an organic insulating film made of a polyimide film formed by a printing method etc. A pure acrylic resin film, (4) is an inorganic insulating film, such as a silicon oxide film formed by sputtering, and (5) is a transparent conductive film, which is formed by sputtering, for example.
m-Tin-Oxide) film (6) is an alignment-treated film, which is a polyimide film formed by, for example, a transfer method.

A color filter for a liquid crystal flat display according to the present invention and a method for manufacturing the same will be explained. Pyrex glass substrate (11 with a thickness of 0.5 to 3 μm, for example, by printing method)
As you can read, the colored layer is a pigment-dispersed polyimide film (
2) Form. This polyimide film (2) is black as a light shielding film, and red as a pixel display area.

It is formed once for each of the four colors blue and green, a total of 14 times. After forming this polyimide film (2) in a golden color, a film with a thickness of 0.5 to 5 μm is printed on the polyimide film (2), for example, by a printing method.
A high-purity acrylic resin film +3) is formed so that m is obtained. This acrylic resin film (3) is desirably thicker in order to enhance the effect of suppressing impurities in the polyimide film (2) and improve the coverage of the transparent conductive film (5).

FIG. 2 shows the relationship between the thickness of the acrylic resin film (3) and the pinhole density. It can be seen that the number of pinholes is suppressed to the minimum value when the film thickness is 1.2 μm or more. Acrylic resin IJ!
+3) To obtain a sufficient pinhole suppression effect by itself,
A film thickness of 1.2 μm or more is required, but since the silicon oxide film +41 is formed on the acrylic resin film (3), impurity suppression is 0.5 for the acrylic resin film (3).
This effect can be obtained at a thickness of μm or more. Furthermore, even if the acrylic resin film (3) is deposited up to a thickness of 5 μm, no occurrence of M# peeling will be observed, but if the thickness exceeds 5 μm, there is a possibility that the film will peel off during the cell assembly process of a liquid crystal flat display, making it difficult to put into practical use. A silicon oxide film (
4) Form. This silicon oxide film (4) increases the effect of suppressing impurities in the polyimide film (2), and the transparent conductive film (5)
), it is desirable to make the film thicker. Figure 3 shows the relationship between the thickness of the silicon oxide film (4) and the pinhole density. It can be seen that it is suppressed to the minimum value. Therefore, in order to obtain a sufficient impurity suppression effect, the thickness of the silicon oxide film (4) needs to be 0.08 μm or more. Furthermore, even if the silicon oxide film (4) is deposited up to a thickness of 3 μm, no film peeling is observed, but if the thickness exceeds 3 μm, there is a possibility of film peeling.
ITO (Indius-Tin), which is a transparent conductive film, is deposited on the impractical silicon oxide film (4) to a thickness of 0.03 to 0.3 μm by, for example, sputtering.
-0w1de) film (5) is formed, and the present ITO film (5) is formed.
) to a thickness of 0.01 to lttm by sputtering, for example.
A silicon oxide film (6) is formed so that the actual silicon oxide film,
For example, by a transfer method, a thickness of 0.03 to 0 is applied onto the coating film (6).
．． A polyimide film (7
) to obtain a color filter for liquid crystal flat display.

In addition, in the above example, a glass substrate is used! Although a Pyrex glass substrate was used in No. 11, other glass substrates such as low-alkali glass substrates may be used.Although a polyimide film with pigment dispersed in the colored layer (2) was used, other colored layers such as a dyed gelatin film may be used. In particular, the light shielding part (2a) may be a colored layer (2a) formed by vapor deposition or other methods, and may be a metal film such as a Cr film patterned by photolithography or the like.
), a printing method was used to form the organic insulating film (3), but other methods such as photolithography may be used.Although a printing method was used to form the organic insulating film (3), a spin coating method may also be used. Although silicon oxide was used for the inorganic insulating film (4), it could also be a silicon thioside film, and the sputtering method was used for its formation.
Other methods such as CVD may be used to coat the transparent conductive film (5).
Although a To (Indium-Tin-Oxide) film was used, other transparent conductive films such as 5nOz and 'lx's may also be used.Although sputtering was used as the formation method, other methods such as vacuum evaporation may also be used. Although silicon oxide was used for the insulating film (6), silicon oxide etc. could also be used for the insulating film (6), and sputtering was used as the formation method, but other methods such as CVD may also be used. Although a polyimide film was used as the alignment treatment film (7), a film of polyvinyl alcohol or the like may also be used.Although a transfer method was used as the method for forming the film, a normal photolithography method may also be used. Further, the alignment film (7) may be a silicon oxide film or the like which is subjected to oblique evaporation of the vacuum evaporation method.

Furthermore, in the above embodiment, an organic insulating film (
3) is formed, and an inorganic insulating film (4) is formed on the organic insulating film (3).
) was formed, but an inorganic insulating film (4) may be formed on the colored layer (2), and the organic insulating film (3) may be formed from this inorganic insulating film (4).

〔Effect of the invention〕

As described above, according to the present invention, since the organic insulating film and the inorganic insulating film are formed on the colored layer, it is possible to prevent impurities from diffusing into the liquid crystal of the colored layer, and to prevent the diffusion of impurities at the stepped portions of the colored layer. The present invention has the effect of providing a color filter for a liquid crystal flat display with high dormancy that can prevent the occurrence of open defects due to poor coverage of the transparent conductive film, and a method for manufacturing the same.

[Brief explanation of drawings]

FIG. 1 is a process cross-sectional view showing a color filter for a liquid crystal flat display according to an embodiment of the present invention and its manufacturing method, and FIG. 2 is a film thickness and pinhole density of an acrylic resin film, which is an embodiment of an organic insulating film. 3 is a graph showing the relationship between the thickness of a silicon oxide film and the pinhole density, which is an example of an inorganic insulating film, and FIG. 4 is a graph showing a conventional color filter for liquid crystal flat displays and its manufacture. It is a process sectional view showing a method. +11...Glass substrate, (2)...Colored layer, (3)
...Organic insulating film, (4)...Inorganic I! membrane, (5)
...Transparent conductive film, (6)...Insulating film, (7)...
This is an alignment treated film. In addition, in the figures, the same reference numerals indicate the same or corresponding parts.

Claims (1)

[Claims] An organic insulating film and an inorganic insulating film are formed on a colored layer formed on a glass substrate and below a transparent conductive film, and the thickness of the organic insulating film on the colored layer is 0.5 to 5 μm. A color filter and a method for manufacturing the same, characterized in that an insulating film is formed to have a thickness of 0.08 to 3 μm.