JPH0231125U - - Google Patents
Info
- Publication number
- JPH0231125U JPH0231125U JP1988108756U JP10875688U JPH0231125U JP H0231125 U JPH0231125 U JP H0231125U JP 1988108756 U JP1988108756 U JP 1988108756U JP 10875688 U JP10875688 U JP 10875688U JP H0231125 U JPH0231125 U JP H0231125U
- Authority
- JP
- Japan
- Prior art keywords
- doping
- ion
- ion generation
- semiconductor wafer
- impurities
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988108756U JPH0231125U (it) | 1988-08-19 | 1988-08-19 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988108756U JPH0231125U (it) | 1988-08-19 | 1988-08-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0231125U true JPH0231125U (it) | 1990-02-27 |
Family
ID=31344390
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988108756U Pending JPH0231125U (it) | 1988-08-19 | 1988-08-19 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0231125U (it) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140101656A (ko) * | 2013-02-11 | 2014-08-20 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 처리 장치, 이온 주입 장치 및 이온 주입 방법 |
-
1988
- 1988-08-19 JP JP1988108756U patent/JPH0231125U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20140101656A (ko) * | 2013-02-11 | 2014-08-20 | 타이완 세미콘덕터 매뉴팩쳐링 컴퍼니 리미티드 | 처리 장치, 이온 주입 장치 및 이온 주입 방법 |