JPH0241252U - - Google Patents

Info

Publication number
JPH0241252U
JPH0241252U JP12011888U JP12011888U JPH0241252U JP H0241252 U JPH0241252 U JP H0241252U JP 12011888 U JP12011888 U JP 12011888U JP 12011888 U JP12011888 U JP 12011888U JP H0241252 U JPH0241252 U JP H0241252U
Authority
JP
Japan
Prior art keywords
axis direction
fixing frame
mask
mask fixing
microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12011888U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12011888U priority Critical patent/JPH0241252U/ja
Publication of JPH0241252U publication Critical patent/JPH0241252U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案による大型フオトマスク検査装
置全体の平面図、第2図は本考案による大型フオ
トマスク検査装置全体の正面図である。 1……土台、2……LMガイド、3……フオト
マスク、4……マスク固定枠、5……LMブロツ
ク、6……ロボツト(X軸)、7……ロボツト(
Y軸)、8……顕微鏡、9……CCDカメラ。
FIG. 1 is a plan view of the entire large-sized photomask inspection apparatus according to the present invention, and FIG. 2 is a front view of the entire large-sized photomask inspection apparatus according to the present invention. 1...Foundation, 2...LM guide, 3...Photo mask, 4...Mask fixing frame, 5...LM block, 6...Robot (X axis), 7...Robot (
Y axis), 8...Microscope, 9...CCD camera.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 大型フオトマスクのパターン形状及び欠陥検査
用装置において、ライトテーブルと、前記ライト
テーブル上にX軸方向に摺動可能に設置されたマ
スク固定枠と、前記マスク固定枠をX軸方向に摺
動するロボツトと、前記マスク固定枠の摺動方向
に対して垂直方向(Y軸方向)に摺動し、かつ、
顕微鏡とCCDカメラとの少なくとも一方を搭載
するロボツトとから構成され、X軸方向はマスク
を、Y軸方向は顕微鏡(CCDカメラ)を自動走
査することを特徴とする大型フオトマスク検査装
置。
An apparatus for inspecting pattern shapes and defects of large photomasks, comprising a light table, a mask fixing frame installed on the light table so as to be slidable in the X-axis direction, and a robot that slides the mask fixing frame in the X-axis direction. and slide in a direction perpendicular to the sliding direction of the mask fixing frame (Y-axis direction), and
A large photomask inspection device comprising a robot equipped with at least one of a microscope and a CCD camera, and characterized in that it automatically scans the mask in the X-axis direction and the microscope (CCD camera) in the Y-axis direction.
JP12011888U 1988-09-13 1988-09-13 Pending JPH0241252U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12011888U JPH0241252U (en) 1988-09-13 1988-09-13

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12011888U JPH0241252U (en) 1988-09-13 1988-09-13

Publications (1)

Publication Number Publication Date
JPH0241252U true JPH0241252U (en) 1990-03-22

Family

ID=31365941

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12011888U Pending JPH0241252U (en) 1988-09-13 1988-09-13

Country Status (1)

Country Link
JP (1) JPH0241252U (en)

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