JPH0243823B2 - KINZOKUJOHATSUSEN - Google Patents
KINZOKUJOHATSUSENInfo
- Publication number
- JPH0243823B2 JPH0243823B2 JP18209984A JP18209984A JPH0243823B2 JP H0243823 B2 JPH0243823 B2 JP H0243823B2 JP 18209984 A JP18209984 A JP 18209984A JP 18209984 A JP18209984 A JP 18209984A JP H0243823 B2 JPH0243823 B2 JP H0243823B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- evaporation
- wire
- core
- guard
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052751 metal Inorganic materials 0.000 claims description 51
- 239000002184 metal Substances 0.000 claims description 51
- 238000001704 evaporation Methods 0.000 claims description 30
- 230000008020 evaporation Effects 0.000 claims description 30
- 238000002844 melting Methods 0.000 claims description 14
- 230000008018 melting Effects 0.000 claims description 13
- 238000001883 metal evaporation Methods 0.000 claims description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 7
- 238000005192 partition Methods 0.000 claims description 6
- 238000004804 winding Methods 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 239000010937 tungsten Substances 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 11
- 229910052759 nickel Inorganic materials 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 239000011295 pitch Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
［産業上の利用分野］
この発明は金属の真空蒸着やコーテングなどに
用いられる金属蒸発線に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a metal evaporation line used for vacuum evaporation or coating of metals.
［従来の技術］
従来の蒸発用金属を保持する手段としては、タ
ングステンなどの高溶融点の金属線をもつて形成
したコイルに、蒸発用金属を挿入または係止して
保持したコイルタイプ。蒸発用金属をボートと称
される容器や坩堝に収容した容器タイプ。高溶融
点の金属盤をベースとし、そのベースに蒸発用金
属を積重したターゲツトタイプなどがある。[Prior Art] A conventional means for holding an evaporation metal is a coil type in which the evaporation metal is inserted or locked into a coil formed of a metal wire with a high melting point such as tungsten. A container type in which metal for evaporation is stored in a container or crucible called a boat. There is a target type that is based on a metal plate with a high melting point, and a metal for evaporation is stacked on the base.
［発明が解決しようとする問題点］
しかしながら、上記コイルタイプでは蒸発用金
属が溶融により垂れ落ち易く、蒸発効率が低い欠
点があつた。また容器タイプは加熱効率が悪く、
ターゲツトタイプではベースとして用される高融
点金属の使用量がコイルタイプに比べて多く、コ
スト高となるなどの欠点があつた。[Problems to be Solved by the Invention] However, the coil type described above has the disadvantage that the evaporation metal tends to drip down due to melting, resulting in low evaporation efficiency. Also, the container type has poor heating efficiency.
The target type requires a larger amount of high-melting point metal as a base than the coil type, resulting in higher costs and other disadvantages.
この発明は上記従来の問題点を解決するために
考えられたものであつて、その目的とするところ
は、高電圧、高電流、高温に耐え、溶融により生
ずる蒸発用金属の滴下がほとんどなく、蒸発用金
属の装荷量を増して、蒸発効果を更に向上させる
ことができるばかりか、ターゲツトタイプよりも
低コストの金属蒸発線を提供することにある。 This invention was devised to solve the above-mentioned conventional problems, and its purpose is to withstand high voltage, high current, and high temperature, and to have almost no dripping of evaporation metal caused by melting. The object of the present invention is to provide a metal evaporation line that not only can increase the loading amount of evaporation metal to further improve the evaporation effect, but also has a lower cost than the target type.
［問題点を解決するための手段］
上記目的よりなるこの発明の特徴は、融点2500
℃以上の複数本の金属線を撚線して芯体とし、そ
の芯体に所要本数の蒸発用金属線を、該蒸発用金
属線よりも高融点の金属による区画線と共に巻線
し、その巻線上に融点2500℃以上の金属線による
ガードを巻線してなることにある。[Means for Solving the Problems] The feature of this invention which achieves the above object is that the melting point is 2500.
℃ or higher is twisted to form a core body, and the required number of evaporation metal wires are wound around the core body along with a partition line made of a metal having a higher melting point than the evaporation metal wires. It is made by winding a guard made of metal wire with a melting point of 2500℃ or higher on the winding.
上記芯体、ガード及び蒸発用金属線間の区画金
属線としては、タングステン、モリブデン、タン
タルなどの金属を用いることができる。 Metals such as tungsten, molybdenum, and tantalum can be used as the partition metal wire between the core, the guard, and the evaporation metal wire.
上記芯体となるタングステン線の線径は、0.8
〜1.0φm／ｍの範囲が好ましく、その２本または
３本を、２〜14m／ｍの寸法内に３山のピツチに
て撚線している。 The wire diameter of the tungsten wire that becomes the core above is 0.8
The range of φm/m to 1.0 m/m is preferable, and two or three of the strands are twisted at three pitches within a size of 2 to 14 m/m.
また蒸発用金属として上記芯体に巻線される金
属、とえば金、銀、銅、ニツケル、アルミニウム
などによる金属線の線径は、0.8〜1.2φm／ｍの
範囲が好ましく、線径0.8〜1.2φm／ｍの区画金
属線と共に、12〜15m／ｍの寸法内にて、蒸発用
金属線は６山、区画金属線は１山の割合にて巻線
し、外径2.8〜2.6φm／ｍの金属蒸発線を形成し
ている。 Further, the wire diameter of the metal wire, such as gold, silver, copper, nickel, aluminum, etc., wound around the core as the evaporation metal is preferably in the range of 0.8 to 1.2φm/m; Together with the 1.2φm/m partition metal wire, the evaporation metal wire is wound with 6 threads and the partition metal wire is wound with 1 thread within the dimensions of 12 to 15m/m, with an outer diameter of 2.8 to 2.6φm/ It forms a metal evaporation line of m.
更にまたガードとして巻線される金属線の線径
は、0.3〜0.4φm／ｍの範囲が好ましく、巻線は
１ピツチ2.0〜4.0ｍ／ｍが好ましい。 Furthermore, the wire diameter of the metal wire wound as a guard is preferably in the range of 0.3 to 0.4 m/m, and the winding pitch is preferably 2.0 to 4.0 m/m.
［作用］
上記構成からなる金属蒸発線では、真空装置内
において、所要の電力を芯体に通電すると、芯体
が加熱して蒸発用金属線が溶融し蒸発する。[Function] In the metal evaporation wire having the above configuration, when the required power is applied to the core in the vacuum device, the core is heated and the evaporation metal wire is melted and evaporated.
また各蒸発用金属線は、溶融によつてその形態
を失い、相互に溶け合うが、その溶け合いは一定
間隔ごとに存する区画金属線によつて全体には及
ばず、区画金属線がないときに比べて、溶融金属
の垂れは生じ難くなる。 In addition, each metal wire for evaporation loses its shape due to melting and melts into each other, but the melting does not extend to the whole due to the partitioned metal wires that exist at regular intervals, compared to when there is no partitioned metal wire. Therefore, molten metal is less likely to drip.
更にまた溶融金属が流動し始めた際には、上記
ガードによつて下方への流動が阻止され、溶融金
属が蒸発線から水滴状にたれ落ちる水たれ現象が
生じ難くなる。 Furthermore, when the molten metal begins to flow, the guard prevents it from flowing downward, making it difficult for the molten metal to drip from the evaporation line in the form of water droplets.
この結果、蒸発用金属の装荷量を増すことがで
き、また蒸発効果も一段と向上する。 As a result, the amount of metal to be loaded for evaporation can be increased, and the evaporation effect can be further improved.
この発明を図面に示す１実施例により更に詳説
する。 This invention will be explained in more detail with reference to an embodiment shown in the drawings.
［実施例］
図中１は芯体、２は蒸発用金属、３は区画金属
線、４はガードである。[Example] In the figure, 1 is a core, 2 is an evaporation metal, 3 is a partition metal wire, and 4 is a guard.
上記芯体１は、1.0φm／ｍの２本のタングステ
ン線１ａ，１ａを、12m／ｍの長さl1範囲に３山
の割合で撚線して形成したものからなり、その芯
体１の周囲に、1.0φm／ｍの３本のニツケルの蒸
発用金属線２，２，２，と、0.5φm／ｍの１本の
モリブデンによる区画金属線３とを、12m／ｍの
長さl2範囲に区画金属線３を含めて７山の割合で
巻線し、外径が2.1φm／ｍとなつた蒸発線に、更
に0.4φm／ｍのタングステン線をガード４として
2m／ｍピツチl3にて巻線したものからなる。 The above-mentioned core body 1 is formed by twisting two tungsten wires 1a, 1a of 1.0φm/m at a ratio of three strands in one range of length l of 12 m/m. Three 1.0φm/m nickel evaporation metal wires 2, 2, 2, and one molybdenum division metal wire 3 of 0.5φm/m are placed around the 12m/m length l. Including the divided metal wire 3 in the 2 range, wind the wire at a ratio of 7 threads, and add a 0.4φm/m tungsten wire as the guard 4 to the evaporation wire with an outer diameter of 2.1φm/m.
Consists of wire wound at 2m/m pitch l3 .
上記構造の金属蒸発線を、真空蒸着装置にて
10V・200A程度の電気を芯体１に通電して加熱
し、ニツケルの蒸発を行つたところ、通電中に芯
体１が断線するようなことがなく、また水たれ現
象も発生せず、ニツケル装荷量のほぼ80％が蒸発
した。 The metal evaporation wire with the above structure is made using a vacuum evaporation device.
When electricity of about 10 V and 200 A was applied to the core 1 to heat it and evaporate the nickel, the core 1 did not break during the current, and no water dripping occurred. Almost 80% of the load was evaporated.
比較検討のため、線径0.8〜0.9φm／ｍの１本
のタングステン線にニツケル線とモリブデン線と
を実施例と同様に巻線してガードなしのニツケル
蒸発線を作成し、通電により蒸発を試みたとこ
ろ、蒸発中に断線が生じ、ニツケル蒸発量は装荷
量の１％にも満なかつた。 For comparative study, a nickel evaporation wire without a guard was created by winding a tungsten wire with a wire diameter of 0.8 to 0.9φm/m with a nickel wire and a molybdenum wire in the same manner as in the example, and the evaporation was caused by energization. When an attempt was made, a wire break occurred during evaporation, and the amount of nickel evaporated was less than 1% of the loaded amount.
［発明の効果］
この発明は上述のように、撚線による芯体によ
つて通電加熱時の断線が防止され、また区画金属
線により蒸発金属線の全体的な溶け合いが阻止さ
れ、更にガードによつて溶融金属の水たれ現象が
防止される結果、蒸着金属の装荷量を増加し得る
とともに、蒸発効率が向上し、未蒸発金属として
廃棄される量はきわめて少量となるなどの効果を
有する。また全体が１本の線体からなるため、装
置へのセツトも容易であり、低コストで全体的に
各金属の重量バランスもよく、従来のものに比べ
て使用し易いなどの特長を有する。[Effects of the Invention] As described above, in this invention, the stranded wire core prevents wire breakage during energization heating, the divided metal wire prevents the evaporation metal wire from melting together as a whole, and the guard is further improved. As a result of preventing the dripping phenomenon of molten metal, the amount of deposited metal loaded can be increased, evaporation efficiency is improved, and the amount discarded as unevaporated metal is extremely small. In addition, since the entire wire is made of one wire, it is easy to set up in equipment, is low cost, has a good overall weight balance of each metal, and has features such as being easier to use than conventional wires.
図面はこの発明に係る金属蒸発線の構成を例示
するもので、第１図は一部を切除した正面図、第
２図はその拡大断面図である。
１……芯体、２……蒸発用金属線、３……区画
金属線、４……ガード。
The drawings illustrate the structure of the metal evaporation wire according to the present invention, and FIG. 1 is a partially cutaway front view, and FIG. 2 is an enlarged sectional view thereof. 1... Core body, 2... Metal wire for evaporation, 3... Division metal wire, 4... Guard.
Claims (1)
芯体とし、その芯体に所要本数の蒸発用金属線
を、該蒸発用金属線よりも高融点の金属による区
画線と共に巻線し、その巻線上に融点2500℃以上
の金属線によるガードを巻線してなることを特徴
とする金属蒸発線。 ２ 上記芯体及びガードはタングステン、モリブ
デン、タンタルなどの金属線からなる特許請求の
範囲第１項記載の金属蒸発線。[Scope of Claims] 1. A plurality of metal wires with a melting point of 2500°C or higher are twisted to form a core, and a required number of evaporation metal wires are attached to the core using a metal having a higher melting point than the evaporation metal wires. A metal evaporation wire characterized in that the wire is wound together with a partition wire according to the invention, and a guard made of a metal wire having a melting point of 2500°C or higher is wound on the winding. 2. The metal evaporation wire according to claim 1, wherein the core and the guard are made of metal wires such as tungsten, molybdenum, and tantalum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18209984A JPH0243823B2 (en) | 1984-08-31 | 1984-08-31 | KINZOKUJOHATSUSEN |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18209984A JPH0243823B2 (en) | 1984-08-31 | 1984-08-31 | KINZOKUJOHATSUSEN |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6160879A JPS6160879A (en) | 1986-03-28 |
| JPH0243823B2 true JPH0243823B2 (en) | 1990-10-01 |
Family
ID=16112325
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18209984A Expired - Lifetime JPH0243823B2 (en) | 1984-08-31 | 1984-08-31 | KINZOKUJOHATSUSEN |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0243823B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0417886U (en) * | 1990-06-01 | 1992-02-14 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4969281B2 (en) * | 2007-03-26 | 2012-07-04 | Ｃｏｓｍｏ・Ａ株式会社 | How to use heating equipment for vacuum deposition |
| WO2016024361A1 (en) * | 2014-08-14 | 2016-02-18 | 株式会社ユーテック | Filament electrode, plasma cvd device and method for manufacturing magnetic recording medium |
-
1984
- 1984-08-31 JP JP18209984A patent/JPH0243823B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0417886U (en) * | 1990-06-01 | 1992-02-14 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6160879A (en) | 1986-03-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |