JPH0243918A - Removal of residual moisture in atmospheric gas - Google Patents
Removal of residual moisture in atmospheric gasInfo
- Publication number
- JPH0243918A JPH0243918A JP63192037A JP19203788A JPH0243918A JP H0243918 A JPH0243918 A JP H0243918A JP 63192037 A JP63192037 A JP 63192037A JP 19203788 A JP19203788 A JP 19203788A JP H0243918 A JPH0243918 A JP H0243918A
- Authority
- JP
- Japan
- Prior art keywords
- moisture
- residual moisture
- atmospheric gas
- extremely low
- brought
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011734 sodium Substances 0.000 claims abstract description 36
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 32
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 30
- 238000000034 method Methods 0.000 claims description 14
- 239000006185 dispersion Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 abstract description 34
- 229910052751 metal Inorganic materials 0.000 abstract description 31
- 239000002184 metal Substances 0.000 abstract description 30
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 abstract description 24
- 150000002739 metals Chemical class 0.000 abstract description 19
- 239000000843 powder Substances 0.000 abstract description 11
- 239000007790 solid phase Substances 0.000 abstract description 10
- 239000011261 inert gas Substances 0.000 abstract description 7
- -1 hydroxide compound Chemical class 0.000 abstract description 3
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000002826 coolant Substances 0.000 abstract 1
- 239000007792 gaseous phase Substances 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 150000004679 hydroxides Chemical class 0.000 description 8
- 239000012071 phase Substances 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 6
- 239000003507 refrigerant Substances 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 239000003814 drug Substances 0.000 description 2
- 229940079593 drug Drugs 0.000 description 2
- 239000003208 petroleum Substances 0.000 description 2
- 150000003385 sodium Chemical class 0.000 description 2
- MPCRDALPQLDDFX-UHFFFAOYSA-L Magnesium perchlorate Chemical compound [Mg+2].[O-]Cl(=O)(=O)=O.[O-]Cl(=O)(=O)=O MPCRDALPQLDDFX-UHFFFAOYSA-L 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000007791 dehumidification Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
Landscapes
- Drying Of Gases (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Abstract
Description
【発明の詳細な説明】
［産業上の利用分野コ
本発明は、雰囲気ガス中の残存水分除去方法に係わり、
特に水酸化化合物を生成する活性金属の高純度微粉末（
ＩＩａ、Ｉ［［ａ、ＩＶａ、ＩＶｂ族金属）を製造する
にあたり、雰囲気ガス中の残存Ｒ量水分を除去する工程
において使用する方法に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for removing residual moisture in an atmospheric gas,
High-purity fine powder of active metals that produce especially hydroxide compounds (
The present invention relates to a method used in the process of removing residual R amount moisture in an atmospheric gas in producing IIa, I [[a, IVa, IVb group metals].
［従来の技術］
一般に、活性金属の酸化等を防止すべく、その金属のさ
らされる雰囲気を不活性ガス雰囲気や真空にすることは
周知の如くである。[Prior Art] Generally, it is well known that in order to prevent oxidation of active metals, the atmosphere to which the metals are exposed is set to an inert gas atmosphere or a vacuum.
近年、超電導材料等の発達による要請から活性金属の中
でも水酸化化合物を生成する活性金属（Ｉｌａ、１ｉｒ
ａ、ＩＶａ、■ｂ族金属）の高純度微粉末の製造が注目
されている。In recent years, due to the development of superconducting materials, active metals that generate hydroxide compounds (Ila, 1ir
The production of high-purity fine powders of group a, IVa, and b metals is attracting attention.
このような水酸化化合物を生成する活性金属は、その金
属のさらされる雰囲気を不活性ガス雰囲気や真空にして
も、その雰囲気中に微量でも水分が残存していると上記
水酸化化合物を生成してし、ようなめ、空孔等の欠陥が
発生する原因となっていた。Active metals that generate such hydroxide compounds will not generate the above hydroxide compounds if even a trace amount of moisture remains in the atmosphere, even if the metal is exposed to an inert gas atmosphere or a vacuum. This caused defects such as cracks, holes, and holes.
このような欠陥を防止すべく水分除去を行う従来技術と
しては、シリカゲル、硫酸、水酸化ナトリウム及び無水
過塩素酸マグネシウム等の薬物を使用し、て水分を吸着
する高濃度水分除去方法や、除湿機による水分除去があ
った。Conventional techniques for removing water to prevent such defects include high-concentration water removal methods that adsorb water using drugs such as silica gel, sulfuric acid, sodium hydroxide, and anhydrous magnesium perchlorate, and dehumidification methods. Water was removed by a machine.
［発明が解決しようとする課題］
し、かじ、これらの従来技術では雰囲気ガス中の残存水
分を極低濃度（１０〜１００１４／Ｖｌ）ｒｌｌ） ）
まで除去することはできなかった。[Problem to be solved by the invention] However, these conventional techniques reduce the residual moisture in the atmospheric gas to an extremely low concentration (10 to 10014/Vl))
It was not possible to remove it.
また、薬物による吸着法にあっては、雰囲気温度が上昇
し、たり、雰囲気圧力が減圧した場合に、吸着された水
分が再放出されるという問題があった。Furthermore, the adsorption method using drugs has the problem that the adsorbed water is re-released when the ambient temperature rises or the atmospheric pressure decreases.
上述の如き課題に鑑みて本発明は、水酸化化合物を生成
する活性金属（ｎａ、Ｉ［［ａ、ＩＶａ、ｒＶｂ族金属
）の高純度微粉末を得るべく雰囲気ガス中の残存水分を
極低濃度（１０〜１００Ｗ／Ｖｒｌｌ）ｂ ） （ｔで
除去することができる雰囲気ガス中の残存水分除去方法
を提供することを目的とするものである。In view of the above-mentioned problems, the present invention aims to minimize residual moisture in the atmospheric gas in order to obtain high-purity fine powder of active metals (na, I[[a, IVa, rVb group metals]) that generate hydroxide compounds. The purpose of this invention is to provide a method for removing residual moisture in an atmospheric gas that can remove the remaining moisture in an atmospheric gas at a concentration (10 to 100 W/Vrll) b ) (t).
［課題を解決するための手段］
上記目的を達成すべく本発明は、雰囲気ガス中の残存水
分を極低温で露結させ、該露結水分に金属ナトリウムを
接触させて上記残存水分を分解・除去するようにし、な
ものである。[Means for Solving the Problems] In order to achieve the above object, the present invention condenses residual moisture in an atmospheric gas at an extremely low temperature, and brings metal sodium into contact with the dew condensed moisture to decompose and decompose the residual moisture. Remove it and it will be fine.
また、雰囲気ガス中に金属ナトリウムの蒸気を発生させ
上記雰囲気ガス中に含まれる残存水分に分散接触させて
該残存水分を分解・除去するようにしたものである。Further, the vapor of metallic sodium is generated in the atmospheric gas and brought into dispersion contact with the residual moisture contained in the atmospheric gas to decompose and remove the residual moisture.
更に、雰囲気ガス中の残存水分を極低温で露結させ、該
露結水分に金属ナトリウムを接触させて上記残存水分を
分解・除去した後、雰囲気ガス中に金属ナトリウムの蒸
気を発生させ上記雰囲気ガス中に依然とし、て含まれる
残存微量水分に分散接触させて該残存微量水分を分解・
除去するようにしたものである。Furthermore, residual moisture in the atmospheric gas is dewdened at extremely low temperatures, metallic sodium is brought into contact with the condensed moisture to decompose and remove the residual moisture, and then metallic sodium vapor is generated in the atmospheric gas to reduce the atmosphere. Decomposes and decomposes the residual trace moisture still contained in the gas by dispersing and contacting it.
It was designed to be removed.
［作用］
雰囲気ガスを収容する容器に極低温冷媒を接触させると
上記雰囲気ガス中の残存水分はその容器の内壁に露結す
る。この露結した水分に金属ナトリウム塊を接触させる
と、いわゆる固相ゲッタとして作用し水酸化ナトリウム
が生成され、上記残存水分は水酸基として分解・除去さ
れるものである。[Operation] When a cryogenic refrigerant is brought into contact with a container containing atmospheric gas, residual moisture in the atmospheric gas is condensed on the inner wall of the container. When a metallic sodium lump is brought into contact with this dew-condensed water, it acts as a so-called solid-phase getter to generate sodium hydroxide, and the remaining water is decomposed and removed as hydroxyl groups.
また、雰囲気ガス中で金属ナトリウムを加熱してナトリ
ウム蒸気を発生させ分散させると、ナトリウム蒸気は上
記雰囲気ガス中に含まれる残存水分に分散接触し、いわ
ゆる気相ゲッタとして作用し、水酸化ナトリウムが生成
され、上記残存水分は水酸基として分解・除去されるも
のである。In addition, when metallic sodium is heated in an atmospheric gas to generate and disperse sodium vapor, the sodium vapor comes into contact with the residual moisture contained in the atmospheric gas and acts as a so-called gas phase getter, causing sodium hydroxide to The remaining moisture is decomposed and removed as hydroxyl groups.
更に、雰囲気ガスを収容する容器に極低温冷媒を接触さ
せると上記雰囲気ガス中の残存水分はその容器の内壁に
露結する。この露結した水分に金属ナトリウム塊を接触
させると、いわゆる固相ゲッタとして作用し水酸化ナト
リウムが生成され、上記残存水分は水酸基として分解・
除去されるものである。しかし１、上記雰囲気ガス中に
は露結しない残存微量水分が依然として含まれている。Further, when a cryogenic refrigerant is brought into contact with a container containing atmospheric gas, residual moisture in the atmospheric gas is condensed on the inner wall of the container. When a metallic sodium block is brought into contact with this dew-condensed water, it acts as a so-called solid phase getter and sodium hydroxide is generated, and the remaining water is decomposed and decomposed as hydroxyl groups.
It is something that will be removed. However, 1. the atmospheric gas still contains a trace amount of residual moisture that does not condense.
そこで、この残存微量水分が含まれている雰囲気ガス中
で金属ナトリウムを加熱してナトリウム蒸気を発生させ
分散させると、ナトリウム蒸気は上記雰囲気ガス中に含
まれる残存微量水分に分散接触し、いわゆる気相ゲッタ
として作用し、水酸化ナトリウムが生成され、上記固相
ゲッタで除去できなかった残存微量水分は水酸基とし、
て極低濃度（１０〜１００Ｗ／Ｖｐｐｂ ）まで分解・
除去されるものである。Therefore, when metallic sodium is heated in an atmospheric gas containing this residual trace moisture to generate and disperse sodium vapor, the sodium vapor comes into contact with the residual trace moisture contained in the atmospheric gas, and the so-called gas Acting as a phase getter, sodium hydroxide is generated, and residual trace water that could not be removed by the solid phase getter is converted into hydroxyl groups.
Decomposes and decomposes to extremely low concentrations (10 to 100W/Vppb)
It is something that will be removed.
［実施例］ 以下に本発明の好適一実施例を詳述する。[Example] A preferred embodiment of the present invention will be described in detail below.
まず、水酸化化合物を生成する活性金属（Ｉ［ａ、ｎ［
ａ、ＩＶａ、ｒＶｂ族金属）の高純度微粉末を生成する
ための密閉容器内を排気して真空雰囲気にする。その後
、当該容器内に不活性ガスを供給して置換する。このよ
うに水酸化化合物を生成する活性金属のさらされる雰囲
気を真空や不活性ガス雰囲気にし、ても、その雰囲気中
には微量の水分が残存している。次に、この密閉容器の
一側壁に極低温冷媒を接触させる。この極低温冷媒には
例えば液体窒素を使用し、−１５０°Ｃ以下に冷却する
。すると、上記雰囲気ガス中の残存水分はその容器の内
壁に露結する。そして、この露結しまた水分に棒状の金
属ナトリウム塊を接触させる。この棒状の金属ナトリウ
ム壇は上記不活性ガス雰囲気下で使用されるため発火す
ることなく、いわゆる固相ゲッタとして作用する。この
金属ナトリウム塊は発火を防止すべく例えば石油等の油
に浸漬させた状態で上記容器内に収容する。上記露結し
、た水分（Ｈ２Ｏ）に金属ナトリウム境（Ｎａ）が固相
ゲッタとして作用すると、
２Ｎａ＋２Ｈ２０→２ＮａＯＨ＋Ｈ２
の如く反応が起こり水酸化すｌ・リウム（ＮａＯ旧が生
成され、上記残存水分は水酸基として分解・除去される
ものである。First, active metals (I[a, n[
The inside of a closed container for producing high-purity fine powder of group a, IVa, rVb group metals is evacuated to create a vacuum atmosphere. Thereafter, an inert gas is supplied into the container for replacement. Even if the atmosphere to which the active metal that generates the hydroxide compound is exposed is made into a vacuum or an inert gas atmosphere, a small amount of moisture remains in the atmosphere. Next, a cryogenic refrigerant is brought into contact with one side wall of this sealed container. For example, liquid nitrogen is used as this cryogenic refrigerant, and is cooled to -150°C or lower. Then, the remaining moisture in the atmospheric gas condenses on the inner wall of the container. Then, a rod-shaped metallic sodium lump is brought into contact with this dew-condensed water. Since this rod-shaped metal sodium platform is used in the above-mentioned inert gas atmosphere, it does not catch fire and acts as a so-called solid-phase getter. This metallic sodium lump is housed in the container while being immersed in oil such as petroleum to prevent ignition. When the metal sodium boundary (Na) acts as a solid-phase getter on the dew-condensed moisture (H2O), a reaction occurs as follows: 2Na+2H20→2NaOH+H2, and sulfur and lithium hydroxide (NaO) are generated, and the remaining moisture is It is decomposed and removed as a hydroxyl group.
尚、この金属ナトリウム塊（Ｎａ）を固相ゲッタとして
作用させる水分除去方法は、別途出願した［活性金属の
高純度微粉末製造容器」にて開示した密閉容器及びこれ
に備えられた極低温露結装置を使用し、て行うものであ
る。The moisture removal method in which this metallic sodium lump (Na) acts as a solid phase getter is based on the sealed container and the cryogenic exposure device equipped with it, which are disclosed in the separately filed [Container for producing high-purity fine powder of active metals]. This is done using a tying device.
しかしながら、雰囲気ガス中には極低温冷却しても露結
しない微量の水分が残存している。固相ゲッタでは露結
した水分しか除去することはできない。However, a trace amount of moisture remains in the atmospheric gas, which does not condense even when cooled to a cryogenic temperature. A solid-phase getter can only remove condensed water.
そこで、次に上記容器内で金属ナトリウムを約６００″
Ｃで加熱・溶解してナトリウム蒸気を発生させる。この
金属ナトリウムは同様に発火を防止すべく例えば石油等
の油に浸漬させた状態で上記容器内に収容し、不活性ガ
ス中で取り出す。このナトリウム蒸気は密閉容器に分散
し、水分除去のための気相ゲッタとし、て作用する。雰
囲気ガス中の残存微量水分（Ｈ２Ｏ）にナトリウム蒸気
（Ｈａ）が気相ゲッタとして作用すると、
２Ｎａ＋２Ｈ２０−２ＮａＯＨ−１−Ｈ２の如く反応し
て水酸化ナトリウム（ＮａＯＨ）を生成し、上記残存水
分は水酸基として極低濃度（１０〜１００１４／Ｖｌｌ
ｌ）ｂ ）まで分解・除去することになる。Therefore, next, add about 600″ of metallic sodium in the above container.
Heating and melting with C generates sodium vapor. In order to similarly prevent ignition, this metallic sodium is stored in the container while being immersed in oil such as petroleum, and taken out in an inert gas atmosphere. This sodium vapor is dispersed in a closed container and acts as a gas phase getter for moisture removal. When sodium vapor (Ha) acts as a gas phase getter on residual trace moisture (H2O) in the atmospheric gas, it reacts as 2Na+2H20-2NaOH-1-H2 to produce sodium hydroxide (NaOH), and the residual moisture is Extremely low concentration (10-10014/Vll) as a hydroxyl group
l) b) will be disassembled and removed.
尚、このナトリウム蒸気（Ｎａ）を気相ゲッタとして作
用させる水分除去方法は、別途出願した「活性金属の高
純度微粉末製造容器」及び「ナトリウム蒸気発生装置」
にて開示した夫々の装置を使用して行うものである。The moisture removal method in which this sodium vapor (Na) acts as a gas-phase getter is described in the separately filed ``Container for producing high-purity fine powder of active metals'' and ``Sodium vapor generator.''
This is done using the respective devices disclosed in .
二のように本発明は、水酸化化合物を生成する活性金属
の高純度微粉末を製造する工程において雰囲気を浄化す
べく残存水分を除去するものであり、その特徴は水酸化
化合物を生成する活性金属（ＩＩａ、Ｉｌ［ａ、ＩＶａ
、ＩＶｂ族金属）の中でも最も水酸化化合物を生成しや
すい金属ナトリウムを固相ゲ／り或いは気相ゲッタとし
、て採用し、たことにある、これらの方法は所望の水分
除去度合いに応じて金属ナトリウムを固相ゲッタ或いは
気相ゲッタとして、又はこれらの両作用を利用し、てな
されるものである９本発明の雰囲気ガス中の残存水分除
去方法は簡単な方法ではあるが従来方法と比較するなら
ば、極微量の水分を敏感に分解・除去することが可能で
あり、雰囲気の温度変化や圧力変化が生じても水分を再
放出することがない。2, the present invention removes residual moisture in order to purify the atmosphere in the process of producing high-purity fine powder of active metals that generate hydroxide compounds. Metals (IIa, Il[a, IVa
Metallic sodium, which is the most likely to generate hydroxide compounds among the group IVb metals), is used as a solid-phase getter or a gas-phase getter. The method for removing residual moisture from atmospheric gas according to the present invention is simple, but compared to conventional methods, it is carried out using metallic sodium as a solid-phase getter or a gas-phase getter, or by using both of these functions. If this is done, it is possible to sensitively decompose and remove minute amounts of water, and no water will be released again even if the temperature or pressure of the atmosphere changes.
尚、本発明は水酸化化合物を生成する活性金属の高純度
微粉末を製造することを目的として雰囲気ガス中の残存
水分を除去するのに活用しているが、一般的には多目的
用途に使用することが可能である。Although the present invention is utilized to remove residual moisture in atmospheric gas for the purpose of producing high-purity fine powder of active metals that generate hydroxide compounds, it is generally used for multipurpose purposes. It is possible to do so.
［発明の効果コ
以上要するに本発明の請求項１、請求項２及び請求項３
によれば、水酸化化合物を生成す、る活性金属（Ｉｌａ
、Ｉ［Ｉａ、Ｎａ、ｒｖｂ族金属）の高純度微粉末を得
るべく雰囲気ガス中の残存水分を除去する、二とができ
る。[Effects of the Invention] In summary, claims 1, 2, and 3 of the present invention
According to
, I[Ia, Na, rvb group metals] can be obtained by removing residual moisture in the atmospheric gas to obtain high-purity fine powder.
その除去度合いは、請求項３〉請求項２〉請求項１の順
に優れており、上記請求項３にあっては極低濃度（１０
〜１００１４／Ｖｒ］１１１１ ＞まで水分除去するこ
とができる９
特許出願人 石川島播磨重工業株式会社有限会社石川
島マスターメタルThe degree of removal is excellent in the order of claim 3>claim 2>claim 1, and in claim 3, the extremely low concentration (10
~10014/Vr]1111>9 Patent applicant Ishikawajima Harima Heavy Industries Co., Ltd. Ishikawajima Master Metal Co., Ltd.
Claims (1)
結水分に金属ナトリウムを接触させて上記残存水分を分
解・除去するようにしたことを特徴とする雰囲気ガス中
の残存水分除去方法。 ２、雰囲気ガス中に金属ナトリウムの蒸気を発生させ上
記雰囲気ガス中に含まれる残存水分に分散接触させて該
残存水分を分解・除去するようにしたことを特徴とする
雰囲気ガス中の残存水分除去方法。 ３、請求項１の水分除去の後に、雰囲気ガス中に依然と
して含まれる残存微量水分を除去すべく請求項２の水分
除去を行うようにしたことを特徴とする雰囲気ガス中の
残存水分除去方法。[Scope of Claims] 1. An atmosphere characterized in that residual moisture in the atmospheric gas is condensed at extremely low temperatures, and metallic sodium is brought into contact with the dew condensed moisture to decompose and remove the residual moisture. Method for removing residual moisture in gas. 2. Removal of residual moisture in an atmospheric gas, characterized in that metallic sodium vapor is generated in the atmospheric gas and brought into dispersion contact with the residual moisture contained in the atmospheric gas to decompose and remove the residual moisture. Method. 3. A method for removing residual moisture in an atmospheric gas, characterized in that after the moisture removal according to claim 1, the moisture removal according to claim 2 is performed to remove residual trace amounts of moisture still contained in the atmospheric gas.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63192037A JPH0687938B2 (en) | 1988-08-02 | 1988-08-02 | Method for removing residual water in atmospheric gas |
| DE1989614213 DE68914213T2 (en) | 1988-07-25 | 1989-07-24 | Method and apparatus for purifying atmospheric gas used for the production of high-purity fine particles of reactive metals. |
| EP93106256A EP0564000B1 (en) | 1988-07-25 | 1989-07-24 | Method and apparatus for detecting moisture present in atmosphere gas |
| EP89113587A EP0356698B1 (en) | 1988-07-25 | 1989-07-24 | Method and apparatus for cleaning atmosphere gas used in making high-purity fine particles of reactive metals |
| DE1989627741 DE68927741T2 (en) | 1988-07-25 | 1989-07-24 | Method and apparatus for the detection of moisture in the gas atmosphere |
| US07/737,121 US5180554A (en) | 1988-07-25 | 1991-07-29 | Method of detecting the presence of moisture in a gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63192037A JPH0687938B2 (en) | 1988-08-02 | 1988-08-02 | Method for removing residual water in atmospheric gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0243918A true JPH0243918A (en) | 1990-02-14 |
| JPH0687938B2 JPH0687938B2 (en) | 1994-11-09 |
Family
ID=16284554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63192037A Expired - Lifetime JPH0687938B2 (en) | 1988-07-25 | 1988-08-02 | Method for removing residual water in atmospheric gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0687938B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5520523A (en) * | 1992-06-22 | 1996-05-28 | Nippondenso Co., Ltd. | Diaphragm-type pump |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5278800A (en) * | 1975-12-26 | 1977-07-02 | Japan Atom Energy Res Inst | Drying of ammonia gas flow |
| JPS6174641A (en) * | 1984-09-20 | 1986-04-16 | Tatsuo Ido | Method for manufacturing metal sodium coating |
-
1988
- 1988-08-02 JP JP63192037A patent/JPH0687938B2/en not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5278800A (en) * | 1975-12-26 | 1977-07-02 | Japan Atom Energy Res Inst | Drying of ammonia gas flow |
| JPS6174641A (en) * | 1984-09-20 | 1986-04-16 | Tatsuo Ido | Method for manufacturing metal sodium coating |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5520523A (en) * | 1992-06-22 | 1996-05-28 | Nippondenso Co., Ltd. | Diaphragm-type pump |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0687938B2 (en) | 1994-11-09 |
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