JPH0244257B2 - INGAZNMGO5DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO - Google Patents
INGAZNMGO5DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHOInfo
- Publication number
- JPH0244257B2 JPH0244257B2 JP1750187A JP1750187A JPH0244257B2 JP H0244257 B2 JPH0244257 B2 JP H0244257B2 JP 1750187 A JP1750187 A JP 1750187A JP 1750187 A JP1750187 A JP 1750187A JP H0244257 B2 JPH0244257 B2 JP H0244257B2
- Authority
- JP
- Japan
- Prior art keywords
- compound
- oxide
- gallium
- indium
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 24
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 12
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 12
- 239000011701 zinc Substances 0.000 claims description 12
- 239000011777 magnesium Substances 0.000 claims description 10
- 229910052733 gallium Inorganic materials 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 8
- 229910052738 indium Inorganic materials 0.000 claims description 8
- 239000000395 magnesium oxide Substances 0.000 claims description 8
- 229910052725 zinc Inorganic materials 0.000 claims description 8
- 229910052749 magnesium Inorganic materials 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 6
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 6
- 239000011787 zinc oxide Substances 0.000 claims description 6
- AJNVQOSZGJRYEI-UHFFFAOYSA-N digallium;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Ga+3].[Ga+3] AJNVQOSZGJRYEI-UHFFFAOYSA-N 0.000 claims description 4
- 229910001195 gallium oxide Inorganic materials 0.000 claims description 4
- 229910003437 indium oxide Inorganic materials 0.000 claims description 4
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 4
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 239000000463 material Substances 0.000 description 9
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 239000000843 powder Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000013078 crystal Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000000634 powder X-ray diffraction Methods 0.000 description 2
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Catalysts (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
産業上の利用分野
本発明は光機能材料、半導体材料等として有用
な新規化合物であるInSaZnMgO5で示される六方
晶系の層状構造を有する化合物及びその製造法に
関する。
従来技術
従来(Yb3+Fe3+O3)oFe2+O(nは整数を表わ
す)で示される六方晶系の層状構造を有する化合
物は、本出願人によつて合成され、知られてい
る。
YbFe2O4、Yb2Fe3O7、Yb3Fe4O10、及び
Yb4Fe5O13の六方晶系としての格子定数、YbO1.5
層、FeO1.5層、Fe2O2.5層の単位格子内における
層数を示すと表−1の通りである。
INDUSTRIAL APPLICATION FIELD The present invention relates to a compound having a hexagonal layered structure represented by InSaZnMgO 5 , which is a new compound useful as an optical functional material, a semiconductor material, etc., and a method for producing the same. Prior Art A conventional compound having a hexagonal layered structure represented by (Yb 3+ Fe 3+ O 3 ) o Fe 2+ O (n represents an integer) was synthesized by the applicant and is a known compound. ing. YbFe2O4 , Yb2Fe3O7 , Yb3Fe4O10 , and _
Lattice constant of Yb 4 Fe 5 O 13 as hexagonal system, YbO 1.5
Table 1 shows the number of layers in the unit cell, FeO 1.5 layer, and Fe 2 O 2.5 layer.
【表】【table】
【表】
これらの化合物は酸化鉄(FeO)1モルに対し
て、YbFeO3がn(n:1、2、3、…)モルの
割合で化合していると考えられる層状構造を持つ
化合物である。
発明の目的
本発明は前記(YbFeO3)oFeOの化学式におい
て、n=1/2で、Yb3+の代わりにIn3+を、Fe3+の
代わりにGa3+を、Fe2+の代わりに(Zn2++
Mg2+)を置きかえられた新規化合物を提供する
にある。
発明の構成
本発明の化合物はInGaZnMgO5で示され、イ
オン結晶モデルでは、In3+(Ga3+Zn2+)
Mg2+O5 2-として記述され、その構造はInO1.5層、
(GaZn)O2.5層及びMgO層の積層によつて形成
されており、著しい構造異方性を持つていること
がその特徴の一つである。
Zn2+はGa3+と共に(GaZn)O2.5層を作り、
Mg2+はMgO層を作つている。六方晶系としての
格子定数は以下の通りである。
a=3.300±0.001(Å)
c=22.30±0.01(Å)
この化合物の面指数(hkl)、面間隔(d(Å))
(dpは実測値、dcは計算値を示す〕及びX線に対
する相対反射強度I(%)を表−2に示す。[Table] These compounds are compounds with a layered structure in which n (n: 1, 2, 3,...) moles of YbFeO 3 are combined with 1 mole of iron oxide (FeO). be. Purpose of the Invention The present invention is based on the above chemical formula of (YbFeO 3 ) o FeO, where n=1/2, In 3+ instead of Yb 3+ , Ga 3+ instead of Fe 3+ , and Fe 2+ . Instead (Zn 2+ +
The object of the present invention is to provide a novel compound that can replace Mg 2+ ). Structure of the Invention The compound of the present invention is represented by InGaZnMgO 5 , and in the ionic crystal model, In 3+ (Ga 3+ Zn 2+ )
Described as Mg 2+ O 5 2- , its structure consists of 1.5 layers of InO,
It is formed by laminating a (GaZn)O 2.5 layer and a MgO layer, and one of its characteristics is that it has significant structural anisotropy. Zn 2+ forms a (GaZn)O 2.5 layer with Ga 3+ ,
Mg 2+ forms the MgO layer. The lattice constants as a hexagonal crystal system are as follows. a=3.300±0.001 (Å) c=22.30±0.01 (Å) Planar index (hkl), interplanar spacing (d (Å)) of this compound
(d p is the measured value, d c is the calculated value) and the relative reflection intensity I (%) for X-rays are shown in Table 2.
【表】【table】
【表】【table】
【表】
この化合物は光機能材料、半導体材料及び触媒
材料などとして利用し得られる。
蛍光体、半導体用の素子としての利用が挙げら
れる。
この化合物は次の方法で製造し得られる。
金属インジウムあるいは酸化インジウムもしく
は加熱により酸化インジウムに分解される化合物
と、金属ガリウムあるいは酸化ガリウムもしくは
加熱により酸化ガリウムに分解される化合物と、
金属亜鉛いらうに酸化亜鉛もしくは加熱により酸
化亜鉛に分解される化合物と、金属マグネシウム
あるいは酸化マグネシウムもしくは加熱により酸
化マグネシウムに分解される化合物とを、インジ
ウム、ガリウム、亜鉛及びマグネシウムの割合が
原子比で1対1対1対1になるように混合して、
該混合物を600℃以上のもとで、大気中、酸化性
雰囲気中あるいはインジウム及びガリウムが各々
3価状態、亜鉛及びマグネシウムが各々2価状態
より還元されない程度の還元雰囲気中で加熱する
ことによつて製造し得られる。
本発明に用いる出発物質は市販の物をそのまま
使用してもよいが、化学反応を速やかに進行させ
るためには粒径が小さい方がよく、特に10μm以
下であることが好ましい。また、光機能材料、半
導体材料として用いる場合には不純物の混入をき
らうので、純度の高い物が好ましい。この原料を
そのままあるいはアルコール類もしくはアセトン
等と共に充分混合する。
これらの混合割合は、In、Ga、Zn及びMgの割
合が原子比で1対1対1対1の割合である。この
割合がはずれると目的とする化合物の単一相が得
られない。この混合物を大気中あるいは酸化性雰
囲気中もしくはIn及びGaが各々3価イオン状態、
Zn及びMgが各々2価状態から還元され得ない程
度の還元雰囲気中で600℃以上で加熱する。加熱
時間は数時間もしくはそれ以上である。加熱の際
の昇温速度に制約はない。加熱終了後0℃に急冷
するかあるいは大気中に急激に引き出せばよい。
得られた化合物の粉末は無色で、粉末X線回折法
によると結晶構造を有することがわかつた。その
結晶構造は層状構造であり、InO1.5層、(Ga、
Zn)O2.5層、及びMgO層の積み重ねによつて形
成されている。
実施例
純度99.99%以上のIn2O3粉末、純度99.9%以上
のGa2O3粉末、試薬特級のZnO及び試薬特級の
MgO粉末をモル比で1対1対2対2の割合に秤
量し、めのう乳鉢内でエタノールを加えて約30分
間混合し、平均粒径数μmの微粉状混合物を得
た。この混合物を白金管内に封入し、1300℃に設
定された炉内に入れ、3日間加熱し、その後試料
を炉外に取り出し、室温まで急速に冷却した。
得られた試料はInSaZnMgO5の単一相であり、
粉末X線回折法によつて各反射の面間隔dp(Å)
及び相対反射強度を測定した。その結果は前記表
−2の通りであつた。
六方晶系としての格子定数は
a=3.300±0.001(Å)
c=22.30±0.001(Å)
であつた。
上記の格子定数及び表−2の各反射(hkl)よ
り算出した面間隔(dc(Å))は実測の面間隔(dp
(Å))と極めてよく一致している。
発明の効果
本発明は光機能材料、半導体材料及び触媒とし
て有用な新規化合物を提供する。[Table] This compound can be used as a photofunctional material, a semiconductor material, a catalyst material, etc. Examples include use as a phosphor and a semiconductor element. This compound can be produced by the following method. Metallic indium or indium oxide or a compound that is decomposed into indium oxide by heating; Metallic gallium or gallium oxide or a compound that is decomposed into gallium oxide by heating;
The ratio of indium, gallium, zinc, and magnesium is 1 in atomic ratio of metallic zinc, zinc oxide, or a compound decomposed to zinc oxide by heating, and metallic magnesium, magnesium oxide, or a compound decomposed to magnesium oxide by heating. Mix it in a ratio of 1:1:1,
The mixture is heated at 600°C or higher in the air, in an oxidizing atmosphere, or in a reducing atmosphere such that indium and gallium are not reduced to their trivalent state, and zinc and magnesium are not reduced to their divalent state. It can be manufactured and obtained. Commercially available starting materials for use in the present invention may be used as they are, but in order for the chemical reaction to proceed quickly, the particle size is preferably small, particularly preferably 10 μm or less. Further, when used as an optical functional material or a semiconductor material, a highly pure material is preferable because contamination with impurities is avoided. This raw material is thoroughly mixed as it is or with an alcohol, acetone, or the like. The mixing ratio of these is such that the ratio of In, Ga, Zn, and Mg is 1:1:1:1 in terms of atomic ratio. If this ratio is off, a single phase of the target compound cannot be obtained. This mixture is stored in the air or in an oxidizing atmosphere, or when In and Ga are each in a trivalent ion state,
It is heated at 600° C. or higher in a reducing atmosphere to such an extent that Zn and Mg cannot be reduced from their divalent state. Heating time is several hours or more. There are no restrictions on the rate of temperature increase during heating. After heating, it may be rapidly cooled to 0°C or rapidly drawn out into the atmosphere.
The powder of the obtained compound was colorless and was found to have a crystalline structure by powder X-ray diffraction. Its crystal structure is a layered structure, with 1.5 layers of InO, (Ga,
It is formed by stacking Zn)O 2.5 layer and MgO layer. Examples In 2 O 3 powder with a purity of 99.99% or more, Ga 2 O 3 powder with a purity of 99.9% or more, reagent grade ZnO, and reagent grade ZnO
MgO powder was weighed at a molar ratio of 1:1:2:2, ethanol was added in an agate mortar, and the mixture was mixed for about 30 minutes to obtain a fine powder mixture with an average particle size of several μm. This mixture was sealed in a platinum tube, placed in a furnace set at 1300°C, heated for 3 days, and then the sample was taken out of the furnace and rapidly cooled to room temperature. The obtained sample is a single phase of InSaZnMgO5 ,
The interplanar spacing d p (Å) of each reflection was determined by powder X-ray diffraction method.
and the relative reflection intensity was measured. The results were as shown in Table 2 above. The lattice constants as a hexagonal crystal system were a=3.300±0.001 (Å) and c=22.30±0.001 (Å). The interplanar spacing (d c (Å)) calculated from the above lattice constant and each reflection (hkl) in Table 2 is the actual interplanar spacing (d p
(Å)) is in excellent agreement. Effects of the Invention The present invention provides novel compounds useful as optical functional materials, semiconductor materials, and catalysts.
Claims (1)
造を有する化合物。 2 金属インジウムあるいは酸化インジウムもし
くは加熱により酸化インジウムに分解される化合
物と、金属ガリウムあるいは酸化ガリウムもしく
は加熱により酸化ガリウムに分解される化合物
と、金属亜鉛あるいは酸化亜鉛もしくは加熱によ
り酸化亜鉛に分解される化合物と、金属マグネシ
ウムあるいは酸化マグネシウムもしくは加熱によ
り酸化マグネシウムに分解される化合物とを、イ
ンジウム、ガリウム、亜鉛及びマグネシウムの割
合が原子比で1対1対1対1になるように混合し
て、該混合物を600℃以上のもとで、大気中、酸
化性雰囲気中あるいはインジウム及びガリウムが
各々3価状態、亜鉛及びマグネシウムが各々2価
状態より還元されない程度の還元雰囲気中で加熱
することを特徴とするInGaZnMgO5で示される
六方晶系の層状構造を有する化合物の製造法。[Claims] 1. A compound having a hexagonal layered structure represented by InGaZnMgO 5 . 2 Metallic indium or indium oxide or a compound that decomposes into indium oxide when heated; Metallic gallium or gallium oxide or a compound that decomposes into gallium oxide when heated; Metallic zinc or zinc oxide or a compound that decomposes into zinc oxide when heated. and magnesium metal, magnesium oxide, or a compound decomposed into magnesium oxide by heating, such that the atomic ratio of indium, gallium, zinc, and magnesium is 1:1:1:1, and the mixture is prepared. is heated at a temperature of 600°C or higher in the air, in an oxidizing atmosphere, or in a reducing atmosphere to the extent that indium and gallium are not reduced to a trivalent state, and zinc and magnesium are not reduced to a divalent state. A method for producing a compound having a hexagonal layered structure represented by InGaZnMgO5 .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1750187A JPH0244257B2 (en) | 1987-01-28 | 1987-01-28 | INGAZNMGO5DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1750187A JPH0244257B2 (en) | 1987-01-28 | 1987-01-28 | INGAZNMGO5DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63185819A JPS63185819A (en) | 1988-08-01 |
| JPH0244257B2 true JPH0244257B2 (en) | 1990-10-03 |
Family
ID=11945738
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1750187A Expired - Lifetime JPH0244257B2 (en) | 1987-01-28 | 1987-01-28 | INGAZNMGO5DESHIMESARERUROTSUHOSHOKEINOSOJOKOZOOJUSURUKAGOBUTSUOYOBISONOSEIZOHO |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0244257B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3947575B2 (en) * | 1994-06-10 | 2007-07-25 | Hoya株式会社 | Conductive oxide and electrode using the same |
-
1987
- 1987-01-28 JP JP1750187A patent/JPH0244257B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63185819A (en) | 1988-08-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |