JPH0245796Y2 - - Google Patents
Info
- Publication number
- JPH0245796Y2 JPH0245796Y2 JP18069383U JP18069383U JPH0245796Y2 JP H0245796 Y2 JPH0245796 Y2 JP H0245796Y2 JP 18069383 U JP18069383 U JP 18069383U JP 18069383 U JP18069383 U JP 18069383U JP H0245796 Y2 JPH0245796 Y2 JP H0245796Y2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- removal body
- stage
- interference
- gases
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 97
- 230000002452 interceptive effect Effects 0.000 claims description 9
- 238000000354 decomposition reaction Methods 0.000 claims description 3
- 239000003054 catalyst Substances 0.000 description 14
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 238000005259 measurement Methods 0.000 description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 9
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 7
- 229910002091 carbon monoxide Inorganic materials 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 3
- 239000005977 Ethylene Substances 0.000 description 3
- 239000001273 butane Substances 0.000 description 3
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 3
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 3
- 239000001294 propane Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229910001361 White metal Inorganic materials 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000011491 glass wool Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000010969 white metal Substances 0.000 description 1
Landscapes
- Sampling And Sample Adjustment (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
Description
この考案は、ガスの濃度等を測定するガス測定
器の前段に接続され、被検ガス以外の干渉ガスを
除去する干渉ガス除去装置に関する。
一般に、大気中には排気ガス等により水素、一
酸化炭素、炭化水素ガス等が含まれているが、こ
のようなガスは、ある特定の種類のガスを測定す
る場合に被検ガスに粉れ込み、測定に干渉して結
果に誤差を生じさせる。このため、従来において
は、ガス測定器のガス選択性および精度を向上さ
せるために、前処理によつて前述のような干渉ガ
スを除去することが行なわれており、例えば、ガ
ス測定器の前段に、活性炭、シリカゲル、ロ紙等
を単体又は組み合わせて配置している。しかしな
がら、このようなものは水素、一酸化炭素さらに
は還元性ガスに対する吸着能が低いため、これら
の干渉ガスを充分に除去できないという問題点が
あつた。
この考案は前述の問題点に着目してなされたも
ので、水素、一酸化炭素さらには還元性ガスから
なる干渉ガスを確実に除去して、ガス選択性およ
び精度を向上させることを目的としている。
このような目的は、ガスの濃度等を測定するガ
ス測定器の前段に接続され、被検ガス以外の干渉
ガスを除去する干渉ガス除去装置であつて、白金
属触媒およびホプカライト触媒を直列に配置して
構成され被検ガスの分解温度未満に加熱された前
段除去体と、除湿剤から構成された後段除去体
と、を備えることにより達成することができる。
以下、この考案の一実施例の構成を図面に基づ
いて説明する。
図面において、１は被検ガス、例えば三フツ化
窒素（NF3）ガス、メタン（CH4）ガス、の濃度
等を測定するガス測定器であり、このガス測定器
１は活性炭が収納された活性炭ケース２およびロ
紙、綿、グラスウールが収納されたフイルタケー
ス３を有し、これらの活性炭ケース２、フイルタ
ケース３内を次々と通過した測定ガスは半導体式
又は定電位電解方式等のガスセンサ４に送られ、
被検ガスの濃度等が測定される。このガス測定器
１の前段には干渉ガス除去装置５が接続されてい
る。この干渉ガス除去装置５は前段除去体６に測
定ガスを導びく導入管７を有し、前記測定ガスに
は、前述した被検ガスと、この被検ガスの濃度等
をガスセンサ４で測定する際、この測定を干渉す
る干渉ガス、例えば水素ガス、一酸化炭素ガス、
ブタンガス、プロパンガス、エチレンガス、メタ
ノールガス、アセトンガスと、が含まれている。
前記前段除去体６はステンレススチール又はガラ
スからなるケース８を有し、このケース８内には
白金属触媒９およびホプカライト触媒１０がこの
順序で直列に配置収納されている。この結果、測
定ガスは白金属触媒９、ホプカライト触媒１０に
次々と接触した後、接続管１１を通つて後段除去
体１２に導びかれる。前記白金属触媒９としては
白金属元素およびこの酸化物が使用され、例え
ば、白金、パラジウム、ロジウム、前記元素の酸
化物またはこれらの混合物、合金である。なお、
この実施例ではケース８内に白金属触媒９、ホプ
カライト触媒１０の順序で直列配置したが、この
考案においては、ホプカライト触媒１０、白金属
触媒９の順序で直列配置してもよい。前記前段除
去体６は恒温加熱槽１３内に収納され、この恒温
加熱槽１３により前段除去体６は前記被検ガスの
分解温度未満、すなわち220℃未満、に加熱され
る。この温度以上になると、被検ガスが熱分解し
て濃度等が測定できなくなるからである。また、
この前段除去体６は130℃以上の温度に加熱する
のが好ましい。その理由は、この温度未満である
と、後掲した実施例から明らかなように最も除去
し難い水素ガスを前段除去体６で充分に除去でき
ないからである。したがつて、前段除去体６は
130℃から220℃の範囲に加熱するのが好ましいこ
とになる。前記後段除去体１２は恒温加熱槽１３
外に設置され、ステンレススチール又はガラスか
らなるケース１４と、このケース１４内に収納さ
れた除湿剤１５、例えばシリカゲル、と、から構
成されている。後段除去体１２を通過した測定ガ
スは冷却用の銅管１６を通つた後前記ガス測定器
１に導びかれる。前述した前段除去体６、接続管
１１、後段除去体１２および恒温加熱槽１３は全
体として干渉ガス除去装置５を構成する。
次に、この考案の一実施例の作用について説明
する。
まず、被検ガス、干渉ガスを含む測定ガスを導
入管７を通じて前段除去体６に導びき、白金属触
媒９、ホプカライト触媒１０に次々と接触させ
る。このとき、前段除去体６は、恒温加熱槽１３
により130℃から220℃までの範囲内の一定温度に
加熱されているため、干渉ガス中の水素ガス、ブ
タンガス、プロパンガス、エチレンガス、メタノ
ールガス、アセトンガスは白金属触媒９により酸
化され、不活性化されるとともに水分が生成され
る。また、干渉ガス中の一酸化炭素はホプカライ
ト触媒１０により酸化され、不活性化される。こ
のようにして被検ガスは熱分解されることなく干
渉ガスの干渉能が除去される。次に、測定ガスは
接続管１１を通つて後段除去体１２に導びかれ、
この後段除去体１２においてガスセンサ４に悪影
響を与える前記水分が吸湿除去される。次に、測
定ガスは銅管１６において常温に冷却された後ガ
ス測定器１に導びかれる。このガス測定器１にお
いて測定ガスは活性炭ケース２、フイルタケース
３内を次々と通過した後ガスセンサ４に導びか
れ、該ガスセンサ４において被検ガスの濃度が測
定される。
以下に示す表は、被検ガスとして三フッ化窒素
ガスが10ppm含まれ、干渉ガスとして水素ガスが
10ppm、一酸化炭素ガスが30ppm、ブタンガスが
10ppm、プロパンガスが10ppm、エチレンガスが
10ppm、メタノールガスが1000ppm、アセトンガ
スが1000ppm含まれた測定ガスを前記干渉ガス除
去装置によつて処理した後の各ガスの濃度
（ppm）を示したもので、前段除去体６を100℃、
130℃、160℃、190℃、220℃の各温度に加熱して
測定したものである。
This invention relates to an interference gas removal device that is connected upstream of a gas measuring instrument that measures gas concentration, etc., and that removes interference gases other than the gas to be measured. Generally, the atmosphere contains hydrogen, carbon monoxide, hydrocarbon gases, etc. due to exhaust gas, etc., but when measuring certain types of gases, these gases are dispersed into the sample gas. interference with the measurement, causing errors in the results. Therefore, in the past, in order to improve the gas selectivity and accuracy of gas measuring instruments, the above-mentioned interfering gases have been removed through pretreatment. Activated carbon, silica gel, wax paper, etc. are placed singly or in combination. However, since such materials have a low adsorption capacity for hydrogen, carbon monoxide, and reducing gases, there is a problem that these interfering gases cannot be removed sufficiently. This idea was created with a focus on the above-mentioned problems, and aims to improve gas selectivity and accuracy by reliably removing interfering gases such as hydrogen, carbon monoxide, and reducing gases. . This purpose is an interference gas removal device that is connected to the front stage of a gas measuring device that measures gas concentration, etc., and removes interference gases other than the target gas. This can be achieved by including a first-stage removal body configured as above and heated below the decomposition temperature of the gas to be detected, and a second-stage removal body configured from a dehumidifying agent. Hereinafter, the configuration of an embodiment of this invention will be explained based on the drawings. In the drawing, 1 is a gas measuring device for measuring the concentration of a gas to be detected, such as nitrogen trifluoride (NF 3 ) gas, methane (CH 4 ) gas, etc. This gas measuring device 1 houses activated carbon. It has an activated carbon case 2 and a filter case 3 in which paper, cotton, and glass wool are housed, and the measurement gas that has passed through the activated carbon case 2 and filter case 3 one after another is detected by a gas sensor 4 such as a semiconductor type or constant potential electrolysis type. sent to,
The concentration of the test gas, etc. is measured. An interference gas removal device 5 is connected upstream of the gas measuring device 1. This interference gas removal device 5 has an introduction pipe 7 that guides a measurement gas to a pre-stage removal body 6, and the measurement gas includes the above-mentioned test gas and the concentration etc. of this test gas is measured with a gas sensor 4. Interfering gases that interfere with this measurement, such as hydrogen gas, carbon monoxide gas, etc.
Contains butane gas, propane gas, ethylene gas, methanol gas, and acetone gas.
The pre-stage removal body 6 has a case 8 made of stainless steel or glass, and a platinum metal catalyst 9 and a hopcalite catalyst 10 are arranged and housed in series in this order in the case 8. As a result, the measurement gas comes into contact with the platinum metal catalyst 9 and the hopcalite catalyst 10 one after another, and then is led to the latter-stage removal body 12 through the connecting pipe 11 . As the platinum metal catalyst 9, a platinum metal element and its oxide are used, such as platinum, palladium, rhodium, oxides of the above elements, or mixtures and alloys thereof. In addition,
In this embodiment, the platinum metal catalyst 9 and the hopcalite catalyst 10 are arranged in series in this order in the case 8, but in this invention, the hopcalite catalyst 10 and the platinum metal catalyst 9 may be arranged in series in this order. The pre-stage removal body 6 is housed in a constant temperature heating tank 13, and the pre-stage removal body 6 is heated by the constant temperature heating tank 13 to a temperature below the decomposition temperature of the gas to be detected, that is, below 220°C. This is because if the temperature exceeds this temperature, the sample gas will thermally decompose, making it impossible to measure the concentration, etc. Also,
This pre-stage removal body 6 is preferably heated to a temperature of 130° C. or higher. The reason for this is that if the temperature is below this temperature, hydrogen gas, which is the most difficult to remove, cannot be sufficiently removed by the first-stage removal body 6, as is clear from the examples listed below. Therefore, the first stage removal body 6 is
It will be preferred to heat to a range of 130°C to 220°C. The latter stage removal body 12 is a constant temperature heating tank 13
It consists of a case 14 installed outside and made of stainless steel or glass, and a dehumidifier 15, such as silica gel, housed within this case 14. The measurement gas that has passed through the latter-stage removal body 12 is guided to the gas measuring device 1 after passing through a cooling copper pipe 16. The aforementioned front-stage removal body 6, connection pipe 11, rear-stage removal body 12, and constant temperature heating tank 13 collectively constitute the interference gas removal device 5. Next, the operation of one embodiment of this invention will be explained. First, a measurement gas containing a test gas and an interference gas is led to the first-stage removal body 6 through the introduction pipe 7, and brought into contact with the platinum metal catalyst 9 and the hopcalite catalyst 10 one after another. At this time, the pre-stage removal body 6 is heated in the constant temperature heating tank 13.
Since the interfering gases such as hydrogen gas, butane gas, propane gas, ethylene gas, methanol gas, and acetone gas are heated to a constant temperature within the range of 130°C to 220°C by Moisture is generated along with activation. Furthermore, carbon monoxide in the interference gas is oxidized and inactivated by the hopcalite catalyst 10. In this way, the interfering ability of the interfering gas is removed without thermally decomposing the sample gas. Next, the measurement gas is led to the subsequent removal body 12 through the connecting pipe 11,
The moisture that adversely affects the gas sensor 4 is absorbed and removed in this latter-stage removal body 12 . Next, the measurement gas is cooled to room temperature in the copper tube 16 and then introduced to the gas measuring device 1. In this gas measuring device 1, a gas to be measured passes through an activated carbon case 2 and a filter case 3 one after another, and then is led to a gas sensor 4, where the concentration of the gas to be detected is measured. The table below contains 10 ppm of nitrogen trifluoride gas as the test gas and hydrogen gas as the interference gas.
10ppm, carbon monoxide gas 30ppm, butane gas
10ppm, propane gas 10ppm, ethylene gas
This shows the concentration (ppm) of each gas after the measurement gas containing 10 ppm of methanol gas, 1000 ppm of methanol gas, and 1000 ppm of acetone gas was processed by the interference gas removal device.
Measurements were made by heating to 130°C, 160°C, 190°C, and 220°C.
【表】【table】
【表】
以上説明したように、この考案によれば、水
素、一酸化炭素さらには還元性ガスからなる干渉
ガスを確実に除去して、ガス選択性および精度を
向上させることができる。[Table] As explained above, according to this invention, interfering gases including hydrogen, carbon monoxide, and reducing gases can be reliably removed, and gas selectivity and accuracy can be improved.
図面はこの考案の一実施例を示す概略断面図で
ある。
１……ガス測定器、６……前段除去体、９……
白金属触媒、１０……ホプカライト触媒、１２…
…後段除去体、１５……除湿剤。
The drawing is a schematic sectional view showing an embodiment of this invention. 1...Gas measuring device, 6...Pre-stage removal body, 9...
White metal catalyst, 10...Hopcalite catalyst, 12...
...Later stage removal body, 15...Dehumidifier.
Claims (1)
続され、被検ガス以外の干渉ガスを除去する干渉
ガス除去装置であつて、白金属触媒およびホプカ
ライト触媒を直列に配置して構成され被検ガスの
分解温度未満に加熱された前段除去体と、除湿剤
から構成された後段除去体と、を備えたことを特
徴とする干渉ガス除去装置。 This is an interference gas removal device that is connected to the front stage of a gas measuring instrument that measures gas concentration, etc., and removes interference gases other than the test gas. An interfering gas removal device comprising: a first stage removal body heated below the gas decomposition temperature; and a second stage removal body made of a dehumidifier.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18069383U JPS6088254U (en) | 1983-11-22 | 1983-11-22 | Interference gas removal device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18069383U JPS6088254U (en) | 1983-11-22 | 1983-11-22 | Interference gas removal device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6088254U JPS6088254U (en) | 1985-06-17 |
| JPH0245796Y2 true JPH0245796Y2 (en) | 1990-12-04 |
Family
ID=30391725
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18069383U Granted JPS6088254U (en) | 1983-11-22 | 1983-11-22 | Interference gas removal device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6088254U (en) |
-
1983
- 1983-11-22 JP JP18069383U patent/JPS6088254U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6088254U (en) | 1985-06-17 |
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