JPH0247285A - Method for producing highly corrosion-resistant chromium-molybdenum alloy film - Google Patents
Method for producing highly corrosion-resistant chromium-molybdenum alloy filmInfo
- Publication number
- JPH0247285A JPH0247285A JP19736988A JP19736988A JPH0247285A JP H0247285 A JPH0247285 A JP H0247285A JP 19736988 A JP19736988 A JP 19736988A JP 19736988 A JP19736988 A JP 19736988A JP H0247285 A JPH0247285 A JP H0247285A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- film
- alloy
- chromium
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005260 corrosion Methods 0.000 title claims abstract description 20
- 230000007797 corrosion Effects 0.000 title claims abstract description 20
- 229910001182 Mo alloy Inorganic materials 0.000 title claims abstract description 14
- VNTLIPZTSJSULJ-UHFFFAOYSA-N chromium molybdenum Chemical compound [Cr].[Mo] VNTLIPZTSJSULJ-UHFFFAOYSA-N 0.000 title claims description 25
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 238000007747 plating Methods 0.000 claims abstract description 41
- 238000009713 electroplating Methods 0.000 claims abstract description 8
- 150000001845 chromium compounds Chemical class 0.000 claims description 6
- 239000005078 molybdenum compound Substances 0.000 claims description 6
- 150000002752 molybdenum compounds Chemical class 0.000 claims description 6
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 abstract 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 3
- 229910004616 Na2MoO4.2H2 O Inorganic materials 0.000 abstract 1
- FDEIWTXVNPKYDL-UHFFFAOYSA-N sodium molybdate dihydrate Chemical compound O.O.[Na+].[Na+].[O-][Mo]([O-])(=O)=O FDEIWTXVNPKYDL-UHFFFAOYSA-N 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 description 21
- 239000000956 alloy Substances 0.000 description 21
- 239000011651 chromium Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 238000004070 electrodeposition Methods 0.000 description 4
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 235000015393 sodium molybdate Nutrition 0.000 description 2
- 239000011684 sodium molybdate Substances 0.000 description 2
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 208000006558 Dental Calculus Diseases 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- VLAPMBHFAWRUQP-UHFFFAOYSA-L molybdic acid Chemical compound O[Mo](O)(=O)=O VLAPMBHFAWRUQP-UHFFFAOYSA-L 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Landscapes
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、クロム−モリブデン（Ｃｒ−Ｍｏ）合金皮膜
の作製方法に関し、更に詳述すると、電気めっき法によ
りクラックフリーで耐食性に優れたＣ ｒ −Ｍ ｏ合
金皮膜を作製する方法に関する。Detailed Description of the Invention [Field of Industrial Application] The present invention relates to a method for producing a chromium-molybdenum (Cr-Mo) alloy film. The present invention relates to a method for producing an r-Mo alloy film.
〔従来の技術及び発明が解決しようとする課題〕従来、
Ｃｒ −Ｍ ｏ合金皮膜を電気めっき法により作製する
手段としては、例えばクロム酸等の水溶性クロム化合物
とモリブデン酸ナトリウム等の水溶性モリブデン化合物
とを含むめっき浴を用いて電気めっきを行なう方法が知
られている。[Problems to be solved by conventional techniques and inventions] Conventionally,
A method for producing a Cr-Mo alloy film by electroplating is, for example, a method of electroplating using a plating bath containing a water-soluble chromium compound such as chromic acid and a water-soluble molybdenum compound such as sodium molybdate. Are known.
しかしながら、上述した手段で得られたＣｒ−Ｍｏ合金
皮膜、特にＭｏを３〜１０％含有する合金皮膜は、クラ
ックが多く、大気中などで容易に腐食し昌く、耐食性に
劣るという欠点を一般に有しており、実用化するにはそ
の性能が不十分なものであった。However, the Cr-Mo alloy film obtained by the above-mentioned method, especially the alloy film containing 3 to 10% Mo, generally has the drawbacks of having many cracks, being easily corroded in the atmosphere, and having poor corrosion resistance. However, its performance was insufficient for practical use.
この場合、かかるＣ ｒ −Ｍ ｏ合金めっき皮膜の耐
食性を向上させるため、Ｃｒ −Ｍ ｏ合金めっき皮膜
上に更にポーラスクロムめっきを施す二重クロムめっき
方式が行なわれている。しかし、Ｃｒ−Ｍｏ合金めっき
後、更にポーラスクロムめっきを行なうことは、２度手
間となって時間と費用を要する上、Ｃｒ−Ｍｏ合金めっ
き皮膜上に別のめっき皮膜を形成するので、Ｃｒ −Ｍ
ｏ合金めっき皮膜の特性が十分生かされないという問
題がある。In this case, in order to improve the corrosion resistance of the Cr-Mo alloy plating film, a double chromium plating method is used in which porous chromium plating is further applied on the Cr-Mo alloy plating film. However, further performing porous chromium plating after Cr-Mo alloy plating requires twice the effort, time and cost, and requires forming another plating film on the Cr-Mo alloy plating film. M
There is a problem that the characteristics of the o-alloy plating film are not fully utilized.
本発明は上記事情を改善するためになされたもので、従
来のようにＣｒ −Ｍ ｏ合金めっき皮膜上にポーラス
クロムめっきを施すことにより該ポーラスクロムめっき
皮膜の作用で間接的にＣｒ−ＭＯ合金めっき皮膜の耐食
性を向上するという方法とは異なり、めっき法によりそ
れ自体クラックフリーで耐食性に優れたＣ ｒ −Ｍ
ｏ合金皮膜を作製することが可能なＣｒ −Ｍ ｏ合金
皮膜の作製方法を提供することを目的とする。The present invention has been made to improve the above-mentioned situation, and by applying porous chromium plating on a Cr-Mo alloy plating film as in the past, the Cr-MO alloy is indirectly Unlike the method of improving the corrosion resistance of a plating film, the plating method itself is crack-free and has excellent corrosion resistance.
An object of the present invention is to provide a method for producing a Cr-Mo alloy film that can produce an o alloy film.
〔課題を解決するための手段及び作用〕本発明者らは、
上記目的を達成するため、高耐食性Ｃｒ −Ｍ ｏ合金
めっき皮膜を得ることができる電析条件について種々検
討を行なった結果、めっき浴の温度を３５℃以下又は６
５℃以上として電析を行なった場合、タラツクフリーで
あると共に、不導態膜の保護性により耐食性が向上した
Ｃ ｒ −Ｍ ｏ合金皮膜が得られることを見い出し、
本発明をなすに至った。[Means and effects for solving the problem] The present inventors,
In order to achieve the above objective, we conducted various studies on the electrodeposition conditions that would allow us to obtain a highly corrosion-resistant Cr-Mo alloy plating film.
It has been discovered that when electrodeposition is carried out at a temperature of 5°C or higher, a Cr-Mo alloy film can be obtained that is not only tartar-free but also has improved corrosion resistance due to the protective properties of the passivating film.
The present invention has been accomplished.
従って、本発明は、水溶性クロム化合物と水溶性モリブ
デン化合物とを含むめっき浴を用い、クロム−モリブデ
ン合金電気めっきをめっき浴温度３５℃以下又は６５℃
以上で行なって、クラックフリーのクロム−モリブデン
合金めっき皮膜を得ることを特徴とする高耐食性クロム
−モリブデン合金皮膜の作製方法を提供するものである
。Therefore, the present invention uses a plating bath containing a water-soluble chromium compound and a water-soluble molybdenum compound to perform chromium-molybdenum alloy electroplating at a plating bath temperature of 35°C or lower or 65°C.
The present invention provides a method for producing a highly corrosion-resistant chromium-molybdenum alloy film, which is characterized by obtaining a crack-free chromium-molybdenum alloy plating film by performing the above steps.
この場合、上記めっき浴からＣｒ −Ｍ ｏ合金めっき
を行なうことは従来行なわれているが、高耐食性皮膜、
特にＭｏ含量が０．５〜４％の高耐食性Ｃｒ −Ｍ ｏ
合金めっき皮膜を得るための上記電析条件は、本発明者
らが新たに確立したものである。 以下、本発明につき
更に詳しく説明する。In this case, it has been conventional practice to perform Cr-Mo alloy plating from the above plating bath;
Especially high corrosion resistance Cr-Mo with Mo content of 0.5-4%
The above electrodeposition conditions for obtaining an alloy plating film were newly established by the present inventors. The present invention will be explained in more detail below.
本発明は、上述したように、水溶性クロム化合物と水溶
性モリブデン化合物とを含むめっき洛中において、浴温
を３５℃以下又は６５℃以上とした状態でＣｒ −Ｍ
ｏ合金皮膜の電析を行なうようにしたものである。As described above, the present invention provides Cr-M plating in a plating bath containing a water-soluble chromium compound and a water-soluble molybdenum compound at a bath temperature of 35°C or lower or 65°C or higher.
o alloy film is electrodeposited.
この場合、水溶性クロム化合物としてはクロム酸等が用
いられ、水溶性モリブデン化合物としてはモリブデン酸
ナトリウム等を用いることができる。In this case, chromic acid or the like can be used as the water-soluble chromium compound, and sodium molybdate or the like can be used as the water-soluble molybdenum compound.
また、これら化合物のめ、つき浴濃度としては、クロム
化合物をＣｒｙ、として１００〜３００ｇ／Ｑ、より好
ましくは２５０〜３００ｇ／Ｑ、モリブデン化合物をＭ
ｏとして５０〜３００ｇ／Ｑ、より好ましくは７０〜２
２０ｇ／Ωとすることができる。この場合、Ｍ ｏ ／
Ｃｒ○、は重量比として０．０９〜０．２５、特に０
．０９〜０．１５とすることが好ましく、これによりＭ
ｏ含量が０．５〜４％のＣｒ −Ｍ ｏ合金皮膜を得る
ことができる。なお、浴中には必要に応じ硫酸等の他の
適宜な添加剤を加えることができる。In addition, the concentration of these compounds in the bath is 100 to 300 g/Q, more preferably 250 to 300 g/Q for Cry, and more preferably 250 to 300 g/Q for chromium compounds, and M for molybdenum compounds.
50 to 300 g/Q, more preferably 70 to 2
It can be set to 20g/Ω. In this case, M o /
Cr○ is 0.09 to 0.25 as a weight ratio, especially 0
．． It is preferable to set it as 09-0.15, thereby M
A Cr-Mo alloy film having an o content of 0.5 to 4% can be obtained. Note that other suitable additives such as sulfuric acid can be added to the bath as necessary.
本発明は、上記めっき浴の温度を３５℃以下又は６５℃
以上とするものであるが、浴温のより好ましい範囲は２
５〜３５℃、特に２８〜３２℃、或いは６５〜７５℃、
特に６８〜７２℃である。In the present invention, the temperature of the plating bath is 35°C or less or 65°C.
However, the more preferable range of bath temperature is 2.
5-35°C, especially 28-32°C, or 65-75°C,
In particular, it is 68-72°C.
なお、浴温かあまり低くなったり、高くなったりすると
、電流効率が悪くなる場合がある。Note that if the bath temperature becomes too low or too high, the current efficiency may deteriorate.
本発明において、浴温以外の電析条件に特に制限はない
が、陰極電流密度は２０〜５０Ａ／ｄｍ２とすることが
好ましい。また撹拌を行なうことが好ましい。In the present invention, there are no particular limitations on the electrodeposition conditions other than the bath temperature, but the cathode current density is preferably 20 to 50 A/dm2. It is also preferable to stir.
以上説明したように、本発明方法によれば、クラックフ
リーで、耐食性に優れたＣ ｒ −Ｍ ｏ合金皮膜を得
ることができる。従って、鉄、ニッケル等の素地上に本
発明方法でＣｒ −Ｍ ｏ合金めっきを施すことにより
、素地が侵食されるのを防止し、素地の寿命を延長する
ことが可能である。また、本発明によるめっき皮膜は、
大気中において腐食し難いため、広い実用的用途に用い
ることができる。更に、本発明による皮膜は、高硬度で
あるため、耐食性、耐摩耗性の両特性を同時に要求され
る用途に使用可能である。As explained above, according to the method of the present invention, a crack-free Cr-Mo alloy film having excellent corrosion resistance can be obtained. Therefore, by applying Cr-Mo alloy plating on a substrate made of iron, nickel, etc. by the method of the present invention, it is possible to prevent the substrate from being eroded and extend the life of the substrate. Furthermore, the plating film according to the present invention is
Since it is difficult to corrode in the atmosphere, it can be used for a wide range of practical applications. Furthermore, since the coating according to the present invention has high hardness, it can be used in applications that require both corrosion resistance and wear resistance at the same time.
以下、実施例により本発明を具体的に示すが、本発明は
下記実施例に限定されるものではない。EXAMPLES Hereinafter, the present invention will be specifically illustrated by examples, but the present invention is not limited to the following examples.
モリブデン酸（Ｎａ、ＭｏＯ２・２Ｈ，Ｏ）を７５ｇ／
Ｑ（浴Ｎｏ、１）、１２５ｇ／Ｒ（浴Ｎｏ、２）又は１
７０ｇ／Ｑ（浴Ｎ ｏ 、’ ３ ）とクロム酸とを含
むめっき浴を用い、種々の浴温、電流密度にて銅板上に
Ｃｒ−Ｍｏ合金電気めっきを行なった。Molybdic acid (Na, MoO2・2H, O) 75g/
Q (bath No. 1), 125g/R (bath No. 2) or 1
Using a plating bath containing 70 g/Q (bath N o ,'3) and chromic acid, Cr-Mo alloy electroplating was performed on a copper plate at various bath temperatures and current densities.
なお、クロム酸重量に対するモリブデン重量の割合（Ｍ
ｏ ／ Ｃｒ Ｏ３）は、浴Ｎｏ、１はｏ、０９、Ｎ
００２は０．１５、Ｎｏ、３は０．２０とした。In addition, the ratio of molybdenum weight to chromic acid weight (M
o/Cr O3) is bath No. 1 is o, 09, N
002 was set to 0.15, and No. 3 was set to 0.20.
また、その他の添加剤としては、浴中Ｃｒ’＋濃度を一
定に保つためにしゆう酸５．２ｇ／Ｑを添加した。めっ
き条件は浴温度３０〜７０℃、電流密度２０〜１００
Ａ／ｄｍ”とした。Further, as other additives, 5.2 g/Q of oxalic acid was added in order to keep the Cr'+ concentration in the bath constant. Plating conditions are bath temperature 30~70℃, current density 20~100℃.
A/dm".
結果を第１図（浴Ｎｏ、１）、第２図（浴Ｎ ｏ 。The results are shown in Figure 1 (bath No. 1) and Figure 2 (bath No. 0).
２）、第３図（浴Ｎｏ、３）にそれぞれ示す、なお、図
中０はクラックフリーで高耐食性の皮膜が得られた場合
、×はクラックを有し耐食性が劣る皮膜が得られた場合
、Δは０とＸとの中間的な性質の皮膜が得られた場合を
示す。また、これらのめっきにより得られたＣ ｒ −
Ｍ ｏ合金皮膜中のＭｏ含量は０．５〜４％であった。2) and Figure 3 (Bath No. 3), respectively. In the figure, 0 indicates that a crack-free coating with high corrosion resistance was obtained, and × indicates that a coating with cracks and poor corrosion resistance was obtained. , Δ indicates the case where a film with intermediate properties between 0 and X was obtained. In addition, Cr − obtained by these platings
The Mo content in the Mo alloy film was 0.5 to 4%.
第１〜３図の結果より、浴温を３０℃以下、７０℃以上
とすることにより、高耐食性皮膜が得られることが知見
される。From the results shown in FIGS. 1 to 3, it is found that a highly corrosion-resistant film can be obtained by setting the bath temperature to 30° C. or lower and 70° C. or higher.
一方、上記めっき皮膜を用い、５％Ｈ，Ｓｏい６０’Ｃ
溶液中における浸漬試験を行なった。結果を第４図に示
すが、浴温３０℃、７０℃において電析した膜は優れた
耐食性を示すのに対し、上記面温度の中間温度で電析し
た膜は耐食性が悪く、実用的でないことが認められる。On the other hand, using the above plating film, 5% H, Soi 60'C
An immersion test in a solution was conducted. The results are shown in Figure 4. Films deposited at bath temperatures of 30°C and 70°C show excellent corrosion resistance, whereas films deposited at intermediate temperatures between the above surface temperatures have poor corrosion resistance and are not practical. It is recognized that
また、上記めっき皮膜を用い、３％ＮａＣＱ、３０℃溶
液中における孔食電位を測定した。結果を第５図に示す
が、３０”Ｃ１７０℃にて電析した膜は極めて高い電位
を示すことが認められる。Further, using the above plating film, the pitting potential in a 3% NaCQ solution at 30° C. was measured. The results are shown in FIG. 5, and it can be seen that the film deposited at 30"C and 170.degree. C. exhibits an extremely high potential.
更に、上記めっき皮膜を用い、塩水噴霧試験を行なった
。結果を参考図の写真に示すが、３０’Ｃ１７０”Ｃに
て電析した皮膜は発錆が認められず、耐食性に優れてい
ることが知見される。Furthermore, a salt spray test was conducted using the above plating film. The results are shown in the reference photograph, and it can be seen that the film electrodeposited with 30'C170''C showed no rusting and was found to have excellent corrosion resistance.
第１図乃至第３図はそれぞれ種々の電析条件でＣｒ −
Ｍ ｏ合金電気めっきを行なったときの皮膜の状態を示
すグラフ、第４図は同皮膜の硫酸溶液への浸漬試験結果
を示すグラフ、第５図は同皮膜の塩化ナトリウム溶液中
における孔食電位を示すグラフである。
第１図
第２図
骸密度
（八／ｄｍ１）
燭ｔだ密バし （へ／ｄｍ２ン
第３図
電流密度
（△／ｄｌ’ｎ２）
洛倶度
じＯン
Ｔ。Figures 1 to 3 show Cr −
A graph showing the state of the film when Mo alloy electroplating was performed. Figure 4 is a graph showing the results of an immersion test of the same film in a sulfuric acid solution. Figure 5 is a graph showing the pitting potential of the same film in a sodium chloride solution. This is a graph showing. Figure 1 Figure 2 Body density (8/dm1) Candle density (to/dm2) Figure 3 Current density (△/dl'n2) RakukudajiONT.
Claims (1)
含むめっき浴を用い、クロム−モリブデン合金電気めっ
きをめっき浴温度３５℃以下又は６５℃以上で行なって
、クラックフリーのクロム−モリブデン合金めっき皮膜
を得ることを特徴とする高耐食性クロム−モリブデン合
金皮膜の作製方法。1. Using a plating bath containing a water-soluble chromium compound and a water-soluble molybdenum compound, perform chromium-molybdenum alloy electroplating at a plating bath temperature of 35°C or lower or 65°C or higher to obtain a crack-free chromium-molybdenum alloy plating film. A method for producing a highly corrosion-resistant chromium-molybdenum alloy film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19736988A JPH0247285A (en) | 1988-08-08 | 1988-08-08 | Method for producing highly corrosion-resistant chromium-molybdenum alloy film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19736988A JPH0247285A (en) | 1988-08-08 | 1988-08-08 | Method for producing highly corrosion-resistant chromium-molybdenum alloy film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0247285A true JPH0247285A (en) | 1990-02-16 |
| JPH0521992B2 JPH0521992B2 (en) | 1993-03-26 |
Family
ID=16373351
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19736988A Granted JPH0247285A (en) | 1988-08-08 | 1988-08-08 | Method for producing highly corrosion-resistant chromium-molybdenum alloy film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0247285A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5196108A (en) * | 1991-04-24 | 1993-03-23 | Scot Industries, Inc. | Sucker rod oil well pump |
| JPH10168593A (en) * | 1996-12-12 | 1998-06-23 | Teikoku Piston Ring Co Ltd | Chromium alloy plating coating, plating method therefor and member having this coating |
| JP2005154902A (en) * | 2003-11-21 | 2005-06-16 | Enthone Inc | Process of depositing metallic layer free of nickel and chromium (vi) |
| DE102015105761A1 (en) | 2015-04-15 | 2016-10-20 | HDO Druckguss- und Oberflächentechnik GmbH | Component with applied chromium layer with tungsten content and molybdenum content and method for producing such a component by means of ternary deposition |
-
1988
- 1988-08-08 JP JP19736988A patent/JPH0247285A/en active Granted
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5196108A (en) * | 1991-04-24 | 1993-03-23 | Scot Industries, Inc. | Sucker rod oil well pump |
| JPH10168593A (en) * | 1996-12-12 | 1998-06-23 | Teikoku Piston Ring Co Ltd | Chromium alloy plating coating, plating method therefor and member having this coating |
| JP2005154902A (en) * | 2003-11-21 | 2005-06-16 | Enthone Inc | Process of depositing metallic layer free of nickel and chromium (vi) |
| DE102015105761A1 (en) | 2015-04-15 | 2016-10-20 | HDO Druckguss- und Oberflächentechnik GmbH | Component with applied chromium layer with tungsten content and molybdenum content and method for producing such a component by means of ternary deposition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0521992B2 (en) | 1993-03-26 |
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