JPH0247601A - Production of glass with functional film - Google Patents

Abstract

PURPOSE:To improve the smoothness of a film surface by precisely polishing the film forming surface of glass on which a functional film is formed by a PVD method such as vacuum vapor deposition method. CONSTITUTION:The outermost layer surface of the functional film of the glass formed with the functional film by the physical vapor deposition method such as vacuum deposition method or sputtering is precisely polished. More specifically, a polishing roll 25 is rotated to polish the surface of said film while a polishing material slurry is supplied from a slurry supply nozzle 13 onto the antireflection film. The precision polishing of the outermost layer film of the antireflection film is ended by cooperatively moving both in an arrow direction. The abrasive grains for polishing are preferably colloidal silica, zirconium oxide, and cerium oxide. The surface of the deposited film is smoothed in this way and the stains sticking to the surface of the deposited film at the time of use are easily wiped away by a cloth, etc.

Description

DETAILED DESCRIPTION OF THE INVENTION Industrial Net The present invention relates to a method for manufacturing glass with a functional film on which an antireflection film or the like is formed.

Physical vapor deposition methods (PV) such as vacuum evaporation and sputtering
Method D; Phlsical Vapor Diposis
Forming functional thin films on glass substrates is widely practiced. A typical example of this is glass with an anti-reflection coating, and CRT (Cathode Ray Tube).
be) etc. Furthermore, a transparent conductive film such as ITO is formed on the glass surface to impart an antistatic function.

Multilayer antireflection films have traditionally been used to improve optical properties. For example, antireflection films consisting of four or five layers are disclosed in Japanese Patent Publication No. 52-22245 and No. 53-1983.
It is described in Publication No. 14227 and the like. Anti-reflection films have conventionally been formed by vacuum evaporation, which allows easy control of film thickness.

However, once dirt such as fingerprints gets on glass with an anti-reflection coating, it cannot be easily removed even if you try to rub it off with a cloth. Furthermore, if the film is rubbed too strongly, the film may be worn away, thereby impairing its original optical properties or causing film peeling.

The above explanation focused on glass with anti-reflection coating, but
The situation is similar in the case of other glasses with functional films.

The present invention has been made in order to solve the above-mentioned problems, and provides a method for manufacturing glass with a functional film that can be easily removed even if dirt is attached.

The method for producing glass with a functional film according to the present invention is characterized in that the film-forming surface of the glass on which the functional film is formed by a PVD method such as a vacuum evaporation method is precisely polished to improve the smoothness of the film surface. shall be.

Films obtained by PVD methods such as vacuum evaporation methods cannot be said to be smooth when viewed microscopically, and the surface has a surface roughness [center line average roughness (according to JIS BO601-19132) Ra
It has fine irregularities with a value of about 20 people].

The present inventors focused on this point and found that by precision polishing and smoothing the fine irregularities, dirt adhering to the film surface can be easily removed, and based on this knowledge, the above invention was completed.

In the present invention, it is preferable that the surface after precision polishing has an unevenness Ra value of less than 15, preferably 10 Å or less, particularly preferably 5 Å or less, since adhered dirt can be removed very easily.

Precision polishing can be performed using, for example, a mixed solution (slurry) in which common polishing abrasives such as cerium oxide, zirconium oxide, red iron, chromium oxide, titanium dioxide, colloidal silica, alumina, and calcium phosphate are mixed in water. can.

In order to perform precise polishing as in the present invention, the average particle diameter of such polishing abrasive grains is preferably 0.5 μm or less.

Colloidal silica, zirconium oxide, and cerium oxide are preferable as the abrasive grains because such fine particles can be easily obtained.

Precision polishing can be performed by using an abrasive slurry such as the one described above and polishing with a polishing roll that can apply precision pressure.Specific equipment is an ultra-precision machine that uses hydrostatic bearings to enable precision machining control. Examples include polishing equipment.

FIG. 1 is an explanatory diagram showing an embodiment of the present invention using such a device. A piece of glass 11 with an anti-reflection film is placed on the table 17, and is vacuum chucked and fixed by a vacuum hole 19. The antireflection film-coated glass 11 is fixed with the surface on which the antireflection film (not shown) is formed facing upward. While supplying the abrasive slurry onto the anti-reflection film from the slurry supply nozzle 13, the polishing roll 15
The precision polishing of the outermost layer of the anti-reflection film is completed by rotating and polishing and moving the rain sound in conjunction with the direction of the arrow in the figure.

Through precision polishing, surface irregularities are polished away, resulting in a smooth antireflection film, and does not adversely affect film properties such as antireflection function and film strength.

In the above explanation, the anti-reflection film formed by vacuum evaporation method was mainly explained, but other films such as sputtering method etc.
Water washing can be similarly applied to glass having other functional films (for example, antistatic films) formed by the VD method.

According to the present invention, by precision polishing the surface of the deposited film on the glass on which the PVD deposited film has been formed, the surface of the deposited film can be smoothed without substantially increasing the functional properties of the film. Thus, a glass with a functional film can be obtained that allows dirt adhering to the surface of the deposited film to be easily wiped off with a cloth or the like during use. Therefore, it goes without saying that it can be used in a clean state at all times, but there is also the risk of scratches on the film due to excessive scrubbing of dirt, or the film becoming abraded, making it impossible to obtain the original optical properties, or causing the film to peel off. Prevented. Furthermore, since the membrane surface is smooth, dirt itself is difficult to adhere to.

Example 1 A glass plate on which a multilayer antireflection film was formed by a conventional vacuum deposition method was prepared. This multilayer anti-reflection film is made of three layers coated from the air side with M g F2- Z r O, -A lio at an optical thickness of λ/4-λ/2-λ/4 (λ is 550 nm). It is a membrane, and the outermost layer (air side) has an Ra value of 20.
It had unevenness of human race.

Prior to precision polishing, ■ Spectral reflection characteristics of the film; see Figure 2 (solid line) ■ Chemical resistance;
10% sodium hydroxide aqueous solution, 50% acetic acid aqueous solution, 2
4-hour Rub resistance: A rubbing test with an eraser (eraser test 20 times) was evaluated.

Next, the outermost layer of the multilayer antireflection film was precisely polished using the apparatus shown in FIG. Glass with multilayer anti-reflection coating is the first
It was set as shown in the figure, and an aqueous solution of zirconium oxide (average particle size: 0°4 μm) with a concentration of 5 to 10% by weight was used as the abrasive slurry.

Polishing pressure is 30gf#j, polishing roll rotation speed is 50r.
When precision polishing was performed at a polishing roll feed rate of 45 cm/sun, the outermost layer was polished by several to several people, and the Ra value of the surface irregularities was 6 degrees.

When the spectral reflection characteristics of the obtained glass with the smoothed multilayer antireflection coating were measured, as shown by the broken line in FIG. 2, there was no change from before precision polishing.

Furthermore, when chemical resistance and abrasion resistance were evaluated in the same manner as above, performance equivalent to that before precision polishing was obtained.

In addition, when glass with a smoothed multilayer anti-reflection coating was actually used in a CRT, it was found that the adhered dirt could be easily removed by wiping it with a cloth. 1 The anti-reflection performance did not deteriorate and the condition remained clean. I was able to use it.

Example 2 A glass plate having the same anti-reflection film as in Example 1 was treated with colloidal silica (average particle size approximately 0.0
When precision polishing was performed in the same manner as in Example 1 except that a 25 to 27% by weight aqueous solution of 5 μm) was used, the outermost layer was polished by several polishers, and the Ra value of the surface unevenness was about 1.5.

Spectral characteristics of the obtained glass with smoothed multilayer antireflection coating,
When chemical resistance and abrasion resistance were evaluated, the same performance as before precision polishing was obtained.

In addition, such glass with a smooth multilayer antireflection coating can be used as a CRT.
When used in actual use, the adhered dirt could be wiped off more easily than in Example 1, and the antireflection performance did not deteriorate, allowing the product to be used in a very clean state.

[Brief explanation of the drawing]

FIG. 1 is an explanatory diagram showing an example of a method of implementing the present invention. FIG. 2 is a graph showing the spectral reflection characteristics before and after precision polishing in Example 1. 11... Glass with antireflection film 13... Slurry supply nozzle 15... Polishing roll 17... Table 19.
・・Vacuum hole catcher 11”+

Claims (1)

[Claims] 1. Precisely polishing the surface of the outermost layer of a functional film of glass on which a functional film has been formed by a physical vapor deposition method such as vacuum evaporation or sputtering to improve the smoothness of the film surface. A method for producing glass with a functional film characterized by: 2. Precisely polish the surface of the outermost layer of the functional film of the glass on which the functional film has been formed by physical vapor deposition methods such as vacuum evaporation and sputtering, and reduce the unevenness of the functional film surface to a center line average roughness of 1.
2. The method for producing a functional film-coated glass according to claim 1, wherein the thickness is less than 5 Å. 3. In antireflection glass in which a single layer or multilayer antireflection film is formed on a glass substrate by a physical vapor deposition method such as vacuum evaporation or sputtering, the surface of the outermost layer of the antireflection film is An antireflection glass characterized by a roughness of less than 15 Å.