JPH0252084A - アフターグロープラズマによる表面浄化方法 - Google Patents

アフターグロープラズマによる表面浄化方法

Info

Publication number: JPH0252084A
Authority: JP; Japan
Prior art keywords: plasma; nitrogen; purification method; tube; oxygen
Prior art date: 1988-05-10
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

JP1113871A

Other languages

English (en)

Japanese (ja)

Inventor

Odile Dessaux

オディル　ドゥソー

Brigitte Mutel

ブリジット　ミェテル

Daniel Szurminski

ダニエル　ズルマンスキー

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

PRESTATIONS DE SERVICES SPS SOC

Original Assignee

PRESTATIONS DE SERVICES SPS SOC

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-05-10

Filing date

1989-05-08

Publication date

1990-02-21

1989-05-08 Application filed by PRESTATIONS DE SERVICES SPS SOC filed Critical PRESTATIONS DE SERVICES SPS SOC

1990-02-21 Publication of JPH0252084A publication Critical patent/JPH0252084A/ja

Status Pending legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims abstract description 14
238000004140 cleaning Methods 0.000 title description 12
239000007789 gas Substances 0.000 claims abstract description 24
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 20
230000005495 cold plasma Effects 0.000 claims abstract description 12
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 10
239000000203 mixture Substances 0.000 claims abstract description 9
229910052757 nitrogen Inorganic materials 0.000 claims abstract description 9
239000001301 oxygen Substances 0.000 claims abstract description 9
229910052760 oxygen Inorganic materials 0.000 claims abstract description 9
150000001875 compounds Chemical class 0.000 claims description 9
239000000356 contaminant Substances 0.000 claims description 7
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 6
239000011521 glass Substances 0.000 claims description 6
239000002184 metal Substances 0.000 claims description 6
229910052751 metal Inorganic materials 0.000 claims description 6
QKCGXXHCELUCKW-UHFFFAOYSA-N n-[4-[4-(dinaphthalen-2-ylamino)phenyl]phenyl]-n-naphthalen-2-ylnaphthalen-2-amine Chemical compound C1=CC=CC2=CC(N(C=3C=CC(=CC=3)C=3C=CC(=CC=3)N(C=3C=C4C=CC=CC4=CC=3)C=3C=C4C=CC=CC4=CC=3)C3=CC4=CC=CC=C4C=C3)=CC=C21 QKCGXXHCELUCKW-UHFFFAOYSA-N 0.000 claims description 6
229910001220 stainless steel Inorganic materials 0.000 claims description 5
239000010935 stainless steel Substances 0.000 claims description 5
230000009471 action Effects 0.000 claims description 4
239000000919 ceramic Substances 0.000 claims description 4
VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 4
229910018503 SF6 Inorganic materials 0.000 claims description 3
229910052573 porcelain Inorganic materials 0.000 claims description 3
SFZCNBIFKDRMGX-UHFFFAOYSA-N sulfur hexafluoride Chemical compound FS(F)(F)(F)(F)F SFZCNBIFKDRMGX-UHFFFAOYSA-N 0.000 claims description 3
229960000909 sulfur hexafluoride Drugs 0.000 claims description 3
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 2
HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 2
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 2
239000000460 chlorine Substances 0.000 claims description 2
229910052801 chlorine Inorganic materials 0.000 claims description 2
229960001701 chloroform Drugs 0.000 claims description 2
239000003344 environmental pollutant Substances 0.000 claims description 2
229910052731 fluorine Inorganic materials 0.000 claims description 2
239000011737 fluorine Substances 0.000 claims description 2
QEHKBHWEUPXBCW-UHFFFAOYSA-N nitrogen trichloride Chemical compound ClN(Cl)Cl QEHKBHWEUPXBCW-UHFFFAOYSA-N 0.000 claims description 2
231100000719 pollutant Toxicity 0.000 claims description 2
230000002285 radioactive effect Effects 0.000 claims description 2
239000000126 substance Substances 0.000 claims description 2
TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical group FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 2
238000000746 purification Methods 0.000 claims 6
239000010687 lubricating oil Substances 0.000 claims 1
150000002739 metals Chemical class 0.000 claims 1
230000004907 flux Effects 0.000 abstract description 3
239000010453 quartz Substances 0.000 abstract description 3
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 3
230000008569 process Effects 0.000 abstract description 2
238000005406 washing Methods 0.000 abstract 2
238000004904 shortening Methods 0.000 abstract 1
210000002381 plasma Anatomy 0.000 description 34
235000007319 Avena orientalis Nutrition 0.000 description 5
239000004519 grease Substances 0.000 description 5
241000209761 Avena Species 0.000 description 4
241000196324 Embryophyta Species 0.000 description 4
238000010586 diagram Methods 0.000 description 3
239000000463 material Substances 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
230000000694 effects Effects 0.000 description 2
230000005684 electric field Effects 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
QGZKDVFQNNGYKY-OUBTZVSYSA-N Ammonia-15N Chemical compound [15NH3] QGZKDVFQNNGYKY-OUBTZVSYSA-N 0.000 description 1
244000075850 Avena orientalis Species 0.000 description 1
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
108010085603 SFLLRNPND Proteins 0.000 description 1
230000003213 activating effect Effects 0.000 description 1
230000002411 adverse Effects 0.000 description 1
239000003570 air Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
150000001768 cations Chemical class 0.000 description 1
229910010293 ceramic material Inorganic materials 0.000 description 1
230000008859 change Effects 0.000 description 1
230000001066 destructive effect Effects 0.000 description 1
238000000605 extraction Methods 0.000 description 1
239000003365 glass fiber Substances 0.000 description 1
229910052736 halogen Inorganic materials 0.000 description 1
150000002367 halogens Chemical class 0.000 description 1
238000010438 heat treatment Methods 0.000 description 1
238000009434 installation Methods 0.000 description 1
230000003993 interaction Effects 0.000 description 1
239000007788 liquid Substances 0.000 description 1
239000002905 metal composite material Substances 0.000 description 1
230000007935 neutral effect Effects 0.000 description 1
239000003921 oil Substances 0.000 description 1
239000013307 optical fiber Substances 0.000 description 1
239000005416 organic matter Substances 0.000 description 1
239000002245 particle Substances 0.000 description 1
239000003058 plasma substitute Substances 0.000 description 1
238000005086 pumping Methods 0.000 description 1
238000010408 sweeping Methods 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like

Landscapes

Chemical & Material Sciences (AREA)
Metallurgy (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Optics & Photonics (AREA)
Mechanical Engineering (AREA)
Organic Chemistry (AREA)
Physics & Mathematics (AREA)
Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Cleaning In General (AREA)
Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Detergent Compositions (AREA)
Polishing Bodies And Polishing Tools (AREA)
Drying Of Semiconductors (AREA)
Cleaning Or Drying Semiconductors (AREA)

JP1113871A 1988-05-10 1989-05-08 アフターグロープラズマによる表面浄化方法 Pending JPH0252084A (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
FR8806607A FR2631258B1 (fr)	1988-05-10	1988-05-10	Procede de nettoyage en surface par plasma differe
FR8806607		1988-05-10

Publications (1)

Publication Number	Publication Date
JPH0252084A true JPH0252084A (ja)	1990-02-21

Family

ID=9366376

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP1113871A Pending JPH0252084A (ja)	1988-05-10	1989-05-08	アフターグロープラズマによる表面浄化方法

Country Status (7)

Country	Link
EP (1)	EP0343038A1 (fr)
JP (1)	JPH0252084A (fr)
CN (1)	CN1038036A (fr)
DK (1)	DK226989A (fr)
FR (1)	FR2631258B1 (fr)
NO (1)	NO173921C (fr)
ZA (1)	ZA893473B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2012152855A (ja) *	2011-01-26	2012-08-16	Osg Corp	ダイヤモンド被膜または硬質炭素被膜の脱膜方法

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH06285868A (ja) *	1993-03-30	1994-10-11	Bridgestone Corp	加硫金型の清浄方法
US5938854A (en) *	1993-05-28	1999-08-17	The University Of Tennessee Research Corporation	Method and apparatus for cleaning surfaces with a glow discharge plasma at one atmosphere of pressure
FR2733437B1 (fr) *	1995-04-27	1997-09-12	Aubert Bruno	Procede de separation d'elements chimiques par formation de composes volatils avec un gaz excite dans un plasma froid et dispositif de mise en oeuvre
FR2750348B1 (fr) *	1996-06-28	1998-08-21	Conte	Procede pour augmenter l'anti-mouillabilite d'un corps, corps ainsi traite et ses applications
US6125859A (en) *	1997-03-05	2000-10-03	Applied Materials, Inc.	Method for improved cleaning of substrate processing systems
US6274058B1 (en)	1997-07-11	2001-08-14	Applied Materials, Inc.	Remote plasma cleaning method for processing chambers
SG72905A1 (en)	1997-12-18	2000-05-23	Central Glass Co Ltd	Gas for removing deposit and removal method using same
US6543460B1 (en)	1999-06-24	2003-04-08	Wisconsin Alumni Research Foundation	Cold-plasma treatment of seeds to remove surface materials
JP2005036250A (ja) *	2003-07-16	2005-02-10	Matsushita Electric Ind Co Ltd	スパッタ装置
US20110108058A1 (en) *	2009-11-11	2011-05-12	Axcelis Technologies, Inc.	Method and apparatus for cleaning residue from an ion source component
CN101837357B (zh) *	2010-05-04	2011-10-05	宁波大学	一种等离子体清洗装置
CN104148334A (zh) *	2014-07-02	2014-11-19	太仓华德石太工业设备有限公司	一种针对工业局部清洁的碳氢化合物/等离子体的清洁方法
CN104353643B (zh) *	2014-12-02	2017-07-25	上海华虹宏力半导体制造有限公司	一种减小超声波清洗器的维护系统及维护方法
DE102020131832A1 (de)	2020-12-01	2022-06-02	Universität Kassel, Körperschaft des öffentlichen Rechts	Verfahren zur Herstellung von Gussformen oder Gusskernen

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2647088B2 (de) *	1976-10-19	1979-04-05	Kernforschungsanlage Juelich Gmbh, 5170 Juelich	Verfahren und Vorrichtung zum Reinigen von Oberflächen
US4555303A (en) *	1984-10-02	1985-11-26	Motorola, Inc.	Oxidation of material in high pressure oxygen plasma
WO1987002603A1 (fr) *	1985-10-29	1987-05-07	Hughes Aircraft Company	Procede et dispositif d'irradiation par un faisceau atomique

1988
- 1988-05-10 FR FR8806607A patent/FR2631258B1/fr not_active Expired - Lifetime
1989
- 1989-05-03 NO NO891827A patent/NO173921C/no unknown
- 1989-05-08 JP JP1113871A patent/JPH0252084A/ja active Pending
- 1989-05-09 DK DK226989A patent/DK226989A/da not_active Application Discontinuation
- 1989-05-10 CN CN89103142A patent/CN1038036A/zh active Granted
- 1989-05-10 ZA ZA893473A patent/ZA893473B/xx unknown
- 1989-05-10 EP EP89401297A patent/EP0343038A1/fr not_active Withdrawn

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2012152855A (ja) *	2011-01-26	2012-08-16	Osg Corp	ダイヤモンド被膜または硬質炭素被膜の脱膜方法

Also Published As

Publication number	Publication date
EP0343038A1 (fr)	1989-11-23
DK226989D0 (da)	1989-05-09
NO891827L (no)	1989-11-13
FR2631258B1 (fr)	1991-04-05
FR2631258A1 (fr)	1989-11-17
CN1038036A (zh)	1989-12-20
DK226989A (da)	1989-11-11
NO891827D0 (no)	1989-05-03
ZA893473B (en)	1990-01-31
NO173921C (no)	1994-02-23
NO173921B (no)	1993-11-15

Publication	Publication Date	Title
JPH0252084A (ja)	1990-02-21	アフターグロープラズマによる表面浄化方法
TW410240B (en)	2000-11-01	Method for cleaning etch by-product from plasma chamber surfaces
JP2770883B2 (ja)	1998-07-02	基体処理用の濃縮流体光化学処理方法
JP3421954B2 (ja)	2003-06-30	オゾン層破壊物質の処理方法
EP0573449A1 (fr)	1993-12-15	Sterilisation en milieu gazeux
CA2222620A1 (fr)	1996-12-05	Procede et dispositif pour nettoyer des surfaces par plasma a decharge lumineuse sous une pression d'une atmosphere
EP1138802A3 (fr)	2003-11-26	Procédé pour nettoyer une chambre de traitement de semi-conducteurs utilisant fluor
US5800620A (en)	1998-09-01	Plasma treatment apparatus
Krčma et al.	2014	Application of low temperature plasmas for restoration/conservation of archaeological objects
JP2002273168A (ja)	2002-09-24	除害装置及び除害方法
TW375780B (en)	1999-12-01	Process for cleaning a film forming device
DE4113440A1 (de)	1992-10-29	Verfahren zur sanierung von belasteten boeden
JPH1176740A (ja)	1999-03-23	有機フッ素系排ガスの分解処理方法及び分解処理装置
US20070116891A1 (en)	2007-05-24	Plasma brush apparatus and method
JPH02190472A (ja)	1990-07-26	膜形成操作系におけるフツ化物系ガスによるクリーニング後の汚染除去方法
US6936114B1 (en)	2005-08-30	Steam cleaning system and method for semiconductor process equipment
Sternovsky et al.	2002	Effect of charge exchange ions upon Langmuir probe current
KR100485743B1 (ko)	2005-04-28	반도체 생산 설비용 세정 가스
JPS5615044A (en)	1981-02-13	Plasma cleaning method
Hedara et al.	2022	Comparative Study and Experimental Optimization of Ozone Generators by Cylindrical Surface Dielectric Barrier Discharge (DBD).
Reid	1999	Cleaning for vacuum service
JP3404434B2 (ja)	2003-05-06	マイクロ波プラズマ装置のクリーニング方法
JPS5486968A (en)	1979-07-10	Washing
RU2061804C1 (ru)	1996-06-10	Способ очистки внутренней поверхности кварцевых изделий
Madani et al.	2018	An overview of the application of plasma technology in the protection of cultural and historical objects

JPH0252084A - アフターグロープラズマによる表面浄化方法 - Google Patents

Info

Links

Classifications

Landscapes

Applications Claiming Priority (2)

Publications (1)

Family

ID=9366376

Family Applications (1)

Country Status (7)

Cited By (1)

Families Citing this family (14)

Family Cites Families (3)

Cited By (1)

Also Published As

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