JPH0259863B2 - - Google Patents

Info

Publication number
JPH0259863B2
JPH0259863B2 JP3613784A JP3613784A JPH0259863B2 JP H0259863 B2 JPH0259863 B2 JP H0259863B2 JP 3613784 A JP3613784 A JP 3613784A JP 3613784 A JP3613784 A JP 3613784A JP H0259863 B2 JPH0259863 B2 JP H0259863B2
Authority
JP
Japan
Prior art keywords
substrate
ion
ion species
boron
nitrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3613784A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60181262A (ja
Inventor
Mamoru Sato
Koichi Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
National Institute of Advanced Industrial Science and Technology
Original Assignee
Agency of Industrial Science and Technology
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Kyocera Corp filed Critical Agency of Industrial Science and Technology
Priority to JP3613784A priority Critical patent/JPS60181262A/ja
Priority to US06/700,697 priority patent/US4656052A/en
Publication of JPS60181262A publication Critical patent/JPS60181262A/ja
Publication of JPH0259863B2 publication Critical patent/JPH0259863B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C23C14/0647—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP3613784A 1984-02-13 1984-02-29 高硬度窒化ホウ素膜の製造方法 Granted JPS60181262A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP3613784A JPS60181262A (ja) 1984-02-29 1984-02-29 高硬度窒化ホウ素膜の製造方法
US06/700,697 US4656052A (en) 1984-02-13 1985-02-12 Process for production of high-hardness boron nitride film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3613784A JPS60181262A (ja) 1984-02-29 1984-02-29 高硬度窒化ホウ素膜の製造方法

Publications (2)

Publication Number Publication Date
JPS60181262A JPS60181262A (ja) 1985-09-14
JPH0259863B2 true JPH0259863B2 (fr) 1990-12-13

Family

ID=12461396

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3613784A Granted JPS60181262A (ja) 1984-02-13 1984-02-29 高硬度窒化ホウ素膜の製造方法

Country Status (1)

Country Link
JP (1) JPS60181262A (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2593441B2 (ja) * 1986-01-16 1997-03-26 日新電機株式会社 高硬度膜被覆工具材料とその製造方法
JPH0742571B2 (ja) * 1986-07-11 1995-05-10 三菱重工業株式会社 Ｃｂｎ被覆法
JPH01225767A (ja) * 1988-03-07 1989-09-08 Nissin Electric Co Ltd 窒化ケイ素膜の製造方法

Also Published As

Publication number Publication date
JPS60181262A (ja) 1985-09-14

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term