JPH0261734B2 - - Google Patents

Info

Publication number
JPH0261734B2
JPH0261734B2 JP57150428A JP15042882A JPH0261734B2 JP H0261734 B2 JPH0261734 B2 JP H0261734B2 JP 57150428 A JP57150428 A JP 57150428A JP 15042882 A JP15042882 A JP 15042882A JP H0261734 B2 JPH0261734 B2 JP H0261734B2
Authority
JP
Japan
Prior art keywords
pattern
round bar
light
conical mirror
coating film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57150428A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5938749A (ja
Inventor
Kazuo Watanabe
Takao Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP57150428A priority Critical patent/JPS5938749A/ja
Publication of JPS5938749A publication Critical patent/JPS5938749A/ja
Publication of JPH0261734B2 publication Critical patent/JPH0261734B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57150428A 1982-08-30 1982-08-30 露光方法 Granted JPS5938749A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57150428A JPS5938749A (ja) 1982-08-30 1982-08-30 露光方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57150428A JPS5938749A (ja) 1982-08-30 1982-08-30 露光方法

Publications (2)

Publication Number Publication Date
JPS5938749A JPS5938749A (ja) 1984-03-02
JPH0261734B2 true JPH0261734B2 (fr) 1990-12-20

Family

ID=15496711

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57150428A Granted JPS5938749A (ja) 1982-08-30 1982-08-30 露光方法

Country Status (1)

Country Link
JP (1) JPS5938749A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5822042A (en) * 1992-11-12 1998-10-13 International Business Machines Corporation Three dimensional imaging system
JP5164176B2 (ja) * 2009-11-20 2013-03-13 独立行政法人産業技術総合研究所 立体投影による光投影露光装置及び光投影露光方法

Also Published As

Publication number Publication date
JPS5938749A (ja) 1984-03-02

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