JPH0266531A - Production of metallic mold for reticle - Google Patents
Production of metallic mold for reticleInfo
- Publication number
- JPH0266531A JPH0266531A JP21909688A JP21909688A JPH0266531A JP H0266531 A JPH0266531 A JP H0266531A JP 21909688 A JP21909688 A JP 21909688A JP 21909688 A JP21909688 A JP 21909688A JP H0266531 A JPH0266531 A JP H0266531A
- Authority
- JP
- Japan
- Prior art keywords
- sulfuric acid
- mold
- satin
- relief
- reticle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 27
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 46
- 238000007747 plating Methods 0.000 claims abstract description 39
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 23
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 22
- 238000009713 electroplating Methods 0.000 claims abstract description 18
- 239000000654 additive Substances 0.000 claims abstract description 14
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052802 copper Inorganic materials 0.000 claims abstract description 13
- 239000010949 copper Substances 0.000 claims abstract description 13
- 238000009499 grossing Methods 0.000 claims abstract description 13
- 230000002378 acidificating effect Effects 0.000 claims abstract description 6
- 230000000996 additive effect Effects 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002253 acid Substances 0.000 claims description 4
- HIRWGWMTAVZIPF-UHFFFAOYSA-N nickel;sulfuric acid Chemical compound [Ni].OS(O)(=O)=O HIRWGWMTAVZIPF-UHFFFAOYSA-N 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 20
- 238000003754 machining Methods 0.000 abstract description 4
- 206010027146 Melanoderma Diseases 0.000 abstract description 3
- 238000009792 diffusion process Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 26
- 238000010586 diagram Methods 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- 206010064127 Solar lentigo Diseases 0.000 description 5
- 238000000149 argon plasma sintering Methods 0.000 description 3
- 238000005323 electroforming Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- -1 Hydrochloric acid ion Chemical class 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N hydrochloric acid Substances Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- LITQZINTSYBKIU-UHFFFAOYSA-F tetracopper;hexahydroxide;sulfate Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[OH-].[Cu+2].[Cu+2].[Cu+2].[Cu+2].[O-]S([O-])(=O)=O LITQZINTSYBKIU-UHFFFAOYSA-F 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/082—Construction of plunger or mould for making solid articles, e.g. lenses having profiled, patterned or microstructured surfaces
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/14—Die top coat materials, e.g. materials for the glass-contacting layers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/02—Press-mould materials
- C03B2215/08—Coated press-mould dies
- C03B2215/30—Intermediate layers, e.g. graded zone of base/top material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2215/00—Press-moulding glass
- C03B2215/40—Product characteristics
- C03B2215/41—Profiled surfaces
- C03B2215/414—Arrays of products, e.g. lenses
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Viewfinders (AREA)
- Mounting, Exchange, And Manufacturing Of Dies (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、カメラ等の光学機械の焦点板を製造するため
の焦点板用金型の製造方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a focusing plate mold for manufacturing a focusing plate for an optical machine such as a camera.
カメラ等の光学機械の焦点板を製造する方法やそのため
の金型としては、特開昭61−120128号公報に開
示された技術がある。As a method for manufacturing a focus plate for an optical machine such as a camera and a mold therefor, there is a technique disclosed in Japanese Patent Application Laid-Open No. 120128/1983.
かかる技術は、金属板の表面に角錐状の規則的な凹凸レ
リーフを加工し、その表面にサテン状の電気メッキを行
うことにより各角錐をレンズ面となした後、さらに電気
メッキを施して得た表面形状を転写面として光学素材に
転写する方法である。This technique involves machining regular pyramid-shaped uneven reliefs on the surface of a metal plate, applying satin-like electroplating to the surface to form each pyramid into a lens surface, and then applying further electroplating to obtain a lens surface. This method uses the surface shape obtained as a transfer surface to transfer onto an optical material.
上記方法によれば、角錐状の凹凸レリーフは電気メッキ
のスムージングパワーにより角錐頂部及び稜面部の角が
丸められ、微小レンズレリーフとなる。従って、かかる
微小レンズレリーフを転写した焦点板は、その微小レン
ズによって光の拡散作用が得られる。又、レンズ面に形
成されたサテン状のレリーフも光の拡散作用が得られる
。According to the above method, the pyramid-shaped uneven relief has rounded corners of the pyramid top and ridge surface by the smoothing power of electroplating, and becomes a minute lens relief. Therefore, a focusing plate to which such microlens reliefs are transferred can obtain a light diffusing effect due to the microlenses. Further, the satin-like relief formed on the lens surface also provides a light diffusing effect.
上記従来技術により製造される焦点板用金型は、微小レ
ンズの集合体よりなる拡散レリーフを有するが、かかる
微小レンズ群における互に隣接する微小レンズ間の谷部
がエツジ状(非円滑状a)となっているために、各微小
レンズ間の谷部を通る光が大きく拡散し、ケラれ、その
部分が黒点状のムラを生ずるという大きな問題点があっ
た。The focusing plate mold manufactured by the above-mentioned conventional technique has a diffusion relief made of an aggregate of microlenses, but the valleys between adjacent microlenses in the microlens group are edge-shaped (non-smooth a ), there was a major problem in that the light passing through the valleys between the microlenses was greatly diffused and vignetted, causing black dot-like unevenness in that area.
又、薇小レンズが規則的に配列された形状であることか
ら回折現象が生じ、各レンズを通る光が干渉してデフォ
ーカス時に不自然な多線ボケを生ずるという問題点があ
った。Further, since the small lenses are regularly arranged, a diffraction phenomenon occurs, and the light passing through each lens interferes, resulting in an unnatural multi-line blur when defocused.
本発明は、上記従来技術の問題点に鑑みなされたもので
あって、微小レンズ状レリーフにおける各微小レンズ間
の谷部を通る光の拡散を小さく抑え、従来のような黒点
状のムラがなく、かつ自然なボケ味を有する焦点板を転
写しうるようにした焦点板用金型の製造方法を提供する
ことを目的とする。The present invention has been made in view of the above-mentioned problems of the prior art, and suppresses the diffusion of light passing through the valleys between the microlenses in the microlens-shaped relief to a minimum, thereby eliminating the sunspot-like unevenness seen in the prior art. It is an object of the present invention to provide a method for manufacturing a focus plate mold which is capable of transferring a focus plate having a natural blur.
〔課題を解決するための手段及び作用〕本発明は、金属
板の表面に角錐状の規則的な凹凸レリーフを加工し、そ
の表面に平滑作用のある添加剤を含有する硫酸酸性ニッ
ケル電気メッキを施して隣接する角錐の谷部を埋めて滑
らかな曲率を有する面に形成し、その後、平滑作用のな
い添加剤を含有するサテン状硫酸酸性銅電気メッキを施
すとともに、そのサテン状銅メッキ層の上に平滑作用の
ない添加剤を含有する硫酸酸性ニッケル電気メッキを施
して転写表面を形成する焦点板用金型の製造方法を提供
することにより、黒点状ムラの生じない、かつ自然なボ
ケ味を有する焦点板を製作しうる金型を容易に製造でき
るようにしたものである。[Means and effects for solving the problem] The present invention involves processing a regular pyramid-shaped uneven relief on the surface of a metal plate, and applying sulfuric acid acid nickel electroplating containing an additive with a smoothing effect to the surface. The troughs of the adjacent pyramids are filled in to form a surface with a smooth curvature, and then satin sulfuric acid acid copper electroplating containing an additive with no smoothing effect is applied, and the satin copper plating layer is By providing a method for manufacturing a focusing plate mold in which a transfer surface is formed by applying sulfuric acid acid nickel electroplating containing an additive that does not have a smoothing effect on the top, it is possible to obtain a natural bokeh without causing black spot unevenness. This makes it possible to easily manufacture a mold that can manufacture a reticle having a focusing plate.
以下、必要に応じて図面を用いつつ本発明の実施例につ
いて詳細に説明する。Embodiments of the present invention will be described in detail below, using drawings as necessary.
(第1実施例)
第1図a、b、c、dは、本発明に係る焦点板用金型の
製造方法における製造工程を示す説明図である。以下、
第1図を用いて本発明に係る焦点板用金型の製造方法の
1実施例について説明する。(First Embodiment) FIGS. 1a, b, c, and d are explanatory diagrams showing manufacturing steps in a method for manufacturing a mold for a focus plate according to the present invention. below,
An embodiment of the method for manufacturing a focusing plate mold according to the present invention will be described with reference to FIG.
〈第1工程〉
まず、第1図a、第2図にて示すように、金属板よりな
るベースlの表面に機械加工にて角錐状の規則的な凹凸
レリーフ2を形成する。この角錐状の凹凸レリーフ2は
、ピッチ15μm、底面となす角度を30”とした6角
錐3と3角錐4との組合せにて形成しである。角錐状の
凹凸レリーフ2は、研削盤等を用いてダ、イヤモンドバ
イトで容易に加工できるものであり、近年のように高精
度加工技術が進展した現状においては、第2図にて示す
ごとき簡単な3本の直線の組合せによる角錐の機械加工
は容易かつ高精度に加工できる。<First Step> First, as shown in FIGS. 1a and 2, a pyramid-shaped regular uneven relief 2 is formed by machining on the surface of a base l made of a metal plate. This pyramid-shaped uneven relief 2 is formed by a combination of a hexagonal pyramid 3 and a triangular pyramid 4 with a pitch of 15 μm and an angle of 30 inches with the bottom surface. It can be easily machined with a diamond cutting tool, and in the current situation where high-precision machining technology has advanced in recent years, it is now possible to machine a pyramid using a simple combination of three straight lines as shown in Figure 2. can be processed easily and with high precision.
く第2工程〉
次に、第1図すにて示すように、上記工程にて加工形成
した角錐状の規則的な凹凸レリーフ2にレベリング作用
を有する添加剤を含んだ硫酸性ニッケル浴にて電気メッ
キし、ニッケルメッキ層5を形成する。本工程の硫酸性
ニッケル浴にて、3角錐4の頂点が無くなるまで埋める
とともに、6角錐3上にメッキされたメッキ層の冬山部
と山部の境部(3角錐4の頂部を埋めた部分)を滑らか
な面で形成するようにする。レベリング作用を存するニ
ッケルメッキは、レベリング作用を有しないニッケルメ
ッキ液IE当りに添加剤として1次光火剤ニクスター1
000 (商品名)を20M172次光沢剤ニクスター
2000 (商品名)を1.5m加えたものを用いた。Second step> Next, as shown in Figure 1, the pyramid-shaped regular relief 2 formed in the above step is treated with a sulfuric acid nickel bath containing an additive having a leveling effect. Electroplating is performed to form a nickel plating layer 5. In the sulfuric acid nickel bath of this process, fill in the triangular pyramid 4 until the apex disappears, and also fill in the boundary between the winter mountain part and the mountain part of the plating layer plated on the hexagonal pyramid 3 (the part where the top of the triangular pyramid 4 is filled) ) with a smooth surface. Nickel plating that has a leveling effect can be used as an additive for the nickel plating solution IE that does not have a leveling effect.
000 (trade name) to which 1.5 m of 20M17 secondary brightener Nixstar 2000 (trade name) was added was used.
なお、レベリング作用を有しないニッケルメッキ液は、
後述の第4工程のニッケルメッキ液を用いた。又、メッ
キ液によるレベリング効果は、電気メッキ時の電解電流
密度の大小によって調整可能である。In addition, nickel plating liquid that does not have a leveling effect is
The nickel plating solution used in the fourth step, which will be described later, was used. Furthermore, the leveling effect of the plating solution can be adjusted by adjusting the electrolytic current density during electroplating.
本工程のニッケルメッキ処理後においては、山部はまだ
エツジ状であり、レンズ形状となっていない。After the nickel plating process in this step, the peaks are still edge-shaped and do not have a lens shape.
く第3工程〉
次に第1図Cにて示すように、前工程にてメッキ処理し
たニッケルメッキ層5の上に酸性銅メッキ浴にてサテン
状の電気メッキを施し、サテン状銅メッキ層6を形成す
る0本工程においては、電気メッキのスムージングパワ
ーにより冬山部の頂点及び稜線部のエツジ状部が丸めら
れ、レンズ形状となる。又、図に示すように表面に微細
な凹凸構造が形成される。Third step> Next, as shown in FIG. 1C, satin-like electroplating is applied to the nickel plating layer 5 plated in the previous step in an acidic copper plating bath to form a satin-like copper plating layer. In the 0-step process of forming 6, the smoothing power of electroplating rounds the peaks of the winter mountain portions and the edge-like portions of the ridgeline portions, forming a lens shape. Further, as shown in the figure, a fine uneven structure is formed on the surface.
本工程のニッケルメッキは、メッキ液11当り硫酸w4
(含5 Hz O) 115gr、硫酸210gr。Nickel plating in this process requires 4 w4 sulfuric acid per 11 plating solution.
(including 5 Hz O) 115gr, sulfuric acid 210gr.
塩酸イオン30■とを基礎硫酸銅メッキ浴とし、基礎添
加剤としてキエートロニクスA(商品名)を20m
キュートロニクス(商品名)818mを使用し、浴温度
28°Cで空気攪拌を行いながらメッキを行った。Hydrochloric acid ion 30μ was used as the basic copper sulfate plating bath, and Chietronics A (trade name) was used as the basic additive for 20m
Plating was carried out using Cutronics (trade name) 818m at a bath temperature of 28° C. while stirring air.
〈第4工程〉
本工程では、前工程にてメッキ処理されたサテン状銅メ
ッキ層6の上に、レベリング作用(平滑作用)を有しな
い添加剤を含有する硫酸酸性ニッケル浴にて電気メッキ
を行い、第1図dにて示すように最終ニッケルメッキ層
7を形成する。本工程のニッケルメッキを施すことによ
り、前工程の銅メッキにて形成されたレンズ面状の極め
て微細な凹凸レリーフがなだらかな起伏の凹凸レリーフ
に整形される。又、本工程にて形成される最終ニッケル
メッキ層7は、図に示すように前工程のサテン状銅メッ
キ層6のサテンの影響を残しながらも、凹凸レリーフの
滑らかな谷部がエツジ状にならない程度の形状に整形さ
れる。<Fourth step> In this step, electroplating is performed on the satin-like copper plating layer 6 plated in the previous step in a sulfuric acid acidic nickel bath containing an additive that does not have a leveling effect (smoothing effect). A final nickel plating layer 7 is formed as shown in FIG. 1d. By applying nickel plating in this step, the extremely fine uneven relief in the shape of a lens surface formed in the copper plating in the previous step is shaped into a gently undulating relief. In addition, as shown in the figure, the final nickel plating layer 7 formed in this step retains the satin effect of the satin-like copper plating layer 6 in the previous step, but the smooth valleys of the uneven relief are shaped into edges. It is shaped into a shape that does not look like it should.
本工程のニッケルメッキは、メッキ液12当り硫酸ニッ
ケル(含6 H□○)250gr、塩化ニッケル(含6
H,○)75gr、ホウ酸40grを基礎ニッケル浴と
し、電解質のPH値を4.4〜4.6に保ち浴温度を4
8゛C〜52°Cとし、液を撹拌せずにカソードロッキ
ング法によってメッキした。又、本工程において銅メッ
キの上に施すニッケルメッキは、添加剤としてスルフォ
ン酸末を用いた。Nickel plating in this process uses 250g of nickel sulfate (containing 6H□○) and nickel chloride (containing 6H) per 12 plating solutions.
H, ○) 75gr and boric acid 40gr as a basic nickel bath, keeping the pH value of the electrolyte between 4.4 and 4.6 and the bath temperature at 4.
The temperature was 8°C to 52°C, and plating was carried out by the cathode locking method without stirring the liquid. Furthermore, in this process, sulfonic acid powder was used as an additive for the nickel plating applied on top of the copper plating.
以上の工程を経て、最終製品である焦点板製造用金型8
が得られる。そして、上記工程にて製造された焦点板製
造用金型8を原型として光学素材に転写することにより
、第3図にて示すごとき微小レンズ状レリーフ(凹凸レ
リーフ)10を有する所要の焦点板11を得ることがで
きるものである。第4図は、本実施例の方法により製作
した焦点板製造用金型8を用いて得られた焦点板11の
光散乱特性を示す説明図である。本実施例方法にて製造
した金型8は、微小レンズ間の谷部が滑らかな形状に整
形されているので、かかる金型8を用いて製作した焦点
板11の微小レンズ状レリーフ10における微小レンズ
間の谷部12を通る光13は、谷部12により比較的狭
い角度βで散乱されることになる。従って、微小レンズ
間の谷部を通る光13の散乱は小さく抑えられるので明
るくなり、その結果、従来性じていたような黒点状のム
ラの発生をなくすことができるのである。なお、14で
示すのは散乱光である。After the above steps, the final product, the focusing plate manufacturing mold 8
is obtained. Then, by using the reticle manufacturing mold 8 manufactured in the above process as a master model and transferring it to an optical material, a required reticle 11 having microlens-like reliefs (concavo-convex reliefs) 10 as shown in FIG. This is something that can be obtained. FIG. 4 is an explanatory diagram showing the light scattering characteristics of the focus plate 11 obtained using the focus plate manufacturing mold 8 manufactured by the method of this example. In the mold 8 manufactured by the method of this embodiment, the valleys between the microlenses are shaped into a smooth shape. Light 13 passing through the valleys 12 between the lenses will be scattered by the valleys 12 at a relatively narrow angle β. Therefore, the scattering of the light 13 passing through the valleys between the microlenses is suppressed to a small level, resulting in brightness, and as a result, it is possible to eliminate the occurrence of sunspot-like unevenness that has conventionally occurred. Note that 14 indicates scattered light.
又、本実施例においては、第4工程にて説明したように
、最終ニッケルメッキ層7の表面を、その前の工程にて
形成された銅メッキ層6のサテンの影響を残し、微小な
凹凸を有する表面に形成する(第1図d参照)ので、か
かる本実施例の方法にて製造した金型8を用いて製作し
た焦点板11の微小レンズ状レリーフ10の表面にも微
小な凹凸15が形成される。この表面の微小な凹凸15
は、微小レンズ状レリーフ10にて攪拌された光で発生
する回折現象を弱める働きをするので、自然なボケ味を
有する焦点板を得ることができる。In addition, in this example, as explained in the fourth step, the surface of the final nickel plating layer 7 is left with the satin effect of the copper plating layer 6 formed in the previous step, and has minute irregularities. (see FIG. 1d), the surface of the microlens-like relief 10 of the focus plate 11 manufactured using the mold 8 manufactured by the method of this embodiment also has microscopic irregularities 15. is formed. Minute irregularities on this surface 15
serves to weaken the diffraction phenomenon generated by the light stirred by the microlens-like relief 10, so it is possible to obtain a reticle with natural blur.
以上のように、本実施例によれば、微小レンズ間の谷部
で発生する大きな角度をもった拡散光を抑えるとともに
、微小レンズ表面の微小凹凸15にて更に散乱させて明
るく、黒点状のムラのない、かつ自然なボケ味を有する
焦点板11を転写しうる焦点板用金型8を製造できるも
のである。As described above, according to this embodiment, the diffused light with a large angle generated in the valleys between the microlenses is suppressed, and the light is further scattered by the microscopic irregularities 15 on the surface of the microlenses, resulting in bright, sunspot-shaped light. It is possible to manufacture a focus plate mold 8 that can transfer the focus plate 11 with an even and natural blur.
上記効果は、第5図にて示す焦点板11aと比較すれば
より明白となる。即ち、第5図にて示す焦点+Ii 1
1 aは、スムージングパワーを有スる電気メッキを行
うことにより得られた焦点板製造用金型を用いて転写し
た焦点板11aの光散乱特性を示す図であるが、図に示
すように、この場合は、微小レンズ状レリーフ10aの
微小レンズ間の谷部12aがきついエツジとなっている
ために谷部12aによって光線13aが大きな角度αで
拡散されることになり、従ってその部分が黒点状のムラ
を生じることとなる。又、かがる焦点板においては、微
小レンズが規則的に配列された形状でありしかも、本実
施例の場合のような凹凸15がないので、回折現象が生
じ、各レンズを通る光が干渉してデフォーカス時に不自
然なボケを生ずることとなる。この焦点板11aは、従
来技術の製造用型にて転写されたものと同様のものであ
るところから、本実施例は、かかる従来の技術の問題点
を解決することができるものである。なお、14aで示
すのは散乱光である。The above effect becomes more obvious when compared with the focusing plate 11a shown in FIG. That is, the focal point +Ii 1 shown in FIG.
1a is a diagram showing the light scattering characteristics of a focusing plate 11a transferred using a focusing plate manufacturing mold obtained by performing electroplating with smoothing power. In this case, since the valleys 12a between the microlenses of the microlens-shaped relief 10a have sharp edges, the light rays 13a are diffused by the valleys 12a at a large angle α, and therefore, the valleys 12a become sunspot-like. This will result in unevenness. In addition, since the refocusing plate has a shape in which microlenses are regularly arranged and there is no unevenness 15 as in the case of this embodiment, a diffraction phenomenon occurs and the light passing through each lens interferes. This results in unnatural blurring when defocusing. Since this focusing plate 11a is similar to that transferred using a manufacturing mold of the prior art, this embodiment can solve the problems of the prior art. Note that 14a indicates scattered light.
なお、上記本実施例の製造工程にてメッキ整形された型
表面のレリーフパターンはそのまま転写型として使用す
ることができるものであるが、電鋳法を作り、これを光
学プラスチックに転写することもできる。この場合、レ
リーフの凹凸が逆になるが、性能は同しである。又、同
様にメッキされたレリーフパターンを転写型として使用
して得られた焦点板を電鋳法を利用して反転させた型を
作り、これを光学プラスチックに転写することもできる
。これら電鋳法による型の製造法により、1つのメンキ
されたレリーフパターンをもつ型から複数の同様なレリ
ーフパターンをもつ型を容易に作ることができるもので
ある。Although the relief pattern on the mold surface plated and shaped in the manufacturing process of this example above can be used as a transfer mold as it is, it is also possible to create an electroforming method and transfer it to optical plastic. can. In this case, the unevenness of the relief is reversed, but the performance is the same. Furthermore, it is also possible to use electroforming to create a mold in which the reticle obtained by using a similarly plated relief pattern as a transfer mold is inverted, and this can be transferred to optical plastic. By using these electroforming mold manufacturing methods, it is possible to easily make molds having a plurality of similar relief patterns from a mold having a single scratched relief pattern.
又、本実施例においては、ベース1に機械加工する角錐
状の凹凸レリーフ2を任意に設定できるとともに、角錐
の角度5メッキの膜厚等を任意に選択して目的に応じた
特性の焦点板製造用金型8を得ることができる。又、角
錐状の凹凸レリーフ2にメッキ処理を施す際のメッキ浴
の組成とメッキ方法とを選択して歩留りのよいメッキを
行うことができる。In addition, in this embodiment, the pyramid-shaped uneven relief 2 machined on the base 1 can be set arbitrarily, and the thickness of the plating of the pyramid angle 5 can be arbitrarily selected to create a focus plate with characteristics according to the purpose. A manufacturing mold 8 can be obtained. Further, by selecting the composition of the plating bath and the plating method when plating the pyramid-shaped uneven relief 2, it is possible to perform plating with a high yield.
以上のように、本発明に係る焦点板用金型の製造方法に
よれば、微小レンズ状レリーフにおける微小レンズ間の
谷部を通る光の散乱を小さ(抑え、黒点状のムラの生じ
ない、かつ自然なボケ味を有する焦点板を転写製作する
ことができる焦点板用金型を容易に製造出来る。As described above, according to the method for manufacturing a focus plate mold according to the present invention, the scattering of light passing through the valleys between the microlenses in the microlens-shaped relief is minimized (suppressed), and sunspot-like unevenness does not occur. In addition, it is possible to easily manufacture a mold for a focus plate that can transfer and produce a focus plate having a natural blur.
第1図a、b、c、dは、本発明に係る金型製造方法の
1実施例の製造工程を示す説明図、第2図は、第1図a
の工程における金型表面の凹凸レリーフを示す説明図、
第3図は、本発明に係る方法の1実施例により製造した
金型により転写製作した焦点板を示す側面図、
第4図、第5図は、本発明に係る方法の1実施例により
製造した金型にて転写製作した焦点板の光散乱特性を説
明するための作用説明図である。
1・・・ベース(金属板)
2・・・角錐状の凹凸レリーフ
5・・・ニッケルメッキ層
6・・・サテン状銅メッキ層
7・・・最終ニッケルメッキ層Figures 1a, b, c, and d are explanatory diagrams showing the manufacturing process of one embodiment of the mold manufacturing method according to the present invention, and Figure 2 is an explanatory diagram showing the manufacturing process of one embodiment of the mold manufacturing method according to the present invention.
FIG. 3 is a side view showing a reticle produced by transfer using a mold manufactured by an embodiment of the method according to the present invention; FIGS. The figure is an operational explanatory diagram for explaining the light scattering characteristics of a reticle produced by transfer using a mold manufactured by an embodiment of the method according to the present invention. 1...Base (metal plate) 2...Pyramid-shaped uneven relief 5...Nickel plating layer 6...Satin-like copper plating layer 7...Final nickel plating layer
Claims (1)
加工し、その表面に平滑作用のある添加剤を含有する硫
酸酸性ニッケル電気メッキを施して隣接する角錐の谷部
を埋めて滑らかな曲率を有する面に形成し、その後、平
滑作用のない添加剤を含有するサテン状硫酸酸性銅電気
メッキを施すとともに、そのサテン状銅メッキ層の上に
平滑作用のない添加剤を含有する硫酸酸性ニッケル電気
メッキを施して転写表面を形成すること特徴とする焦点
板用金型の製造方法。(1) A pyramid-shaped regular uneven relief is processed on the surface of the metal plate, and sulfuric acid nickel electroplating containing a smoothing additive is applied to the surface to fill in the valleys of the adjacent pyramids and smooth the surface. After that, satin-like sulfuric acid acid copper electroplating containing non-smoothing additives is applied, and on the satin-like copper plating layer, sulfuric acid containing non-smoothing additives is applied. A method of manufacturing a mold for a focusing plate, characterized in that a transfer surface is formed by applying acidic nickel electroplating.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21909688A JPH0266531A (en) | 1988-09-01 | 1988-09-01 | Production of metallic mold for reticle |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21909688A JPH0266531A (en) | 1988-09-01 | 1988-09-01 | Production of metallic mold for reticle |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0266531A true JPH0266531A (en) | 1990-03-06 |
Family
ID=16730196
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21909688A Pending JPH0266531A (en) | 1988-09-01 | 1988-09-01 | Production of metallic mold for reticle |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0266531A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6972073B2 (en) | 1998-09-29 | 2005-12-06 | Metso Paper, Inc. | Method for conveying and guiding a lead-in strip of a web in a paper machine |
| JP2008058388A (en) * | 2006-08-29 | 2008-03-13 | Brother Ind Ltd | Image forming apparatus |
| JP2008265130A (en) * | 2007-04-19 | 2008-11-06 | Olympus Corp | Fly eye lens molding die, and fly eye lens molding die machining device, and fly eye lens molding die machining method |
-
1988
- 1988-09-01 JP JP21909688A patent/JPH0266531A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6972073B2 (en) | 1998-09-29 | 2005-12-06 | Metso Paper, Inc. | Method for conveying and guiding a lead-in strip of a web in a paper machine |
| JP2008058388A (en) * | 2006-08-29 | 2008-03-13 | Brother Ind Ltd | Image forming apparatus |
| JP2008265130A (en) * | 2007-04-19 | 2008-11-06 | Olympus Corp | Fly eye lens molding die, and fly eye lens molding die machining device, and fly eye lens molding die machining method |
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