JPH02665A - Phthalocyanine compound - Google Patents
Phthalocyanine compoundInfo
- Publication number
- JPH02665A JPH02665A JP107489A JP107489A JPH02665A JP H02665 A JPH02665 A JP H02665A JP 107489 A JP107489 A JP 107489A JP 107489 A JP107489 A JP 107489A JP H02665 A JPH02665 A JP H02665A
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- compound
- phthalocyanine compound
- atoms
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Phthalocyanine compound Chemical class 0.000 title claims abstract description 43
- 230000003287 optical effect Effects 0.000 claims abstract description 12
- 125000000623 heterocyclic group Chemical group 0.000 claims abstract description 9
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims abstract description 9
- 125000004429 atom Chemical group 0.000 claims abstract description 7
- 229910052751 metal Inorganic materials 0.000 claims abstract description 7
- 239000002184 metal Substances 0.000 claims abstract description 7
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 claims abstract description 3
- MGNZXYYWBUKAII-UHFFFAOYSA-N cyclohexa-1,3-diene Chemical group C1CC=CC=C1 MGNZXYYWBUKAII-UHFFFAOYSA-N 0.000 claims abstract description 3
- 150000001875 compounds Chemical class 0.000 claims description 31
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 125000004432 carbon atom Chemical group C* 0.000 claims description 4
- 150000004820 halides Chemical class 0.000 claims description 4
- 125000004434 sulfur atom Chemical group 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 229910052717 sulfur Inorganic materials 0.000 claims description 2
- 229910052725 zinc Inorganic materials 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims 2
- 239000000463 material Substances 0.000 abstract description 32
- 239000004065 semiconductor Substances 0.000 abstract description 17
- 238000010992 reflux Methods 0.000 abstract description 9
- 230000035945 sensitivity Effects 0.000 abstract description 7
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 239000003960 organic solvent Substances 0.000 abstract description 4
- 238000002360 preparation method Methods 0.000 abstract description 2
- LMBFAGIMSUYTBN-MPZNNTNKSA-N teixobactin Chemical compound C([C@H](C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H](CCC(N)=O)C(=O)N[C@H]([C@@H](C)CC)C(=O)N[C@@H]([C@@H](C)CC)C(=O)N[C@@H](CO)C(=O)N[C@H]1C(N[C@@H](C)C(=O)N[C@@H](C[C@@H]2NC(=N)NC2)C(=O)N[C@H](C(=O)O[C@H]1C)[C@@H](C)CC)=O)NC)C1=CC=CC=C1 LMBFAGIMSUYTBN-MPZNNTNKSA-N 0.000 abstract 3
- 150000002366 halogen compounds Chemical class 0.000 abstract 1
- 230000001105 regulatory effect Effects 0.000 abstract 1
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 21
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 14
- 238000000034 method Methods 0.000 description 14
- 239000000758 substrate Substances 0.000 description 10
- 238000010521 absorption reaction Methods 0.000 description 9
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 125000005843 halogen group Chemical group 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- QPUYECUOLPXSFR-UHFFFAOYSA-N 1-methylnaphthalene Chemical compound C1=CC=C2C(C)=CC=CC2=C1 QPUYECUOLPXSFR-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 125000003118 aryl group Chemical group 0.000 description 4
- 238000004040 coloring Methods 0.000 description 4
- 238000005562 fading Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 3
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003545 alkoxy group Chemical group 0.000 description 3
- OPQARKPSCNTWTJ-UHFFFAOYSA-L copper(ii) acetate Chemical compound [Cu+2].CC([O-])=O.CC([O-])=O OPQARKPSCNTWTJ-UHFFFAOYSA-L 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 229910052708 sodium Inorganic materials 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 description 2
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 description 2
- JTPNRXUCIXHOKM-UHFFFAOYSA-N 1-chloronaphthalene Chemical compound C1=CC=C2C(Cl)=CC=CC2=C1 JTPNRXUCIXHOKM-UHFFFAOYSA-N 0.000 description 2
- ONJRTQUWKRDCTA-UHFFFAOYSA-N 2h-thiochromene Chemical group C1=CC=C2C=CCSC2=C1 ONJRTQUWKRDCTA-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 2
- 239000000020 Nitrocellulose Substances 0.000 description 2
- 238000002835 absorbance Methods 0.000 description 2
- 239000001110 calcium chloride Substances 0.000 description 2
- 229910001628 calcium chloride Inorganic materials 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- 229940117389 dichlorobenzene Drugs 0.000 description 2
- 239000012769 display material Substances 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 239000000113 methacrylic resin Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229920001220 nitrocellulos Polymers 0.000 description 2
- 108091008695 photoreceptors Proteins 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- COKMLVOGWBEPNX-UHFFFAOYSA-N 1-(dipropylamino)ethanol Chemical compound CCCN(C(C)O)CCC COKMLVOGWBEPNX-UHFFFAOYSA-N 0.000 description 1
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- BFSVOASYOCHEOV-UHFFFAOYSA-N 2-diethylaminoethanol Chemical compound CCN(CC)CCO BFSVOASYOCHEOV-UHFFFAOYSA-N 0.000 description 1
- MGADZUXDNSDTHW-UHFFFAOYSA-N 2H-pyran Chemical compound C1OC=CC=C1 MGADZUXDNSDTHW-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- 229940126062 Compound A Drugs 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- NLDMNSXOCDLTTB-UHFFFAOYSA-N Heterophylliin A Natural products O1C2COC(=O)C3=CC(O)=C(O)C(O)=C3C3=C(O)C(O)=C(O)C=C3C(=O)OC2C(OC(=O)C=2C=C(O)C(O)=C(O)C=2)C(O)C1OC(=O)C1=CC(O)=C(O)C(O)=C1 NLDMNSXOCDLTTB-UHFFFAOYSA-N 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 101150048609 RR21 gene Proteins 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000005083 alkoxyalkoxy group Chemical group 0.000 description 1
- 125000005336 allyloxy group Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 229940125904 compound 1 Drugs 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000003136 n-heptyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920005668 polycarbonate resin Polymers 0.000 description 1
- 239000004431 polycarbonate resin Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920013716 polyethylene resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920005990 polystyrene resin Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 238000010898 silica gel chromatography Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000003718 tetrahydrofuranyl group Chemical group 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- YZYKBQUWMPUVEN-UHFFFAOYSA-N zafuleptine Chemical compound OC(=O)CCCCCC(C(C)C)NCC1=CC=C(F)C=C1 YZYKBQUWMPUVEN-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、新規なフタロシアニン系化合物に関するもの
である。詳しくは、本発明は各種の記録・記憶材料、複
写材料、調光材料、印刷感光体レーザー用感光材料、写
真植字用感光材料あるいは光学フィルター、マスキング
用材料、光ユ計。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a novel phthalocyanine compound. Specifically, the present invention relates to various recording/memory materials, copying materials, light control materials, photosensitive materials for printing photoreceptors, lasers, photosensitive materials for phototypesetting, optical filters, masking materials, and photometers.
デイスプレィ用材料として有用なフォトクロミック性を
有する新規なフタロシアニン系化合物に関するものであ
る。The present invention relates to a novel phthalocyanine compound having photochromic properties useful as a display material.
[従来の技術及び先行技術]
光の照射により発色又は消色する、フォトクロミック性
を有する化合物は種々知られており、これを利用したフ
ォトクロミック材料が従来より提案されている。[Prior Art and Prior Art] Various compounds are known that have photochromic properties that develop or discolor when irradiated with light, and photochromic materials using these compounds have been proposed.
例えば、特開昭55−149812には、ニトロセルロ
ース系樹脂に次式の様なスピロピラン化合物を分散させ
たフォトクロミック材料が提案されている。For example, JP-A-55-149812 proposes a photochromic material in which a spiropyran compound of the following formula is dispersed in a nitrocellulose resin.
(式中、R″は水素原子又はハロゲン原子を示し、Rb
はアルキル基を示し、Rcは水素原子又はアルコキシ基
を示す、)
また、特公昭45−28892号には、次式のようなス
ピロナフトオキサジン系化合物を含有するフォトクロミ
ック材料が提案されている。(In the formula, R″ represents a hydrogen atom or a halogen atom, and R″
represents an alkyl group, and Rc represents a hydrogen atom or an alkoxy group.) Furthermore, Japanese Patent Publication No. 45-28892 proposes a photochromic material containing a spironaphthoxazine compound as shown in the following formula.
(式中、R6は水素原子、ハロゲン原子、シアノ基、炭
素数1〜8のアルキル基又はアルコキシ基を示す。)
ところで、近年、このようなフォトクロミック化合物を
可逆的な光記録材料として用いようとする研究か盛んに
行なわれているか、この場合、次のような条件が満足さ
れていることが要求される。(In the formula, R6 represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group having 1 to 8 carbon atoms, or an alkoxy group.) In recent years, attempts have been made to use such photochromic compounds as reversible optical recording materials. In this case, the following conditions must be met:
■ 半導体レーザー感受性
■ 非破壊読み出し
■ 記録の熱安定性
■ 早い応答速度
■ 繰り返し耐久性
上記要件のうち■の半導体レーザー感受性を改良した化
合物として次式のようなベンゾチオビラン環を有するス
ピロベンゾピラン誘導体を含有するフォトクロミック材
料が提案されている[浅井伸利他、応用物理学会(春)
予稿集442(1986) コ 。■ Semiconductor laser sensitivity ■ Non-destructive readout ■ Thermal stability of recording ■ Fast response speed ■ Repeat durability Among the above requirements, a spirobenzopyran derivative having a benzothiopyrane ring having a benzothiopyrane ring is used as a compound that improves semiconductor laser sensitivity. A photochromic material has been proposed [Nobutoshi Asai et al., Japan Society of Applied Physics (Spring)]
Proceedings 442 (1986) Ko.
0(:)13
また、■の記録の熱安定性を特に改良した化合物として
、本発明者は、先に特願昭61−122696において
、下記のフォトクロミズムを示すジチェニルジシアノエ
テン誘導体及びそれを使用してなる、記録の熱安定性の
良好な光記録材料を提案した。0(:)13 In addition, as a compound that particularly improves the thermal stability of recording in (2), the present inventor previously disclosed in Japanese Patent Application No. 61-122696 a dithenyldicyanoethene derivative exhibiting the following photochromism and its use. We have proposed an optical recording material with good thermal stability for recording.
(式中、R’、Rh、R’、R’、R’、R’はアルキ
ル基を示す。)
[発明が解決しようとする課題]
フォトクロミック化合物を光記録材料として用いる場合
において、上記■の記録の熱安定性に加えて更に、■の
半導体レーザー感受性の両方の要件を具備することが重
要であるが、従来このような要件を兼備する光記録材料
は提案されておらず、前記スピロベンゾピラン銹導体を
含有するものは、■の記録の熱安定性に劣り、ジチェニ
ルジシアノエテン銹導体よりなるものは■の半導体レー
ザー感受性を備えていないという欠点があった。(In the formula, R', Rh, R', R', R', and R' represent an alkyl group.) [Problems to be Solved by the Invention] When using a photochromic compound as an optical recording material, the above In addition to thermal stability for recording, it is also important to meet the requirements of (1) sensitivity to semiconductor lasers; however, no optical recording material that meets these requirements has hitherto been proposed. Those containing a pyran rust conductor had the disadvantage of being inferior in thermal stability ((2)), and those made of a dithenyldicyanoethene rust conductor did not have the semiconductor laser sensitivity ((3)).
本発明は、光記録材料として用いるに好適な、半導体レ
ーザー領域(600〜900nm)に吸収を有し、しか
も記録の熱安定性も良好なフォトクロミズムを示す新規
化合物を提供することを目的とする。An object of the present invention is to provide a novel compound suitable for use as an optical recording material, which has absorption in the semiconductor laser region (600 to 900 nm) and exhibits photochromism with good thermal stability for recording.
本発明のフタロシアニン系化合物は、一般式[] (式中、Mは2H又は■族、Ib族、Ilb族。The phthalocyanine compound of the present invention has the general formula [] (In the formula, M is 2H or group II, group Ib, group Ilb.
III b族、IVa族、Va族、Via族、■a族の
金属原子及びその酸化物、ハロゲン化物を表わし、A
I 、 A 2 、 A3 、 A 4 、 B l
、 B 2 、 B 3 、 B 4は複素環を表わす
。ただし、A1とs I A2とB2 A3とB3
.A’とB4はそれぞれ光照射によって互いに環化して
、シクロへキサジエン環を形成することにより、その光
学的性質を変化せしめるような複素環である。ただし、
Mが2Hの場合、A1−A4.Bl〜B4は同時にチオ
フェン環ではない。)
で表わされるものである。III Represents metal atoms of group b, group IVa, group Va, group Via, group ■a, and their oxides and halides; A
I, A2, A3, A4, Bl
, B 2 , B 3 and B 4 represent a heterocycle. However, A1 and s I A2 and B2 A3 and B3
.. A' and B4 are heterocycles that change their optical properties by cyclizing each other with light irradiation to form a cyclohexadiene ring. however,
When M is 2H, A1-A4. B1 to B4 are not thiophene rings at the same time. ).
特に、本発明のフタロシアニン系化合物は、一般式[H
]
(式中、Mは2H又は■族
Ib族、Ilb族。In particular, the phthalocyanine compound of the present invention has the general formula [H
] (In the formula, M is 2H, Group Ib, Group Ilb.
III b族、rVa族、Va族、VTa族、■a族の
金属原子及びその酸化物、ハロゲン化物を表わし、X、
YはS、O,Se原子を表わし、RI 、 R2R8,
R6,R7Ra、R目R+2 R+3 RR+7.
RI♂、 R19,R”、 R23,R”はアルキル
基を表わし、R3、R4、R9、RI O、RI 5
RR21、R22は水素原子又はアルキル基を表わす
。III represents metal atoms of group b, group rVa, group Va, group VTa, group ■a, and their oxides and halides, X,
Y represents S, O, Se atom, RI, R2R8,
R6, R7Ra, R eye R+2 R+3 RR+7.
RI♂, R19,R", R23,R" represent an alkyl group, R3, R4, R9, RI O, RI 5
RR21 and R22 represent a hydrogen atom or an alkyl group.
ただし、Mが2Hの場合、X、Yは同時にS原子ではな
い。)
で表わされる化合物であることが好ましく、とりわけ、
上記[I+ ]式において、RI R2R3R4R5、
R6、R7、R11、R9、RI OR1l RI
RR宣 ’、 R” RI 6
R17,RI 8 R” R”R21
,R22,R23,R24が炭素数1〜20の直鎖状又
は分岐状のアルキル基を示し、Mが2HCu、Ni、C
o、Zn、Fe又は■0を示すものであることが好まし
い。However, when M is 2H, X and Y are not S atoms at the same time. ) Preferably, it is a compound represented by
In the above [I+] formula, RI R2R3R4R5,
R6, R7, R11, R9, RI OR1l RI
RR ', R' RI 6
R17, RI 8 R”R”R21
, R22, R23, R24 represent a linear or branched alkyl group having 1 to 20 carbon atoms, and M is 2HCu, Ni, C
It is preferable that the material exhibits o, Zn, Fe, or ■0.
以下に本発明につき詳細に説明する。The present invention will be explained in detail below.
本発明において、A I 、 A 2 、 A 3 、
A 4 、 B l 、 B2B5. B4の複素環
基としては、例えば、下記一般式
[IIIコ
基、ハロゲン原子、トリフルオロメチル基を表わは置換
されていてもよいアルキル基、アリール基、シクロアル
キル基を表わす。)
で示されるもの等が挙げられる。このような複素環基の
具体的な例としては、下記のものが挙げられる。In the present invention, A I , A 2 , A 3 ,
A 4 , B 1 , B2B5. The heterocyclic group represented by B4 is, for example, represented by the following general formula [III group, halogen atom, trifluoromethyl group, or an optionally substituted alkyl group, aryl group, or cycloalkyl group. ). Specific examples of such heterocyclic groups include the following.
基、ハロゲン原子、トリフルオロメチル基を表わし、R
■は水素原子又は置換されていてもよレゾルキル基、ア
リール基、シクロアルキル基を表わす。)
あるいは、下記−形成[IV ]
(式中、環Aは炭化水素環又は複素環を表わし、これら
のうち、特に好ましい複素環基としては、下記−形成[
V]
■ ■ ■
RRRは水素又はアルキル基を表わ
す。)
で示されるものが挙げられる。group, halogen atom, trifluoromethyl group, R
(2) represents a hydrogen atom or an optionally substituted resolkyl group, aryl group, or cycloalkyl group. ) Alternatively, the following -formation [IV] (wherein, ring A represents a hydrocarbon ring or a heterocyclic ring, and among these, particularly preferred heterocyclic groups are the following -formation [IV]
V] ■ ■ ■ RRR represents hydrogen or an alkyl group. ).
なお、前記[+111. [IV]、 [V]式におい
て、■ ■ ■ ■ ■ ■ ■RRRR
RR,Rのア
ルキル基としてはメチル基、エチル基、n−プロピル基
、i−プロピル基、n−ブチル基、i−ブチル基、5e
c−ブチル基、n−ペンチル基、n−へブチル基、n−
ヘキシル基、n−オクチル基、2−エチルヘキシル基、
n−ステアリル基等の01〜2o、好ましくは01〜4
の直鎖状又は分枝状のアルキル基等が挙げられる。R■
■ ■ ■
R、R、Rのハロゲン原子としては、フッ素原子、塩素
原子、臭素原子、ヨウ素原子が挙げ■ ■
られる。また、R、Rのアルキル基、アリール基又はシ
クロヘキシル基の置換基としては、例えば、アルコキシ
基、アルコキシアルコキシ基、アルコキシアルコキシア
ルコキシ基、アリルオキシ基、アリール基、アリールオ
キシ基、シアノ基、ヒドロキシ基、テトラヒドロフリル
基等が挙げられる。Note that the above [+111. In the [IV] and [V] formulas, ■ ■ ■ ■ ■ ■ ■RRRR
The alkyl groups of RR and R include methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, 5e
c-butyl group, n-pentyl group, n-hebutyl group, n-
hexyl group, n-octyl group, 2-ethylhexyl group,
01-2o such as n-stearyl group, preferably 01-4
Examples include straight-chain or branched alkyl groups. R■
■ ■ ■ Examples of the halogen atoms for R, R, and R include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Further, examples of substituents for the alkyl group, aryl group, or cyclohexyl group of R and R include an alkoxy group, an alkoxyalkoxy group, an alkoxyalkoxyalkoxy group, an allyloxy group, an aryl group, an aryloxy group, a cyano group, a hydroxy group, Examples include tetrahydrofuryl group.
本発明においては、前記−形成[If ]で示されるフ
タロシアニン化合物であって、とりわけ、式9式%
R23,R24で表わされるアルキル基が、メチル基、
エチル基、n−プロピル基、i−プロピル基、n−ブチ
ル基、i−ブチル基、5ec−ブチル基、n−ペンチル
基、n−ヘプチル基、n−ヘキシル基、n−オクチル基
、2−エチルヘキシル基、n−ステアリル基等のC8〜
20%好ましくは01〜4の直鎖状又は分岐状のアルキ
ル基であるものが最も好ましい。In the present invention, in the phthalocyanine compound represented by the above-mentioned -formation [If], the alkyl group represented by formula 9 % R23, R24 is a methyl group,
Ethyl group, n-propyl group, i-propyl group, n-butyl group, i-butyl group, 5ec-butyl group, n-pentyl group, n-heptyl group, n-hexyl group, n-octyl group, 2- C8~ such as ethylhexyl group, n-stearyl group, etc.
Most preferred are straight or branched alkyl groups with 20% preferably 01-4.
本発明の化合物は、例えば、次のようにして製造するこ
とができる。即ち、まず、下記−形成%式%[
(式中、R1、R2、R3,R4、R5、R6、R7、
R8,R9R” RII RI2 R”
R14,R]5. R16R” R” R+
9 R” R”、 22. R23R2
4は前記定義に同じ。)
で表わされるジチェニルジシアノエデン誘導体を金属ナ
トリウムの存在下メタノール溶媒等の有機溶媒中、アン
モニアガスを吹き込みながら加熱還流下反応させ、それ
ぞれ下記−形成[X]、 [XI]。The compound of the present invention can be produced, for example, as follows. That is, first, the following -formation % formula % [ (wherein R1, R2, R3, R4, R5, R6, R7,
R8, R9R" RII RI2 R"
R14, R]5. R16R"R" R+
9 R” R”, 22. R23R2
4 is the same as the above definition. ) in the presence of metallic sodium in an organic solvent such as methanol solvent while blowing ammonia gas under heating under reflux to form the following compounds [X] and [XI], respectively.
[X[[]、 [X[II]
(式中、Rl 、 R2、R3、R4、R5、Ra 、
R? 、 R6、R9R1o R口 R12,R+
3. R14,R15,RR17,−R”、R”、R”
、R”、R22,R23R24は前記定義に同じ。)
で表わされるジイミノインドリン化合物を得る。[X[[], [X[II] (wherein, Rl, R2, R3, R4, R5, Ra,
R? , R6, R9R1o R mouth R12, R+
3. R14, R15, RR17, -R", R", R"
, R'', R22, R23 and R24 are the same as defined above.) A diiminoindoline compound is obtained.
次いで、これらを2− (N、N−ジメチルアミノ)エ
タノールまたはブタノール等の有機溶媒に溶解し、その
まま(Mが2Hの場合)、あるいは下記−形成[項]
MCflx ’−”[X
IVコ(式中、Mは2H以外の前記定義に同じ、)で表
わされる金属塩を加えて加熱還流することにより環化し
て、−形成[IIに示されるフタロシアニン系化合物を
製造することができる。Next, these are dissolved in an organic solvent such as 2-(N,N-dimethylamino)ethanol or butanol, and either as is (when M is 2H) or the following -formation [section] MCflx '-"[X
A phthalocyanine compound represented by -formation [II can be produced by adding a metal salt represented by IV (wherein M is the same as defined above except 2H) and cyclizing by heating and refluxing. .
R”
IJ
R’″l
R”
なお、ジイミノインドリン化合物を製造する際に使用さ
れる有機溶媒としては、メタノールの他、エタノール、
n−プロパツール、n−ブタノール、1so−プロパツ
ール等のアルコール系溶媒が好ましい。さらに使用され
る金属としては、ナトリウムの他、カリウム等が挙げら
れる。R" IJ R'"l R" In addition to methanol, ethanol,
Alcohol solvents such as n-propatol, n-butanol, and 1so-propatol are preferred. Furthermore, examples of metals used include potassium in addition to sodium.
反応温度としては、室温から150℃が好ましく、特に
60〜90℃が好ましい。The reaction temperature is preferably from room temperature to 150°C, particularly preferably from 60 to 90°C.
また、ジイミノインドリン化合物からフタロシアニン系
化合物を製造する際に使用される有機溶媒としては、N
、N−ジメチルアミノエタノール、N、N−ジエチルア
ミノエタノール、N、 N−ジ−n−プロピルアミノエ
タノール等のN、N−アルキルアミノアルコール系ある
いはブタノール系溶媒が好適であり、反応温度としては
、80〜200℃、特に100〜150℃が好ましい。In addition, the organic solvent used when producing phthalocyanine compounds from diiminoindoline compounds is N
, N-dimethylaminoethanol, N,N-diethylaminoethanol, N,N-di-n-propylaminoethanol, and other N,N-alkylamino alcohol-based or butanol-based solvents are suitable, and the reaction temperature is 80°C. -200°C, especially 100-150°C is preferred.
このような本発明の新規フタロシアニン系化合物は、下
記のような公知の方法に準じた方法により、これを含有
する記録層を形成し、光記録材料とすることができる。Such a novel phthalocyanine compound of the present invention can be used as an optical recording material by forming a recording layer containing it by a method similar to a known method as described below.
例えば、
■ 本発明のフタロシアニン系化合物を必要に応じて、
ポリエステル樹脂、ポリスチレン樹脂、ポリビニルブチ
ラール樹脂、ポリ塩化ビニリデン、ポリ塩化ビニル、ポ
リメタクリル酸メチル、ポリ酢酸ビニル、酢酸セルロー
ス、エポキシ樹脂、フェノール樹脂等のバインダーと共
に、四塩化炭素、ベンゼン、シクロヘキサン、メチルエ
チルケトン、テトラクロロエタン等の溶媒に分散又は溶
解させて、適当な基板上に塗布する。For example, ■ If necessary, the phthalocyanine compound of the present invention,
Along with binders such as polyester resin, polystyrene resin, polyvinyl butyral resin, polyvinylidene chloride, polyvinyl chloride, polymethyl methacrylate, polyvinyl acetate, cellulose acetate, epoxy resin, and phenol resin, carbon tetrachloride, benzene, cyclohexane, methyl ethyl ketone, It is dispersed or dissolved in a solvent such as tetrachloroethane and applied onto a suitable substrate.
■ 本発明のフタロシアニン系化合物を、公知の蒸着法
又は他の化合物との共蒸着法により、適当な基板上に蒸
着する。(2) The phthalocyanine compound of the present invention is vapor-deposited on a suitable substrate by a known vapor deposition method or a co-evaporation method with other compounds.
■ 本発明のフタロシアニン系化合物を上述のような溶
媒に溶解し、ガラスセル等に封入する。(2) The phthalocyanine compound of the present invention is dissolved in the above-mentioned solvent and sealed in a glass cell or the like.
等の方法により、記録層を形成することにより、光記録
材料を製造することができる。An optical recording material can be manufactured by forming a recording layer using the method described above.
なお、■の方法において、使用される基板としては、使
用する光に対して透明又は不透明のいずれでも良い。基
板材料の材質としては、ガラス、プラスチック、紙、板
状又は箔状の基板等の一般の記録材料の支持体が挙げら
れ、これらのうちプラスチックが種々の点から好適であ
る。プラスチックとしては、アクリル樹脂、メタアクリ
ル樹脂、酢酸ビニル樹脂、塩化ビニル樹脂、ニトロセル
ロース、ポリエチレン樹脂、ポリプロピレン樹脂、ポリ
カーボネート樹脂、ポリイミド樹脂、ポリサルホン樹脂
等が挙げられる。In the method (2), the substrate used may be either transparent or opaque to the light used. Examples of the substrate material include supports for general recording materials such as glass, plastic, paper, plate-like or foil-like substrates, and among these, plastic is preferable from various points of view. Examples of the plastic include acrylic resin, methacrylic resin, vinyl acetate resin, vinyl chloride resin, nitrocellulose, polyethylene resin, polypropylene resin, polycarbonate resin, polyimide resin, polysulfone resin, and the like.
塗布方法としては、ドクターブレード法、キャスト法、
スピナー法、浸漬法など一般に行なわれている塗膜形成
法を採用することができる。Application methods include doctor blade method, casting method,
A commonly used coating film forming method such as a spinner method or a dipping method can be employed.
方、蒸着法としては、真空蒸着法、スパッタリング法等
を採用することができる。On the other hand, as the vapor deposition method, a vacuum vapor deposition method, a sputtering method, etc. can be adopted.
基板上に形成する記録層の膜厚は、100人〜100μ
m、特に1000人〜10μmとするのが好ましい。記
録層は、基板の両面に設けてもよいし、片面だけに設け
てもよい。The thickness of the recording layer formed on the substrate is 100 to 100μ.
m, particularly preferably 1000 to 10 μm. The recording layer may be provided on both sides of the substrate or only on one side.
上記の様にして得られる本発明フタロシアニン系化合物
を用いた光学記録材料への記録は、基体の両面又は片面
に設けた記録層あるいはセル中の記録層に1〜10μm
程度に集束した半導体レーザー光をあてることにより、
容易に行なうことができる。しかして、光照射された部
分は、光エネルギーの吸収により色変化が起こる。記録
された情報の再生は、光による色変化が起きている部分
と起きていない部分の反射率あるいは吸光度の差を読み
とることにより行なうことができる。Recording on an optical recording material using the phthalocyanine compound of the present invention obtained as described above is performed on a recording layer provided on both sides or one side of a substrate or a recording layer in a cell with a thickness of 1 to 10 μm.
By applying moderately focused semiconductor laser light,
It can be done easily. As a result, the area irradiated with light undergoes a color change due to absorption of light energy. The recorded information can be reproduced by reading the difference in reflectance or absorbance between a portion where a color change due to light has occurred and a portion where no color change has occurred.
[実施例]
次に、本発明を実施例により更に具体的に説明するが、
本発明はその要旨を超えない限り、以下の実施例に限定
されるものではない。[Example] Next, the present invention will be explained in more detail with reference to Examples.
The present invention is not limited to the following examples unless it exceeds the gist thereof.
実施例1
(1) ジイミノインドリン化合物の製゛告50ccの
3つロフラスコに塩化カルシウム管の付いた冷却管、温
度計、ガス導入口を装着した。この中に乾燥メタノール
50mJZを入れ、金属ナトリウム0.12g(5,2
xlO−’moIl)及び下記構造式
で表わされるジシアノビス(2,4,5−1−リメチル
チェニル)エテノ(分子ff1326)2.1g(6,
5x 10””mou)を順次溶解した。ガス導入口か
ら乾燥アンモニアガスを導入しながら、室温で1時間攪
拌、続いて3時間速流下反応させた。溶媒を留去後、シ
リカゲルカラムクロマトグラフィーにより分取精製し、
下記構造式で表わされるジイミノインドリン化合物(分
子量343)1.71g (4,99X10””moλ
)を得た。(収率77%)。Example 1 (1) Preparation of diiminoindoline compound A 50 cc three-hole flask was equipped with a cooling tube with a calcium chloride tube, a thermometer, and a gas inlet. Add 50mJZ of dry methanol to this and add 0.12g of metallic sodium (5,2
xlO-'moIl) and 2.1 g (6,
5x 10''mou) were sequentially dissolved. While introducing dry ammonia gas from the gas inlet, the mixture was stirred at room temperature for 1 hour, and then reacted under rapid flow for 3 hours. After distilling off the solvent, the product was purified by silica gel column chromatography.
Diiminoindoline compound (molecular weight 343) represented by the following structural formula 1.71g (4,99X10""moλ
) was obtained. (Yield 77%).
(2) ジイミノインドリン化合物の物性値(i )’
H−NMR(CDCus )δ =1. 76
s 3H1、79s
3H
2,07s 3H
2,09s 3H
2、25s 6H
3,60br 、 s 3H
(ii) 13C−NMR(CDCJZ3 )δ=1
66.5,136.0 135.0134.8,131
.8,131.0゜127.8,127.7,14.2
1 3.2. 1 3. 0
(iii) IR(KBr)
1645cm−’(=NH)
(3) フタロシアニン系化合物の製造−1(1)で得
られた下記構造式
で表わされるフタロシアニン系化合物(分子量t306
)16mgを得た。(収率3%)。(2) Physical property values (i)' of diiminoindoline compounds
H-NMR (CDCus) δ = 1. 76
s 3H1, 79s
3H 2,07s 3H 2,09s 3H 2,25s 6H 3,60br, s 3H (ii) 13C-NMR (CDCJZ3) δ=1
66.5,136.0 135.0134.8,131
.. 8,131.0°127.8,127.7,14.2 1 3.2. 1 3. 0 (iii) IR (KBr) 1645 cm-' (=NH) (3) Production of phthalocyanine compound-1 Phthalocyanine compound represented by the following structural formula obtained in (1) (molecular weight t306
) 16 mg was obtained. (Yield 3%).
で表わされるジイミノインドリン化合物0.5g(1,
46xlO−3moJ2)を2− (N、N−ジメチル
アミノ)エタノール10mILに溶解し、20時間加熱
還流した。この反応液を濾過し、生成物を少量のメタノ
ール、アセトンで数回洗浄後乾燥し、下記構造式
(1)で得られた下記構造式
で表わされるジイミノインドリン化合物0.15gを塩
化カルシウム乾燥管付還流管のついたフラスコ中、乾燥
ブタノール5mflに溶かし、加熱還流した。7時間後
、生成した沈殿を濾別し、メタノール続いてアセトンで
洗浄後、乾燥して(2)と同様のフタロシアニン系化合
物12.8mHな得た(収率8.5%)。更に、濾液を
反応容器にもどし、13時間加熱後、生成した沈殿を濾
別、メタノール続いてアセトンで洗浄後、乾燥して再び
フタロシアニン系化合物23.8mgを得た(収率16
%)。得られたものを合計してフタロシアニン系化合物
36.6mgを得た(収率24.8%)。0.5g of diiminoindoline compound (1,
46xlO-3moJ2) was dissolved in 10 ml of 2-(N,N-dimethylamino)ethanol and heated under reflux for 20 hours. This reaction solution was filtered, the product was washed several times with small amounts of methanol and acetone, and then dried. 0.15 g of a diiminoindoline compound represented by the following structural formula obtained by the following structural formula (1) was dried with calcium chloride. It was dissolved in 5 mfl of dry butanol in a flask equipped with a reflux tube and heated to reflux. After 7 hours, the formed precipitate was filtered, washed with methanol and then acetone, and dried to obtain 12.8 mH of a phthalocyanine compound similar to (2) (yield: 8.5%). Furthermore, the filtrate was returned to the reaction vessel, and after heating for 13 hours, the generated precipitate was separated by filtration, washed with methanol and then acetone, and dried to again obtain 23.8 mg of a phthalocyanine compound (yield: 16
%). The obtained materials were totaled to obtain 36.6 mg of a phthalocyanine compound (yield: 24.8%).
(5) フタロシアニン系化合物の物性値(3)(4)
で得られたフタロシアニン系化合物のλ1llax(0
−ジクロロベンゼン中)は第1図に示したように673
nm、610nmにあり、半導体レーザー領域(600
〜900nm)に吸収があることを確認した。(5) Physical property values of phthalocyanine compounds (3) (4)
λ1llax(0
- in dichlorobenzene) is 673 as shown in Figure 1.
nm, 610 nm, semiconductor laser region (600 nm)
It was confirmed that there was absorption at 900 nm).
実施例2
実施例1において、下記構造式
で表わされるジシアノビス(2,4,5−トリエチルチ
エニル)エテノ2.7gを用いた以外は実施例1と同様
にして下記構造式のフタロシアニン系化合物を得た。Example 2 A phthalocyanine compound having the following structural formula was obtained in the same manner as in Example 1 except that 2.7 g of dicyanobis(2,4,5-triethylthienyl)etheno represented by the following structural formula was used. Ta.
で表わされるジシアノビス(2,4,5−トリメチルチ
エニル)エテノ2.1gの代りに下記構造式
氷晶のλ□X (O−ジクロロベンゼン中)は674
nm、610nmであり、実施例1で得られたものと同
様、半導体レーザー領域(600〜900nm)に吸収
があることが確認された。Instead of 2.1 g of dicyanobis(2,4,5-trimethylthienyl)etheno represented by
nm, 610 nm, and it was confirmed that there was absorption in the semiconductor laser region (600 to 900 nm), similar to that obtained in Example 1.
実施例3〜9
実施例1に準じた方法により、前記−形成[1!コにお
けるMが2H,X及びYがS原子、R1−R24が第1
表に示すアルキル基である化合物を合成し、それぞれ0
−ジクロロベンゼン中のλ□8を測定し、結果を第1表
に示した。Examples 3 to 9 The above-mentioned -formation [1! M in C is 2H, X and Y are S atoms, R1-R24 are the first
Synthesize compounds with alkyl groups shown in the table, each with 0
- λ□8 in dichlorobenzene was measured and the results are shown in Table 1.
実施例10
実施例1の(1)で得られた下記構造式領域(600〜
900nm)に吸収があることを確認した。Example 10 The following structural formula region (600-
It was confirmed that there was absorption at 900 nm).
で表わされるジイミノインドリン化合物0.17gと下
記構造式
%式%)
で表わされる酢酸銅(I+)0.027gを溶かした乾
燥ブタノール溶液を実施例1の(4)と同様の装置で2
0時間加熱還流し、反応させた。反応混合物を実施例1
の(4)と同様に処理し、下記構造式で表わされるフタ
ロシアニン系化合物80mgを得た(収率46.8%)
。A dry butanol solution containing 0.17 g of a diiminoindoline compound represented by the following structural formula (% formula %) and 0.027 g of copper acetate (I+) represented by
The mixture was heated under reflux for 0 hours to react. The reaction mixture was prepared in Example 1.
80 mg of a phthalocyanine compound represented by the following structural formula was obtained (yield 46.8%).
.
得られたフタロシアニン系化合物のλ。ilX (ク
ロロナフタレン中)は第2図に示したように583nm
、639nmにあり、半導体し一ザー実施例11
実施例1の(1)で得られた下記構造式で表わされるジ
イミノインドリン化合物0,13gと下記構造式
%式%
で表わされる塩化ニッケル0.09gを5mILの乾燥
ブタノールに加え、20時間加熱通流して反応させた。λ of the obtained phthalocyanine compound. ilX (in chloronaphthalene) has a wavelength of 583 nm as shown in Figure 2.
, 639 nm, and is a semiconductor.Example 11 0.13 g of the diiminoindoline compound represented by the following structural formula obtained in Example 1 (1) and 0.13 g of nickel chloride represented by the following structural formula % formula %. 09 g was added to 5 mL of dry butanol, and the reaction was carried out by heating and passing through the mixture for 20 hours.
反応生成物を実施例1の(4)と同様に処理し、下記構
造式で表わされるフタロシアニン系化合物2.8mgを
得た(収率2.2%)。The reaction product was treated in the same manner as in Example 1 (4) to obtain 2.8 mg of a phthalocyanine compound represented by the following structural formula (yield: 2.2%).
得られたフタロシアニン系化合物のλ、n!8(1−メ
チルナフタレン中)は580nm。λ, n! of the obtained phthalocyanine compound 8 (in 1-methylnaphthalene) is 580 nm.
639nmであり、半導体レーザー領域(600〜90
0nm)に吸収があることを確認した。639 nm, which is in the semiconductor laser region (600-90
It was confirmed that there was absorption at 0 nm).
実施例12
実施例1の(1)で得られた下記構造式で表わされるジ
イミノインドリン化合物0.50gを5ml1の乾燥2
− (N、N−ジメチルアミノ)エタノールに溶解し、
これに下記構造式2式%
で表わされる酢酸亜鉛二本和物を加え、20時間加熱還
流した。生じた沈殿をメタノールで洗浄後、アセトンで
抽出をくり返し、下記構造式で表わされるフタロシアニ
ン系化合物2mgを得た(収率0.4%)。Example 12 0.50 g of the diiminoindoline compound represented by the following structural formula obtained in (1) of Example 1 was added to 5 ml of dried 2
- (N,N-dimethylamino) dissolved in ethanol,
To this was added zinc acetate dihydrate represented by the following structural formula 2%, and the mixture was heated under reflux for 20 hours. After washing the resulting precipitate with methanol, extraction was repeated with acetone to obtain 2 mg of a phthalocyanine compound represented by the following structural formula (yield: 0.4%).
氷晶のフタロシアニン系化合物のλ、、、(1−メチル
ナフタレン)は590nm、643nmであり、半導体
レーザー領域(600〜900nm)
に吸収があることを確認した。The wavelengths of the ice crystal phthalocyanine compound λ, (1-methylnaphthalene) are 590 nm and 643 nm, and it was confirmed that there is absorption in the semiconductor laser region (600 to 900 nm).
実施例1
実施例1
実施例13〜4
反応させる化合物を適宜選定し、
上述の実施例
と同様にして下記構造式で示されるフタロシアニン系化
合物を製造した。Example 1 Example 1 Examples 13 to 4 Compounds to be reacted were appropriately selected, and phthalocyanine compounds represented by the following structural formula were produced in the same manner as in the above examples.
これらはいずれも半導体 レーザー領域に吸収があることが確認された。All of these are semiconductors. It was confirmed that there is absorption in the laser region.
実施例1
実施例1
実施例1
実施例1
実施例1
実施例2
実施例2
実施例2
実施例2
実施例2
実施例2
実施例2
実施例2
実施例28
実施例3
実施例3
実施例2
実施例3
実施例3
実施例3
実施例3
実施例3
実施例39
実施例40
実施例37
実施例38
実施例41
(1)合成例
下記構造式
で表わされるジイミノインドリン化合物0.25gと下
記構造式
%式%)
で表わされる酢酸銅(II)0.027gを溶かした乾
燥ブタノール溶液を実施例1の(4)と同様の装置で2
0時間加熱還流し、反応させた。反応混合物を実施例1
の(4)と同様に処理し、下記構造式で表わされるフタ
ロシアニン系化合物50mgを得た。Example 1 Example 1 Example 1 Example 1 Example 1 Example 2 Example 2 Example 2 Example 2 Example 2 Example 2 Example 2 Example 2 Example 28 Example 3 Example 3 Example 2 Example 3 Example 3 Example 3 Example 3 Example 3 Example 39 Example 40 Example 37 Example 38 Example 41 (1) Synthesis Example 0.25 g of a diiminoindoline compound represented by the following structural formula and A dry butanol solution containing 0.027 g of copper (II) acetate represented by the following structural formula (% formula %) was heated to 2.
The mixture was heated under reflux for 0 hours to react. The reaction mixture was prepared in Example 1.
(4) to obtain 50 mg of a phthalocyanine compound represented by the following structural formula.
得られたフタロシアニン系化合物のえ0.X (クロロ
ナフタレン中)は630nm、680nmにあり、半導
体レーザー領域(600〜900nm)に吸収があるこ
とを確認した。The weight of the obtained phthalocyanine compound is 0. X (in chloronaphthalene) was found at 630 nm and 680 nm, and it was confirmed that there was absorption in the semiconductor laser region (600 to 900 nm).
得られた化合物のベンゼン溶液をガラスセルに封入し、
このガラスセルに404.5nmの単色光を2分間照射
したところ、青色から青紫色に着色した。この着色状態
は熱的に非常に安定であった。次に水銀ランプとフィル
ターを組み合せ、680nmの単色光を5分間照射した
ところ、直ちに消色した。この変化は可逆的に繰り返し
行うことができた。A benzene solution of the obtained compound is sealed in a glass cell,
When this glass cell was irradiated with monochromatic light of 404.5 nm for 2 minutes, it was colored from blue to bluish-purple. This colored state was thermally very stable. Next, when a mercury lamp and a filter were combined and monochromatic light of 680 nm was irradiated for 5 minutes, the color immediately disappeared. This change could be repeated reversibly.
(3)゛学記録法2
得られた化合物200nmとポリスチレン(分子量16
万)20gとをトルエン400mj2に溶解し、その溶
液をガラス基板上に塗布、乾燥して、記録層を作成した
。(3) Scientific Recording Method 2 The obtained compound 200 nm and polystyrene (molecular weight 16
A recording layer was prepared by dissolving 20g of 1000g) in 400mj2 of toluene, coating the solution on a glass substrate, and drying it.
この記録層に404.5nmの単色光を3分間照射し、
全面を着色状態にした。この着色状態は熱的に安定であ
り、80℃において12時間以上退色は認められなかっ
た。次にHe−Neレーザー(633nm)10mWに
より書き込みを試みたところ、10秒間の照射で着色は
直ちに退色した。この着色、退色のサイクルは50回以
上繰り返しが可能であった。This recording layer was irradiated with monochromatic light of 404.5 nm for 3 minutes,
The entire surface was colored. This colored state was thermally stable, and no fading was observed for 12 hours or more at 80°C. Next, when writing was attempted using a He-Ne laser (633 nm) at 10 mW, the coloring immediately faded after irradiation for 10 seconds. This cycle of coloring and fading could be repeated 50 times or more.
(4)′学記録法3
得られた化合物1gを2X10−’Torrの真空下で
、約80〜150℃に加熱し、板厚12mmのメタアク
リル樹脂基板上に真空蒸着した。(4) Scientific Recording Method 3 1 g of the obtained compound was heated to about 80 to 150° C. under a vacuum of 2×10 Torr, and vacuum deposited on a 12 mm thick methacrylic resin substrate.
この記録層に404.5nmの単色光を3分間照射し、
全面を着色状態にした。この着色状態は熱的に安定であ
り、80℃において12時間以上退色は認められなかっ
た。次にHe−Neレーザー(633nm)10mWに
より書き込みを試みたところ、10秒間の照射で着色は
直ちに退色した。この着色、退色のサイクルは50回以
上繰り返しが可能であった。This recording layer was irradiated with monochromatic light of 404.5 nm for 3 minutes,
The entire surface was colored. This colored state was thermally stable, and no fading was observed for 12 hours or more at 80°C. Next, when writing was attempted using a He-Ne laser (633 nm) at 10 mW, the coloring immediately faded after irradiation for 10 seconds. This cycle of coloring and fading could be repeated 50 times or more.
し発明の効果]
以上詳述した通り、本発明のフタロシアニン系化合物は
半導体レーザー領域(600〜900nm)に吸収があ
り、半導体レーザー感受性を有し、かつ記録の熱安定性
良好な新規なフォトクロミズムを示す化合物である。[Effects of the Invention] As detailed above, the phthalocyanine compound of the present invention has absorption in the semiconductor laser region (600 to 900 nm), has semiconductor laser sensitivity, and has a novel photochromism with good recording thermal stability. This is the compound shown.
特に前記−数式[11]で示されるフタロシアニン系化
合物、とりわけ−数式[I+ ]において、Rl 、
R2、R3、R4、RS 、 R8、R? 、 Ra
、 R9、RI OR日 R12R13R” RI5
R” R17R” R”、R”、R” R22,
R”、R”が炭素数1〜20の直鎮状又は分岐状のアル
キル基であって、Mが2H,Cu、Ni、Co、Zn。In particular, in the phthalocyanine compound represented by the formula [11], especially in the formula [I+], Rl,
R2, R3, R4, RS, R8, R? , Ra
, R9, RI OR day R12R13R” RI5
R” R17R” R”, R”, R” R22,
R" and R" are straight or branched alkyl groups having 1 to 20 carbon atoms, and M is 2H, Cu, Ni, Co, or Zn.
Fe又は■Oであるフタロシアニン系化合物であれば、
極めて優れた半導体レーザー感受性、記録の熱安定性を
示す。If it is a phthalocyanine compound that is Fe or ■O,
Shows excellent semiconductor laser sensitivity and recording thermal stability.
従って、本発明の化合物は、各種の記録・記憶材料、複
写材料、調光材料、印刷感光体、レーザー用感光材料、
写真植字用感光材料あるいは光フイルタ−、マスキング
用材料、光量計、デスプレイ用材料等として極めて有用
である。Therefore, the compound of the present invention can be used in various recording/memory materials, copying materials, light control materials, printed photoreceptors, laser photosensitive materials,
It is extremely useful as a light-sensitive material for phototypesetting, a light filter, a masking material, a photometer, a display material, etc.
第1図、第2図は、それぞれ実施例1.実施例1Oで合
成した本発明に係るフタロシアニン系化合物の吸収スペ
クトルを示す図であって、横軸は波長(nm)を示し、
縦軸は吸光度を示す。
代理人 弁理士 重 野 剛FIG. 1 and FIG. 2 show Example 1, respectively. It is a diagram showing the absorption spectrum of the phthalocyanine compound according to the present invention synthesized in Example 1O, where the horizontal axis shows the wavelength (nm),
The vertical axis shows absorbance. Agent Patent Attorney Tsuyoshi Shigeno
Claims (3)
族、IVa族、Va族、VIa族、VIIa族の金属原子及び
その酸化物、ハロゲン化物を表わし、A^1、A^2、
A^3、A^4、B^1、B^2、B^3、B^4は複
素環を表わす。ただし、A^1とB^1、A^2とB^
2、A^3とB^3、A^4とB^4はそれぞれ光照射
によって互いに環化して、シクロヘキサジエン環を形成
することにより、その光学的性質を変化せしめるような
複素環である。ただし、Mが2Hの場合、A^1、A^
2、A^3、A^4、B^1、B^2、B^3、B^4
は同時にチオフェン環ではない。) で表わされるフタロシアニン系化合物。(1) General formula [I] ▲There are mathematical formulas, chemical formulas, tables, etc.▼... [I] (In the formula, M is 2H or group VIII, group Ib, group IIb, IIIb
Represents metal atoms of Group IVa, Group Va, Group VIa, Group VIIa, and their oxides and halides, A^1, A^2,
A^3, A^4, B^1, B^2, B^3, and B^4 represent a heterocycle. However, A^1 and B^1, A^2 and B^
2. A^3 and B^3, A^4 and B^4 are heterocycles that change their optical properties by cyclizing each other with light irradiation to form a cyclohexadiene ring. However, if M is 2H, A^1, A^
2, A^3, A^4, B^1, B^2, B^3, B^4
is not a thiophene ring at the same time. ) A phthalocyanine compound represented by
化学式、表等があります▼・・・[II] (式中、Mは2H又はVIII族、 I b族、IIb族、IIIb
族、IVa族、Va族、VIa族、VIIa族の金属原子及び
その酸化物、ハロゲン化物を表わし、X、YはS、O、
Se原子を表わし、R^1、R^2、R^5、R^6、
R^7、R^8、R^1^1、R^1^2、R^1^3
、R^1^4、R^1^7、R^1^6、R^1^9、
R^2^0、R^2^3、R^2^4はアルキル基を表
わし、R^3、R^4、R^9、R^1^0、R^1^
5、R^1^6、R^2^1、R^2^2は水素原子又
はアルキル基を表わす。 ただし、Mが2Hの場合、X、Yは同時にS原子ではな
い。) で表わされる化合物であることを特徴とする特許請求の
範囲第1項に記載のフタロシアニン系化合物。(2) The phthalocyanine compound has the general formula [II]▲mathematical formula,
There are chemical formulas, tables, etc. ▼... [II] (In the formula, M is 2H or group VIII, group I b, group IIb, IIIb
Represents metal atoms of Group IVa, Group Va, Group VIa, Group VIIa, and their oxides and halides, and X and Y are S, O,
Represents Se atoms, R^1, R^2, R^5, R^6,
R^7, R^8, R^1^1, R^1^2, R^1^3
, R^1^4, R^1^7, R^1^6, R^1^9,
R^2^0, R^2^3, R^2^4 represent alkyl groups, R^3, R^4, R^9, R^1^0, R^1^
5. R^1^6, R^2^1 and R^2^2 represent a hydrogen atom or an alkyl group. However, when M is 2H, X and Y are not S atoms at the same time. ) The phthalocyanine compound according to claim 1, which is a compound represented by:
^3、R^4、R^5、R^6、R^7、R^8、R^
9、R^1^0、R^1^1、R^1^2、R^1^4
、R^1^4、R^1^5、R^1^6、R^1^7、
R^1^8、R^1^9、R^2^0、R^2^1、R
^2^2、R^2^3、R^2^4が炭素数1〜20の
直鎖状又は分岐状のアルキル基を示し、Mが2H、Cu
、Ni、Co、Zn、Fe又はVoを示すことを特徴と
する特許請求の範囲第2項に記載のフタロシアニン系化
合物。(3) In the general formula [II], R^1, R^2, R
^3, R^4, R^5, R^6, R^7, R^8, R^
9, R^1^0, R^1^1, R^1^2, R^1^4
, R^1^4, R^1^5, R^1^6, R^1^7,
R^1^8, R^1^9, R^2^0, R^2^1, R
^2^2, R^2^3, R^2^4 represent a linear or branched alkyl group having 1 to 20 carbon atoms, M is 2H, Cu
, Ni, Co, Zn, Fe, or Vo.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP107489A JPH02665A (en) | 1988-01-22 | 1989-01-06 | Phthalocyanine compound |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63-11895 | 1988-01-22 | ||
| JP1189588 | 1988-01-22 | ||
| JP107489A JPH02665A (en) | 1988-01-22 | 1989-01-06 | Phthalocyanine compound |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02665A true JPH02665A (en) | 1990-01-05 |
Family
ID=26334234
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP107489A Pending JPH02665A (en) | 1988-01-22 | 1989-01-06 | Phthalocyanine compound |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02665A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0985163A4 (en) * | 1997-05-30 | 2004-05-19 | Steven A Carlson | Optical shutter device |
-
1989
- 1989-01-06 JP JP107489A patent/JPH02665A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0985163A4 (en) * | 1997-05-30 | 2004-05-19 | Steven A Carlson | Optical shutter device |
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