JPH0267729A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPH0267729A
JPH0267729A JP63219118A JP21911888A JPH0267729A JP H0267729 A JPH0267729 A JP H0267729A JP 63219118 A JP63219118 A JP 63219118A JP 21911888 A JP21911888 A JP 21911888A JP H0267729 A JPH0267729 A JP H0267729A
Authority
JP
Japan
Prior art keywords
wiring layer
pad
wiring
input
wiring layers
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63219118A
Other languages
Japanese (ja)
Inventor
Masayuki Karasawa
唐澤 眞之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP63219118A priority Critical patent/JPH0267729A/en
Publication of JPH0267729A publication Critical patent/JPH0267729A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • H10W72/932Plan-view shape, i.e. in top view

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To enable an input/output signal to be taken out of a pad directly through an arbitrary wiring layer without increasing chip area in a semiconductor device having multiple wiring layers by arranging and connecting all the wiring layers in the pad. CONSTITUTION:For example, in a semiconductor device having three wiring layers, a third wiring layer 11 and a second wiring layer 12 are connected to each other at a contact hole 14, and the second wiring layer 12 and a first wiring layer 13 are connected to each other at a contact hole 15. All the wiring layers are arranged and connected in this pad so that an input/output signal can be led out from the pad directly through the first wiring layer 26. The input/output signal can also equally be taken out through the second or the third wiring layer, and because all the wiring layers are arranged and connected in the pad, the input/output signal can be taken out from the pad directly through an arbitrary wiring layer without increasing chip area.

Description

【発明の詳細な説明】 [産業上の利用分野1 本発明は、半導体装置に関し、特に入出力信号の取り出
し方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application 1] The present invention relates to a semiconductor device, and particularly to a method for extracting input/output signals.

[従来の技術1 以下、従来の技術について、3層の配線層を有する半導
体装置において、入出力信号を1層目の配線層で取り出
す場合で説明する。
[Prior Art 1] Hereinafter, a conventional technique will be described based on a case where input/output signals are taken out in the first wiring layer in a semiconductor device having three wiring layers.

前記における従来例は第3図の如きであった。The conventional example mentioned above was as shown in FIG.

第3図に示されるように、パッドは最上部3層目配線層
31の単層構造であり、入出力信号をパッドから1層目
の配線層33で取り出す場合、パッド外側にて3層目の
配線層31と2層目の配線層32とを34のコンタクト
ホールで接続し、かつ、2層目の配線層32と1層目の
配線層33とを35のコンタクトホールで接続していた
As shown in FIG. 3, the pad has a single-layer structure with the third wiring layer 31 at the top, and when input/output signals are taken out from the pad through the first wiring layer 33, the third wiring layer 31 is placed on the outside of the pad. The wiring layer 31 and the second wiring layer 32 were connected through 34 contact holes, and the second wiring layer 32 and the first wiring layer 33 were connected through 35 contact holes. .

以上、従来例を3層の配線層を有し、かつ、入出力信号
をパッドから1層目の配線層で引き出す場合について説
明したが、3層以外の多層の配線層を有し、かつ、入出
力信号を任意の配線層で弓き出す場合においても、従来
においては、第3図に示される従来例同様パッドを構成
する最上部配線層から前記任意の配線層までパッドの外
側で順次金配線M間をコンタクトホールで個々に接続し
ていた。
In the above, the conventional example has three wiring layers and the input/output signal is extracted from the pad through the first wiring layer. Even when input/output signals are routed through an arbitrary wiring layer, conventionally, as in the conventional example shown in FIG. The wirings M were individually connected through contact holes.

〔発明が解決しようとする課題1 今日、半導体装置において、チップ面積縮小の為、多層
配線比の傾向が著じるしい。
[Problem to be Solved by the Invention 1] Today, in semiconductor devices, there is a remarkable tendency to increase the multilayer wiring ratio in order to reduce the chip area.

多層の配線層を有する半導体装置において、入出力信号
をパッドから任意の配線層で取り出す場合、従来技術に
おいては、以下の理由によりチップ面積の増加、品質悪
化等の問題があった。
In a semiconductor device having multiple wiring layers, when an input/output signal is extracted from a pad through an arbitrary wiring layer, conventional techniques have had problems such as an increase in chip area and deterioration in quality due to the following reasons.

1、パッドと前記任意の配線層までの距離は、前記任意
の配線層が下層になる程長くなる。
1. The distance between the pad and the arbitrary wiring layer increases as the arbitrary wiring layer becomes a lower layer.

2、特に出力信号等大電流が流れる場合には、配線溶断
防止の為各配線層間を接続するコンタクトホールの面積
を大きくする必要がある。逆に、チップ面積に制限があ
り、各配線層間を接続するコンタクトホールの面積が十
分数れない場合、配線溶断という問題が起こる。
2. In particular, when a large current such as an output signal flows, it is necessary to increase the area of the contact hole connecting each wiring layer to prevent the wiring from melting. On the other hand, if the chip area is limited and the area of the contact holes connecting each wiring layer is insufficient, the problem of wiring melting occurs.

そこで本発明は以上の如き問題点を解決するもので、チ
ップ面積の増加なしに入出力信号をパッドから直接任意
の配線層で取り出すことを可能とし、かつ、品質の向上
した半導体装置を提供することを目的とする。
Therefore, the present invention solves the above-mentioned problems, and provides a semiconductor device that allows input/output signals to be taken out directly from pads through any wiring layer without increasing the chip area, and has improved quality. The purpose is to

[課題を解決するための手段] 本発明の半導体装置は、 a)ICにおいて、 b)少なくとも2層以上の金属配線層とC)パッドとを
有し d)前記パッドが前記少なくとも2層以上の金属配線層
すべてを具備し、かつ、前記少なくとも2層以上の金属
配線層すべてをコンタクトホールにて接続して構成され
、 e)かつ、IC内部の任意の金属配線層と前記パッドと
を直接接続したことを特徴とする。
[Means for Solving the Problems] A semiconductor device of the present invention includes a) an IC, b) at least two or more metal wiring layers, and C) a pad, and d) the pad is one of the at least two or more layers. All metal wiring layers are provided, and all of the at least two or more metal wiring layers are connected through contact holes, and e) Any metal wiring layer inside the IC is directly connected to the pad. It is characterized by what it did.

〔実 施 例1 以下、本発明について、3層の配線層を有する半導体装
置の実施例で説明する。
[Example 1] The present invention will be described below using an example of a semiconductor device having three wiring layers.

第1図(a)、(b)は、本発明のパッドの基本的な実
施例を示すそれぞれ平面図、断面図である。第1図にお
いて、11は3層目配線層、12は2層目配線層、13
は1層目配線層であり、前記11と12とは14のコン
タクトホールで、前記12と13とは15のコンタクト
ホールでそれぞれ接続されている。第2図(a)、(b
)は、入出力信号を前記第1図に示されるパッドから1
層目の配線層で引き出した場合の実施例を示すそれぞれ
平面図、断面図である。第2図に示されるように、前記
第1図に示されるパッドにおいてすべでの配線層が配置
接続されている為、チップ面積を増加することなく入出
力信号をパッドから直接1層目の配線層26で引き出す
ことができる。
FIGS. 1(a) and 1(b) are a plan view and a sectional view, respectively, showing a basic embodiment of the pad of the present invention. In FIG. 1, 11 is the third wiring layer, 12 is the second wiring layer, and 13 is the third wiring layer.
is the first wiring layer, the above-mentioned 11 and 12 are connected through 14 contact holes, and the above-mentioned 12 and 13 are connected through 15 contact holes, respectively. Figure 2 (a), (b)
) connects the input/output signals from the pad shown in FIG.
FIG. 7 is a plan view and a cross-sectional view, respectively, showing an example in which wiring is drawn out at the second wiring layer. As shown in Figure 2, all wiring layers are arranged and connected at the pad shown in Figure 1, so input/output signals can be routed directly from the pad to the first layer wiring without increasing the chip area. It can be drawn out at layer 26.

また、2層目、3層目の配線層で入出力信号を取り出す
場合においても同様の事が言える0以上、パッドにすべ
ての配線層が配置接続されている為、チップ面積が増加
することなく入出力信号をパッドから任意の入出力配線
層で直接引き出すことができ、さらに以下の様な効果が
ある。
The same thing can be said when extracting input/output signals from the second and third wiring layers.Since all wiring layers are arranged and connected to the pads, the chip area does not increase. Input/output signals can be directly extracted from the pad through any input/output wiring layer, and the following effects are also achieved.

1、各配線層間を接続するコンタクトホールの面積はチ
ップ面積に影響を与えることな〈従来例に比べ大きくと
れ、この為、前記コンタクトホールにおける許容電流値
は大きくなり配線溶断を防止することができる。
1. The area of the contact hole that connects each wiring layer can be made larger than the conventional example without affecting the chip area, and therefore the permissible current value in the contact hole is large and wiring melting can be prevented. .

2、各配線層間の接続部の厚さはすべての配線層が重な
る為従来例に比べ厚くなり、この為、各配線層間の接続
抵抗は小さくなりスピードは速くなる。
2. The thickness of the connection between each wiring layer is thicker than in the conventional example because all the wiring layers overlap, so the connection resistance between each wiring layer is reduced and the speed is increased.

3、ボンディングの際のワイヤーボールとパッドとの接
触面積は従来の平面的な接触に比べ立体的な接触である
為大きくなり、この為、接触抵抗は小さくなりスピード
は速くなる。
3. The contact area between the wire ball and the pad during bonding is larger because it is a three-dimensional contact than the conventional planar contact, and therefore the contact resistance is reduced and the speed is increased.

以上、3層配線を有する半導体装置で説明したが、前記
実施例に限らず3層以外の多層配線層を有する場合にお
いても、パッドにすべての配線層を配置接続することに
より同様の事が言える。
Although the above description has been made regarding a semiconductor device having three layers of wiring, the same thing can be said not only in the above embodiment but also in cases where the device has a multilayer wiring layer other than three layers by arranging and connecting all the wiring layers to the pads. .

〔発明の効果〕〔Effect of the invention〕

以上1本発明によれば、多層の配線層を有する半導体装
置において、パッドにすべての配線層を配置接続するこ
とにより以下の様な効果がある。
According to the present invention, in a semiconductor device having multiple wiring layers, the following effects can be achieved by arranging and connecting all wiring layers to pads.

1、チップ面積が増加することなく入出力信号なパッド
から任意の配線層で直接取り出すことができる。
1. It is possible to take out input/output signals directly from the pad to any wiring layer without increasing the chip area.

2、各配線層間を接続するコンタクトホールの面積はチ
ップ面積に影響を与えることな〈従来例に比べ大きくと
れ、この為、前記コンタクトホールにおける許容電流値
は大きくなり配線溶断を防止することができる。
2. The area of the contact hole that connects each wiring layer can be made larger than the conventional example without affecting the chip area, and therefore, the permissible current value in the contact hole is increased and wiring melting can be prevented. .

3、各配線層間の接続部の厚さはすべての配線層が重な
る為従来例に比べ厚くなり、この為、各配線層間の接続
抵抗は小さくなりスピードは速くなる。
3. The thickness of the connection between each wiring layer is thicker than in the conventional example because all the wiring layers overlap, so the connection resistance between each wiring layer is reduced and the speed is increased.

4、ボンディングの際のワイヤーボールとパッドとの接
触面積は従来の平面的な接触に比べ立体的な接触である
為大きくなり、この為、接触抵抗は小さくなりスピード
は速くなる。
4. The contact area between the wire ball and the pad during bonding is larger because it is a three-dimensional contact than the conventional planar contact, and therefore the contact resistance is reduced and the speed is increased.

の基本的な実施例を示すそれぞれ平面図、断面図、第3
図(a)、(b)は、従来例を示すそれぞれ平面図、断
面図。
A plan view, a sectional view, and a third diagram showing the basic embodiment of the
Figures (a) and (b) are a plan view and a sectional view, respectively, showing a conventional example.

1 l 、 l 2、 l 3. 14. 21. 22. 22、 l 5. 31 ・ ・ ・ ・ 32 ・ ・ ・ ・ 26、32 ・ 24、25、 ・3層目配線層 ・2層目配線層 ・1層目配線層 34.35 ・コンタクトホール 以上 出願人 セイコーエプソン株式会社 代理人 弁理士 上 柳 雅 誉(他1名)1 l, l 2、 l 3. 14. 21. 22. 22, l 5. 31 ・ ・ ・ ・ 32 ・ ・ ・ ・ 26, 32・ 24, 25, ・3rd layer wiring layer ・Second wiring layer ・1st wiring layer 34.35 ・Contact hole that's all Applicant: Seiko Epson Corporation Agent: Patent attorney Homare Kamiyanagi (1 other person)

【図面の簡単な説明】[Brief explanation of the drawing]

第1図(a)、(b)は、本発明のパッドの基本的な実
施例を示すそれぞれ平面図、断面図、第2図(a)、(
b)は、入出力信号の取り出し法(O−) (b) 塾1)乞 (F)) 阜21幻
FIGS. 1(a) and 1(b) are a plan view and a sectional view showing a basic embodiment of the pad of the present invention, and FIGS.
b) is the method of extracting input/output signals (O-) (b) School 1) Request (F))

Claims (1)

【特許請求の範囲】 a)半導体集積回路(以下ICと略す)において、 b)少なくとも2層以上の金属配線層と、 c)IC外部機器とICとをワイヤー接続する為の金属
接続部(以下パッドと略す)とを有し、d)前記パッド
が前記少なくとも2層以上の金属配線層すべてを具備し
、かつ、前記少なくとも2層以上の金属配線層すべてを
コンタクトホールにて接続して構成され、 e)かつ、IC内部の任意の金属配線層と前記パッドと
を直接接続したことを特徴とする半導体装置。
[Scope of Claims] a) A semiconductor integrated circuit (hereinafter abbreviated as IC), b) at least two or more metal wiring layers, and c) a metal connection part (hereinafter referred to as IC) for wire connection between an IC external device and the IC. d) the pad comprises all of the at least two or more metal wiring layers, and is configured by connecting all of the at least two or more metal wiring layers with a contact hole. , e) and a semiconductor device characterized in that an arbitrary metal wiring layer inside the IC and the pad are directly connected.
JP63219118A 1988-09-01 1988-09-01 Semiconductor device Pending JPH0267729A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63219118A JPH0267729A (en) 1988-09-01 1988-09-01 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63219118A JPH0267729A (en) 1988-09-01 1988-09-01 Semiconductor device

Publications (1)

Publication Number Publication Date
JPH0267729A true JPH0267729A (en) 1990-03-07

Family

ID=16730527

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63219118A Pending JPH0267729A (en) 1988-09-01 1988-09-01 Semiconductor device

Country Status (1)

Country Link
JP (1) JPH0267729A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10154708A (en) * 1996-11-18 1998-06-09 Samsung Electron Co Ltd Pad structure of semiconductor device
US5903058A (en) * 1996-07-17 1999-05-11 Micron Technology, Inc. Conductive bumps on die for flip chip application

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5903058A (en) * 1996-07-17 1999-05-11 Micron Technology, Inc. Conductive bumps on die for flip chip application
JPH10154708A (en) * 1996-11-18 1998-06-09 Samsung Electron Co Ltd Pad structure of semiconductor device

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