JPH02721U - - Google Patents
Info
- Publication number
- JPH02721U JPH02721U JP7779788U JP7779788U JPH02721U JP H02721 U JPH02721 U JP H02721U JP 7779788 U JP7779788 U JP 7779788U JP 7779788 U JP7779788 U JP 7779788U JP H02721 U JPH02721 U JP H02721U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- locking shoulder
- support
- support device
- guide surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000630 rising effect Effects 0.000 claims 2
- 238000001514 detection method Methods 0.000 description 1
Landscapes
- Separation Of Particles Using Liquids (AREA)
Description
図面は本考案の実施例を示し、第１図は断面図
、第２図は支持片の拡大側面図、第３図はチヤツ
クプレートの平面図、第４図は端板部分の断面図
、第５図は検出板部分の平面図である。
１……チヤツクプレート、６……支持片、１２
……回転軸。
The drawings show an embodiment of the present invention; FIG. 1 is a sectional view, FIG. 2 is an enlarged side view of the support piece, FIG. 3 is a plan view of the chuck plate, and FIG. 4 is a sectional view of the end plate. FIG. 5 is a plan view of the detection plate portion. 1...Chuck plate, 6...Support piece, 12
……Axis of rotation.
Claims (1)
ウエハの外周を取り囲むよう複数の支持片を突設
し、該支持片にウエハの周縁を担持するよう係止
肩を形成した両面スクラバにおけるウエハの支持
装置。 ２ 上記支持片の先端と係止肩の間にウエハを係
止肩に案内するよう傾斜する案内面を形成した請
求項１に記載のウエハ支持装置。 ３ 上記係止肩と案内面の間に上方に立上る立上
面を形成した請求項２に記載のウエハの支持装置
。[Claims for Utility Model Registration] 1. A plurality of support pieces are protruded from the surface of a rotatably provided chuck plate so as to surround the outer periphery of the wafer, and a locking shoulder is provided on the support pieces to support the periphery of the wafer. Wafer support device in the formed double-sided scrubber. 2. The wafer support device according to claim 1, further comprising an inclined guide surface formed between the tip of the support piece and the locking shoulder so as to guide the wafer to the locking shoulder. 3. The wafer support device according to claim 2, wherein a rising surface rising upward is formed between the locking shoulder and the guide surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7779788U JPH02721U (en) | 1988-06-14 | 1988-06-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7779788U JPH02721U (en) | 1988-06-14 | 1988-06-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02721U true JPH02721U (en) | 1990-01-05 |
Family
ID=31302759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7779788U Pending JPH02721U (en) | 1988-06-14 | 1988-06-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02721U (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS58217184A (en) * | 1982-06-09 | 1983-12-17 | 三菱電機株式会社 | Wafer drier |
| JPS63178531A (en) * | 1987-01-20 | 1988-07-22 | Fujitsu Ltd | Washing type intermediate stage |
-
1988
- 1988-06-14 JP JP7779788U patent/JPH02721U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5737837A (en) * | 1980-08-20 | 1982-03-02 | Toshiba Corp | Drying device for semiconductor wafer |
| JPS58217184A (en) * | 1982-06-09 | 1983-12-17 | 三菱電機株式会社 | Wafer drier |
| JPS63178531A (en) * | 1987-01-20 | 1988-07-22 | Fujitsu Ltd | Washing type intermediate stage |