JPH02733U - - Google Patents
Info
- Publication number
- JPH02733U JPH02733U JP7991288U JP7991288U JPH02733U JP H02733 U JPH02733 U JP H02733U JP 7991288 U JP7991288 U JP 7991288U JP 7991288 U JP7991288 U JP 7991288U JP H02733 U JPH02733 U JP H02733U
- Authority
- JP
- Japan
- Prior art keywords
- holding table
- partition
- processed
- holding
- gas chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Electron Beam Exposure (AREA)
Description
第１図はこの考案の一実施例の断面図、第２図
は従来例の隔壁とウエハとを示す断面図、第３図
は他の従来例の断面図である。
１…ウエハ、２…隔壁、２ａ…微小孔、３…保
持台、４…ガス室、６…加圧バルブ、７…排気バ
ルブ、１１…クランプ装置。
FIG. 1 is a sectional view of one embodiment of this invention, FIG. 2 is a sectional view showing a partition wall and a wafer of a conventional example, and FIG. 3 is a sectional view of another conventional example. DESCRIPTION OF SYMBOLS 1... Wafer, 2... Partition wall, 2a... Microhole, 3... Holding stand, 4... Gas chamber, 6... Pressure valve, 7... Exhaust valve, 11... Clamp device.
Claims (1)
設け、前記処理物の縁部を前記保持台に固定する
クランプ装置を設け、前記隔壁の裏面に開口した
ガス室を前記保持台に設け、前記隔壁に多数の微
小孔を設けた真空内処理物の保持装置。 A flexible partition on which the object to be processed is placed is provided on the surface of the holding table, a clamp device is provided for fixing the edge of the object to the holding table, and a gas chamber opening on the back side of the partition is provided on the holding table. , a holding device for an object to be processed in a vacuum, the partition wall having a large number of micropores;
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7991288U JPH02733U (en) | 1988-06-14 | 1988-06-14 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7991288U JPH02733U (en) | 1988-06-14 | 1988-06-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH02733U true JPH02733U (en) | 1990-01-05 |
Family
ID=31304758
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7991288U Pending JPH02733U (en) | 1988-06-14 | 1988-06-14 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02733U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011523770A (en) * | 2008-06-04 | 2011-08-18 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | Technology to change the temperature of the platen |
-
1988
- 1988-06-14 JP JP7991288U patent/JPH02733U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011523770A (en) * | 2008-06-04 | 2011-08-18 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | Technology to change the temperature of the platen |